JPS59153368U - Magnetron sputtering equipment - Google Patents

Magnetron sputtering equipment

Info

Publication number
JPS59153368U
JPS59153368U JP4692483U JP4692483U JPS59153368U JP S59153368 U JPS59153368 U JP S59153368U JP 4692483 U JP4692483 U JP 4692483U JP 4692483 U JP4692483 U JP 4692483U JP S59153368 U JPS59153368 U JP S59153368U
Authority
JP
Japan
Prior art keywords
magnetron sputtering
target
sputtering equipment
vacuum reactor
workpiece
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4692483U
Other languages
Japanese (ja)
Inventor
枝村　瑞郎
梶川　享志
康治 岡本
Original Assignee
川崎重工業株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 川崎重工業株式会社 filed Critical 川崎重工業株式会社
Priority to JP4692483U priority Critical patent/JPS59153368U/en
Priority to US06/594,577 priority patent/US4478703A/en
Publication of JPS59153368U publication Critical patent/JPS59153368U/en
Pending legal-status Critical Current

Links

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of drawings]

図面は本考案の実施態様を例示し、第１図はスパッタリ
ング装置の概略構成図、第２図は温度と時間の関係を示
す処理サイクル図である。 １・・・・・・スパッタリング装置、２・・・・・・真
空反応炉、２ｂ・・・・・・炉体、３・・・・・・ター
ゲット、５・・・・・・被処理物、１４・・・・・・ヒ
ーター。The drawings illustrate embodiments of the present invention; FIG. 1 is a schematic diagram of a sputtering apparatus, and FIG. 2 is a processing cycle diagram showing the relationship between temperature and time. 1... Sputtering device, 2... Vacuum reactor, 2b... Furnace body, 3... Target, 5... Processing object , 14... Heater.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 真空反応炉内に配設されたターゲットの近傍に磁界を形
成する磁界形成手段を設けたスパッタリング装置におい
て、ターゲット若しくは真空反応炉の炉壁を陽極、被処
理物を陰極とするグロー放電手段と、ターゲットを陰極
、被処理物を陽極とするスパッタリング手段とを備えて
いるとともに、真空反応炉内には被処理物を加熱するヒ
ーターが設けられていることを特徴とするマグネトロン
スパッタリング装置。In a sputtering apparatus equipped with a magnetic field forming means for forming a magnetic field near a target disposed in a vacuum reactor, a glow discharge means using the target or the furnace wall of the vacuum reactor as an anode and the object to be treated as a cathode; A magnetron sputtering apparatus comprising a sputtering means in which a target is a cathode and a workpiece is an anode, and a vacuum reactor is provided with a heater for heating the workpiece.
JP4692483U 1983-03-31 1983-03-31 Magnetron sputtering equipment Pending JPS59153368U (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP4692483U JPS59153368U (en) 1983-03-31 1983-03-31 Magnetron sputtering equipment
US06/594,577 US4478703A (en) 1983-03-31 1984-03-29 Sputtering system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4692483U JPS59153368U (en) 1983-03-31 1983-03-31 Magnetron sputtering equipment

Publications (1)

Publication Number Publication Date
JPS59153368U true JPS59153368U (en) 1984-10-15

Family

ID=30177473

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4692483U Pending JPS59153368U (en) 1983-03-31 1983-03-31 Magnetron sputtering equipment

Country Status (1)

Country Link
JP (1) JPS59153368U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2020505514A (en) * 2017-01-23 2020-02-20 ミバ・グライトラーガー・オーストリア・ゲゼルシャフト・ミト・ベシュレンクテル・ハフツング Method of forming a multi-layer plain bearing element

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52111891A (en) * 1976-03-18 1977-09-19 Honda Motor Co Ltd Method of surface treatment of metal
JPS53104534A (en) * 1977-02-24 1978-09-11 Kawasaki Heavy Ind Ltd Method and apparatus for ion nitriding treatment

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52111891A (en) * 1976-03-18 1977-09-19 Honda Motor Co Ltd Method of surface treatment of metal
JPS53104534A (en) * 1977-02-24 1978-09-11 Kawasaki Heavy Ind Ltd Method and apparatus for ion nitriding treatment

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2020505514A (en) * 2017-01-23 2020-02-20 ミバ・グライトラーガー・オーストリア・ゲゼルシャフト・ミト・ベシュレンクテル・ハフツング Method of forming a multi-layer plain bearing element

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