JPS5911101B2 - Photosensitive plate for electrophotography - Google Patents

Photosensitive plate for electrophotography

Info

Publication number
JPS5911101B2
JPS5911101B2 JP49109481A JP10948174A JPS5911101B2 JP S5911101 B2 JPS5911101 B2 JP S5911101B2 JP 49109481 A JP49109481 A JP 49109481A JP 10948174 A JP10948174 A JP 10948174A JP S5911101 B2 JPS5911101 B2 JP S5911101B2
Authority
JP
Japan
Prior art keywords
photosensitive plate
weight
oxide
photoconductive layer
photoconductive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP49109481A
Other languages
Japanese (ja)
Other versions
JPS5136945A (en
Inventor
昭七 加藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ricoh Co Ltd
Original Assignee
Ricoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ricoh Co Ltd filed Critical Ricoh Co Ltd
Priority to JP49109481A priority Critical patent/JPS5911101B2/en
Publication of JPS5136945A publication Critical patent/JPS5136945A/ja
Publication of JPS5911101B2 publication Critical patent/JPS5911101B2/en
Expired legal-status Critical Current

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  • Photoreceptors In Electrophotography (AREA)

Description

【発明の詳細な説明】 本発明は電子写真用感光板に関し、詳しくは特定な組成
比を有する無機ガラス結着剤を使用し、これに光導電性
物質を分散して焼結した光導電層が導電性支持体上に設
けられている電子写真用感光板に係る。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a photosensitive plate for electrophotography, and more specifically, a photoconductive layer comprising an inorganic glass binder having a specific composition ratio, a photoconductive substance dispersed therein, and sintered. The present invention relates to an electrophotographic photosensitive plate provided on a conductive support.

従来より、硫化カドミウム、酸化亜鉛その他の無機光導
電性物質の微粉体を感光板に仕上げるには各種の絶縁性
の結合剤が使用されている。
Conventionally, various insulating binders have been used to finish fine powders of cadmium sulfide, zinc oxide, and other inorganic photoconductive substances into photosensitive plates.

分散媒としての性質をもつこの結合剤は誘電率が大きく
、絶縁性のすぐれたもので、好ましくは無色透明でフィ
ルム形成能のすぐれたものが望ましいとされている。そ
の為、一般には天然または合成樹脂が最も多く採用され
、中でもシリコン樹脂、スチレンゴム、酢酸ビニル樹脂
が多く使用されている。しかし乍ら、こうした樹脂結着
剤を使用した場合には感光板は機械的強度、耐摩耗性、
耐熱性、耐コロナ性、耐溶剤性などについて問題があり
、従つてこれらをも満足するような電子写真用感光板の
出現が要望されていた。こうした要望に添うものとして
無機物質の結着剤を使用したセラミック感光板が提案さ
れた(特公昭41−17186号公報)。
This binder, which has properties as a dispersion medium, has a high dielectric constant and excellent insulating properties, and is preferably colorless and transparent and has excellent film-forming ability. Therefore, in general, natural or synthetic resins are most commonly used, and among them, silicone resin, styrene rubber, and vinyl acetate resin are often used. However, when such a resin binder is used, the photosensitive plate has poor mechanical strength, abrasion resistance,
There are problems with heat resistance, corona resistance, solvent resistance, etc., and therefore there has been a demand for an electrophotographic photosensitive plate that satisfies these properties. To meet these demands, a ceramic photosensitive plate using an inorganic binder has been proposed (Japanese Patent Publication No. 17186/1986).

このセラミック感光板は耐摩耗性、機械的強度などの点
ですぐれたものであるが、結着剤(無機ガラス結着剤)
にアルカリ性物質を多く使用しているため暗抵抗が高く
なく、また光導電層を得るのに焼成が行なわ15れるが
その際にアルカリ性物質が表面に浮いてしまう傾向が避
けられず、そのため光導電層が均一なものになりにくい
欠点がある。また表面抵抗が低いため例えばべんがらで
パラ研磨するという表面処理が必要となり、簡単には感
光板が得られな20いという欠点がある。本発明者は長
期にわたつて電子写真用感光板に採用しうる無機結着剤
の研究を行なつてきたが、無機結着剤として酸化ビスマ
ス50〜90重量%、酸化ホウ素9〜30重量%および
酸化コバルト250.001〜5重量%よりなる無機ガ
ラス結着剤の使用によれば、各種性能を充分満足できる
光導電層が得られることを知見した。
This ceramic photosensitive plate has excellent abrasion resistance and mechanical strength, but it has a binder (inorganic glass binder).
Since a large amount of alkaline substances are used in the photoconductive layer, the dark resistance is not high, and when baking is performed to obtain the photoconductive layer, the alkaline substances inevitably tend to float to the surface. The disadvantage is that it is difficult to form a uniform layer. In addition, since the surface resistance is low, surface treatment such as para-polishing with a red iron is required, and there is a drawback that a photosensitive plate cannot be easily obtained. The present inventor has been conducting research on inorganic binders that can be used in electrophotographic photosensitive plates for a long time, and found that bismuth oxide (50 to 90% by weight) and boron oxide (9 to 30% by weight) are used as inorganic binders. It has been found that by using an inorganic glass binder containing 250.001 to 5% by weight of cobalt oxide, a photoconductive layer can be obtained that fully satisfies various performances.

本発明はこれに基づいて完成されたものである。すなわ
ち本発明は、Bi20350〜90重量%、30B20
39〜30重量%およびC000.001〜5重量%を
必須成分とし、必要によりCd00〜30重量%および
Ca00〜30重量%を添加した無機ガラス結着剤中に
光導電性物質を分散し、これを導電性物質が変質しない
温度範囲内で、好35ましくはこれを導電性支持体上で
低温で乾燥し、クラックが入る寸前に400〜800℃
の温度範囲内で焼結して得られた電子写真用感光板であ
る。
The present invention has been completed based on this. That is, in the present invention, Bi20350 to 90% by weight, 30B20
A photoconductive substance is dispersed in an inorganic glass binder containing 0.001 to 5% by weight of Cd and 0.001 to 5% by weight as essential components, and 00 to 30% by weight of Cd and 00 to 30% of Ca added as necessary. Dry it at a low temperature, preferably on a conductive support, within a temperature range where the conductive material does not change in quality, and dry it at a temperature of 400 to 800 °C just before cracks appear.
This is an electrophotographic photosensitive plate obtained by sintering within the temperature range of .

この本発明は無機ガラス結着剤の組成に最も特徴がある
のであるが、主成分となるのは酸化ビスマス50〜90
重量%好ましくは60〜70重量%、酸化ホウ素9〜3
0重量%、好ましくは10〜20重量%、COOO.O
Ol〜5重量%好ましくは0.1〜1重量%である。こ
れに更にCdOO〜30重量%好ましくは10〜20重
量%、およびCaOO〜30重量%好ましくは1〜5重
量%を添加してもよい。CdOの添加は静電特性が良好
になるうえから有利であり、またCaOの添加は静電特
性の傾向および硬度の増大のうえから有効である。こう
した組成からなる無機ガラス結着剤の軟化点は400〜
800℃と比較的低温なので、この結着剤中にCdS.
ZnOなどの無機光導電性物質の粉体を分散し、これを
導電性支持体上に塗布したものを焼成して感光板を作成
する時の焼成温度は400〜800℃の温度範囲内であ
る。ただし、当初から400〜800℃で焼成するのは
好ましくなく、先づクラツクが入仝寸前までは低温例え
ば20〜70℃で乾燥させることが必要である。従つて
相当乾燥が進んでから焼成が行なわれる。800℃以上
の焼成温度ではCdSは昇華あるいは分解し、特性が変
わつてしまう。
This invention is most characterized by the composition of the inorganic glass binder, and the main component is bismuth oxide 50-90%.
Weight% preferably 60-70% by weight, boron oxide 9-3
0% by weight, preferably 10-20% by weight, COOO. O
Ol~5% by weight, preferably 0.1~1% by weight. To this may be further added ~30% by weight CdOO, preferably 10-20% by weight, and ~30% by weight, preferably 1-5% by weight CaOO. Addition of CdO is advantageous because it improves electrostatic properties, and addition of CaO is effective because it improves electrostatic properties and hardness. The softening point of an inorganic glass binder with such a composition is 400~
Since the temperature is relatively low at 800°C, CdS.
The firing temperature for producing a photosensitive plate by dispersing powder of an inorganic photoconductive substance such as ZnO and coating it on a conductive support is within the temperature range of 400 to 800°C. . However, it is not preferable to fire at 400 to 800°C from the beginning, and it is necessary to dry at a low temperature, for example, 20 to 70°C, until cracks are about to appear. Therefore, firing is performed after considerable drying has progressed. At a firing temperature of 800° C. or higher, CdS sublimes or decomposes, changing its properties.

従つて無機光導電性物質にZnOを採用された場合には
800℃以上の焼成温度が採られてもよい。また他の成
分としてXYm(但し、XはMg,.BalPb,.Z
n,.Mn,.Yは0,.F..C1、m=1又は2)
で示される金属の酸化物、弗化物、塩化物などが5重量
%以下の範囲内で添加されてもよい。この結着剤中に光
導電性物質は分散され焼成されて光導電層が形成される
のであるが、この場合光導電性物質は前記光導電層の約
50%以下を占めるように添加される。結着剤中に光導
電性物質を分散したものは、例えばスプレーガンで導電
性支持体上に塗布した後焼成すれば本発明感光板が得ら
れる。
Therefore, when ZnO is used as the inorganic photoconductive material, a firing temperature of 800° C. or higher may be used. Other components include XYm (where X is Mg, .BalPb, .Z
n,. Mn,. Y is 0,. F. .. C1, m=1 or 2)
Metal oxides, fluorides, chlorides, etc. shown in may be added in an amount of 5% by weight or less. A photoconductive substance is dispersed in this binder and baked to form a photoconductive layer. In this case, the photoconductive substance is added so as to account for about 50% or less of the photoconductive layer. . A photosensitive plate of the present invention can be obtained by applying a photoconductive substance dispersed in a binder onto a conductive support using a spray gun, for example, and then baking it.

前記支持体としてはステンレス板、アルミニウム板、鉄
板、その他種々のものが適応されるが、特に金属基板中
でもステンレス板の使用が好適である。すなわちステン
レスの膨張係数と本発明で使用される結着剤の膨張係数
とは近似しているため、例え薄いステンレス基板を用い
た時でも、焼成、冷却後の支持体のカールが極めて小さ
いからである。本発明に係る電子写真用感光板における
光導電層の厚さはそれ程厳密に規定される必要はないが
、30〜150μ好ましくは40〜70μの範囲であり
、また結着剤の粒径は2μ以下であるのが望ましいこと
が実験により確認された。本発明の電子写真用感光板は
その光導電層が機械的強度にすぐれているため傷がつき
難く、耐摩耗性もあるため長期にわたつて使用が可能で
あり、また表面が滑らかで光沢がありクリーニングが容
易で地汚れを生じることがない。
As the support, a stainless steel plate, an aluminum plate, an iron plate, and various other materials can be used, and among metal substrates, a stainless steel plate is particularly suitable. In other words, the expansion coefficient of stainless steel and the expansion coefficient of the binder used in the present invention are similar, so even when a thin stainless steel substrate is used, the curl of the support after firing and cooling is extremely small. be. The thickness of the photoconductive layer in the electrophotographic photosensitive plate according to the present invention does not need to be so strictly defined, but it is in the range of 30 to 150 μm, preferably 40 to 70 μm, and the particle size of the binder is 2 μm. It has been confirmed through experiments that the following is desirable. The photosensitive plate for electrophotography of the present invention has a photoconductive layer with excellent mechanical strength, so it is hard to be scratched and has wear resistance, so it can be used for a long period of time, and the surface is smooth and glossy. It is easy to clean and does not cause stains.

特に本発明に係る無機ガラス結着剤は誘電率が大きく、
絶縁性にすぐれているのみならず、金属基板との接着性
が良好なので、金属基板からの光導電層の剥離はまつた
く生じない。次に実施例および比較例を示す。
In particular, the inorganic glass binder according to the present invention has a large dielectric constant,
Not only does it have excellent insulation properties, but it also has good adhesion to the metal substrate, so the photoconductive layer hardly peels off from the metal substrate. Next, examples and comparative examples will be shown.

実施例 1 からなる酸化物粉末を乳鉢で充分混合粉砕し、これを磁
製ルツボに移し860℃に維持された電気炉にて1時間
溶融した後、蒸溜水中に流込み急冷することによつて粒
状の釉薬を得た。
The oxide powder consisting of Example 1 was sufficiently mixed and ground in a mortar, transferred to a porcelain crucible, melted in an electric furnace maintained at 860°C for 1 hour, and then poured into distilled water and rapidly cooled. A granular glaze was obtained.

この釉薬707に蒸溜水50CCを添力し、これをボー
ルミルで30時間粉砕し、その一部をスプレーガンを使
用してステンレス基板上に塗布し、約60℃で乾燥した
50 cc of distilled water was added to this glaze 707, which was ground in a ball mill for 30 hours, a portion of which was applied onto a stainless steel substrate using a spray gun, and dried at about 60°C.

その後550℃で10分間焼成することによつて35μ
厚の膜層が得られた。このものの電荷保持性は第1図の
曲線aに示されるごとくであつた。次に前記ボールミル
で粉砕し得られた釉薬50rVCcds粉末(GE社製
)307を添加し、さらに40CCの蒸溜水を溶媒とし
て加えてホモジナイザーで30分間分散した。
After that, by baking at 550℃ for 10 minutes, 35μ
A thick film layer was obtained. The charge retention property of this product was as shown by curve a in FIG. Next, glaze 50rVCcds powder (manufactured by GE) 307 obtained by pulverization using the ball mill was added, and further 40cc of distilled water was added as a solvent and dispersed using a homogenizer for 30 minutes.

これをスプレーガンで脱脂されたステンレス基板上に塗
布し乾燥した後、550℃で10分間焼成して50μ厚
の光導電層を有する電子写真用感光板を作成した。この
感光板を−5,7K、20μAの放電条件にて10秒間
暗中に放置後、照度10ルツクスのタングステン光で照
射した場合の表面電位を測定したところ、第2図の曲線
bが得られた。この曲線bは電子写真用感光板として充
分な特性を示すものである。実施例 2 実施例1の酸化物粉末にさらに酸化カルシウム粉末10
7を添加し、実施例1と同様な方法を行なつて得られた
電子写真用感光板は、機械的強度が極めて大きいもので
あつた。
This was applied onto a degreased stainless steel substrate with a spray gun, dried, and then baked at 550° C. for 10 minutes to produce an electrophotographic photosensitive plate having a photoconductive layer with a thickness of 50 μm. This photosensitive plate was left in the dark for 10 seconds under discharge conditions of -5.7 K and 20 μA, and then irradiated with tungsten light at an illuminance of 10 lux. When the surface potential was measured, curve b in Figure 2 was obtained. . This curve b shows sufficient characteristics as an electrophotographic photosensitive plate. Example 2 Calcium oxide powder 10 was added to the oxide powder of Example 1.
The electrophotographic photosensitive plate obtained by adding No. 7 and carrying out the same method as in Example 1 had extremely high mechanical strength.

またこの感光板を実施例1と同じ条件で表面電位の測定
を行なつたところ、第2図の曲線cが得られた。この曲
線cは曲線bのものよりも更にすぐれた特性をもつ電子
写真用感光板を意味するものである。比較例 実施例1で得られた粒状の釉薬707に蒸溜水50CC
を添加し、これをボールミルで30分間粉砕し、その一
部をスプレーガンを使用してステンレス基板上に塗布し
、500℃で10分間焼成することによつて35μ厚の
膜層が得られた。
When the surface potential of this photosensitive plate was measured under the same conditions as in Example 1, curve c in FIG. 2 was obtained. Curve c represents an electrophotographic photosensitive plate having better properties than curve b. Comparative Example 50cc of distilled water was added to the granular glaze 707 obtained in Example 1.
was added, pulverized for 30 minutes in a ball mill, a part of it was applied onto a stainless steel substrate using a spray gun, and a 35μ thick film layer was obtained by baking at 500°C for 10 minutes. .

このものの電荷保持性は第1図の曲線dに示されるごと
くであつた。また前記ボールミルで粉砕し得られた釉薬
507にCdS粉末(GE社製)30yを添加し、さら
に40CCの蒸溜水を溶媒として加えてホモジナイド一
で30分間分散し、これを脱脂されたステンレス基板上
に塗布し500℃で10分間焼成して50μ厚の光導電
層を有する電子写真用感光板を作成したが、このものの
電荷保持性は零に近かつた。
The charge retention property of this product was as shown by curve d in FIG. Further, CdS powder (manufactured by GE) 30y was added to the glaze 507 obtained by grinding with the ball mill, and 40 cc of distilled water was added as a solvent, dispersed for 30 minutes in a homogenide, and this was placed on a degreased stainless steel substrate. An electrophotographic photosensitive plate having a photoconductive layer with a thickness of 50 μm was prepared by coating the photoconductive layer on a substrate and baking it at 500° C. for 10 minutes, but the charge retention property of this plate was close to zero.

【図面の簡単な説明】[Brief explanation of drawings]

第1図および第2図は電荷保持の状態を示す図である。 FIG. 1 and FIG. 2 are diagrams showing the state of charge retention.

Claims (1)

【特許請求の範囲】[Claims] 1 導電性支持体上に光導電層が設けられた電子写真用
感光板において、前記光導電層が、酸化ビスマス50〜
90重量%、酸化ホウ素9〜30重量%、酸化コバルト
0.001〜5%、酸化カドミウム0〜30%、および
酸化カルシウム0〜30%を主成分とする無機ガラス結
着剤中に光導電性物質が分散され光導電性物質が変質し
ない温度範囲内で焼結されたものであることを特徴とす
る電子写真用感光板。
1. In an electrophotographic photosensitive plate having a photoconductive layer provided on a conductive support, the photoconductive layer comprises bismuth oxide 50-50
90% by weight of boron oxide, 9-30% of boron oxide, 0.001-5% of cobalt oxide, 0-30% of cadmium oxide, and 0-30% of calcium oxide. 1. A photosensitive plate for electrophotography, characterized in that it is sintered within a temperature range in which a substance is dispersed and a photoconductive substance does not deteriorate.
JP49109481A 1974-09-25 1974-09-25 Photosensitive plate for electrophotography Expired JPS5911101B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP49109481A JPS5911101B2 (en) 1974-09-25 1974-09-25 Photosensitive plate for electrophotography

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP49109481A JPS5911101B2 (en) 1974-09-25 1974-09-25 Photosensitive plate for electrophotography

Publications (2)

Publication Number Publication Date
JPS5136945A JPS5136945A (en) 1976-03-29
JPS5911101B2 true JPS5911101B2 (en) 1984-03-13

Family

ID=14511324

Family Applications (1)

Application Number Title Priority Date Filing Date
JP49109481A Expired JPS5911101B2 (en) 1974-09-25 1974-09-25 Photosensitive plate for electrophotography

Country Status (1)

Country Link
JP (1) JPS5911101B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6245904A (en) * 1985-08-22 1987-02-27 Mitsubishi Heavy Ind Ltd Gas turbine stationary blade

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6245904A (en) * 1985-08-22 1987-02-27 Mitsubishi Heavy Ind Ltd Gas turbine stationary blade

Also Published As

Publication number Publication date
JPS5136945A (en) 1976-03-29

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