JPS59176639U - reactive liquid container - Google Patents

reactive liquid container

Info

Publication number
JPS59176639U
JPS59176639U JP7175783U JP7175783U JPS59176639U JP S59176639 U JPS59176639 U JP S59176639U JP 7175783 U JP7175783 U JP 7175783U JP 7175783 U JP7175783 U JP 7175783U JP S59176639 U JPS59176639 U JP S59176639U
Authority
JP
Japan
Prior art keywords
reactive liquid
liquid container
gas
container
gas inlet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7175783U
Other languages
Japanese (ja)
Inventor
撰梅　豊
Original Assignee
日本電信電話株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日本電信電話株式会社 filed Critical 日本電信電話株式会社
Priority to JP7175783U priority Critical patent/JPS59176639U/en
Publication of JPS59176639U publication Critical patent/JPS59176639U/en
Pending legal-status Critical Current

Links

Landscapes

  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Abstract] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第１図は本考案の反応性液体容器を使用した半導体製造
装置の１実施の態様を示す系統図、第２図及び第３図は
本考案の反応性液体容器の１実施の態様を示す概要図で
あって、第２図はその斜視図、第３図は縦断面概略図そ
して第４図は半導体製造装置の１実施の態様を示す系統
図である。 １：反応容器、３　ＨＧａＡｓ基板、５：ノズル、６゜
６′　：反応性液体容器、７．７’、　７１．７１′　
：恒温槽、８．　８’　　：キャリアガス配管、９゜９
′、９″　：キャリアガス導入管。FIG. 1 is a system diagram showing one embodiment of a semiconductor manufacturing apparatus using the reactive liquid container of the present invention, and FIGS. 2 and 3 are overviews showing one embodiment of the reactive liquid container of the present invention. 2 is a perspective view thereof, FIG. 3 is a schematic vertical cross-sectional view, and FIG. 4 is a system diagram showing one embodiment of the semiconductor manufacturing apparatus. 1: Reaction container, 3 HGaAs substrate, 5: Nozzle, 6°6': Reactive liquid container, 7.7', 71.71'
: Constant temperature bath, 8. 8': Carrier gas piping, 9°9
′, 9″: Carrier gas introduction pipe.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] ガス導入管、ガス導入口及びガス排出口を具備する容器
で、かつガス導入口より導入したガスに、容器内部に収
容した反応性液体から発生させた蒸気を混入させてガス
排出口より排出させる反応性液体容器において、該ガス
導入管の少なくとも一部が、該反応性液体容器の壁面に
一体化して取付けられていることを特徴とする反応性液
体容器。A container equipped with a gas inlet pipe, a gas inlet, and a gas outlet, in which the gas introduced through the gas inlet is mixed with vapor generated from a reactive liquid stored inside the container, and the mixture is discharged through the gas outlet. 1. A reactive liquid container, wherein at least a portion of the gas introduction pipe is integrally attached to a wall surface of the reactive liquid container.
JP7175783U 1983-05-16 1983-05-16 reactive liquid container Pending JPS59176639U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7175783U JPS59176639U (en) 1983-05-16 1983-05-16 reactive liquid container

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7175783U JPS59176639U (en) 1983-05-16 1983-05-16 reactive liquid container

Publications (1)

Publication Number Publication Date
JPS59176639U true JPS59176639U (en) 1984-11-26

Family

ID=30201910

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7175783U Pending JPS59176639U (en) 1983-05-16 1983-05-16 reactive liquid container

Country Status (1)

Country Link
JP (1) JPS59176639U (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003012843A1 (en) * 2001-07-31 2003-02-13 L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude Method and apparatus for cleaning and method and apparatus for etching
JP2010284628A (en) * 2009-06-15 2010-12-24 Hemmi Slide Rule Co Ltd Method and apparatus for bubbling vaporization and supply of liquid raw material

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003012843A1 (en) * 2001-07-31 2003-02-13 L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude Method and apparatus for cleaning and method and apparatus for etching
JP2010284628A (en) * 2009-06-15 2010-12-24 Hemmi Slide Rule Co Ltd Method and apparatus for bubbling vaporization and supply of liquid raw material

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