JPS5870555A - Preparation of liquid crystal display device - Google Patents

Preparation of liquid crystal display device

Info

Publication number
JPS5870555A
JPS5870555A JP56169307A JP16930781A JPS5870555A JP S5870555 A JPS5870555 A JP S5870555A JP 56169307 A JP56169307 A JP 56169307A JP 16930781 A JP16930781 A JP 16930781A JP S5870555 A JPS5870555 A JP S5870555A
Authority
JP
Japan
Prior art keywords
metal
layer
glass substrate
display device
liquid crystal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56169307A
Other languages
Japanese (ja)
Inventor
Takashi Nakazawa
尊史 中澤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Suwa Seikosha KK
Epson Corp
Original Assignee
Seiko Epson Corp
Suwa Seikosha KK
Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp, Suwa Seikosha KK, Epson Corp filed Critical Seiko Epson Corp
Priority to JP56169307A priority Critical patent/JPS5870555A/en
Publication of JPS5870555A publication Critical patent/JPS5870555A/en
Pending legal-status Critical Current

Links

Landscapes

  • Liquid Crystal (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)

Abstract

PURPOSE:To obtain easily mountable liquid crystal display device through arrangement, in the form of matrix, of the nonlinear elements having the structure of metal-insulator-metal by depositing organic substance layer to unnecessary area and then selectively anode-oxidizing them. CONSTITUTION:A patterned metal layer 7 on the first layer of glass substrate 8 is selectively covered with a resist 9 and the anode oxide film is formed in the electrolyte as specified. The portion masked by resist 9 becomes a terminal at the time of assembling. The resist 9 is removed and the glass substrate 8 is cut along the dotted line. Thereby, a substrate on which the terminal 11 exists in the right and left in one after another line cab be obtained. According to this structure, terminal interval can be widened even when integration density of metal- insulator-metal structure becmoes high, and moreover when a liquid crystal display device is assembled by forming the glass substrate 8 in the form of matrix, such a device can be mounted very easily.

Description

【発明の詳細な説明】 不発明は、メタル・インシュレーター・メタル(以)M
IMという)を、ガラス基板上にマトリックス状に配し
たガラス基板の製造過程での陽極酸化方法に関する。
[Detailed description of the invention] The non-invention is metal insulator metal (hereinafter referred to as M)
The present invention relates to an anodizing method during the manufacturing process of a glass substrate in which IM) is arranged in a matrix on a glass substrate.

従来、MIMの1層目のメタルを第1図に示す様な形状
にバターニングした後、陽極酸化をしてインシュレータ
一部を形成した。1111図に示すパターニング形状は
、112図に示す様に端子部3とMIMへの配線部4と
から成るライン1がガラス1板2上[1#!I配列さn
etのである。第1図に示す様な形状にバターニングし
た後、w45図に示す様に、*aのバターニングさfi
九一層目のメタルのライン1?、導電ゴム5ですべて導
AI、た後M工Mへの配線部4まで電解96に入nて、
*aのバターニングさnた一鳩目のメタルのライン1を
同時に陽極酸化を行なうものであつ九。
Conventionally, the first metal layer of the MIM was patterned into the shape shown in FIG. 1, and then anodized to form a part of the insulator. In the patterning shape shown in FIG. 1111, as shown in FIG. 112, the line 1 consisting of the terminal portion 3 and the wiring portion 4 to the MIM is formed on the glass 1 plate 2 [1#! I array n
et's. After buttering into the shape shown in Fig. 1, as shown in Fig. w45, the patterning of *a is
Metal line 1 on the 91st layer? , after making all the conductive AI with the conductive rubber 5, enter the electrolysis 96 to the wiring part 4 to the M engineering M,
*Anodic oxidation is performed on the first metal line 1 that has been buttered at the same time.

仁のような陽極酸化方法は、MIMの集積密度が大きく
なると、一層目のメタルライン1の間隔が狭くなり、M
IMをマトリックス状に配したガラス着板2を用いて沿
畠表示amを組立て九場合、実装が困難に′1にるとい
う欠点があつ九。
In the anodic oxidation method like Jin, as the integration density of MIM increases, the interval between the metal lines 1 in the first layer becomes narrower, and the MIM
When assembling a shoreline display AM using a glass plate 2 on which IMs are arranged in a matrix, there is a drawback that mounting is difficult.

また、亀子WA5が陽極酸化さnない様に、電解6へ入
nる面積を調整しなけnげならないという欠点があった
In addition, there was a drawback in that the area of entry into the electrolyte 6 had to be adjusted so that the Kameko WA 5 would not be anodic oxidized.

また、陽極酸化中に電解液6が波立ててしまうと、端子
部3′tで陽極酸化されてしまうという欠点があった。
Furthermore, if the electrolytic solution 6 ripples during anodization, there is a drawback that the terminal portion 3't will be anodized.

また、積載の一−目のメタルのライン1すべてを、導通
させて、同時に陽極酸化しなければならず、この丸め、
導電ゴム5f用い九が、導電ゴム5による汚れが付1し
てしまい、MXMの特性を劣化させてしまうという欠点
があった。
In addition, all the first metal lines 1 on the load must be made conductive and anodized at the same time, and this rounding,
When the conductive rubber 5f was used, there was a drawback that the conductive rubber 5 was contaminated with dirt, which deteriorated the characteristics of MXM.

本発明はかかる欠点を除去したもので、その目的は、実
装が容易な、M:[Mをマトリックス状に配したガラス
基板製造過程ての陽極酸化方法11−提供するものであ
る。
The present invention eliminates such drawbacks and aims to provide an anodizing method 11 for manufacturing a glass substrate in which M:[M is arranged in a matrix, which is easy to implement.

以下、実施例に基づいて、不発明の詳細な説明する。Hereinafter, the invention will be described in detail based on examples.

141図は本発明の陽極酸化する際のMIMの一層目の
メタルのバ2z−二ング形状である。7は)くターニン
グさnた一層目のメタル、8Fiガラス基板、9はレジ
ストである。第5図は1iJ44図に示すに示すガラス
基板B上につけらnたMIMの一一目のパターニングさ
nたメタル7の電解液6に入っていない部分をクリップ
ではさみ、直流電源の陽極に接続する。直流電源の陰極
には、白金を接続して、電解f116の中へ入れる。直
流電源の陽極と陰極の間に所定の電圧を印加することに
より、電解液6に入っているパターニングされた一層目
のメタル70部分が陽極化さするのである。ここで、斜
細部で示しである部分には有機物であるレジスト9が塗
布さ1ている。レジスト9て覆わn九部分のメタルは陽
極酸化さnない。レジスト9により陽極酸化されなかっ
た部分は、液晶表示装置1に組立てた場合の端子部とな
る部分である。
FIG. 141 shows the shape of the first metal layer of the MIM when anodized according to the present invention. 7 is the turned first layer metal, 8Fi glass substrate, and 9 is a resist. Figure 5 shows the patterning of each MIM attached to the glass substrate B shown in Figure 1J44.The part of the metal 7 that is not in the electrolyte 6 is held between clips and connected to the anode of a DC power supply. do. Connect platinum to the cathode of the DC power source and put it into the electrolyte f116. By applying a predetermined voltage between the anode and cathode of the DC power supply, the patterned first layer metal 70 contained in the electrolytic solution 6 is anodized. Here, a resist 9 made of an organic material is applied to the portions indicated by diagonal details. The metal in the portion covered by the resist 9 is not anodized. The portions that are not anodized by the resist 9 are portions that will become terminal portions when assembled into the liquid crystal display device 1.

第4図に示すガラス基板を、陽極酸化した後に、レジス
ト9f、ハクリし、第1図に示す点線でガラス基板8f
切断すれば、1ラインお舞に端子部が左右に存在する第
6図に示す様な基板が得らnる。
After the glass substrate shown in FIG. 4 is anodized, the resist 9f is peeled off and the glass substrate 8f is marked with the dotted line shown in FIG.
When cut, a board as shown in FIG. 6 is obtained in which terminal portions are present on the left and right sides in one line.

第6図の斜線で示した部分10はMIMの一層目のパタ
ーニングさ−n7?:メタルの陽極酸化さnた部分であ
り、11は1ラインおきに左右KWIけらn九亀子部で
ある。
The shaded area 10 in FIG. 6 is the patterning of the first layer of MIM -n7? : Anodized parts of the metal, and 11 are the left and right KWI shingles on every other line.

以上の様忙本発明によfLは、MXMの集積密度が大き
くなっても端子の間隔を広くすることができ、MIMを
マトリックス状に配したガラス基板8を用いて、W11
#1表示装置IIf組立てた場合、実装が容易であると
いう利点がある。
According to the present invention, fL can widen the interval between terminals even if the integration density of MXM increases, and by using the glass substrate 8 on which MIMs are arranged in a matrix, W11
#1 When assembled, display device IIf has the advantage of being easy to mount.

また、陽極酸化する際、電解液6轢入nる面積鉱、第4
図の12の矢印の閾に液面かくる様に設定すれけ喪く、
大量生産Kti肩利である。
In addition, when anodizing, the electrolyte is poured into 6 areas, and the 4th
Set the liquid level so that it reaches the threshold indicated by arrow 12 in the figure.
It has the advantage of mass production KTI.

また、陽極酸化中に電解液6が多少波立っても何ら影響
がないとiう利点がある。
Another advantage is that even if the electrolytic solution 6 is somewhat rippled during anodization, there is no effect.

この発明は以上説明しえように、M工M″t”mgさn
た非靜形素子をマトリックス状に配した最適の液晶表示
装置を提供することができる。
As explained above, this invention
Accordingly, it is possible to provide an optimal liquid crystal display device in which non-silent elements are arranged in a matrix.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図、第2図、第5図#i従来の例であり・ 1はパ
ターニングさnた一層目のメタル、2はガラス基板、5
はパターニングさnた一層目のメタルの端子部、1はパ
ターニングさnた一1目のメタルのMIMへの配線部、
5は導電ゴム、6は電解液、である。 FJJ図、第5図、第6図は本発明の実施例であり、7
はパターニングさまた一層目の、メタル、8はガラス基
板、9はレジスト、10は陽極酸化さnた一層目のメタ
ル、1IFi端子部である。 以   上 出願人 信州精器株式会社 株式会社諏訪精工舎 第1図 第2図 第3図 第4図 第5図
Figures 1, 2, and 5 are conventional examples. 1 is the patterned first layer of metal, 2 is the glass substrate, and 5 is the conventional example.
1 is the terminal part of the patterned first metal layer, 1 is the wiring part of the patterned 11th metal layer to MIM,
5 is a conductive rubber, and 6 is an electrolyte. The FJJ diagram, FIG. 5, and FIG. 6 are examples of the present invention, and 7
1 is a patterned first layer of metal; 8 is a glass substrate; 9 is a resist; 10 is an anodized first layer of metal; 1IFi terminal portion. Applicant Shinshu Seiki Co., Ltd. Suwa Seikosha Co., Ltd. Figure 1 Figure 2 Figure 3 Figure 4 Figure 5

Claims (1)

【特許請求の範囲】[Claims] ガラス基板上に一層目のメタルをつけ、前記一層目のメ
タルを所定の形状にバターニングし、前記−一目のメタ
ルを陽極酸化してインシュレータを形成し、前記インシ
ュレーターの上に2層目のメタルをつけ、前記2層目の
メタルを功足の形状K バターニングしてメタルパイン
シュレータ−・メタルより成る非線形素子の製造過程の
前dピー一目のメタルを陽極酸化する方法において、陽
極量化しない部分に、肩機物−をつけ、選択的に陽極酸
化することを特命とする液晶表示装置の製造方法。
A first layer of metal is attached on a glass substrate, the first layer of metal is buttered into a predetermined shape, the first layer of metal is anodized to form an insulator, and a second layer of metal is placed on the insulator. In the method of anodizing the first metal in the process of manufacturing a nonlinear element made of metal pine insulator metal by buttering the second layer of metal into a shape K, the part that is not anodized A manufacturing method for a liquid crystal display device in which a shoulder machine is attached to the liquid crystal display device and selectively anodized.
JP56169307A 1981-10-22 1981-10-22 Preparation of liquid crystal display device Pending JPS5870555A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56169307A JPS5870555A (en) 1981-10-22 1981-10-22 Preparation of liquid crystal display device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56169307A JPS5870555A (en) 1981-10-22 1981-10-22 Preparation of liquid crystal display device

Publications (1)

Publication Number Publication Date
JPS5870555A true JPS5870555A (en) 1983-04-27

Family

ID=15884099

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56169307A Pending JPS5870555A (en) 1981-10-22 1981-10-22 Preparation of liquid crystal display device

Country Status (1)

Country Link
JP (1) JPS5870555A (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5070857A (en) * 1973-10-29 1975-06-12
JPS55161273A (en) * 1979-05-30 1980-12-15 Northern Telecom Ltd Liquid crystal display unit and producing same

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5070857A (en) * 1973-10-29 1975-06-12
JPS55161273A (en) * 1979-05-30 1980-12-15 Northern Telecom Ltd Liquid crystal display unit and producing same

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