JPS59145770A - One-side metal hot dipping method - Google Patents
One-side metal hot dipping methodInfo
- Publication number
- JPS59145770A JPS59145770A JP58018917A JP1891783A JPS59145770A JP S59145770 A JPS59145770 A JP S59145770A JP 58018917 A JP58018917 A JP 58018917A JP 1891783 A JP1891783 A JP 1891783A JP S59145770 A JPS59145770 A JP S59145770A
- Authority
- JP
- Japan
- Prior art keywords
- plating
- plated
- metal
- strip
- hot
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 42
- 239000002184 metal Substances 0.000 title claims abstract description 42
- 238000007598 dipping method Methods 0.000 title abstract description 4
- 238000007747 plating Methods 0.000 claims abstract description 66
- 229910000831 Steel Inorganic materials 0.000 claims abstract description 31
- 239000010959 steel Substances 0.000 claims abstract description 31
- 238000010438 heat treatment Methods 0.000 claims abstract description 17
- 238000005096 rolling process Methods 0.000 claims abstract description 17
- 238000001816 cooling Methods 0.000 claims abstract description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 27
- 229910052802 copper Inorganic materials 0.000 claims description 27
- 239000010949 copper Substances 0.000 claims description 27
- 238000000034 method Methods 0.000 claims description 15
- 238000005498 polishing Methods 0.000 claims description 6
- 239000007864 aqueous solution Substances 0.000 claims description 5
- 238000005246 galvanizing Methods 0.000 claims description 4
- 238000005507 spraying Methods 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 claims description 2
- 238000002844 melting Methods 0.000 claims description 2
- 230000008018 melting Effects 0.000 claims description 2
- 150000003839 salts Chemical class 0.000 claims description 2
- 239000002253 acid Substances 0.000 claims 1
- 239000003795 chemical substances by application Substances 0.000 abstract description 3
- 239000003112 inhibitor Substances 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 7
- 239000007789 gas Substances 0.000 description 7
- 230000003647 oxidation Effects 0.000 description 6
- 238000007254 oxidation reaction Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 239000007921 spray Substances 0.000 description 4
- 229910019142 PO4 Inorganic materials 0.000 description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 235000021317 phosphate Nutrition 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 238000007664 blowing Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000000155 melt Substances 0.000 description 2
- 239000010452 phosphate Substances 0.000 description 2
- 239000001488 sodium phosphate Substances 0.000 description 2
- 229910000162 sodium phosphate Inorganic materials 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- LWIHDJKSTIGBAC-UHFFFAOYSA-K tripotassium phosphate Chemical compound [K+].[K+].[K+].[O-]P([O-])([O-])=O LWIHDJKSTIGBAC-UHFFFAOYSA-K 0.000 description 2
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 2
- 239000004254 Ammonium phosphate Substances 0.000 description 1
- 235000017166 Bambusa arundinacea Nutrition 0.000 description 1
- 235000017491 Bambusa tulda Nutrition 0.000 description 1
- 241001330002 Bambuseae Species 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical group [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 235000015334 Phyllostachys viridis Nutrition 0.000 description 1
- 206010041349 Somnolence Diseases 0.000 description 1
- 239000006061 abrasive grain Substances 0.000 description 1
- 238000010306 acid treatment Methods 0.000 description 1
- LFVGISIMTYGQHF-UHFFFAOYSA-N ammonium dihydrogen phosphate Chemical compound [NH4+].OP(O)([O-])=O LFVGISIMTYGQHF-UHFFFAOYSA-N 0.000 description 1
- 229910000387 ammonium dihydrogen phosphate Inorganic materials 0.000 description 1
- 235000019289 ammonium phosphates Nutrition 0.000 description 1
- 239000011425 bamboo Substances 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000002734 clay mineral Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- MNNHAPBLZZVQHP-UHFFFAOYSA-N diammonium hydrogen phosphate Chemical compound [NH4+].[NH4+].OP([O-])([O-])=O MNNHAPBLZZVQHP-UHFFFAOYSA-N 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 239000002932 luster Substances 0.000 description 1
- GVALZJMUIHGIMD-UHFFFAOYSA-H magnesium phosphate Chemical compound [Mg+2].[Mg+2].[Mg+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O GVALZJMUIHGIMD-UHFFFAOYSA-H 0.000 description 1
- 239000004137 magnesium phosphate Substances 0.000 description 1
- 229960002261 magnesium phosphate Drugs 0.000 description 1
- 229910000157 magnesium phosphate Inorganic materials 0.000 description 1
- 235000010994 magnesium phosphates Nutrition 0.000 description 1
- 230000013011 mating Effects 0.000 description 1
- 238000010297 mechanical methods and process Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 235000019837 monoammonium phosphate Nutrition 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 125000002467 phosphate group Chemical group [H]OP(=O)(O[H])O[*] 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 229910000160 potassium phosphate Inorganic materials 0.000 description 1
- 235000011009 potassium phosphates Nutrition 0.000 description 1
- 239000003507 refrigerant Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 235000011008 sodium phosphates Nutrition 0.000 description 1
- 229910052567 struvite Inorganic materials 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
- C23C2/003—Apparatus
- C23C2/0034—Details related to elements immersed in bath
- C23C2/00342—Moving elements, e.g. pumps or mixers
- C23C2/00344—Means for moving substrates, e.g. immersed rollers or immersed bearings
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
- C23C2/003—Apparatus
- C23C2/0035—Means for continuously moving substrate through, into or out of the bath
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
- C23C2/003—Apparatus
- C23C2/0038—Apparatus characterised by the pre-treatment chambers located immediately upstream of the bath or occurring locally before the dipping process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
- C23C2/003—Apparatus
- C23C2/0038—Apparatus characterised by the pre-treatment chambers located immediately upstream of the bath or occurring locally before the dipping process
- C23C2/004—Snouts
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
- C23C2/006—Pattern or selective deposits
- C23C2/0064—Pattern or selective deposits using masking layers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
- C23C2/26—After-treatment
- C23C2/28—Thermal after-treatment, e.g. treatment in oil bath
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
- C23C2/26—After-treatment
- C23C2/28—Thermal after-treatment, e.g. treatment in oil bath
- C23C2/29—Cooling or quenching
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Thermal Sciences (AREA)
- Coating With Molten Metal (AREA)
Abstract
Description
【発明の詳細な説明】 〔発明の利用分野〕 本発明は銅帯の片面溶融金属めっき方法に関する。[Detailed description of the invention] [Field of application of the invention] The present invention relates to a method for single-sided hot-dip metal plating of copper strips.
銅帯の両面または片面にめっきを施した、いわゆるめっ
き鋼帯が耐食性に優れているため多方面に使用されつつ
ある。このめっき鋼帯の製造方法は溶融金属めっき浴へ
浸漬したままでも製品として使用されるが、更に材質改
善9表面品質向上のためスキンパス圧延されることが多
い。しかしながら溶融金属めっき浴へ浸漬したままの銅
帯波めっき金属厚さは変動があるため、この被めっき銅
帯にスキンパス圧延を施すと銅帯の表面に光沢ムラを生
じ商品価値を著しく減じるという問題があった。上記の
問題は片面にめっきを施した片面めっき鋼帯において特
にめっき面及び非めっき面の銅帯両面に光沢ムラを生じ
た。A so-called plated steel strip, which is a copper strip plated on both or one side, is being used in a wide variety of applications because of its excellent corrosion resistance. In this method of manufacturing a plated steel strip, it can be used as a product even if it is immersed in a hot-dip metal plating bath, but it is often subjected to skin pass rolling in order to further improve the surface quality. However, since the thickness of the copper band wave plated metal while immersed in the hot-dip metal plating bath fluctuates, applying skin pass rolling to the copper band to be plated causes uneven gloss on the surface of the copper band, which significantly reduces the commercial value. was there. The above problem caused uneven gloss in a single-sided plated steel strip that was plated on one side, particularly on both the plated and non-plated sides of the copper strip.
本発明は上記事実に鑑みてなされたものであり、被めっ
き金属厚さの変動を小さくし均等化することを目的とし
、めっき処理後におけるスキンパス圧延による光沢ムラ
を防止するものである。The present invention has been made in view of the above facts, and aims to reduce and equalize variations in the thickness of the metal to be plated, and to prevent uneven gloss caused by skin pass rolling after plating.
本発明は銅帯を溶融金属めっき処理後めっき金属が再溶
解する温度に被めっき鋼帯の表面を加熱し、鋼帯被め′
)き表面におけるめっき厚さが犬の部分のめつき金属を
小の部分に流すことによシ、銅帯表面の被めっき厚さの
均等化を計り前記目的を達成するようにしたものである
。The present invention involves heating the surface of the steel strip to be plated to a temperature at which the plated metal re-melts after hot-dipping the copper strip.
) The above purpose was achieved by pouring the plating metal on the dog surface into a small area, thereby equalizing the plating thickness on the surface of the copper strip. .
本発明者らはめつ色鋼帯をスキンパス圧延処理した場合
に、めっき面及び非めっき面に発生する光沢ムラの原因
について研究した結果、このような光沢ムラはめつき装
置の振動、めっき厚さを制御する気体絞り装置の気体の
振動、めっき浴溶融温度の低下などの影響によりめつき
厚さが変動し、このためめっき鋼帯の厚さが変動し、ス
キンバス圧延時鋼帯の被めっき厚さが犬の部分は加工度
(圧下率)が大きく、小の部分では加工度が小さくなり
、加工度にムラが生ずる結果、この加工度ムラに起因し
てスキンパス圧延処理後の銅帯表面に光沢ムラが発生す
ることが明らかとなった。今、めっき厚さの変動による
圧下率を、片面めっき鋼帯の場合で比較すると、第1図
に示すように鋼帯1に溶融金属めっきされためつき金属
Mはa部分では厚く、b部分では薄くなっている。この
ため鋼帯の厚さをHO,最小めっき金属厚さをHl、め
っき金属厚さの最大と最小の差をΔH1スキンパス後の
厚さをH2とすると
とな93部分とb部分の圧下率の比は
とな’)、HsはHOに比べて十分小さいから銅帯の厚
さHoが薄い程、まためっき金属厚さの差ΔHが大きい
程、圧下率の比が大きくなる事がわかる。この結果、ス
キンパス圧延の際銅帯表面に光沢ムラが生ずることとな
る。The present inventors researched the causes of uneven gloss that occurs on the plated and non-plated surfaces when skin-pass rolling is applied to a dark-colored steel strip. As a result, the inventors found that such uneven gloss can be caused by vibrations of the plating equipment and changes in the plating thickness. The plating thickness fluctuates due to the effects of gas vibrations in the controlling gas throttling device, a decrease in the melting temperature of the plating bath, etc., and as a result, the thickness of the plated steel strip changes, and the coating thickness of the steel strip changes during skin bath rolling. The degree of work (rolling reduction) is large in the sag dog part, and the degree of work is small in the small part, resulting in uneven work. It became clear that uneven gloss occurred. Now, when we compare the rolling reduction due to variations in plating thickness in the case of single-sided plated steel strip, as shown in Figure 1, the plated metal M coated with hot-dip metal on steel strip 1 is thicker in part a and thicker in part b. It's getting thinner. For this reason, if the thickness of the steel strip is HO, the minimum plated metal thickness is Hl, the difference between the maximum and minimum plated metal thickness is ΔH1, and the thickness after skin pass is H2, then the rolling reduction ratio of the 93 part and b part is Since Hs is sufficiently smaller than HO, it can be seen that the thinner the thickness Ho of the copper strip and the larger the difference ΔH between the plated metal thicknesses, the larger the rolling reduction ratio becomes. As a result, uneven gloss occurs on the surface of the copper strip during skin pass rolling.
本発明者らは研究の結果、めっき厚さの変動を小さくす
るためにはめつき後の銅帯の表面を加熱することが最も
有効であることを見出した。すなわち溶融亜鉛めっきの
場合は銅帯表面のめつき亜鉛が再溶解開始する温度40
0C乃至温度過上昇による酸化現象が防止出来る温度5
00Cに、また溶融アルミめっきの場合は銅帯表面のめ
つきアルミが再溶解開始する温度600℃乃至温度過上
昇による酸化現象が防止出来る温度700Cに銅帯の被
めっき面を加熱することによシ鋼帯表面のめつき金属を
溶融状態にし、めっき厚さが犬の部分のめつき金属を小
の部分に流すことによりめっき厚さの均等化を計るため
である。また加熱された被めっき面に空気あるいは窒素
等の気体を吹き付けることにより、溶融状態化した銅帯
表面のめつき金属を強制的に流動させるため銅帯めっき
厚さの均等化の効果が大きくなる。As a result of research, the present inventors found that it is most effective to heat the surface of the copper strip after plating in order to reduce variations in plating thickness. In other words, in the case of hot-dip galvanizing, the temperature at which the plated zinc on the surface of the copper strip starts to melt again is 40
0C to temperature 5 at which oxidation phenomenon due to excessive temperature rise can be prevented
By heating the surface of the copper strip to be plated to 00C, or in the case of hot-dip aluminization, to 600C, the temperature at which the plated aluminum on the surface of the copper strip starts to melt again, to 700C, the temperature at which oxidation phenomenon due to excessive temperature rise can be prevented. This is to equalize the plating thickness by bringing the plating metal on the surface of the steel strip into a molten state and flowing the plating metal in the areas where the plating thickness is a little thicker to the smaller areas. In addition, by blowing air or a gas such as nitrogen onto the heated surface to be plated, the plated metal on the molten surface of the copper strip is forced to flow, which increases the effect of equalizing the thickness of the copper strip plating. .
さらに加熱されてめっき金属厚さの変動が小さくなシ均
等平滑化されためつき面としたのち、強制冷却手段とし
て水または水溶液を均一に吹き付けまたは噴霧すること
が好ましく、めっき面は結晶粒成金が抑止され微細なス
パングル模様を呈しためつき外観が得られる。なお冷却
用の冷媒として水溶性リン酸塩を水に溶解した水溶液を
噴霧することにより、めっき面に生成するスパングルは
微細で均一粒度のものとなシ、めっき厚さの均等化と相
俟ってよシ一段と効果が大きくなる。この場合使用され
るリン酸塩はリン酸ソーダ、リン酸カリ、す/酸マグネ
シウム、リン酸アンモニウムおよびリン酸二水素アンモ
ニウムなどでアシ、これらの単独または組合せで使用で
きる。使用濃度は薬液の噴霧で作業環境を悪化させるた
め、可能なかぎシ薄い方が好ましく3%以下である。After the plating surface is further heated to make the plating surface uniform and smooth with little variation in thickness, it is preferable to uniformly spray or spray water or an aqueous solution as a forced cooling means, so that the plating surface has no crystal grain formation. A shimmering appearance with a fine spangled pattern is obtained. By spraying an aqueous solution of water-soluble phosphate dissolved in water as a cooling refrigerant, the spangles generated on the plating surface are fine and of uniform particle size, which works well with equalizing the plating thickness. The effect will be even greater. The phosphates used in this case include sodium phosphate, potassium phosphate, magnesium phosphate, ammonium phosphate, and ammonium dihydrogen phosphate, which can be used alone or in combination. The concentration used is preferably 3% or less, which is as thin as possible, since the spraying of the chemical worsens the working environment.
この強制冷却処理を施したのち、引続き常法の冷却を行
ない鋼板を冷却したのち非めっき面に塗布されためつき
阻止剤を除去する目的で研磨工程に入る。研磨はブラシ
などを使用する機械的方法と、化学的にめっき阻止剤と
鉄地との界面に浸透して界面はくシを促す塩酸処理のよ
うな方法がおるが、本法で使用するめつき阻止剤は粘土
鉱物を主成分とし、これにバインダーとしてリン酸塩お
よびケイ酸塩を5〜30チ添加した組成からなるもので
、いずれの研磨方法によっても、!、たけこれらの併用
でも適性条件下で確実に除去できる。After this forced cooling treatment, the steel plate is subsequently cooled by a conventional method, and then a polishing process is started for the purpose of removing the anti-stick agent applied to the non-plated surface. There are two methods for polishing: mechanical methods using brushes, etc., and methods such as hydrochloric acid treatment, which chemically penetrates the interface between the plating inhibitor and the iron base and promotes interfacial deterioration. The inhibitor has a composition mainly composed of clay minerals, to which are added 5 to 30 units of phosphate and silicate as binders, and can be used with any polishing method. , bamboo can also be used in combination to ensure removal under appropriate conditions.
機械的研磨条件の一例をあげれば、砥粒入シのナイロン
ブラシの線径が1.0〜25mのものを3〜5スタンド
設置して、ライン速度60〜120m/―で帯鋼を通過
させれば、めっき阻止剤は除去できる。化学的研磨条件
の一例として塩酸濃度3〜15チを用いて2〜3秒間処
理することによって界面からめつき阻止剤がはくすする
。To give an example of mechanical polishing conditions, 3 to 5 stands of nylon brushes containing abrasive grains with a wire diameter of 1.0 to 25 m are installed, and the steel strip is passed through at a line speed of 60 to 120 m/-. If so, the plating inhibitor can be removed. As an example of chemical polishing conditions, the anti-plating agent is removed from the interface by treatment for 2 to 3 seconds using hydrochloric acid at a concentration of 3 to 15%.
めっき阻止剤をはくシ除去した片面溶融めっき鋼帯は引
続きスキンパス圧延工程に入シ、材質の改善および表面
品質の向上が図られる。なおこ\では圧下率0.5〜2
.5%の範囲で圧延されて製品化される。The single-sided hot-dip coated steel strip from which the plating inhibitor has been removed is subsequently subjected to a skin pass rolling process to improve the material quality and surface quality. Naoko\ has a reduction rate of 0.5 to 2.
.. It is rolled into a product within a range of 5%.
以上一連の工程を経て製造された片面溶融金属均一およ
び光沢ム2のない、めっき面非めっき面ともに優れた外
観品質の製品を得ることができる。Through the series of steps described above, it is possible to obtain a product with uniform molten metal on one side, no gloss 2, and excellent appearance quality on both the plated and non-plated surfaces.
以下本発明の実施例を図面によシ説明する。 Embodiments of the present invention will be described below with reference to the drawings.
第2図は本発明を適用した片面亜鉛めっき方法の実施例
を示し、鋼帯1はピックアップロール2、アプリケ−ク
ロール3、バックアップロール4、めっき阻止剤の受皿
5から構成された阻止剤塗布装置6によル受皿5中のめ
つき阻止剤7をこの非めっき面に塗布された後酸化炉8
に入る。酸化炉8では銅帯のめつき面に付着していた油
などを燃焼させられた後、スロート9を通仄還元炉1o
に入る。還元炉10では銅帯のめつき面の酸化物が還元
され清浄にされる。次に鋼帯1はデフレクタローラ11
を経て溶融めっき金属12中に浸漬され、ジンクローラ
13を経て大気中に引き上げられ気体絞シ装置14によ
シ所定のめつき厚さに調整される。次に#帯lは高周波
加熱装置15にょシ加熱され、めっき金属が再溶解し、
あるいは付着しためつき金属が溶融状態にある場合はめ
つき金属の流動性が一層高まシ、金属自体の持つ嵌面張
力作用によシめつき厚さ大の部分は小の部分にめっき金
属が流れて厚さの均等化が促進される。FIG. 2 shows an embodiment of the single-sided galvanizing method to which the present invention is applied, in which the steel strip 1 is coated with an inhibitor coating device consisting of a pick-up roll 2, an applicator roll 3, a backup roll 4, and a plating inhibitor tray 5. After the plating inhibitor 7 in the pan 5 is applied to this non-plated surface, the oxidation furnace 8
to go into. In the oxidation furnace 8, oil adhering to the plated surface of the copper strip is burned off, and then the throat 9 is passed through the reduction furnace 1o.
to go into. In the reduction furnace 10, oxides on the plated surface of the copper strip are reduced and cleaned. Next, the steel strip 1 is deflector roller 11
It is immersed in the hot-dip plated metal 12 through a zinc roller 13, and then pulled up into the atmosphere and adjusted to a predetermined plating thickness by a gas throttling device 14. Next, # band 1 is heated by the high frequency heating device 15, and the plated metal is remelted.
Alternatively, if the attached plating metal is in a molten state, the fluidity of the plating metal will be even higher, and the plating metal will be thicker in areas with larger plating thickness than in smaller parts due to the tension of the mating surface of the metal itself. It flows and promotes thickness uniformity.
またこの時、鋼帯1の加熱面に気体吹付は装置15′に
よシ空気又は窒素等の気体を吹き付ける事によシ、前記
めっき金属を強制的に流動させるため、めっき厚さ均等
化の効果が大きくなる。なお吹き刊ける気体は出来れば
窒素等の不活性ガスが鋼帯の酸化防止の上から有利であ
るが空気を用いてもよい。サポートロー216は高周波
加熱法置に対向して非めっき面側に鋼帯1に接触して設
けられており鋼帯1の振動を防止すると共に高周波加熱
装置15と鋼帯1の隙間Gを一定に保持する役目を有し
ている。At this time, the gas is sprayed onto the heating surface of the steel strip 1 by blowing air or gas such as nitrogen using the device 15', which forces the plating metal to flow, thereby making the plating thickness uniform. The effect will be greater. The gas to be sprayed is preferably an inert gas such as nitrogen, which is advantageous in terms of preventing oxidation of the steel strip, but air may also be used. The support row 216 is provided in contact with the steel strip 1 on the non-plated side facing the high-frequency heating device to prevent vibration of the steel strip 1 and to keep the gap G between the high-frequency heating device 15 and the steel strip 1 constant. It has the role of holding the
銅帯1を加熱する装置としては前述の高周波加熱装置の
他にバーナーの火炎を直接鋼帯に当てて加熱する方法、
眠気ヒータにより加熱する方法などがあシ、いずれも本
発明の加熱装置として適用できるが、いずれにしても装
置長さの縮減とめつき金属の酸化抑制のため短時間で加
熱できることが望ましく、この点適当な周波数を用いれ
ば表層部のみを加熱出来る高周波加熱法が最も望ましい
と言える。As a device for heating the copper strip 1, in addition to the above-mentioned high-frequency heating device, there are a method in which the flame of a burner is directly applied to the steel strip to heat it;
There are other methods, such as heating with a drowsiness heater, which can be applied as the heating device of the present invention, but in any case, it is desirable to be able to heat in a short time in order to reduce the length of the device and suppress oxidation of the plated metal. The most desirable method is the high-frequency heating method, which can heat only the surface layer by using an appropriate frequency.
次に鋼帯1は強制冷却装置17によりリン酸ソーダ2%
水溶液を圧力2’q/cdで均一にめっき面に噴霧し、
めっき面のスパングルが極めて極微細化されたのち、引
続き常法の冷却装置17′で冷却された後A1ブライド
ルローラ18およびA2ブライドルローラ19によυ張
力をかけられた状態で阻止剤除去装置20に入υ、砥粒
入シナイロンブラシ線径1.6圏、3スタンド、ライン
速度60m/Mmの研磨条件でめっき阻止剤が完全に除
去される。Next, the steel strip 1 is cooled with 2% sodium phosphate using a forced cooling device 17.
Spray the aqueous solution uniformly onto the plating surface at a pressure of 2'q/cd,
After the spangles on the plating surface have been made extremely fine, the spangles on the plating surface are subsequently cooled in a conventional cooling device 17', and then the inhibitor removing device 20 is placed under υ tension by the A1 bridle roller 18 and the A2 bridle roller 19. The plating inhibitor was completely removed under the following polishing conditions: abrasive-containing snylon brush wire diameter of 1.6 mm, 3 stands, and line speed of 60 m/Mm.
次に鋼帯1はスキンバスミル21に入9鋼帯張力が屋3
ブライドルローラ22とA2ブライドルローラ19によ
り制御されて0.5%の伸び率のスキンパス圧延されて
材質の改善、表面品質の向上が図られる。めっき厚さが
十分均等化されているためスキンバス圧延処理において
も、めっき面、非めっき面とも光沢ムラを生ずることは
ない。Next, the steel strip 1 is put into the skin bath mill 21 and the tension of the 9 steel strips is increased to the mill 3.
Controlled by the bridle roller 22 and the A2 bridle roller 19, skin pass rolling is performed with an elongation rate of 0.5% to improve material quality and surface quality. Since the plating thickness is sufficiently uniform, uneven gloss does not occur on both the plated and non-plated surfaces even during skin bath rolling.
本発明者らの実験によると第2図に例示した片面めっき
方法によp1鋼帯の片面溶融亜鉛めっきを実施したとこ
ろ、亜鉛浴温度455Cで溶融めっきを行い、めっき後
、周波数30KH2の高周波加熱装置によp高周波コイ
ルと銅帯の隙間を10咽に保持して銅帯の表面温度45
0Cに加熱を行いスキンバスミルによシ圧下率0.5%
の圧延処理を施したもの、および上記において加熱面に
空気ある陽は窒素の気体を吹付けもの共、めっき面、非
めっき面とも実用上問題となるような光沢ムラは認めら
れず片面173 g/m”の亜鉛付着量の美麗な片面め
っき銅帯が得られた。まためっき而に対し24時間の5
チ塩水噴霧耐食性試験を行った結果、めっき面には赤錆
の発生はなく確実なめっきが施されていることが確認さ
れ、従来技術の問題点が解消された。According to experiments conducted by the present inventors, one-sided hot-dip galvanizing of P1 steel strip was carried out using the single-sided plating method illustrated in FIG. The device maintains the gap between the high-frequency coil and the copper strip at 10 mm, and the surface temperature of the copper strip is 45 mm.
Heat to 0C and use a skin bath mill to reduce the pressure to 0.5%.
In both the rolling treatment and the one in which the heating surface was sprayed with air or nitrogen gas, no uneven gloss was observed on either the plated or non-plated surfaces, which would pose a practical problem, and each side weighed 173 g. A beautiful single-sided plated copper strip with a zinc coverage of 1/m" was obtained.
As a result of conducting a salt spray corrosion resistance test, it was confirmed that there was no red rust on the plated surface and that the plating was reliable, and the problems of the conventional technology were resolved.
以上述べたように本発明によれば、銅帯の片面溶融金属
めっきにおいて、めっき処理後加熱炉に入れてめっき金
属の表面が再溶解する温度に加熱し、しかるのちめっき
金属の閾が未だ溶融状態にあるとき強制冷却を行なうこ
とにより、めっき厚さの均等化が計れる結果、スキンバ
ス圧延後の銅帯表面に光沢ムラのないめっき鋼帯が製造
可能となシ、その工業的価値は極めて大きい。As described above, according to the present invention, in single-sided hot-dip metal plating of a copper strip, after the plating process, the plated metal is placed in a heating furnace and heated to a temperature at which the surface of the plated metal re-melts, and then the threshold of the plated metal is still molten. By performing forced cooling when the copper strip is in this state, the plating thickness can be made uniform, and as a result, it is possible to produce a plated steel strip with even luster on the surface of the copper strip after skin bath rolling, and its industrial value is extremely high. big.
第1図はめつき厚さのムラを示す片面めっき鋼帯拡大断
面図、第2図は本発明の一実施例を示す片面めっき装置
図。FIG. 1 is an enlarged sectional view of a single-sided plated steel strip showing unevenness in plating thickness, and FIG. 2 is a diagram of a single-sided plating apparatus showing an embodiment of the present invention.
Claims (1)
製造する方法において、めっき処理後加熱炉に入れてめ
っき金属の表面が再溶解する温度に加熱し、しかるのち
めっき金属の表面が未だ溶融状態にあるとき強制冷却を
水ないし水溶液を噴霧することにより行ない、しかるの
ち通常冷却をし、非めっき面の研磨およびスキンパス圧
延を順次行なうことを特徴とする片面溶融金属めっき方
法。 2、前記加熱温度が溶融亜鉛めっきの場合に400C乃
至500cであることを特徴とする特許請求の範囲第1
項記載の片面溶融金属めっき方法。 3、前記加熱温度が溶融アルミめっきの場合に600C
乃至700cであることを特徴とする特許請求の範囲第
1項記載の片面溶融金属めっき方法。 4、前記強制冷却用水溶液が水溶性り/酸塩を水に0.
5〜3%溶解したものであることを特徴とする特許請求
の範囲第1項記載の片面溶融金属めっき方法。[Claims] 1. In a method for producing a single-sided hot-dip metal-plated steel strip by immersing a copper strip in a plating bath, after plating, the copper strip is placed in a heating furnace and heated to a temperature at which the surface of the plated metal remelts; Single-sided melting is characterized in that when the surface of the plated metal is still in a molten state, forced cooling is performed by spraying water or an aqueous solution, followed by normal cooling, followed by polishing and skin pass rolling of the non-plated surface. Metal plating method. 2. Claim 1, characterized in that the heating temperature is 400C to 500C in the case of hot-dip galvanizing.
Single-sided hot-dip metal plating method described in Section 1. 3. The heating temperature is 600C for hot-dip aluminum plating.
700c to 700c, the single-sided hot-dip metal plating method according to claim 1. 4. The forced cooling aqueous solution is a water-soluble salt/acid in water.
The single-sided hot-dip metal plating method according to claim 1, characterized in that 5 to 3% of the metal is melted.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58018917A JPS59145770A (en) | 1983-02-09 | 1983-02-09 | One-side metal hot dipping method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58018917A JPS59145770A (en) | 1983-02-09 | 1983-02-09 | One-side metal hot dipping method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS59145770A true JPS59145770A (en) | 1984-08-21 |
Family
ID=11984958
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58018917A Pending JPS59145770A (en) | 1983-02-09 | 1983-02-09 | One-side metal hot dipping method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59145770A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1998021378A1 (en) * | 1996-11-09 | 1998-05-22 | Thyssen Stahl Ag | METHOD OF HEAT-TREATING THIN SHEET COATED WITH ZnAl BY HOT DIP GALVANIZATION |
-
1983
- 1983-02-09 JP JP58018917A patent/JPS59145770A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1998021378A1 (en) * | 1996-11-09 | 1998-05-22 | Thyssen Stahl Ag | METHOD OF HEAT-TREATING THIN SHEET COATED WITH ZnAl BY HOT DIP GALVANIZATION |
US6231695B1 (en) | 1996-11-09 | 2001-05-15 | Thyssen Stahl Ag | Method of heat-treating a thin sheet coated with ZnAL by hot dip galvanization |
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