JPS59165450U - 取鍋内への保温剤投入装置 - Google Patents
取鍋内への保温剤投入装置Info
- Publication number
- JPS59165450U JPS59165450U JP4112583U JP4112583U JPS59165450U JP S59165450 U JPS59165450 U JP S59165450U JP 4112583 U JP4112583 U JP 4112583U JP 4112583 U JP4112583 U JP 4112583U JP S59165450 U JPS59165450 U JP S59165450U
- Authority
- JP
- Japan
- Prior art keywords
- ladle
- heat insulating
- insulating agent
- chute
- adding heat
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Feeding Of Articles To Conveyors (AREA)
- Treatment Of Steel In Its Molten State (AREA)
- Auxiliary Methods And Devices For Loading And Unloading (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4112583U JPS59165450U (ja) | 1983-03-22 | 1983-03-22 | 取鍋内への保温剤投入装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4112583U JPS59165450U (ja) | 1983-03-22 | 1983-03-22 | 取鍋内への保温剤投入装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59165450U true JPS59165450U (ja) | 1984-11-06 |
| JPH0235797Y2 JPH0235797Y2 (enExample) | 1990-09-28 |
Family
ID=30171721
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4112583U Granted JPS59165450U (ja) | 1983-03-22 | 1983-03-22 | 取鍋内への保温剤投入装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59165450U (enExample) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100368232B1 (ko) * | 1998-12-09 | 2003-04-21 | 주식회사 포스코 | 슬래그 탈산용 탈산재 투입장치 |
| US6979605B2 (en) | 2001-11-30 | 2005-12-27 | Semiconductor Energy Laboratory Co., Ltd. | Manufacturing method for a semiconductor device using a marker on an amorphous semiconductor film to selectively crystallize a region with a laser light |
| US7050878B2 (en) | 2001-11-22 | 2006-05-23 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductror fabricating apparatus |
| US7133737B2 (en) | 2001-11-30 | 2006-11-07 | Semiconductor Energy Laboratory Co., Ltd. | Program for controlling laser apparatus and recording medium for recording program for controlling laser apparatus and capable of being read out by computer |
| US7214573B2 (en) | 2001-12-11 | 2007-05-08 | Semiconductor Energy Laboratory Co., Ltd. | Method of manufacturing a semiconductor device that includes patterning sub-islands |
| JP2019127611A (ja) * | 2018-01-23 | 2019-08-01 | トピー工業株式会社 | 製鋼方法および製鋼システムにおけるワイヤ投入ステーション |
| CN110723508A (zh) * | 2019-09-02 | 2020-01-24 | 安徽福瑞斯特玻璃制品有限公司 | 一种玻璃加料机设备 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5612236A (en) * | 1979-07-06 | 1981-02-06 | Kawasaki Steel Corp | Segregation preventing device for storage and delivery of powdery particle |
| JPS579324U (enExample) * | 1980-06-18 | 1982-01-18 |
-
1983
- 1983-03-22 JP JP4112583U patent/JPS59165450U/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5612236A (en) * | 1979-07-06 | 1981-02-06 | Kawasaki Steel Corp | Segregation preventing device for storage and delivery of powdery particle |
| JPS579324U (enExample) * | 1980-06-18 | 1982-01-18 |
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100368232B1 (ko) * | 1998-12-09 | 2003-04-21 | 주식회사 포스코 | 슬래그 탈산용 탈산재 투입장치 |
| US7050878B2 (en) | 2001-11-22 | 2006-05-23 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductror fabricating apparatus |
| US7439115B2 (en) | 2001-11-22 | 2008-10-21 | Semiconductor Eneregy Laboratory Co., Ltd. | Semiconductor fabricating apparatus |
| US6979605B2 (en) | 2001-11-30 | 2005-12-27 | Semiconductor Energy Laboratory Co., Ltd. | Manufacturing method for a semiconductor device using a marker on an amorphous semiconductor film to selectively crystallize a region with a laser light |
| US7133737B2 (en) | 2001-11-30 | 2006-11-07 | Semiconductor Energy Laboratory Co., Ltd. | Program for controlling laser apparatus and recording medium for recording program for controlling laser apparatus and capable of being read out by computer |
| US7510920B2 (en) | 2001-11-30 | 2009-03-31 | Semiconductor Energy Laboratory Co., Ltd. | Manufacturing method for a thin film transistor that uses a pulse oscillation laser crystallize an amorphous semiconductor film |
| US7588974B2 (en) | 2001-11-30 | 2009-09-15 | Semiconductor Energy Laboratory Co., Ltd. | Program for controlling laser apparatus and recording medium for recording program for controlling laser apparatus and capable of being read out by computer |
| US7214573B2 (en) | 2001-12-11 | 2007-05-08 | Semiconductor Energy Laboratory Co., Ltd. | Method of manufacturing a semiconductor device that includes patterning sub-islands |
| US7560397B2 (en) | 2001-12-11 | 2009-07-14 | Semiconductor Energy Laboratory Co., Ltd. | Laser irradiation method and method of manufacturing a semiconductor device |
| JP2019127611A (ja) * | 2018-01-23 | 2019-08-01 | トピー工業株式会社 | 製鋼方法および製鋼システムにおけるワイヤ投入ステーション |
| CN110723508A (zh) * | 2019-09-02 | 2020-01-24 | 安徽福瑞斯特玻璃制品有限公司 | 一种玻璃加料机设备 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0235797Y2 (enExample) | 1990-09-28 |
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