JPS5883815A - Electrode construction for liquid crystal display element - Google Patents
Electrode construction for liquid crystal display elementInfo
- Publication number
- JPS5883815A JPS5883815A JP18114781A JP18114781A JPS5883815A JP S5883815 A JPS5883815 A JP S5883815A JP 18114781 A JP18114781 A JP 18114781A JP 18114781 A JP18114781 A JP 18114781A JP S5883815 A JPS5883815 A JP S5883815A
- Authority
- JP
- Japan
- Prior art keywords
- film
- transparent conductive
- display
- conductive film
- thickness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1345—Conductors connecting electrodes to cell terminals
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Liquid Crystal (AREA)
Abstract
Description
【発明の詳細な説明】 不発−は液晶表示素子の電極構造に関する。[Detailed description of the invention] Misfires relate to the electrode structure of liquid crystal display elements.
周知の如く、液晶表示素子の電極は透明導電膜で形成さ
れているが１表示部度が上がると、透明導電膜のシート
抵抗が高くなる。ｔた膜厚を厚くするとｍ抗は下がるが
、透過率が落る。As is well known, the electrodes of a liquid crystal display element are formed of a transparent conductive film, and as the display area increases, the sheet resistance of the transparent conductive film increases. If the film thickness is increased, the resistance will decrease, but the transmittance will also decrease.
この岡題を郷拠するため、従来、第１１１に示すように
、ガラス基板１上に形成した電極を透明導電膜からなる
表示部２とＣｒ膜からなる配一部３に分けている。しか
しながら配線部３には前記の如（Ｃｒ膜などよりなる金
属電極を使用しているため、液晶表示素子全体の透過率
が低下し１表示が暗くなるという欠点が慇った。In order to address this problem, conventionally, as shown in No. 111, an electrode formed on a glass substrate 1 is divided into a display part 2 made of a transparent conductive film and a distribution part 3 made of a Cr film. However, since the wiring portion 3 uses a metal electrode made of a Cr film or the like as described above, the transmittance of the entire liquid crystal display element decreases, resulting in a dark display.
本発明の目的は、表示を著しく暗くすることなく電極の
電気抵抗を低下させることがで舎る液晶表示素子の電極
構造を提供することにある。An object of the present invention is to provide an electrode structure for a liquid crystal display element that can reduce the electrical resistance of the electrodes without significantly darkening the display.
以下、本発明の一実施例を第２１１ＩよりｌＫ＠する。Hereinafter, an embodiment of the present invention will be described from 211I to IK@.
本夷膣例は２重マトリクス電極構造に適用した例を示す
。ガラス基１［１１上に形成した表示＄１２と配一部具
３とを透明導電膜で形成し、かつ表示部１２より配線部
１３の膜厚を厚く形成してなる。This example shows an example of application to a double matrix electrode structure. The display $12 formed on the glass base 1[11] and the mounting member 3 are made of a transparent conductive film, and the wiring portion 13 is formed thicker than the display portion 12.
すなわち、１０００λ未満の膜厚の透明導電膜で形成し
た表示部１２をＩＧＯＯＡ以上１μｍ以下の膜厚の透明
導電膜で形成したＥ線部１３でつないだ電極構造である
。That is, it has an electrode structure in which a display section 12 formed of a transparent conductive film with a thickness of less than 1000 λ is connected by an E-line section 13 formed of a transparent conductive film with a thickness of IGOOA or more and 1 μm or less.
このような構造にすることにより、表示部１２の透過率
は十分大きく表示を暗くしない。また配線部１３は膜厚
が厚いため低い電気抵抗を実現できる。さらに配線部１
３は表示部１旧こ瑯べいくらか透過率が低下するが、金
属を使った場合のように透過率が０となることはなくま
た藺積も小さいため、表示を暗くする割合は従来に比べ
著しく小さい。With this structure, the transmittance of the display section 12 is sufficiently large so that the display does not become dark. Further, since the wiring portion 13 has a thick film thickness, low electrical resistance can be achieved. Furthermore, wiring section 1
In 3, the transmittance of the display part 1 decreases somewhat, but unlike when using metal, the transmittance does not become 0, and the accumulation is small, so the proportion of the display that is darkened is lower than before. Noticeably small.
次にこのような電極構造の形成方法について簡単に述べ
る。ガラス基１［１１上に酸化インジウムを主体とする
透明導電膜を約１番００λ形成し、その上にホトレジス
ト膜を層成した螢、ホトレジスト膜をマスクとして配一
部１３を残してＳＯＷ分の透明導電膜をエツチングする
。ホトレジスト膜を除去した後、ガラス基１［１１上に
酸化インジウムを主体とする透明導電膜を約５００λ形
成する。その上にホトレジスト膜を形成した後ホトレ（
ジス、ト膜をマスクとして配線部１３および表示部１２
を残して他の部分の透明導電膜をエツチングする。ホト
レジスト膜を除去すると第２Ｅの爽施何で示した電極構
造が得られる。この方法で作剃した電極は表示部１２の
、透明導電膜の厚さが５００λであり、配線部１３の厚
さが２ｏｏｏＡとなる。Next, a method for forming such an electrode structure will be briefly described. A transparent conductive film mainly composed of indium oxide is formed on a glass substrate 1 [11], and a photoresist film is layered on top of the transparent conductive film. Etching the transparent conductive film. After removing the photoresist film, a transparent conductive film mainly composed of indium oxide is formed on the glass substrate 1[11 with a thickness of about 500λ. After forming a photoresist film on it, photoresist (
Wiring section 13 and display section 12 using the resistor film as a mask
The transparent conductive film in other parts is etched except for the remaining parts. When the photoresist film is removed, the electrode structure shown in FIG. 2E is obtained. In the electrode shaved by this method, the thickness of the transparent conductive film of the display section 12 is 500λ, and the thickness of the wiring section 13 is 200A.
ここで、配線部１３の逓−導電膜が２層となっている点
も本発明の特徴の−っである。一般に配−１１ｓ１３は
細くかつ長いので、断線する確率が高いが、２層構造と
なっているため、どちらかの膜に欠陥があっても他方の
膜により修復され断線とならない０２層の膜が同じ箇所
に欠陥をもつ確率はきわめて少ないため、配線部１３が
断−する確率はきわめて小さくなる。Here, another feature of the present invention is that the electrically conductive film of the wiring portion 13 has two layers. Generally, wiring 11s13 is thin and long, so there is a high probability of wire breakage, but since it has a two-layer structure, even if there is a defect in either film, it will be repaired by the other film and the wire will not break. Since the probability of having a defect at the same location is extremely low, the probability that the wiring portion 13 is disconnected is extremely low.
本発明によれば１表示部度の高い液晶表示素子にぶいて
透過率を著しく低下させ、全体を暗くすることなく電極
の電気抵抗を低下させる効果がある。また鎗随的な効果
として、電極の配線部の断線の確率を著しく小さくする
ことができる。According to the present invention, the transmittance is significantly reduced for a liquid crystal display element with a high display area, and the electrical resistance of the electrodes is reduced without darkening the entire display. Additionally, as an additional effect, the probability of disconnection in the wiring portion of the electrode can be significantly reduced.
ａｍの簡単な説明
ｊｌｌｍｌは従来例の断ＩＩ図、第２図は本発明の一実
施例を示し、（ａ）は正面図、（ｂ）は断面図である。Brief explanation of amjllml is a sectional view II of a conventional example, and FIG. 2 shows an embodiment of the present invention, in which (a) is a front view and (b) is a sectional view.
１１−・・ガラス基板、 １２−・表示部、１３−配
線部。11--Glass substrate, 12--Display section, 13--Wiring section.
第１図 第２図 （０） （ｂ）Figure 1 Figure 2 (0) (b)
Claims (1)
部より配一部の膜厚を厚くしたと七を特徴とする箪晶−
示素子の電極構造。 ２、膜厚は、表示部を１０００λ未満、配線部を１ｏｏ
ｏ＾以上１μｍ以下とすることを特徴とする特許請求の
範８１１１１ｊ１’１４Ｗ！！−の液晶表示素子の電極
構造。[Scope of Claims] 1. A display device characterized in that the display part and the wiring part are formed of a transparent conductive film, and the film thickness of the wiring part is thicker than that of the display part.
electrode structure of the display element. 2. The film thickness is less than 1000λ for the display part and 100λ for the wiring part.
Claim 81111j1'14W, characterized in that it is not less than o^ and not more than 1 μm! ! - electrode structure of a liquid crystal display element.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18114781A JPS5883815A (en) | 1981-11-13 | 1981-11-13 | Electrode construction for liquid crystal display element |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18114781A JPS5883815A (en) | 1981-11-13 | 1981-11-13 | Electrode construction for liquid crystal display element |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5883815A true JPS5883815A (en) | 1983-05-19 |
Family
ID=16095703
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18114781A Pending JPS5883815A (en) | 1981-11-13 | 1981-11-13 | Electrode construction for liquid crystal display element |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5883815A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5270845A (en) * | 1987-02-19 | 1993-12-14 | Mitsubishi Denki K.K. | Liquid crystal display unit manufacturing method including forming one of two gate line layers of display electrode material |
-
1981
- 1981-11-13 JP JP18114781A patent/JPS5883815A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5270845A (en) * | 1987-02-19 | 1993-12-14 | Mitsubishi Denki K.K. | Liquid crystal display unit manufacturing method including forming one of two gate line layers of display electrode material |
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