JPS587931B2 - Kongo Kouseigas no Chiyouseihouhou - Google Patents

Kongo Kouseigas no Chiyouseihouhou

Info

Publication number
JPS587931B2
JPS587931B2 JP2826674A JP2826674A JPS587931B2 JP S587931 B2 JPS587931 B2 JP S587931B2 JP 2826674 A JP2826674 A JP 2826674A JP 2826674 A JP2826674 A JP 2826674A JP S587931 B2 JPS587931 B2 JP S587931B2
Authority
JP
Japan
Prior art keywords
gas
concentration
flow rate
dilution
calibration
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP2826674A
Other languages
Japanese (ja)
Other versions
JPS50122989A (en
Inventor
額田正巳
目黒智郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Seika Chemicals Co Ltd
Original Assignee
Seitetsu Kagaku Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seitetsu Kagaku Co Ltd filed Critical Seitetsu Kagaku Co Ltd
Priority to JP2826674A priority Critical patent/JPS587931B2/en
Publication of JPS50122989A publication Critical patent/JPS50122989A/ja
Publication of JPS587931B2 publication Critical patent/JPS587931B2/en
Expired legal-status Critical Current

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  • Sampling And Sample Adjustment (AREA)
  • Control Of Non-Electrical Variables (AREA)

Description

【発明の詳細な説明】 本発明は高精度の校正ガスを連続的に発生させる方法に
関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for continuously generating highly accurate calibration gas.

大気の汚染成分の測定に際して各種の機器分析あるいは
化学分析の手法が適用されており、そのとき測定しよう
とする汚染成分と類似組成の濃度既知ガスが測定標準物
質(校正ガス)として用いられている。
Various instrumental analysis or chemical analysis methods are applied to measure atmospheric pollutants, and a gas with a known concentration and similar composition to the pollutant to be measured is used as a measurement standard material (calibration gas). .

一般に数1 0 ppm以上の濃度域および化学活性度
の極めて小さい汚染成分に対する校正ガスの製造は比較
的容易で、これらは、高圧容器に充填されたものが使用
されているが、化学反応性の太きい、あるいは数1 0
ppm以下のごとき微量濃度の校正ガスの場合には、
ガス相互間の反応、ガスと容器との反応、ガスの密度差
もしくは容器の温度勾配等に起因して取り出すガスの濃
度値に不安定性を生じるため高圧容器に充填することは
非実用的で好ましくない。
In general, it is relatively easy to produce calibration gases for contaminant components in the concentration range of several 10 ppm or more and with extremely low chemical activity, and these gases are used filled in high-pressure containers. Thick or number 1 0
In the case of a calibration gas with a trace concentration such as ppm or less,
It is impractical and desirable to fill a high-pressure container because instability occurs in the concentration value of the extracted gas due to reactions between gases, reactions between gases and the container, differences in gas density, or temperature gradients in the container. do not have.

そのため適当濃度の該当汚染ガスとたとえば高純度窒素
のごとき稀釈ガスとを混合することによって、適当な稀
釈率で定まる該当汚染ガス濃度の混合校正ガスを連続的
に作成する方法が採用されている。
Therefore, a method has been adopted in which a mixed calibration gas having a concentration of the contaminant gas determined by an appropriate dilution rate is continuously created by mixing the contaminant gas at an appropriate concentration with a diluent gas such as high-purity nitrogen.

このとき使用される流量計の実流量(実測値)は当然の
ことながら石鹸膜流量計あるいは湿式回転流量計などに
よって正確に検定されなければならない。
Of course, the actual flow rate (actual measurement value) of the flowmeter used at this time must be accurately verified using a soap film flowmeter or a wet rotary flowmeter.

しかるに、このようにして校正ガスを調製しようとすれ
ば、所望する校正ガスの濃度が数ppbから数ppmま
での広範囲に亘る場合には、使用する被稀釈ガス(原料
汚染ガス)の種類、濃度、比熱、密度、流量範囲等に応
じてその都度前記の流量検出装置に対応する多回数の検
定操作が必要となり、実質的に適用実施はきわめて困難
である。
However, when preparing a calibration gas in this way, if the concentration of the desired calibration gas is over a wide range from several ppb to several ppm, the type and concentration of the dilution gas (raw material contamination gas) to be used must be adjusted. , specific heat, density, flow rate range, etc., require multiple verification operations for each flow rate detection device, making practical implementation extremely difficult.

本発明では上記従来法を改め、最少限の検定操作によっ
て広範囲な濃度域の校正ガスを自由に連続して調整し得
る方法を提供しようとするものである。
The present invention aims to improve the above-mentioned conventional method and provide a method that allows calibration gases in a wide range of concentrations to be freely and continuously adjusted with a minimum of verification operations.

すなわち、本発明の要旨は少なくとも2種類のガスから
低濃度の混合校正ガスを製造するに当り、少なくとも1
種類の数百ppm程度以下の濃度既知の校正ガスを被稀
釈ガスとしてこれを定量流量計を通して一定量ずつ流す
工程と、実質的に100%濃度の稀釈ガスを可変流量計
を通して所望濃度に応じた稀釈量ずつ流す工程と、前記
ガス流を混合後供給する工程を包含してなる、被稀釈ガ
ス流量を定量的に流し、稀釈ガス流量を制御することに
より、数十ppm程度以下の低濃度校正ガスを連続的に
供給することを特徴とする低濃度混合校正ガスの調製方
法である。
That is, the gist of the present invention is to produce a low concentration mixed calibration gas from at least two types of gases.
A process in which a calibration gas with a known concentration of several hundred ppm or less of each type is used as a dilution gas and is flowed in fixed amounts through a quantitative flowmeter, and a dilution gas with a substantially 100% concentration is passed through a variable flowmeter in accordance with the desired concentration. Low concentration calibration of several tens of ppm or less can be performed by quantitatively flowing the diluted gas flow rate and controlling the dilution gas flow rate, which includes a step of flowing the diluted amount at a time and a step of supplying the gas flow after mixing. This is a method for preparing a low concentration mixed calibration gas characterized by continuously supplying gas.

本発明は上述のごとくあらかじめ調製された既知濃度の
被稀釈ガスを常時一定量ずつ流し、これに正確な流量測
定か容易な稀釈ガスの流量を変化させることにより、所
望する各種濃度に調製するものであるから、流量検定操
作は最少となり使用被稀釈ガス濃度以下の校正ガスを自
由に調製することができる。
In the present invention, as described above, a dilution gas of a known concentration, which has been prepared in advance, is constantly flowed in a fixed amount, and various desired concentrations are adjusted by accurately measuring the flow rate or easily changing the flow rate of the dilution gas. Therefore, the flow rate verification operation is minimized, and a calibration gas having a concentration lower than the concentration of the diluent gas to be used can be freely prepared.

稀釈ガスには一般に100%に近い高純度のものあるい
は化学的活性の小さいガスが使用されるので、比熱、密
度などの物性値の変化が少なく、安定した状態で被稀釈
ガスの稀釈に供することができ、測定精度も高い。
Generally, dilution gases with high purity close to 100% or gases with low chemical activity are used, so there is little change in physical properties such as specific heat and density, and the gas to be diluted must be diluted in a stable state. The measurement accuracy is also high.

本発明では2種類の流量計を用いて被稀釈ガスならびに
稀釈ガスの流通量を測定するが、この場合の流量計は特
定のものでなく、通常一般にガス流体測定に利用されて
いる計器であればいずれも使用することができ、それら
の例をあげれば、毛細管オリフイス、限界オリフィス、
質量流量計などである。
In the present invention, two types of flowmeters are used to measure the gas to be diluted and the flow rate of the dilution gas, but the flowmeter in this case is not a specific one, and may be any instrument that is generally used for measuring gas fluids. Any of these can be used, including capillary orifices, marginal orifices,
Such as a mass flow meter.

また稀釈ガスとしての条件はできるだけ高純度で反応性
の少ないガスが望まれるが、窒素、ヘリウム、アルゴン
、炭酸ガスの外に一酸化炭素、酸素、合成空気なども混
合される被稀釈ガスとの安定性混合割合の範囲を考慮し
て使用することができる。
In addition, it is desirable that the dilution gas be as pure as possible and have minimal reactivity, but the gas to be diluted may include carbon monoxide, oxygen, synthetic air, etc. in addition to nitrogen, helium, argon, and carbon dioxide. It can be used in consideration of the range of stability mixing ratio.

以下に本発明を図面の具体例によって説明する。The present invention will be explained below using specific examples shown in the drawings.

第1図の1は濃度既知の被稀釈校正ガス、2は例えば窒
素のごとき単一組成の高純度稀釈ガス、3は例えば限界
オリフイスのごとき定量流量計とそれと連動する制御機
構からなる一定の安定流量を得るための装置、4は質量
流量計あるいはオリフイス流量計のごとき可変流量計と
それと連動する制御機構を有してなる、ある範囲の流量
を可変し得る装置である。
In Figure 1, 1 is a calibration gas to be diluted with a known concentration, 2 is a high-purity diluent gas with a single composition, such as nitrogen, and 3 is a constant, stable gas that is composed of a quantitative flow meter such as a limit orifice and a control mechanism that interlocks with it. A device for obtaining a flow rate, 4, is a device that can vary the flow rate within a certain range, and includes a variable flow meter such as a mass flow meter or an orifice flow meter, and a control mechanism interlocked with the variable flow meter.

また5および6はそれぞれガスを均一に混合するための
混合槽であって、所望数だけ設置し得る。
Furthermore, numerals 5 and 6 are mixing tanks for uniformly mixing gases, and a desired number of mixing tanks can be installed.

実施態様の一例として、今1に高純度窒素で稀釈した濃
度1 0 0 ppmの一酸化窒素校正ガスを充填し、
このガスを3の限界オリフイス流量計へ1cc/分の定
流量流し、一方2に高純度窒素を用いて、このガスは4
の質量流量計で100cc〜1000cc/分の範囲内
で流量設定を行ないながら、6の混合槽から排出される
一酸化窒素混合校正ガスの濃度をそれぞれ測定したとこ
ろ、1 ppmから0. 1 ppmの範囲の校正ガス
が計算値どおり、安定してかつ自由に得られた。
As an example of an embodiment, the chamber is filled with a nitric oxide calibration gas diluted with high-purity nitrogen at a concentration of 100 ppm,
This gas was flowed at a constant rate of 1 cc/min into the limit orifice flowmeter at 3, while using high purity nitrogen at 2, the gas was
While setting the flow rate within the range of 100cc to 1000cc/min using a mass flowmeter, the concentration of the nitrogen monoxide mixed calibration gas discharged from the mixing tank 6 was measured, and the concentration ranged from 1 ppm to 0. Calibration gas in the range of 1 ppm was obtained stably and freely as calculated.

このとき、もし1に各種濃度の混合標準ガスを用いて流
量を変化させながら校正ガスを得ようとすれば、流量計
3に対し、用いる混合標準ガスの組成成分の種類と濃度
および流量範囲が変数となる組合せに対応する多数の実
流量対流量指示の検定曲線が必要となって実際の適用が
不可能になる。
At this time, if you try to obtain a calibration gas while changing the flow rate using a mixed standard gas of various concentrations in 1, the flowmeter 3 will be asked to check the type, concentration, and flow rate range of the mixed standard gas to be used. A large number of calibration curves of actual flow rate versus flow rate indication corresponding to combinations of variables would be required, making practical application impossible.

それに反して本発明では原料被稀釈ガス濃度および流量
を一定とし、稀釈ガスとして高純度ガスを用いるからガ
スの種類と流量範囲に関係する極く少数の検定曲線の作
成によって所望の混合校正ガスを容易に得ることができ
る。
On the other hand, in the present invention, the raw material dilution gas concentration and flow rate are kept constant, and a high-purity gas is used as the dilution gas, so the desired mixed calibration gas can be determined by creating a very small number of calibration curves related to the gas type and flow rate range. can be obtained easily.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の工程を示す概略図である。 FIG. 1 is a schematic diagram showing the steps of the present invention.

Claims (1)

【特許請求の範囲】[Claims] 1 少なくとも2種類のガスから低濃度の混合校正ガス
を製造するに当り、少なくとも1種類の数百ppm程度
以下の濃度既知の校正ガスを被稀釈ガスとしてこれを定
量流量計を通して一定量ずつ流す工程と、実質的に10
0%濃度の稀釈ガスを可変流量計を通して所望濃度に応
じた稀釈量ずつ流す工程と、前記ガス流を混合後供給す
る工程を包含してなる、被稀釈ガス流量を定量的に流し
、稀釈ガス流量を制御することにより、数十ppm程度
以下の低濃度校正ガスを連続的に供給することを特徴と
する低濃度混合校正ガスの調製方法。
1 In producing a low-concentration mixed calibration gas from at least two types of gases, a process of flowing a fixed amount of at least one type of calibration gas with a known concentration of several hundred ppm or less as a dilution gas through a quantitative flowmeter. and essentially 10
A step of flowing a dilution gas having a concentration of 0% through a variable flowmeter in dilution amounts according to a desired concentration, and a step of supplying the gas flow after mixing, quantitatively flowing the dilution gas flow rate and producing the dilution gas. A method for preparing a low concentration mixed calibration gas, characterized by continuously supplying a low concentration calibration gas of approximately several tens of ppm or less by controlling the flow rate.
JP2826674A 1974-03-11 1974-03-11 Kongo Kouseigas no Chiyouseihouhou Expired JPS587931B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2826674A JPS587931B2 (en) 1974-03-11 1974-03-11 Kongo Kouseigas no Chiyouseihouhou

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2826674A JPS587931B2 (en) 1974-03-11 1974-03-11 Kongo Kouseigas no Chiyouseihouhou

Publications (2)

Publication Number Publication Date
JPS50122989A JPS50122989A (en) 1975-09-26
JPS587931B2 true JPS587931B2 (en) 1983-02-14

Family

ID=12243759

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2826674A Expired JPS587931B2 (en) 1974-03-11 1974-03-11 Kongo Kouseigas no Chiyouseihouhou

Country Status (1)

Country Link
JP (1) JPS587931B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6232229U (en) * 1985-08-11 1987-02-26

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0955185A (en) * 1995-08-11 1997-02-25 Furontetsuku:Kk Mass filter type gas analyzer with calibration gas system and its operating method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6232229U (en) * 1985-08-11 1987-02-26

Also Published As

Publication number Publication date
JPS50122989A (en) 1975-09-26

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