JPS5845089B2 - Method for producing protective film on magnetic disks - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for producing a protective film on a magnetic disk used as a storage medium of a magnetic disk device.

In recent years, due to the trend towards higher density magnetic disk drives, the contact start-stop type (hereinafter referred to as "contact start-stop" type), in which the magnetic disk and magnetic head are in contact when not in operation, and the magnetic head floats due to the action of airflow caused by the rotation of the magnetic disk when in operation C1
It is called S, S type.

) magnetic heads are being used.

When using a C, S, or S type magnetic head, the surface of the protective coating on the magnetic disk is made to have unevenness in order to prevent the magnetic head from adhering to the disk and maintain a good lubrication effect over a long period of time. However, since the protective film is extremely thin, it is difficult to process it.

In view of the above circumstances, the present invention uses a magnetic disk with only a magnetic layer formed on its surface as an anode, and generates sputtering by glow discharge between the anode and a cathode made of a protective film material, and also forms a large number of holes. A method for forming a protective film on a magnetic disk is provided, in which a protective film having a large number of irregularities on the surface can be formed on the magnetic layer of the magnetic disk by appropriately inserting a mask between the cathode and the magnetic disk. The purpose is to

Hereinafter, the present invention will be specifically explained based on an embodiment shown in the drawings.

As shown in FIG. 1, the sputtering apparatus 1 has a casing 2 in which a gas such as argon is sealed and sealed. A cathode 3 is provided.

A magnetic disk 5 on which a protective film is not formed is installed as an anode at a position facing the cathode 3, and the magnetic disk 5 is connected to an aluminum substrate 5 as shown in FIG.
A magnetic layer 5b is formed on a.

Between the cathode 3 and the disk 5, as shown in FIG.
A mask 6 is installed so as to be able to move forward and backward, and is formed into a mesh shape and has a large number of holes 6a formed therethrough.

Since the sputtering apparatus 1 has the above configuration, in order to form a protective film on the surface of the magnetic disk 50 using the apparatus 1, first, as shown in FIG. A DC voltage is applied between 5 and 5.

Then, glow discharge occurs in the housing 2, and metal molecules such as silicon dioxide, alumina, etc. of the cathode 3 are attracted and attached to the disk 5, which is the anode, by sputtering.

At this time, due to the presence of the mask 6, some of the metal molecules attracted to the disk 5 adhere to the mask 6 with their path blocked, and the rest pass through the hole 6a of the mask 6 as shown by the arrow. , are attracted to the disk 5 in a pattern that is almost the same as the arrangement pattern of the holes 6a of the mask 6.

By continuing the discharge in this state, a protective film 5e is formed on the magnetic layer 5b of the disk 5, as shown in FIGS. It is formed.

When a lubricant is applied to the disk 5 on which the protective film 5e having many irregularities is formed in this manner, the lubricant permeates into the recesses 5d of the protective film 5e.

In addition, in the above-mentioned embodiment, the case was described in which the mask 6 was used from the beginning of sputtering by glow discharge, but the mask 6 does not necessarily have to be used from the beginning of sputtering.
In the initial stage of sputtering, the mask 6 is not used, but after a uniform protective film 5e of a certain thickness is formed on the surface of the magnetic layer 5b, the mask 6 is inserted between the cathode 3 and the disk 50, as shown in FIG. Of course, the convex portion 5c and the concave portion 5d may be formed.

It is also possible, of course, to form the recesses 5d by chemical etching after forming the protective film 5e to a uniform thickness on the magnetic layer 5b of the magnetic disk 5.

As explained above, according to the present invention, the protective film 5e having many irregularities on the surface can be easily formed on the magnetic layer 5b of the magnetic disk 5 by sputtering using the mask 6. , S, not only can prevent the S type magnetic head from adhering to the disk 5, but also can maintain the lubricating effect of the lubricant in a good state over a long period of time by impregnating the recess 5d with the lubricant. Then,
A high-performance magnetic disk 5 can be provided.

[Brief explanation of the drawing]

FIG. 1 is a schematic front view showing an embodiment of a sputtering apparatus to which the present invention is applied; FIG. 2 is a partially enlarged side sectional view showing a magnetic disk on which a protective film is formed according to an embodiment of the present invention; 3 is an enlarged plan view of the protective film shown in FIG. 2, and FIG. 4 is a partially enlarged side sectional view showing a magnetic disk on which a protective film is formed according to another embodiment of the present invention.・Cathode, 5...Magnetic disk, 5
b...magnetic layer, 5c...convex portion, 5d...
...Concavity, 5e...Protective film, 6...
...Mask, 6a...hole.

Claims (1)

[Claims] 1 Using a magnetic disk with only a magnetic layer formed on its surface as an anode, sputtering is caused by glow discharge between the anode and a cathode made of a protective film material, and a mask with a large number of holes is connected between the cathode and the magnetic disk. A method for forming a protective film on a magnetic disk, the method comprising forming a protective film having a large number of irregularities on the surface on the magnetic layer of the magnetic disk by appropriately inserting the protective film between the magnetic disks.