JPS588714A - Recovery of washing solvent - Google Patents

Recovery of washing solvent

Info

Publication number
JPS588714A
JPS588714A JP10627181A JP10627181A JPS588714A JP S588714 A JPS588714 A JP S588714A JP 10627181 A JP10627181 A JP 10627181A JP 10627181 A JP10627181 A JP 10627181A JP S588714 A JPS588714 A JP S588714A
Authority
JP
Japan
Prior art keywords
solvent
monomer
water
washing
cleaning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10627181A
Other languages
Japanese (ja)
Other versions
JPS5950686B2 (en
Inventor
Masahiro Kaneko
昌弘 金子
Tadashi Asanuma
正 浅沼
Shinryu Uchikawa
進隆 内川
Ichiro Fujikage
一郎 藤隠
Tetsunosuke Shiomura
潮村 哲之助
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Toatsu Chemicals Inc
Toyo Engineering Corp
Original Assignee
Mitsui Toatsu Chemicals Inc
Toyo Engineering Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Toatsu Chemicals Inc, Toyo Engineering Corp filed Critical Mitsui Toatsu Chemicals Inc
Priority to JP10627181A priority Critical patent/JPS5950686B2/en
Priority to IN687/CAL/82A priority patent/IN158315B/en
Priority to GB08217465A priority patent/GB2101613B/en
Priority to MX193207A priority patent/MX164784B/en
Priority to IT21938/82A priority patent/IT1152424B/en
Priority to CA000405509A priority patent/CA1204371A/en
Priority to US06/389,764 priority patent/US4468257A/en
Priority to KR8202738A priority patent/KR890002372B1/en
Priority to BR8203624A priority patent/BR8203624A/en
Publication of JPS588714A publication Critical patent/JPS588714A/en
Publication of JPS5950686B2 publication Critical patent/JPS5950686B2/en
Expired legal-status Critical Current

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  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

PURPOSE:To recover a purified solvent in a high yield by evaporating a washing solvent used for washing the production apparatus of an aromatic vinyl/acrylonitrile copolymer thereby separating a solvent/monomer mixture from a polymeric substance and distilling the former together with water to form a water/ monomer azeotrope. CONSTITUTION:A styrene/acrylonitrile copolymer is produced by bulk polymerization. After withdrawing the polymerized solution, a polymerization apparatus 2 is filled and washed with a solvent supplied from a tank 1 and selected from the group consisting of dimethylformamide, dimethylacetamide and dimethyl sulfoxide. The washing solvent containing the washed monomer and polymer substance is continuously transferred by a pump 4 through a tank 3 to an evaporator 4, wherein a vapor comprising the monomer and the solvent is separated from the polymeric substance. In a distillation tower, the former is further distilled together with water introduced from a tank 11, whereby the monomer and the water are azeotropically distilled to recover a purified solvent 13. The monomer/water azeotrope is passed through a condenser 10 to the tank 11, wherein the azeotrope separated into a water phase and a monomer phase and the former is recirculated into the tower 8.

Description

【発明の詳細な説明】 本発明は、芳香族ビニル−アクリロニトリル共重合体の
製造装置等の洗浄に川(・た溶媒の再生回収方法に関す
る。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for regenerating and recovering a solvent used for cleaning equipment for producing an aromatic vinyl-acrylonitrile copolymer.

芳香族ビニル−アクリロニトリル共重合体の製造時、製
造装置内に単量体や重合溶媒に不溶若しくは難溶な高分
子物質が生成することが知られている。この高分子物質
は反応槽内や伝熱装置などに付着し、製造装置に伝熱性
能の低下や配管の閉塞を起こす。これに伴ない、反応の
制御性の低下、生産性の低下が起こり、安定操業の大き
な障害となっている。また更には、高分子物質の一部が
製品中へ混入し、製品外観や色相の悪化が発生する。
It is known that during the production of aromatic vinyl-acrylonitrile copolymers, polymeric substances that are insoluble or sparingly soluble in monomers and polymerization solvents are produced in production equipment. This polymer substance adheres to the inside of the reaction tank and heat transfer equipment, causing a decrease in heat transfer performance in the manufacturing equipment and clogging of piping. This results in a decrease in reaction controllability and a decrease in productivity, which is a major obstacle to stable operation. Furthermore, a part of the polymer substance is mixed into the product, resulting in deterioration of the product appearance and color.

このため適時操業を停止してこの高分子物質除去する必
要があった。
For this reason, it was necessary to stop the operation at an appropriate time and remove this polymeric substance.

この高分子物質の除去方法としては、人力による除去作
業も実施されているが多くの人手と時間とを要し、また
装置の破損や作業者の残在化学物質による汚染等も発生
し好ましい方法とは言えない。
As a method for removing this polymer substance, manual removal work is also carried out, but it requires a lot of manpower and time, and it also causes damage to the equipment and contamination by residual chemical substances from the operator, so this is the preferred method. It can not be said.

また高圧流体を用いて剥離除去する方法も知られている
が装置の構造上高圧流体を直接吹き付けられない個所が
存在する場合や、強度が不足している場合は適用できな
い。
A method of peeling and removing using high-pressure fluid is also known, but this cannot be applied if there are locations where high-pressure fluid cannot be directly sprayed due to the structure of the device, or if the strength is insufficient.

このため溶剤による洗浄除去方法が一般に行なわれてい
る。単量体での洗浄は、低温では溶解能力が劣り高温で
は単量体の重合が心配され洗浄の効果が小さいので重合
体を溶解し、得る溶媒が用いられる。ジメチルホルムア
ミド等のアルギルアマイド及びジメチルスルホキシド等
のアルギルスルホキシドは、芳香族ビニル−アクリロニ
トリル共重合体に対して良好な溶媒であるが、洗浄に使
用し単量体等が混入すると高分子物質の溶解能力が低下
することが知られている。
For this reason, a cleaning removal method using a solvent is generally used. When cleaning with a monomer, a solvent obtained by dissolving the polymer is used because the dissolving ability is poor at low temperatures and the cleaning effect is small at high temperatures due to concerns about polymerization of the monomer. Argyl amide such as dimethylformamide and argyl sulfoxide such as dimethyl sulfoxide are good solvents for aromatic vinyl-acrylonitrile copolymers, but if they are used for cleaning and monomers etc. are mixed in, the polymer substances may be It is known that the dissolution ability decreases.

この高分子物質は、芳香族ビニル−アクリロニトリル共
重合体の単量体等で膨1ij’l 1.た状態にあり、
それ自体に単量体を多く含んでいる。このためこの高分
子物質を溶媒を用いて洗トfIすると溶媒中に単量体が
混入し洗浄力を低下させる。一度の洗浄で高分子物質を
洗浄する能力が限界値に達することもある。例えば連続
塊状重合でスヂレンーアクリロニトリル共重合体を製造
した場合、重合終了時の重合装置内には高分子物71及
びlj量体が多く存在するため、洗浄溶媒を用い回分式
に洗浄した場合には該溶媒中お単量体等の濃度はλ〜、
20重量係、通常乙〜72重量係にも達し、とれを再度
洗浄に用いることは不適当であり、1jli %J+溶
媒の回収精製が必要となる。洗浄溶媒中の単量体等の濃
度の上昇を防ぐため重合装置内を乾燥させ単量体を除く
操作を行なう場合もあるが、乾燥時間が長く必要なこと
や、作業面に困難があるなどの理由から問題となるとと
が多い。
This polymer material is swelled with monomers such as aromatic vinyl-acrylonitrile copolymer.1. in a state of
It itself contains many monomers. Therefore, when this polymeric substance is washed fI using a solvent, the monomer is mixed into the solvent, reducing the cleaning power. The ability to clean polymeric substances may reach its limit with one cleaning. For example, when a styrene-acrylonitrile copolymer is produced by continuous bulk polymerization, a large amount of polymer 71 and lj polymers are present in the polymerization apparatus at the end of polymerization, so it is necessary to wash the copolymer in batches using a washing solvent. In this case, the concentration of the monomer, etc. in the solvent is λ~,
20% by weight, usually reaching 72% by weight, making it inappropriate to use the residue for washing again, and it is necessary to recover and purify 1jli% J+ solvent. In order to prevent an increase in the concentration of monomers, etc. in the cleaning solvent, the interior of the polymerization apparatus may be dried to remove the monomers, but this requires a long drying time and is difficult to operate. This is often a problem for the following reasons.

一般に、洗浄に用いる溶媒は高価であるため、回収して
再度利用する必要がある。しかし溶媒の回収には高分子
物質と単量体を分離する必要があり濾過法や吸収法は採
用できない。そのため蒸留操作で行なわれるのが一般的
であるが、高分子物質を含むため回分式で洗浄溶媒と単
量体とを分留しその後高分子物質を分離する方法が採ら
れる。
Generally, solvents used for cleaning are expensive and therefore need to be recovered and reused. However, in order to recover the solvent, it is necessary to separate the polymer substance and the monomer, and filtration or absorption methods cannot be used. For this reason, it is generally carried out by a distillation operation, but since it contains polymeric substances, a method is adopted in which the cleaning solvent and monomer are fractionally distilled in a batch manner, and then the polymeric substances are separated.

しかし回分式の蒸留操作は単量体の分留時に溶媒のロス
が多いことや、手間がかかること、それに大量に処理す
る必要がある場合装置が大きくなり設備に要する費用も
大きくなるなど欠点が多い。
However, batch-type distillation operations have drawbacks such as a large amount of solvent loss during monomer fractionation, being labor-intensive, and the need for larger equipment and higher equipment costs if large quantities need to be processed. many.

そこで本発明者らは芳香族ビニル−アクリロニトリル共
重合体製造装置の溶媒による洗浄とその溶媒の回収の効
率的な実施につき鋭意研究したところ、従来法に見られ
たような難点のない芳香族ビニルザクリロニトリル共重
合体の製造装置の洗浄溶媒の回収方法を完成した。
Therefore, the present inventors conducted intensive research on efficient implementation of solvent cleaning of aromatic vinyl-acrylonitrile copolymer manufacturing equipment and recovery of the solvent, and found that aromatic vinyl We have completed a method for recovering cleaning solvents from equipment for producing zacrylonitrile copolymer.

本発明は、芳香族ビニル−アクリロニトリル共重合体を
製造する装置内に付着する高分子物質を、ジメチルホル
ムアミド、ジメチルアセトアミド及びジメチルスルホキ
シドから成る群より選ばれる一種を主成分とする洗浄溶
媒を用い7511f+除去し、洗浄の結果生じた高分子
物質及び単量体を含む溶媒から洗浄溶媒を回収するに際
し、 (a)  前記溶媒を連続的に蒸発装置に導入し、(b
)  該蒸発装置において洗浄溶媒及び単量体を蒸発さ
せ、前記溶媒中に含まれている高分子物質を分離し、 (C)蒸発装置から蒸発させた洗浄溶媒及び単量体の混
合物を蒸気として蒸留塔に供給し、((1)  同時に
蒸留塔内に水を供給し、塔頂部から水と単量体の共沸混
合物を主成分とする留分を留出し、 (e)  該留分を水を主成分とする相と単量体を主成
分とする相とに分液し、 (1)水を主成分とする相の一部又は全部を(C1)の
水として用い、 (g)  塔底から精製された洗浄溶媒を回収する、と
とを特徴とする洗浄溶媒の回収方法である。
The present invention uses a cleaning solvent mainly composed of one selected from the group consisting of dimethylformamide, dimethylacetamide, and dimethyl sulfoxide to remove polymeric substances adhering to an apparatus for producing an aromatic vinyl-acrylonitrile copolymer. In recovering the washing solvent from the solvent containing polymeric substances and monomers produced as a result of washing, (a) continuously introducing the solvent into an evaporator; (b)
) Evaporating the cleaning solvent and monomer in the evaporator to separate the polymeric substance contained in the solvent; (C) converting the mixture of the cleaning solvent and monomer evaporated from the evaporator into vapor; (1) At the same time, water is supplied into the distillation column, and a fraction containing an azeotrope of water and a monomer as a main component is distilled from the top of the column; (e) the fraction is Separating into a phase mainly composed of water and a phase mainly composed of monomers, (1) using part or all of the phase mainly composed of water as water in (C1), (g) A cleaning solvent recovery method is characterized in that the purified cleaning solvent is recovered from the bottom of the column.

本発明を適用しうる芳香族ビニル−アクリロニトリル共
重合体とは、好ま1〜くはアクリロニトリルを10〜S
O重量係、より好ましくは、20〜グ0重量係含む共重
合体で、アクリロニトリルの代りにメタアクリロニトリ
ル等のニトリル単量体を含むものでも良く、芳香族ビニ
ル単量体としては、スチレン、α−メチルスチレン等が
挙げられる。共重合体の製造方法は、懸濁重合、溶液重
合、塊状重合などどの方法にも適用できるが、特に溶液
重合、塊状重合では重合装置内に付着している高分子物
質が単量体等で膨潤した状態となっているため、本発明
を適用する効果が大きい。この芳香族ビニル−アクリロ
ニトリル共重合体を作る単量体は、前記のアクリロニト
リル、メタアクリロニトリル、スチレン、α−メチルス
チレン等の単量体で、水と共沸混合物を作りかつ水に溶
解しにくいものであり、また共重合11.11の重合溶
剤として使J’f’lサレ7;v ベンゼン、トルエン
、キシレン、エチルベンゼン、ヘギザン、ヘプタン等の
水と共沸混合物を作りかつ水に溶解しにくい溶剤を含む
ものであっても良い。
The aromatic vinyl-acrylonitrile copolymer to which the present invention can be applied preferably has acrylonitrile of 1 to 10S.
A copolymer having a weight coefficient of O, more preferably 20 to 0, and may also contain a nitrile monomer such as methacrylonitrile instead of acrylonitrile. Examples of the aromatic vinyl monomer include styrene, α -Methylstyrene and the like. Copolymers can be produced by any method such as suspension polymerization, solution polymerization, and bulk polymerization, but especially in solution polymerization and bulk polymerization, the polymer substances attached to the polymerization equipment are monomers, etc. Since it is in a swollen state, the effect of applying the present invention is great. The monomers that make this aromatic vinyl-acrylonitrile copolymer are monomers such as acrylonitrile, methacrylonitrile, styrene, and α-methylstyrene, which form an azeotropic mixture with water and are difficult to dissolve in water. It is also used as a polymerization solvent in Copolymerization 11.11. Solvents that form an azeotrope with water and are difficult to dissolve in water, such as benzene, toluene, xylene, ethylbenzene, hegyzane, and heptane. It may also include.

本発明に用いろ洗aト溶媒ば、ジメチルポルムアミド、
ジメチルアセトアミド、ジメチルスルボキシドから成る
群より選ばれる7種を主成分とするもので・あるが、ス
チレン−アクリロニI・リル共重合体に対してはジメチ
ルポルムアミドが好適である。
The filter washing solvent used in the present invention is dimethylpolamide,
It contains seven types selected from the group consisting of dimethylacetamide and dimethylsulfoxide as main components, and dimethylpolamide is suitable for the styrene-acryloni I/lyl copolymer.

洗浄の結果生じた高分子物質及び単量体を含む洗浄溶媒
は溶媒を連続的に蒸発させろ能力のある蒸発装置に導入
されろ。蒸発装置としては、フラッシュ蒸発器、薄膜蒸
発器、It 4’l′:容器等が利用でき高分子物質の
分+411.4Jl出を実施することも可能である。こ
の操作は加圧下、大気圧下あるいは減圧下で実施可能で
あるが操作の容易な大気圧下でのなく蒸気の形で、溶媒
と単量体とを分離するために蒸留塔に導かれる。蒸留塔
としては、通常充填塔あるいは棚段塔が用いられ、大気
圧下あるいは減圧下で分留が実施されるが、この分留に
対しては蒸留塔の段数は7〜20段で十分であり、溶媒
と単量体の混合蒸気は塔底と中間段の間、通常中段より
数段下に供給することが有利である。
The wash solvent containing polymeric substances and monomers resulting from the wash is introduced into an evaporator capable of continuously evaporating the solvent. As the evaporation device, a flash evaporator, a thin film evaporator, a container, etc. can be used, and it is also possible to emit 411.4 Jl of the polymeric substance. This operation can be carried out under pressure, atmospheric pressure or reduced pressure, but rather than at atmospheric pressure, which is easier to operate, the vapor is introduced into a distillation column in order to separate the solvent and monomer. As a distillation column, a packed column or a tray column is usually used, and fractional distillation is carried out under atmospheric pressure or reduced pressure. For this fractional distillation, a number of plates in the distillation column of 7 to 20 is sufficient. It is advantageous to feed the mixed vapor of solvent and monomer between the bottom of the column and the middle stage, usually several stages below the middle stage.

この蒸留塔には単量体の除去のため水が供給される。塔
頂より留出する水と単量体との共沸混合物を主成分とす
る留出物は、単量体を主成分とする相と水を主成分とす
る相に分液されるが、この操作には通常静置分割槽が用
いられ、分液された水を主成分とする相の一部又は全部
を常に還流に用いることで水を閉鎖系で使用することが
可能である。水の供給は通常蒸留操作開始前に予め静置
分離槽に水を桑備しこれを還流に用いる方法や、蒸留塔
内に水又は蒸気を導入する方法で実施される。また洗浄
溶媒を蒸発装置に導入する際に水を供給することも可能
である。
This distillation column is supplied with water for monomer removal. The distillate whose main component is an azeotropic mixture of water and monomer distilled from the top of the column is separated into a phase whose main component is monomer and a phase whose main component is water. A stationary divided tank is usually used for this operation, and by constantly using part or all of the separated water-based phase for reflux, it is possible to use water in a closed system. Water is normally supplied by a method in which water is prepared in advance in a static separation tank before the start of the distillation operation and used for reflux, or by a method in which water or steam is introduced into the distillation column. It is also possible to supply water when introducing the washing solvent into the evaporator.

静置分離した単量体を主成分とする相は、連続的又は回
分的に抜出すことで除去される。
The phase mainly composed of monomers separated by standing is removed by continuous or batch extraction.

蒸留塔の塔底にはスチームジャケット、リボイラーなど
の加熱装置が精留のために収伺けられる。
At the bottom of the distillation column, heating devices such as a steam jacket and reboiler are installed for rectification.

精製された洗浄溶媒は塔底より回収され貯蔵されるか、
あるいは洗トfiのため製造装置に再供給される。
Is the purified washing solvent collected from the bottom of the column and stored?
Alternatively, it is resupplied to the manufacturing equipment for cleaning.

ヌチレンーアクリロニトリルJ1、重合体製造装置の洗
浄に用いたジメチルポルノ・アミドに本発明を適用した
場合通常99重量係を超えろ純度のジメチルポルムアミ
ドが95重量係以−1−の回収率で回収可能である。
When the present invention is applied to nuthylene-acrylonitrile J1, dimethylpormamide used for cleaning polymer production equipment, dimethylpolamide with purity exceeding 99% by weight is recovered at a recovery rate of 1-1-1% by weight or more than 95% by weight. It is possible.

本発明の方法によれば芳香族ビニル−アクリロニ) I
Jル共重合体の製造装置の洗’/’f−IF用いた/9
1:、浄溶媒の回収を効果的に実施することができる。
According to the method of the invention aromatic vinyl-acryloni) I
Washing of the production equipment for J-ru copolymer using f-IF/9
1: The purified solvent can be effectively recovered.

洗浄溶媒を連続的に回収することにより単量体等を効率
良く除去し溶媒の回収率も高い。また回収した溶媒を再
度重合装置に供給ずろことにより洗浄時間をより短くす
ると同時に高価フ、【溶媒の必要量を減少させることが
可能である。
By continuously recovering the washing solvent, monomers and the like can be removed efficiently and the recovery rate of the solvent is also high. Furthermore, by supplying the recovered solvent to the polymerization apparatus again, it is possible to shorten the cleaning time and at the same time reduce the cost and the amount of solvent required.

以下、本発明を実施例により、第7図を参照しつつ説明
する。
Hereinafter, the present invention will be explained by way of examples with reference to FIG. 7.

実施例/ 塊状重合法でスチレン−アクリロニトリル共重合体(ア
クリロニトリルを、211重量係含有)の製造を連続3
2 E1間実施1〜、品分子物質の付着した内容量3 
m’の重合装置λをジメチルポルムアミドを用いて洗浄
した。
Example: Continuous production of styrene-acrylonitrile copolymer (containing acrylonitrile in a weight ratio of 211%) using a bulk polymerization method.
2 E1 implementation 1~, content amount 3 with attached product molecular substance
The polymerization apparatus λ of m' was washed with dimethylpolamide.

塊状重合が終了した後重合液が重合装置から排出されろ
。このとき装置内に付着している高分子物質は、単量体
であるアクリロニトリル、スチレン及び重合溶剤どして
用いているエチルベンゼンで膨湿した状態にある。
After the bulk polymerization is completed, the polymerization liquid is discharged from the polymerization apparatus. At this time, the polymeric substance adhering to the inside of the apparatus is in a swollen state due to the monomers acrylonitrile and styrene and the ethylbenzene used as the polymerization solvent.

この重合装置にジメチルポルムアミドを満液となるまで
供給槽/から供給し重合装置内を攪拌しながら730℃
で70時間洗浄した。洗浄終了後洗浄に用いた溶媒には
と重量係の単量体等及びグ重量係の高分子物質が含まれ
ていた。この洗浄に用いた溶媒は中継槽3を経て、ポン
プクで連続的に蒸発装置Sに送られる。
Dimethylpolamide was supplied from the supply tank to this polymerization apparatus until it became full, and the temperature was raised to 730°C while stirring the inside of the polymerization apparatus.
Washed for 70 hours. After the cleaning was completed, the solvent used for cleaning contained monomers and the like in the weight range and polymeric substances in the weight range. The solvent used for this cleaning passes through the relay tank 3 and is continuously sent to the evaporator S by a pump tank.

この蒸発装置はgoolの加熱槽であり:130℃まで
加熱可能な蒸気及び熱媒ジャケット及び内部コイルが取
り付けである。蒸発装置の底部からは高分子物質を排出
するだめのギヤポンプ乙が取り付けられている。また加
熱槽上部には重合体の飛沫同伴を防ぐため300 n1
llの高さの充填部7が設U゛られている。蒸発操作は
+=: b=゛大気圧下(105atm)で行なわれ蒸
発装置は/ /15 ℃に保たれここで発生した蒸気は
2701(g/′nr の速度で蒸留塔gに送られる。
This evaporator is a gool heating tank: it is equipped with a steam and heat medium jacket capable of heating up to 130°C and an internal coil. A gear pump O is attached to the bottom of the evaporator to discharge the polymeric substance. In addition, 300 n1 is placed at the top of the heating tank to prevent entrainment of polymer droplets.
A filling section 7 with a height of 11 is provided. The evaporation operation is carried out under atmospheric pressure (105 atm), the evaporator is maintained at /15°C, and the vapor generated here is sent to the distillation column g at a rate of 2701 g/'nr.

この蒸留塔は塔径1I−3Omrnの充填塔で蒸気供給
部より上にグ段、蒸気供給部より下に3段合計7段の塔
である。この蒸留塔には塔底液加熱用のりボイラー7と
塔頂蒸気の凝縮器10及び凝縮液の分液槽//(容量1
000e )と還流用のポンプ/2が取り付けられてい
る。
This distillation column was a packed column with a column diameter of 1 I-3 Omrn, and had a total of 7 columns, 1 stage above the steam supply section and 3 stages below the steam supply section. This distillation column includes a glue boiler 7 for heating the bottom liquid, a condenser 10 for top steam, and a separation tank for condensed liquid (capacity 1
000e) and a reflux pump/2 are attached.

′ 分留塔の塔頂では分液槽に]つめ用意された水を還
流し水と溶媒中の?l′L量体等を共dI′、させる。
′ At the top of the fractionation column, the water prepared in the separation tank is refluxed to separate the water and the solvent. The l'L-mer etc. are made to be dI'.

このとき共沸して塔頂より出た単111′体等は分液槽
で分岐され水層を還流に使用する。このときの還流比R
はり0であった。この操作に、1:すrlt量体等は殆
ど除かれ分留塔塔底からは′?97市沿係のジメチルポ
ルムアミドが得られた。このジメチルホルムアミドば/
3で示ず貯槽に集められた。
At this time, the single 111' compound and the like that azeotroped and came out from the top of the column are separated in a liquid separation tank and the aqueous layer is used for reflux. Reflux ratio R at this time
The tension was 0. In this operation, most of the 1:srlt polymer is removed from the bottom of the fractionation column. Dimethylpolamide was obtained in 97 cities. This dimethylformamide/
3 was collected in a storage tank.

この回収操作により9g重量係のジメチルホルムアミド
が回収された。
Through this recovery operation, 9 g of dimethylformamide was recovered.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、本発明を実施するのに用いた装置のフローシ
ートの一例である。 /:溶媒供給槽   、!:重合装置 3:中継槽     Il、:ポンプ S:蒸発装置    乙:ギャボンプ 7:充填部     g:蒸留塔 ′?:リボイラー  10:凝縮器 //:分液槽    /2=還流用ポンプ/3:貯槽 
     M:モーター 代理人 若 林  忠 第  1  図
FIG. 1 is an example of a flow sheet of an apparatus used to carry out the present invention. /: Solvent supply tank,! : Polymerization device 3: Relay tank Il, : Pump S: Evaporator B: Gabon pump 7: Filling section g: Distillation column'? : Reboiler 10: Condenser //: Separation tank /2 = Reflux pump /3: Storage tank
M: Motor agent Tadashi Wakabayashi Figure 1

Claims (1)

【特許請求の範囲】 / 芳香族ビニル−アクリロニトリル共重合体を製造す
る装置内に付着する高分子物質を、ジメチルポルムアミ
ド、ジメチルアセトアミド及びジメチルスルホキシドか
ら成る群より選ばれる一種を主成分とする洗浄溶媒を用
い洗浄除去し、洗浄の結果生じた高分子物質及び単量体
を含む溶媒から洗浄溶媒を回収するに際し、 (a)  前記溶媒を連続的に蒸発装置に導入し、(b
)  該蒸発装置において/!IL浄溶媒及び単量体を
蒸発させ、前記溶媒中に含まれている高分子物質を分離
し、 (C)蒸発装置から蒸発させた洗浄溶媒及び単量体の混
合物を蒸気として蒸留塔に供給し、(C1)  同時に
蒸留塔内に水を供給し、塔頂部から水と単量体の共沸混
合物を主成分とする留分を留出し、 (e)  該留分を水を主成分とず4)相とl’を量体
を主成分とする相とに分液し、 (ロ 水を主成分とずろ相の一部又は全部な(d)の水
として用い、 (g)  塔底から精製された洗(−f1’ni媒を回
収する、ことを特徴とする洗トfト溶媒の回収力lJミ
。 記 前記洗浄溶′媒がジメチルポルノ・アミドである特
許請求の範囲第1項記載の方法。 3、 前記単量体がアクリロニトリル及びヌチレンであ
る特許請求の範囲第1項記載の方?iミ。 ”  前記単ft 体力ベンゼン、!・ルエン、キシレ
ン、エチルベンゼン、ヘプタン等の水と共沸する炭化水
素を含む特許請求の範囲第/項記載の方法。
[Scope of Claims] / A method for cleaning polymeric substances adhering to equipment for producing aromatic vinyl-acrylonitrile copolymers, the main component of which is one selected from the group consisting of dimethylpolamide, dimethylacetamide, and dimethylsulfoxide. When washing and removing a solvent and recovering the washing solvent from the solvent containing polymeric substances and monomers produced as a result of washing, (a) the solvent is continuously introduced into an evaporator; (b)
) In the evaporator/! Evaporating the IL cleaning solvent and monomer to separate the polymeric substance contained in the solvent; (C) supplying the mixture of the cleaning solvent and monomer evaporated from the evaporator to the distillation column as vapor; (C1) At the same time, water is supplied into the distillation column, and a fraction containing an azeotrope of water and a monomer as a main component is distilled from the top of the column; 4) Separate the phase and 1' into a phase whose main component is mercury, (b) Use water as part or all of the main component and the mer phase (d), (g) At the bottom of the tower. Claim 1, characterized in that the cleaning solvent is recovered from a purified washing solvent. 3. The method according to claim 1, wherein the monomers are acrylonitrile and nutylene." A method according to claim 1, comprising a hydrocarbon azeotropic with.
JP10627181A 1981-06-19 1981-07-09 How to recover cleaning solvent Expired JPS5950686B2 (en)

Priority Applications (9)

Application Number Priority Date Filing Date Title
JP10627181A JPS5950686B2 (en) 1981-07-09 1981-07-09 How to recover cleaning solvent
IN687/CAL/82A IN158315B (en) 1981-06-19 1982-06-15
GB08217465A GB2101613B (en) 1981-06-19 1982-06-16 Cleansing apparatus in which vinyl-acrylonitrile systems polymerise
MX193207A MX164784B (en) 1981-06-19 1982-06-17 METHOD FOR WASHING AND REMOVING HIGHLY MOLECULAR SUBSTANCES AND METHOD FOR RECOVERING THE WASHING SOLVENT
IT21938/82A IT1152424B (en) 1981-06-19 1982-06-18 WASHING METHOD AND REMOVAL OF HIGH MOLECULAR WEIGHT SUBSTANCES AND WASHING SOLVENT RECOVERY METHOD
CA000405509A CA1204371A (en) 1981-06-19 1982-06-18 Washing and removal method of high molecular substances and recovery method of washing solvent
US06/389,764 US4468257A (en) 1981-06-19 1982-06-18 Washing and removal method of high molecular substances
KR8202738A KR890002372B1 (en) 1981-06-19 1982-06-19 Washing and removal method of high moleculor substances
BR8203624A BR8203624A (en) 1981-06-19 1982-06-21 PROCESS FOR WASHING AND REMOVING HIGH MOLECULAR WEIGHT SUBSTANCES ADHERED INSIDE A PRODUCTION APPLIANCE OR MOLDING MACHINE IN THE PRODUCTION OR MOLDING OF AN AROMATIC-ACRYLONITRILLA VINYL COPOLYMER

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10627181A JPS5950686B2 (en) 1981-07-09 1981-07-09 How to recover cleaning solvent

Publications (2)

Publication Number Publication Date
JPS588714A true JPS588714A (en) 1983-01-18
JPS5950686B2 JPS5950686B2 (en) 1984-12-10

Family

ID=14429413

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10627181A Expired JPS5950686B2 (en) 1981-06-19 1981-07-09 How to recover cleaning solvent

Country Status (1)

Country Link
JP (1) JPS5950686B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009504808A (en) * 2005-08-10 2009-02-05 リンデ アーゲー How to clean the reactor

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04168935A (en) * 1990-10-31 1992-06-17 Fujitsu Ltd Power supply

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009504808A (en) * 2005-08-10 2009-02-05 リンデ アーゲー How to clean the reactor

Also Published As

Publication number Publication date
JPS5950686B2 (en) 1984-12-10

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