JPS59177371A - Vacuum deposition device - Google Patents

Vacuum deposition device

Info

Publication number
JPS59177371A
JPS59177371A JP5159683A JP5159683A JPS59177371A JP S59177371 A JPS59177371 A JP S59177371A JP 5159683 A JP5159683 A JP 5159683A JP 5159683 A JP5159683 A JP 5159683A JP S59177371 A JPS59177371 A JP S59177371A
Authority
JP
Japan
Prior art keywords
furnace
metal
pan
furnaces
pipes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5159683A
Other languages
Japanese (ja)
Inventor
Kenichi Yanagi
謙一 柳
Toshio Taguchi
田口 俊夫
Tetsuyoshi Wada
哲義 和田
Heizaburo Furukawa
古川 平三郎
Kanji Wake
和気 完治
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Heavy Industries Ltd
Nippon Steel Nisshin Co Ltd
Original Assignee
Mitsubishi Heavy Industries Ltd
Nisshin Steel Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Heavy Industries Ltd, Nisshin Steel Co Ltd filed Critical Mitsubishi Heavy Industries Ltd
Priority to JP5159683A priority Critical patent/JPS59177371A/en
Publication of JPS59177371A publication Critical patent/JPS59177371A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/246Replenishment of source material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To prevent the clogging in lifting pipes during operation by a simple method in a device which conducts the molten metal in a melting furnace in the atm. air through the lifting pipes into the evaporation pan in a vacuum deposition vessel by using the plural melting furnaces and providing means for lifting the furnaces to said furnaces. CONSTITUTION:The molten metals 21 in melting furnaces 19, 20 are sucked under vacuum through lifting pipes 17, 18 into the evaporation pan 13 in a vacuum vessel 12 where a material 11 to be plated travels. Said metal is heated by a heater 16 to evaporate and is plated by vacuum deposition on the surface of the steel strip 11. Lifters 22 are operated during this operation to move vertically the furnaces 19. When the furnace 19 is moved upward, the level of the metal 21 in the pan 13 rises as the pressure difference is constant, then the difference in the level in the pan 13 and the level of the metal 21 in the furnace 20 is made larger than the difference in the stationary stage, by which the metal 21 is admitted from the pan 13 into the furnace 20. When the furnace 19 is conversely lowered, the metal 21 moves through the pan 13 to the furnace 19. Stagnation of dross 24 in each part in the pipes 17, 18 is thus obviated and the clogging in the pipes 17, 18 is prevented.

Description

【発明の詳細な説明】 本発明は、銅帯等(一連続的にZn、At等の金属めっ
き皮膜を真空蒸着させる真空蒸着装置に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a vacuum evaporation apparatus for continuously vacuum evaporating a metal plating film such as Zn or At on a copper strip or the like.

従来この種の真空蒸着装置は、第11Jに示すように銅
帯Iが走行する真空槽2内に蒸着銅3を配置し、かつ大
気中Cユ溶解炉4を配置し、この溶解炉4と蒸発鍋3と
を吸上管5で連通している。上記蒸発鍋3は、上部に蒸
発口6を開口し、内面に保温材7を張り゛付け、内部に
加熱ヒータ8を設置している。
Conventionally, this type of vacuum evaporation apparatus has a vacuum vapor deposition apparatus in which vapor-deposited copper 3 is disposed in a vacuum chamber 2 in which a copper strip I runs as shown in No. 11J, and an atmospheric C melting furnace 4 is disposed, and this melting furnace 4 and It communicates with the evaporating pot 3 through a suction pipe 5. The evaporating pot 3 has an evaporating port 6 opened at the top, a heat insulating material 7 pasted on the inner surface, and a heater 8 installed inside.

この真空蒸着装置は、溶解炉4円のめっき材である溶融
全屈9を真空吸引して、吸上ゾ〆5から蒸発鍋3に導き
、加熱ヒータ8で加熱して溶融金属9を蒸発させ、鋼帯
Iに連続的ζ−めっきする。
This vacuum evaporation device vacuum-suctions the molten metal 9, which is a plating material, in the melting furnace 4, guides it from the suction tank 5 to the evaporation pan 3, and heats it with a heater 8 to evaporate the molten metal 9. , continuous ζ-plating on steel strip I.

しかしこの真空蒸着装置は、スタートアップ時(二溶解
炉4から蒸発鍋3内(二大蛍の溶融金属9が吸上げられ
る。このため溶解炉4の庇部にあるドロスIOC溶融金
属と溶解炉壁材との化合物)が一部浮遊して溶融金M 
9とともに吸上管5円に吸上げられるおそれがある。
However, in this vacuum evaporation apparatus, at startup (the molten metal 9 of the two major fireflies is sucked up from the two melting furnaces 4 to the evaporation pot 3), the dross IOC molten metal in the eaves of the melting furnace 4 and the melting furnace wall Some of the compounds (compounds with metal) float and form molten gold M.
There is a risk that it will be sucked up into the suction pipe 5 yen along with 9.

−万、吸上管5内の溶融金属9は流速が小さい。例えば
1容融金属9がZnの場合、Zn消゛d! 800 K
F、/ h 、吸引管直径100mとすると。
- 10,000, the flow velocity of the molten metal 9 in the suction pipe 5 is low. For example, when the molten metal 9 is Zn, Zn disappears d! 800K
F,/h, and the diameter of the suction tube is 100 m.

吸上管5内のZn平均流速は4 mm 、/ seeと
小さく。
The average flow velocity of Zn in the suction pipe 5 is as small as 4 mm/see.

また流れか層流であるため、吸引管内壁近イ帝ではさら
に流速が小さくなる。
Also, since the flow is laminar, the flow velocity becomes even smaller near the inner wall of the suction tube.

従って一旦吸上げられたドロスIOは、押し流されずに
長時間吸上管5のベント部5aや蒸発鍋3との接合部5
b付近などに滞留する。吸上管5の内壁にも多少ドロス
が生成しており、その付近にドロスが滞留していると、
ドロスIθがひっかかったり、成長−して吸上管5を閉
塞させる。ドロスIOで閉塞した箇所は、一般(−扁温
でも容易に再融解せず、復旧が困難である。このため従
来は、吸上管5が閉塞すると、蒸発鍋3′、吸上管5と
も新品と変換しなければならなかった。
Therefore, the dross IO once sucked up remains at the vent part 5a of the suction pipe 5 and the joint part 5 with the evaporating pot 3 for a long time without being washed away.
It stays near b. Some dross is also generated on the inner wall of the suction pipe 5, and if the dross is accumulated in the vicinity,
The dross Iθ gets stuck or grows and blocks the suction pipe 5. In general, areas blocked by dross IO do not easily re-melt even at low temperatures, making recovery difficult.For this reason, conventionally, when the suction pipe 5 is blocked, both the evaporating pot 3' and the suction pipe 5 Had to convert it to a new one.

本発明は、上記事情に鑑みてなされたもので、その目的
とするところは、運転中の吸上管の閉塞を簡単な方法で
防止すること′力(できる真空蒸着装置を得んとするも
のである。
The present invention has been made in view of the above circumstances, and an object thereof is to provide a vacuum evaporation apparatus that can easily prevent clogging of a suction pipe during operation. It is.

すなわち本発明は、被めっき材が走行する真空槽内に被
めっき材蒸着用蒸発鍋を設け、又大気中に也数の溶解炉
を設けて、各溶解炉中の溶融金属(めっき材)を吸上管
を介して蒸発鍋に導く際(−1少なくとも1つの溶解炉
に溶解炉上下動平膜を取付けて、運転中に溶解炉2上下
させ、もって吸上管内の溶融金属を常時流動させること
を特牧とする。
That is, the present invention provides an evaporation pot for depositing the material to be plated in a vacuum tank in which the material to be plated runs, and also provides a number of melting furnaces in the atmosphere to melt the molten metal (plating material) in each melting furnace. When guiding the metal to the evaporation pot via the suction pipe (-1) Attach a melting furnace vertically moving flat membrane to at least one melting furnace, and move the melting furnace 2 up and down during operation, thereby making the molten metal in the suction pipe constantly flow. This is a special topic.

以下本発明を図示する実施例を%照して説明する。第2
図は真空蒸着装j1\の41i洗略1.j’l’ m+
−である。この真空蒸石装置は、被めつさ材である4H
,j帯IIが定行する真空槽I2内(−蒸発i・I4 
r aン配設している。この蒸発鍋I3は、上部j” 
迂j’! ’1HIIに対向して蒸発ロI4ン設け、内
面に保温材I5を張り付け、更に内部(−加熱ヒータ1
6を配置している。
The present invention will be described below with reference to embodiments illustrating the invention. Second
The figure shows 41i cleaning 1. of vacuum evaporation equipment j1\. j'l' m+
− is. This vacuum steam stone equipment uses 4H, which is the covering material.
, in the vacuum chamber I2 in which the j band II is running (-evaporation i, I4
It is installed in ra. This evaporating pot I3 is
Detour! '1 Provide an evaporator tube I4 opposite to the HII, paste a heat insulating material I5 on the inner surface, and further inside (-heater 1
6 is placed.

この蒸発鍋I3の底部には、2本の吸上管l7I8が按
6?され、各吸上管I7゜I8は雛解炉I9,2θ内に
開口している。各播屏炉l9t20は、それぞれ大気中
(−設置され、内部(二めっき材である溶融金属2Iが
入っている。行溶解炉19.20は、上下動手段である
リフター22.23上(二載りされている。
At the bottom of this evaporating pot I3, there are two suction pipes I7 and I8. Each of the suction pipes I7 and I8 opens into the pyrolysis furnace I9 and 2θ. Each of the melting furnaces 19 and 20 is installed in the atmosphere, and contains molten metal 2I, which is the second plating material. It is listed.

この真空蒸着装置は、溶解炉19 、2”0円の浴融金
属2Iン吸上管19.20ン弁して蒸発鍋I3に真空吸
引し、7Ia*小ヒータZ6で加メ、4′−蒸発させて
if1帯IIの表面に蒸着めっきする。
This vacuum evaporation apparatus consists of a melting furnace 19, a 2" 0 yen bath molten metal, a suction tube 19.20 valve to vacuum the evaporation pan I3, a 7Ia* small heater Z6 for heating, and a 4'- Evaporate and deposit on the surface of if1 zone II.

更にこの真空蒸着装置は、蒸着めっきの操業中Cユリフ
タ−22を操作して、溶解炉Z9を上下動させる。溶解
炉19を上方(−移動させると、圧力差が一定であるた
め蒸発鍋13同の溶融金属21(めっき材)のレベルが
上昇する。すると、蒸発鍋13内の溶融金属レベルと溶
解炉20の溶融金属レベルとの差が定常時より大きくな
り、蒸発鍋I3から溶解炉20へ溶融金属2Iが流入す
る。すなわち、溶解炉X9から溶解炉20へ溶融金属2
Zが移動する。また逆に溶解炉19を下げると、溶解炉
20から蒸発鍋I3を通って溶解炉Z!9に溶融金属2
Iが移動する。
Furthermore, this vacuum evaporation apparatus operates the C lifter 22 to move the melting furnace Z9 up and down during the operation of evaporation plating. When the melting furnace 19 is moved upward (-), the level of the molten metal 21 (plating material) in the evaporation pot 13 rises because the pressure difference is constant. The difference between the molten metal level of
Z moves. Conversely, when the melting furnace 19 is lowered, it passes from the melting furnace 20 through the evaporation pot I3 to the melting furnace Z! 9 to molten metal 2
I moves.

この場合浴融金属21の移動量は、溶融金属2Iの消費
址とは無関係であり、溶解炉I9の上下動の回数を増す
こと(−よって移動量を大きくできる。このため吸上管
17.18内の溶融金属流速を従来に比べて非常に大き
くすることができ、又部れの向きを逆転させることがで
きる。従って吸上管77 、 ’i8のベンド部xya
・1 B −a ”ン°接合FflS17 b 、 I
 8 b等にドロス24が滞留せず、吸上管Z7.1B
か閉塞するのを防止することができる。
In this case, the amount of movement of the bath molten metal 21 is independent of the consumption of the molten metal 2I, and the number of vertical movements of the melting furnace I9 can be increased (-therefore, the amount of movement can be increased. The flow rate of molten metal in the suction pipe 77 can be made much higher than in the past, and the direction of the part can be reversed.Therefore, the bend part xya of the suction pipe 77
・1 B-a”n° junction FflS17 b, I
8 Dross 24 does not accumulate in b etc., and suction pipe Z7.1B
or blockage can be prevented.

なお溶解炉及び吸上管は2個(−限らず3個以上でもよ
い。また1つの溶解炉に限らず他の溶解炉も上下動でさ
るようC−シてもよXl)。
Note that the number of melting furnaces and suction pipes is two (not limited to three, but may be three or more.Also, not only one melting furnace but also other melting furnaces can be moved up and down so that they can be moved up and down).

以上の如く本発明によれば、溶解炉を上下動させるとい
う簡単な方法で、吸上管の閉塞を防止することができる
顕著な効果を奏する。
As described above, according to the present invention, the simple method of moving the melting furnace up and down has the remarkable effect of preventing blockage of the suction pipe.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来の真空蒸着装置の概略断面図、第2図は本
発明の一実施例を示す真空蒸着装置の概略断面図である
。 II・・・銅帯(被めっき材)、I2・・・真空槽。 I3・・・蒸発鍋、I4・・・蒸発口、IS・・・保温
材、I6・・・加熱ヒータ、I’?、1B・・・吸上管
、19゜20・・・溶解炉、21・・・溶′i金属、2
2.23・・・リフター(上下動手段]24・・・ドロ
ス、173118m・・・ベンド部、11b、18b・
・・接合部。 出鵬人復代理人 弁理士 鈴 江 武 彦第1頁の続き 0発 明 者 和気完治 広島市西区観音新町四丁目6番 22号三菱重工業株式会社広島造 船所内 ■出 願 人 日新製鋼株式会社 東京都千代田区丸の内3丁目4 番1号 、−371−
FIG. 1 is a schematic sectional view of a conventional vacuum evaporation apparatus, and FIG. 2 is a schematic sectional view of a vacuum evaporation apparatus showing an embodiment of the present invention. II...Copper band (material to be plated), I2...Vacuum chamber. I3...evaporating pot, I4...evaporating port, IS...insulating material, I6...heater, I'? , 1B... Suction pipe, 19° 20... Melting furnace, 21... Molten metal, 2
2.23... Lifter (vertical movement means) 24... Dross, 173118m... Bend part, 11b, 18b.
・Joint part. Patent Attorney Takehiko Suzue Continued from page 1 0 Author Wake Kanji, 4-6-22 Kannon Shinmachi, Nishi-ku, Hiroshima City, Hiroshima Shipyard, Mitsubishi Heavy Industries, Ltd. Applicant Nisshin Steel Co., Ltd. Company 3-4-1 Marunouchi, Chiyoda-ku, Tokyo -371-

Claims (1)

【特許請求の範囲】[Claims] 被めっき材が走行する真空槽内に設けられた被めっき材
蒸着用蒸発鍋と、大気中に設けられた複数の溶解炉と、
同溶解炉中の溶融金属をそれぞれ上記蒸発鍋に導く複数
の吸上管と、少なくとも1つの溶解炉(ユ取付けた溶解
炉上下動手段とを具備したことを特徴とする真空蒸着装
置。
An evaporation pot for evaporating the plating material installed in a vacuum chamber in which the plating material travels, and a plurality of melting furnaces installed in the atmosphere.
A vacuum evaporation apparatus comprising: a plurality of suction pipes each guiding molten metal in the melting furnace to the evaporation pot; and at least one melting furnace (with a means for vertically moving the melting furnace attached to the melting furnace).
JP5159683A 1983-03-29 1983-03-29 Vacuum deposition device Pending JPS59177371A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5159683A JPS59177371A (en) 1983-03-29 1983-03-29 Vacuum deposition device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5159683A JPS59177371A (en) 1983-03-29 1983-03-29 Vacuum deposition device

Publications (1)

Publication Number Publication Date
JPS59177371A true JPS59177371A (en) 1984-10-08

Family

ID=12891286

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5159683A Pending JPS59177371A (en) 1983-03-29 1983-03-29 Vacuum deposition device

Country Status (1)

Country Link
JP (1) JPS59177371A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04135953U (en) * 1991-05-31 1992-12-17 日新製鋼株式会社 Molten metal supply equipment for vacuum deposition plating
EP1357200A1 (en) * 2002-04-25 2003-10-29 Eastman Kodak Company Thermal PVD apparatus with detachable vapor source(s)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04135953U (en) * 1991-05-31 1992-12-17 日新製鋼株式会社 Molten metal supply equipment for vacuum deposition plating
EP1357200A1 (en) * 2002-04-25 2003-10-29 Eastman Kodak Company Thermal PVD apparatus with detachable vapor source(s)

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