JPS59177938U - Electron beam exposure equipment - Google Patents
Electron beam exposure equipmentInfo
- Publication number
- JPS59177938U JPS59177938U JP5396184U JP5396184U JPS59177938U JP S59177938 U JPS59177938 U JP S59177938U JP 5396184 U JP5396184 U JP 5396184U JP 5396184 U JP5396184 U JP 5396184U JP S59177938 U JPS59177938 U JP S59177938U
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- beam exposure
- exposure equipment
- exposure
- sample
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electron Beam Exposure (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Abstract] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
図は本考案の一実施例を示す概略構成図である。
１・・・電子ビーム露光装置、５・・・試料室、７・・
・試 □料台、８・・・試料、９・・・Ｂｅ箔（コ
ーティング）。The figure is a schematic configuration diagram showing an embodiment of the present invention. 1... Electron beam exposure device, 5... Sample chamber, 7...
・Sample □Sample stand, 8...Sample, 9...Be foil (coating).
Claims (1)
れた電子ビームを照射し、上記試料を露光する電子ビー
ム露光装置において、前記露光室の少くとも前記設置さ
れた試料の露光面に対向する面を、Ｂｅでコーティング
したことを特徴とする電子ビーム露光装置。In an electron beam exposure apparatus that exposes a sample placed in an exposure chamber by irradiating an electron beam generated by an electron beam generation source to the sample, an electron beam exposure device that faces at least the exposure surface of the installed sample in the exposure chamber An electron beam exposure device characterized in that a surface thereof is coated with Be.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5396184U JPS59177938U (en) | 1984-04-12 | 1984-04-12 | Electron beam exposure equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5396184U JPS59177938U (en) | 1984-04-12 | 1984-04-12 | Electron beam exposure equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS59177938U true JPS59177938U (en) | 1984-11-28 |
Family
ID=30184310
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5396184U Pending JPS59177938U (en) | 1984-04-12 | 1984-04-12 | Electron beam exposure equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59177938U (en) |
-
1984
- 1984-04-12 JP JP5396184U patent/JPS59177938U/en active Pending
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