JPS59111290A - Method of forming electrode of semiconductor heater - Google Patents
Method of forming electrode of semiconductor heaterInfo
- Publication number
- JPS59111290A JPS59111290A JP21987382A JP21987382A JPS59111290A JP S59111290 A JPS59111290 A JP S59111290A JP 21987382 A JP21987382 A JP 21987382A JP 21987382 A JP21987382 A JP 21987382A JP S59111290 A JPS59111290 A JP S59111290A
- Authority
- JP
- Japan
- Prior art keywords
- metal
- electrode
- semiconductor
- heater
- semiconductor heater
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Resistance Heating (AREA)
- Coating By Spraying Or Casting (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
技術分野
本発明は、セラミンク半導体素子に金属を溶射すること
により電極を形成する方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION Technical Field The present invention relates to a method of forming electrodes by spraying metal onto a ceramic semiconductor element.
背景技術
従来、例えば正温度特性の半導体ヒータを構成する場合
で、セラミック半導体磁器の多数の貫通孔を有する面に
電極を形成するにあたり、アルミニウム、真ちゅう等の
金属を高温にして吹付ける金属溶射法を適用するのがよ
いことが知られている(特公昭54−30133号)。BACKGROUND ART Conventionally, when forming an electrode on a surface of a ceramic semiconductor porcelain having many through holes, for example when configuring a semiconductor heater with positive temperature characteristics, a metal spraying method is used in which metal such as aluminum or brass is sprayed at a high temperature. It is known that it is good to apply (Japanese Patent Publication No. 54-30133).
然し、この金属溶射法では金属を溶射するだけで電極を
刺着成形するのみであるため、電極層の付着強度が弱く
しかも電極の固有抵抗が大きくて、例えば半導体ヒータ
としての性能に劣りまた使用耐久性に欠けるものになっ
てしまう。However, in this metal spraying method, the metal is simply sprayed and the electrodes are formed by pricking, so the adhesion strength of the electrode layer is weak and the specific resistance of the electrodes is large, resulting in poor performance as a semiconductor heater, for example, and making it difficult to use. It ends up lacking in durability.
発明の開示
本発明は、斯る欠点を解消し得る半導体ヒータの電極形
成方法を提供すること、を[」的とする。DISCLOSURE OF THE INVENTION It is an object of the present invention to provide a method for forming electrodes of a semiconductor heater that can eliminate the above-mentioned drawbacks.
即ち、本発明に係る電極の形成方法においては、電極を
形成す□る金属を溶射刺着した後、その金属層を適宜温
度で加熱焼付けするようにされている。That is, in the method for forming an electrode according to the present invention, after the metal forming the electrode is deposited by thermal spraying, the metal layer is heated and baked at an appropriate temperature.
発明を実施するための最良の形態
以下、これを図示実施例に基づいて説明すれば、次の通
りである。BEST MODE FOR CARRYING OUT THE INVENTION The following is a description of the best mode for carrying out the invention based on illustrated embodiments.
この実施例は半導体ヒータを構成するものであり、中空
円盤形状をしたセラミック半導体素子lの多数の貫通孔
を有する表面に電極2を形成することが行なわれている
。This embodiment constitutes a semiconductor heater, and electrodes 2 are formed on the surface of a ceramic semiconductor element 1 in the shape of a hollow disk, which has a large number of through holes.
この電極2は、アルミニウム、真ちゅう等の金属を高温
にし、溶射装置で半導体素子lの貫通孔を有する面に吹
(=4けることにより金属層として形成する。この溶射
処理は、貫通孔の内部にまで金属をイ=J着しないよう
にするため、10°〜60°の角度より金属を溶射する
ことが望ましい。その溶射処理後、金属層には加熱炉内
で焼付は処理を施す。この加熱処理は金属層を酸化しな
い程度で行うのがよく、具体的には450℃〜600℃
の温度下で10分程度加熱焼付けすれば足りる。This electrode 2 is formed as a metal layer by heating a metal such as aluminum or brass to a high temperature and spraying it on the surface of the semiconductor element l having the through hole using a thermal spraying device.This thermal spraying process is carried out inside the through hole. In order to prevent the metal from sticking to the surface, it is desirable to spray the metal from an angle of 10° to 60°.After the spraying process, the metal layer is baked in a heating furnace. The heat treatment is preferably carried out at a level that does not oxidize the metal layer, specifically at 450°C to 600°C.
It is sufficient to heat and bake for about 10 minutes at a temperature of .
このように焼付は処理すると、金属層が高密度になり、
金属の固相焼結により半導体素子lの表面に強固に付着
ししかも固有抵抗を半減することができる。When baked in this way, the metal layer becomes denser,
By solid-phase sintering of metal, it is possible to firmly adhere to the surface of the semiconductor element 1 and reduce the specific resistance by half.
このセラミンク半導体Aは、その両面の電極を金属板材
で形成した給電板B、Cに夫々接触させて挟持し、それ
を耐熱性絶縁樹脂で形成した枠板りに取付は固定するこ
とにより、半導体ヒータを構成するに用いることができ
る。この半導体ヒータでは半導体Aを介して給電板B、
C及び枠板りの開孔を通ずるエアーを吹込み、温風器等
とじてセラミック半導体Aの発熱を利用できるものであ
るが、この場合でも電極が半導体素子1の表面に強固に
付着しているため、エアーの吹出し側に電極が位置する
ようセラミ、り゛に導体Aを取+1け配置しても電極層
が風圧で剥離してしまうことがない。This ceramic semiconductor A is sandwiched by bringing the electrodes on both sides into contact with power supply plates B and C made of metal plates, respectively, and is fixed to a frame plate made of a heat-resistant insulating resin. It can be used to construct a heater. In this semiconductor heater, a power supply plate B,
The heat generated by the ceramic semiconductor A can be utilized by blowing air through the openings in the C and frame plate and using a hot air heater, etc. However, even in this case, the electrodes are firmly attached to the surface of the semiconductor element 1. Therefore, even if the conductor A is placed on the ceramic plate so that the electrode is located on the air blowing side, the electrode layer will not peel off due to wind pressure.
発明の効果
このように、本発明に係る電極の形成方法に依れば、電
極の付着強度を向上しまた固有抵抗も半減できるため、
半導体ヒータ等としての性能を良好にししかも使用耐久
性を高め得るようになる。Effects of the Invention As described above, according to the electrode forming method according to the present invention, the adhesion strength of the electrode can be improved and the specific resistance can be halved.
The performance as a semiconductor heater or the like can be improved and the durability in use can be increased.
第1図は本発明に係る電極の形成方法を示す説明図、第
2図は同方法で得た半導体素子を組込んだ半導体ヒータ
の斜視図である。
1−電極を形成する半導体素r、2:金属電極層。FIG. 1 is an explanatory diagram showing a method for forming an electrode according to the present invention, and FIG. 2 is a perspective view of a semiconductor heater incorporating a semiconductor element obtained by the same method. 1 - semiconductor element r forming an electrode; 2: metal electrode layer;
Claims (1)
溶射付着した後、その金属層を酸化しない程度の温度で
加熱焼伺けしたことを特徴とする半導体ヒータの電極形
成方法。1. A method for forming an electrode for a semiconductor heater, which comprises depositing a metal to form an electrode by thermal spraying on a desired surface of a ceramic semiconductor element, and then heating and burning the metal layer at a temperature that does not oxidize it.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21987382A JPS59111290A (en) | 1982-12-15 | 1982-12-15 | Method of forming electrode of semiconductor heater |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21987382A JPS59111290A (en) | 1982-12-15 | 1982-12-15 | Method of forming electrode of semiconductor heater |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS59111290A true JPS59111290A (en) | 1984-06-27 |
Family
ID=16742391
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP21987382A Pending JPS59111290A (en) | 1982-12-15 | 1982-12-15 | Method of forming electrode of semiconductor heater |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59111290A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62297452A (en) * | 1986-05-05 | 1987-12-24 | ゼネラル・エレクトリツク・カンパニイ | Formation of high quality plasma spraying deposit having complicated geometrical shape |
JPS63451A (en) * | 1986-05-05 | 1988-01-05 | ゼネラル・エレクトリツク・カンパニイ | Formation of wide area high quality plasma spraying deposit |
JPH04209877A (en) * | 1990-12-06 | 1992-07-31 | Kashiyuu Internatl Trading:Kk | Luminescent article and discrimination of the same article |
-
1982
- 1982-12-15 JP JP21987382A patent/JPS59111290A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62297452A (en) * | 1986-05-05 | 1987-12-24 | ゼネラル・エレクトリツク・カンパニイ | Formation of high quality plasma spraying deposit having complicated geometrical shape |
JPS63451A (en) * | 1986-05-05 | 1988-01-05 | ゼネラル・エレクトリツク・カンパニイ | Formation of wide area high quality plasma spraying deposit |
JPH04209877A (en) * | 1990-12-06 | 1992-07-31 | Kashiyuu Internatl Trading:Kk | Luminescent article and discrimination of the same article |
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