JPS59131532A - Starting material feeder for optical fiber making - Google Patents
Starting material feeder for optical fiber makingInfo
- Publication number
- JPS59131532A JPS59131532A JP472983A JP472983A JPS59131532A JP S59131532 A JPS59131532 A JP S59131532A JP 472983 A JP472983 A JP 472983A JP 472983 A JP472983 A JP 472983A JP S59131532 A JPS59131532 A JP S59131532A
- Authority
- JP
- Japan
- Prior art keywords
- raw material
- optical fiber
- temperature
- vessels
- starting materials
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4485—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation without using carrier gas in contact with the source material
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/01413—Reactant delivery systems
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/80—Feeding the burner or the burner-heated deposition site
- C03B2207/85—Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid
- C03B2207/86—Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid by bubbling a gas through the liquid
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/80—Feeding the burner or the burner-heated deposition site
- C03B2207/85—Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid
- C03B2207/87—Controlling the temperature
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Manufacturing & Machinery (AREA)
- Light Guides In General And Applications Therefor (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は光フアイバ母材作製用の装置（こ、気化したガ
ラス原料を供給するための光フアイバ用原料供給装置（
こ関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an optical fiber base material manufacturing apparatus (this invention is an optical fiber raw material supplying apparatus for supplying vaporized glass raw materials).
Regarding this.
一般に光ファイバ母材は、液体のガラス原料とアルゴン
等のガスでバブリングして気化させ、気化したガラス原
料を加水分解し、得られたガラス粉末を所定の部材に堆
積させること１こよって作製されている。Generally, optical fiber preforms are manufactured by bubbling liquid glass raw material with a gas such as argon to vaporize it, hydrolyzing the vaporized glass raw material, and depositing the obtained glass powder on a predetermined member. ing.
したがってここでは少なくとも加水分解・堆積用の母材
作製装置と原料供給装置とが必要になる〇
本発明は後者の装置１こ係るものである。Therefore, here, at least a base material preparation device for hydrolysis/deposition and a raw material supply device are required. The present invention relates to the latter device 1.
ところで光ファイバ母相を作製する（こは、Ｓ ＩＣｔ
４ 、Ｇ ｅ Ｃｌ ４ 、Ｐ ＯＣｔ ３ 等の数
種のガラス原料を適当な比率で混合させ、これを堆積さ
せるのが一般である。By the way, the optical fiber matrix is prepared (here, S ICt
Generally, several types of glass raw materials such as 4, G e Cl 4 and P OCt 3 are mixed in an appropriate ratio and then deposited.
この場合（こはこれらガラス原料を種類別；こ原料容器
ζこ入れ、同容器を恒温槽中の熱溶媒に浸漬して液体の
ガラス原料を所定の温度ｌこ保持しておき、同原料中（
こアルゴン等のガスｆ ４人してバブリングを行なう。In this case, put these glass raw materials by type; place them in a raw material container, immerse the same container in a hot solvent in a constant temperature bath, and maintain the liquid glass raw material at a predetermined temperature. (
Four people perform bubbling with a gas such as argon.
そ９して気化したガラヌ原料ｋｍ当な比率で混合し、こ
れを堆積させる。Then, the vaporized galanu raw materials are mixed at an appropriate ratio per km, and this is deposited.
この混合比は液体のガラス原料の１ｌｆ１１１１度ト、
バブリング用のガスの流量と番こ依存するため、で佼体
ガラス原料の７晶度を適正に設定する必要がある０
ところで従来の原料供給装置として吹の代素的な２例を
挙げることができる。This mixing ratio is 1lf 1111 degrees of liquid glass raw material,
Since it depends on the flow rate and temperature of the gas for bubbling, it is necessary to set the crystallinity of the raw material for glass glass appropriately. can.
その１つは個々の原料容器を、各々独立しｆｃ＠温槽の
夫々に入れ、各恒温槽の温度を独立（こ設定するタイプ
であり、また１つは１つの恒温槽に総ての原料容器を入
れるタイプである。One is the type in which each raw material container is placed in each independent fc@temperature bath, and the temperature of each constant temperature bath is set independently (this type is set). It is a type that can be put in a container.
しかし前者においては、各恒扇槽毎【こ設けた温度制御
部を１つたく同等（こ調整することは困鐘で、必ず制御
部間に差が生じ、したがって各恒温槽を向一温度〔こ設
定することは不可能である。However, in the former case, it is equivalent to having one temperature control section installed in each thermostatic oven.It is difficult to adjust the temperature control section installed in each thermostatic oven. This setting is not possible.
また後者；こおいては温度制御部が１つであるため、前
者のような不都合（ま生じ′ｆＸ、１が、恒温槽が大き
くなるため、温度分布の問題が生じる。In the latter case, since there is only one temperature control section, the disadvantages of the former case ('f
そこでこの装置では熱溶媒を攪拌することｆこよって温
度の均一化を図っているが、温度分布の発生を抑制する
ことは内鍵てあった。Therefore, this device attempts to equalize the temperature by stirring the hot solvent, but the key is to suppress the occurrence of temperature distribution.
また多量の熱溶媒を必要とするため、不経済であり、さ
ら「こは装置が大型化１−る等の難点があった。Furthermore, since a large amount of hot solvent is required, it is uneconomical, and there are also disadvantages such as the size of the apparatus.
本発明は、原料容器の数１こ対応した数の恒温槽を用意
、し、１つの温度制御部から出る熱溶媒を各種に分配す
ると共ｆこ各分配；住♀調ｖ：゛ｊず旬こと（こよって
上記問題点を解決しようと１．／１９もので、これを図
面（こ示ず実施例を参１！＜Ｉ Ｌろ：がら説明すると
、第１図に示すよう番こ複数の＋１：ｌ：１１冒’！ｊ
Ｎ＋）（１）・・・・・は、配管系（２）ヲ介して温度
制御部（３）に連結さオしている。In the present invention, a number of constant temperature baths corresponding to the number of raw material containers are prepared, and the thermal solvent discharged from one temperature control section is distributed to various types. 1./19 In order to solve the above problem, this is explained in detail in the drawings (not shown). +1:l:11 de'!j
N+) (1)... are connected to the temperature control section (3) via a piping system (2).
配管系（２）は、温度制御部（３）に連結された上パイ
プ（２）ａと、主パイプ（２）ａから分岐しかつ各恒温
槽（１１（１）・・・・・（こ連結された分配パイプ（
２１ｂ、（２）ｂ・・・・・とから構成されている０上
記分配バイブ（２＋ １）、（２）ｂ・・・・・は６恒
、□１１冒曹ｔｌｌＦｌ）・・・・・の底部ｔｌ） ａ
、 ｉｌｌ ａ・・・・・に取りイー１けられるが、
その取付は位置は第２図（ａ） ｉこ示すよう］こ原料
容器（４）の直下か捷たは同図（ｂ）（こ示ずより１こ
底部（１）ａの周縁部であるのが好ましい。The piping system (2) includes an upper pipe (2) a connected to the temperature control section (3), and a main pipe (2) a that branches out from each thermostatic chamber (11 (1)). Connected distribution pipes (
21b, (2)b... 0 above distribution vibe (2+1), (2)b... is 6 constituencies, □11 profane tllFl)... bottom of tl) a
, ill a... will get you 1, but
The mounting position is either directly below the raw material container (4) as shown in Figure 2 (a) or at the periphery of the bottom (1) a (not shown) in Figure 2 (b). is preferable.
同図（＋）） ！こ示ず位置（こ取り付けること（こよ
り、熱溶媒（５）は矢印Ａで示すようＧこ原料容器（４
）を包むよう１こ上昇し、また同図（ｂ）！こ示す位置
（こルり伺けることにより、熱溶媒（５）は矢印Ｂで示
ずよう（こ原料容器（４）の周囲をら旋状をこ上昇する
。Same figure (+))! The thermal solvent (5) should be attached to the raw material container (4) as shown by arrow A.
) and rises by 1 to wrap around it, and the same figure (b)! By reaching the position shown here, the hot solvent (5) rises in a spiral around the raw material container (4) as shown by arrow B.
−ｉ ｆｃ第１図に示すように各分配バイブ（２１ｂ、
（２１ｂ・・・・・昏こは、熱溶媒（，５）の流量を調
節するための調節バルブ＋６１ （６）・・・・・が設
けられている０同バルブ２こよって流量を調節すること
：こよりｂ ＋ＩＩ ｆｉｌ （１）・・・・・内のＪ
ｌｌ’１度分布は笈化し、適当な’ｊＡＬ量（こ設定す
ることにより温度分布差を減少させることができる。-i fc As shown in Figure 1, each distribution vibrator (21b,
(21b...Koko is equipped with a regulating valve +61 (6)... for regulating the flow rate of the thermal solvent (,5).The flow rate is adjusted by the same valve 2. Koto: Koyori b +II fil (1)... J in...
The temperature distribution difference is reduced by setting an appropriate amount of 'jAL.
さら（こ各恒温槽１） （１１・・・・・の止部：こ：
ま環流バイブ（７＋ （７］・・・・・が取り（１けら
れており、これらバイア” ［７） ＋７＋・・・・・
（１１つ、こでとまって集液バイブ′（８）を（構成し
ている。(Each thermostatic chamber 1) (Stop part of 11...):
The circulation vibe (7+ (7)... is removed (1 is removed, these vias) [7] +7+...
(Eleven pieces are stopped together to form the liquid collection vibrator' (8).
この集液パイプ（８）は配管系・、２）１こ１ル結さ凡
て、１つの１盾環路を形成している。The liquid collection pipes (8) are connected together to form one shield loop.
この循環路の中途、Ｌｌ（］ちｊ己−＃糸（２）と集Ｃ
戊バイブ（８）との境界（こは！ｉｔａ度制御部（３）
とポンプｆｌｏｌとが設けられている。In the middle of this circulation path, Ll(]chijself-#thread(2) and collection C
Boundary with Bo Vibrator (8) (Koha! Ita degree control part (3)
and a pump flol are provided.
この、；清度ｒｊ制御部（３）は第３図に示すよ″）に
、熱交換器Ｕと、この熱交換器Ｕυの温度を調節するた
めの温度調節計（１２１と、熱交換器（１１１から出る
熱溶媒（５ンの＋１漬度を検出しかつその情報を澗度調
１１ｉｉ計０ｚに送る温度検出器０３）とから構成され
ている。The cleanliness rj control unit (3) as shown in FIG. (Temperature sensor 03 which detects the +1 soaking degree of 5th and sends the information to the temperature scale 11ii total 0z) which comes out from the thermal solvent 111.
かかる温度制御部（３）９こよって所定の温度（こ設定
された熱溶媒（５１は配管系（２］を経て恒温槽ｉｌｌ
（１）・・・・・内に流入し、さらにそこから環流バ
イブ（刀（７）・・・・・を介して流出し、集液バイブ
（８）から温度制御部（３）（こ到る。The temperature control unit (3) 9 controls the predetermined temperature (the set thermal solvent (51 is the constant temperature bath ill) via the piping system (2).
(1)... from there, flows out through the reflux vibe (sword (7)...), and flows from the collection vibe (8) to the temperature control section (3) (to the temperature control section (3)). Ru.
この熱溶媒（５）の循環はポンプθ１こよって行なわれ
る。Circulation of this thermal solvent (5) is performed by pump θ1.
ところで各恒温槽［１） （１）・・・・・には原料容
器（４）（４）・・・・・が入れられ、同容器中の液体
ガラス原料（４）ａは熱溶媒（５月こよって所定の温度
に設定される。By the way, raw material containers (4) (4)... are placed in each constant temperature bath [1) (1)..., and the liquid glass raw material (4)a in the same container is heated to a thermal solvent (5 The temperature is set to a predetermined temperature depending on the month.
これら原料容器（４） ｉ４）・・・・・番こは供給系
Ｑ弔を介してアルゴン等の所定ガスが導入され、液体の
ガラス原料（４）ａは同ガスによるパブリンク真こよっ
て気化する。A predetermined gas such as argon is introduced into these raw material containers (4) i4) through the supply system Q, and the liquid glass raw material (4) a is vaporized by the gas. do.
気化したガラス原料はｔｌＩｌ呆気ωを介して図示しな
い光フアイバ母材作製装置に送られる。The vaporized glass raw material is sent to an optical fiber base material manufacturing device (not shown) via the tlIl vapor ω.
以上のようＧこ本発明におｌ／１ては、原料容器の数に
対応した数の恒ｌ晶槽の夫々に温度制御部から流出する
熱溶媒を分配すると八に熱溶媒の流量を調節自在とした
ので、各恒温槽番こは同一の温度制御部からの熱溶媒が
供給されることになり、したがって各恒温槽はほぼ同一
の温度（こ保持されるため、原料容器中の液体ガラス原
料間（こおける温度差は極めてよく低減化され、例えば
３ Ｍｌのガラス原料間蟇こおける温度分布を±０２℃
以下にすることができる。As described above, in the present invention, when the thermal solvent flowing out from the temperature control section is distributed to each of the constant temperature crystal tanks of the number corresponding to the number of raw material containers, the flow rate of the thermal solvent is adjusted in 8 steps. Since the temperature control unit is freely adjustable, each constant temperature bath is supplied with hot solvent from the same temperature control unit, and therefore each constant temperature bath is maintained at almost the same temperature (this temperature is maintained so that the temperature of the liquid glass in the raw material container is maintained). The temperature difference between the raw materials (in the chamber) is extremely reduced, for example, the temperature distribution between the glass raw materials of 3 ml is ±02℃.
It can be:
このためガラス原料の混合比が安定することになり、し
たがって元ファイバの屈折率分布の再現性が向上するこ
とτこなる。Therefore, the mixing ratio of the glass raw materials becomes stable, and therefore the reproducibility of the refractive index distribution of the original fiber improves.
また熱溶媒の量は、恒温槽が１つの場合に比べ半分です
むこと（こなり、コストの低減化も図れること１こｌる
。In addition, the amount of thermal solvent can be reduced to half compared to when there is only one constant temperature bath (this also reduces costs).
第１図は本発明に係る装置の略示断面図、第２図（ａ）
（ｂ）は分配バイブの取付は位置と熱溶媒の流れとの関
係を示す説明図、第３図は温度制御部の構成を示す略示
図である。
（１）・・・・・恒温槽
（２）・・・・・配管系
（３）・・・・・湿度制御部
（４）・・・・・原料容器
（５）・・・・・熱溶媒
（６）・・・・・調節バルブFig. 1 is a schematic cross-sectional view of the device according to the present invention, Fig. 2(a)
(b) is an explanatory diagram showing the relationship between the mounting position of the distribution vibrator and the flow of the thermal solvent, and FIG. 3 is a schematic diagram showing the configuration of the temperature control section. (1)... Constant temperature chamber (2)... Piping system (3)... Humidity control section (4)... Raw material container (5)... Heat Solvent (6)・・・Adjustment valve
Claims (2)
、該原料容器を所定の温度に保持するための恒γ晶槽と
、該恒温槽（こ供給される熱溶媒を所定の温度に設定す
るための温度制御部と、上記ガラス原料中にアルゴン等
の所定のガスを導入するための供給系と、同ガスのバブ
リング１こよって気化したガラス原料を光フアイバ母材
作製装置（こ供給するためのす［気系とを有する光フア
イバ用原料供給装置において、上記原料容器の数に対応
する数の恒温槽と、各恒温！）こ上記ｉ１Ｊ御部から流
出する熱溶媒を分配するための配管系と、該配管系を介
して各ｍ泥槽に流入する熱溶媒の流量を調節するための
調節バルブとを有していることを特徴とする光フアイバ
用原料供給装置。(1) A raw material container for containing a liquid glass raw material, a constant gamma crystal bath for maintaining the raw material container at a predetermined temperature, and a constant temperature bath (for setting the supplied thermal solvent to a predetermined temperature) a supply system for introducing a predetermined gas such as argon into the glass raw material; and a supply system for introducing a predetermined gas such as argon into the glass raw material; In the optical fiber raw material supply device having a gas system, there are a number of constant temperature chambers corresponding to the number of raw material containers, and each constant temperature!) piping for distributing the thermal solvent flowing out from the i1J control section above. What is claimed is: 1. A raw material supply device for optical fiber, characterized in that it has a control valve for adjusting the flow rate of the thermal solvent flowing into each m mud tank via the piping system.
分備えており、夫々の分配パイプは原料容器の直下にお
ける恒温槽の底部（こ取り付けられていることを特徴と
する特許請求の範囲第１項記載の光ファイバ母利用原料
供給装置。 （３ン 配管系は各垣／ｌｌｌ１槽ｌこ連結された分
配パイプを備えており、夫々の分配パイプは恒温槽底部
の周経部に設けられていると共（こ同バイブは同底部５
こ対し傾斜して取り付けられていることを特徴とする特
許請求の範囲第１項記載の光ファイバ母材川原ｆ−１洪
給装置。(2) The piping system is equipped with a distribution vibrator connected to each thermostatic chamber, and each distribution pipe is attached to the bottom of the thermostatic chamber directly below the raw material container. The raw material supply device using an optical fiber motherboard as described in item 1. (This vibrator is the same bottom 5
The optical fiber preform Kawahara f-1 feeding device according to claim 1, wherein the optical fiber preform Kawahara f-1 feeding device is installed at an angle with respect to the optical fiber preform.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP472983A JPS59131532A (en) | 1983-01-14 | 1983-01-14 | Starting material feeder for optical fiber making |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP472983A JPS59131532A (en) | 1983-01-14 | 1983-01-14 | Starting material feeder for optical fiber making |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59131532A true JPS59131532A (en) | 1984-07-28 |
| JPH033619B2 JPH033619B2 (en) | 1991-01-21 |
Family
ID=11591981
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP472983A Granted JPS59131532A (en) | 1983-01-14 | 1983-01-14 | Starting material feeder for optical fiber making |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59131532A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62207725A (en) * | 1986-03-07 | 1987-09-12 | Furukawa Electric Co Ltd:The | Device for vaporizing liquid glass material |
-
1983
- 1983-01-14 JP JP472983A patent/JPS59131532A/en active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62207725A (en) * | 1986-03-07 | 1987-09-12 | Furukawa Electric Co Ltd:The | Device for vaporizing liquid glass material |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH033619B2 (en) | 1991-01-21 |
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