JPS59184792A - Vapor phase synthesis of diamond - Google Patents
Vapor phase synthesis of diamondInfo
- Publication number
- JPS59184792A JPS59184792A JP58057044A JP5704483A JPS59184792A JP S59184792 A JPS59184792 A JP S59184792A JP 58057044 A JP58057044 A JP 58057044A JP 5704483 A JP5704483 A JP 5704483A JP S59184792 A JPS59184792 A JP S59184792A
- Authority
- JP
- Japan
- Prior art keywords
- diamond
- filament
- coated
- temp
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/04—Diamond
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Polishing Bodies And Polishing Tools (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
Description
【発明の詳細な説明】
この発明は、気相合成法にてダイヤモンドを粒状あるい
は膜状に析出せしめる方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method of depositing diamond in the form of grains or films using a vapor phase synthesis method.
ダイヤモンドは、現存する物質の中で最も硬く、かつ熱
伝導性および電気絶縁性にもすぐれた′vJ相であるこ
とから、工業的に有用な材料として、その使用分野は広
範囲にわたっている。Diamond is the hardest of all existing substances and is in the 'vJ phase with excellent thermal conductivity and electrical insulation, so it is used in a wide range of fields as an industrially useful material.
また、ダイヤモンドには、天然に産出するもののほかに
、超高圧合成装置を用い、超高圧発生容器内に黒鉛粉末
を触媒と共に入れ、温度二1600℃以上、圧力 60
kb以上の高温高圧下で反応させ、黒鉛をダイヤモンド
に相変態させることによって製造された人工ダイヤモン
ドがある。この人工ダイヤモンドは、原料粉末の粒度や
反応時間を制御することにより種々の粒度のものが得ら
れるが、装置自体が大型となるばかりでなく、1回の生
産量にも限界があるため、生産性の点て問題が、l、ど
うしてもコスト高となるのをまぬがれることができない
。このほか、ダイヤモンドの合成法には、火薬の爆発に
よる衝撃力を利用して、黒鉛をダイヤモンドに変換する
方法があるが、この方法によって製造された人工ダイヤ
モンドは、前記の超高圧合成法によ!ll製造されたも
のに比して多少安価ではあるが、結晶性が完全なものを
得ることが困難であり、したがって特性上問題があるも
のである。In addition to naturally occurring diamonds, we also use ultra-high pressure synthesis equipment to produce diamonds. Graphite powder is placed together with a catalyst in an ultra-high pressure generating container, and diamonds are produced at a temperature of 21,600°C or higher and a pressure of 60°C.
There is an artificial diamond produced by causing graphite to undergo phase transformation into diamond by reacting at high temperatures and pressures of kB or higher. This artificial diamond can be obtained in various particle sizes by controlling the particle size of the raw material powder and the reaction time, but not only does the equipment itself become large, but there is also a limit to the amount of production at one time. In terms of performance, there is no way to avoid high costs. Another method for synthesizing diamonds is to convert graphite into diamond by using the impact force from the explosion of gunpowder, but the artificial diamonds produced by this method are not produced by the ultra-high pressure synthesis method mentioned above. ! Although it is somewhat cheaper than those manufactured by Il, it is difficult to obtain one with perfect crystallinity, and therefore there are problems in terms of characteristics.
そこで、本発明者等は、上述のような観点から、大型の
プレス装置などを用いることなく、かつ結晶性の完全な
人工ダイヤモンドを高い生産性で、コスト安く製造すべ
く研究を行なった結果、ダイヤモンドが析出される基体
として、鉄族金属、サーメット、あるいはセラミックか
らなる基体部材の表面に、WまたはNl)からなる被覆
層を形成してなる表面被覆部材を用い、気相合成法にて
、前記表面被層部材の表面から05〜3 Cnl離れた
位置に、W 、 Ta、 Mo、あるいは黒鉛からなる
フィラメントを位置させた状態で、CH4とH2との容
量割合、すなわちCH4/H2を0.001〜005に
調整した混合反応ガスを前記フィラメントヲ通過して前
記表面被覆部材の表面に自るように流しながら、表面被
覆部材の表面温度°500〜1200℃、およびフィラ
メントの温度 1800〜2500℃の条件で反応を行
なわしめると、前記表面被覆部材の表面に、結晶性が完
全なダイヤモンドが粒状あるいは膜状に形成されるよう
に在るという知見を得たのである。Therefore, from the above-mentioned viewpoint, the present inventors conducted research in order to manufacture perfectly crystalline artificial diamonds with high productivity and at low cost without using large press equipment, etc. As a result, Using a surface coating member formed by forming a coating layer made of W or Nl on the surface of a base member made of iron group metal, cermet, or ceramic as a substrate on which diamond is deposited, using a vapor phase synthesis method, With a filament made of W, Ta, Mo, or graphite positioned at a distance of 05 to 3 Cnl from the surface of the surface coating member, the capacitance ratio of CH4 and H2, that is, CH4/H2, was set to 0. While the mixed reaction gas adjusted to 001 to 005 passes through the filament and flows automatically onto the surface of the surface coating member, the surface temperature of the surface coating member is 500 to 1200°C, and the temperature of the filament is 1800 to 2500°C. They found that when the reaction was carried out under these conditions, perfectly crystalline diamond was present on the surface of the surface coating member in the form of grains or films.
なお、この発明の方法において、上記の表面被覆部材の
表面とフィラメントとの距離が05〜30の範囲内にお
いて比較的小さい場合に、ダイヤモンドの析出核の密度
が高くなり、この析出核が横に密に並ぶため膜状となり
、一方前記の肉11間距離が大きくなると粒状となるの
である。寸だ、上記の被覆層は、ダイヤモンド核を多く
析出させるのに不可欠のものであり、したがって、との
被段層が存在しない場合には、ダイヤモンドの析出はき
わめて少ガく、所望のダイヤモンド核の析出、およびそ
の成長をはかることはできないものである。In addition, in the method of the present invention, when the distance between the surface of the surface coating member and the filament is relatively small within the range of 0.5 to 30 mm, the density of diamond precipitation nuclei becomes high, and the precipitation nuclei are spread horizontally. Because they are arranged densely, they become film-like, and on the other hand, when the distance between the meats 11 increases, they become granular. The above-mentioned coating layer is essential for precipitating a large number of diamond nuclei. Therefore, if there is no coating layer, the precipitation of diamond will be extremely small and the desired diamond nuclei will not be formed. It is impossible to measure the precipitation and growth of .
つぎに、この発明の方法において、製造条件を」−記の
通りに限定した理由を説明する。Next, in the method of the present invention, the reason why the manufacturing conditions are limited to the following will be explained.
+a+ フィラメントの温度
フィラメントはメタン(CH4) k分解すると同時に
、この結果形成されたC 、!−H2とを活性化し、ダ
イヤモンド形成に害鳥するものと考えられるが、その温
度が1800℃未満では反応ガスの活性化が十分に行な
われず、一方その温度が25oo℃を越えると熱輻射が
犬きくなシすぎ、いずれの場合もダイヤモンドの形成が
不十分となることがら、フィラメント温度t1800〜
2500Cと定めた。The temperature of the +a+ filament causes the filament to decompose methane (CH4) and at the same time the resulting C,! - H2 is thought to be harmful to diamond formation, but if the temperature is less than 1800°C, the activation of the reaction gas will not be sufficient, while if the temperature exceeds 250°C, thermal radiation will be harmful. If the filament temperature is too high, diamond formation will be insufficient in either case.
It was set at 2500C.
(1)) 表面被覆部材の表面温度
この表面温度は、フィラメントからの輻射熱と部材自体
の加熱温度にょp決まるが、この表面温度が500℃未
満てはダイヤモンドの析出速度が遅く、一方1200’
Ci越えた表面温度ではダイヤモンドの析出が行なわれ
ないことがら、その表面温度を500〜120 (l
Cと定めた。(1)) Surface temperature of the surface-coated member This surface temperature is determined by the radiant heat from the filament and the heating temperature of the member itself, but if the surface temperature is less than 500°C, the precipitation rate of diamond will be slow;
Since diamond does not precipitate at a surface temperature exceeding Ci, the surface temperature is set at 500 to 120 (l
It was set as C.
(C) 混合反応ガスにおけるCH4/H2の割合こ
の割合がo、oo1未満では、ダイヤモンドの生成速度
が著しく遅く、一方この割合が0.05を越えると、ダ
イヤモンド中に黒鉛が混在するようになることから、C
H4/H2ノ割合k 0.001−0.05と定めた。(C) Ratio of CH4/H2 in the mixed reaction gas If this ratio is less than o or oo1, the rate of diamond formation is extremely slow, while if this ratio exceeds 0.05, graphite will be mixed in the diamond. Therefore, C
The H4/H2 ratio k was set at 0.001-0.05.
(d) 表面被覆部材の表面とフィラメント間の距離
この距離が0.5 on未満になると、フィラメントの
輻射熱により部材の表面温度が1200’Ct越えて高
くな9すぎ、ダイヤモンドの析出が行なわれないように
な9、一方この距離が3 an f越えて大きくなると
、ダイヤモンド核の形成密度が急激に低下するようにな
ることから、その距離f 0.5〜3cmと定めた。(d) Distance between the surface of the surface-coated member and the filament If this distance is less than 0.5 on, the surface temperature of the member will exceed 1200'Ct due to the radiant heat of the filament9, and diamond precipitation will not occur. 9. On the other hand, if this distance becomes larger than 3 an f, the density of diamond nucleus formation decreases rapidly, so the distance f was determined to be 0.5 to 3 cm.
また、この発明の方法を実施するに際して、反応雰囲気
は、5〜I Q Otorrの範囲内の圧力の真空雰囲
気とするのが好ましく、これは5 torr未/111
11の圧力ではダイヤモンドの析出速度がきわめてRく
、一方100 torrを越えた圧力にすると黒鉛が混
在するようになるという理由によるものである。Further, when carrying out the method of the present invention, the reaction atmosphere is preferably a vacuum atmosphere with a pressure within the range of 5 to IQ Otorr, which is less than 5 torr/111
This is because at a pressure of 11 Torr, the precipitation rate of diamond is extremely high, while at a pressure exceeding 100 Torr, graphite becomes mixed.
さらに、上記の被覆層は、基体部材(で応じて、通常の
化学蒸着法、物理蒸着法、および溶射法などの方法を用
いて形成することができる。Furthermore, the above-mentioned coating layer can be formed using a conventional method such as a chemical vapor deposition method, a physical vapor deposition method, or a thermal spraying method depending on the base member.
なお、との発明の方法によって合成されたダイヤモンド
は、不可避不純物としてフィラメント構成成分であるW
、Ivlo、あるいはTaなどを1〜10原子係の範囲
で含有する場合があるが、この程度の不純物含有量はダ
イヤモンド特性に何らの悪影響も及ぼすものではない。In addition, the diamond synthesized by the method of the invention contains W, which is a filament constituent, as an unavoidable impurity.
, Ivlo, Ta, etc. may be contained in the range of 1 to 10 atoms, but this level of impurity content does not have any adverse effect on the properties of diamond.
つきに、この発明の方法を実施例により具体的に説明す
る。At the same time, the method of the present invention will be specifically explained with reference to Examples.
実施例
それぞれ第1表に示される成分組成を有し、かつ10m
m’X厚さ 2 ramの寸法をもった基体部材を用意
し、この基体部材の表面に、同じく第1表に示される被
覆層形成法、すなわち化学蒸着法(CVDで示す)、物
理蒸着法の1種であるマグネトロンスパッタリング法(
pVD−MSで示す)、およびプラズマ溶射法(psで
示す)のいずれかを用い、通常の条件で同じく第1表に
示される材質および平均層厚の被覆層を形成し、ついで
、このようにして調製した表面被覆部材の表面に、同じ
く第1表に示される条件で、ダイヤモンド形成のための
気相合成反応を施すことによって、本発明法1〜7およ
び比較法1〜7をそれぞれ実施し、実施後、その表面に
形成された合成ダイヤモンドの平均層厚を測定すると共
に、その状態を観察した。これらの結果を第1表に合せ
て示した。Each of the examples had the component composition shown in Table 1, and 10 m
A base member having dimensions of m' x thickness 2 ram is prepared, and a coating layer forming method shown in Table 1 is applied to the surface of this base member, that is, a chemical vapor deposition method (indicated by CVD), a physical vapor deposition method. Magnetron sputtering method (
Using either pVD-MS (indicated by pVD-MS) or plasma spraying method (indicated by ps), a coating layer of the material and average layer thickness shown in Table 1 is formed under normal conditions, and then the coating layer is formed in this manner. Methods 1 to 7 of the present invention and comparative methods 1 to 7 were carried out by subjecting the surface of the surface-coated member prepared in the same manner to a gas phase synthesis reaction for diamond formation under the conditions shown in Table 1. After the experiment, the average layer thickness of the synthetic diamond formed on the surface was measured and its condition was observed. These results are also shown in Table 1.
なお、比較法1〜7は、いずれもダイヤモンド形成のだ
めの気相合成条件がこの発明の範囲から外れた条件(第
1表に※印を伺した条件がこの発明の範囲から外れた条
件である)で実施したものである。In addition, Comparative Methods 1 to 7 all involve conditions in which the vapor phase synthesis conditions for diamond formation are outside the scope of this invention (the conditions marked with * in Table 1 are conditions outside the scope of this invention). ).
第1表に示される結果から、本発明法1〜7においては
、いずれも良好々状態でダイヤモントヲ合成されるのに
対して、比較法1〜7においては、いずれの場合も満足
するダイヤモンド合成は行なわれないことが明らかであ
る。From the results shown in Table 1, diamonds were synthesized in good condition in all methods 1 to 7 of the present invention, whereas diamonds were synthesized satisfactorily in all cases in comparative methods 1 to 7. It is clear that this will not be done.
々お、本発明法1〜7によって合成されたダイヤモンド
は、いずれも天然ダイヤモンドと同等の硬さと電気抵抗
を示すものであった。All of the diamonds synthesized by Methods 1 to 7 of the present invention exhibited hardness and electrical resistance equivalent to those of natural diamond.
上述のように、この発明の方法によれば、大型の装置を
用いることなく、かつ生産性の高い状態で、結晶性の完
全な人工ダイヤモンドを、表面被覆部拐の表面に粒状あ
るいは膜状の形で合成することができ、したがって、ダ
イヤモンドヲ粒状に合成した場合には、これ全部材表面
から機械的にかき落して粉末状とし、砥石や研摩材、あ
るいは粉末冶金用原料粉末などとして用いることができ
、また、膜状に形成する場合には、基体部材を、耐摩耗
性や耐候性が要求される各種の工具部材、あるいは熱伝
導性や電気絶縁性が要求される工CやLSIなどとして
もよく、さらに絶縁膜や、B。As described above, according to the method of the present invention, completely crystalline artificial diamond can be coated with grains or films on the surface of the surface coating part without using large-scale equipment and with high productivity. Therefore, when diamond is synthesized in the form of granules, it can be mechanically scraped off from the surface of the material to form a powder and used as a grindstone, abrasive, or raw material powder for powder metallurgy. In addition, when forming a film, the base member can be used for various tool parts that require wear resistance and weather resistance, or for engineering C or LSI that require thermal conductivity and electrical insulation. It may also be used as an insulating film or B.
P、およびMなどの成分とのドープと合せて半導体膜な
どとしての用途にも適用することができるなど工業上有
用な効果がもたらされるのである。In combination with doping with components such as P and M, it brings about industrially useful effects such as being able to be applied to applications such as semiconductor films.
出願人 三菱金属株式会社
代理人 富 1)和 夫 外1名
手続補正占(自利
昭和58年9月2目
特許庁長官 若 杉 和 夫 殿
1、事件の表示
特願昭58−57044 号
2 発明の名称
ダイヤモンドの気相合成法
3、補正をする者
事件との関係 特許出願人
住所 東原都千代田区大手町−丁f]5番2号氏名
(名称H626J三菱金属株式会社代表者 水
野 健
4代 理 人
5 拒絶理由通知の日付
自 発
(1) 明細書、第6頁、発明の詳細な説明の項、第
15行、
「5〜100torrの範囲内の圧力」とあるを、「ピ
ラニ一式真空計で5〜100 torrの範囲内の圧力
(この圧力はダイヤフラム式真空計で測定した場合のO
1〜10torrに相当、以下圧力はピラニ一式真空計
で測定した圧力で示す)」と訂正する。Applicant Mitsubishi Metals Co., Ltd. Agent Tomi 1) Kazuo Kazuo and 1 other person amended proceedings (Jiri Kazuo Wakasugi, Commissioner of the Japan Patent Office, September 2, 1980 1, Patent Application No. 57044, 1982, Patent Application No. 2) Name of the invention: Diamond vapor phase synthesis method 3; Relationship with the case of the person making the amendment Patent applicant address: No. 5-2, Otemachi-cho, Chiyoda-ku, Higashihara City Name
(Name H626J Mitsubishi Metals Co., Ltd. Representative Water
Ken No 4 Agent 5 Date of notice of reasons for refusal Voluntary statement (1) Description, page 6, detailed description of the invention, line 15, "pressure within the range of 5 to 100 torr""Pressure within the range of 5 to 100 torr with a Pirani vacuum gauge (this pressure is the O when measured with a diaphragm vacuum gauge)
Corresponds to 1 to 10 torr (hereinafter the pressure is shown as the pressure measured with a Pirani vacuum gauge)" (corrected).
以上that's all
Claims (1)
体部4′;Aの表面に、w’lたはNl)からなる被晋
層を形成してなる表面被覆部材を反応炉に装入し、前記
表面被覆部材の表面と、W 、 Ta、 Mo、あるい
は黒鉛からなるフィラメントとの間隔ヲ0.5〜30に
保持した状態で、OH4/H2の割合−tO,001〜
005の範囲内に調整した混合反応ガスを反応炉内に流
しながら、表面被覆部材の表面温度:500〜1200
℃、およびフィラメント温度−1800〜2500℃の
条件で気相合成反応を行なわしめることにより前記表面
皺覆部材の表面にダイヤモンドを粒状あるいは膜状に析
出せしめることを特徴とするダイヤモンドの気相合成法
。A surface coating member in which a coated layer of w'l or Nl) is formed on the surface of the base portion 4';A made of iron group metal, cermet, or ceramic is charged into a reactor, and the surface While maintaining the distance between the surface of the coating member and the filament made of W, Ta, Mo, or graphite at 0.5 to 30, the ratio of OH4/H2 is -tO,001 to
While flowing the mixed reaction gas adjusted within the range of 0.005 into the reactor, the surface temperature of the surface coating member: 500 to 1200.
℃, and a filament temperature of -1800 to 2500℃, thereby depositing diamond in the form of granules or film on the surface of the surface wrinkle covering member. .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58057044A JPS59184792A (en) | 1983-04-01 | 1983-04-01 | Vapor phase synthesis of diamond |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58057044A JPS59184792A (en) | 1983-04-01 | 1983-04-01 | Vapor phase synthesis of diamond |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59184792A true JPS59184792A (en) | 1984-10-20 |
| JPS6344719B2 JPS6344719B2 (en) | 1988-09-06 |
Family
ID=13044443
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58057044A Granted JPS59184792A (en) | 1983-04-01 | 1983-04-01 | Vapor phase synthesis of diamond |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59184792A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62283898A (en) * | 1986-05-31 | 1987-12-09 | Fujitsu Ltd | Production of fine diamond particle |
| JPS63237870A (en) * | 1987-03-26 | 1988-10-04 | Goei Seisakusho:Kk | Diamond coated grinding wheel |
-
1983
- 1983-04-01 JP JP58057044A patent/JPS59184792A/en active Granted
Non-Patent Citations (2)
| Title |
|---|
| JOURMAL OF MATERIALS SCIENCE * |
| JOURNAL OF CRYSTAL GROWTH * |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62283898A (en) * | 1986-05-31 | 1987-12-09 | Fujitsu Ltd | Production of fine diamond particle |
| JPS63237870A (en) * | 1987-03-26 | 1988-10-04 | Goei Seisakusho:Kk | Diamond coated grinding wheel |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6344719B2 (en) | 1988-09-06 |
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