JPS59102838A - Devitrification-resistant molded article of fused quartz - Google Patents
Devitrification-resistant molded article of fused quartzInfo
- Publication number
- JPS59102838A JPS59102838A JP20774082A JP20774082A JPS59102838A JP S59102838 A JPS59102838 A JP S59102838A JP 20774082 A JP20774082 A JP 20774082A JP 20774082 A JP20774082 A JP 20774082A JP S59102838 A JPS59102838 A JP S59102838A
- Authority
- JP
- Japan
- Prior art keywords
- devitrification
- molded article
- fused silica
- resistant
- amorphous silica
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Glass Melting And Manufacturing (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は、耐失透性溶融孔実質成形体に関するものであ
る。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a devitrification-resistant melt-pored substantial molded article.
溶融石英質成形体は各種の特性を有している。例えば、
熱膨張係数が小ざいこと、耐熱衝撃性に優れていること
、熱伝導度が低いことなどの特性を有している。このた
め、従来から溶融石英質成形体は各種工業に使用されて
きた。Fused silica molded bodies have various characteristics. for example,
It has characteristics such as a small coefficient of thermal expansion, excellent thermal shock resistance, and low thermal conductivity. For this reason, fused silica molded bodies have been used in various industries.
しかし、従来の溶融石英質成形体は一般に1100℃以
上の高温で使用すると急激に失透が進んでしまう。そこ
で、この失透を防ぐために、従来から溶融石英質成形体
を高純度原料で製造しICす、あるいは失透に強い伯の
材料でコーティングしたりしていた。However, when conventional fused silica molded bodies are used at high temperatures of 1100° C. or higher, devitrification rapidly progresses. Therefore, in order to prevent this devitrification, conventionally, fused silica molded bodies have been manufactured from high-purity raw materials and subjected to IC, or coated with a material that is resistant to devitrification.
高純度の原料を使って溶融石英質成形体を製造すれば、
確かに失透に対して強くなる。If a fused silica molded body is manufactured using high-purity raw materials,
It certainly becomes stronger against devitrification.
しかし、高純度の原料を使用することはコスト高となる
こと及び製造工程における汚染が無視できなくなること
等の問題があった。However, the use of highly pure raw materials has resulted in problems such as high costs and non-negligible contamination during the manufacturing process.
また、失透に強いA 9203などのコーテイング膜を
溶融石英質成形体に施しても、熱膨張の差でコーテイン
グ膜が剥離してしまうという欠点があった。Further, even if a coating film such as A 9203, which is resistant to devitrification, is applied to a fused silica molded body, there is a drawback that the coating film peels off due to the difference in thermal expansion.
本発明は上記の実情に鑑みてなされたもので、失透に強
くしかも安価に製造することができる耐失透性溶融孔実
質成形体を提供することを目的とする。The present invention has been made in view of the above-mentioned circumstances, and an object of the present invention is to provide a devitrification-resistant melt-pore substantial molded body that is resistant to devitrification and can be manufactured at low cost.
本発明は耐失透性溶融孔実質成形体は、溶融石英質成形
体に四塩化ケイ素の加水分解によって調整したコロイド
溶液から構成される超微粒子で高純度のアモルファスシ
リカをコーティングしたことを特徴とするものである。The present invention is characterized in that the devitrification-resistant melt-pore substance molded body is a fused silica molded body coated with high-purity amorphous silica with ultrafine particles composed of a colloidal solution prepared by hydrolysis of silicon tetrachloride. It is something to do.
以上のように本発明の耐失透性溶融石英質成形体は、超
微粒子で高純度のアモルファスシリカがコーティングさ
れている。このため、α−クリストバライトの発生が抑
制され、失透に対して大変強い。As described above, the devitrification-resistant fused silica molded body of the present invention is coated with ultrafine particles of highly pure amorphous silica. Therefore, the generation of α-cristobalite is suppressed, and it is extremely resistant to devitrification.
本発明の耐失透性溶融石英質成形体は高純度の原料を使
用していない。このため、安価な耐失透性溶融石英質成
形体を得ることができる。また、製造工程での汚染に対
してあまり気を使う必要がない。The devitrification-resistant fused silica molded body of the present invention does not use high-purity raw materials. Therefore, an inexpensive devitrification-resistant fused silica molded body can be obtained. Also, there is no need to be very careful about contamination during the manufacturing process.
さらに、超微粒子で高純度のアモルファスシリカコーテ
ィング層は、溶融石英質成形体と同じ溶融シリカの焼結
層なので、従来流されたA 9203 、S +3 N
4などのコーティング層のように剥離、する危険がな
い。Furthermore, since the amorphous silica coating layer with ultra-fine particles and high purity is a sintered layer of fused silica, which is the same as the fused silica molded body, it is different from conventionally cast A 9203, S +3 N.
There is no danger of peeling off like coating layers such as 4.
本発醐の耐失透性溶融石英質成形体は、以上のような効
果を有しているので、例えばガラス工業用耐火物や電子
工業用冶具に適しているほか、ケイ光体焼成用としても
使用できる。The devitrification-resistant fused silica molded product of this invention has the above-mentioned effects, so it is suitable for refractories for the glass industry and jigs for the electronic industry, as well as for firing phosphor materials. can also be used.
第1図及び第2図を参照して、溶融石英質成形体の表面
に超微粒子のアモルファスシリカがコーティングされる
様子を説明する。With reference to FIGS. 1 and 2, the manner in which the surface of a fused silica molded body is coated with ultrafine amorphous silica particles will be described.
溶融石英質成形体1は4〜20%の気孔率を有している
。このため、溶融石英質成形体1をコロイド溶液に浸漬
すると、コロイド溶液は例えば毛管現象によって気孔2
内に侵入する。その結果、粒径的0.01μmの超微粒
子であるアモルファスシリカ3が気孔2内に入り込むの
である(第1図参照)。こうして溶融石英質成形体1表
面にアモルファスシリカのコーティング層4が形成され
る(第2図参照〉。The fused silica molded body 1 has a porosity of 4 to 20%. For this reason, when the fused silica molded body 1 is immersed in a colloidal solution, the colloidal solution will flow into the pores due to capillary action, for example.
invade inside. As a result, amorphous silica 3, which is an ultrafine particle with a particle size of 0.01 μm, enters into the pores 2 (see FIG. 1). In this way, an amorphous silica coating layer 4 is formed on the surface of the fused silica molded body 1 (see FIG. 2).
コーティング方法としては色々と考えることができる。Various coating methods can be considered.
前述の毛管現象を利用するもののほかに、溶融石英質成
形体1に電圧をかけて電気泳動を利用することもできる
。電気泳動を利用すると毛管現象の場合よりも短時間に
コーティングすることができる。このほか、加圧・減圧
してアモルファスシリカ3を含浸することも可能である
。In addition to the method using the capillary phenomenon described above, it is also possible to apply a voltage to the fused silica molded body 1 and use electrophoresis. Electrophoresis allows coating to occur in a shorter time than capillary action. In addition, it is also possible to impregnate the amorphous silica 3 by pressurizing or reducing the pressure.
以下、実施例を掲げて本発明をより具体的に説明する。Hereinafter, the present invention will be described in more detail with reference to Examples.
11九七
第1表に示す特−性を持つ溶融石英質成形体く焼成前で
も焼成後でも良い)を、四塩化ケイ素と純水により調整
したコロイド溶液に浸して5時間後取り出した。そして
研磨し、エーテル、純水の順で洗浄し、乾燥後1100
°Cで8時間焼成した。こうしてできた本発明の耐失透
性溶融石英質成形体の物性値を第2表に示す。A fused silica molded body (which may be used before or after firing) having the properties shown in Table 1 was immersed in a colloidal solution prepared with silicon tetrachloride and pure water and taken out after 5 hours. Then, it was polished, washed with ether and pure water in that order, and dried at 1100 ml.
It was baked at °C for 8 hours. Table 2 shows the physical properties of the devitrification-resistant fused silica molded article of the present invention thus produced.
丈1」[を
第1表に示す特性を持つ溶融石英質パイプに銅製電極を
入れてコロイド溶液に浸した。A copper electrode was placed in a fused silica pipe having the characteristics shown in Table 1 and immersed in a colloid solution.
コロイド溶液は実施例1のものと同じものを使用し、銅
製容器内に調整した。そして、溶融石英質パイプの電極
にプラス電圧をかけ、銅製容器にマイナス電圧をかけた
。電圧は20〜30V/cn+であった。約10分後に
電流を切って実施例1と同様に研磨、洗浄、焼成を行っ
た。こうしてできた本発明の耐失透性溶融石英質パイプ
の物性値を第3表に示す。The same colloid solution as in Example 1 was used and was prepared in a copper container. Then, a positive voltage was applied to the electrode of the fused silica pipe, and a negative voltage was applied to the copper container. The voltage was 20-30V/cn+. After about 10 minutes, the current was turned off and polishing, cleaning, and firing were performed in the same manner as in Example 1. Table 3 shows the physical properties of the devitrification-resistant fused silica pipe of the present invention thus produced.
第1表〜第3表から、本発明の耐失透性溶融石英質成形
体は気孔率が未コーティングの溶融石実質或欣体に比べ
て小さいことがわかる。From Tables 1 to 3, it can be seen that the devitrification-resistant fused silica molded body of the present invention has a smaller porosity than the uncoated molten stone substance or body.
次に、本発明の耐失透性溶融石英質成形体と未コーティ
ングの溶融石英質成形体について1300℃の空気中に
おける失透試験を行なった。そして、X線によってα−
クリストバライト量を測定した。その結果を第3図に示
す。Next, a devitrification test was conducted on the devitrification-resistant fused silica molded body of the present invention and the uncoated fused silica molded body in air at 1300°C. Then, α-
The amount of cristobalite was measured. The results are shown in FIG.
この失透試験により、未コーティングの溶融石英質成形
体と比較して、本発明の耐失透性溶融石英質成形体は優
れた耐失透性を示すことがわかった。This devitrification test revealed that the devitrification-resistant fused silica molded product of the present invention exhibits superior devitrification resistance compared to an uncoated fused silica molded product.
第1図はコーティング前の溶融石英質成形体表面の一例
を示す部分断面図、第2図は本発明の耐失透性溶融石英
質成形体表面の一例を示す部分断面図、第3図は本発明
の耐失透性溶融石英質成形体と未コーティングの溶融石
英質成形体の失透試験の結果を示ずグラフである。
1・・・溶融石英質成形体
2・・・気孔 1
3・・・アモルファスシリカ
4・・・コーティング層
−X−表コーティ〉グの1穿扇宕す萎−棒雀ン形イ≠−
o−$発朗t>N灼先仇S融石蒼芦涼°形礁411、
ff Fill Mi’l fsill)20
5FIG. 1 is a partial sectional view showing an example of the surface of the fused silica molded product before coating, FIG. 2 is a partial sectional view showing an example of the surface of the devitrification-resistant fused silica molded product of the present invention, and FIG. It is a graph that does not show the results of a devitrification test of the devitrification-resistant fused silica molded body of the present invention and the uncoated fused silica molded body. 1... Fused silica molded body 2... Pore 1 3... Amorphous silica 4... Coating layer -
o-$Hatsurot>N Burning Point Enemy S Melted Stone Aoashi Ryo ° Shape Reef 411,
ff Fill Mi'l fsill)20
5
Claims (1)
調整したコロイド溶液から生成される超微粒子で高純度
のアモルファスシリカをコーティングしたことを特徴と
する耐失透性溶融孔実質成形体。A devitrification-resistant fused pore substantial molded product characterized by coating a fused silica molded product with highly pure amorphous silica with ultrafine particles produced from a colloidal solution prepared by hydrolyzing silicon tetrachloride.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20774082A JPS59102838A (en) | 1982-11-29 | 1982-11-29 | Devitrification-resistant molded article of fused quartz |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20774082A JPS59102838A (en) | 1982-11-29 | 1982-11-29 | Devitrification-resistant molded article of fused quartz |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS59102838A true JPS59102838A (en) | 1984-06-14 |
Family
ID=16544746
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP20774082A Pending JPS59102838A (en) | 1982-11-29 | 1982-11-29 | Devitrification-resistant molded article of fused quartz |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59102838A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0844212A1 (en) * | 1996-11-20 | 1998-05-27 | Mitsubishi Chemical Corporation | Silica gel, synthetic quartz glass powder and shaped product of quartz glass |
CN104671670A (en) * | 2013-11-28 | 2015-06-03 | 赫罗伊斯石英玻璃股份有限两合公司 | Method For Producing A Coated Component Of Quartz Glass Or Fused Silica |
CN108341588A (en) * | 2018-04-28 | 2018-07-31 | 烟台同立高科新材料股份有限公司 | A kind of preparation method of high-compactness silica crucible |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57169704A (en) * | 1981-04-13 | 1982-10-19 | Nippon Telegr & Teleph Corp <Ntt> | Production for optical waveguide film |
-
1982
- 1982-11-29 JP JP20774082A patent/JPS59102838A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57169704A (en) * | 1981-04-13 | 1982-10-19 | Nippon Telegr & Teleph Corp <Ntt> | Production for optical waveguide film |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0844212A1 (en) * | 1996-11-20 | 1998-05-27 | Mitsubishi Chemical Corporation | Silica gel, synthetic quartz glass powder and shaped product of quartz glass |
CN104671670A (en) * | 2013-11-28 | 2015-06-03 | 赫罗伊斯石英玻璃股份有限两合公司 | Method For Producing A Coated Component Of Quartz Glass Or Fused Silica |
CN108341588A (en) * | 2018-04-28 | 2018-07-31 | 烟台同立高科新材料股份有限公司 | A kind of preparation method of high-compactness silica crucible |
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