JPS59201356A - Scanning type electron microscope - Google Patents
Scanning type electron microscopeInfo
- Publication number
- JPS59201356A JPS59201356A JP7667283A JP7667283A JPS59201356A JP S59201356 A JPS59201356 A JP S59201356A JP 7667283 A JP7667283 A JP 7667283A JP 7667283 A JP7667283 A JP 7667283A JP S59201356 A JPS59201356 A JP S59201356A
- Authority
- JP
- Japan
- Prior art keywords
- sample
- detector
- holder
- around
- electron microscope
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/244—Detectors; Associated components or circuits therefor
Abstract
Description
【発明の詳細な説明】 (イ)産業上の利用分野 本発明は走査型電子顕微鏡に関する。[Detailed description of the invention] (b) Industrial application fields The present invention relates to a scanning electron microscope.
(ロ)従来技術
走査型電子顕微鏡では試料を照射する電子ビームの方向
が試料を視る視線方向に相当し、試料から出る二次電子
7反射電子等を検出する検出器は試料を照明する光源に
相当する。例えば第]図Aに示すような一つの凸部Pを
有する試料を考える。(b) In conventional scanning electron microscopes, the direction of the electron beam that irradiates the sample corresponds to the line of sight from which the sample is viewed, and the detector that detects secondary electrons 7 reflected electrons etc. emitted from the sample is the light source that illuminates the sample. corresponds to For example, consider a sample having one convex portion P as shown in Figure A.
試料の基準面を8とする。電子ビームがAの方向から試
料を照射している場合、凸部の頂点Pは電子ビームが試
料の基準面S上でa点を走査しているときに検出され、
電子ビームがB方向から照射しているときはb点を走査
しているときに凸部頂点Pが検出される。即ち電子ビー
ムの照射方向によって凸部の像に視差が生じる。と云う
ことは電子ビームの照射方向が視線方向に対応している
と云うことである。他方検出器りが図の位置にある場合
、凸部Pの右側斜面と左側斜面とを較べると、右側斜面
から放出された二次電子等の方が左側斜面からのものよ
り検出され易い。従って映像では検出器りのある側の斜
面の方が明るくなっている。The reference plane of the sample is 8. When the electron beam is irradiating the sample from the direction A, the apex P of the convex portion is detected when the electron beam is scanning point a on the reference surface S of the sample,
When the electron beam is irradiated from direction B, the apex P of the convex portion is detected while scanning point b. That is, parallax occurs in the image of the convex portion depending on the irradiation direction of the electron beam. This means that the irradiation direction of the electron beam corresponds to the line-of-sight direction. On the other hand, when the detector is in the position shown in the figure, when comparing the right slope and the left slope of the convex portion P, secondary electrons etc. emitted from the right slope are easier to detect than those from the left slope. Therefore, in the image, the slope on the side where the detector is located is brighter.
即ち検出器りが照明に対応して試料面の像にコントラス
トで形成されるのである。That is, the detector forms a contrast image of the sample surface in response to the illumination.
所で従来の走査型電子顕微鏡では検出器の位置は固定さ
れており、このことは試料を照明する方向が固定されて
いることに相当していた。しかし凹凸のある試料では照
明方向によってコントラストのつき方が異シ、第1図B
のような試料面に対してDの位置に検出器を置いた場合
、試料面のど2−
の点からでも略同じ効率で二次電子等が検出されるので
余りコントラストがつかず試料面はなだらかなものと認
識される。反対にD’の位置に検出器を置くと、Cの部
分は二次電子等の検出効率が低く陰がついて見え、表面
の凹凸が鮮明となる。このように試料面の状態によって
は照明の方向即ち検出器の位置によって映像からお試料
面の状態の解釈が異ってくる。電子顕微鏡は光学顕微鏡
に比し、焦点深度が大へん深くて試料面の立体的構造の
観察に適しているのであるが、上述したように検出器の
位置によってコントラストのつき方に著るしい異いかあ
り、それによって立体構造の解釈にも差異が生ずるので
、検出器の位置が固定されている従来の走査型電子顕微
鏡は立体観察に適している特性を充分に活かしていると
は云えない。However, in conventional scanning electron microscopes, the position of the detector is fixed, which means that the direction in which the sample is illuminated is fixed. However, for samples with uneven surfaces, the contrast varies depending on the illumination direction, as shown in Figure 1B.
If the detector is placed at position D with respect to a sample surface like be recognized as something. On the other hand, if the detector is placed at position D', the area C will have a low detection efficiency for secondary electrons, etc., and will appear shaded, and the unevenness of the surface will become clear. As described above, depending on the state of the sample surface, the interpretation of the state of the sample surface from the image varies depending on the direction of illumination, that is, the position of the detector. Compared to optical microscopes, electron microscopes have a much deeper depth of focus and are suitable for observing the three-dimensional structure of the sample surface, but as mentioned above, there are significant differences in contrast depending on the position of the detector. Therefore, it cannot be said that conventional scanning electron microscopes, in which the position of the detector is fixed, make full use of the characteristics suitable for three-dimensional observation.
(ハ)目 的
本発明は上述した点に鑑みてなされたもので、試料の周
囲のどの方向からでも二次電子等を検出できるようにし
た走査型電子顕微鏡を提供しようとするものである。(c) Purpose The present invention has been made in view of the above-mentioned points, and it is an object of the present invention to provide a scanning electron microscope capable of detecting secondary electrons, etc. from any direction around a sample.
(ニ)構 成
本発明走査型電子顕微鏡は試料の周囲に回転可能に検出
器を設けるか或は試料の周囲に複数の検出器を円周上に
配置し、電子検出信号を取出す検出器を選択できるよう
にすることにより、検出器を試料の周囲に回転させるの
と同じ結果を電気的に実現した点に特徴を有する。(d) Configuration In the scanning electron microscope of the present invention, a detector is rotatably provided around the sample, or a plurality of detectors are arranged circumferentially around the sample, and a detector for extracting an electronic detection signal is selected. It is characterized by electrically achieving the same result as rotating the detector around the sample.
実施例
第2図、第3図に本発明の一実施例を示す。第2図で1
は走査型電子顕微鏡の対物レンズ、2は試料で、3は試
料ホルダである。試料ホルダ3の外周には回転可能に環
状検出器ホルダ4が遊嵌される。この検出器ホルダ4に
は一個所上方に突出しだ部分41があり、この部分の内
面に半導体電子検出器5が取付けである。検出器ホルダ
4の外周には歯車42が切ってあり、走査型電子顕微鏡
の本体に取付けられたウオーム6と噛合うようになって
いる。このウオームは本体外から回わすことができ、そ
れによって検出器ホルダ4を試料ホルダ3の周囲で回転
させることができる。検出器ホルダ4を回わせば検出器
5が試料2の周囲を移動することになる。Embodiment FIGS. 2 and 3 show an embodiment of the present invention. 1 in Figure 2
2 is an objective lens of a scanning electron microscope, 2 is a sample, and 3 is a sample holder. An annular detector holder 4 is rotatably fitted around the outer periphery of the sample holder 3. This detector holder 4 has a portion 41 that protrudes upward at one location, and a semiconductor electronic detector 5 is attached to the inner surface of this portion. A gear 42 is cut on the outer periphery of the detector holder 4 and is adapted to mesh with a worm 6 attached to the main body of the scanning electron microscope. This worm can be turned from outside the main body, thereby allowing the detector holder 4 to rotate around the sample holder 3. By rotating the detector holder 4, the detector 5 moves around the sample 2.
試料ホルダ3は走査型電子顕微鏡本体内の試料微動装置
に着脱自在に取付けられる。この取付けは試料ホルダ3
の下面の突出部3]、を試料微動装置の試料台7上の溝
に滑り適寸せることによって行われる。この操作は、走
査型電子顕微鏡本体の側面に設けられた予備排気室内に
挿入された試料ホルダを真空外からの操作で走査型電子
顕微鏡本体内に送入し試料台7上にセットする。検出器
ホルダ4は予め試料ホルダ3に嵌着してあり、試料ホル
ダ3を矢印方向に試料台7上に滑シ込ませることによっ
て外周の歯車42とウオーム6とが自動的に噛合う。試
料ホルダ3は下面の突部31が試料台7上の溝に係合し
ているので、検出器ホルダ4を回軸させても、試料ホル
ダ3が回転するようなことはない。The sample holder 3 is detachably attached to a sample fine movement device within the main body of the scanning electron microscope. This installation is done on sample holder 3.
This is done by sliding the protrusion 3 on the lower surface of the sample slider into the groove on the sample stage 7 of the sample fine movement device to an appropriate size. In this operation, a sample holder inserted into a preliminary evacuation chamber provided on the side surface of the scanning electron microscope body is moved into the scanning electron microscope body from outside the vacuum and set on the sample stage 7. The detector holder 4 is fitted onto the sample holder 3 in advance, and by sliding the sample holder 3 onto the sample stage 7 in the direction of the arrow, the gear 42 on the outer periphery and the worm 6 automatically mesh. Since the protrusion 31 on the lower surface of the sample holder 3 engages with the groove on the sample stage 7, the sample holder 3 will not rotate even if the detector holder 4 is rotated.
第4図は本発明の他の実施例を示す。この実施例では試
料ホルダ3の周囲に円周状に固定的に電子検出器5を配
置したもので、電子検出器5は8個に分割されており、
相隣る任意の2個の電子検出器の出力の和を取出せるよ
うにしたものである。FIG. 4 shows another embodiment of the invention. In this embodiment, the electron detector 5 is fixedly arranged in a circumferential manner around the sample holder 3, and the electron detector 5 is divided into eight pieces.
This allows the sum of the outputs of any two adjacent electron detectors to be calculated.
(へ)効 果
本発明走査電子顕微鏡は上述したような構成で、簡単な
構造で任意に照明方向を変えた試料面の像を見ることが
でき、試料面の立体的な形状について豊富なデータを得
ることができる。(F) Effects The scanning electron microscope of the present invention has the above-mentioned configuration, has a simple structure, can view images of the sample surface by changing the illumination direction arbitrarily, and can provide abundant data on the three-dimensional shape of the sample surface. can be obtained.
第1図A、Bは試料面と照射電子ビームとの関係を示す
図、第2図は本発明の一実施例の要部縦断側面図、第3
図は同実施例の要部平面図、第4図は本発明の他の実施
例の要部平面図である。
2・・・試料、ト・・試料ホルダ、4・・・検出器ホル
ダ、5・・・電子検出器、6・・・ウオーム、7・・・
試料台。
代理人 弁理士 縣 浩 介口
(I5)1A and 1B are diagrams showing the relationship between the sample surface and the irradiated electron beam, FIG.
This figure is a plan view of the main part of the same embodiment, and FIG. 4 is a plan view of the main part of another embodiment of the present invention. 2... Sample, G... Sample holder, 4... Detector holder, 5... Electronic detector, 6... Worm, 7...
Sample stand. Agent: Patent Attorney Hiroshi Agata (I5)
Claims (1)
試料の周囲に円周に治って固定的に複数個の電子検出器
を設けてその中の任意の電子検出器を選択可能とするこ
とによって、試料の周囲任意の方向に電子検出器を配置
できるようにしたことを特徴とする走査型電子顕微鏡。One electron detector can be rotatably provided around the sample, or a plurality of fixed electron detectors can be provided circumferentially around the sample, and any one of them can be selected. A scanning electron microscope characterized in that an electron detector can be placed in any direction around a sample.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7667283A JPS59201356A (en) | 1983-04-30 | 1983-04-30 | Scanning type electron microscope |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7667283A JPS59201356A (en) | 1983-04-30 | 1983-04-30 | Scanning type electron microscope |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS59201356A true JPS59201356A (en) | 1984-11-14 |
Family
ID=13611913
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7667283A Pending JPS59201356A (en) | 1983-04-30 | 1983-04-30 | Scanning type electron microscope |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59201356A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2010097861A1 (en) * | 2009-02-27 | 2010-09-02 | 株式会社 日立ハイテクノロジーズ | Charged particle beam device |
WO2012026291A1 (en) * | 2010-08-24 | 2012-03-01 | 株式会社 日立ハイテクノロジーズ | Charged particle beam device and sample observation method |
WO2015118605A1 (en) * | 2014-02-04 | 2015-08-13 | 富士通株式会社 | Material evaluation device and method |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5818851A (en) * | 1981-07-24 | 1983-02-03 | Hitachi Ltd | Reflected-electron detecting device |
-
1983
- 1983-04-30 JP JP7667283A patent/JPS59201356A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5818851A (en) * | 1981-07-24 | 1983-02-03 | Hitachi Ltd | Reflected-electron detecting device |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2010097861A1 (en) * | 2009-02-27 | 2010-09-02 | 株式会社 日立ハイテクノロジーズ | Charged particle beam device |
JP2010199002A (en) * | 2009-02-27 | 2010-09-09 | Hitachi High-Technologies Corp | Charged particle beam device |
US8610060B2 (en) | 2009-02-27 | 2013-12-17 | Hitachi High-Technologies Corporation | Charged particle beam device |
WO2012026291A1 (en) * | 2010-08-24 | 2012-03-01 | 株式会社 日立ハイテクノロジーズ | Charged particle beam device and sample observation method |
JP2012048819A (en) * | 2010-08-24 | 2012-03-08 | Hitachi High-Technologies Corp | Charged particle beam device and sample observation method |
EP2610891A1 (en) * | 2010-08-24 | 2013-07-03 | Hitachi High-Technologies Corporation | Charged particle beam device and sample observation method |
US8791413B2 (en) | 2010-08-24 | 2014-07-29 | Hitachi High-Technologies Corporation | Charged particle beam device and sample observation method using a rotating detector |
EP2610891A4 (en) * | 2010-08-24 | 2015-01-14 | Hitachi High Tech Corp | Charged particle beam device and sample observation method |
WO2015118605A1 (en) * | 2014-02-04 | 2015-08-13 | 富士通株式会社 | Material evaluation device and method |
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