JPS5877569A - Production of product with interference pattern - Google Patents

Abstract

PURPOSE:To produce products with interference patterns such as beautiful interference colors by vapor depositing the particles of a vapor depositing material in such a way as to strike diagonally against the surface to be vapor deposited. CONSTITUTION:A holder which holds a vapor depositing material 2 is fixed below a box body of which the inside is evacuated, and a base material 4 is suspended above. In the intermediate part in the box, an electron gun 5 as a heating source and a circular baffle plate 6 above the same are connected by means of a U-shaped arm 7 and the arm 7 is made movable back and forth or right and left. The surface 41 to be vapor deposited of the material 4 and the plate 6 are held level, and the inside of the device is evacuated. A beam 8 is cast to the material 2 with the gun 5 to release the particles 9 of the vapor depositing material radially. The particles advancing nearly right above among the particles 9 are blocked by the plate 6 and the arm 7 is moved back and forth or right and left. Then the particles are blocked at about <15 deg. angle with respect to the perpendicular of the surface 41, whereby beautiful interference patterns are formed on the surface 41 of the material 4.

Description

Detailed Description of the Invention: This invention provides beautiful interference colors, in which various spectral colors (interference colors) can be seen from any direction due to the interference of light rays, and the colors due to these spectral colors appear different depending on the viewing direction. Concerning the manufacturing method of products with interference patterns.

Conventionally, transparent thin films have been used in various products such as machines, tools, and equipment. For example, silicon dioxide films are used to protect reflective surfaces used in reflectors of lighting equipment and reflectors of floodlights. Conventionally, such transparent films have been considered to have a spectral color due to interference, which is considered a drawback.

That is, the occurrence of such a phenomenon means that the surface of the transparent film is not smooth and has minute irregularities, or that the film thickness is not constant.

The inventors have created a system in which various spectral colors due to interference of light rays can be seen from any direction by actively producing a phenomenon such as a pre-symptom, which has traditionally been seen as a drawback of transparent films. In an effort to create a patterned product with a beautiful interference pattern that changes color depending on the direction of observation, we conducted repeated research on the manufacturing method.

Finally, this invention was realized.

The method for manufacturing a product with an interference pattern according to the present invention is characterized in that the vapor deposition is performed so that the particles of the vapor deposition material obliquely contact the surface to be vapor-deposited. The following is a detailed explanation of the invention.

In the method for manufacturing a product with an interference pattern according to the present invention, a thin film is formed on a base material by a vapor deposition method such as a vacuum vapor deposition method. That is, a 4A material such as Ge/R element dioxide is deposited on the base material to form a film that causes optical interference. The vapor deposition material is not limited to any material as long as it causes optical interference to be z, 1 when formed into a film, 1:<. In this case, instead of the deposition material particles hitting the deposition surface of the base material almost perpendicularly as in the conventional method, the deposition material particles hit the deposition surface obliquely, that is, performing oblique deposition. . In this way, a product with a beautiful interference pattern can be obtained.

The reason for this is explained as follows: 1. If the first vapor deposition is performed, the surface of the vapor deposited film will not be a clean smooth surface. In some cases, the surface is rather rough, with minute irregularities. This surface condition causes a phenomenon in which a sharp spectral color is visible on the film surface when viewed from any direction, and the color of this spectral color appears to change depending on the viewing direction. The base material may be any material such as a metal plate, and is not limited to any material.

The surface of the base material to be vapor-deposited is not limited to a flat surface, and may be uneven. Alternatively, a base material made of metal or the like whose deposition surface is polished to become a reflective surface may also be used. The interference film on the base material is not limited to one layer, but may be provided in multiple layers.

When performing oblique vapor deposition, it is preferable to use a vacuum vapor deposition apparatus as shown in FIG. This vacuum evaporation apparatus is equipped with an electron gun as a heating source, and is the same as the conventional one except for the following configuration. That is, as shown in the figure, a holder 3 is provided with a box l whose interior is in a vacuum, and a holder 3 that holds the vapor deposition material 2 in its concave portion is provided at the lower part of the box 1;
and means for fixing the base material 4 upward by hanging it etc. (
(not shown). Furthermore, although not shown, a means for forming a high vacuum atmosphere is also provided. As shown in the figure, an electron gun 5 as a heating source is provided in the middle part of the box 1, and a circular shield plate 6 is provided above the electron gun 5. The electron gun 5 is connected to the baffle plate 6 by a U-shaped arm 7, and the -gamma arm 7 allows the baffle plate 6 to be placed directly above the evaporation material 1e so that the electron beam hits the evaporation material. The W configuration mode has been determined.

Although not shown, means for holding the arm 7 in the space inside the box 1 and moving it back and forth and left and right is provided. The baffle plate 6 is used to block particles of the vapor deposition material generated by heating that are about to hit perpendicularly to the surface 7h of the base material to be vaporized.

When this apparatus is used, oblique deposition is performed as shown in FIG. The surface 41 on which the base phase 4 is deposited and the baffle plate 6 are kept horizontal and the inside of the apparatus is evacuated. When a beam (electron beam) 8 is applied from an electron gun 5 to a vapor deposition material (target) 2 in a holder 3 from a substantially vertical direction, vapor deposition material particles (steam) 9 that fly out travel radially. Of these vapor deposition material particles 9, those that proceed almost directly above, that is, those that are about to collide almost perpendicularly with the surface 41 to be vapor deposited, are all blocked by the barrier plate 6. By moving the arm 7 back and forth and/or left and right while applying the electron beam 8 to the vapor deposition material, the vapor deposition material comes to obliquely impinge on the entire surface 41 to be vapor deposited.

In addition, the blocking of vapor deposition material particles is defined as particles that try to hit the surface to be deposited at an angle of 75 degrees or more, that is, particles that try to hit the surface to be deposited at an angle of 15 degrees or less to the perpendicular to the surface to be deposited (blocking angle of 15 degrees or less). Most preferably, this is done for those who do.

In the above explanation of oblique evaporation, the surface to be evaporated and the baffle plate are held horizontally, and the electron beam is applied from an almost vertical direction, but it is not always necessary to do so, and there may be cases where it is not horizontal or almost vertical. . Further, the baffle plate does not necessarily have to be circular, and furthermore, it is not necessarily necessary to connect the baffle plate to the electron gun and move the baffle plate together with the electron gun as in the vacuum evaporation apparatus described above.

The method for manufacturing a product with an interference pattern according to the present invention is constructed as described above, and since the transparent vapor deposition material particles are vapor-deposited so as to obliquely contact the surface to be vapor-deposited, a very different spectrum can be obtained when viewed from any direction. It is possible to obtain a product with a beautiful interference pattern in which color is visible and the color of the spectrum changes depending on the viewing direction.

Next, Examples will be explained along with Comparative Examples.

In Example 1.2 and Comparative Example, as shown in Table 1, aluminum UNO, (AI) plate, and vapor deposition material (old target) were used as the base materials, and °τ silicon dioxide (SiO2) was used as the base material.
) was used to deposit silicon dioxide on the surface of the aluminum plate at the same deposition rate, and 1f+ was the product in which the aluminum plate -F was coated with a silicon dioxide film of the same thickness. In Example 1.2, the deposition of silicon dioxide was regulated at the respective blocking angles shown in the first layer, whereas in the comparative example, no blocking was performed.

(See margin below) Table 1 The appearance of the products obtained by the manufacturing methods of Example 1.2 and Comparative Example as described above was compared. The results are shown in Table 1. While the comparative example did not appear colored, both Examples 1 and 2 appeared colored.

In addition, the reflection spectra of the products obtained by the manufacturing methods of Example 1.2 and Comparative Example were measured using an integrating sphere. The results are shown in FIG.

As shown in the figure, the reflectance according to the comparative example has a relatively small change in reflectance depending on the wavelength, whereas the change according to Example 1.2 is large. This measurement result also shows that the comparative example is colored and cannot be seen, that is, the reflected light is white light, whereas Examples 1 and 2 are both visible as colored. )

[Brief explanation of the drawing]

FIG. 1 shows an example of a vapor deposition apparatus used in the method of manufacturing a product with an interference pattern according to the present invention.
The tR5 clear diagram and the fourth diagram are d ;) of the usage example of the vapor deposition apparatus in Figure 1; This is a graph showing changes in reflectance. l...Box 2...Vapor deposition material, (...Holder 4
... Base phase 41 ... Hazardous deposition surface 5 ... Hoshigun 6.
...Jiya 1 plate 7...Rim 8-Beam ('Sakiko line) 9... Vapor deposition 4/l different particles

Claims (1)

[Claims] (4) A method for manufacturing a product with an interference pattern, characterized in that vapor deposition is performed so that particles of vapor deposition material obliquely contact a surface to be vapor-deposited. (2) Among the deposition material particles, those traveling perpendicularly to the surface to be deposited are blocked by a plate that moves in accordance with the movement of the beam irradiation position by the electron gun as a heating source, so that only those traveling diagonally are allowed to pass through. A method for producing an interference patterned product according to claim 1. (3) A method for manufacturing a product with an interference pattern according to claim 1 or 2, in which the vapor deposition material particles are applied at an angle smaller than 75° to the surface to be vapor deposited.