JPS59211573A - Vacuum deposition device - Google Patents

Abstract

PURPOSE:To provide a titled device which permits observation of a heating and evaporating part at all times and is low in cost by constituting a base material for a mirror to be provided in a vacuum chamber in order to observe the heating and evaporating part of a vapor depositing member of a material having the coefft. of linear expansion in a heating temp. range approximate to that of the material to be deposited by evaporation. CONSTITUTION:A material 4 to be deposited by evaporation installed in a vacuum chamber 1 of a vacuum deposition device is heated to evaporate by the electron ray 3 generated from an E gun 2, and the particles of the evaporating member 4 evaporated through the aperture 11a of a heat shielding plate 11 provided at the top end of a shroud 10 are deposited on a member 5 to be subjected to vapor deposition installed in the upper part so as to face the member 2. The operator controls the evaporation by observing the heating and evaporating part of the member 4 through a peep window 6, a mirror 9a and the aperture 11b of the plate 11. The base material of said mirror 9 is constituted of the material having the same coefft. of linear expansion in the predicted heating temp. range of the mirror 9a as that of the member 4 or having the aporoximate coefft. of linear expansion within about 30%. Even if the material to be deposited by evaporation sticks on the mirror 9a, the specular surface condition is maintained and the observation through the window 6 is not hampered.

Description

DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to a vacuum evaporation apparatus in which a mirror for observing a heated evaporation part of a evaporation member is provided in a vacuum chamber together with the evaporation member.

[Technical Background of the Invention and Points of Interest] A typical method for forming a thin film in a vacuum involves heating and evaporating a metal or non-metal as a member to be vapor-deposited, such as a glass or quartz plate as a member to be vapor-deposited. evaporation, which deposits a thin film on the surface of metals, and molecular beam epitaxy, which heats and evaporates metals or non-metals to create particle beams made of neutral molecules to grow crystals, but in this specification, they are collectively referred to as This is called vacuum evaporation.

Here, in order to heat and evaporate silicon, which has a relatively high melting point, to obtain a high-purity molecular beam, a method is adopted in which a melt part is formed in the upper central part of the silicon ingot and the silicon ingot itself is used as a crucible. An E gun that performs impact heating using an accelerated electron beam is used to form this melt portion.

In this way, when a melt part is formed in the upper central part of the silicon ingot, the lower bottom and side surfaces of the silicon ingot are forcibly cooled, but the melt part is cooled by the energy provided in the form of electron beams and the cooling efficiency of the silicon ingot. Because the spread changes slightly, it is necessary to observe the heating evaporation part from outside the vacuum chamber where vacuum evaporation is performed.

FIG. 1 shows the configuration of a conventional vacuum evaporation apparatus of this type, in which a evaporation member 4 is placed in a vacuum chamber 1.
A loaded E-can 2 and a member to be evaporated 5 are provided, and the side wall of the vacuum chamber 1 is provided with a viewing window 6 and a shutter 7 for closing the viewing window 6 from inside. A handle 8 for operating the handle 7 protrudes outward through the side wall through the shell.

Here, the vapor deposition part 4 is loaded into the hearth part formed in the E gun 2 with its upper surface exposed, and when the upper central part of the vapor deposition part 4 is heated by the electron beam 3, this part is heated. A melt section is formed in the melt section, and vapor deposition is carried out from row 7 on the heated >ti member 5 placed in the -F region.

On the other hand, the viewing window 6 is set at a position where the heating and evaporating section can be observed from diagonally above, and the shutter 7 is moved out of the field of view during this observation, so that no observation can be made. Return it to prevent contamination of the viewing window.

Next, FIG. 2 also shows the configuration of this type of conventional vacuum evaporation apparatus, in which a mirror 9 is provided on the side wall facing the viewing window 6, and a mechanism similar to that described above is provided. It is provided in front of the shutter 7 or the mirror 9.

Thus, the heating and evaporation section is observed through the mirror 9, and the shutter 7 prevents the reflection curve of the mirror 90 from being contaminated.

In this case, since the viewing window 6 and the mirror 9 are provided on side walls facing each other, the angle at which the heating evaporator is viewed is somewhat closer to horizontal than that shown in FIG. The inner surface is prevented from being hit by evaporated molecules.Therefore, the viewing window 6 is always kept clean and is also used to monitor the condition inside the vacuum chamber 1.

Next, FIG. 3 shows the configuration of a conventional vacuum evaporation apparatus for forming a thin film in an ultra-high vacuum.
While performing heat shielding Mk at 12 o'clock, the position facing the evaporator 7g member 4 and the heating evaporator part 16: where each has openings 11a and llb (heat)! ,,shield 1
1 is arranged at the upper end of the shroud 10.

The viewing window 6, mirror 9 and shutter 7 are the same as the device 6 shown in FIG. With respect to the unique arrangement 1', the heating evaporation section is observed by tracing the open DIlb of the heat shield plate 1.

3X mentioned above! ! The vacuum evaporation equipment with = has shutter 7.
is used to prevent contamination of the viewing window 6 or mirror 9. However, when observing the heating evaporation section, the shutter 7 must be moved out of the field of view from the front of the viewing window 6 or mirror 9. The contamination of time is reflected, and we are forced to remove the material that has accumulated here.

In addition, if a chromium-plated glass is used as the mirror 9, and if the vapor deposition material is gold 1>j'i,
Even if metal adheres to the mirror 9, the mirror surface will be maintained for a period of ¥1,000 (σ), so the viewing window VC, :I゛f object'L'↓
Compared to Ka・1ζ1 fall, it was 7 months ago!
7I'Aυ): This is a force that uses a mirror at the entry point to reduce the amount of damage caused by one river.

However, if more than 1μn1 of silicon as a 19'-inch habitual shell is deposited on this mirror 9, the deposited silicon will partially peel off and cause heating heat.
It becomes extremely difficult to perform s, i3°, and in some cases, it may become impossible to perform t, si12.

In other words, the temperature of the mirror 9 easily rises to about 100°C due to the radiant heat of the heating evaporation section, and may rise to 200°C during observation for a long time. As the temperature of the mirror 9) falls to room temperature, the deposited silicon will peel off due to the difference in glandular expansion coefficient of 1j4.1 between the glass and chromium that forms the mirror 9) and the silicon deposited here. considered to be a thing.

(Thus, in conventional vacuum evaporation equipment, observation time is limited to one time when contamination is low, and the heating evaporation section cannot be constantly observed. Its temperature is measured externally. Although the thickness could be controlled to a certain degree, there were several disadvantages.

Also, since the handle for moving the shutter 7 is poorly constructed and passes through the walls 1 and 11 of the viewing room 1, airtightness cannot be maintained;
g, 7 Similar careful adjustments are required, which increases manufacturing costs, and is there a backing here? There was also a risk that gas would be released from the backing of the sword used.

On the other hand, the apparatus shown in FIG.
r': t, vc, once exposed to the atmosphere, it takes a long time to reach the air.
Even when the deposits on the reflective surface of mirror 9 peeled off, making it impossible to perform warm-extension measurements, mirror 9 could not be replaced.

One way to prevent this is to water-cool the mirror, but this has the drawback of increasing the cost of mounting and mounting.

[Purpose of the invention]

The present invention has been made to eliminate the above-mentioned drawbacks.
1. It is inexpensive in terms of cost and allows the heating and evaporating section to be ``suspended'' and prevented from becoming observable. c) The purpose is to provide a vacuum evaporation device.

[Summary of the invention]

In order to achieve this object, the present invention provides a mirror for observing the heating evaporation section of the evaporation section [■J evaporation section].

In a vacuum vapor deposition system provided in a vacuum chamber together with a member, the base material of the mirror is heated to a temperature range in which the mirror is expected to be heated. It is characterized by being made of the same or similar material.

[Embodiments of the invention]

Hereinafter, a single person embodiment of the present invention will be described with reference to the accompanying drawings.

FIG. 4 shows 414 examples of a vacuum evaporation apparatus according to the present invention, in which the same reference numerals as in FIG. 3 indicate the same elements. 3 in that the shutter 7 and handle 8 shown in FIG. 3 are removed, and a mirror 9a of the same quality as the vapor deposition material 4 is provided in place of the mirror 90.

As mentioned above, the mirror used together with the heating evaporation section can be heated up to, for example, 200°C by radiation heat, and the mirror used is one with chrome plating on the glass surface, and the evaporation Xf material is used as the mirror. is chrono・
In this case, the multi-jd surface state is maintained because the chromium molecules illuminate the reflective surface in a state similar to normal vapor i.

However, when the film thickness of chrome becomes large, based on the difference in line expansion between glass and chrome,
Chrome flaking occurs when the temperature of the mirror rises and falls repeatedly.

On the other hand, in the steaming layer during super-improvement, a mirror with no chrome plating on the next surface of the glass allows the steaming layer f'i'/
When observing the evaporated part under the applied force 1 of silicon as J quality, the mirror state is maintained in this case as well since silicon adheres to the chromium.

However, if the silicon film thickness exceeds 1 μrn f: chromium and silicon 1ite 17) Linear expansion 1
The difference in coefficient of linear expansion between glass and silicon is thought to be the cause of the difference in coefficient of linear expansion, rather than a physical difference between the two types.

Therefore, at the angle of 141 degrees shown in Fig. 4, the vaporizing material 11'b is silicon, and the reflection 11. An explanation of the heating evaporation section will be made using a mirror 9a made entirely of silicon including lI. 1-Nawa' et al., when using mirroran of the same quality as the deposited material, there is no difference in linear expansion coefficient, so this method prevents the deposit from peeling off.

According to actual experiments, there is 1 on the reflective surface of this silicon mirror 9a.
Even if silicon of 00μIT1 or more is deposited, this 7'
There was no peeling off of the L.

In this example, a mirror of the same quality as the deposited material was used, but it is not necessarily necessary that the two are of the same quality, but the advantage of similar linear expansion coefficients is 'i,? A mirror having a base 4d'' may also be used.

Also, according to experiments, silicon was heated and evaporated using a chrome-plated mirror glass plate, and silicone was heated and evaporated here. L: No peeling occurred even when the film was deposited to a thickness of 50 μm or more. Here, the linear expansion coefficients of Virex glass and silicon are J and O, respectively.
X 10-6! 2.4, X ICl-6, the difference between the two when based on silicon was about 2.5%.

The result of these experiments is -', from the i side, ? , the same as the adhesion member.
Of course, it is best to use a mirror of high quality, but even if it is not necessarily of the same quality, this mirror will add j,',,% f? , , ) Then, in the predicted temperature range, j, if the expansion coefficient of the vapor deposited part and the modern one are 3 (1% I), then, The peeps that are not available for support are oral skills.

In addition, in the embodiment described in -, the vaporization process is carried out in a high vacuum chamber. Of course, by applying 7, it goes without saying that C can also be obtained.3 [Effects of the Invention] As is clear from the R invention of 7r, according to the g air steaming apparatus of the present invention, Q! 4) Constant observation of the thermal evaporation section, and water cooling to prevent the inability to observe the heat, which was indispensable in conventional equipment, This eliminates the need for one piece of equipment, resulting in significant cost reductions.

In addition, since the shirt shutter is no longer necessary, there is no longer a need for a handle that penetrates the wall of the vacuum chamber, and there is no need for gas to be released from the backing, etc. used here (enabling good evaporation under high vacuum). .

Note that even if a mirror of the same age as the vapor deposition member or a mirror made of a material with a similar coefficient of linear expansion is used, it must be replaced at some point, but the number of times the replacement is required is less than that of conventional equipment. The best thing to do is to reduce it to less than /100.

[Brief explanation of the drawing]

1 to 3 are conceptual diagrams showing the configuration of various conventional vacuum evaporation apparatuses, and FIG. 4 is a conceptual diagram showing the configuration of an embodiment of the vacuum evaporation apparatus according to the present invention. 1...Vacuum chamber, 2...E gun, 3...Pacific gland, 4
... Vapor deposition member, 5... Evaporation target member, 6... Peephole, 7... Shutter, 8... Handle, 9, 9a...
-Mirror, 10...shroud, 11...heat shield plate, lla, llb...opening. Figure 1 Figure 3 Figure 2 Figure 4

Claims (3)

[Claims] (1) In a vacuum evaporation apparatus in which a mirror for observing the heated evaporation part of the evaporation member is provided in a vacuum chamber together with the #layer member, the base material of the mirror is heated within a temperature range where the mirror is expected to be heated. A vacuum evaporation apparatus fl, l, characterized in that it is made of a material with a linear expansion coefficient of 4r'+ equal to or similar to that of the evaporation member MiJ. (2) Claim 1, characterized in that the base material of the mirror is made of a gold material of the same quality as the vapor deposition member.
The vacuum evaporation apparatus described in Section 1. (3) The base material of the mirror is made of a material having a coefficient of linear expansion within a percentage of that of the vapor deposition material in the range from room temperature to approximately 200°C. vacuum evaporation equipment.