JPH09251161A - Substrate for display element - Google Patents

Substrate for display element

Info

Publication number
JPH09251161A
JPH09251161A JP5865896A JP5865896A JPH09251161A JP H09251161 A JPH09251161 A JP H09251161A JP 5865896 A JP5865896 A JP 5865896A JP 5865896 A JP5865896 A JP 5865896A JP H09251161 A JPH09251161 A JP H09251161A
Authority
JP
Japan
Prior art keywords
transparent electrode
substrate
layer
antireflection layer
transparent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5865896A
Other languages
Japanese (ja)
Other versions
JP3592830B2 (en
Inventor
Toshiaki Anzaki
利明 安崎
Hideaki Saito
英昭 斉藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Sheet Glass Co Ltd
Original Assignee
Nippon Sheet Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Sheet Glass Co Ltd filed Critical Nippon Sheet Glass Co Ltd
Priority to JP5865896A priority Critical patent/JP3592830B2/en
Publication of JPH09251161A publication Critical patent/JPH09251161A/en
Application granted granted Critical
Publication of JP3592830B2 publication Critical patent/JP3592830B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Optical Filters (AREA)

Abstract

PROBLEM TO BE SOLVED: To obtain a substrate for a display element having high resistance against an electric field, high heat and moisture resistance and water resistance in the voltage input terminal by depositing, from a transparent substrate, a lower antireflection layer, a metal layer and an upper antireflection layer to constitute a transparent electrode for a display part, while forming only the lower antireflection layer as the electrode in the input terminal part. SOLUTION: A transparent electrode 4 is patterned into a predetermined form of an electrode on the surface of a glass substrate 5. The transparent electrode 4 consists of a transparent electrode 4a in a display part and an electrode 4b in an input terminal part which is extended from the transparent electrode 4a to the edge of the glass substrate. The transparent electrode 4a in the display part consists of a laminated body comprising, from the glass substrate 5, a lower antireflection layer 1, a metal layer 2 and an upper antireflection layer 4 deposited in this order, while the electrode 4b in the input terminal part consists of only the lower antireflection layer 1. Since no metal layer is used on the contact point with a transparent electrode of an external input terminal and on the area near the contact point, the obtd. substrate having a transparent conductive film has both of high transmittance for visible rays and durability against an electric field.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、液晶表示素子など
の薄型表示素子に用いられる透明電極付き基板に関し、
とりわけ大面積で高精細、高速応答の液晶表示素子に好
適に用いられる透明電極付き基板およびそれを用いた液
晶表示素子に関する。また本発明の透明電極付き基板は
プラズマ表示素子やプラズマアドレス液晶表示素子など
の他の電気信号により駆動する表示素子にも適用するこ
とができる。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate with a transparent electrode used for a thin display device such as a liquid crystal display device,
Particularly, the present invention relates to a substrate with a transparent electrode, which is preferably used for a liquid crystal display device having a large area, high definition, and high speed response, and a liquid crystal display device using the same. Further, the substrate with a transparent electrode of the present invention can be applied to a display element driven by other electric signals such as a plasma display element and a plasma addressed liquid crystal display element.

【0002】[0002]

【従来の技術】従来、液晶表示素子に用いられる透明電
極付き基板としては、錫を含有する酸化インジウム(I
TO)をガラス基板表面に被覆したものが用いられてい
る。この基板のITO透明電極を所定形状の透明電極に
パターン加工したものは、可視光の透過性が優れている
が、透明導電膜の抵抗率は10ー4Ωcmオーダーという
大きな値を有するため、表示面積を大きく、また、表示
の高精細化、高速応答化を実現するためには、透明電極
の膜厚を厚くしなければならないという問題があった。
2. Description of the Related Art Conventionally, as a substrate with a transparent electrode used for a liquid crystal display element, tin-containing indium oxide (I
A glass substrate coated with (TO) is used. The ITO transparent electrode of this substrate, which is patterned into a transparent electrode of a predetermined shape, has excellent transparency to visible light, but the transparent conductive film has a large resistivity of the order of 10 −4 Ωcm. There is a problem that the film thickness of the transparent electrode must be increased in order to increase the area and realize the high definition display and the high speed response.

【0003】透明導電膜の膜厚が厚くなると、高精細な
形状の電極を歩留りよく形成することが困難になり、ま
た液晶表示素子内部に透明電極による顕著な段差が形成
されるので、ラビングなどによる液晶の配向処理におい
てこの段差部周辺で配向不良が生じるという問題があっ
た。この問題を解決するために、抵抗率の小さい銀の薄
膜を導電層とし、透過率の向上をはかるために、この銀
層をITOなどの導電性反射防止層で挟んだ3層構造の
透明電極が、液晶表示用透明電極として特開昭63−1
87399号公報や特開平7ー114841号公報に開
示されている。
If the thickness of the transparent conductive film is increased, it becomes difficult to form electrodes with a high definition in a high yield, and a remarkable step due to the transparent electrodes is formed inside the liquid crystal display element. There is a problem in that the alignment process of the liquid crystal by the above causes the alignment defect around the step portion. In order to solve this problem, a silver thin film having a low resistivity is used as a conductive layer, and in order to improve the transmittance, this silver layer is sandwiched between conductive antireflection layers such as ITO, and has a three-layer structure transparent electrode. As a transparent electrode for liquid crystal display
It is disclosed in Japanese Patent No. 87399 and Japanese Patent Application Laid-Open No. 7-114841.

【0004】[0004]

【発明が解決しようとする課題】しかしながら、導電層
に銀の薄膜を用いる従来の技術は、透明性(可視光線透
過率)と低抵抗特性を併せ有するが、入力端子接続部で
の強い電界によって、銀が移動し腐食劣化を起こすとい
う問題点があった。また、入力端子部近傍は外気に直接
触れる状態で使用されるので、耐湿性や耐水性が十分で
なく、経時的に劣化するという問題があった。本発明
は、従来技術が有する上記問題点を解決するためになさ
れたものである。
However, the conventional technique of using a silver thin film for the conductive layer has both transparency (visible light transmittance) and low resistance characteristics, but the strong electric field at the input terminal connecting portion However, there is a problem that silver migrates and causes corrosion deterioration. Further, since the vicinity of the input terminal portion is used in a state of being directly exposed to the outside air, there is a problem that the moisture resistance and the water resistance are not sufficient and the material deteriorates with time. The present invention has been made in order to solve the above-mentioned problems of the related art.

【0005】[0005]

【課題を解決するための手段】本発明は、透明基板の一
方の主表面上に透明電極が形成された表示素子用透明電
極付き基板において、前記表示素子が形成されるときに
表示部となる前記透明電極を、前記透明基板から数えて
下部反射防止層、金属層、上部反射防止層の順に積層
し、前記表示部の透明電極に連なる入力端子部の電極
を、前記下部反射防止層、前記上部反射防止層あるいは
透明基板から前記下部反射防止層と前記上部反射防止層
とをこの順序に被覆した積層体とし、かつ導電性とした
表示素子用透明電極付き基板である。
The present invention provides a substrate with a transparent electrode for a display element, in which a transparent electrode is formed on one main surface of a transparent substrate, which serves as a display portion when the display element is formed. The transparent electrode, the lower antireflection layer counting from the transparent substrate, a metal layer, an upper antireflection layer are laminated in this order, the electrode of the input terminal portion connected to the transparent electrode of the display unit, the lower antireflection layer, the It is a substrate with a transparent electrode for a display element, which is a laminated body in which an upper antireflection layer or a transparent substrate is coated with the lower antireflection layer and the upper antireflection layer in this order, and is made conductive.

【0006】本発明の透明電極付き基板を液晶表示素子
に用いるときは、液晶が封入される密閉空間内(液晶セ
ル内)の表示部の透明電極が、透明基板から数えて下部
反射防止層、金属層、上部反射防止層の順で被覆された
積層体となるように組み立てられる。
When the substrate with a transparent electrode of the present invention is used for a liquid crystal display element, the transparent electrode of the display portion in the closed space (in the liquid crystal cell) in which the liquid crystal is sealed is the lower antireflection layer counted from the transparent substrate, The metal layer and the upper antireflection layer are assembled in this order to form a laminated body.

【0007】さらに、表示部の透明電極から連なり、少
なくとも入力端子部、さらにその近傍の透明電極は、下
部反射防止層、上部反射防止層あるいは透明基板側から
下部反射防止層と上部反射防止層とをこの順序に被覆し
た積層体となるようにし、かつ導電性を有する層となる
ように組み立てられる。
Further, at least the input terminal portion and the transparent electrodes in the vicinity thereof are connected to the transparent electrodes of the display section, and the lower antireflection layer, the upper antireflection layer, or the lower antireflection layer and the upper antireflection layer from the transparent substrate side. Are coated in this order to form a laminated body, and are assembled so as to form a conductive layer.

【0008】本発明の下部反射防止層または上部反射防
止層は、550nmの波長における屈折率が1.6〜
2.9の可視光線波長域で透明な金属酸化物を用いるこ
とができる。これらの金属酸化物としては、酸化インジ
ウム、酸化亜鉛、酸化錫、酸化ネオジウム、酸化ジルコ
ニウム、酸化セリウム、酸化カドミウム、酸化アンチモ
ン、五酸化タンタル、酸化ビスマス、二酸化チタニウ
ム、酸化アルミニウムやこれらの混合物からなる複合酸
化物が例示できる。さらに屈折率が小さい二酸化珪素を
屈折率調整の目的のために、上記透明金属酸化物と混合
して用いることができる。
The lower antireflection layer or the upper antireflection layer of the present invention has a refractive index of 1.6 to 550 nm.
A metal oxide transparent in the visible light wavelength range of 2.9 can be used. These metal oxides include indium oxide, zinc oxide, tin oxide, neodymium oxide, zirconium oxide, cerium oxide, cadmium oxide, antimony oxide, tantalum pentoxide, bismuth oxide, titanium dioxide, aluminum oxide and mixtures thereof. A complex oxide can be illustrated. Further, silicon dioxide having a smaller refractive index can be used as a mixture with the transparent metal oxide for the purpose of adjusting the refractive index.

【0009】本発明の上部反射防止層は、酸化インジウ
ムを主成分とする層が好ましく、なかでも錫を含有させ
た酸化インジウム(ITO)が好ましい。また、酸化亜
鉛を主成分とする層と、酸化インジウムを主成分とする
層をこの順で積層した積層体とも好ましく用いられる。
この場合、アルミニウムを少量ドープした酸化亜鉛(A
ZOまたはZnO:Alで表記される)とITOの積層
体とするのが最も好ましい。
The upper antireflection layer of the present invention is preferably a layer containing indium oxide as a main component, and in particular, indium oxide containing tin (ITO) is preferable. A layered body in which a layer containing zinc oxide as a main component and a layer containing indium oxide as a main component are stacked in this order is also preferably used.
In this case, zinc oxide (A
Most preferred is a laminate of ZO or ZnO: Al) and ITO.

【0010】本発明においては、入力端子部の透明電極
は、反射防止層により形成される。ここで入力端子部と
は、ガラス基板周辺部に設けられる外部入力装置との接
触部およびその近傍を含み、液晶物質を2枚の透明基板
の間に封入する封止材の外周側のガラス基板表面の全部
を含む。さらに、表示部の透明電極と入力端子部の透明
電極の境界は、液晶セル内で実質的に画像表示に関与し
ない位置、封止材が設けられている位置に設けてもよ
い。本発明においては、表示部の透明電極の導電性は、
可視光線で透明な金属層により確保されるが、入力端子
部の透明電極は、下部反射防止層または上部反射防止層
の導電性により確保される必要がある。従って上記の下
部反射防止層および上部反射防止層のうちいずれか一方
の反射防止層は、透明導電性の金属酸化物であることが
必要である。かかる酸化物としては、酸化インジウム、
酸化インジウム主成分の酸化物、アルミニウムを少量含
有する酸化亜鉛などが例示でき、とりわけITOが電極
加工がしやすい点で好ましい。
In the present invention, the transparent electrode of the input terminal portion is formed of the antireflection layer. Here, the input terminal portion includes the contact portion with the external input device provided in the peripheral portion of the glass substrate and its vicinity, and the glass substrate on the outer peripheral side of the encapsulating material for enclosing the liquid crystal substance between the two transparent substrates. Includes all of the surface. Further, the boundary between the transparent electrode of the display section and the transparent electrode of the input terminal section may be provided at a position in the liquid crystal cell that does not substantially participate in image display or at a position where the sealing material is provided. In the present invention, the conductivity of the transparent electrode of the display unit,
Although it is ensured by a metal layer which is transparent to visible light, the transparent electrode of the input terminal portion needs to be ensured by the conductivity of the lower antireflection layer or the upper antireflection layer. Therefore, either one of the lower antireflection layer and the upper antireflection layer must be a transparent conductive metal oxide. Such oxides include indium oxide,
Examples thereof include oxides containing indium oxide as a main component and zinc oxide containing a small amount of aluminum. In particular, ITO is preferable in terms of easy electrode processing.

【0011】本発明の金属層は、銀または銀主成分の金
属が好ましく用いられる。銀に抵抗を著しく低下させな
い程度に、また耐湿熱性を向上させるためにパラジウ
ム、金、白金などの金属を含ませることができる。この
ときの金属層の体積抵抗率は、10μΩcm以下とする
のが好ましい。
For the metal layer of the present invention, silver or a metal containing silver as a main component is preferably used. Metals such as palladium, gold and platinum may be included in silver to the extent that resistance is not significantly lowered and in order to improve resistance to heat and humidity. The volume resistivity of the metal layer at this time is preferably 10 μΩcm or less.

【0012】本発明においては、可視光線に対する透明
性および低い面積抵抗を確保する上で、下部反射防止層
の膜厚を10〜200nmとするのが好ましく、金属層
の膜厚を5〜100nmとするのが好ましく、上部反射
防止層の膜厚を10〜200nmとするのが好ましい。
In the present invention, the thickness of the lower antireflection layer is preferably 10 to 200 nm and the thickness of the metal layer is 5 to 100 nm in order to secure transparency to visible light and low sheet resistance. The thickness of the upper antireflection layer is preferably 10 to 200 nm.

【0013】本発明の金属層は、さらに下部反射防止層
または上部反射防止層と同じ組成の分割層で2層以上に
分割することができる。すなわち分割層を1つまたはそ
れ以上挿入することにより、2つまたはそれ以上の層数
の金属層に分割することができる。これにより、金属層
を分割しない場合に比べ、ほぼ同じ面積抵抗で有れば、
より高い透過率の透明導電膜付き基板とするすることが
できる。このように前記金属層を分割する場合は、それ
ぞれの分割された金属層の膜厚の総和が100nm以下
とするのが好ましい。
The metal layer of the present invention can be further divided into two or more layers with a dividing layer having the same composition as the lower antireflection layer or the upper antireflection layer. That is, by inserting one or more dividing layers, it is possible to divide into two or more metal layers. As a result, if the sheet resistance is almost the same as in the case where the metal layer is not divided,
A substrate with a transparent conductive film having higher transmittance can be obtained. When the metal layer is divided as described above, the total thickness of the divided metal layers is preferably 100 nm or less.

【0014】本発明に用いることのできる基板として
は、ソーダライムシリカ組成のガラスや硼珪酸ガラス
(無アルカリガラス)などの公知のガラス基板はもちろ
ん、ポリエチレンテレフタレート(PET)やアクリル
(PMMA)などのプラスチック基板やプラスチックフ
ィルム、さらにはこれらの基板表面上にカラー表示を目
的としたカラーフイルタを設けた基板を例示することが
できる。またこれらの基板は平面である必要はなく、曲
面を有した基板でもよい。
As the substrate that can be used in the present invention, not only known glass substrates such as glass of soda lime silica composition and borosilicate glass (non-alkali glass) but also polyethylene terephthalate (PET) and acrylic (PMMA) are used. Examples thereof include a plastic substrate, a plastic film, and a substrate provided with a color filter for the purpose of color display on the surface of these substrates. Further, these substrates do not have to be flat and may be substrates having a curved surface.

【0015】[0015]

【発明の実施の態様】本発明の実施態様を下記に説明す
る。図1は、本発明の透明電極付き基板の一実施例で、
アルカリ溶出防止用二酸化珪素膜(図示されてない)が
表面に被覆されたガラス基板5の表面上に、透明電極4
が所定形状に電極加工されて形成されている。この透明
電極4は、液晶表示素子とするときの表示部4aと表示
部の透明電極4aに連なりガラス基板の端にまで引き出
された入力端子部の電極4bからなっている。表示部の
透明電極4aは、図1のAA断面図で示されるように、
下部反射防止層1と金属層2と上部反射防止層3とがガ
ラス基板5側からこの順に被覆された積層体でできてお
り、入力端子部の電極4bは、下部反射防止層1のみか
らなる。図5は、本発明の透明電極付き基板を用いて作
成した液晶表示素子の一実施例の断面図である。2枚の
本発明の透明電極付きガラス基板が、一定間隔を置いて
エポキシ樹脂等の有機樹脂からなる封止材14により接
着され、密閉空間を有する液晶セル13が形成されてい
る。液晶セル13には液晶(図中黒丸で示されている)
が封じ込められており、この液晶は表面に液晶を配向す
るための配向膜12が塗布された透明電極の間に印加さ
れた電圧により配向制御が行われ、画像や文字表示が行
われる。図5においては、本発明の表示部の透明電極4
aと入力端子部の透明電極4bの境界は、液晶セル13
内の周辺部に設けられている。
BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below. FIG. 1 shows an example of a substrate with a transparent electrode according to the present invention.
A transparent electrode 4 is formed on the surface of a glass substrate 5 whose surface is covered with a silicon dioxide film (not shown) for preventing alkali elution.
Are electrode-formed into a predetermined shape. The transparent electrode 4 is composed of a display portion 4a used as a liquid crystal display element and an electrode 4b of an input terminal portion which is connected to the transparent electrode 4a of the display portion and is extended to the end of the glass substrate. The transparent electrode 4a of the display unit is, as shown in the AA sectional view of FIG.
The lower antireflection layer 1, the metal layer 2, and the upper antireflection layer 3 are made of a laminated body which is coated in this order from the glass substrate 5 side, and the electrode 4b of the input terminal portion is composed of only the lower antireflection layer 1. . FIG. 5 is a cross-sectional view of an embodiment of a liquid crystal display device produced using the substrate with a transparent electrode of the present invention. Two glass substrates with a transparent electrode according to the present invention are adhered at regular intervals with a sealing material 14 made of an organic resin such as an epoxy resin to form a liquid crystal cell 13 having a sealed space. Liquid crystal in the liquid crystal cell 13 (indicated by a black circle in the figure)
The liquid crystal is contained, and the alignment is controlled by the voltage applied between the transparent electrodes coated with the alignment film 12 for aligning the liquid crystal on the surface, and images and characters are displayed. In FIG. 5, the transparent electrode 4 of the display unit of the present invention is shown.
The boundary between the liquid crystal cell 13a and the transparent electrode 4b of the input terminal is
It is provided in the inner peripheral area.

【0016】入力端子部の電極4bは、外気が直接触れ
る液晶セル13の外側全面に設けられ、入力端子部電極
のガラス基板の先端部分で入力端子16と接続されてい
る。
The electrode 4b of the input terminal portion is provided on the entire outer surface of the liquid crystal cell 13 which is directly exposed to the outside air, and is connected to the input terminal 16 at the tip portion of the glass substrate of the input terminal portion electrode.

【0017】上記の透明電極付き基板の各層は、スパッ
タリングや真空蒸着法により、ガラス基板と層を被覆す
るための原料(スパッタリングではターゲット、蒸着で
は蒸発材料)との間に適宜マスキング板を設置する方法
により行うことができる。
For each layer of the above-mentioned substrate with a transparent electrode, a masking plate is appropriately provided between the glass substrate and the raw material (target for sputtering, evaporation material for vapor deposition) for coating the layer by sputtering or vacuum vapor deposition. It can be performed by a method.

【0018】たとえば、ガラス基板全面にスパッタリン
グや真空蒸着法により下部反射防止層1としてのITO
を被覆し、その後表示部となるガラス基板の中央部分が
開放されその周辺部分が遮蔽されるようなマスキング治
具を介して金属層2としての銀及び上部反射防止層3と
してのITOをスパッタリングや真空蒸着法により引き
続き被覆形成する方法を用いることができる。その後必
要により、感光性レジストやドライフイルムによるフオ
トリソグラフイ法を用いた酸によるエッチングにより、
ITO、銀、ITOの3層を一工程で所定形状に電極加
工する。
For example, ITO as the lower antireflection layer 1 is formed on the entire surface of the glass substrate by sputtering or vacuum deposition.
And then the silver as the metal layer 2 and the ITO as the upper antireflection layer 3 are sputtered through a masking jig that opens the central portion of the glass substrate to be the display portion and shields the peripheral portion. A method of subsequently forming a coating by a vacuum vapor deposition method can be used. After that, if necessary, by acid etching using a photolithographic method using a photosensitive resist or dry film,
The electrodes of the three layers of ITO, silver and ITO are processed into a predetermined shape in one step.

【0019】図3は、本発明の透明電極付き基板6の他
の実施例である。マスキング治具を介して行うスパッタ
リングや真空蒸着法により、ガラス基板1の液晶表示素
子としたときに表示部となる部分4aに、下部反射防止
層1としての酸化チタニウムなどの酸不溶性の透明絶縁
膜および金属層2としての銀層を被覆積層する。その後
マスキング治具を用いずにガラス基板全体に上部反射防
止層3としてのITOを被覆する。得られた透明電極付
き基板は、必要によりフオトリソグラフイ法を用いた酸
によるエッチングにより銀層及び上部反射防止層のIT
Oを一工程で所定形状に電極加工する。
FIG. 3 shows another embodiment of the substrate 6 with a transparent electrode according to the present invention. An acid-insoluble transparent insulating film such as titanium oxide serving as the lower antireflection layer 1 is formed on the portion 4a of the glass substrate 1 that serves as a display portion by a sputtering or vacuum deposition method performed through a masking jig. And a silver layer as the metal layer 2 is coated and laminated. Thereafter, the entire glass substrate is covered with ITO as the upper antireflection layer 3 without using a masking jig. The obtained transparent electrode-attached substrate was subjected to etching with an acid using a photolithography method, and the IT of the silver layer and the upper antireflection layer was obtained as necessary.
The electrode of O is processed into a predetermined shape in one step.

【0020】図4は本発明の他の実施例で、表示部4a
の電極はガラス基板/下部反射防止層としてのITO層
/銀層/分割層としてのITO層/銀層/上部反射防止
層としてのITO層の5層からなり、入力端子部の電極
4bは下部反射防止層としてのITO層からなることを
示している。この場合、入力端子部の電極は、下部反射
防止層としてのITO層/分割層としてのITO層/上
部反射防止層としてのITO層の3回に分けて被覆され
たITO層としてもよい。
FIG. 4 shows another embodiment of the present invention, which is a display portion 4a.
The electrode of 5 is composed of 5 layers of glass substrate / ITO layer as lower anti-reflection layer / silver layer / ITO layer as dividing layer / silver layer / ITO layer as upper anti-reflection layer, and the electrode 4b in the input terminal part is the lower part. It shows that it is composed of an ITO layer as an antireflection layer. In this case, the electrode of the input terminal portion may be an ITO layer which is coated three times, that is, an ITO layer as a lower antireflection layer / an ITO layer as a division layer / an ITO layer as an upper antireflection layer.

【0021】入力端子装置との接続点である透明電極の
耐電界性、耐湿熱性および耐アルカリ性の高さで評価さ
れる化学的耐久性、基板込みの可視光透過率の高さで評
価される透明性、シート抵抗の低さで評価される電気的
特性、エッチングのし易さと面内の均一性で評価される
電極加工性を評価した。これらの特性から、本発明のと
りわけ好ましい実施態様としては、シート抵抗値で約
2.5Ω/□以下1、5Ω/□以上、可視光透過率60%
以上という特性を示す透明電極の封止した表示セル内で
基板/ITO/銀/ITO/銀/ITOの積層構造をと
り、かつ入力端子部透明電極は基板/ITO、基板/I
TO/ITO(下部反射防止層のITOと上部反射防止
層のITOとの積層体)、または基板/ITO/ITO
/ITO(下部反射防止層としてのITOと分割層とし
てのITOと上部反射防止層としてのITOとの積層体
を意味する)とすることが挙げられる。1.5Ω/□以
下の範囲で可視光透過率60%以上という特性を有する
本発明の基板としては、表示部で基板/ITO/銀/I
TO/銀/ITO/銀/ITOの積層構造をとり、入力
端子部の電極を基板/ITO、基板/ITO/ITO、
基板/ITO/ITO/ITO、または基板/ITO/
ITO/ITO/ITOで構成したものが例示できる。
The transparent electrode, which is a connection point with the input terminal device, has a chemical durability evaluated by high electric field resistance, high humidity resistance and high alkali resistance, and high visible light transmittance including the substrate. The electrical characteristics evaluated by transparency and low sheet resistance, and the electrode workability evaluated by ease of etching and in-plane uniformity were evaluated. From these characteristics, as a particularly preferred embodiment of the present invention, the sheet resistance value is about 2.5Ω / □ or less 1, 5Ω / □ or more, and the visible light transmittance is 60%.
In the display cell in which the transparent electrode having the above characteristics is sealed, a laminated structure of substrate / ITO / silver / ITO / silver / ITO is adopted, and the transparent electrode of the input terminal is substrate / ITO, substrate / I.
TO / ITO (a laminated body of ITO of the lower antireflection layer and ITO of the upper antireflection layer) or substrate / ITO / ITO
/ ITO (meaning a laminated body of ITO as a lower antireflection layer, ITO as a dividing layer, and ITO as an upper antireflection layer). The substrate of the present invention having a visible light transmittance of 60% or more in the range of 1.5Ω / □ or less includes a substrate / ITO / silver / I in the display unit.
It has a laminated structure of TO / silver / ITO / silver / ITO, and the electrodes of the input terminal are substrate / ITO, substrate / ITO / ITO,
Substrate / ITO / ITO / ITO or Substrate / ITO /
An example is one composed of ITO / ITO / ITO.

【0022】以下に実施例で本発明を説明する。 実施例1 縦400mm横300mm厚さ0.7mmの単純マトリ
ックス液晶表示用ソーダライムシリカ組成のガラス基板
を洗浄した後、アルカリパッシベーション用二酸化珪素
層を30nm形成した。つぎにスパッタリングターゲッ
トとして10重量%の酸化錫を含む酸化インジウム、銀
をそれぞれ用いて、DCスパッタリング法により、IT
O層/銀層/ITO層をそれぞれ膜厚で40nm、15
nm、40nmになるよう順次ガラス基板上に被覆し、
透明電極付き基板のサンプル1を得た。この際、マスキ
ング治具により、電圧入力装置と接続する場所およびそ
の近傍には銀層の被覆が行われないようにした。このサ
ンプル1の入力端子部の電極は、ITO単層からなる
が、その積層は下部反射防止層ITOと上部反射防止層
ITOの2回のスパッタリングにより形成されている。
入力端子部の電極の成膜履歴をスラッシュにより表して
いる。表1に電極の構成と、耐久性試験結果をまとめて
示す。
The present invention will be described below with reference to examples. Example 1 A glass substrate of 400 mm in length, 300 mm in width and 0.7 mm in thickness having a soda lime silica composition for simple matrix liquid crystal display was washed, and then a silicon dioxide layer for alkali passivation was formed to a thickness of 30 nm. Then, using indium oxide containing 10% by weight of tin oxide and silver as sputtering targets, respectively, by a DC sputtering method, IT
O layer / silver layer / ITO layer having a thickness of 40 nm, 15
nm and 40 nm are sequentially coated on the glass substrate,
A sample 1 of a substrate with a transparent electrode was obtained. At this time, a masking jig was used to prevent the silver layer from being coated on and near the place where the voltage input device was connected. The electrode of the input terminal portion of this sample 1 is composed of an ITO single layer, and the lamination is formed by sputtering the lower antireflection layer ITO and the upper antireflection layer ITO twice.
The film formation history of the electrode of the input terminal portion is represented by a slash. Table 1 collectively shows the configuration of the electrodes and the results of the durability test.

【0023】得られた透明電極をフオトリソグラフイ法
により電極幅70μm、電極間隔15μmのストライプ
状透明電極になるように、酸として塩酸及び硝酸を含む
水溶液からなるエッチング液により電極パターン加工を
した。 実施例2〜6 実施例1と同じガラス基板を用い、表示部の電極構造、
入力端子部の電極構造および金属層の分割について変更
して本発明の透明電極付き基板のサンプル2〜6を得
た。それらの電極の構造、入力端子部の成膜履歴および
耐久性試験結果を表1に示す。
The transparent electrode thus obtained was patterned by an etching solution containing an aqueous solution containing hydrochloric acid and nitric acid as an acid so as to form a stripe transparent electrode having an electrode width of 70 μm and an electrode interval of 15 μm by a photolithography method. Examples 2 to 6 Using the same glass substrate as in Example 1, the electrode structure of the display section,
By changing the electrode structure of the input terminal portion and the division of the metal layer, Samples 2 to 6 of the substrate with a transparent electrode of the present invention were obtained. Table 1 shows the structures of these electrodes, the film formation history of the input terminal portion, and the durability test results.

【0024】比較例1〜4 実施例と同じガラス基板を用いて、表示部と入力端子部
の両部分に、金属層として銀層を設けた透明電極付き基
板の比較サンプル1〜4を作成した。サンプル1〜4の
電極構造および実施例1と同じ方法で評価した耐久性の
試験結果を表1に示す。得られた透明電極をフオトリソ
グラフイ法により電極幅70μm、電極間隔15μmの
ストライプ状透明電極になるように、酸として塩酸及び
硝酸を含む水溶液からなるエッチング液により電極パタ
ーン加工をした。
Comparative Examples 1 to 4 Comparative samples 1 to 4 of transparent electrode-equipped substrates in which a silver layer was provided as a metal layer on both the display portion and the input terminal portion were prepared using the same glass substrate as in the examples. . Table 1 shows the durability test results evaluated by the same method as in the electrode structures of Samples 1 to 4 and Example 1. The obtained transparent electrode was subjected to an electrode pattern processing by a photolithography method so as to form a striped transparent electrode having an electrode width of 70 μm and an electrode interval of 15 μm with an etching solution containing an aqueous solution containing hydrochloric acid and nitric acid as acids.

【0025】[0025]

【表1】 [Table 1]

【0026】上記の実施例から、本発明の透明電極付き
基板の電極は、入力端子部での電圧印加に対する耐久性
が、従来技術として説明される比較例の電極構造を有す
るものよりも格段に優れていることが分かる。また、銀
を含む構造の透明電極を液晶表示素子の外部雰囲気に触
れる箇所に設けることなく液晶セル内に設ける構造とす
れば、電圧印加に対する耐久性の向上に併せて、耐湿熱
性、耐水性が併せ得られるものと期待される。
From the above examples, the electrodes of the substrate with a transparent electrode of the present invention have a much higher durability against voltage application at the input terminal portion than those having the electrode structure of the comparative example described as the prior art. It turns out to be excellent. In addition, if the transparent electrode having a structure containing silver is provided in the liquid crystal cell without being provided in a portion exposed to the external atmosphere of the liquid crystal display element, the durability against voltage application is improved, and the wet heat resistance and water resistance are improved. Expected to be obtained together.

【0027】[0027]

【発明の効果】本発明の透明電極付き基板は、その液晶
表示部となる電極を金属層を含む可視光線透過率が高く
低い抵抗を有するものとし、表示部以外の少なくとも外
部入力端子の透明電極との接点およびその近傍において
金属層を用いていないので、大きな面積を有する表示部
における低抵抗及び高い可視光透過率と入力端子部の電
極部における高い耐電界性を兼ね備えた透明導電膜付き
基板とすることができる。これにより、耐久性の優れた
大画面、高画質の表示素子を得ることができる。
According to the substrate with a transparent electrode of the present invention, the electrode serving as the liquid crystal display part has a high visible light transmittance including a metal layer and a low resistance, and at least the transparent electrode of the external input terminal other than the display part. Since a metal layer is not used at the contact point with and in the vicinity thereof, a substrate with a transparent conductive film that has both low resistance and high visible light transmittance in the display section having a large area and high electric field resistance in the electrode section of the input terminal section Can be This makes it possible to obtain a large-screen, high-quality display element with excellent durability.

【0028】[0028]

【図面の簡単な説明】[Brief description of drawings]

【図1】図1は、本発明の表示素子用透明電極膜付き基
板の一実施例の平面図である。
FIG. 1 is a plan view of an embodiment of a substrate with a transparent electrode film for a display device of the present invention.

【図2】図2は、図1のAーA断面図である。FIG. 2 is a sectional view taken along the line AA in FIG. 1;

【図3】図3は、本発明の表示素子用透明電極付き基板
の他の実施例の断面図である。
FIG. 3 is a cross-sectional view of another embodiment of the substrate with a transparent electrode for a display device of the present invention.

【図4】図4は、本発明の表示素子用透明電極付き基板
の別の実施例の断面図である。
FIG. 4 is a cross-sectional view of another embodiment of the substrate with a transparent electrode for a display device of the present invention.

【図5】図5は、本発明の表示素子用透明電極付き基板
を用いた液晶表示素子の一実施例の断面図である。
FIG. 5 is a cross-sectional view of an embodiment of a liquid crystal display device using the substrate with a transparent electrode for a display device of the present invention.

【0029】[0029]

【符号の説明】[Explanation of symbols]

1:下部反射防止層 2:金属層 3:上部反射防止層 4:透明電極 4a:表示部の透明電極 4b:入力端子部の透明電極 5:透明基板 6:本発明の透明電極付き基板 10:カラーフィルター 11:保護膜 12:配向膜 13:液晶セル 14:封止材 15:本発明の透明電極付き基板を用いた液晶表示素子 16:入力装置1: Lower Antireflection Layer 2: Metal Layer 3: Upper Antireflection Layer 4: Transparent Electrode 4a: Transparent Electrode of Display 4b: Transparent Electrode of Input Terminal 5: Transparent Substrate 6: Substrate with Transparent Electrode of the Present Invention 10: Color filter 11: Protective film 12: Alignment film 13: Liquid crystal cell 14: Encapsulating material 15: Liquid crystal display device using the substrate with a transparent electrode of the present invention 16: Input device

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】透明基板の一方の主表面上に透明電極が形
成された表示素子用透明電極付き基板において、前記表
示素子が形成されるときに表示部となる前記透明電極
を、前記透明基板から数えて下部反射防止層、金属層、
上部反射防止層の順で積層し、前記表示部の透明電極に
連なる入力端子部の電極を、前記下部反射防止層、前記
上部反射防止層あるいは透明基板から前記下部反射防止
層と前記上部反射防止層をこの順序に被覆した積層体と
し、かつ導電性としたことを特徴とする表示素子用透明
電極付き基板。
1. A substrate with a transparent electrode for a display element, wherein a transparent electrode is formed on one main surface of a transparent substrate, wherein the transparent electrode serving as a display portion when the display element is formed is the transparent substrate. Bottom anti-reflection layer, metal layer, counting from
The upper antireflection layer is laminated in this order, and the electrode of the input terminal portion connected to the transparent electrode of the display unit is formed from the lower antireflection layer, the upper antireflection layer or the transparent substrate to the lower antireflection layer and the upper antireflection layer. A substrate with a transparent electrode for a display element, which is a laminated body in which layers are coated in this order, and is made conductive.
【請求項2】前記表示部となる透明電極と前記透明基板
との間に、カラーフイルタが設けられている請求項1に
記載の表示素子用透明電極付き基板。
2. The substrate with a transparent electrode for a display element according to claim 1, wherein a color filter is provided between the transparent electrode that serves as the display section and the transparent substrate.
【請求項3】前記下部反射防止層を550nmの波長に
おける屈折率が1.6〜2.9の透明金属酸化物の層と
し、上部反射防止層を酸化インジウムを主成分とする層
とした請求項1または2に記載の表示素子用透明電極付
き基板。
3. The lower antireflection layer is a transparent metal oxide layer having a refractive index of 1.6 to 2.9 at a wavelength of 550 nm, and the upper antireflection layer is a layer containing indium oxide as a main component. Item 3. A substrate with a transparent electrode for a display device according to item 1 or 2.
【請求項4】前記下部反射防止層を550nmの波長に
おける屈折率が1.6〜2.9の透明金属酸化物の層と
し、上部反射防止層を酸化亜鉛を主成分とする層と、酸
化インジウムを主成分とする層をこの順で積層した積層
体とした請求項1または2に記載の表示素子用透明電極
付き基板。
4. The lower antireflection layer is a layer of a transparent metal oxide having a refractive index of 1.6 to 2.9 at a wavelength of 550 nm, and the upper antireflection layer is a layer containing zinc oxide as a main component and an oxide. The substrate with a transparent electrode for a display element according to claim 1, which is a laminate in which layers containing indium as a main component are laminated in this order.
【請求項5】前記下部反射防止層を酸化インジウムを主
成分とする層とした請求項3または4に記載の表示素子
用透明電極付き基板。
5. The substrate with a transparent electrode for a display element according to claim 3, wherein the lower antireflection layer is a layer containing indium oxide as a main component.
【請求項6】前記表示部となる透明電極の金属層をn
(nは1以上の整数)層の酸化インジウムを主成分とす
る分割層でn+1層に分割した請求項1〜5のいずれか
の項に記載の表示素子用透明電極付き基板。
6. The metal layer of the transparent electrode which becomes the display section is n.
The substrate with a transparent electrode for a display element according to any one of claims 1 to 5, wherein (n is an integer of 1 or more) layers divided into n + 1 layers with a division layer containing indium oxide as a main component.
【請求項7】請求項1〜6に記載の表示素子用透明電極
付き基板を用いた液晶表示素子。
7. A liquid crystal display device using the substrate with a transparent electrode for a display device according to claim 1.
JP5865896A 1996-03-15 1996-03-15 Display element substrate Expired - Fee Related JP3592830B2 (en)

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Application Number Priority Date Filing Date Title
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Publication Number Publication Date
JPH09251161A true JPH09251161A (en) 1997-09-22
JP3592830B2 JP3592830B2 (en) 2004-11-24

Family

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Country Link
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