JPS59111610A - Automatic focusing device - Google Patents

Automatic focusing device

Info

Publication number
JPS59111610A
JPS59111610A JP57220251A JP22025182A JPS59111610A JP S59111610 A JPS59111610 A JP S59111610A JP 57220251 A JP57220251 A JP 57220251A JP 22025182 A JP22025182 A JP 22025182A JP S59111610 A JPS59111610 A JP S59111610A
Authority
JP
Japan
Prior art keywords
differential pressure
wafer
output
adder
adjusting device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP57220251A
Other languages
Japanese (ja)
Inventor
Seishiro Sato
佐藤 征四郎
Soichiro Hayashi
林 聰一郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP57220251A priority Critical patent/JPS59111610A/en
Publication of JPS59111610A publication Critical patent/JPS59111610A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/28Systems for automatic generation of focusing signals

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Automatic Focus Adjustment (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To improve the reproducibility of the scale of a needle bulb and to improve operativity by providing a bias adjusting device at the output of a differential pressure transformer, adding both outputs, and operating a servomechanism so that the addition output is ceased. CONSTITUTION:The adder 13 is connected to the differential pressure transformer 8 and bias adjusting device 12. A motor 6 is connected to the output terminal of this adder 13 through an amplifier 7. The adder 13 adds the outputs of the differential pressure transformer 8 and adjusting device 12 together to operate the servomechanism so that the output of the adder is ceased. Therefore, the adjusting device 12 is adjusted to perform through focusing. This is carried out electrically, so automation by computer control is extremely easy to obtain good reproducibility and also to improve the reliability and operativity.

Description

【発明の詳細な説明】 〔発明の利用分野〕 本発明は対物レンズとウエノ・間の距離を電気的に調整
する自動焦点装置に係り、特に、正焦点位置を見い出す
のに好適な自動焦点装置に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Application of the Invention] The present invention relates to an automatic focusing device that electrically adjusts the distance between an objective lens and an objective lens, and particularly to an automatic focusing device suitable for finding a positive focus position. Regarding.

〔従来技術〕[Prior art]

従来の自動焦点装置は、第1図に示す如き構成を有して
いる。この第1図は縮少投影露光装置に於けるオートフ
ォーカスの構成である。すなわち、圧力源11から供給
された空気は三方に分岐され、その一方の差圧変換器8
の一方の入力に供給され他の一方はニードルバルブ19
を経由してエアマイクロ2に供給されエアマイクロ2と
ウェハ3間のギャップから大気に放出される。従がって
、エアマイクロ内の圧力が差圧変換器の他の一方の入力
となっている。
A conventional automatic focusing device has a configuration as shown in FIG. FIG. 1 shows an autofocus configuration in a reduction projection exposure apparatus. That is, the air supplied from the pressure source 11 is branched into three directions, and the differential pressure converter 8
is supplied to one input of the needle valve 19 and the other is supplied to one input of the needle valve 19.
The air is supplied to the air micro 2 via the air micro 2, and is released into the atmosphere from the gap between the air micro 2 and the wafer 3. Therefore, the pressure within the air micro is the other input to the differential pressure converter.

このとき差圧変換器の二つの入力間に圧力の差があると
その差の大きさに見合った電気出力を差圧変換器から取
り出すことが出来る。
At this time, if there is a pressure difference between the two inputs of the differential pressure converter, an electrical output commensurate with the magnitude of the difference can be extracted from the differential pressure converter.

その出力をアンプ7により増巾しモータ6を駆動して、
くさび5を矢印Aの方向に移動することによってウェハ
支持分4を矢印Bの方向に移動させエアマイクロ2とウ
ェハ3間の距離を変化させる。このとききよりの変化方
向は差圧変換器の入力差がなくなる方向に変化するとい
う位置サーボ機構をとっているのでウエノ・の厚みが変
化したり凹凸があってもウェハ3とレンズ1間の即離は
一定に保つことが出来る。
The output is amplified by the amplifier 7 to drive the motor 6,
By moving the wedge 5 in the direction of arrow A, the wafer support 4 is moved in the direction of arrow B to change the distance between the air micro 2 and the wafer 3. At this time, the position servo mechanism is used in which the direction of change in the pressure changes in the direction that eliminates the input difference of the differential pressure converter, so even if the thickness of the wafer changes or there are irregularities, the gap between the wafer 3 and the lens 1 Immediate separation can be kept constant.

このような装置に於てはウェハ3の位置は第3図の如く
通常はレチクル14とレンズ1間の即離は固定としてお
き、ウェハ3を上下させることによって正しく焦点がウ
ェハ上に(rすげれるよう方位置をさがす必要がある。
In such an apparatus, the position of the wafer 3 is usually fixed so that the immediate separation between the reticle 14 and the lens 1 is fixed as shown in FIG. It is necessary to find a suitable position so that it can be seen.

その手段としては第4図の如くウェハを光軸方向に階段
状に変化させながら露光を第5図に示す如く1〜25の
ようにくりかえし、現像処理して最も解像度の高い位置
を正焦点位置としてウエノ・の高さを調整する方法がと
られている。またウェハの高さを光軸方向に変化させる
手段としては第1図に於けるニードルバルブ9あるいは
ニードルバルブ10の目盛を記録しながら変化させる方
法がとられている。
As a means of achieving this, as shown in Fig. 4, the wafer is changed stepwise in the optical axis direction, and the exposure is repeated from 1 to 25 as shown in Fig. 5, and the position with the highest resolution is placed at the positive focal point by developing. As a result, a method is used to adjust the height of the ueno. Further, as a means for changing the height of the wafer in the optical axis direction, a method is used in which the height of the wafer is changed while recording the scale of the needle valve 9 or 10 shown in FIG.

この従来の方法は空気圧を変化させることによってウェ
ハ位置を変化させるもので装置が大きくなり、機械的に
行なうもので自動化が困難である。
This conventional method changes the wafer position by changing air pressure, which requires a large apparatus, and is mechanically performed, making automation difficult.

また最も解像度の高かった目盛に調整してもニードルバ
ルブの性質からバックラッシュ等のため再現性が悪い、
等の欠点があった。
Also, even if you adjust to the scale with the highest resolution, the reproducibility is poor due to backlash due to the nature of the needle valve.
There were other drawbacks.

〔発明の目的〕[Purpose of the invention]

本発明の目的は、ニードルバルブの目盛に対する距離の
再現性が良く、かつ」1■作性を高めることのできる自
動焦点装置を提供することにある。
SUMMARY OF THE INVENTION An object of the present invention is to provide an automatic focusing device that has good reproducibility of the distance to the scale of a needle valve and can improve productivity.

〔発明の概要〕[Summary of the invention]

本発明は、差圧変換器の出力にバイアス調整器を設け、
加算器により両者の加算を行ない、該加算器の出力が零
になるようにサーボ機構させることにより、再現性を良
くシ、かつ操作性を高めようというものである。
The present invention provides a bias regulator at the output of the differential pressure converter,
The purpose is to improve reproducibility and operability by adding the two using an adder and using a servo mechanism so that the output of the adder becomes zero.

〔発明の実施例〕[Embodiments of the invention]

以下、本発明の実施例について説明する。 Examples of the present invention will be described below.

第2図には、本発明の一実施例が示されている。FIG. 2 shows an embodiment of the invention.

図において、差圧変換器8とバイアス調整器12には、
加算器13が接続されている。この加算器13の出力端
には、アンプ7を介してモータ6が接続されている。
In the figure, the differential pressure converter 8 and bias regulator 12 include:
An adder 13 is connected. A motor 6 is connected to the output end of the adder 13 via an amplifier 7.

第1図の従来例に於ても、差圧変換器の出力が常にゼロ
になるようにサーボ機構が作動するのでニードルバルブ
9又はニードルバルブ10を調整することによってウェ
ハの高さを変えることができる。第2図の実施例は、差
圧変換器8の出力に、バイアス調整器12を設け、加算
器13で両者の加算を行なうことによって加算器の出力
が0になるようにサーボ機構をさせるものである。
In the conventional example shown in FIG. 1, the servo mechanism operates so that the output of the differential pressure converter is always zero, so the height of the wafer can be changed by adjusting the needle valve 9 or 10. can. In the embodiment shown in FIG. 2, a bias adjuster 12 is provided at the output of the differential pressure converter 8, and an adder 13 adds the two, thereby causing a servo mechanism so that the output of the adder becomes 0. It is.

したがつ−5、本実施例によれば、バイアス調整器12
を調整することによってスルーフォーカス全行なうこと
が出来る。即ち電気的に行なうことが出来るのでコンピ
ュータ制御による自動化が極めて容易で必り、また電気
的に行なうので再現性もよく、信頼性を高め操作性を高
めることが可能である。
Therefore, according to the present embodiment, the bias adjuster 12
Full through focus can be achieved by adjusting the . That is, since it can be carried out electrically, automation by computer control is extremely easy, and since it is carried out electrically, the reproducibility is good and it is possible to improve reliability and operability.

〔発明の効果〕〔Effect of the invention〕

以上説明したように、本発明によれば、ニードルバルブ
の目盛に対する即離の再現性が良く、かつ操作性を高め
ることができる。
As described above, according to the present invention, the reproducibility of instant release with respect to the scale of the needle valve is good, and the operability can be improved.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来の自動焦点装置の構成図、第2図は本発明
の実施例を示す回路図、第3図はレチクル原画とレンズ
とウェハの相対位置関係を示す図、第4図は従来の装置
に於るニードルバルブの目盛とウェハの位置を示す図、
第5図はウェハ上に露光されたチップの状態を示す図で
ある。 7・・・アンプ、8・・・差圧変換器、12・・・バイ
アス調TJMI 第4m ÷5m 43−
Fig. 1 is a configuration diagram of a conventional autofocus device, Fig. 2 is a circuit diagram showing an embodiment of the present invention, Fig. 3 is a diagram showing the relative positional relationship between a reticle original image, a lens, and a wafer, and Fig. 4 is a conventional autofocus device. A diagram showing the scale of the needle valve and the position of the wafer in the device,
FIG. 5 is a diagram showing the state of chips exposed on a wafer. 7...Amplifier, 8...Differential pressure converter, 12...Bias adjustment TJMI 4th m ÷5m 43-

Claims (1)

【特許請求の範囲】[Claims] 1、縮少投影霧光装置のウエノ・と対物レンズ間に構成
されるエアマイクロ機構における該エアマイクロの背圧
及び基準圧をそれぞれ差圧変換器の2つの入力に供給し
、両者の差圧によって発生する差圧変換器の出力全上記
ウエノ・を支持するウエノ・支持台の上下機構の駆動信
号とすることにより上記ウェハと対物レンズ間の距離を
制御する自動焦点装置において、上記差圧変換器からの
出力電圧にバイアス電圧を加算し該バイアス電圧を外部
より変化させることによりウエノ・と対物レンズ間の距
離を制御するようにしたことを特徴とする自動焦点装置
1. The back pressure and reference pressure of the air micro in the air micro mechanism configured between the Ueno lens and the objective lens of the reduction projection fog light device are respectively supplied to the two inputs of the differential pressure converter, and the differential pressure between the two is In an automatic focusing device that controls the distance between the wafer and the objective lens by using the output of the differential pressure converter generated by the wafer as a drive signal for the vertical mechanism of the wafer support stand that supports the wafer, the differential pressure converter An automatic focusing device characterized in that the distance between the lens and the objective lens is controlled by adding a bias voltage to the output voltage from the device and changing the bias voltage from the outside.
JP57220251A 1982-12-17 1982-12-17 Automatic focusing device Pending JPS59111610A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57220251A JPS59111610A (en) 1982-12-17 1982-12-17 Automatic focusing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57220251A JPS59111610A (en) 1982-12-17 1982-12-17 Automatic focusing device

Publications (1)

Publication Number Publication Date
JPS59111610A true JPS59111610A (en) 1984-06-27

Family

ID=16748254

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57220251A Pending JPS59111610A (en) 1982-12-17 1982-12-17 Automatic focusing device

Country Status (1)

Country Link
JP (1) JPS59111610A (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5276590A (en) * 1975-12-22 1977-06-28 Nippon Chemical Ind Automatic focussing apparatus in microscope
JPS5535324A (en) * 1978-09-04 1980-03-12 Hitachi Ltd Automatic focusing device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5276590A (en) * 1975-12-22 1977-06-28 Nippon Chemical Ind Automatic focussing apparatus in microscope
JPS5535324A (en) * 1978-09-04 1980-03-12 Hitachi Ltd Automatic focusing device

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