JPS59149317A - 投影型露光装置のアライメント光学系 - Google Patents

投影型露光装置のアライメント光学系

Info

Publication number
JPS59149317A
JPS59149317A JP58024202A JP2420283A JPS59149317A JP S59149317 A JPS59149317 A JP S59149317A JP 58024202 A JP58024202 A JP 58024202A JP 2420283 A JP2420283 A JP 2420283A JP S59149317 A JPS59149317 A JP S59149317A
Authority
JP
Japan
Prior art keywords
reticle
rectangular aperture
light source
positive lens
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58024202A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0415924B2 (enrdf_load_stackoverflow
Inventor
Makoto Uehara
誠 上原
Akira Anzai
安西　暁
Kyoichi Suwa
恭一 諏訪
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp, Nippon Kogaku KK filed Critical Nikon Corp
Priority to JP58024202A priority Critical patent/JPS59149317A/ja
Publication of JPS59149317A publication Critical patent/JPS59149317A/ja
Publication of JPH0415924B2 publication Critical patent/JPH0415924B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
  • Lenses (AREA)
JP58024202A 1983-02-16 1983-02-16 投影型露光装置のアライメント光学系 Granted JPS59149317A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58024202A JPS59149317A (ja) 1983-02-16 1983-02-16 投影型露光装置のアライメント光学系

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58024202A JPS59149317A (ja) 1983-02-16 1983-02-16 投影型露光装置のアライメント光学系

Publications (2)

Publication Number Publication Date
JPS59149317A true JPS59149317A (ja) 1984-08-27
JPH0415924B2 JPH0415924B2 (enrdf_load_stackoverflow) 1992-03-19

Family

ID=12131728

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58024202A Granted JPS59149317A (ja) 1983-02-16 1983-02-16 投影型露光装置のアライメント光学系

Country Status (1)

Country Link
JP (1) JPS59149317A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5367404A (en) * 1991-08-02 1994-11-22 Canon Kabushiki Kaisha Image projection method and semiconductor device manufacturing method using the same
EP0614097B1 (en) * 1991-08-02 1999-12-15 Canon Kabushiki Kaisha Image projection method and semiconductor device manufacturing method using the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5367404A (en) * 1991-08-02 1994-11-22 Canon Kabushiki Kaisha Image projection method and semiconductor device manufacturing method using the same
EP0614097B1 (en) * 1991-08-02 1999-12-15 Canon Kabushiki Kaisha Image projection method and semiconductor device manufacturing method using the same

Also Published As

Publication number Publication date
JPH0415924B2 (enrdf_load_stackoverflow) 1992-03-19

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