JPS5845349A - Thin strip of high-silicon steel having (100)<011> aggregated texture - Google Patents
Thin strip of high-silicon steel having (100)<011> aggregated textureInfo
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- JPS5845349A JPS5845349A JP56124003A JP12400381A JPS5845349A JP S5845349 A JPS5845349 A JP S5845349A JP 56124003 A JP56124003 A JP 56124003A JP 12400381 A JP12400381 A JP 12400381A JP S5845349 A JPS5845349 A JP S5845349A
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- silicon steel
- ribbon
- thin strip
- silicon
- gaseous
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Abstract
Description
【発明の詳細な説明】
本発明は、高珪素鋼薄帯、特に珪素を５０〜８．０重量
係含有する高珪素−鋼薄帯に関するものである。従来、
珪素鋼板としては珪素を３重量係程度、含有し、（１１
０）（０，０１）なる集合組織をもつものが優れた電磁
鋼板であることはよく知られている。そして、珪素量が
さらに増加し、珪素５，０〜８．０重量係を含有した高
珪素鋼板は、前記電磁鋼板より、電気抵抗率が２倍以上
となり、かつ飽和磁歪定数も小さくなるため、トランス
用磁心に使用するには極めて優れた拐料であることも知
られてはいたが、この５．０〜８．０重′ｈＬ係の珪素
を含む高珪素鋼板は冷間圧延が極めて困難なため、薄帯
化が難しく工業化されていないのが現状である。一方、
最近になり液体超急冷技術を用い高珪素鋼薄帯を作成す
る研究がおこなわれており、その結果によると、珪素含
有量の多い珪素鉄合金〜でも、この方法によれば極めて
靭性に富む薄帯が容易に待られることがわか−、だ。し
かし、融体の凝固が棒めて急速におこり、凝固して薄帯
となると、き、融体の持っている熱が薄帯の厚さ方向に
伝達されて回転体に吸収されるので薄帯の厚さ方向に結
晶の優先成長がおこる。そして、この優先方位は（１０
０）であると同時に、薄帯の面内で無配向になっている
ことがＸ線回折によシ明らかとなった。従って、このよ
うな薄帯をトロイダル巻きにして変成器などの磁心に用
いると磁束の流れ方向は、無配向の方向を利用すること
になり、波形歪のない有効な磁束密度での動作点が下が
るため高いレベルで動作をさせると磁心損失が大きくな
るなどの問題があった。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a high-silicon steel ribbon, particularly a high-silicon steel ribbon containing 50 to 8.0% silicon by weight. Conventionally,
The silicon steel plate contains about 3 parts by weight of silicon, (11
It is well known that those having a texture of 0)(0,01) are excellent electrical steel sheets. In addition, a high-silicon steel sheet with a further increased silicon content and a silicon content of 5.0 to 8.0% by weight has an electrical resistivity of more than twice that of the electrical steel sheet and a smaller saturation magnetostriction constant. Although it was known that it was an extremely excellent material for use in magnetic cores for transformers, it was extremely difficult to cold-roll this high-silicon steel sheet containing silicon with a weight of 5.0 to 8.0 hL. For this reason, it is difficult to make thin ribbons and it has not yet been industrialized. on the other hand,
Recently, research has been conducted to create high-silicon steel ribbons using liquid ultra-quenching technology, and the results show that even silicon-iron alloys with high silicon content can be made into extremely tough thin ribbons using this method. It turns out that the belt can be easily waited for. However, when the molten material solidifies rapidly and becomes a thin ribbon, the heat of the molten material is transferred in the thickness direction of the ribbon and absorbed by the rotating body. Preferential growth of crystals occurs in the thickness direction of the band. And this preferred direction is (10
0), and at the same time, it was revealed by X-ray diffraction that there was no orientation within the plane of the ribbon. Therefore, if such a ribbon is toroidally wound and used in the magnetic core of a transformer, the flow direction of the magnetic flux will be in an unoriented direction, and the operating point at an effective magnetic flux density without waveform distortion will be Therefore, when operating at a high level, there were problems such as increased magnetic core loss.
本発明は、かかる欠点を除去するものであり、薄帯面上
に（１００）面を何らかの配向をもつように改良した、
磁気特性の優れた高珪素鋼薄帯を提供することを目的と
するも党である。The present invention eliminates such drawbacks, and improves the (100) plane to have some kind of orientation on the ribbon surface.
Our objective is to provide a high-silicon steel ribbon with excellent magnetic properties.
し
次に、本発明の構成を詳細に説明する。本発明名らは、
超急冷技術を用いて得られる高珪素銅帯結果、高珪素鋼
薄帯をアルゴンガス、窒素ガス、水素ガス中で、かつ６
００℃以上の温度で熱処理を施すと、薄帯面内において
（０１１）方位が薄帯の長手方向に配向することを見出
した。そして、研究の結果、不純物ガスである酸素、硫
化水素、水蒸気等の濃度が１ ｐｐｍ以下の場合、雰囲
気は、高真空と同じ状態になり、薄帯面に（１００）面
にかわって（１１０）面が析出してくる。そのデータを
第６図に示す。また不純物ガスが５００ｐｐｍ以上にな
ると不純物ガスが薄帯面に侵入して磁気特性の劣化をま
ねくことがわかった。そのデータを第７図に示す。また
、６００℃以下の熱処理では、高珪素鋼薄帯の再結晶温
度以下となるため、熱処理による効果はない。Next, the configuration of the present invention will be explained in detail. The name of the present invention is
High-silicon copper strip obtained using ultra-quenching technology, high-silicon steel ribbon in argon gas, nitrogen gas, hydrogen gas, and 6
It has been found that when heat treatment is performed at a temperature of 00° C. or higher, the (011) orientation is oriented in the longitudinal direction of the ribbon within the ribbon surface. As a result of research, when the concentration of impurity gases such as oxygen, hydrogen sulfide, and water vapor is 1 ppm or less, the atmosphere becomes the same as a high vacuum, and the (110) plane changes to the (100) plane of the ribbon. ) surface begins to precipitate. The data are shown in FIG. It was also found that when the impurity gas concentration exceeds 500 ppm, the impurity gas invades the ribbon surface and causes deterioration of the magnetic properties. The data is shown in FIG. In addition, heat treatment at 600° C. or lower results in a temperature lower than the recrystallization temperature of the high-silicon steel ribbon, so that the heat treatment has no effect.
以下、本発明の具体的構成を実施例によって説明する。Hereinafter, the specific configuration of the present invention will be explained using examples.
実施例１ 一−１′（。Example 1 1-1'(.
Ｆｅ９３．５ ”” ６．５重量係の母合金を作成し、
第１図に示すようにこの母合金を誘導コイル１によって
１５００℃に誘導加熱して、耐熱性ノズル２のノズル口
３からアルゴンガスにより０．３〜０．４ ｋｇ／ｍ”
の圧力を加えて、周速２２ ｍ／ｓで円柱状の鉄力・ら
なる回、転体４の回転面上に噴出させ、急冷、凝固させ
ることにより高珪素鋼薄帯５を得だ。このようにして得
た＃帯は、巾１０胡、厚さ５０μｍのものであった。こ
のときの極点図を第２図（ａｔ 、 ｆｂｌに示す。Fe93.5 "" Create a master alloy with a weight coefficient of 6.5,
As shown in FIG. 1, this master alloy is induction heated to 1500°C by an induction coil 1, and 0.3 to 0.4 kg/m'' is heated by argon gas from the nozzle opening 3 of the heat-resistant nozzle 2.
The high-silicon steel ribbon 5 was obtained by applying a pressure of 22 m/s, ejecting a cylindrical iron force onto the rotating surface of the rolling body 4 at a circumferential speed of 22 m/s, and rapidly cooling and solidifying it. The # band thus obtained had a width of 10 mm and a thickness of 50 μm. The pole figures at this time are shown in Figure 2 (at, fbl).
件だ、この薄帯を１０５０℃で、アルコゝンガス中で３
０分間熱処理を行なった。このときの極メ裁図を第３図
（ａ） 、 ｉｂ）に示す。The matter is, this ribbon was heated to 1050℃ in alcoion gas for 30 minutes.
Heat treatment was performed for 0 minutes. The final cutting diagram at this time is shown in Figure 3(a), ib).
２え４施ｆンリー；卓−
実施例１で作成した高珪素鋼薄帯を１２００℃で、窒素
ガス中で、１時間熱処理した。このときの極点図を第４
図ｆａｌ 、 ｆｂｌに示す。The high silicon steel ribbon prepared in Example 1 was heat treated at 1200° C. in nitrogen gas for 1 hour. The pole figure at this time is the fourth
Shown in Figures fal, fbl.
実施例３
実施例１で作成した高珪素鋼薄帯を、１１００℃で水素
ガス中で、９０分間熱処理した。このときの極点図を第
５図ｆａｌ 、 （ｂｌに示す。Example 3 The high silicon steel ribbon produced in Example 1 was heat treated in hydrogen gas at 1100° C. for 90 minutes. The pole figure at this time is shown in Figure 5.
以トのように、本発明によれば、アルコゝンガス、窒素
ガス、水素ガス中で、かつ６００℃以上の熱処理を施す
ことにより（１００）（０１１）の方向性をもった高珪
素鋼薄帯を容易に提供することができる。As described above, according to the present invention, a high-silicon steel thin film having (100) (011) orientation can be produced by heat treatment at 600°C or higher in alcone gas, nitrogen gas, or hydrogen gas. Obi can be easily provided.
重量係の液体超急冷法によってできた薄帯のロール面側
の（２００）面のぽから９σ１での極点図であってＲ，
Ｄ、はロール方向、Ｔ、Ｄはロールと重上
直方向を示し、第２図（ｂｌは実施例で述べたＦｅ９３
．５８１６．５重量係の液体超急冷法によってできた薄
帯のロール面側の（ｌｌＯ）面の３Ｃから９σまでの極
点図、第３図（ａｌは、実施例１で述べたＦｅ９３．５
Ｓｉ６．ｓ重量係の液体急冷法によってできた薄帯を１
０５０℃でアルゴンがス中で３０分間熱処理をした時の
薄帯のロール面側のぽから９Ｃｆ’までの（２００）面
の極点図、第３図ｆｂｌ似、実施例１で熱処理した薄帯
の３（ｆ’から９（ｆ’までのロール面側の（ｊ １０
）面の極点図、第４図（ａｌは、実施例２で述べた＃
弗・のロール面１１ｉのσから９（ｆまでの（２００）
面の極点図、第４図（ｂｌは、実施例２で述べた薄帯の
ロール面側の３ぽから９０’−ｉでの（１−１０）面の
極点図、第５図（ａｔは、実施例３で述べた薄帯のロー
ル面側のσから９Ｃｆ′ｔでの（２００）面の極点図、
第５図ｆｂｌは、実施例３で述べた薄帯のロール面側の
３Ｃｆから９σまでの（１１０）面の極点図、第６図は
、不純物ガス濃度とＸ線回析により求めた（１１０）面
と（２００）面との割合を示す図、第７図は、不純物ガ
ス濃度と保磁力（Ｏｅ）との関係を示す図である。
１・・・高周波コイル、２°・・ノズル、３・・・ロー
ル、４・・・ノズル口、５・・・超急冷によってできた
薄帯、６・・・溶融体。
ｊＩＩ図
第６図
□ ｐｐｍ
第７図
手続補正書（）試）
４１人１１１１＋Ｌ、ｉ：Ａ１１
円
昭和５７年 ２ＪｊＢ Ｆ＋
特許庁長官 島 ＩＢ 春 樹 殿
１、 １ｊ件の表示 特願昭、６−□２４００３号
・１１件との関係 出願人
ＩＩ ｐｌｒ 大阪府門真市大字門真」００
６番地？、 ４゛１． （５８２）松下電器産業
株式会社代入と 山 下 俊 彦
市話０３ （４３１） ８１１１番（代表）５、手続補
正指令書の１１付
昭和５７年 １月 ５［１（発送日昭和５７年１月２６
Ｅｌ ）（１）明細書第５頁第７行［第２図（ａ）
、 （ｂｌ Ｊ １５「第２図（イ）、（ロ）」と訂正
する。
（２）同第１１行［第：３図（ａ）、 （ｂ） Ｊ （
ｉ； ｒ第３図（４）。
（ロ）」と訂１１：、する。
（３） 同第１５行［第１図（ａ） 、 （ｂ） Ｊを
１第１図（１）。
（ロ）」と訂１１−する。
（１） 同第１９行［第５図（ａ） 、 （ｂ） Ｊ
を「第５図（イ）。
（ロ）」と訂１１する。
（５） 同第６頁第７行「第２図（ａ）」を「第２図
（ｆ）」と訂正する。
（６）同第１１行「第２図（ｂ）」を「第２図（ＩＪ）
」と訂正する。
（７）同第１４行「第３図（ａ）」を１第３図（ｆ）」
と訂正する。
（８） 同第１８行「第３図（ｂ）」を「第３図（”
ｌ Ｊと訂正する。
（９） 同第２０行「第４図（ａ）」を［第１図（イ
）（と訂Ｉ卜する。
（ｌＯ）同第７頁第２行「第４図（ｂ）」を［第１図（
１ｊ）Ｊと訂ｌＩ−する。
２−
（１１）同第４行「第５図（ａ）」を「第５図（イ）」
と訂Ｉ卜する。
（１２）同第６行「第５図山）」を「第５図（ロ）」と
訂＋Ｆ、する。
以 上
手続補正書（自制
収入印紙金額
円
昭和５７年ｌＯ月？、２日
特許庁長官 若 杉 和 夫 殿
１、事１′１０表小
特願昭５６−１２４００３号
２、！１Ｊ４（７）名称 。、。。、＜。１、＞１工、
ケイ１オｈａｒ ｆ−Ｊｏえゎ１．□３、 ｈｌｉ正を
する者
・１１件との関係 出願人
住 所 大阪府門真市大字門真１００６番地名
称 （５８２）松下電器産業株式会社代表茜
山 下 俊 彦４、代理人〒１０
５
電活０３ （４３１） ８１１１番（代表）５、補＋Ｉ
（により増加する発明の数 ０（２、特許請求の範囲
を％ｌＩｉの通り訂正する。
に３） 明細書の次表の通り訂正する。
（４）第７図を別紙の通り訂正する（文字の追加）。
以 上
特許請求の範囲を記載した書面
特許請求の範囲
（リ 珪素５０〜８０重門チを含４ｊシ、残部が実質的
に鉄からなり、かつ薄帯の厚みツノ向に＜ ＋ □ ｏ
：’−・）１位が配向すると共に薄帯の長手方向にく
（月１〉力（Ｉ’ｔが配向ルた集合組織を有することを
特徴とする高珪素鋼薄帯において、超急伶法で作製直後
の、＋７＋）１素鋼薄帯をアルゴンガス、窒素ガス、水
素カスの（０１１）集合組織を有する高珪素鋼薄帯。
（２） アルゴンガス、窒素ガス、水素ガス中に含ま
れる、酸素、硫化水素、水蒸気などの不純物ガスが、ｌ
ｐｐｍ以上５００１’ｐｍ以下であることを特徴とす
る雰囲気中で熱焼鈍したことを特徴とする特許請求の範
囲第（１）項記載の高珪素鋼薄帯。It is a pole figure at 9σ1 from the (200) plane on the roll surface side of the ribbon produced by the weight-related liquid ultra-quenching method, R,
D indicates the roll direction, T and D indicate the vertical direction above the roll, and FIG.
．． Figure 3 is a pole figure from 3C to 9σ of the (llO) plane on the roll side of the ribbon produced by the liquid ultra-quenching method with a weight factor of 5816.5 (al is Fe93.5 as described in Example 1).
Si6. The thin strip made by the liquid quenching method of s weight section is 1
Pole figure of the (200) plane from po to 9Cf' on the roll surface side of the ribbon when heat treated at 050°C for 30 minutes in an argon atmosphere, Figure 3 similar to fbl, the ribbon heat treated in Example 1 (j 10 on the roll surface side from 3(f' to 9(f')
) surface, Figure 4 (al is # described in Example 2)
(200) from σ to 9(f) of the roll surface 11i of 弗
Pole figure of the plane, FIG. 4 (bl is the pole figure of the (1-10) plane at 90'-i from 3 points on the roll surface side of the ribbon described in Example 2, FIG. 5 (at is , the pole figure of the (200) plane at 9Cf't from σ on the roll surface side of the ribbon described in Example 3,
Figure 5 fbl is the pole figure of the (110) plane from 3Cf to 9σ on the roll surface side of the ribbon described in Example 3, and Figure 6 is the (110) plane determined by impurity gas concentration and X-ray diffraction. ) plane and the (200) plane, and FIG. 7 is a diagram showing the relationship between impurity gas concentration and coercive force (Oe). DESCRIPTION OF SYMBOLS 1... High frequency coil, 2°... Nozzle, 3... Roll, 4... Nozzle opening, 5... Thin ribbon made by ultra-quenching, 6... Molten material. Figure jII Figure 6 □ ppm Figure 7 Procedural amendment (test) 41 people 1111+L, i: A11 Yen 1982 2JjB F+ Commissioner of the Patent Office Shima IB Haruki Tono 1, Display of 1j Patent application 1986, 6- □Relationship with No. 24003/11 Applicant II plr Oaza Kadoma, Kadoma City, Osaka Prefecture 00
Number 6? , 4゛1. (582) Assignment of Matsushita Electric Industrial Co., Ltd. and Toshihiko Yamashita City Story 03 (431) No. 8111 (Representative) 5, Procedural Amendment Order dated 11 January 1982 [1 (Shipping date January 1988) 26
El) (1) Page 5, line 7 of the specification [Figure 2 (a)
, (bl J 15 “Figure 2 (a), (b)” is corrected. (2) Same line 11 [Figure 3 (a), (b) J (
i; rFigure 3 (4). (b)” Correction 11:. (3) Line 15 [Figure 1 (a), (b) J to 1 Figure 1 (1). (b)” and amended 11-. (1) Line 19 [Figure 5 (a), (b) J
is revised to ``Figure 5 (a). (b)''11. (5) On page 6, line 7, ``Figure 2 (a)'' is corrected to ``Figure 2 (f)''. (6) Line 11, “Figure 2 (b)” is changed to “Figure 2 (IJ)”
” he corrected. (7) Line 14 “Figure 3 (a)” to 1 “Figure 3 (f)”
I am corrected. (8) Line 18, “Figure 3 (b)” is changed to “Figure 3 (”
l Correct it as J. (9) ``Figure 4 (a)'' on line 20 of the same page should be revised to ``Figure 4 (b)'' on line 2 of page 7 of the same page. Figure 1 (
1j) Revised as J. 2- (11) Change the 4th line “Figure 5 (a)” to “Figure 5 (a)”
I am correcting this. (12) Correct +F the 6th line of the same line, ``Figure 5 Mountain)'' to ``Figure 5 (B)''. Written amendment to the above procedure (self-imposed revenue stamp amount Yen 10 month 1980?, 2nd Japan Patent Office Commissioner Kazuo Wakasugi 1, Matter 1'10 Small Patent Application No. 1983-124003 2, !1J4 (7) Name .,...,<.1,>1 engineering,
Kei1ohar f-Joewa1. □3. Relationship with 11 cases of hli correction Applicant Address 1006 Oaza Kadoma, Kadoma City, Osaka Name (582) Akane, Representative of Matsushita Electric Industrial Co., Ltd.
Toshihiko Yamashita 4, agent 〒10
5 Denkatsu 03 (431) No. 8111 (Representative) 5, Supplementary + I
(Number of inventions increased by 0 (2) The claims are corrected as per %lIi. 3) The specification is corrected as shown in the following table. (4) Figure 7 is corrected as shown in the attached sheet (letters (addition of 4j. + □ o
:'-・) In a high-silicon steel ribbon characterized by having a texture in which the 1-position is oriented and the longitudinal direction of the ribbon is oriented, A high-silicon steel ribbon having a (011) texture of argon gas, nitrogen gas, and hydrogen scum is obtained by converting +7+)1 raw steel ribbon immediately after production by the method. (2) Contained in argon gas, nitrogen gas, and hydrogen gas. Impurity gases such as oxygen, hydrogen sulfide, and water vapor
The high-silicon steel ribbon according to claim 1, which is thermally annealed in an atmosphere having a concentration of ppm or more and 5001'pm or less.
Claims (4)
に鉄からなり、かつ薄帯の厚み方向に（１００＞方位が
配向すると共に薄帯の長手方向に〈Ｏｌｌ〉力位が配向
した集合組織を有することを特徴とする高珪素鋼薄帯。(1) Contains 5.0 to 80% silicon by weight, the remainder is substantially made of iron, and the (100> direction is oriented in the thickness direction of the ribbon, and the <Oll> force position is oriented in the longitudinal direction of the ribbon. 1. A high-silicon steel ribbon characterized by having an oriented texture.
６００℃以上の温度で熱焼鈍されていることを特徴とす
る特許請求の範囲第（１）項記載の高珪素鋼薄帯。(2) The high-silicon steel ribbon according to claim (1), wherein the high-silicon copper ribbon is thermally annealed at a temperature of 600° C. or higher in a non-oxidizing atmosphere.
する特許請求の範囲第（２）項記載の高珪素鋼動帯。(3) The high-silicon steel moving belt according to claim (2), wherein the non-oxidizing atmosphere is at least one of argon gas, nitrogen gas, and hydrogen.
素ガス、水素ガス中に含まれる、酸素、硫化水素、水蒸
気などの不純物ガスが、ｌｐｐｍ以上５００ ｐｐｍ以
下であることを特徴とする雰囲気中で熱焼鈍しだことを
特徴とする特許請求の範囲第（３）項記載の高珪素鋼薄
帯。(4) In an atmosphere characterized in that impurity gases such as oxygen, hydrogen sulfide, and water vapor contained in the non-oxidizing atmosphere such as argon gas, nitrogen gas, and hydrogen gas are 1 ppm or more and 500 ppm or less. The high silicon steel ribbon according to claim (3), characterized in that it is thermally annealed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56124003A JPS5845349A (en) | 1981-08-10 | 1981-08-10 | Thin strip of high-silicon steel having (100)<011> aggregated texture |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56124003A JPS5845349A (en) | 1981-08-10 | 1981-08-10 | Thin strip of high-silicon steel having (100)<011> aggregated texture |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5845349A true JPS5845349A (en) | 1983-03-16 |
| JPS646250B2 JPS646250B2 (en) | 1989-02-02 |
Family
ID=14874625
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56124003A Granted JPS5845349A (en) | 1981-08-10 | 1981-08-10 | Thin strip of high-silicon steel having (100)<011> aggregated texture |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5845349A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6326330A (en) * | 1986-07-18 | 1988-02-03 | Nippon Kokan Kk <Nkk> | Chemical vapor deposition treatment |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5541951A (en) * | 1978-09-19 | 1980-03-25 | Noboru Tsuya | Thin strip of silicon iron and its manufacture |
| JPS5550431A (en) * | 1978-10-05 | 1980-04-12 | Armco Steel Corp | Annealing of silicon steel oriented to cube * on * edge after decarburization |
| JPS563625A (en) * | 1979-06-23 | 1981-01-14 | Noboru Tsuya | Thin sheet of high silicon steel nondirectional in (100) plane and very low in coercive force and its manufacture |
| JPS5794519A (en) * | 1980-12-05 | 1982-06-12 | Kawasaki Steel Corp | Method for manufacturing strip of silicon steel having excellent soft magnetic characteristics |
| JPS5822357A (en) * | 1981-07-31 | 1983-02-09 | Matsushita Electric Ind Co Ltd | High silicon steel thin strip having (100)<011> aggregated structure |
-
1981
- 1981-08-10 JP JP56124003A patent/JPS5845349A/en active Granted
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5541951A (en) * | 1978-09-19 | 1980-03-25 | Noboru Tsuya | Thin strip of silicon iron and its manufacture |
| JPS5550431A (en) * | 1978-10-05 | 1980-04-12 | Armco Steel Corp | Annealing of silicon steel oriented to cube * on * edge after decarburization |
| JPS563625A (en) * | 1979-06-23 | 1981-01-14 | Noboru Tsuya | Thin sheet of high silicon steel nondirectional in (100) plane and very low in coercive force and its manufacture |
| JPS5794519A (en) * | 1980-12-05 | 1982-06-12 | Kawasaki Steel Corp | Method for manufacturing strip of silicon steel having excellent soft magnetic characteristics |
| JPS5822357A (en) * | 1981-07-31 | 1983-02-09 | Matsushita Electric Ind Co Ltd | High silicon steel thin strip having (100)<011> aggregated structure |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6326330A (en) * | 1986-07-18 | 1988-02-03 | Nippon Kokan Kk <Nkk> | Chemical vapor deposition treatment |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS646250B2 (en) | 1989-02-02 |
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