JPS59134647A - Polishing method and tool of optical part - Google Patents
Polishing method and tool of optical partInfo
- Publication number
- JPS59134647A JPS59134647A JP687783A JP687783A JPS59134647A JP S59134647 A JPS59134647 A JP S59134647A JP 687783 A JP687783 A JP 687783A JP 687783 A JP687783 A JP 687783A JP S59134647 A JPS59134647 A JP S59134647A
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- workpiece
- molded
- mold
- polishing tool
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B13/00—Machines or devices designed for grinding or polishing optical surfaces on lenses or surfaces of similar shape on other work; Accessories therefor
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
Abstract
Description
【発明の詳細な説明】
この発明はレンズ、プリズム等の光学部品の研磨方法お
よびこれに用いる仙齢具に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for polishing optical parts such as lenses and prisms, and a polishing tool used for the same.
光学部品の研磨方法はその1J11工治具の改良または
研ト剤の改良等に件って2辻に変革している。一般に、
この柳の研磨方決、予め加工形状に成形された押し生地
を素成形する荒摺り工程と、素成形された被加工部品を
所望の形状に整形する砂掛は工程と、砂掛けに糾いて鏡
面精研(中仕上げ)する精研工程と、如終仕上げを行な
う研磨工程とからなる。The method of polishing optical parts has undergone two changes due to improvements in 1J11 tools and polishing agents. in general,
The method of polishing this willow involves a rough sanding process in which the pressed fabric is formed into a pre-processed shape, and a sanding process in which the formed workpiece is shaped into the desired shape. It consists of a fine polishing process for mirror polishing (intermediate finishing) and a polishing process for final finishing.
しかるに、光′481S品のp<y5度と原価低減を計
るため、高速反でかつ品質のよい研磨方決が次々と考え
られている。例えば、荒摺り工程においては、カーブジ
ェネレーター製筒(CG)による整形方法がbe %さ
れた、すなわち上述した従来の工程のうち荒摺りと砂掛
けとを同一の工程にて行なわれるようになった。However, in order to reduce the cost of optical '481S products by achieving p<y5 degrees, polishing methods that provide high speed and high quality are being considered one after another. For example, in the rough-sanding process, the shaping method using a curve generator cylinder (CG) has been improved.In other words, the rough-sanding and sanding of the above-mentioned conventional processes are now performed in the same process. .
また、従来の精研工程ではピッチ剤を研磨面に貼着して
研磨が実施されていたが、これに代り金属粉末若しくは
レジン粉末又はダイヤモンド粉末をシートに含浸せしめ
たものを用いるシート研磨方法、所謂プリサイスゲライ
ニング(p G)が開発され、て研磨の筒辷化が量産化
と共に進歩してきた。また、最終仕上げの研磨工程では
研磨剤を研磨面に塗布しながら研磨していたが、上述し
たPGのような研磨具の進歩により研磨加工が高速にな
り、また研磨剤の代りに水による研磨方法も提案されて
いる。In addition, in the conventional fine polishing process, polishing was carried out by pasting a pitch agent on the polishing surface, but instead of this, a sheet polishing method using a sheet impregnated with metal powder, resin powder, or diamond powder, So-called precision gellining (pG) was developed, and progress has been made in the polishing process along with mass production. In addition, in the final polishing process, polishing was performed while applying an abrasive to the polished surface, but with the advancement of polishing tools such as the PG mentioned above, the polishing process has become faster, and polishing using water instead of an abrasive has become possible. A method has also been proposed.
その上、従来の荒摺り工程と砂掛は工程とを併用するC
a法や、従来の砂掛は工程と精研工程とを併用するPC
)法等の種々の加工方決が開発されてきたが、中仕上げ
の精研工程と最終仕上げの研磨工程とを併用する加工方
法は未だ開発されておらず、その開発が当該技術分野で
永い間の要望でもあった。すなわち、荒摺り工程と砂掛
は工程とを併用した0G工程に加えて、精研工程と研磨
工程とを併用する研磨工程を1泊発することが強く要望
されている。In addition, C
A method and conventional sand-kake process are PC that uses both process and fine polishing process.
) method, etc. have been developed, but a processing method that combines a fine polishing process for semi-finishing and a polishing process for final finishing has not yet been developed, and its development is a long-awaited process in this technical field. It was also a temporary request. That is, in addition to the 0G process that combines a rough-sanding process and a sanding process, there is a strong demand for a polishing process that combines a fine-sharpening process and a polishing process to be performed overnight.
この発明は上記費望を満足する研磨方法と、これに用い
る研締具とを提供せんとするもので、被加工素材に成形
された押し生地をカーブジェネレーターにより素、波形
する工程と、酵素成形された加工部品をフェノールレシ
ンと、酸化セリウムと、硬化剤とよりなる固形砥粒の研
磨具にて研磨する工程とよりなる光学部品の研磨方法と
、フェノールレジンと酸化セリウムと、硬化剤との混合
物を加熱し、強静1乾燥し、粗砕後置形化してなる光学
部品用研磨具にある。The present invention aims to provide a polishing method that satisfies the above-mentioned requirements and a sharpening tool used therefor, which includes a step of undulating and corrugating pressed dough formed on a workpiece material using a curve generator, and an enzyme molding process. A method for polishing optical parts comprising the step of polishing a processed part with a solid abrasive polishing tool made of phenol resin, cerium oxide, and a hardening agent; A polishing tool for optical components is obtained by heating the mixture, drying it under high pressure, crushing it into coarse particles, and then shaping it.
次に、この発明の一実施例を図面に基いて説明する。Next, one embodiment of the present invention will be described based on the drawings.
第1図に示す従来の光学部品の研磨方法においては、ま
ず被加工素材を予め目的形状に合わせて押し生地に成形
し、これをは!目的の寸法、例えば只の外径および厚さ
近くの形状に切削加工し、カーブジェネレーター(CG
)による工程を経て中仕上げ加工、すなわちpcによる
精研加工を行なう。次に、この被加工部品を最終仕上げ
である研磨工程に施して所望の加工部品を得る。In the conventional polishing method for optical parts shown in Fig. 1, the material to be processed is first formed into a pressed dough according to the desired shape, and then the material is pressed! Cut to a shape close to the desired dimensions, such as the outer diameter and thickness, and use a curve generator (CG
), semi-finishing processing, that is, fine polishing processing using PC, is performed. Next, this processed part is subjected to a final polishing step to obtain a desired processed part.
上述した従来の精研工程に用いる研磨具は、第5図に示
すように半円形状の研磨面1の内周面に被加工部品の研
磨面と同−形状のR部を形成するようダイヤモンド粉末
または金属粉末等を含浸せしめたシート2を貼着してな
るものである。この研磨具により精研された被加工部材
は、シート2の代りに、ピッチ剤を内周面に貼着した研
磨面1により最終仕上げのため研磨加工される。As shown in FIG. 5, the polishing tool used in the conventional fine polishing process described above uses a diamond so as to form an R portion having the same shape as the polishing surface of the workpiece on the inner peripheral surface of the semicircular polishing surface 1. It is made by pasting a sheet 2 impregnated with powder or metal powder. The workpiece finely polished by this polishing tool is polished for final finishing using a polishing surface 1 having a pitch agent adhered to the inner peripheral surface instead of the sheet 2.
従来の研磨方法では、上述したように精研工程と研磨工
程との間で研磨面の内周面に貼着する研磨剤を替えて研
磨加工を行なう必要がある。また、研磨加工中に只の変
形を生じるので、加工中にその修正を行なわねばならな
い。さらに、ピッチ剤は研磨毎に研磨面の内周面に貼着
しなけれはならない。このように、従来の研磨方法は4
大′セ時間生労力を要する欠点がある。In the conventional polishing method, as described above, it is necessary to perform the polishing process by changing the abrasive agent attached to the inner peripheral surface of the polished surface between the fine polishing step and the polishing step. Furthermore, since some deformation occurs during the polishing process, correction must be made during the process. Furthermore, the pitch agent must be attached to the inner peripheral surface of the polished surface each time the polishing is performed. In this way, the conventional polishing method is
It has the disadvantage of requiring a large amount of time and effort.
次に、この発明の研磨方法を第2図にて説明する。第2
図からもり」らかな如く、押し生地およびCG工程は第
1図に示す従来法と同一工程であり、ここでは観明を省
略する。この発明が従来法と全く集なるのは精研・研磨
工程であり、これについて以後説明する。Next, the polishing method of the present invention will be explained with reference to FIG. Second
As is clear from the figure, the pressing dough and CG steps are the same as the conventional method shown in FIG. 1, and their explanation will be omitted here. What this invention is completely different from the conventional method is the fine polishing and polishing process, which will be explained below.
この精研・研磨工程に用いる研磨具は第3図に示すフロ
ーシートに従って製造した研磨面1の内面に貼着された
ブロック砥石3(第6図)よりなる。ブロック砥石3は
、第3図ニ示スように結合剤としてのフェノールレジン
をまず有機溶剤に溶解し、これに酸化セリウム研磨剤と
硬化剤とを添加してこれらを均一に湿式混合し、生成し
た混合物を150〜170℃で熟成して有機浴剤を除去
し、次いで強制乾燥して成型材料を形成する。The polishing tool used in this fine polishing/polishing step consists of a block whetstone 3 (FIG. 6) adhered to the inner surface of the polishing surface 1 manufactured according to the flow sheet shown in FIG. The block whetstone 3 is produced by first dissolving phenol resin as a binder in an organic solvent, adding a cerium oxide abrasive and a hardening agent to this, and uniformly wet-mixing these. The resulting mixture is aged at 150-170°C to remove the organic bath agent and then forced dried to form a molding material.
フェノールレシンとしては掠々のものを用いることがで
きるが、特にカシュウ変戒フェノールレジンの使用が好
ましい−、丁た、饅化セリウム研磨剤としては下記に示
すような組成および比率を有するものが最も好ましい。As the phenol resin, any type of phenol resin can be used, but it is particularly preferable to use phenol resin, which has the composition and ratio shown below. preferable.
酸化硫黄 (S04・)1.2%
酸化鉄 CFe*Os I 0.5%酸化ラ
ンタン (La20s)9.0%酸化セリr>ム(Ce
Oz) 86.0%酸化プルトニウム (Pro
O1ト) 0−8%酸化ネオジウム (、l’
Jdt Os ) 2−5%e化セリウム研磨剤と
、カシュウ変成フェノールレジンと、硬化剤とを下記の
混合比率で混合する:
酸化セリウム研磨剤 85〜95%カシュウ
昶成フェノールレジン 5〜15%硬 化 剤
0.2〜0.4%上記混合比亭にお
いて、研磨剤が上限を越えて多くなりすぎると、生成す
る砥石の硬度および強度が低下し、また逆に下限値より
少ないと、耐久性および摩擦性に影響して研磨精度が低
下する。一方、フェノールレジンが多過ぎると硬くなり
、少な過ぎると柔かく耐久性かなくなるなどの障害が生
ずる。この点に関L、第71dにフェノールレシンのN
(%)に対する成型ブロック3のシミアール硬&の関係
を示す。第7図から、ブロック3の硬軟がフェノールレ
シンの焔によって変1.するため、フェノールレジンの
適Nと研磨剤および硬化剤(ハ配合比か極めて重要なこ
とが明らかになる。Sulfur oxide (S04・) 1.2% Iron oxide CFe*Os I 0.5% Lanthanum oxide (La20s) 9.0% Cerium oxide
Oz) 86.0% plutonium oxide (Pro
O1t) 0-8% neodymium oxide (,l'
Jdt Os ) 2-5% e-based cerium abrasive, Kashu modified phenol resin, and hardener are mixed in the following mixing ratio: Cerium oxide abrasive 85-95% Kashu modified phenol resin 5-15% Hard oxidizing agent
0.2-0.4% At the above mixing ratio, if the amount of abrasive exceeds the upper limit, the hardness and strength of the resulting grinding wheel will decrease, and if it is less than the lower limit, the durability and friction will decrease. Polishing accuracy decreases due to the impact on polishing properties. On the other hand, if there is too much phenol resin, it will become hard, and if it is too little, it will become soft and lack durability. Regarding this point, L of phenolresin in No. 71d
The relationship between the Simial hardness of the molded block 3 and (%) is shown. From Figure 7, the hardness and softness of block 3 changes due to the flame of phenol resin.1. Therefore, it becomes clear that the appropriate N of the phenol resin and the blending ratio of the abrasive and hardening agent are extremely important.
次に、上述した配合割合よりなるp・イ型材料を第4図
に示す金型に入れて成型ブロック3(第6図a)を製造
する。Next, the p-type material having the above-mentioned compounding ratio is placed in the mold shown in FIG. 4 to manufacture the molded block 3 (FIG. 6a).
第4図aに断面で示す金型において、符号4は中央に成
形品の寸法に対応して形成された円形の突起5を備えた
下型である。下型4の上方には下型4の平面と突起5の
外径と精密に嵌合する側壁円筒体6が装着されている。In the mold shown in cross section in FIG. 4a, reference numeral 4 denotes a lower mold having a circular protrusion 5 formed in the center corresponding to the dimensions of the molded product. A side wall cylindrical body 6 is mounted above the lower mold 4 and precisely fits the plane of the lower mold 4 and the outer diameter of the protrusion 5.
さらに、側壁円筒体6の内径上方には、下型4と同じ寸
法、形状で突起7を備えたT字状の上型8が嵌合装着さ
れている2、そして、下型Aの突起5と上型8の突起7
との間にブロック形成用の成型材料が充填されている。Furthermore, a T-shaped upper mold 8 having the same size and shape as the lower mold 4 and having a protrusion 7 is fitted and attached above the inner diameter of the side wall cylindrical body 6 2, and a protrusion 5 of the lower mold A and the protrusion 7 of the upper mold 8
A molding material for forming a block is filled between the two.
成型ブロックを製造するに節し、まず下型4上に側壁円
筒「体6を嵌合装着し、突起5上で円筒体間内に第3図
の70−シートに従って得た成型材料を適量充填し、上
型8を嵌合装着し、150〜170℃に加熱しながら上
型8を下型4の方へ押圧する。しかる後、上型8を円筒
体6より離脱し、さらに該円筒体6を下型4より上方に
離脱せしめ、生成した成型ブロック3を下型4より離脱
して得る。To manufacture a molded block, first fit and attach the side wall cylinder body 6 onto the lower mold 4, and fill the space between the cylinder bodies on the protrusion 5 with an appropriate amount of molding material obtained according to sheet 70 in Fig. 3. Then, the upper mold 8 is fitted and mounted, and the upper mold 8 is pressed toward the lower mold 4 while heating to 150 to 170°C.After that, the upper mold 8 is separated from the cylindrical body 6, and the cylindrical body is 6 is removed above the lower mold 4, and the produced molded block 3 is removed from the lower mold 4 to obtain it.
このようにして得た円形の成型ブロック3の一方の面を
、第6図すに示すように、底面が平坦な円形の研磨皿1
に接合し、研磨皿1の中心を例えば旋盤等のチ°ヤック
に嵌着させた後、ブロック3の他方の面を所望の曲率R
の形状に切削整形すると同時に研磨時の給水用溝9(第
6図C)を形成し、これを用いてこの発明の精研−研磨
工程を実施する。One side of the circular molded block 3 obtained in this way is placed into a circular polishing dish with a flat bottom, as shown in FIG.
After fitting the center of the polishing plate 1 into the chuck of a lathe, etc., the other surface of the block 3 is shaped to a desired curvature R.
At the same time, a groove 9 for water supply during polishing (FIG. 6C) is formed, and this is used to carry out the fine polishing-polishing process of the present invention.
第4図すは成型ブロックを製造するのに用いる金型の他
の例を示す〜「面図である。一般に、成型ブロック3を
金型から離脱させる際、金型に傷かあったり汚れている
場合、若しくは成型温度が高い場合、又は上下の型温度
が不均一な場合等によりブロックの型離れが恕<、金型
を叩いてブロックを離型させなければならない場合が多
く生じる。すなわち、か\る離型作業は極めて多大な労
力を必要とするばかりか、金型の破損や成型ブロックの
す損等を生じる危険がある。この離型作業を容易にする
ため、成型材料を金型に充填する際、離型剤を予め金型
に塗布しておく方法が通常使用されている。すなわち、
下型4の突起5の上面と、側壁円筒体6の内壁面および
上型8の突起7の下面にそれぞれ離型剤を塗布する方法
である。し力1し、離型剤を敵布しても離型が困難な場
合がある。第4図すに示す金型は上述した欠点を解消し
、離型を更に容易にするものである。Figure 4 is a top view showing another example of a mold used to manufacture a molded block.Generally, when the molded block 3 is removed from the mold, the mold is scratched or dirty. When the molding temperature is high, or when the upper and lower mold temperatures are uneven, etc., the block may not be released from the mold, and it is often necessary to release the block by hitting the mold. In other words, Not only does such mold release work require an extremely large amount of labor, but there is also a risk of damage to the mold or loss of the molded block. When filling the mold, a method is usually used in which a mold release agent is applied to the mold in advance.
In this method, a mold release agent is applied to the upper surface of the projection 5 of the lower mold 4, the inner wall surface of the side wall cylinder 6, and the lower surface of the projection 7 of the upper mold 8, respectively. It may be difficult to release the mold even if a mold release agent is applied. The mold shown in FIG. 4 eliminates the above-mentioned drawbacks and further facilitates mold release.
第4゛図すの金型はm型補助板10.11を用いること
以外第4図aのものと基本的に同一の構造を有する。第
4図すの金型を用いて成型ブロックを製造するには、下
型4の突起5の上面と、上型Bの突起Tの下面にそれぞ
れ#S型補助板10.11を配置すると共に、これら補
助板10.11の成型材料と接する側の面にそれぞれ離
型剤を塗布しておく。このような補助板10.11と離
型剤とを併用しても離型がまた困難な場合には、補助板
10の上面と補助板11の下面との各々に組型紙を介在
させ、これら離型紙の成型材料に接する側の面に離型剤
を塗布すれば、離型を一層容易に実施し得る。The mold shown in FIG. 4 has basically the same structure as the mold shown in FIG. 4a except for the use of m-type auxiliary plates 10 and 11. In order to manufacture a molded block using the mold shown in FIG. A mold release agent is applied to the surfaces of these auxiliary plates 10 and 11 that come into contact with the molding material. If it is still difficult to release the mold even if such auxiliary plates 10.11 and a mold release agent are used in combination, a paper pattern is interposed between the upper surface of the auxiliary plate 10 and the lower surface of the auxiliary plate 11, and these If a release agent is applied to the surface of the release paper that comes into contact with the molding material, release can be performed more easily.
第4図a又はbに示す金型を用いて得た成型ブロック3
を前述した如く研、管面1に接合すると同時に任意所望
の形状に整形したものを用いることにより、任意形状の
光学部品を研磨することができる。また、従来の研磨法
によれば研磨皿の研磨面に狂いを生じて修正したり、ま
た研磨皿の使用が不可能になり再生を行なう等の障害が
生じていたが、この発明によれは成型ブロックを一回だ
け整形することにより多数の光学部品を連続して研磨す
ることができ、また研磨の尚連化にも耐えると共にゼ産
研酌にも適するなどの多大の効果を奏する。Molded block 3 obtained using the mold shown in Figure 4 a or b
By using a material that has been polished as described above, bonded to the tube surface 1, and shaped into any desired shape at the same time, it is possible to polish an optical component of any shape. Furthermore, with the conventional polishing method, there were problems such as the polishing surface of the polishing plate being distorted and having to be corrected, or the polishing plate becoming unusable and having to be regenerated. By shaping the molded block only once, a large number of optical parts can be polished continuously, and it has many effects such as being able to withstand continuous polishing and being suitable for industrial research.
第1図は従来の光学部品の研磨方法の工程を示すフロー
シート、第2図はこの発明の光学部品の研磨方法の工程
を示すフローシート、第3図はこの発明に用いる研磨具
の製造工程を示す70−シート、嬉4図aおよびbはそ
れぞれこの発明に係る研磨具を製造するのに用いる金型
の線図的断面図、第5図は従来の光学部品用研暦具の線
図的断面図、第6図はこの発明の研磨具を示すもので、
aは成凋ブロックの断面図、bは他M具の島r面図、0
は研磨具を成型ブロック側力)ら見た平面図、第7図は
フェノールレジンの量と生成する成型ブロックの硬度と
の関係を示すグラフである0
1・・0研磨皿
3・・・成型プ四ツク
4・・・下 型
5.71]突 起
8・・・上 型
9Φ−・給水用溝
10.11・・・離型液助板
特許 出願人 オリンパス光学工業株式会社第1図
第2図
第3図
第4図
第6図
(C1)
(b) 、 (c)
し ジ ン 量 (チ)
手続補正書(自発)
1、事件の表示
昭和58年特 許願第6877号
発明の名称
2 光学部品の研磨方法および研磨具3 補正をする
者
事件との関係 特許出願人
M”’+W 東京都渋谷区幅ヶ谷2丁目43番2号4
、代理人
明細曹の「発明の詳細な説明」の掴及び図面8、補正の
内容
(1)明細曹第2頁第6行目から同第4頁第14行目ま
での記載を下記の洩り補正する。
[光学部品のHm方法はその加工治具の改良または研磨
剤の改良等に伴って急速に変革している。一般に、この
榎の研磨方法、予め加工形状に成形された押し生地を集
成形する荒摺り工程と、集成形された被加工部品ケ所望
の形状に整形する砂掛は工程と、最終仕上げを行なう研
磨工程とからなる。
しかるに、光学部品の需要度と原価低減を計るため、高
速度でかつ品質のよい研磨方法が次々と考えられている
。例えば、兎摺り工程においては、カーブジェネレータ
ー装置t(CG)による歪形方法が開発された。すなわ
ち上述した従来の工程のうち荒摺りか短時間で加工出来
る様になった。
また、従来の砂畑は工程では砂を水で浴かした切q+」
液を研磨面に墜布し砂!にけ皿で加工していた1J)、
これに代り金属粉末若しくはレジン粉末又はダイヤモン
ド粉末°をシートに含浸せしめたものを用いるシート研
磨方法、所謂プリサイスゲライニング(PG)が開発さ
れて研磨の尚連化が量産化と共に進歩してきた。また、
最終仕上げの研磨工程では研磨剤を研磨面に塗布しなか
ら研磨していたが、上述したPGのような研磨具の進歩
により幼心加工が高速になり、また研磨剤の代りに水に
よる研磨方法も提案されている。
従来の荒摺り工程のCG化、そして砂掛は工程のPG化
等か開発されてきたが、中仕上げの精研工程と最終仕上
げのイυti工程とな併用する加工方法は未だ開発され
ておらず、その開発が当該技術分野で永い間の要望でも
あった。
この発明は上記要望を満足する研磨方法と、これに用い
る研磨具とを徒供せんとするもので、被加工素材に成形
された押し生地をカーブジェネレーターにより集成形す
る工程と、レジン粒末又はダイヤモンド粒末を含浸した
砥粒な用いたPG工程、そして該集成形された加工部品
をフェノールレジンと、酸化セリウムと、硬化剤とより
なる固形砥粒の研磨具にて研磨する工程とよりなる光学
部品の研磨方法と、フェノールレジンと酸化セリウムと
、硬化剤との混合物を加熱し、強制乾燥し、粗砕後置形
化してなる光学部品用研磨具にある。」
(2) 図中、第6図Cを別紙の逝り補正する。
9、添付書類の目録
(1)補 正 図 面 1通
第6図
(C)FIG. 1 is a flow sheet showing the steps of a conventional method for polishing optical components, FIG. 2 is a flow sheet showing the steps of the method of polishing optical components of the present invention, and FIG. 3 is a process for manufacturing a polishing tool used in the present invention. Figures 4a and 4b are diagrammatic cross-sectional views of molds used to manufacture the polishing tool according to the present invention, respectively, and Figure 5 is a diagrammatic diagram of a conventional polishing tool for optical components. A cross-sectional view, FIG. 6, shows the polishing tool of the present invention.
a is a cross-sectional view of the mature block, b is an island r-view of the other M tools, 0
Figure 7 is a plan view of the polishing tool viewed from the side of the molded block, and Figure 7 is a graph showing the relationship between the amount of phenol resin and the hardness of the molded block produced. 4...Lower mold 5.71] Projection 8...Upper mold 9Φ-・Water supply groove 10.11...Mold release liquid aid plate patent Applicant: Olympus Optical Industry Co., Ltd. Figure 1 Figure 2 Figure 3 Figure 4 Figure 6 (C1) (b), (c) Amount of ginseng (h) Procedural amendment (voluntary) 1. Indication of the case 1988 Patent Application No. 6877 Title of the invention 2. Method for polishing optical parts and polishing tools 3. Relationship with the person making the amendment case Patent applicant M”'+W 2-43-2-4, Habagaya, Shibuya-ku, Tokyo
, the agent's description of the detailed description of the invention, Drawing 8, and the contents of the amendments (1) The description from page 2, line 6 to page 4, line 14 of the specification is as follows: Correct. [Hm methods for optical parts are rapidly changing as processing jigs and abrasives are improved. In general, this method of polishing Enoki involves a rough sanding process in which pressed dough that has been previously formed into a processed shape is assembled, a sanding process in which the assembled processed parts are shaped into the desired shape, and a final finishing process. It consists of a polishing process. However, in order to reduce the demand and cost of optical components, high-speed and high-quality polishing methods are being developed one after another. For example, in the rabbit printing process, a distortion method using a curve generator device t (CG) has been developed. In other words, it has become possible to perform rough sanding in a short time in the conventional process mentioned above. In addition, in the process of traditional sand fields, the sand is soaked in water.
Drop the liquid onto the polishing surface and sand! 1J), which was processed using a sink plate.
Instead, a sheet polishing method using a sheet impregnated with metal powder, resin powder, or diamond powder, so-called precision gellining (PG), was developed, and continuous polishing has progressed along with mass production. Also,
In the final polishing process, polishing was performed without applying an abrasive to the polished surface, but with the advancement of polishing tools such as the PG mentioned above, child center processing has become faster, and polishing methods using water instead of abrasive has also been proposed. CG has been developed for the conventional rough-sanding process, and PG has been developed for the sanding process, but a processing method that can be used in combination with the semi-finishing fine polishing process and the final finishing process has not yet been developed. Its development has long been a desire in this technical field. The present invention aims to provide a polishing method that satisfies the above-mentioned requirements and a polishing tool used therein, and includes a step of assembling pressed dough formed into a workpiece material using a curve generator, and It consists of a PG process using abrasive grains impregnated with diamond powder, and a process of polishing the assembled processed parts with a solid abrasive polishing tool made of phenol resin, cerium oxide, and a hardening agent. The present invention provides a method for polishing optical components, and a polishing tool for optical components, which is obtained by heating a mixture of a phenol resin, cerium oxide, and a hardening agent, drying it forcibly, crushing it, and then shaping it. (2) In the figure, correct the deviation of Figure 6C on the attached sheet. 9. List of attached documents (1) Amendment drawings 1 copy Figure 6 (C)
Claims (2)
レーターにより紫成形する工程と、該素成形された加工
部品をフェノールレジンと、酸化セリウムと、嫉化剤と
よりなる后;彫砥粒の研M具にて研磨する工程とよりな
ることを特徴とする光学部品の研磨方法。(1) The process of purple-shaping the pressed dough formed on the workpiece material using a curve generator, and the process of turning the raw-formed workpiece into phenol resin, cerium oxide, and an abrasive agent; A method for polishing an optical component, comprising the steps of polishing with a polishing tool.
の混合物を加熱し、強itiUNmし、粗砕後「!(形
化してなる光学部品用研磨具。 (317エレールレジンを有機溶剤に俗解する工程と、
これに酸化セリウムと硬化剤とを添加し、均一に混合す
る工程と、混合物を加熱する工程と、加熱己れた混合物
を強制乾燥する工程と、乾燥された混合物を粉砕する工
程と、粗砕物を熱圧プレスにて固形化する工程とよりな
ることを特徴とする光学部品用研磨具の製造方法1、(2) A mixture of phenol resin, cerium oxide, and hardening agent is heated, hardened, and crushed into a polishing tool for optical parts. process and
A step of adding cerium oxide and a hardening agent to this and mixing it uniformly, a step of heating the mixture, a step of force drying the heated mixture, a step of pulverizing the dried mixture, and a step of crushing the mixture. A method for manufacturing an optical component polishing tool 1, characterized by comprising a step of solidifying it with a hot pressure press.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP687783A JPS59134647A (en) | 1983-01-19 | 1983-01-19 | Polishing method and tool of optical part |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP687783A JPS59134647A (en) | 1983-01-19 | 1983-01-19 | Polishing method and tool of optical part |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS59134647A true JPS59134647A (en) | 1984-08-02 |
Family
ID=11650449
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP687783A Pending JPS59134647A (en) | 1983-01-19 | 1983-01-19 | Polishing method and tool of optical part |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59134647A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6464766A (en) * | 1987-09-01 | 1989-03-10 | Tadatomo Suga | Machining method for specular surface of hard and brittle material and grinding wheel member used therefor |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5279398A (en) * | 1975-11-11 | 1977-07-04 | Showa Denko Kk | Polishing device for glass face finishing |
JPS5451091A (en) * | 1977-09-29 | 1979-04-21 | Fujimi Kenmazai Kougiyou Kk | Glass polishing material |
JPS54164083A (en) * | 1978-05-24 | 1979-12-27 | Minnesota Mining & Mfg | Fininggsheet*its preparation and fining method of vitreous surface |
-
1983
- 1983-01-19 JP JP687783A patent/JPS59134647A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5279398A (en) * | 1975-11-11 | 1977-07-04 | Showa Denko Kk | Polishing device for glass face finishing |
JPS5451091A (en) * | 1977-09-29 | 1979-04-21 | Fujimi Kenmazai Kougiyou Kk | Glass polishing material |
JPS54164083A (en) * | 1978-05-24 | 1979-12-27 | Minnesota Mining & Mfg | Fininggsheet*its preparation and fining method of vitreous surface |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6464766A (en) * | 1987-09-01 | 1989-03-10 | Tadatomo Suga | Machining method for specular surface of hard and brittle material and grinding wheel member used therefor |
JPH05170B2 (en) * | 1987-09-01 | 1993-01-05 | Tadatomo Suga |
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