JPS588075A - Preparation of high purity phthalic anhydride - Google Patents

Preparation of high purity phthalic anhydride

Info

Publication number
JPS588075A
JPS588075A JP10440481A JP10440481A JPS588075A JP S588075 A JPS588075 A JP S588075A JP 10440481 A JP10440481 A JP 10440481A JP 10440481 A JP10440481 A JP 10440481A JP S588075 A JPS588075 A JP S588075A
Authority
JP
Japan
Prior art keywords
phthalic anhydride
catalyst
crude
gas
manganese
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10440481A
Other languages
Japanese (ja)
Other versions
JPS6113710B2 (en
Inventor
Yuichi Kita
裕一 喜多
Kentaro Sakamoto
健太郎 坂本
Takahisa Sato
高久 佐藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Shokubai Co Ltd
Original Assignee
Nippon Shokubai Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Shokubai Co Ltd filed Critical Nippon Shokubai Co Ltd
Priority to JP10440481A priority Critical patent/JPS588075A/en
Priority to US06/394,477 priority patent/US4436922A/en
Priority to DE19823225079 priority patent/DE3225079A1/en
Priority to FR8211850A priority patent/FR2508906A1/en
Publication of JPS588075A publication Critical patent/JPS588075A/en
Publication of JPS6113710B2 publication Critical patent/JPS6113710B2/ja
Granted legal-status Critical Current

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Abstract

PURPOSE:To prepare the titled substance free from phthalide, by contacting crude phthalic anhydride obtained by the vapor-phase catalytic oxidation of o-xylene, with a gas containing molecular oxygen at high temperature in the presence of an Mn-containing alloy composition catalyst. CONSTITUTION:High purity phthalic anhydride is prepared by contacting a crude phthalic anhydride with a gas containing molecular oxygen at 200-300 deg.C for 5-30hr in the presence of an Mn-containing alloy compusition catalyst, and distilling the product. The amount of the molecular oxygen-containing gas is at least 2X10<-4> mole/hour reduced to oxygen gas based on 1kg of the crude phthalic anhydride. The Mn content of the catalyst is at least 0.05wt%, and the catalyst is preferably a Cr-Mn alloy, an Fe-Cr-Mn alloy, etc. Wherein the sum of the contents of Cr and Mn is >10wt%. The contacting area of the catalyst is preferably at least 0.002m<2> per 1kg of the crude raw material, and the contact is preferably carried out by charging the crude raw material in a mesh-type layer packed with the catalyst, and passing the oxygen-containing gas upward through the layer.

Description

【発明の詳細な説明】 本発明はオルソキシレンの接触気相酸化によってえられ
た粗製無水フタル酸を精製し、高純度の無水フタル酸を
製造する方法に関する。詳しく述べると、本発明は、上
記粗製無水フタルiI!中に含まれ、分離が困難である
不純物たとえばフタライドを触媒を用い−て効率よく除
去することによって、高純度の無水フタル酸を製造する
だめの方法に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for producing highly pure phthalic anhydride by purifying crude phthalic anhydride obtained by catalytic gas phase oxidation of ortho-xylene. Specifically, the present invention provides the above-mentioned crude anhydrophthalic iI! The present invention relates to a method for producing highly pure phthalic anhydride by efficiently removing impurities such as phthalide, which are difficult to separate, using a catalyst.

通常一般に、オルソキシレンを原料としてバナジウム系
触媒を用い、接触気相酸イヒして哩水フタル「浚をえる
ことは、工業的に広く行なわれている。この方法により
えられる粗製無水フタル酸中には、主たる不純物として
副生のフタライドが0.05〜1重量係混入し、工業的
に通常用すられている蒸留装置などによっては十分に分
離できず、精製無水フタル酸中に無視しえない量の7タ
ライドが残留し、これが原因で製品品質を低下せしめる
1頃向のあることはよく知られる。
Generally, it is widely practiced industrially to produce phthalic anhydride by catalytic gas phase acidification using ortho-xylene as a raw material using a vanadium-based catalyst. The main impurity contained in the by-product phthalide is 0.05 to 1 weight percent, which cannot be sufficiently separated using distillation equipment commonly used in industry, and is negligible in purified phthalic anhydride. It is well known that a significant amount of 7-thallide remains and this tends to degrade product quality.

そのため、無水フタル酸の製造プロセスにおいては、粗
製無水フタルr俊中の不純物であるフタライド量を極力
低減させ、低い水準に保たれるようにオルソキシレンの
接触気相酸化反応を操作せねばならないことになる。す
なわち、一般には触媒の活性低下にともなうオルソキシ
レンの転化率低下や中間副生物フタライド量の増加を抑
えるために、反応温度を上げる方法をとらざるをえない
のであり、このことは触媒寿命を減少するととくつなが
る。そうでなくても粗製無水フタル酸中には副生フタラ
イドの混在は不可避であね、このフタライドを除去する
ために種々の方法が、無水フタル酸の工業的生産におい
て提案されている。
Therefore, in the production process of phthalic anhydride, the catalytic gas phase oxidation reaction of ortho-xylene must be operated in such a way that the amount of phthalide, which is an impurity in the crude phthalic anhydride, is reduced as much as possible and kept at a low level. become. In other words, in order to suppress the decrease in the conversion rate of ortho-xylene and the increase in the amount of intermediate by-product phthalide due to the decrease in catalyst activity, it is necessary to raise the reaction temperature, which shortens the life of the catalyst. Then you will be especially connected. Even if this is not the case, the presence of by-product phthalide in crude phthalic anhydride is unavoidable, and various methods have been proposed for removing this phthalide in the industrial production of phthalic anhydride.

たとえば、特公昭45−10333号公報明細書によれ
ば、亜硫・俊水素カリウム(KH8C)s)やピロ亜硫
酸カリウム(K2S205)などのアルカリ金属イオウ
化合物を用いて粗製無水フタル酸を処理する方法が開示
され、米国特許″$4165324号明細書によれば水
酸化ナトリウム(Nail()や水酸化カリウム(KO
H)などのアルカリ金属水酸化物を用いて処理する方法
が開示されている。しかし、これらの方法は、以下の如
き欠点があり、工業的に有利に採用するには困難である
ことが指摘される。
For example, according to the specification of Japanese Patent Publication No. 45-10333, there is a method of treating crude phthalic anhydride using an alkali metal sulfur compound such as potassium sulfite/hydrogen (KH8C) or potassium pyrosulfite (K2S205). is disclosed, and according to US Pat. No. 4,165,324, sodium hydroxide (Nail()) and potassium hydroxide (KO
A method of treatment using an alkali metal hydroxide such as H) is disclosed. However, it is pointed out that these methods have the following drawbacks and are difficult to be advantageously employed industrially.

まず前者の方法においては、無水フタル酸の精製工程で
残渣中にイオウ化合物も共存してくるため、この残渣の
処理(たとえば焼却処理)の際に多量のイオウ酸化物を
発生し、公害問題をひき起すことになるし、イオウ化合
物そのものも蒸留装置の腐食などの原因となり易く、こ
れらの問題解決のためには多大の費用を要する欠点があ
る。また後者の方法においては、アルカリ金属水酸化物
そのものの反応性が高いために、添加されるべき@製漂
水フタル:俊によっては、きわめて危険性が高くなる。
First, in the former method, sulfur compounds coexist in the residue during the phthalic anhydride purification process, so a large amount of sulfur oxides are generated during the treatment of this residue (for example, incineration), causing pollution problems. In addition, the sulfur compound itself tends to cause corrosion of distillation equipment, which has the disadvantage that solving these problems requires a large amount of cost. In addition, in the latter method, since the alkali metal hydroxide itself has high reactivity, it becomes extremely dangerous depending on the floating water phthalate to be added.

すなわち、たとえば水・俊化カリウムを液状粗d%水フ
タル酸に添加した場合、その中に言まれる無水マレイン
酸が爆発的に重合し、コークス状の“(合物を形成する
。この反応はきわめて急・敢であり、無水フタル酸製造
装置の運転にとって無視できないことはもちろん、発生
するコークス状重合゛吻による配管、バルブ、蒸留塔の
トレイなどの閉庵の原因となる。さらに水酸化カリウム
と無水マレイン酸との急激な反応の際無水フタル涜やそ
の他の不純物の分解反応をも招来し、これ大巾な低下を
招くことも指摘される。
That is, for example, when water/potassium atomized is added to liquid crude d% hydrophthalic acid, the maleic anhydride contained therein polymerizes explosively to form a coke-like compound. The oxidation is extremely sudden and severe, and cannot be ignored in the operation of the phthalic anhydride production equipment, and the coke-like polymerization that occurs can cause blockages in piping, valves, trays of distillation towers, etc. It has also been pointed out that the rapid reaction between potassium and maleic anhydride also leads to decomposition reactions of phthalic anhydride and other impurities, leading to a large drop in strength.

また、硫酸を用いてフタライドを酸化する方法が米国特
許第3407216号明a4に提案されている。しかし
この方法は処理後に残存する硫酸によって製品無水フタ
ル酸が汚染されるという欠点を胃している。それゆえ、
処理後は硫酸を塩基性物質たとえば炭鷹ナトリウムなど
で中第1して、蒸留して製品をえねばならず、結果的に
は2種類の処理剤による2回の処理を要するということ
で工程それ自体複雑化してくる。そして硫酸そのものが
装置を腐食しやすい薬品であること、加熱処理中にイオ
ウ酸化物が発生したり、蒸留後の残渣中に混入してくる
イオウ化合物の処理も公害防止の点で費用が高くつく欠
点も指摘できる。
Further, a method of oxidizing phthalide using sulfuric acid is proposed in US Pat. No. 3,407,216 Mei A4. However, this method suffers from the disadvantage that the phthalic anhydride product is contaminated by sulfuric acid remaining after processing. therefore,
After the treatment, the sulfuric acid must be mixed with a basic substance, such as sodium charcoal, and then distilled to obtain the product.As a result, two treatments using two types of treatment agents are required, so the process is difficult. That in itself becomes complicated. Furthermore, sulfuric acid itself is a chemical that tends to corrode equipment, and sulfur oxides are generated during heat treatment, and the treatment of sulfur compounds that are mixed into the residue after distillation is expensive in terms of pollution prevention. You can also point out flaws.

さらにフタライドを噴化触媒により酸化して高純度の無
水フタル、浚をえる方法も提案され、たとえば米国特許
第3208’ 423号明細書においては、臭化コバル
ト、臭化マンガンのような重金属臭化物を粗製無水フタ
ル酸に添加し、分子状酸素ガスと接触せしめている。し
かしながら、この方法は、触媒としての臭化物が高価で
あり、しかも回収再使用がきわめて困蝿であることで、
工業的に採用しえない方法である。また同様な目的を達
成するために、西独特許公開第193500g号明細書
には、バナジウム酸化物を担体に担持させた触媒を充填
層につめ、ここへ空気を通じつつ粗製無水)タル酸を通
過せしめて、フタライドの・横比を行なう方法が記載さ
れている。しかしこの方法を採用すると、徂!8!無水
フタルポ中に存在するタール状勿質が担持触媒表面に付
着し、触媒の活性がきわめて短期間のうちに低下してし
まうことがわかった。元来担持触媒は触媒活性物質を担
体表面に効果的に分散担持させてなるものであり、その
調製方法も焼成条件などによりその触媒活性に大きく影
−#を与えることはよく知られる。このような担持触媒
を充填塔内部に充填し固定床として使用する方法ケ、シ
たがって工業的に安定に使用するのは困難といわざるを
えない。
Furthermore, a method of oxidizing phthalide using a blowing catalyst to obtain high-purity anhydrous phthalide has been proposed. For example, in US Pat. No. 3,208'423, heavy metal bromides such as cobalt bromide and manganese bromide It is added to crude phthalic anhydride and brought into contact with molecular oxygen gas. However, this method is difficult because bromide as a catalyst is expensive and it is extremely difficult to recover and reuse it.
This is a method that cannot be adopted industrially. In addition, in order to achieve the same purpose, West German Patent Publication No. 193500g discloses that a catalyst in which vanadium oxide is supported on a carrier is packed in a packed bed, and crude talic acid (anhydrous) is allowed to pass therethrough while air is passed therethrough. A method for performing the lateral ratio of phthalides is described. However, if you use this method, then! 8! It was found that the tar-like residue present in anhydrous phthalpochloride adheres to the surface of the supported catalyst, causing the activity of the catalyst to decrease in a very short period of time. Supported catalysts are originally formed by effectively dispersing and supporting a catalytically active substance on the surface of a carrier, and it is well known that the preparation method and calcination conditions greatly affect the catalytic activity. The method of packing such a supported catalyst inside a packed column and using it as a fixed bed is therefore difficult to use stably on an industrial scale.

本発明の目的は、上述のような欠点を解消し、その操作
維持管理が極めて簡単な触媒を用いて、徂−裂無水フタ
ル直中の副生フタライドを酸化し、高純度の無水フタル
酸をえる方法を提供することVCt/)る。
The purpose of the present invention is to eliminate the above-mentioned drawbacks and to oxidize the by-product phthalide directly in split phthalic anhydride using a catalyst that is extremely easy to operate and maintain, thereby producing high-purity phthalic anhydride. VCt/).

本発明は、以下の如くに特定される。The present invention is specified as follows.

11)  オルソキシレンの接触気相酸化によってえら
れた徂!#無水フタル酸を、触媒としてマンガン含有合
金組成物の存在下、高温下に分子状酸素含有ガスと接触
処理し、ついで蒸留操作に供することを特徴とする高純
度無水フタル酸の製造方法。
11) Soil obtained by catalytic gas phase oxidation of ortho-xylene! #A method for producing high-purity phthalic anhydride, which comprises contacting phthalic anhydride with a molecular oxygen-containing gas at high temperature in the presence of a manganese-containing alloy composition as a catalyst, and then subjecting it to a distillation operation.

12)  粗製無水フタル唆1句に対し分子状酸素含有
ガス−を酸素ガスに換算して少なくとも2X10  ’
モル/時、好ましくば4×lO〜2X10−2モル/時
接触させることを特徴とする上記fil記載の方法。
12) At least 2x10' of molecular oxygen-containing gas converted to oxygen gas per crude anhydrophthalic acid.
The method described in the above fil, characterized in that contact is carried out at a rate of mol/h, preferably from 4 x 1O to 2 x 10-2 mol/h.

(31接触処理が200〜300℃、好ましくは250
〜300℃の温度範囲、5〜30時間行われることを特
徴とする上記m iだは(2)記載の方法。
(31 contact treatment at 200-300°C, preferably at 250°C)
The method according to (2) above, characterized in that it is carried out at a temperature range of -300°C for 5 - 30 hours.

+41  粗製無水フタル酸IK4に対し、マンガン含
有合金組成物の接触面積が少くとも0−002 rn 
 N好ましくは0.004〜4m2であることを特徴と
する上記+11、+21または+31記載の方法。
+41 Contact area of manganese-containing alloy composition to crude phthalic anhydride IK4 is at least 0-002 rn
The method according to +11, +21 or +31 above, characterized in that N is preferably 0.004 to 4 m2.

・51  合金組成物中のマンガン含量が少くとも0.
05重号易、好ましくは0.1〜50重量係であること
を特徴とする特徴とする上記ill、+21、(31ま
たは14]記載の方法。
・51 The manganese content in the alloy composition is at least 0.
05 weight factor, preferably 0.1 to 50 weight factor.

・6) マンガンのほかにクロムを含みかつその2つの
金属の合計が少くとも10重量憾である上記(り、+2
1、(3)、14)またけ(5)記載の方法。
・6) The above (ri, +2
1, (3), 14) The method described in step (5).

以下さらに本発明の実施態様について説明する。Embodiments of the present invention will be further described below.

オルソキシレンを接触気相酸化してえられる粗製無水フ
タル酸中には、副生のフタライドが0.05〜1.0重
量壬含まれているのが通常である。
Crude phthalic anhydride obtained by catalytic gas phase oxidation of ortho-xylene usually contains 0.05 to 1.0 by weight of by-product phthalide.

粗製無水フタル酸は130〜150℃の液状で貯えられ
、熱処理工程に送られる。
Crude phthalic anhydride is stored in liquid form at 130-150°C and sent to a heat treatment process.

マンガン含有合金は、針金状のものを網状に編んだもの
などのように、分子状酸素ガスが容易にlI!I過しう
る、はとんど圧損失を与えずかつ表面積が上記の如く大
きいものが用いられる。とくに、気液接触装置内におい
て網状触媒充填層を形成せ発生させて、触媒と接触させ
つつ加熱処理を施す方法が本発明を実施する上で峡も簡
便かつ工業的な方法である。
Manganese-containing alloys, such as those made of wires knitted into a net, are easily absorbed by molecular oxygen gas! The material used is one that has a large surface area as described above, and which causes no pressure loss. In particular, a method of forming and generating a net-like catalyst packed bed in a gas-liquid contacting device and performing heat treatment while contacting it with the catalyst is a simple and industrial method for carrying out the present invention.

マンガン合金を用いる場合は、少くともマンガンを0.
05重量係含有するものが好ましい。とくにクロム−マ
ンガン合金あるいハ鉄−クロムーマンガン合金などが好
ましく、クロムとマンガン含量が合計でlO重量係を越
えるものが、本発明方法に用いる上で最適なフタライド
の減少能を示す。
When using a manganese alloy, at least 0.0% manganese is used.
0.05% by weight is preferred. Particularly preferred are chromium-manganese alloys and iron-chromium-manganese alloys, and those in which the total chromium and manganese content exceeds the 1O weight ratio exhibit optimal phthalide reduction ability when used in the method of the present invention.

用いる分子状酸素含有ガスは、分子状酸素を2〜10容
量憾含有し残りは窒素などの不活性ガスよりなるものが
用いられる。通常は空気にさらに窒素ガスを混入せしめ
、分子状酸素濃度を上述の範囲に調整して用いる。
The molecular oxygen-containing gas used is one containing 2 to 10 volumes of molecular oxygen, with the remainder being an inert gas such as nitrogen. Usually, air is further mixed with nitrogen gas to adjust the molecular oxygen concentration to the above-mentioned range.

かくして、本発明の方法により粗製無水フタル「浚中の
フタライド量は、l/10から1/1000に低減され
、もはや蒸留してえられる精製無水フタル酸は、フタラ
イドilO,05重量憾ないしそれ以下という高純度化
が達成される。粗製無水フタル酸中に副生物として混入
してくるフタライドは、その近接沸点化合物(その詳細
は不明であるがアルデヒドなどの含酸素化合物と思われ
る)とともに不純物を構成すると考えられるのであるが
、本発明の処理方法によりフタライドを中心とするこれ
ら不純物含有肴の低減化により、無水フタル酸の高純度
化が計れ、それとともにえられる製品の溶融色相や熱安
定度の向上が達成されることが判明したのである。
Thus, by the method of the present invention, the amount of phthalide in the crude phthalic anhydride is reduced from 1/10 to 1/1000, and the purified phthalic anhydride obtained by distillation is no longer as heavy as phthalide ilO,05 or less. Phthalide, which is mixed into crude phthalic anhydride as a by-product, removes impurities along with its nearby boiling point compounds (the details of which are unknown, but are thought to be oxygen-containing compounds such as aldehydes). However, by reducing these impurity-containing ingredients, mainly phthalides, by the treatment method of the present invention, it is possible to increase the purity of phthalic anhydride, and at the same time improve the melt color and thermal stability of the resulting product. It was found that an improvement in the results was achieved.

以下本発明を実施例によりさらに詳しく説明する。The present invention will be explained in more detail below with reference to Examples.

実権例 1 オルソキシレンを原料として接触気相酸化し、下記組成
の粗製無水フタル酸をえた。
Practical Example 1 Crude phthalic anhydride having the following composition was obtained by catalytic gas phase oxidation using ortho-xylene as a raw material.

無水フタル酸   99.7重量係 安息香酸    0.05  N マレイン酸   0.07  # フタライド   0.20  # 上記@製無水フタルa1〜をフラスコにとり、底部より
酸素5容量係、窒素95容量係の混合ガスを3ood/
時(酸素量として6X10  ’モル/時に相当)吹き
込み、270℃の温度で30時間処理−した。フラスコ
中にはあらかじめ0a2vusφの針金状の鉄(約70
壬)−クロム(約lc+1)−ニッケル(約9.4 )
−マンガン(約0.24、それぞれ重量4)合金200
9を接触面積Oa1m2、空間率9−7壬の円板状に成
形して固定した。
Phthalic anhydride 99.7 weight Benzoic acid 0.05 N Maleic acid 0.07 # Phthalide 0.20 # Put the above @ manufactured phthalic anhydride a1~ into a flask, and pour a mixed gas of 5 volume parts of oxygen and 95 volume parts of nitrogen from the bottom. 3ood/
(equivalent to 6 x 10' mol/hour of oxygen) and treated at a temperature of 270°C for 30 hours. A wire-like iron (approximately 70
) - Chromium (approx. lc+1) - Nickel (approx. 9.4)
- Manganese (approximately 0.24, weight 4 each) alloy 200
9 was molded into a disc shape with a contact area of 1 m2 and a porosity of 9-7 m and was fixed.

かくして見られた処理後の無水フタル酸中にはフタライ
ドが0.045重量壬含まれていた。
The thus-treated phthalic anhydride contained 0.045 phthalide by weight.

この処理ずみ無水フタル酸を、実段数10の多孔板を設
けた蒸留塔(内径32嘔φ、高さ500電)を用い、5
5yHg (絶対圧)圧力下、還流比0.5で蒸留した
。その結果APRAIO1凝固点131.12℃の精製
無水フタル酸をえた。250℃で2時間加熱による熱安
定度もAPRAl 0で高品質のものであった。なおこ
の精製無水フタル酸には、フタライドは0.04重−を
係合まれていた。
This treated phthalic anhydride was distilled into a distillation column (inner diameter: 32 mm, height: 500 mm) equipped with 10 perforated plates.
Distilled under 5yHg (absolute) pressure with a reflux ratio of 0.5. As a result, purified phthalic anhydride with APRAIO1 freezing point of 131.12°C was obtained. The thermal stability of APRAl 0 by heating at 250° C. for 2 hours was also of high quality. It should be noted that this purified phthalic anhydride was bound to 0.04 times of phthalide.

比較例 l 鉄分99.9v−It%の0.2 m−の針金2002
を接触面積0−1m2、空間率97憾の円板状に成型し
、これを用いて実権例1におけると同様に処理した。′
処理後の無水フタル酸中にはフタライドが0.19重量
係チオれていた。
Comparative example l 0.2 m wire 2002 with iron content 99.9v-It%
was molded into a disk shape with a contact area of 0-1 m2 and a porosity of 97, and was treated in the same manner as in Example 1. ′
After the treatment, phthalide was present in the phthalic anhydride in an amount of 0.19% by weight.

ついでこの無水フタル壊を実施例1におけると同じく蒸
留せしめたところ、APHA 20.凝固点130.8
 ’Cの精製無水フタルr俊をえた。250℃で2時間
加熱による熱安定度はAPHA200であった。そして
この検水フタル酸中にはフタライドがo、x8’ti4
含まれていた。
Then, this anhydrous phthalate was distilled in the same manner as in Example 1, resulting in APHA 20. Freezing point 130.8
'C purified anhydrous phthalate was obtained. Thermal stability after heating at 250° C. for 2 hours was APHA200. And in this phthalic acid sample water, phthalide is o, x8'ti4
It was included.

実権例2〜12および比較例2 実施例1の操作において、触媒として下記の形状および
組成のマンガン含有合金を用い、その使用−!:(接触
面積)、吹込み酸素量、処理温度および処理時間をそれ
ぞれ変えた以外は同様に行った。
Practical Examples 2 to 12 and Comparative Example 2 In the operation of Example 1, a manganese-containing alloy of the following shape and composition was used as a catalyst, and its use -! : (Contact area), amount of blown oxygen, treatment temperature, and treatment time were changed in the same manner.

なお、比較のだめ触媒を用いなかった場合と、分子状酸
素を吹込まなかった場合も検討した。結果を第1表に示
す。
For comparison, a case in which no catalyst was used and a case in which molecular oxygen was not blown were also investigated. The results are shown in Table 1.

実施例 13 オルソキシレンの接触気相、f化によってえられた+@
製無水フタル唆は1、以下の組成を有していた。
Example 13 Contact gas phase of ortho-xylene, +@ obtained by f conversion
The manufactured anhydrophthalic acid had the following composition.

無水フタル酸  99.3重を壬 安息香酸    0.05# マレイン酸   0.07# フタル酸    0.03  II フタライド   0.50 1 この粗製無水フタル酸500句を内径80Prnφ、高
さ120.の竪型処理槽に入れた。底部に5容jilt
の酸累95容を係の1素の混合ガス吹込み用の分散盤、
その上に攪拌器が設けられてなり、処理後実段数に実施
例1で用いたのと同じ材質のマンガン合金網状物500
09を板状に設置したものである。混合ガスを150t
/時で通じ、270℃に加熱しつつ30時間処理し、処
理後実段数10の多孔板を設置した蒸留塔(内径3.2
L−n1φ、高さ50.−rn)にて55慣Hg(絶対
圧)圧力下還流比0.5で蒸留し、APIA 10、凝
固点131.12℃、フタライド含量0.04重量憾の
高純度無水フタル酸をえた。このものの250’C2時
間の加熱後の熱安定度はAPF(A 20であった。
Phthalic anhydride 99.3 times Ibenzoic acid 0.05 # Maleic acid 0.07 # Phthalic acid 0.03 II Phthalide 0.50 1 This crude phthalic anhydride 500 times was made into an inner diameter of 80Prnφ and a height of 120. was placed in a vertical treatment tank. 5 volumes jilt at the bottom
A dispersion plate for blowing 95 volumes of acid into a mixed gas containing one element;
A stirrer is provided on top of it, and after treatment, 500 manganese alloy nets made of the same material as used in Example 1 are used as the actual number of plates.
09 is installed in a plate shape. 150t of mixed gas
/ hour, and was heated to 270°C for 30 hours. After the treatment, a distillation column (inner diameter 3.2
L-n1φ, height 50. -rn) under a pressure of 55 int. Hg (absolute pressure) at a reflux ratio of 0.5 to obtain high purity phthalic anhydride having an APIA of 10, a freezing point of 131.12 DEG C., and a phthalide content of 0.04 wt. Thermal stability of this material after heating at 250'C for 2 hours was APF (A 20).

Claims (1)

【特許請求の範囲】 fil  オルソキシレンの接触気相酸化によってえら
れた粗製無水フタル酸を、触媒としてのマンガン含有合
金組成物の存在下、高温下に分子状酸素含有ガスと接触
処理し、ついで蒸留操作に供することを特徴とする高純
度無水フタル酸の製造方法。 (2)  当該粗製無水フタルre i Kgに対し分
子状酸素含有ガスを酸素ガスに換算して少なくとも2X
10  ’モル/時接触させることを特徴とする特許請
求の範囲fil記載の方法。 ・;(1接触処理が200〜300℃の温度範囲、5〜
30時間行われることを特徴とする特許請求のa、囲(
1)または(2)記載の方法。 ’41  ’lA’ll無水フタルa I Kgに対し
、マンガン含有合金組成物の接触面積が少くとも0.0
02m”であることを特徴とする特許請求の範囲ill
、(2)まだは(3)記載の方法。 (5)  合金組成物中のマンガン含量が少くとも0.
05重量係であることを特徴とする特許請求の範囲(1
)、(2)、(3)または(4)記載の方法。 (6)  マンガンのほかにクロムを含みかつその2つ
の金属の合計が少くとも10重量係である特許請求の範
囲(1)、(2)、(3)、+41または(5)記載の
方法。
[Claims] fil Crude phthalic anhydride obtained by catalytic gas phase oxidation of ortho-xylene is contacted with a molecular oxygen-containing gas at high temperature in the presence of a manganese-containing alloy composition as a catalyst, and then A method for producing high purity phthalic anhydride, the method comprising subjecting it to a distillation operation. (2) At least 2X molecular oxygen-containing gas converted into oxygen gas for the crude anhydrous phthal re i Kg.
A method according to claim fil, characterized in that contact is carried out at 10'mol/hour.・;(1 contact treatment is in the temperature range of 200~300℃, 5~
Claim a, boxed (
1) or the method described in (2). '41 'lA'll Phthalic anhydride a I Kg, the contact area of the manganese-containing alloy composition is at least 0.0
02m''
, (2) still the method described in (3). (5) The manganese content in the alloy composition is at least 0.
05 weight ratio (1)
), (2), (3) or (4). (6) The method according to claim (1), (2), (3), +41 or (5), which contains chromium in addition to manganese and the sum of the two metals is at least 10 parts by weight.
JP10440481A 1981-07-06 1981-07-06 Preparation of high purity phthalic anhydride Granted JPS588075A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP10440481A JPS588075A (en) 1981-07-06 1981-07-06 Preparation of high purity phthalic anhydride
US06/394,477 US4436922A (en) 1981-07-06 1982-07-01 Method for manufacture of high-purity phthalic anhydride
DE19823225079 DE3225079A1 (en) 1981-07-06 1982-07-05 METHOD FOR THE PRODUCTION OF HIGH Purity Phtalic Acid Anhydride
FR8211850A FR2508906A1 (en) 1981-07-06 1982-07-06 PROCESS FOR THE PREPARATION OF HIGH-PURITY PHTHALIC ANHYDRIDE FROM RAW PHTHALIC ANHYDRIDE

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10440481A JPS588075A (en) 1981-07-06 1981-07-06 Preparation of high purity phthalic anhydride

Publications (2)

Publication Number Publication Date
JPS588075A true JPS588075A (en) 1983-01-18
JPS6113710B2 JPS6113710B2 (en) 1986-04-15

Family

ID=14379776

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10440481A Granted JPS588075A (en) 1981-07-06 1981-07-06 Preparation of high purity phthalic anhydride

Country Status (1)

Country Link
JP (1) JPS588075A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010249335A (en) * 2009-04-10 2010-11-04 Mitsubishi Electric Corp Air conditioner

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010249335A (en) * 2009-04-10 2010-11-04 Mitsubishi Electric Corp Air conditioner

Also Published As

Publication number Publication date
JPS6113710B2 (en) 1986-04-15

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