JPS5848769Y2 - Electron microscopes and similar equipment - Google Patents

Electron microscopes and similar equipment

Info

Publication number
JPS5848769Y2
JPS5848769Y2 JP1474678U JP1474678U JPS5848769Y2 JP S5848769 Y2 JPS5848769 Y2 JP S5848769Y2 JP 1474678 U JP1474678 U JP 1474678U JP 1474678 U JP1474678 U JP 1474678U JP S5848769 Y2 JPS5848769 Y2 JP S5848769Y2
Authority
JP
Japan
Prior art keywords
sample
chamber
column
aperture
evaporation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1474678U
Other languages
Japanese (ja)
Other versions
JPS54118069U (en
Inventor
昭次 奥富
Original Assignee
日電子技術サ−ビス株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日電子技術サ−ビス株式会社 filed Critical 日電子技術サ−ビス株式会社
Priority to JP1474678U priority Critical patent/JPS5848769Y2/en
Publication of JPS54118069U publication Critical patent/JPS54118069U/ja
Application granted granted Critical
Publication of JPS5848769Y2 publication Critical patent/JPS5848769Y2/en
Expired legal-status Critical Current

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Description

【考案の詳細な説明】 本考案は絞りの焼出しクリーニングを行うことのできる
電子顕微鏡及び類似装置に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an electron microscope and similar devices capable of performing print-out cleaning of the aperture.

一般に電子顕微鏡においては電子レンズ内に絞りを有し
ているが、この絞りは電子衝撃を受けるため有機分子が
その表面に焼結せられ、汚染被膜を形成する。
Generally, an electron microscope has an aperture within the electron lens, but since this aperture receives electron bombardment, organic molecules are sintered on its surface, forming a contaminating film.

該汚染被膜は電気絶縁物であるため、電子が帯電し、電
子線に非点収差を発生したり、不正な偏向を与えてしま
う。
Since the contaminated film is an electrical insulator, electrons are charged, causing astigmatism or incorrect deflection of the electron beam.

而して、従来汚れた絞りは装置から取り外し、真空蒸着
装置内の電熱ヒータ上に載せ、例えば1500℃以上に
加熱して付着した分子を脱離(焼出し)している。
Conventionally, the dirty aperture is removed from the apparatus, placed on an electric heater in the vacuum evaporation apparatus, and heated to, for example, 1500° C. or higher to remove (bake out) the attached molecules.

しかし乍ら真空蒸着装置を持たない場合には、充分な絞
りクリーニングが行えず、従って絞りを使い捨てにする
か、或いは電子顕微鏡の性能を犠牲にしなければならな
い不都合を生ずる。
However, if a vacuum evaporation device is not provided, sufficient aperture cleaning cannot be performed, resulting in the inconvenience of having to dispose of the aperture or sacrificing the performance of the electron microscope.

そこで本考案は真空蒸着装置がなくても容易に絞りの加
熱クリーニングを可能にする電子顕微鏡及び類似装置を
提供する。
Therefore, the present invention provides an electron microscope and similar devices that can easily perform heating cleaning of the aperture without the need for a vacuum evaporation device.

第1図は簡易型の走査電子顕微鏡の断面図にして、1は
顕微鏡カラムである。
FIG. 1 is a sectional view of a simple scanning electron microscope, and 1 is a microscope column.

該カラム内には電子銃2.電子レンズ3,4及び偏向コ
イル5 a 、5 b等の電子光学手段が収納されてい
る。
Inside the column is an electron gun 2. Electron optical means such as electron lenses 3 and 4 and deflection coils 5 a and 5 b are housed.

前記カラム1の下部には試料室6が結合され、その内部
には試料7を保持した試料台8が配置されている。
A sample chamber 6 is connected to the lower part of the column 1, and a sample stage 8 holding a sample 7 is arranged inside the sample chamber 6.

この試料台は試料室6の側壁に取外し可能に装着された
試料装置9に保持されている。
This sample stage is held by a sample device 9 that is removably mounted on the side wall of the sample chamber 6.

この試料装置は試料台8を水平移動、傾斜9回転させる
機構を含んでいる。
This sample apparatus includes a mechanism for horizontally moving the sample stage 8 and rotating the sample table nine times in the tilt direction.

前記カラム1の電子銃2が納められた部屋には排気管1
0 aが接続され、又試料室6の試料装置9と反対側に
も排気管10 bが接続され、それらは排気管10 C
を通して真空ポンプに接続される。
There is an exhaust pipe 1 in the room where the electron gun 2 of the column 1 is housed.
0a is connected, and an exhaust pipe 10b is also connected to the opposite side of the sample chamber 6 from the sample device 9, and these are connected to the exhaust pipe 10c.
Connected to the vacuum pump through.

本考案の特徴とする所は、第2図に示す如く、試料装置
9に交換して蒸発室11を試料室6の側壁に嵌挿した点
にある。
The feature of the present invention is that, as shown in FIG. 2, the evaporation chamber 11 is inserted into the side wall of the sample chamber 6 in place of the sample device 9.

該蒸発室内には電熱ヒータ12が設けられ、絞りはこの
中に挿入され、高温に加熱される。
An electric heater 12 is provided in the evaporation chamber, and the aperture is inserted into this heater and heated to a high temperature.

又この蒸発室にはパイプ13が気密に固定されており、
このパイプは前述の試料室内排気用の排気管10b内に
深く挿入される。
In addition, a pipe 13 is airtightly fixed to this evaporation chamber.
This pipe is deeply inserted into the exhaust pipe 10b for exhausting the sample chamber described above.

第3図。第4図は前記蒸発室部分の具体例を示す詳細図
であり、蒸発室は試料室6に嵌挿される固定部材14と
、該固定部材14に回転可能に嵌合された筒体15から
構成され、固定体と試料室の間及び固定体と筒体との間
は真空シールが施こされている。
Figure 3. FIG. 4 is a detailed view showing a specific example of the evaporation chamber, and the evaporation chamber is composed of a fixing member 14 fitted into the sample chamber 6 and a cylinder 15 rotatably fitted to the fixing member 14. A vacuum seal is provided between the fixed body and the sample chamber and between the fixed body and the cylindrical body.

又、筒体15の端面中央部には内部を観察するためのガ
ラス窓16が設けである。
Further, a glass window 16 is provided at the center of the end face of the cylinder 15 for observing the inside.

パイプ13は前記固定体を貫通しており、蒸発室と排気
管10 bとを連通する。
A pipe 13 passes through the fixed body and communicates the evaporation chamber with the exhaust pipe 10b.

前記固定体の蒸発室に面する側には、電極17 a及び
17bが植設され、両者間に電熱ヒータ18が張架され
る。
Electrodes 17a and 17b are planted on the side of the fixed body facing the evaporation chamber, and an electric heater 18 is stretched between them.

そして、絞りや蒸発用材料19はこの上に置かれる。Then, the aperture and evaporation material 19 are placed on top of this.

前記電極はリード線20a、20bを介して電源21に
接続され、所定の電流が供給される。
The electrodes are connected to a power source 21 via lead wires 20a and 20b, and a predetermined current is supplied thereto.

而して、走査電子顕微鏡観察を行うときは、第1図の如
く試料装置9を試料室6に装着せしめるわけであるが、
長時間の観察で電子レンズ3や4に使用される絞りが汚
れた場合、該絞りを装置から取り外すと共に、第2図及
び第3図に示す如き蒸発室11を前記試料装置9に交換
して装着せしめ、電熱ヒータ12(18)に前記汚染し
た絞りを保持せしめて、1500℃以上に加熱すれば、
絞りは焼出しクリーニングされ、清浄化される。
When conducting scanning electron microscope observation, the sample device 9 is mounted in the sample chamber 6 as shown in FIG.
If the aperture used for the electron lenses 3 and 4 becomes dirty during long-term observation, remove the aperture from the apparatus and replace the evaporation chamber 11 with the sample apparatus 9 as shown in FIGS. 2 and 3. If the contaminated aperture is held in the electric heater 12 (18) and heated to 1500°C or higher,
The aperture is bakeout cleaned and cleaned.

このとき、蒸発室内はパイプ13を介して、排気管10
bに連通し、走査電子顕微鏡の排気装置により排気さ
れるが、パイプ13が排気管10 bの深くまで挿入さ
れているため、絞りから焼き出された汚染ガスは直ちに
排出され、カラム1内に浸入することが殆んどないため
、電子レンズやその他の電子光学手段を再び汚すことが
ない。
At this time, the inside of the evaporation chamber is connected to the exhaust pipe 10 through the pipe 13.
b, and is exhausted by the exhaust system of the scanning electron microscope. However, since the pipe 13 is inserted deep into the exhaust pipe 10b, the contaminated gas burnt out from the aperture is immediately exhausted and flows into the column 1. Since there is almost no penetration, the electron lens or other electro-optical means will not be contaminated again.

勿論、上記蒸発室は通常の蒸着装置としても使用できる
Of course, the evaporation chamber described above can also be used as a normal evaporation apparatus.

この場合には、第3図、第4図においてヒータ18上に
蒸発材料19を置き筒体15の底部に被検試料22を置
き前記材料19を蒸発させるようにすれば良い。
In this case, as shown in FIGS. 3 and 4, the material 19 to be evaporated may be placed on the heater 18, the test sample 22 placed at the bottom of the cylinder 15, and the material 19 evaporated.

このとき、筒体15を回転させれば、試料面に異った方
向から蒸着でき、シャドウーイング効果を向上できる。
At this time, by rotating the cylindrical body 15, vapor deposition can be performed on the sample surface from different directions, and the shadowing effect can be improved.

以」二の如く構成すれば、高価な真空蒸着装置を持たな
くても、絞りの焼出しクリーニングが可能であり、従っ
て絞りの使いすてという非経済的な問題も解消される。
With the configuration as described above, it is possible to perform printout cleaning of the aperture without the need for an expensive vacuum evaporation device, and the uneconomical problem of wasting the aperture can also be solved.

尚、上記実施例において、パイプ13に代え、カラム1
と試料室6との連通を遮断するように構成することも可
能である。
Incidentally, in the above embodiment, instead of the pipe 13, the column 1
It is also possible to configure the sample chamber 6 so that communication between the sample chamber 6 and the sample chamber 6 is cut off.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は簡易走査電子顕微鏡を示す断面図、第2図は本
考案の特徴を示す図、第3図は本考案の要部具体例を示
す詳細図、第4図は第3図のAA断面図である。 1はカラム、2は電子銃、3及び4は電子レンズ、5a
及び5bは偏向コイル、6は試料室、7は試料、8は試
料台、9は試料装置、10 a 、10 b及び10
Cは排気管、11は蒸発室、12は電熱ヒータ、13は
パイプである。
Figure 1 is a cross-sectional view showing a simple scanning electron microscope, Figure 2 is a diagram showing the features of the present invention, Figure 3 is a detailed view showing a specific example of the main part of the present invention, and Figure 4 is the AA of Figure 3. FIG. 1 is a column, 2 is an electron gun, 3 and 4 are electron lenses, 5a
and 5b is a deflection coil, 6 is a sample chamber, 7 is a sample, 8 is a sample stage, 9 is a sample device, 10a, 10b and 10
C is an exhaust pipe, 11 is an evaporation chamber, 12 is an electric heater, and 13 is a pipe.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 電子レンズ等の電子光学手段を含んだカラム、該カラム
に結合された試料室、該試料室内において試料を保持・
移動させる為の試料装置及び前記カラム並びに試料室を
排気する手段を備えた装置において、前記試料装置に交
換して電熱ヒータを内臓した蒸発室を取付は可能となし
、該蒸発室の取付けに関連して該蒸発室が前記カラムと
事実上隔離されて前記排気手段により排気されるように
構成してなる電子顕微鏡及び類似装置。
A column containing an electron optical means such as an electron lens, a sample chamber coupled to the column, and a sample chamber for holding and holding a sample in the sample chamber.
In an apparatus equipped with a sample device for movement and a means for evacuating the column and sample chamber, it is possible to install an evaporation chamber with a built-in electric heater in place of the sample device, and related to the installation of the evaporation chamber. and the evaporation chamber is substantially isolated from the column and evacuated by the evacuation means.
JP1474678U 1978-02-08 1978-02-08 Electron microscopes and similar equipment Expired JPS5848769Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1474678U JPS5848769Y2 (en) 1978-02-08 1978-02-08 Electron microscopes and similar equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1474678U JPS5848769Y2 (en) 1978-02-08 1978-02-08 Electron microscopes and similar equipment

Publications (2)

Publication Number Publication Date
JPS54118069U JPS54118069U (en) 1979-08-18
JPS5848769Y2 true JPS5848769Y2 (en) 1983-11-08

Family

ID=28835214

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1474678U Expired JPS5848769Y2 (en) 1978-02-08 1978-02-08 Electron microscopes and similar equipment

Country Status (1)

Country Link
JP (1) JPS5848769Y2 (en)

Also Published As

Publication number Publication date
JPS54118069U (en) 1979-08-18

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