JPS5862105A - Dental metallic denture base and its preparation - Google Patents
Dental metallic denture base and its preparationInfo
- Publication number
- JPS5862105A JPS5862105A JP56163172A JP16317281A JPS5862105A JP S5862105 A JPS5862105 A JP S5862105A JP 56163172 A JP56163172 A JP 56163172A JP 16317281 A JP16317281 A JP 16317281A JP S5862105 A JPS5862105 A JP S5862105A
- Authority
- JP
- Japan
- Prior art keywords
- metal
- electroformed
- dental
- metal layer
- silver
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910052751 metal Inorganic materials 0.000 claims abstract description 144
- 239000002184 metal Substances 0.000 claims abstract description 141
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 22
- 229910052709 silver Inorganic materials 0.000 claims abstract description 21
- 239000000919 ceramic Substances 0.000 claims abstract description 18
- 239000000843 powder Substances 0.000 claims abstract description 18
- 210000000214 mouth Anatomy 0.000 claims abstract description 17
- 229910052737 gold Inorganic materials 0.000 claims abstract description 16
- 230000007797 corrosion Effects 0.000 claims abstract description 15
- 238000005260 corrosion Methods 0.000 claims abstract description 15
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 14
- 229910052697 platinum Inorganic materials 0.000 claims abstract description 13
- 229910052703 rhodium Inorganic materials 0.000 claims abstract description 11
- 229910052796 boron Inorganic materials 0.000 claims abstract description 10
- 229910052763 palladium Inorganic materials 0.000 claims abstract description 10
- 229910052698 phosphorus Inorganic materials 0.000 claims abstract description 10
- 229920005989 resin Polymers 0.000 claims abstract description 10
- 239000011347 resin Substances 0.000 claims abstract description 10
- 229910052750 molybdenum Inorganic materials 0.000 claims abstract description 8
- 229910052721 tungsten Inorganic materials 0.000 claims abstract description 8
- 229910052738 indium Inorganic materials 0.000 claims abstract description 7
- 229910052718 tin Inorganic materials 0.000 claims abstract description 7
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 5
- 150000004767 nitrides Chemical class 0.000 claims abstract description 5
- 239000004020 conductor Substances 0.000 claims abstract 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 42
- 238000000034 method Methods 0.000 claims description 25
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 24
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 24
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 21
- 239000004332 silver Substances 0.000 claims description 19
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 18
- 239000010941 cobalt Substances 0.000 claims description 18
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 18
- 229910017052 cobalt Inorganic materials 0.000 claims description 17
- 238000007747 plating Methods 0.000 claims description 15
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 14
- 239000010931 gold Substances 0.000 claims description 14
- 239000000126 substance Substances 0.000 claims description 14
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 13
- 229910052802 copper Inorganic materials 0.000 claims description 13
- 239000010949 copper Substances 0.000 claims description 13
- 229910052742 iron Inorganic materials 0.000 claims description 12
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 11
- 239000011651 chromium Substances 0.000 claims description 11
- 239000010948 rhodium Substances 0.000 claims description 10
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims description 10
- 238000004519 manufacturing process Methods 0.000 claims description 9
- 239000011505 plaster Substances 0.000 claims description 9
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 8
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 8
- 239000011574 phosphorus Substances 0.000 claims description 8
- 239000002421 finishing Substances 0.000 claims description 7
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 7
- 239000010937 tungsten Substances 0.000 claims description 7
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 6
- 239000011733 molybdenum Substances 0.000 claims description 6
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 5
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 5
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 claims description 5
- 229910052707 ruthenium Inorganic materials 0.000 claims description 5
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 4
- 239000006185 dispersion Substances 0.000 claims description 4
- 150000004706 metal oxides Chemical class 0.000 claims description 4
- 239000011248 coating agent Substances 0.000 claims description 3
- 238000000576 coating method Methods 0.000 claims description 3
- 239000011135 tin Substances 0.000 claims description 2
- 239000012811 non-conductive material Substances 0.000 claims 1
- 239000003795 chemical substances by application Substances 0.000 abstract description 4
- 238000000151 deposition Methods 0.000 abstract description 3
- 229910052748 manganese Inorganic materials 0.000 abstract description 2
- 239000000758 substrate Substances 0.000 abstract 2
- 238000005323 electroforming Methods 0.000 description 41
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 20
- 239000000047 product Substances 0.000 description 19
- 239000003973 paint Substances 0.000 description 11
- 230000000694 effects Effects 0.000 description 10
- 238000005406 washing Methods 0.000 description 10
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 9
- 239000000463 material Substances 0.000 description 9
- 239000002245 particle Substances 0.000 description 9
- 239000000243 solution Substances 0.000 description 8
- 239000007864 aqueous solution Substances 0.000 description 7
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- 238000005266 casting Methods 0.000 description 6
- 238000005498 polishing Methods 0.000 description 6
- 238000003756 stirring Methods 0.000 description 6
- 238000011282 treatment Methods 0.000 description 6
- 239000004925 Acrylic resin Substances 0.000 description 5
- 229920000178 Acrylic resin Polymers 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 5
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 5
- 238000009750 centrifugal casting Methods 0.000 description 5
- 238000001035 drying Methods 0.000 description 5
- 239000010440 gypsum Substances 0.000 description 5
- 229910052602 gypsum Inorganic materials 0.000 description 5
- 150000002739 metals Chemical class 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 239000001993 wax Substances 0.000 description 5
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- 239000003822 epoxy resin Substances 0.000 description 4
- 239000012778 molding material Substances 0.000 description 4
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 4
- 230000000704 physical effect Effects 0.000 description 4
- 229920000647 polyepoxide Polymers 0.000 description 4
- 229920001225 polyester resin Polymers 0.000 description 4
- 239000004645 polyester resin Substances 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 4
- TXUICONDJPYNPY-UHFFFAOYSA-N (1,10,13-trimethyl-3-oxo-4,5,6,7,8,9,11,12,14,15,16,17-dodecahydrocyclopenta[a]phenanthren-17-yl) heptanoate Chemical compound C1CC2CC(=O)C=C(C)C2(C)C2C1C1CCC(OC(=O)CCCCCC)C1(C)CC2 TXUICONDJPYNPY-UHFFFAOYSA-N 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 229910021626 Tin(II) chloride Inorganic materials 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 229910010272 inorganic material Inorganic materials 0.000 description 3
- 239000011147 inorganic material Substances 0.000 description 3
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 3
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 3
- 238000005488 sandblasting Methods 0.000 description 3
- 229910052814 silicon oxide Inorganic materials 0.000 description 3
- 239000001119 stannous chloride Substances 0.000 description 3
- 235000011150 stannous chloride Nutrition 0.000 description 3
- 230000001954 sterilising effect Effects 0.000 description 3
- 238000004659 sterilization and disinfection Methods 0.000 description 3
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 3
- TUSDEZXZIZRFGC-UHFFFAOYSA-N 1-O-galloyl-3,6-(R)-HHDP-beta-D-glucose Natural products OC1C(O2)COC(=O)C3=CC(O)=C(O)C(O)=C3C3=C(O)C(O)=C(O)C=C3C(=O)OC1C(O)C2OC(=O)C1=CC(O)=C(O)C(O)=C1 TUSDEZXZIZRFGC-UHFFFAOYSA-N 0.000 description 2
- KWSLGOVYXMQPPX-UHFFFAOYSA-N 5-[3-(trifluoromethyl)phenyl]-2h-tetrazole Chemical compound FC(F)(F)C1=CC=CC(C2=NNN=N2)=C1 KWSLGOVYXMQPPX-UHFFFAOYSA-N 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 2
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- 229910000531 Co alloy Inorganic materials 0.000 description 2
- 239000001263 FEMA 3042 Substances 0.000 description 2
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- LRBQNJMCXXYXIU-PPKXGCFTSA-N Penta-digallate-beta-D-glucose Natural products OC1=C(O)C(O)=CC(C(=O)OC=2C(=C(O)C=C(C=2)C(=O)OC[C@@H]2[C@H]([C@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)O2)OC(=O)C=2C=C(OC(=O)C=3C=C(O)C(O)=C(O)C=3)C(O)=C(O)C=2)O)=C1 LRBQNJMCXXYXIU-PPKXGCFTSA-N 0.000 description 2
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 2
- QXZUUHYBWMWJHK-UHFFFAOYSA-N [Co].[Ni] Chemical compound [Co].[Ni] QXZUUHYBWMWJHK-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
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- 239000000853 adhesive Substances 0.000 description 2
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- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 2
- 239000004327 boric acid Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
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- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 description 1
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- XMVONEAAOPAGAO-UHFFFAOYSA-N sodium tungstate Chemical compound [Na+].[Na+].[O-][W]([O-])(=O)=O XMVONEAAOPAGAO-UHFFFAOYSA-N 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
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- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
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- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Landscapes
- Dental Prosthetics (AREA)
Abstract
Description
【発明の詳細な説明】
この発明は、再現性、適合性、密着性、保持性等が優れ
、軽量で脱落しないことを目的とした歯科用金属床およ
びその製造方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a dental metal floor that has excellent reproducibility, compatibility, adhesion, retention, etc., is lightweight and does not fall off, and a method for manufacturing the same.
通常、人工的な歯(入れ歯もしくは義歯ともいう)には
、金冠を始めとし、継続歯(つぎば)、驕義歯(ブリッ
ジ)、部分床義歯(局部義歯)、全部床義歯(総義歯)
等があるが、金属床は特に全部床義歯(フルメタルプレ
ート)および部分床義歯(パーシャルメタルプレート)
には古くから用いられてきたが、矯正用歯型には使用さ
れなかった。これは熱的加工(たとえば鋳造法)によつ
、て、クラスプワイヤーが焼き鈍しの状態になって弾性
、を失って使用に耐えなくなるからである。このような
歯科の分野で用いられる金属床(以下これを歯科用金属
床と呼ぶ)は、従来つぎのような方法によって作られて
いる。すなわち、まず、患者の口腔内印象を正確にとり
、この印象にたとえば石膏を主成分とする型材料を注入
してマスターモデルを成形し、このマスターモデル上に
製品金属床の設計を行ない、続いて複印象をとり、この
複印象にたとえばリン酸系または石膏系の埋没材と石膏
を主成分とする型材料を注入、固化および゛乾燥させて
ワーキングモデルを作り、これをワックス浴に入れ、ワ
ックスパターンを製作し、これを石膏型中に埋没して、
さらに焼成して中空の鋳型を作製する。つぎに、得られ
た中空鋳型内に、高温で溶融した歯科用金属材料を遠心
鋳造法等の冶金的手法によって鋳込み、所望形状の金属
床を作製する。しかし、近時このような方法に代わるも
のとして、金属板の爆発成形法、または、金属に代わっ
てポリスルホン等の合成樹脂を素材とする合成樹脂床な
どが開発されて来たが、現状ではやはり遠心鋳造法等の
冶金的手法が主流をなしている。Usually, artificial teeth (also called dentures or dentures) include gold crowns, continuous teeth (tsugiba), dentures (bridges), partial dentures (local dentures), and total dentures (complete dentures).
However, metal bases are particularly suitable for total dentures (full metal plates) and partial dentures (partial metal plates).
It has been used for a long time, but it was not used for orthodontic tooth molds. This is because the clasp wire becomes annealed due to thermal processing (for example, casting) and loses its elasticity, making it unusable. Metal floors used in the field of dentistry (hereinafter referred to as dental metal floors) are conventionally made by the following method. That is, first, an accurate impression of the patient's oral cavity is taken, a master model is formed by injecting a molding material mainly composed of plaster into this impression, and the product metal floor is designed on this master model. A double impression is taken, and a working model is created by injecting, for example, a phosphoric acid-based or gypsum-based investment material and a gypsum-based molding material into the double impression, solidifying and drying, and then placing it in a wax bath to create a working model. Create a pattern, bury it in a plaster mold,
Further firing is performed to produce a hollow mold. Next, a dental metal material molten at high temperature is cast into the obtained hollow mold by a metallurgical method such as centrifugal casting to produce a metal bed in a desired shape. However, as an alternative to this method, explosion molding of metal plates and synthetic resin floors made from synthetic resins such as polysulfone instead of metal have been developed in recent years; Metallurgical methods such as centrifugal casting are the mainstream.
従来の歯科用金属床の代表的製法である遠心跨乗1表
造法は、第1表に例示するような歯科用合金を鋳□型に
鋳込み、冷却後鋳型を破壊して金属床を取り出し、サン
ドブラスト、電解研磨、パフ仕上げなどの表面仕上げを
行なうのであるが、このような従来法は、かなり複雑な
設計も可能であり、比較的短時間で目的の金属床が得ら
れるという点で、は一応の評価ができるが、反面、寸法
精度の向上、口腔内の嵌合性の向上はきわめて困難であ
り、さらに、印象再現性、薄肉化が思わしくないので患
者に異和感を与えることが多い。その他、冶金的溶融法
による鋳込み成形のため、成形品の表面荒れが発生し、
仕上げに多(の労力、時間を必要とするばかりでな(、
鋳込後の収縮が大きく、また、パリ等がよく発生し、さ
らには鋳込み操作の失敗等も起って、技術面、コスト面
、使用効果面のすべてにおいて満足できるものではない
。これに対し、金属板の爆発成形法は、成形用の型の製
作がきわめて困難であって、設備費が従来法に比較して
少なくとも50倍以上を要し、かつ、得られる金属床は
加工応力が多く残留し、脆化が著しいため、実用に供す
るには幾多の問題を解決しなければならない現状であり
、また、ポリスルホン等の樹脂床も、厚肉、亀裂、破損
等の点で多(の解決すべき問題点を抱えているのである
。したがって、このような従来の欠陥を解消する金属床
の開発が強く要望されてきた。The centrifugal straddle one-surface manufacturing method, which is a typical manufacturing method for conventional dental metal floors, involves casting dental alloys such as those shown in Table 1 into a mold, and after cooling, the mold is destroyed and the metal bed is taken out. , sandblasting, electrolytic polishing, puff finishing, and other surface finishing methods are used, but these conventional methods are advantageous in that they allow for fairly complex designs and provide the desired metal floor in a relatively short period of time. However, it is extremely difficult to improve dimensional accuracy and fit in the oral cavity, and furthermore, the impression reproducibility and thinning are not as good as expected, which may cause discomfort to the patient. many. In addition, due to casting molding using a metallurgical melting method, surface roughness of the molded product may occur.
It just takes a lot of effort and time to finish it.
The shrinkage after casting is large, frustation etc. often occur, and failures in the casting operation also occur, so that it is not satisfactory in terms of technology, cost, and effectiveness of use. On the other hand, in the explosion forming method for metal sheets, it is extremely difficult to manufacture molds for forming, the equipment cost is at least 50 times higher than that of the conventional method, and the resulting metal plate cannot be processed. Because a large amount of stress remains and the embrittlement is significant, many problems must be solved before it can be put to practical use.Also, resin floors such as polysulfone have many problems in terms of thick walls, cracks, and breakage. Therefore, there has been a strong demand for the development of a metal floor that eliminates these conventional defects.
この発明は、このような現状を打開するためになされた
ものであ・す、ニッケル、コバルトの少なくとも1種、
または、これに銅、銀、金、インジウム、ホウ素、スズ
、リン、クロム、モリブデン、タングステン、マンガン
、鉄、ルテニウム、ロジウム、パラジウム、白金の少な
くとも1種を含有も1種以上を分散共析させ、また、表
面の一部もしくは全部が、金、ロジウム、白金、銀、ク
ロムの少なくとも1種を主成分とする高耐食性金属で被
覆されている歯科用金属床およびその製造方法を提供す
るものである。以下にその詳細を述べる。This invention was made to overcome the current situation.At least one of nickel and cobalt,
Alternatively, at least one of copper, silver, gold, indium, boron, tin, phosphorus, chromium, molybdenum, tungsten, manganese, iron, ruthenium, rhodium, palladium, and platinum is dispersed and co-deposited. The present invention also provides a dental metal floor whose surface is partially or entirely coated with a highly corrosion-resistant metal containing at least one of gold, rhodium, platinum, silver, and chromium as a main component, and a method for producing the same. be. The details are described below.
この発明の患者口腔内模型゛を採取する工程、これによ
って得られた印象に、石膏を主成分とする型材料を注入
してマスターモデルを作製する工程およびマスターモデ
ル上に金属床の設計を行なう工程は、従来広(実施され
ているものとほとんど変化はない。しかし、得られたマ
スターモデルから複印象を作製するに際しては、最初の
印象と同様にカン天が用いられるが、塩化ビニル樹脂、
エポキシ樹脂、ポリエステル樹脂等の樹脂その他の可塑
性物質や硬化性物質を用いてもよい。また、得られた複
印象に再変゛石膏を主成分とする型材料を注入、固化さ
せてワーキングモデルを作製するに際しても、石膏を主
成分とする型材料に限らず、セメントや粘土等の無機材
料、接着剤入り無機材料、エポキシ樹脂、ポリエステル
樹脂、アクリル樹脂、パラフィン、ロウ等の有機材料、
または、これらの複合材料が実用に供されるが、要する
に約70℃程度の温度と電鋳液とに耐え得る材料であれ
ばよく、これらの材料は通常非導電性であるが、材料中
に銀、銅、アルミニウム等の金属粉末もしくは黒鉛のよ
うな導電性の粉末または小片を混入して、ワーキングモ
デル全体を導電性・のものとするか、ワーキングモデル
の電鋳しようとする部分の表面のみに、銀鏡もしくは化
学めっきを施すかまたは黒鉛粉もしくは導電性塗料を塗
布するかして、部分的に導電性のものとするか、いずれ
の方法でワーキングモデルに導電性を付与してもこの発
明、に何等の支障をも来たすことはない。A step of taking a patient's intraoral model of this invention, a step of injecting a mold material mainly composed of plaster into the impression obtained thereby to create a master model, and designing a metal floor on the master model. The process is almost the same as the one used in the past.However, when making a double impression from the obtained master model, a canten is used in the same way as the first impression, but vinyl chloride resin,
Resins such as epoxy resins and polyester resins, as well as other plastic and curable substances may be used. In addition, when creating a working model by injecting and solidifying a molding material mainly composed of gypsum into the obtained double impression, it is possible to use not only molding materials mainly composed of gypsum, but also cement, clay, etc. Inorganic materials, inorganic materials with adhesives, organic materials such as epoxy resin, polyester resin, acrylic resin, paraffin, wax, etc.
Alternatively, these composite materials are put into practical use, but in short, any material that can withstand a temperature of about 70°C and electroforming liquid is sufficient.These materials are usually non-conductive, but there are Make the entire working model conductive by mixing metal powder such as silver, copper, aluminum, or conductive powder or small pieces such as graphite, or make only the surface of the part of the working model to be electroformed. This invention does not apply even if the working model is made partially conductive by applying a silver mirror or chemical plating, or by coating with graphite powder or conductive paint. , will not cause any hindrance.
ここで、銀鏡もしくは化学めっきを行なうには、たとえ
ば、つぎのような処方を例示することができる。まず、
銀鏡に対しては、ワーキングモデルを好ましくは最初タ
ンニン酸2〜100 f!/1の水溶液に浸漬処理し水
洗した後、塩化第−スズ1〜30971.塩酸1〜10
0 CC/ lを主成分とする水溶液中に、室温〜50
℃で1〜Lθ分間処理し、水洗後、硝酸銀0.5〜20
9/1および適量のアンモニア水からなるA液と、トリ
メチルアミン1〜l0CC//、グリオキザール1〜2
0CC//からなるB液からなる銀鏡液とを、噴霧器に
よって、A、B両液が均等に放出できるよう調整し、ワ
ーキングモデルの所定面に勢いよく吹き付けて、銀薄膜
を形成させる。Here, in order to perform silver mirror or chemical plating, for example, the following prescription can be exemplified. first,
For silver mirrors, the working model is preferably initially mixed with 2-100 f! tannic acid. After immersion treatment in an aqueous solution of /1 and washing with water, stannous chloride 1 to 30971. Hydrochloric acid 1-10
In an aqueous solution containing 0 CC/l as the main component, from room temperature to 50
℃ for 1 to Lθ minutes, and after washing with water, silver nitrate 0.5 to 20
Solution A consisting of 9/1 and an appropriate amount of aqueous ammonia, 1 to 10 CC of trimethylamine, and 1 to 2 glyoxal.
A silver mirror solution consisting of Solution B consisting of 0CC// is adjusted using a sprayer so that both Solutions A and B can be released equally, and is vigorously sprayed onto a predetermined surface of the working model to form a thin silver film.
このような方法は、容易に導電性薄膜を作ることが可能
であることから、この発明を実施するうえで最も相応し
いものと言うことができょう。Such a method can be said to be the most suitable for carrying out the present invention since it is possible to easily produce a conductive thin film.
これに対して、化学めっきを施すための方法を例示すれ
ば、通常化学ニッケ゛ルめっき、化学銅めっき等が挙げ
られ、塩化パラジウム、塩酸および塩化第一スズからな
る触媒液に浸漬処理して水洗後、たとえば、化学ニッケ
ルめっきのときは、硫酸ニッケル10〜40FI/、!
、ツクエン酸ナトリウム5〜60971次亜リン酸ナト
リウム5〜309/lを主成分とする水溶液があり、p
H,4,0−10,0、温度30〜98℃、2〜30分
間めっきして、ニッケルの導電性簿膜が得られ、化学銅
めっきのときは、硫酸銅5〜40 fl/ l、 o
ッセ/L/塩5〜2001i’/ l、 ホルマリ:/
5〜80CC// 、 pH10〜13、温度15〜
40℃、2〜40分間めっきして、銅の導電性薄膜を得
るのである。さらに黒鉛粉の塗布は、ワーキングモデル
の表面に刷毛等で何回も塗布して表面を、黒くするもの
であるが、この方法では導電性を高めることが・困難で
あるので好ましい方法とは言えず、導電性塗料の塗布は
、たとえば、エポキシ樹脂等の樹脂中に2〜70%の銀
粉を混入した塗料を、通常の塗装と同様の方法で行なえ
ばよい。On the other hand, examples of methods for applying chemical plating include ordinary chemical nickel plating, chemical copper plating, etc., which are immersed in a catalyst solution consisting of palladium chloride, hydrochloric acid, and stannous chloride, and then washed with water. For example, in the case of chemical nickel plating, nickel sulfate is 10 to 40 FI/!
There is an aqueous solution whose main component is sodium citrate 5-60971 and sodium hypophosphite 5-309/l.
H, 4,0-10,0, temperature 30-98℃, plating for 2-30 minutes to obtain a nickel conductive film, and for chemical copper plating, copper sulfate 5-40 fl/l, o
Sse/L/Salt 5~2001i'/l, Formali:/
5~80CC//, pH10~13, temperature 15~
Plating is performed at 40° C. for 2 to 40 minutes to obtain a conductive thin film of copper. Furthermore, graphite powder is applied to the surface of the working model many times with a brush to make the surface black, but this method is difficult to increase conductivity, so it is not the preferred method. First, the conductive paint may be applied by using a paint in which 2 to 70% silver powder is mixed into a resin such as an epoxy resin in the same manner as in ordinary painting.
このようにして、全表面もしくは一部表面に導電性を付
与したワーキング、モデルは、所定の金属床の設計形状
である必要面および電流接点の部分を除き、不要部分を
すべて塩化ビニル塗料等の電気絶縁塗料でマスキングし
、電鋳浴中に浸漬して電鋳処理を行なう。電鋳浴は電解
質水溶液の浴であり、通常用いられる代表的なものは、
第1表および第2表に例示するように、スルファミン酸
浴(1〜3)、フン化浴(4〜6)、硫酸浴(7〜9)
および塩化浴(10〜12)が挙げられ、いずれの浴も
格別の差はなく実用できるが、最も一般的には、スルフ
ァミン酸浴が電鋳層の残留応力、作業性および仕上り外
観の点で最も良い結果をもたらし、ついでフン化浴、硫
酸浴、塩化浴の順に好ましいと言えよう。このような電
鋳浴によってニッケル、コバルトの少な(とも1種をワ
ーキングモデルの所要面に電着させる。なお、第1表お
よび第2表に示す浴の組成は、あくまでも一般例1第
1 表
を示すものであって、使用塩類の種類、濃度または添加
物の種類もしくは量が変って、多少の電鋳第2表
効率が低下したり、電鋳金属層の外観、硬度等の多少の
不具合が生じても、本発明に基本的な支障を与えるもの
ではない。In this way, all or part of the surface of the working model has been made conductive, with all unnecessary parts coated with vinyl chloride paint, etc., except for the necessary surface, which is the design shape of the metal floor, and the current contact area. Masked with electrically insulating paint and immersed in an electroforming bath for electroforming treatment. An electroforming bath is an electrolyte aqueous solution bath, and the typical ones commonly used are:
As illustrated in Table 1 and Table 2, sulfamic acid bath (1-3), fluoridation bath (4-6), sulfuric acid bath (7-9)
and chloride baths (10 to 12), and all of these baths can be used practically without any particular difference, but most commonly, the sulfamic acid bath is used in terms of residual stress, workability, and finished appearance of the electroformed layer. It can be said that these baths give the best results, followed by the fluoride bath, the sulfuric acid bath, and the chloride bath, in that order. By using such an electroforming bath, a small amount of nickel and cobalt (one kind of each) is electrodeposited on the required surface of the working model.The bath compositions shown in Tables 1 and 2 are for general example 1.
1. Table 2 indicates that the type or concentration of salts used or the type or amount of additives may change, resulting in a slight decrease in electroforming efficiency or changes in the appearance, hardness, etc. of the electroformed metal layer. Even if this problem occurs, it does not fundamentally impede the present invention.
ここで、ニッケルおよびコバルトは、結晶構造、その他
の物理的性質、化学的性質がきわめて近似しているため
、通常両者を完全に分離生産することは不可能に近く、
ここでは両者に何等の差別を与えないものとしたいが、
得られる製品金属床の硬度は、ニッケルとコバルトとの
比がおよそ70対30の付近で最も大きい値を示すので
ある。なお、ニッケルとコバルトの含有比率は、電鋳浴
の操業中にコバルトとニッケルの極に与える電流の強弱
により、すなわち、コバルト陽極に充分な容量を有する
抵抗器を入れて抵抗を付加してコバルトの析出を抑制す
れば、任意に調整することができる。Since nickel and cobalt have extremely similar crystal structures, other physical properties, and chemical properties, it is normally nearly impossible to produce them completely separately.
I would like to assume that there is no discrimination between the two here,
The hardness of the resulting product metal floor reaches its maximum value when the ratio of nickel to cobalt is approximately 70:30. The content ratio of nickel and cobalt depends on the strength of the current applied to the cobalt and nickel electrodes during operation of the electroforming bath. As long as the precipitation of is suppressed, it can be adjusted as desired.
さらにこの発明は、ニッケルおよびコバルトの少なくと
も1種からなる電鋳層とこれに添加することができる効
果的な金属元素には、銅、銀、金、インジウム、ホウ素
、スズ;リン、クロム、モリブデン、タングステン、マ
ンガン、鉄、ルテニウム、ロジウム、パラジウム、白金
があり、実際的にはこれらの中から゛1種以上を採用し
、これらの電解質塩たとえば硫酸塩、塩化物、フッ化物
、臭化物、スルファミン酸塩、その他の形で電鋳浴内に
添加すればよい。ここで、鉄、銅、銀、金、パラジウム
、白金については、ニッケル、コバルトの少なくとも1
種からなる電鋳金属層に対して90%以下の添加共析が
可能であり、また、リンおよびホウ素は通常25%以下
の添加共析が可能であっても0.1〜12.0%が最も
効果的で、靭性が高く、硬度も30〜120%向上して
良好な製品金属床を得るが、12.0%を越え25%以
下に添加共析さすことはほとんど意味がなくなる。鉄は
90%以下の範囲において、共析の意義は靭性、硬度、
%までの共析であれば鉄と同様に効果的であるが、55
%を越えれば耐食性が次第に劣化するので好ましくない
。銀、金、白金、パラジウムは、90%以下の全域にお
いて良好な結果をもたらし、耐食性もきわめて向上する
が、これらの結果は、20%以下の添加量で充分発揮さ
れ、20%を越えても、より多大の効果は望めず、単に
製品原価の上昇を招(のみである。一方、鉄、銅、銀、
金、パラジウム、白金、リン、ホウ素を除く金属元素は
、ニッケルまたはコバルトの少なくとも1種からなる・
電鋳金属層に対して5%以下であることが望ましい。な
ぜならば5%以上の共析は、実験室的にもまた現場的に
も困難であるというばかりでな(、たとえ5%を越えて
共析させても、組織が脆くなるか、または金属外観、物
性等を損うからである。Further, the present invention provides an electroformed layer consisting of at least one of nickel and cobalt, and effective metal elements that can be added thereto, including copper, silver, gold, indium, boron, tin; phosphorus, chromium, and molybdenum. , tungsten, manganese, iron, ruthenium, rhodium, palladium, and platinum.Actually, one or more of these is used, and electrolyte salts of these are used, such as sulfates, chlorides, fluorides, bromides, and sulfamines. It may be added to the electroforming bath in the form of an acid salt or other forms. Here, for iron, copper, silver, gold, palladium, and platinum, at least one of nickel and cobalt
It is possible to add 90% or less of phosphorus and boron to the electroformed metal layer consisting of seeds, and even if it is possible to add 25% or less of phosphorus and boron, it is usually 0.1 to 12.0%. is the most effective and yields a good product metal bed with high toughness and 30 to 120% improvement in hardness, but eutectoid addition of more than 12.0% and less than 25% is almost meaningless. For iron, within the range of 90% or less, the significance of eutectoid is its toughness, hardness,
It is as effective as iron if eutectoid up to 55%
%, it is not preferable because corrosion resistance gradually deteriorates. Silver, gold, platinum, and palladium give good results in the entire range of 90% or less, and greatly improve corrosion resistance, but these results are fully achieved when the addition amount is 20% or less, and even when the amount exceeds 20%. , it cannot be expected to have any greater effect, but only leads to an increase in product costs.On the other hand, iron, copper, silver,
Metal elements other than gold, palladium, platinum, phosphorus, and boron consist of at least one of nickel or cobalt.
It is desirable that the amount is 5% or less with respect to the electroformed metal layer. This is because not only is it difficult to eutectoid with a concentration of 5% or more, both in the laboratory and in the field, but even if the concentration exceeds 5%, the structure will become brittle or the metal appearance will become brittle. This is because the physical properties etc. are impaired.
また、これら添加元素は0.1〜0.5%添加によって
靭性が向上し、硬度も20〜40%向上してきわめて効
果的であるが、05%を越えて4%に至るまでの範囲で
は、著しい効果は認められず、単に硬度の点で僅かな向
上が見られるのみであって、4%を越えると最早効果は
ほとんど期待できなくなる。Furthermore, addition of these additive elements in an amount of 0.1 to 0.5% improves toughness and improves hardness by 20 to 40%, which is extremely effective, but in the range of more than 0.5% to 4%. However, no significant effect is observed, only a slight improvement in hardness is observed, and if it exceeds 4%, almost no effect can be expected.
ここで添加共析する金属元素の共通した効果以外の各元
素特有の効果を示すとつぎのようにまとめることができ
る。Here, effects specific to each element other than the common effects of the metal elements added and eutectoid can be summarized as follows.
〔銅〕:仕上げ研磨後の製品表面がきわめて美しい白色
を示す。[Copper]: The product surface shows an extremely beautiful white color after final polishing.
〔銀〕、〔金〕:耐食性が良好で、患者口腔内との親和
性が増大する。[Silver], [Gold]: Good corrosion resistance and increased compatibility with the patient's oral cavity.
〔インジウム〕:仕上げ研磨後の表面が銀白色を呈する
。[Indium]: The surface after final polishing exhibits a silvery white color.
〔リン〕、〔ホウ素〕:硬度が高くなるにもかかわらず
靭性も極度に向上する。[Phosphorus], [Boron]: Despite increasing hardness, toughness is also extremely improved.
〔スズ〕、〔クロムコ:患者ロ腔内で使用中、有機酸類
によく耐える。[Tin], [Chromco]: Resists organic acids well when used in the patient's cavity.
〔モリブデン〕、〔マンガン〕、〔タングステン〕:仕
上げが速くでき、表面光沢がよくなる。[Molybdenum], [Manganese], [Tungsten]: Faster finishing and better surface gloss.
〔鉄〕:添加共析幅が大きく、安定した製品を供給でき
る。[Iron]: Has a wide addition eutectoid range and can supply stable products.
〔ルテニウム〕、〔ロジウム〕、〔白金〕、〔パラジウ
ム〕:耐食性がきわめてよく、仕上げ後の光沢が消えな
い。[Ruthenium], [Rhodium], [Platinum], [Palladium]: Excellent corrosion resistance, and the luster does not fade after finishing.
また、この発明における電鋳金属層は、金属酸化物、金
属窒化物、金属ホウ化物、金属炭化物その他のセラミッ
クス粉末の少な(とも1種以上を分散共析させると、よ
り一層大きい効果を現わす。In addition, the electroformed metal layer of the present invention exhibits an even greater effect by dispersing and eutectoiding a small amount of metal oxides, metal nitrides, metal borides, metal carbides, and other ceramic powders. .
すなわち、金属酸化物は、たとえば、酸化チタン、酸化
アルミニウム、酸化ジルコニウム、酸化珪素等であり、
金属窒化物、金属ホウ化物、金属炭化物等も、その金属
が、チタン、アルミニウム、珪素、タングステン、モリ
ブデン、マンガン、鉄、クロム、タンタル等とこれらか
らなる化合物であり、いわゆるセラミックスと称される
無機材料粉末であって、この発明の目的とする金属床と
してのこれらセラミックスの作用効果、すなわち、靭性
、硬度については、いずれの材料も格段の差を現わさず
、はぼ同様に採用することができるが、これらの粉末の
粒径については、30P以下が望ましく、最、も望まし
くは1μ以下である。これは均質分散某所を行なううえ
で重要であり、仕上り外観がよく、得られた電鋳金属層
は忠実に靭性が高まり、同時に硬度も1.5〜3.0倍
に向上する。1μ以下で粒径が次第に大きくなるにつれ
て、電鋳金属層の仕上り面が粗くなり、かつ、物性が劣
って好ましくすくなってくる。ここで、粒径IP以下の
セラミックス粉末を電鋳金属層へ分散共析する比率は、
製品の良否を決定する上で重要な事項であって、セラミ
ックス粉末の分散共析量は、電鋳金属層に対して60%
以下、好ましくは3〜30%である。なぜならば、30
%以上では金属間の結合が阻害され、脆化が次第に進行
して、60%を越えると脆さが極度に進行し、一方、3
%未満では靭性および硬度等の物性が上昇過程中にあっ
て安定状態に到達していないからである。That is, the metal oxide is, for example, titanium oxide, aluminum oxide, zirconium oxide, silicon oxide, etc.
Metal nitrides, metal borides, metal carbides, etc. are metals such as titanium, aluminum, silicon, tungsten, molybdenum, manganese, iron, chromium, tantalum, etc., and compounds made of these, and are inorganic materials called ceramics. As for the function and effect of these ceramics as a metal bed, which is the material powder, which is the object of this invention, that is, in terms of toughness and hardness, there is no significant difference in any of the materials, and they can be used in the same way. However, the particle size of these powders is preferably 30P or less, most preferably 1μ or less. This is important in achieving homogeneous dispersion in a certain area, and the finished appearance is good, the toughness of the obtained electroformed metal layer is increased faithfully, and at the same time, the hardness is improved by 1.5 to 3.0 times. As the particle size gradually increases below 1 μm, the finished surface of the electroformed metal layer becomes rougher and the physical properties deteriorate, making it less desirable. Here, the ratio of dispersing and eutectoiding the ceramic powder with a particle size of IP or less into the electroformed metal layer is:
This is an important matter in determining the quality of the product, and the amount of dispersed eutectoid of ceramic powder is 60% of the electroformed metal layer.
Below, it is preferably 3 to 30%. Because 30
If it exceeds 60%, the bond between metals is inhibited and embrittlement progresses gradually, and if it exceeds 60%, brittleness progresses to an extreme level.
This is because, if it is less than %, physical properties such as toughness and hardness are in the process of increasing and have not reached a stable state.
このようなセラミックス粉末の電鋳金属層への分散共析
方法には多(の方法があるが、一般的には、電鋳浴中に
これらセラミックス粉末を5〜300Vlの濃度に混合
し、これをプロペラ、または、ジェット水流等による攪
拌によって激しく流動させ、金属の析出と同時に共析さ
せるのである。この際の攪拌の強弱または浴へ添加する
セラミックス粉末の量によって共析量を任意に調整する
ことができ、通常、攪拌を強くするほど、また、添加量
を多くする程、セラミックス粉末の共析比は増大する傾
向にあるが、たとえば、陽イオン活性剤や陰イオン活性
剤によりセラミックス粒子を包み込んで、セラミックス
粒子に電荷を増減すれば、前記した攪拌や添加濃度の二
つの因子には関係な(共析量を増減させることもできる
。なお、陰イオン活性剤でセラミックス粒子を包むと、
セラミックス粒子の二次凝集が一防止できるので、共析
量が小さくなっても、仕上り外観はきわめて良好となる
ことが見出されている。There are many methods for eutectoid dispersion of ceramic powder into an electroformed metal layer, but in general, these ceramic powders are mixed in an electroforming bath to a concentration of 5 to 300 Vl, and then The metal is made to flow violently by stirring with a propeller or jet water stream, and the metal is eutectoid at the same time as the metal is deposited.The amount of eutectoid can be arbitrarily adjusted by adjusting the strength of the stirring or the amount of ceramic powder added to the bath. Normally, the stronger the stirring or the larger the amount added, the higher the eutectoid ratio of ceramic powder. By wrapping the ceramic particles and increasing or decreasing the charge on the ceramic particles, it is possible to increase or decrease the amount of eutectoid, which is unrelated to the two factors mentioned above, such as stirring and addition concentration.
It has been found that because secondary aggregation of ceramic particles can be prevented, the finished appearance can be extremely good even if the amount of eutectoid is small.
以上の電鋳浴中でワーキングモデル表面に金属を析出さ
せる電流効率は約70〜98%であり、通常、l A/
ddの電流密度で1時間電鋳すると約7〜12μ厚の電
鋳金属層が得られる。したがって、このような目安に基
づいて、電流効率、単位時間当りの析出厚さ、電流密度
および電鋳時間等から仕上り製品の金属床断面厚さを予
測することができるのは言うまでもないが、この発明の
金属床として適当な厚さは、50〜2000μ(最も好
ましくは100〜1000μ)が適当である。なぜなら
ば50μ未満で11簿すぎて必要な靭性1強度が得られ
ず、一方、2000μを越えると厚すぎて、患者口腔内
での異和感が激しくなるばかりか、脱落その他の不都合
を生じ好ましくない、からである。The current efficiency for depositing metal on the working model surface in the above electroforming bath is about 70 to 98%, and is usually 1 A/
Electroforming for 1 hour at a current density of dd yields an electroformed metal layer with a thickness of approximately 7 to 12 microns. Therefore, it goes without saying that the cross-sectional thickness of the metal floor of the finished product can be predicted from the current efficiency, deposition thickness per unit time, current density, electroforming time, etc. based on such a guideline. A suitable thickness for the metal bed of the invention is 50 to 2000 microns (most preferably 100 to 1000 microns). This is because if it is less than 50μ, it is too thick and the necessary toughness and strength cannot be obtained.On the other hand, if it exceeds 2000μ, it is too thick, which not only causes discomfort in the patient's mouth but also causes other inconveniences such as falling off. There is no, because it is.
つぎに矯正用金属床においては、矯正用のクラスプ用ワ
イヤー(接菌弧線やリンガルアーチ等)を電鋳金属床に
固定するための特別な配慮が必要となるが、この発明に
おいては、ワーキングモデルに電鋳する際に、ワーキン
グモデルの所定個所表面に極力近接させるかもしくは接
触するように予め治具等を用いるかまたは埋め込む等の
方法でクラスプ用ワイヤーの端部を保持固定し、この状
態で電鋳して電鋳金属床とクラスプ用ワイヤーの端部を
一体化しようとするのである。このような操作に際して
は、ワイヤーの端部構造、太さ、およびワーキングモデ
ルの表面にワイヤーの端部をどのように近接し得るか等
が重要な成否の鍵となる。したがって、ワイヤーの端部
を細くするか、平偏状−とするか、または接着剤によっ
て仮接着するなどはいずれも有効な方法である。Next, in the metal floor for orthodontics, special consideration is required to fix the wire for the orthodontic clasp (sterilized arch wire, lingual arch, etc.) to the electroformed metal floor, but in this invention, the working model When electroforming, hold and fix the end of the clasp wire in advance by using a jig or embedding it so that it is as close as possible to or in contact with the surface of a predetermined part of the working model, and in this state. The idea is to use electroforming to integrate the electroformed metal floor and the end of the clasp wire. In such operations, the key to success or failure is the structure and thickness of the wire end, how close the wire end can be to the surface of the working model, etc. Therefore, making the end of the wire thinner, making it flattened, or temporarily bonding it with an adhesive are all effective methods.
、 以上のように、製品金属床の目的により、ワーキ
ングモデル表面に電鋳金属層を所定の厚さに電着し、つ
いで水洗後治具等を取り除き、ワーキングモデル表面か
ら電鋳金属層を剥離する。この剥離は、引張る等の機械
的処理か、溶剤薬品等による化学的処理または熱分解等
による熱的処理等によって容易に実施することができる
。剥離が終れば再度水洗し、乾燥した後、必要に応じて
電鋳金属床の表裏両面をサンドブラスト、化学研磨また
はパフ研磨等によって仕上げ、光沢や美観を付与する。As mentioned above, depending on the purpose of the product metal floor, an electroformed metal layer is electrodeposited on the surface of the working model to a predetermined thickness, and then, after washing with water, the jig etc. are removed and the electroformed metal layer is peeled off from the surface of the working model. do. This peeling can be easily carried out by a mechanical treatment such as pulling, a chemical treatment using a solvent or a chemical, or a thermal treatment such as thermal decomposition. After the peeling is completed, the electroformed metal floor is washed with water again, and after drying, the front and back surfaces of the electroformed metal floor are finished by sandblasting, chemical polishing, or puff polishing, etc., to give them a glossy appearance.
なお、金属床周辺には、僅かであるが、電鋳の余剰析出
部があって、突起物を生じていることがあるので、これ
は歯科用のグラインダーその他の工具を用いて除去しな
ければならないこともある。In addition, there may be a small amount of excess deposits of electroforming around the metal floor, creating protrusions, which must be removed using a dental grinder or other tools. Sometimes it doesn't.
このようにして仕上げられた金属床は、好ましくは患者
の口腔内に適合することを確認したうえで、その一部も
しくは全部に、金、ロジウム、白金、銀、クロムの1種
以上番主成分とする高耐食性の金属層によって被覆され
ることが望ましい。The metal floor finished in this way is preferably made with one or more main components of gold, rhodium, platinum, silver, or chromium, in part or in whole, after confirming that it is compatible with the patient's oral cavity. It is desirable that the metal layer be coated with a highly corrosion-resistant metal layer.
高耐食性金属とは金糸のものとして金とニッケルとの合
金、金とコバルトとの合金のような汎用金属との合金で
あってもこの発明には何等の支障をも来たすものではび
く、これら高耐食性金属層の被覆は、改めて説明するま
でもなく、通常のめつき法によって容易に実施すること
ができる。金属床は、このような高耐食性金属層によっ
て被覆されると、製品金属床の価値感を高めるだけでな
く金属床の寿命を著しく延長し、変色等が起らず、しか
も、患者口腔内壁によく親和して異和感を与えない等き
わめて多くの効果を現わすのである。Highly corrosion-resistant metals include alloys with general-purpose metals such as gold threads, alloys of gold and nickel, and alloys of gold and cobalt. Coating with the corrosion-resistant metal layer can be easily carried out by a conventional plating method, without further explanation. When a metal floor is coated with such a highly corrosion-resistant metal layer, it not only increases the value of the product metal floor, but also significantly extends the life of the metal floor, prevents discoloration, etc., and also protects the inner wall of the patient's oral cavity. It has many effects, such as being compatible with each other and not causing any discomfort.
通常、この高耐食性金属層の厚さは、およそ20μ以下
(最も普通には0.1〜5.0μ程度)で目的を充分達
成することができる。Usually, the thickness of this highly corrosion-resistant metal layer is approximately 20 microns or less (most commonly about 0.1 to 5.0 microns) to sufficiently achieve the purpose.
この発明の方法によって製作された金属床は、患者口腔
内模型に対し通常100℃以下の温度で、しかも界面に
接するように電鋳されるため、模型に対してきわめて忠
実な形状が再現され、得られる金属床と患者口腔との適
合性はきわめて良好であり、電鋳法による金属組織は従
来の溶融鋳込み等の冶金的処理によって得られる金属組
織とは著しく相違しており、偏析がなく緻密であって、
成分組成が同じであっても全く異質の金属であるかのよ
うにきわめて優れた特性を示すのである。さらに、セラ
ミックス粉末の分散共析電鋳金属層は一層強靭であって
従来の冶金的方法によっては全〈実施し得ないものであ
って、製品金属床の厚さ、 を薄くすることも可能と
なる。また、中空模型を必要とする従来の遠心鋳造方法
が、リン酸系または石膏系の耐熱埋没材とワックスの精
度により製品の地荒れおよび不要な厚さの増大、ならび
に精度不良が発生しやすかったのに対し、この発明は外
観および精度がきわめて良好で、さらに、パリ等の発生
が少なく、仕上げが容易であって、厚さの調整も任意に
行なうことができる。すなわち、特に製品金属床の中央
部を薄(し、適合性を良好とすると同時に異和感をなく
し、一方周辺部を厚くして、クラスプ部もしくは義歯台
(たとえばアクリル樹脂等)の保持性を高めることも随
時実施するシとができる。さらに全く予期しない効果と
して、この発明の金属床の厚さは、従来の遠心鋳造法に
よる金属床の平均的な厚さの約2/3ないし1/4にす
ることが可能であること、および、金属よりも比重の小
さい方うミックス粉末を分散共析させることによる軽量
化と優れた適合性とによって、患者は使用感が著しく低
減したことを証し、総義歯のときによく見受けられる義
歯の脱落等が金<見られなかったことなどを列挙するこ
とができる。The metal bed manufactured by the method of this invention is electroformed against the patient's intraoral model at a temperature of usually 100°C or less, and in contact with the interface, so that a shape extremely faithful to the model is reproduced. The compatibility between the resulting metal bed and the patient's oral cavity is extremely good, and the metal structure obtained by electroforming is significantly different from that obtained by conventional metallurgical treatments such as melt casting, and is dense and free of segregation. And,
Even though they have the same composition, they exhibit extremely excellent properties as if they were completely different metals. Furthermore, the dispersed eutectoid electroformed metal layer of ceramic powder is much stronger, and it is possible to reduce the thickness of the product metal bed, which is impossible to achieve using conventional metallurgical methods. Become. In addition, the conventional centrifugal casting method, which requires a hollow model, tends to cause roughness of the product, unnecessary increase in thickness, and poor precision due to the precision of the phosphoric acid or gypsum-based heat-resistant investment material and wax. On the other hand, the present invention has an extremely good appearance and precision, is less likely to generate flakes, is easy to finish, and can be adjusted in thickness as desired. In other words, the center part of the metal base of the product should be made thinner to improve compatibility and eliminate any sense of discomfort, while the peripheral part should be made thicker to improve the retention of the clasp part or denture base (for example, acrylic resin, etc.). Further, as a completely unexpected effect, the thickness of the metal bed of the present invention is approximately 2/3 to 1/3 of the average thickness of a metal bed produced by conventional centrifugal casting. 4, as well as the light weight and excellent compatibility achieved by dispersing and eutectoiding the mixed powder, which has a lower specific gravity than the metal, and patients attested to a significant reduction in the feeling of use. It is possible to enumerate the fact that the dentures did not fall out, which is often seen when wearing complete dentures.
以下に実施例を示す。Examples are shown below.
〔実施例1〕
総義歯を必要とする患者の口腔内から、カン天により印
象をとり、この印象に石膏を注入してマスターモデルを
作成し、このマスターモデル上に、部分床義歯用金属床
(パーシャルメタルプレート)の設計を行なった。つい
で、これからカン天により複印象をとり、これに石膏を
注入して、ワーキングモデルを作製した。この模型を充
分乾燥した後、塩化ビニル樹脂塗料をシンナーで希釈し
て模型全表面に塗布して防水処理を施し、水洗した後、
タンニン酸10 ’i/lの水溶液に、室温下、1分間
浸漬する。その後再度水洗し、塩化第一スズ6y4塩酸
10CC//からなる水溶液中に、室温下2分間浸漬す
る。ついで水洗した後、硝酸銀79/lとアンモニア水
を褐色沈澱が溶けるまで加えたA液と、グリオ牛ザール
8CC//1)リメチルアミン5αし′グからなるB液
を等量ずつ約1分間噴霧器で吹き付け、模型面に銅鍍処
理を施した。その後充分水洗し、室温下で乾燥した後、
電鋳不要部分を塩化ビニル塗料で充分にマスキングし、
さらにマスキング面の一部に電鋳時の過剰電流を逃すた
めの補助陰極を設け、この模型を不要部を樹脂被覆した
銅帯からなる治具に強(セットして、電流接点を取り付
け、模型が陰極になるように電鋳浴中に浸漬した。電鋳
浴組成は、スルファミン酸ニッケル600971、塩化
ニッケル5グ/1.ポウ酸15グ/l。[Example 1] An impression was taken from inside the oral cavity of a patient who required a complete denture, a master model was created by injecting plaster into this impression, and a metal base for a partial denture was placed on top of this master model. (partial metal plate) was designed. Next, a double impression was taken using Kanten, and plaster was injected into this to create a working model. After thoroughly drying this model, dilute vinyl chloride resin paint with thinner and apply it to the entire surface of the model to make it waterproof. After washing with water,
Immerse in an aqueous solution of 10 i/l tannic acid for 1 minute at room temperature. Thereafter, it is washed again with water and immersed for 2 minutes at room temperature in an aqueous solution consisting of 6y4 stannous chloride and 10 cc of hydrochloric acid. After washing with water, equal amounts of solution A, which is made by adding silver nitrate 79/l and aqueous ammonia until the brown precipitate is dissolved, and solution B, which is made up of Griot Gyuzaar 8CC//1) Limethylamine 5α, were sprayed for about 1 minute. The model was sprayed and the surface of the model was plated with copper. After that, wash thoroughly with water and dry at room temperature.
Thoroughly mask the unnecessary parts of electroforming with vinyl chloride paint,
Furthermore, an auxiliary cathode is provided on a part of the masking surface to release excess current during electroforming, and the model is firmly attached to a jig consisting of a copper strip whose unnecessary parts are coated with resin. The electroforming bath was immersed in an electroforming bath so that the material became a cathode.The composition of the electroforming bath was nickel sulfamate 600971, nickel chloride 5 g/1, and poric acid 15 g/l.
ラウリル硫酸ソーダO,l Vlであり、47℃、pH
4,2、カソードロッカー、連続沢過の条件下で電流密
度3A/drIl、15時間電鋳し、第1図に示すよう
に460μの厚さのニッケルからなる電鋳金属層1を得
た。ついで電鋳浴より引き上げて水洗し、治具、補極等
を取り外し、さらに模型表面より電□鋳金属層1を模型
との間に薄鉄板を差し込んで機械的に剥離した。これを
充分水洗乾燥し、サンドブラストおよびパフ研磨により
全面を磨き、周囲の突起物を取り去って、目的とするパ
ーシャルメタルプレートを得た。なお、この実施例のパ
ーシャルメタルプレートにおいては、電鋳金属層1の周
囲(外周)の義歯取付は部分に網目状開口部2を有する
アンカ一部3が構成されており、これにアクリル樹脂4
を取り付け、さらに義歯5を固定したのである。このよ
うにして得られたパーシャルメタルプレートは、患者口
腔内壁に対する適合試験の結果、適合性はきわめて良好
であり、同時に作製した従来の遠心鋳造法による製品に
比べて全く格段の差を示し、異和感が全(ないという評
価を得た。このようなパーシャルメタルプレートの全面
に、厚さ0.5μの金めつきを施し、水洗、乾燥、消毒
の後、再度患者口腔内適合試験を行なったところ、全く
不具合が認められなかったばかりでなく、予期しない結
果として、金めつきによる親和性が得られ、患者は快適
な義歯を装着することができて、その後の追跡調査の結
果を見ても、従来品によく見られる脱落現象も、はとん
ど起きていない。これは精度がよく、口腔内模型と同一
に仕上げるため口腔壁への密着が良好であることの査証
であり、患者は厚さが約450μと薄いため軽量であり
その結果使用感もないと評価した。Sodium lauryl sulfate O,l Vl, 47℃, pH
4.2. Electroforming was performed for 15 hours at a current density of 3 A/drIl under the conditions of a cathode rocker and continuous flow, to obtain an electroformed metal layer 1 made of nickel with a thickness of 460 μm as shown in FIG. Then, it was taken out of the electroforming bath, washed with water, the jig, interpolation, etc. were removed, and the electroformed metal layer 1 was mechanically peeled off from the surface of the model by inserting a thin iron plate between it and the model. This was sufficiently washed with water and dried, and the entire surface was polished by sandblasting and puff polishing, and surrounding protrusions were removed to obtain the desired partial metal plate. In the partial metal plate of this embodiment, the denture attachment around the electroformed metal layer 1 (outer periphery) is constituted by an anchor part 3 having a mesh opening 2, and an acrylic resin 4 is attached to the anchor part 3.
was attached, and the denture 5 was further fixed. The partial metal plate obtained in this way was found to have extremely good compatibility with the inner wall of the patient's oral cavity, and showed a marked difference compared to the product produced at the same time using the conventional centrifugal casting method. The entire surface of such a partial metal plate was plated with gold to a thickness of 0.5μ, and after washing, drying, and disinfecting, the patient's oral cavity compatibility test was conducted again. Not only did we find no problems at all, but the unexpected result was that the gold-plated dentures were compatible, and the patient was able to wear the dentures comfortably. Moreover, the falling-off phenomenon that is often seen with conventional products does not occur.This is proof that the accuracy is high and that the finish is the same as the intraoral model, so it adheres well to the oral wall. The product was evaluated as having a thin thickness of about 450 μm, making it lightweight, and as a result, did not give a feeling of use.
〔実施例2〕
矯正を必要とする患者の口腔内からカン天より印象をと
り、これに石膏を注入してマスターモデルを作製し、こ
のマスターモデル上に矯正用金属床の設計を行なった。[Example 2] An impression was taken from the inside of the oral cavity of a patient in need of orthodontics, plaster was injected into the impression to create a master model, and a metal floor for orthodontics was designed on this master model.
ついで、これからカン天を用いて複印象をとり、この複
印象に硬化性ポリエステル樹脂液を注入してワーキング
モデルを作製した。この際、第2図に示すように、接菌
弧線6およびリンガルア1−チアをこのワーキングモデ
ルに埋設して、接菌弧線6およびリンガルアーチ7の露
出部の端部をワーキングモデルの必要個所表面に軽く触
れる程度に近接させて固定した。ついで水洗後、塩化パ
ラジウム0.]J//、塩酸150CC/グ、塩酸第一
スズ57/lからなる触媒溶液中に、室温上駒3分間浸
漬し、再度水洗して、硫酸ニッケル20 f/l、クエ
ン酸ナトリウム30 Vl、次亜リン酸ナトリウム15
f/lからなる化学ニッケルめっき液中で、pH8,
0,42℃で15分間めっきを行ない、ワーキングモデ
ルを導電化した。このワーキングモデルを水洗乾燥し、
電鋳不要部分の面をエポキシ塗料を塗布して絶縁し、電
鋳必要個所へ周囲から約511n離れた位置に、アルミ
ニウムテープにより補助陰極を設け、電流接点治具に取
り付けて電鋳必要面に接続し、軽く水洗してニッケルー
コバルト電鋳浴に浸漬した。このときの浴の組成は、硫
酸コバル) 100y//、硫酸ニッケル200y//
、硫酸50y//、PH1,0以下であって、温度65
℃、電流密度5A/ddで15時間電鋳し、ニッケルと
コバルトからなる電鋳金属層1を厚さ約900Pまで電
着させた。電鋳の際陽極のコバルト極板側に電源との間
に3000の抵抗器(3kW用)をセットし、コバルト
の溶解を抑えた結果、電鋳金属層1の合金成分比はニッ
ケル85%、コバルト15%であった。また、この実施
例において。Next, a double impression was taken from this using a canten, and a curable polyester resin liquid was injected into the double impression to create a working model. At this time, as shown in FIG. 2, the sterilization arch wire 6 and the lingual arch 1-thia are buried in this working model, and the exposed ends of the sterilization arch wire 6 and lingual arch 7 are placed on the surface of the working model at the necessary locations. It was fixed so that it was close enough to touch lightly. Then, after washing with water, palladium chloride 0. ] J //, 150 CC/g of hydrochloric acid, 57/l of stannous hydrochloride, immersed at room temperature for 3 minutes, washed again with water, 20 f/l of nickel sulfate, 30 Vl of sodium citrate, Sodium hypophosphite 15
In a chemical nickel plating solution consisting of f/l, pH 8,
Plating was performed at 0.42°C for 15 minutes to make the working model conductive. Wash and dry this working model,
Apply epoxy paint to insulate the surface of the area that does not require electroforming, and install an auxiliary cathode using aluminum tape at a position approximately 511n away from the surrounding area where electroforming is required, and attach it to a current contact jig to cover the surface that requires electroforming. It was connected, lightly washed with water, and immersed in a nickel-cobalt electroforming bath. The composition of the bath at this time was 100y// of cobal sulfate, 200y// of nickel sulfate.
, sulfuric acid 50y//, pH 1.0 or less, temperature 65
C. and a current density of 5 A/dd for 15 hours, electroforming metal layer 1 consisting of nickel and cobalt was electrodeposited to a thickness of about 900P. During electroforming, a 3000 resistor (for 3kW) was set between the cobalt plate side of the anode and the power supply to suppress dissolution of cobalt, resulting in an alloy composition ratio of 85% nickel and 85% nickel in the electroformed metal layer 1. The cobalt content was 15%. Also in this example.
ポリエステル樹脂のワーキングモデル中に主部を埋設し
、露出した端部がワーキングモデルの電鋳必要個所に近
接するよう固定した接菌弧線6およびリンガルアーチ7
はきわめて良好に電鋳金属層1内に埋設されて、すでに
完全に一体化していた。A sterilized arch wire 6 and a lingual arch 7 whose main parts are buried in a polyester resin working model and fixed so that the exposed ends are close to the parts of the working model that require electroforming.
were very well embedded in the electroformed metal layer 1 and were already completely integrated.
その後水洗し、治具、補極を哉り外し、ワーキングモデ
ルを機械的に破壊して電鋳金属層1を接菌弧線6および
リンガルアーチ7と共に取り出して、水洗、乾燥、研磨
および余剰電流によって周囲に生じた突起物のグライン
ダーによる除去等を行なって全面を仕上げ、gJ2図の
ような矯正用メタルプレートを得た。このものに対する
患者の口腔内適合試験の結果は、適合性がきわめて良好
であり、接菌弧線6もリンガルアーチ7も容易に外れる
ことはなく、長期の使用にあたって、充分な機能を発揮
し、この患者に対してはニッケルーコバルト合金のまま
で、特に耐食性金属のめっきを施さな(でも、矯正期間
中完全に使用に耐えた。After that, the working model is washed with water, the jig and the interpolation electrode are removed, the working model is mechanically destroyed, the electroformed metal layer 1 is taken out together with the sterilized arch wire 6 and the lingual arch 7, and the electroformed metal layer 1 is removed with water, dried, polished, and subjected to excess current. The entire surface was finished by removing protrusions around the plate using a grinder to obtain a metal plate for correction as shown in Fig. gJ2. The results of the patient's oral compatibility test for this product showed that the compatibility was extremely good, and neither the sterilization arch wire 6 nor the lingual arch 7 came off easily, and it exhibited sufficient functionality for long-term use. For the patient, the nickel-cobalt alloy was used without any special corrosion-resistant metal plating (although it was completely usable during the orthodontic period).
〔実施例3〕
残存歯がある患者に対してパーシャルメタルプレートを
提供する目的で、口腔内印象をとり、これをもとに石膏
でマスターモデルを作製し、パ−シャルメタルプレート
の設計を行なってさらに複印象をとり、これに軟化点9
0℃の密ロウを注入してワーキングモデルを調製した。[Example 3] In order to provide a partial metal plate to a patient with remaining teeth, an intraoral impression was taken, a master model was made from plaster based on this impression, and a partial metal plate was designed. Then take a double impression and add a softening point of 9 to this.
A working model was prepared by injecting beeswax at 0°C.
このモデルの全面に黒鉛粉末を塗布し、さらに、電鋳不
要部を前記密ロウでマスキングした。このときのクラス
プ部は帯状に設計し、このクラスプ部が電鋳によって作
製されるようその部分を導電性が残存した状態のままと
した。治具でセントした後、何の処理もしな、いで、ホ
ウフッ化コバルト3509/l 、ホウフッ酸170C
c/l、ピット防止剤0.59/lと平均粒径0.2μ
の酸化アルミニウム粉s o 9/lを添加した電鋳浴
中に浸漬し、pH1,Q以下、浴温25℃、電流密度2
A/d7F1′で、600rpmノフロヘラ攪拌ヲ行
ないながら、約50時間電鋳し、コバルト92%、酸化
アルミニウム8%で酸化アルミニウム粉が分散共析した
厚さ1050μの電鋳金属層を得た。Graphite powder was applied to the entire surface of this model, and areas not required for electroforming were masked with the wax. At this time, the clasp part was designed to have a band shape, and the clasp part was left in a state where conductivity remained so that the clasp part could be produced by electroforming. Cobalt borofluoride 3509/l, fluoroboric acid 170C without any treatment after centrifuging with a jig.
c/l, anti-pitting agent 0.59/l and average particle size 0.2μ
It was immersed in an electroforming bath to which 9/l of aluminum oxide powder was added, pH 1,Q or less, bath temperature 25℃, current density 2.
Electroforming was carried out at A/d7F1' for about 50 hours while stirring with a noflo spatula at 600 rpm to obtain an electroformed metal layer with a thickness of 1050 μm in which aluminum oxide powder was dispersed and eutectoid with 92% cobalt and 8% aluminum oxide.
これを水洗、乾燥後、治具を取り外し、約100’Cの
熱風により密ロウを溶解除去して目的のパーシャルメタ
ルプレートを得たが、電鋳によって作製されたクラスプ
部の厚さは1400/Aに達していたが、突起物の少な
い平滑な帯状のものであった。この実施例によって得ら
れたパーシャルメタルプレートは口腔内は勿論、クラス
プの残存歯に対する適合性もきわめて良好であって、プ
レート本体の靭性、強度は著しく大きく、さらに、この
上に白金めつきを施した結果は変色が全(起らず、しか
も口腔内壁とパーシャルメタルプレートの親和性が高ま
って患者にとって異和感を感じない快適なものであった
。After washing and drying this, the jig was removed and the wax was melted and removed using hot air at about 100'C to obtain the desired partial metal plate. However, the thickness of the clasp part made by electroforming was 1400/ Although it reached grade A, it was a smooth strip with few protrusions. The partial metal plate obtained in this example has extremely good compatibility with the remaining teeth of the clasp as well as inside the oral cavity, and the plate body has extremely high toughness and strength. The results showed that there was no discoloration, and the affinity between the oral cavity wall and the partial metal plate was enhanced, making it comfortable for the patient without causing any discomfort.
〔実施例4〕
残存歯のある患者の口腔から印象をとり、これに石膏を
注入してマスターモデルを作製し、これにパーシャルメ
タルプレートを設計して、シリコン樹脂によって複印象
をとった。この複印象に黒鉛50%を含む変性エポキシ
樹脂の導電性ペーストを硬化剤とともに注入し、約1時
間放置後後印象を取り除き、導電性ワーキングモデルを
作製した。このキデルの電鋳不要部の全面に塩化ビニル
樹脂塗料でマスキングし、治具セットの後過マンガン酸
カリの3%水溶液で洗浄し、さらに水洗して、スルファ
ミン酸二ンケル4sof/!、塩化二ンケル39/l、
ホウ酸1oy7t、スルファミン酸鉄120P/lから
なるニッケルー鉄電鋳浴中へ浸漬し、PH4,6、浴温
50℃、電流密度IA/dゴで15時間電鋳し、ニッケ
ル76%、鉄24%の厚す170μの電鋳金属層を得た
。電鋳の際、鉄柵板側に1000.300Wの抵抗器を
セットした。前記各実施例と同様水洗、治具取り外し、
電鋳金属層の離型等を順次行なって目的とするパーシャ
ルメタルプレートを得た。このニッケルー鉄合金は性状
がきわめて安定し、充分な機能を果したが、この表面に
厚さ0.8Pのロジウムめっきを施したところ、硬度が
高くなり、耐食性も良好となって、前記各実施例に記載
したと同等の効果および薄くて強靭な性能が得られ、満
足すべきものであった。[Example 4] Impressions were taken from the oral cavity of a patient with remaining teeth, plaster was injected into this to create a master model, a partial metal plate was designed on this, and a double impression was taken using silicone resin. A conductive paste of a modified epoxy resin containing 50% graphite was injected into this double impression together with a hardening agent, and after being left for about 1 hour, the post-impression was removed to prepare a conductive working model. The entire surface of the Kidel that does not require electroforming is masked with vinyl chloride resin paint, and after the jig is set, it is washed with a 3% aqueous solution of potassium permanganate, and further washed with water. , nickel chloride 39/l,
It was immersed in a nickel-iron electroforming bath consisting of 1oy7t of boric acid and 120P/l of iron sulfamate, and electroformed for 15 hours at pH 4.6, bath temperature 50℃, and current density IA/d. An electroformed metal layer with a thickness of 170 μm was obtained. During electroforming, a 1000.300W resistor was set on the iron fence plate side. As in each of the above examples, washing with water, removing the jig,
The desired partial metal plate was obtained by successively releasing the electroformed metal layer. This nickel-iron alloy had extremely stable properties and functioned satisfactorily, but when the surface was plated with rhodium to a thickness of 0.8P, it became harder and had good corrosion resistance. The same effect as described in the example and thin and strong performance were obtained, which was satisfactory.
〔実施例5〕
フルメタルプレートを要求する患者から印象をとり、実
施例1と同様の方法でワーキングモデルを作製し、これ
に銀粉30%を含む導電性塗料により電鋳必要個所を導
電化した。この際、前記導電性塗料により義歯台アンカ
一部相当個所を線状にデザインし、前記各実施例と同様
治具セントを行ない、硫酸ニッケル350971.塩化
エンケル202/11ホウ酸101i’//、ピット防
止剤0.4グ/l、タングステン酸ナトリウムsob/
/、粒径0.1μの酸化珪素xoF//1粒径0.5μ
の窒化チタン102/11粒径1μのホウ化クロム1(
1’//、粒径0.08μの炭化タングステンIOF!
//からなるpH3,9の電鋳浴に浸漬し、浴温60℃
、電流密度8A/ddでsoorpmのプロペラ攪拌を
行ないながら4時間電鋳し、ニッケル97%、タングス
テン3%からなる電鋳金属層中に、酸化珪素6%、窒化
チタン2%、ホウ化クロム0.5%、炭化タングステン
8%を含有するセラミックス分散共析のニッケルータン
グステンの厚さ370μの電鋳金属層を施した。これを
水洗した後治具を取り外し、ワーキングモデルから剥離
し、表面を仕上げた後アンカ一部にアクリル樹脂を成形
し、これに義歯を取り付け、目的とするフルメタルプレ
ートを得た。[Example 5] An impression was taken from a patient requesting a full metal plate, a working model was prepared in the same manner as in Example 1, and the parts requiring electroforming were made conductive using a conductive paint containing 30% silver powder. At this time, a part corresponding to a part of the denture base anchor was designed into a line using the conductive paint, and a jig was placed in the same manner as in each of the above embodiments. Enkel chloride 202/11 boric acid 101i'//, pit inhibitor 0.4 g/l, sodium tungstate sob/
/, silicon oxide xoF with particle size 0.1μ //1 particle size 0.5μ
titanium nitride 102/11 grain size 1μ chromium boride 1 (
1'//, tungsten carbide IOF with grain size of 0.08μ!
// Immersed in an electroforming bath with a pH of 3.9 and a bath temperature of 60°C.
, electroforming was performed for 4 hours at a current density of 8 A/dd with propeller stirring at soorpm, and an electroformed metal layer consisting of 97% nickel and 3% tungsten contained 6% silicon oxide, 2% titanium nitride, and 0 chromium boride. A 370 micron thick electroformed metal layer of ceramic dispersion eutectoid nickel-tungsten containing 0.5% tungsten carbide and 8% tungsten carbide was applied. After washing it with water, the jig was removed and it was peeled off from the working model. After finishing the surface, acrylic resin was molded on a part of the anchor, and a denture was attached to it to obtain the desired full metal plate.
この実施例においては、さらに手入れ仕上げ後、厚さ1
.5μのパラジウムを通常のめつき方法によって積層し
て使用したが、前記実施例に記載したと同様の好結果が
得られ、全く問題なく使用することができた。なお、セ
ラミックス粉末の分散共析により、この実施例で得られ
たものの硬度(Hマ)は620であり、きわめて靭性が
大きく良好であった。In this example, after further care and finishing, the thickness is 1
.. Palladium having a thickness of 5μ was laminated using a conventional plating method, and the same good results as described in the above example were obtained, and the product could be used without any problems. In addition, the hardness (Hma) of the material obtained in this example by dispersion eutectoid of ceramic powder was 620, and the toughness was extremely high and good.
第1図はパーシャルメタルプレートの概略を示す一部欠
損の平面図、第2図は矯正用メタルプレートを例示する
平面図である。
1・・・電鋳金属層、2・・・網目状開口部、3・・・
アンカ一部、4・・・アクリル樹脂、5・・・義歯、6
・・・扱歯弧線、7・・・りンガルアーチ
特許出願人 進越化学工業株式会社
同 同 吉 1) 径 −同
同 伊 藤 道 男同
代理人 鎌 1) 文 二第1図
第2図FIG. 1 is a plan view schematically showing a partially defective partial metal plate, and FIG. 2 is a plan view illustrating a correction metal plate. 1... Electroformed metal layer, 2... Mesh opening, 3...
Anchor part, 4... Acrylic resin, 5... Denture, 6
... Treated tooth arc wire, 7... Lingual arch patent applicant Shin-Etsu Chemical Co., Ltd. Dokio Ito 1) Diameter - Dodo Michi Ito
Agent Sickle 1) Sentence 2 Figure 1 Figure 2
Claims (8)
これに銅、銀、金、インジウム、ホウ素、スズ、リン、
クロム、モリブデン、タングステン、マンガン、鉄、ル
テニウム、ロジウム、パラジウム、白金の少なくとも1
種を含有する電鋳金属層から成ることを特徴とする歯科
用金属床。(1) At least one of nickel and cobalt, or
This includes copper, silver, gold, indium, boron, tin, phosphorus,
At least one of chromium, molybdenum, tungsten, manganese, iron, ruthenium, rhodium, palladium, and platinum
A dental metal floor characterized in that it consists of an electroformed metal layer containing seeds.
化物、金属炭化物等のセラミックス粉末の少な(とも1
種以上を分散共析させたものである特許請求の範囲第1
項記載の歯科用金属床。(2) The electroformed metal layer contains a small amount of ceramic powder such as metal oxide, metal nitride, metal boride, metal carbide, etc.
Claim 1 is a dispersion co-deposition of more than one species.
Dental metal floor as described in section.
、白金、銀、クロムの少なくとも1種を主成分とする高
耐食性金属で被覆されている特許請求の範囲第1項また
は第2項記載の歯科用金属床。(3) Part or all of the electroformed metal layer is coated with a highly corrosion-resistant metal whose main component is at least one of gold, rhodium, platinum, silver, and chromium. Dental metal floor as described in section.
されている特許請求の範囲第1項、第2項または第3項
に記載の歯科用金属床。(4) The dental metal bed according to claim 1, 2, or 3, wherein the electroformed metal layer is integrally fixed to the clasp wire.
樹脂、ロウ等の非電導性材料からなる模型基体の表面上
に、銀鏡、化学めっき、導電性塗膜等によって導電性を
付与した印象部、または、患者口腔内からの印象に基づ
き製作された導電性樹脂等の導電性材料からなる模型基
体の印象部に、ニッケル、コバルトの少なくとも1種ま
たはこれに銅、銀、金、インジウム、ホウ素、スズ、リ
ン、クロム、モリブデン、タングステン、マンガン、鉄
、ルテニウム、ロジウム、パラジウム、白金の少なくと
も1種を含有する電鋳金属層を電着させ、これを模型基
体から剥離して仕上げすることを特徴とする歯科用金属
床の製造方法。(5) Plaster manufactured based on impressions from inside the patient's oral cavity;
An impression part made of a non-conductive material such as resin or wax that is made conductive by silver mirror, chemical plating, conductive coating, etc., or an impression made from inside the patient's oral cavity. At least one of nickel and cobalt, or copper, silver, gold, indium, boron, tin, phosphorus, chromium, molybdenum, tungsten, manganese, and iron, is applied to the impression part of the model base made of conductive material such as conductive resin. A method for manufacturing a dental metal floor, which comprises electrodepositing an electroformed metal layer containing at least one of ruthenium, rhodium, palladium, and platinum, and finishing the layer by peeling it off from a model base.
化物、金属炭化物等のセラミック粉末の少なくとも1種
以上、を分散共析させる特許請求の範囲第5項記載の歯
科用金属床の製造方法。(6) The dental metal bed according to claim 5, wherein at least one ceramic powder such as metal oxide, metal nitride, metal boride, metal carbide, etc. is dispersed and eutectoid in the electroformed metal layer. manufacturing method.
、白金、銀、クロムの少なくとも1種を主成分とする高
耐食性金属で被覆する特許請求の範囲第5項または第6
項記載の歯科用金属床の製造方法。(7) Part or all of the electroformed metal layer is coated with a highly corrosion-resistant metal whose main component is at least one of gold, rhodium, platinum, silver, and chromium.
1. Method for manufacturing a dental metal floor as described in Section 1.
に、導電性金属からなるクラスプ用ワイヤーの端部を模
型基体の導電性表面に近接させて、クラスプ用ワイヤー
を電鋳金属層に一体的に同時に固定する特許請求の範囲
第5項、第6項または第7項記載の歯科用金属床の製造
方法。(8) When electrodepositing the electroformed metal layer on the impression part of the model base, the end of the clasp wire made of conductive metal is brought close to the conductive surface of the model base, and the clasp wire is attached to the electroformed metal layer. A method for manufacturing a dental metal floor according to claim 5, 6 or 7, wherein the metal floor is fixed integrally to the layers at the same time.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56163172A JPS5862105A (en) | 1981-10-09 | 1981-10-09 | Dental metallic denture base and its preparation |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56163172A JPS5862105A (en) | 1981-10-09 | 1981-10-09 | Dental metallic denture base and its preparation |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5862105A true JPS5862105A (en) | 1983-04-13 |
Family
ID=15768603
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56163172A Pending JPS5862105A (en) | 1981-10-09 | 1981-10-09 | Dental metallic denture base and its preparation |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5862105A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58209345A (en) * | 1982-05-14 | 1983-12-06 | ホルスト・ヴィスマン | Production of dental metal replacing parts |
JPS6137233A (en) * | 1984-07-31 | 1986-02-22 | 鈴木 信人 | Production of denture and dental prosthesis parts |
EP1156138A3 (en) * | 2000-05-12 | 2004-07-14 | Pioneer Corporation | Electrode material for forming stamper and thin film for forming stamper |
JP2008063984A (en) * | 2006-09-06 | 2008-03-21 | Hitachi Ltd | Low pressure steam turbine |
JP2009221972A (en) * | 2008-03-17 | 2009-10-01 | Toshiba Corp | Steam turbine and air extraction operating method thereof |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US15706A (en) * | 1856-09-09 | Casting artificial-tooth plates by the electrotype process |
-
1981
- 1981-10-09 JP JP56163172A patent/JPS5862105A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US15706A (en) * | 1856-09-09 | Casting artificial-tooth plates by the electrotype process |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58209345A (en) * | 1982-05-14 | 1983-12-06 | ホルスト・ヴィスマン | Production of dental metal replacing parts |
JPH0348819B2 (en) * | 1982-05-14 | 1991-07-25 | Uisuman Horusuto | |
JPS6137233A (en) * | 1984-07-31 | 1986-02-22 | 鈴木 信人 | Production of denture and dental prosthesis parts |
EP1156138A3 (en) * | 2000-05-12 | 2004-07-14 | Pioneer Corporation | Electrode material for forming stamper and thin film for forming stamper |
JP2008063984A (en) * | 2006-09-06 | 2008-03-21 | Hitachi Ltd | Low pressure steam turbine |
JP2009221972A (en) * | 2008-03-17 | 2009-10-01 | Toshiba Corp | Steam turbine and air extraction operating method thereof |
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