JPS5842786A - Electrodeposition of tin-lead alloy - Google Patents
Electrodeposition of tin-lead alloyInfo
- Publication number
- JPS5842786A JPS5842786A JP57147498A JP14749882A JPS5842786A JP S5842786 A JPS5842786 A JP S5842786A JP 57147498 A JP57147498 A JP 57147498A JP 14749882 A JP14749882 A JP 14749882A JP S5842786 A JPS5842786 A JP S5842786A
- Authority
- JP
- Japan
- Prior art keywords
- lead
- tin
- bath
- acid
- electroplating bath
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910001174 tin-lead alloy Inorganic materials 0.000 title claims description 16
- 238000004070 electrodeposition Methods 0.000 title claims 2
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical group O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 claims description 55
- 238000007747 plating Methods 0.000 claims description 34
- -1 fluoroboric acid tin salt Chemical class 0.000 claims description 28
- 239000002253 acid Substances 0.000 claims description 19
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 claims description 19
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 17
- 238000009713 electroplating Methods 0.000 claims description 14
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 12
- 229910052802 copper Inorganic materials 0.000 claims description 12
- 239000010949 copper Substances 0.000 claims description 12
- 150000003839 salts Chemical class 0.000 claims description 12
- RILZRCJGXSFXNE-UHFFFAOYSA-N 2-[4-(trifluoromethoxy)phenyl]ethanol Chemical compound OCCC1=CC=C(OC(F)(F)F)C=C1 RILZRCJGXSFXNE-UHFFFAOYSA-N 0.000 claims description 11
- 239000000203 mixture Substances 0.000 claims description 11
- 150000003934 aromatic aldehydes Chemical class 0.000 claims description 10
- LQBJWKCYZGMFEV-UHFFFAOYSA-N lead tin Chemical compound [Sn].[Pb] LQBJWKCYZGMFEV-UHFFFAOYSA-N 0.000 claims description 10
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical group COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 claims description 9
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 claims description 9
- 239000004327 boric acid Substances 0.000 claims description 9
- 235000019253 formic acid Nutrition 0.000 claims description 9
- 239000004615 ingredient Substances 0.000 claims description 9
- 239000002736 nonionic surfactant Substances 0.000 claims description 9
- 150000004982 aromatic amines Chemical class 0.000 claims description 8
- 239000002184 metal Substances 0.000 claims description 8
- 229910052751 metal Inorganic materials 0.000 claims description 8
- 238000000034 method Methods 0.000 claims description 7
- 150000001299 aldehydes Chemical class 0.000 claims description 6
- 229920000259 polyoxyethylene lauryl ether Polymers 0.000 claims description 6
- 229910052703 rhodium Inorganic materials 0.000 claims description 6
- 239000010948 rhodium Substances 0.000 claims description 6
- KBPLFHHGFOOTCA-UHFFFAOYSA-N 1-Octanol Chemical group CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 claims description 5
- 229910045601 alloy Inorganic materials 0.000 claims description 4
- 239000000956 alloy Substances 0.000 claims description 4
- 239000002518 antifoaming agent Substances 0.000 claims description 4
- 239000002245 particle Substances 0.000 claims description 4
- 125000001931 aliphatic group Chemical group 0.000 claims description 2
- 239000000758 substrate Substances 0.000 claims description 2
- 229910021626 Tin(II) chloride Inorganic materials 0.000 claims 2
- 241000255925 Diptera Species 0.000 claims 1
- 238000005275 alloying Methods 0.000 claims 1
- 239000004071 soot Substances 0.000 description 7
- 238000000576 coating method Methods 0.000 description 6
- 239000000654 additive Substances 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 4
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 229910000978 Pb alloy Inorganic materials 0.000 description 4
- 150000007513 acids Chemical class 0.000 description 4
- 150000001450 anions Chemical class 0.000 description 4
- 239000003963 antioxidant agent Substances 0.000 description 4
- 239000004744 fabric Substances 0.000 description 4
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- 239000006260 foam Substances 0.000 description 3
- 239000004094 surface-active agent Substances 0.000 description 3
- WHOZNOZYMBRCBL-OUKQBFOZSA-N (2E)-2-Tetradecenal Chemical compound CCCCCCCCCCC\C=C\C=O WHOZNOZYMBRCBL-OUKQBFOZSA-N 0.000 description 2
- SQAINHDHICKHLX-UHFFFAOYSA-N 1-naphthaldehyde Chemical group C1=CC=C2C(C=O)=CC=CC2=C1 SQAINHDHICKHLX-UHFFFAOYSA-N 0.000 description 2
- HIXDQWDOVZUNNA-UHFFFAOYSA-N 2-(3,4-dimethoxyphenyl)-5-hydroxy-7-methoxychromen-4-one Chemical compound C=1C(OC)=CC(O)=C(C(C=2)=O)C=1OC=2C1=CC=C(OC)C(OC)=C1 HIXDQWDOVZUNNA-UHFFFAOYSA-N 0.000 description 2
- JJYPMNFTHPTTDI-UHFFFAOYSA-N 3-methylaniline Chemical compound CC1=CC=CC(N)=C1 JJYPMNFTHPTTDI-UHFFFAOYSA-N 0.000 description 2
- ZTQSAGDEMFDKMZ-UHFFFAOYSA-N Butyraldehyde Chemical compound CCCC=O ZTQSAGDEMFDKMZ-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 125000000129 anionic group Chemical group 0.000 description 2
- 230000003078 antioxidant effect Effects 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005187 foaming Methods 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 231100000989 no adverse effect Toxicity 0.000 description 2
- RZXMPPFPUUCRFN-UHFFFAOYSA-N p-toluidine Chemical compound CC1=CC=C(N)C=C1 RZXMPPFPUUCRFN-UHFFFAOYSA-N 0.000 description 2
- 229940044654 phenolsulfonic acid Drugs 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- AKCRQHGQIJBRMN-UHFFFAOYSA-N 2-chloroaniline Chemical compound NC1=CC=CC=C1Cl AKCRQHGQIJBRMN-UHFFFAOYSA-N 0.000 description 1
- NTCCNERMXRIPTR-UHFFFAOYSA-N 2-hydroxy-1-naphthaldehyde Chemical compound C1=CC=CC2=C(C=O)C(O)=CC=C21 NTCCNERMXRIPTR-UHFFFAOYSA-N 0.000 description 1
- AXZKCQSGDARVRL-UHFFFAOYSA-N 2-hydroxy-5-methylbenzenesulfonic acid Chemical compound CC1=CC=C(O)C(S(O)(=O)=O)=C1 AXZKCQSGDARVRL-UHFFFAOYSA-N 0.000 description 1
- YIQGLTKAOHRZOL-UHFFFAOYSA-N 2-methoxynaphthalene-1-carbaldehyde Chemical compound C1=CC=CC2=C(C=O)C(OC)=CC=C21 YIQGLTKAOHRZOL-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- 229910000851 Alloy steel Inorganic materials 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- 229910001369 Brass Inorganic materials 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- AFBPFSWMIHJQDM-UHFFFAOYSA-N N-methyl-N-phenylamine Natural products CNC1=CC=CC=C1 AFBPFSWMIHJQDM-UHFFFAOYSA-N 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- NBBJYMSMWIIQGU-UHFFFAOYSA-N Propionic aldehyde Chemical compound CCC=O NBBJYMSMWIIQGU-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- 150000001491 aromatic compounds Chemical class 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 239000008139 complexing agent Substances 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- MLUCVPSAIODCQM-NSCUHMNNSA-N crotonaldehyde Chemical compound C\C=C\C=O MLUCVPSAIODCQM-NSCUHMNNSA-N 0.000 description 1
- MLUCVPSAIODCQM-UHFFFAOYSA-N crotonaldehyde Natural products CC=CC=O MLUCVPSAIODCQM-UHFFFAOYSA-N 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- 230000008034 disappearance Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 150000002192 fatty aldehydes Chemical class 0.000 description 1
- 239000000796 flavoring agent Substances 0.000 description 1
- 235000019634 flavors Nutrition 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- DOUHZFSGSXMPIE-UHFFFAOYSA-N hydroxidooxidosulfur(.) Chemical compound [O]SO DOUHZFSGSXMPIE-UHFFFAOYSA-N 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 150000002611 lead compounds Chemical class 0.000 description 1
- 230000001050 lubricating effect Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- FPSTYXLUOFPGNZ-UHFFFAOYSA-N n-chloro-n-fluoroaniline Chemical compound FN(Cl)C1=CC=CC=C1 FPSTYXLUOFPGNZ-UHFFFAOYSA-N 0.000 description 1
- KUDPGZONDFORKU-UHFFFAOYSA-N n-chloroaniline Chemical compound ClNC1=CC=CC=C1 KUDPGZONDFORKU-UHFFFAOYSA-N 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 229940044652 phenolsulfonate Drugs 0.000 description 1
- 239000002574 poison Substances 0.000 description 1
- 231100000614 poison Toxicity 0.000 description 1
- 229920000151 polyglycol Polymers 0.000 description 1
- 239000010695 polyglycol Substances 0.000 description 1
- 229920000056 polyoxyethylene ether Polymers 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 150000003458 sulfonic acid derivatives Chemical class 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- 229910002058 ternary alloy Inorganic materials 0.000 description 1
- 150000003606 tin compounds Chemical group 0.000 description 1
- HGBOYTHUEUWSSQ-UHFFFAOYSA-N valeric aldehyde Natural products CCCCC=O HGBOYTHUEUWSSQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/60—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of tin
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
本発明は種々の生地上へすず一鉛合金を析出せしめるた
めの改良めっき浴に関する。特に本発明は塩類と相溶性
の酸すなわちフッ化ホウ素酸と共に、フッ化ホウ素酸す
ずI)とフッ化ホウ酸鉛(1)のような浴可溶性のすず
塩及び鉛塩を特殊添加剤と共に浴成分として用いた改良
浴から光沢のおる金属性のすず一鉛合金を析出せしめる
ことに関する。DETAILED DESCRIPTION OF THE INVENTION This invention relates to an improved plating bath for depositing tin-lead alloys onto various substrates. In particular, the present invention uses salt-compatible acids, namely fluoroboric acid, as well as bath-soluble tin and lead salts such as tin fluoroborate I) and lead fluoroborate (1), together with special additives. This invention relates to the precipitation of a bright metallic tin-lead alloy from a modified bath used as a component.
すず−鉛合金めっき浴及びめっき方法に関する先行特許
は多数みられる。そのうち本発明と関連が深いものは米
国特許第3,730,853号;同第3.749,64
9号;同第3,769,182号;同第3,785,9
39号;同第3.850 、765号;同第3,875
,029号;同第3,905,878号;同第3,92
6,749号;同第3,954,573号;同第3,9
56,123号;同第3,977.949号;同第4,
000,047号;同第4,135,991号;同第4
,118,289号;及び英国特許第1,351,87
5号と同第1,408,148号である。There are many prior patents related to tin-lead alloy plating baths and plating methods. Among these, those closely related to the present invention are U.S. Patent Nos. 3,730,853 and 3.749,64.
No. 9; No. 3,769,182; No. 3,785,9
No. 39; No. 3.850, No. 765; No. 3,875
, No. 029; No. 3,905,878; No. 3,92
No. 6,749; No. 3,954,573; No. 3,9
No. 56,123; No. 3,977.949; No. 4,
No. 000,047; No. 4,135,991; No. 4
, 118,289; and British Patent No. 1,351,87.
No. 5 and No. 1,408,148.
このように多数の文献がらり、かつ多くの浴組成が提案
されているにも拘らず、光沢がらり金属質のすず一鉛合
金めつ1!ヲ種々の生地上へ効率良く析出せしめるため
の浴についてはなお改良の余地がある。他の重II[な
特性は高速めつき性とレベリング性である。従来から提
案されてきたすず− −鉛合金浴組成の多くのものが、
浴の調製に用いる総ての成分はめつき光沢だけでなく前
記のような他の特性についても同時に考慮を払う必要が
おることt示している。Despite the large number of literature and the proposed bath compositions, only one tin-lead alloy with a bright metallic appearance has been found! There is still room for improvement in baths for efficient deposition on various fabrics. Other important properties are high-speed plating and leveling properties. Many of the tin--lead alloy bath compositions that have been proposed so far are
All of the ingredients used in the preparation of the baths indicate that consideration must be given not only to the plating gloss but also to other properties such as those mentioned above.
本発明の目的の一つは各種の生地上に光沢性のすず一鉛
合金を析出せしめうるめつき浴の提供におる。One of the objects of the present invention is to provide a lubricating bath that deposits a bright tin-lead alloy on various fabrics.
本発明の他の目的は比較的高速においても、なおかつ改
良せられた光沢を有する丁ず一鉛合金めっきが得られる
電気めっき浴の提供にある。Another object of the present invention is to provide an electroplating bath which produces single-lead alloy plating with improved gloss even at relatively high speeds.
本発明のさらにその他の目的に改良せられたレベリング
性t−有する丁ず一鉛合金めつ′きt生成せしめうる電
名めっき浴の提供にある。Still another object of the present invention is to provide a plating bath capable of producing a lead alloy plating having improved leveling properties.
この発明のさらに多くの目的は、次の記載と実施例とを
理解することにより自明となるはずでめる。Further objects of the invention will become apparent from the following description and examples.
この発明によれば可溶性すず塩と鉛塩ならびにこれらと
相溶性の酸と共に特殊な添加剤を組み合わせたものを使
用すると改良めっき浴が得られることが分った。この発
明によるめっき浴は各種の生地上に光沢のおる金属性の
すず一鉛合金を高速にて析出させることができる。In accordance with this invention, it has been discovered that an improved plating bath can be obtained by using a combination of soluble tin and lead salts and their compatible acids with special additives. The plating bath according to the present invention can deposit a shiny metallic tin-lead alloy on various types of fabrics at high speed.
浴への添加物の必要な組み合せは、芳香族アζン光沢剤
、芳香族アルデヒド光沢剤、脂肪アルデヒド光沢剤及び
非イオン性界面性剤系粒子リファイナーでらる。The required combination of additives to the bath includes an aromatic amine brightener, an aromatic aldehyde brightener, a fatty aldehyde brightener, and a nonionic surfactant-based particle refiner.
この発明の他の提案によれば、このめっき浴からすず及
び鉛と共に銅もしくにロジウム金属を三元合金の形で効
果的に共析することができる。According to another proposal of the invention, it is possible to effectively eutectoid copper or rhodium metal together with tin and lead in the form of a ternary alloy from this plating bath.
この発明のめつき浴は、好ましくは同じアニオン會有し
、特に好ましくは7ツ化ホウ酸すず及びフッ化ホウ酸鉛
のような浴可溶性の形の2価のすず及び鉛化合物音用い
て調製する。7ツ化ホウ酸丁ず及びフッ化ホウ酸鉛を使
用するときにはこれらに相溶性の酸、特に好ましくはフ
ッ化ホウ素酸會十分な量だけ共存させて導電性を付与し
、また金属塩類の溶解度を維持せしめる。浴中のすすと
鉛の量は所望の丁ず一鉛合金を効果的に析出せしめるの
に少なくとも十分な量ないしは浴への最大溶解度以下で
ある。The plating baths of this invention are prepared using divalent tin and lead compounds preferably having the same anionic association and particularly preferably in bath soluble form such as tin heptoborate and lead fluoroborate. do. When using heptoboric acid and lead fluoroborate, a compatible acid, particularly preferably fluoroboric acid, is allowed to coexist with them in a sufficient amount to impart conductivity, and to improve the solubility of the metal salts. be maintained. The amount of soot and lead in the bath is at least sufficient to effectively precipitate the desired single-lead alloy or less than its maximum solubility in the bath.
塩化物、スルファイン酸塩、フェノールスルホネート及
びその他のような他の浴可溶性2価すず塩ならびに2・
価鉛塩奄またこの発明の浴の調製に使用しうる。異種の
アニオンt−Vするすず塩及び鉛塩でも使用は可能であ
るが、同種アニオンを有する塩類の使用が好ましい。更
に、塩化水素酸、スルファミノ酸、フェノールスルホン
酸及びその他の工すな他の相溶性酸類もま几フッ化ホウ
素酸の代りに、またはフッ化ホウ素酸と共に使用しうる
。使用する酸はすず塩及び鉛塩のそれとに異なったアニ
オン金持つこともできるが、同じアニオンであることが
好ましい。しかしながら、最も好ましい実施態様ではす
ず及び鉛のフッ化ホウ酸塩がフッ化ホウ素酸と共に用い
られる。Other bath-soluble divalent tin salts such as chloride, sulfinate, phenolsulfonate and others as well as
Lead salts may also be used in preparing the baths of this invention. Although it is possible to use tin salts and lead salts having different types of anions, it is preferable to use salts having the same type of anion. Additionally, other compatible acids such as hydrochloric acid, sulfamino acid, phenolsulfonic acid, and others may be used in place of or in conjunction with the fluoroboric acid. The acids used can have different anions than those of the tin and lead salts, but preferably the same anion. However, in the most preferred embodiment, tin and lead fluoroborates are used with fluoroboric acid.
この発明における光沢剤組成物に芳香族−itン、芳香
族アルデヒド及び脂肪族アルデヒドの組み合わせである
。これら光沢剤のそれぞれの含有量は少なくともすず一
鉛合金めっきに光沢金付毒するのに十分な量ないしは浴
中へのそれぞれの最大溶解度以下でおる。当該光沢剤組
成物においての芳香族アオン対芳香族アルデヒドの重量
比t!1.25:1ないし100 : 1以内、特に好
ましくは約5:秦ないし20 : 1の範囲以内でおる
。The brightener composition of this invention is a combination of an aromatic compound, an aromatic aldehyde, and an aliphatic aldehyde. The content of each of these brighteners is at least sufficient to poison the tin-lead alloy plating, or is below their respective maximum solubility in the bath. The weight ratio of aromatic aons to aromatic aldehydes in the brightener composition is t! It is within the range of 1.25:1 to 100:1, particularly preferably within the range of about 5:1 to 20:1.
この発明の目め達成に対して有用な芳香族アミンもしく
にアリルアミンにho−トルイジン、p−トルイジン、
m−トルイジン、アニリン及び0−クロルアニリンが包
含せられる。殆どの目的で灯〇−クロルアニリンの使用
が特に好ましい。例えば芳香族アルデヒドににl−す7
Jルデヒド、2−ヒドロキシ−1−ナフタルデヒド、2
−メトキシ−1−ナフタルデヒド及びその他が包含せら
れる。Aromatic amines or allyl amines useful in achieving the aims of this invention include ho-toluidine, p-toluidine,
Included are m-toluidine, aniline and 0-chloroaniline. The use of fluoro-chloroaniline is particularly preferred for most purposes. For example, in aromatic aldehydes,
J Rudehyde, 2-hydroxy-1-naphthaldehyde, 2
-methoxy-1-naphthaldehyde and others.
このうちで好ましい芳香族アルデヒドは1−ナフタルデ
ヒドでおる。好ましい脂肪族アルデヒドは炭素数1ない
し4のもので、例えばホルムアルデヒド、アセトアルデ
ヒド、プロピルアルデヒド、ブチルアルデヒド、クロト
ンアルデヒド及びその他が包含せられる。仁の発明にお
ける好ましいアルデヒドはホルムアルデヒドであるが、
ホルムアルデヒドを37重量%含有するホルマリンを使
用すると便利である。Among these, the preferred aromatic aldehyde is 1-naphthaldehyde. Preferred aliphatic aldehydes have 1 to 4 carbon atoms and include, for example, formaldehyde, acetaldehyde, propylaldehyde, butyraldehyde, crotonaldehyde, and others. The preferred aldehyde in Jin's invention is formaldehyde,
Conveniently, formalin containing 37% by weight formaldehyde is used.
粒子す7アイナーとしての非イオン性界面活性剤の添加
もまた必要で多る。この含有量はすず一鉛合金めっきの
粒子に緻密性全付与するのに十分な量ないしは浴への最
大溶解度以下である。The addition of nonionic surfactants as particulate additives is also often necessary. This content is sufficient to impart complete density to the tin-lead alloy plating particles, or is below the maximum solubility in the bath.
好ましi非イオン性界面活性剤は市販のものであって、
例えばノニルフェノキシポリエチレンオキサイドxaノ
ール(工pepa1o 0630及びTritoBQS
15 、商標名);ヱトキシアルキロールアミド(、
Am1lox L5及び03.商標名);アルキルポリ
グリコールエーテルエチレンオキサイ) (N5utr
onyx675、商標名)及びその他である。この発明
において最も効果がある非イオン性界面活性剤灯、その
アルキレン基中の炭素数が2ないし2oであるポリオキ
シアルキレンエーテルである。Preferably the nonionic surfactant is a commercially available one,
For example, nonylphenoxy polyethylene oxide
15, trade name); ethoxyalkylolamide (,
Am1lox L5 and 03. Trade name); Alkyl polyglycol ether ethylene oxy) (N5utr
onyx675 (trade name) and others. The most effective nonionic surfactant lamp in this invention is polyoxyalkylene ether whose alkylene group has 2 to 2 carbon atoms.
親油基のモル当り、エチレンオキサイドの10ないし2
0モルを有するポリオキシエチレンエーテルが好ましく
、このなかにはプリジ35−8P (商標名、Br1j
35− BP )として市販されているポリオキシエ
チレンラウリルエーテルのような界面活性剤が包含され
る。10 to 2 of ethylene oxide per mole of lipophilic group
Preferred are polyoxyethylene ethers having 0 moles, including Prizi 35-8P (trade name, Br1j
Surfactants such as polyoxyethylene lauryl ether, commercially available as 35-BP), are included.
浴の補給に用いた第1すず壇が第2すず化合物へ酸化さ
れて沈澱を生ずるのを防止するための酸化防止剤も浴中
に添加してよい。めっき浴が示す酸性の1)Hにおいて
有効であり、がっこの発明方法の遂行をさtたけたり、
生成めっきに悪影響を及はさないようなものであればい
かなる酸化防止剤でも使用できる。酸化防止剤の使用量
は通常、約0.5ないし50 f/As好ましくは約5
ないしは10 f/lである。Antioxidants may also be added to the bath to prevent the primary tin base used to replenish the bath from oxidizing to secondary tin compounds and forming precipitates. It is effective in the acidic 1)H of the plating bath, and it is effective in carrying out the method of the invention of Gakko.
Any antioxidant can be used as long as it does not adversely affect the resulting plating. The amount of antioxidant used is usually about 0.5 to 50 f/As, preferably about 5
or 10 f/l.
特に好ましい酸化防止剤は芳香族スルホン酸類てめる。Particularly preferred antioxidants include aromatic sulfonic acids.
代表的な芳香族スルホン酸には0−クレゾールスルホン
!1% II−クレゾールスルホン酸及びフェノールス
ルホン酸が包含せられる。A typical aromatic sulfonic acid is 0-cresol sulfone! Includes 1% II-cresol sulfonic acid and phenolsulfonic acid.
フェノールやクレゾールの他のスルホン酸、例えば:
2.6−シメチルフエノールスルホン酸2−クロル−6
−メチルフェノールスルホン酸2.4−ジメチルフェノ
ールスルホン酸2.4.6−ドリメチルフエノールスル
ホン酸p−クレゾールスルホン酸
なども使用できる。α−及びβ−す7トールのスルホン
酸誘導体もtた使用できる。Other sulfonic acids of phenol and cresol, such as: 2,6-dimethylphenolsulfonic acid 2-chloro-6
-Methylphenolsulfonic acid, 2.4-dimethylphenolsulfonic acid, 2.4.6-dolimethylphenolsulfonic acid, p-cresolsulfonic acid, and the like can also be used. Sulfonic acid derivatives of α- and β-7tolls can also be used.
この発明の水性めっき浴の好ましい成分Yrm括すれば
次のようである。Preferred components Yrm of the aqueous plating bath of this invention are summarized as follows.
()
(2)鉛 3〜20 2〜8(3)酸
100〜250 160〜190(4)芳香族アル
デヒド 0.01〜0.5 0.03〜0.1(5)
芳香族アミン 0.3〜15 0.1〜1.5(
6)脂肪酸アルデヒド 0.5〜20 0.9〜1
0.0(7)非イオン性界面活性剤 0.1〜20
0.5〜2.5これらの濃度での浴のpHは通常約1以
下、一般には約1なφし約0.05でめるが、1以上で
も使用は可能でらる。浴温及び電流密度はそれぞれ約1
0℃ナイ[,40℃及び約0.5A/DF?/ (5A
SF ) lkイl、 53 A/′DIP?(500
ASF )、好まシ< n 15℃ナイシハ25℃及び
2.6A/D、? (25181F ) yz イシz
l A/%/(200A31F ) ”T:1hル。() (2) Lead 3-20 2-8 (3) Acid
100-250 160-190 (4) Aromatic aldehyde 0.01-0.5 0.03-0.1 (5)
Aromatic amine 0.3-15 0.1-1.5 (
6) Fatty acid aldehyde 0.5-20 0.9-1
0.0(7) Nonionic surfactant 0.1-20
0.5 to 2.5.The pH of the bath at these concentrations is usually less than about 1, generally about 1 and about 0.05, although it is possible to use pH values above 1. The bath temperature and current density are each about 1
0℃ nai[, 40℃ and about 0.5A/DF? / (5A
SF) Ikil, 53 A/'DIP? (500
ASF), preferably 15°C, 25°C and 2.6 A/D, ? (25181F) yz ishiz
l A/%/(200A31F) ”T: 1h le.
この発明によるめっき浴及び方法社すず一鉛合金組成を
広範に変更できる。約(99重重量子すと1重量係船)
ないし約(99重量%鉛と11iIIIs丁ず)の合金
皮膜を得ることができる。異なる組成の合金皮81ヲ生
成せしめたい場合には当然のこと乍ら浴成分の相関量を
変更して所望の組成の合金に対しての最適な光沢と延性
ならびに他の特性が付与されるようにすべきである。実
用的見地からして、約(95重量−と5重量多鉛)の組
成のすず一鉛合金皮膜及び約(60重量−すすと40重
量−鉛)の組成を有するはんだ皮膜が特に有用でありい
ずれもこの発明による浴と方法によって容易に生成させ
ることができる。The plating bath and method according to the present invention allows for a wide range of variations in the tin-lead alloy composition. Approximately (99 weight tons and 1 weight mooring)
An alloy coating of from about 99% by weight lead to 11iIIIs can be obtained. Of course, if it is desired to produce an alloy skin 81 of a different composition, the relative amounts of the bath components may be varied to impart optimum gloss, ductility, and other properties to the alloy of the desired composition. should be. From a practical standpoint, tin-lead alloy coatings having a composition of about (95 wt.- and 5 wt. lead) and solder coatings having a composition of about (60 wt.-soot and 40 wt.-lead) are particularly useful. Both can be easily produced using the bath and method according to the present invention.
はとんどのめつき操作ではかくはん、しばしば急速かく
はんが好ましく適用される。更にアノード:カンード比
は約1=1ないしlo : 1でめり、約4:lが好ま
しい。この発明の浴と方法は銅、銅合金、鋼、ニッケル
、ニッケル合金及びその他に適用される。Stirring, often rapid stirring, is preferred in most plating operations. Additionally, the anode:cand ratio ranges from about 1=1 to lo:1, preferably about 4:1. The baths and methods of this invention are applicable to copper, copper alloys, steel, nickel, nickel alloys, and others.
前述した工うにこの発明の浴を用いることによって、追
加的な添加剤又は錯化剤を加えないでも銅及びロジウム
金属をすすと鉛の合金中に共析させることができる。ニ
ッケル、鉄及びインジウムの工うな金属は同じ条件下で
は共析しなかった。By using the bath of the present invention in the manner described above, copper and rhodium metals can be eutectoided into a soot-lead alloy without the addition of additional additives or complexing agents. Metals such as nickel, iron and indium did not eutectoid under the same conditions.
通常、銅又はロジウムは丁ず及び鉛と同じアニオン會有
する浴可溶性化合物として浴中に添加するのが好ましい
。添加量はすず一鉛合金中に約5重量−〇銅又はロジウ
ムが共析するのに十分な量でめる。かかる共析皮膜を得
るための銅及びロジウムの浴濃度はそれぞれ約0.2な
いし4 t/を及び0.2ないし2 t/lである。It is generally preferred that copper or rhodium be added to the bath as a bath-soluble compound having the same anionic association as lead and lead. The amount to be added is sufficient to eutectoid about 5 weight - 0 copper or rhodium in the tin-lead alloy. The bath concentrations of copper and rhodium to obtain such eutectoid coatings are approximately 0.2 to 4 t/l and 0.2 to 2 t/l, respectively.
この発明の他の提案によれば、脂肪族アルデヒドに追加
してか、または脂肪族アルデヒドの50重量tsまでを
、対応する脂肪族11’によって置換することができ、
この際はんだ用度−〇光沢や他の皮膜特性には悪影響を
与えない。例えばホルムアルデヒドの50重量%以下管
蟻酸によって置換してもこの発明の基本的な丁ず一鉛浴
の性能を維持している。比較のために、前記したホルム
アルデヒド量の50重量係以下しか含まない浴は添加し
た蟻酸の量に拘りなく皮膜の外観が悪くなる。一方、添
加する蟻酸の量はホルムアルデヒドの排除量と正確に一
致しなくてもよく、またホルムアルデヒドの排除なしで
も添加することができる。更にホルムアルデヒドを全く
添加しないでも蟻酸はこの発明の浴にほとんど悪影響を
与えないか又は無影響である。According to another proposal of the invention, in addition to the aliphatic aldehyde or up to 50 weight ts of the aliphatic aldehyde can be replaced by the corresponding aliphatic 11',
At this time, the solder usage level: - No adverse effect on gloss or other film properties. For example, even if less than 50% by weight of formaldehyde is replaced by formic acid, the basic performance of the lead bath of this invention is maintained. For comparison, baths containing less than 50 parts by weight of formaldehyde as described above result in poor appearance of the film, regardless of the amount of formic acid added. On the other hand, the amount of formic acid added does not have to correspond exactly to the amount of formaldehyde removed, and it can also be added without formaldehyde removal. Furthermore, formic acid has little or no adverse effect on the baths of this invention even without the addition of any formaldehyde.
50重量優以下のホルムアルデヒドを蟻酸により置換す
ることの利点は、めっき操作中でのホルムアルデヒドの
消耗量が減少することであり、これにより比較的少量の
ホルムアルデヒドの補給でことが足りる点にある。The advantage of replacing well over 50% by weight of formaldehyde with formic acid is that the amount of formaldehyde consumed during the plating operation is reduced, so that a relatively small amount of formaldehyde needs to be replenished.
ある運転条件においては浴中にホウ酸を添加して遊離の
フッ化水素酸の生成を防止又は減少せしめるのが有利な
場合がある。ホウ酸の添加量に遊離のフッ化水素酸の生
成を実質的に減少せしめるのに十分な量でめれによい。Under certain operating conditions it may be advantageous to add boric acid to the bath to prevent or reduce the formation of free hydrofluoric acid. The amount of boric acid added is rarely sufficient to substantially reduce the formation of free hydrofluoric acid.
通常的601/l、好ましくは30fμである。この発
明によるすず一鉛めつき浴は界面活性剤を含有しておシ
、この活性剤はめる種の用途に用いると発泡を起ξすこ
とがある。仁の発泡の問題は適当な消泡剤を約o、oe
ct7tないし浴中への溶解度の範囲で含有せしめるこ
とにより解決できる。特に好まし一消泡剤はオクチルア
ルコールであり、このアルコールは他の浴成分とは化学
的に、tた電気化学的にも相溶しないが、このすず−鉛
皮膜にはなんらの悪影譬を与えない。Typically 601/l, preferably 30 fμ. The tin-lead plating bath according to the present invention contains a surfactant and may cause foaming when used in applications where this surfactant is applied. To solve the foaming problem, use a suitable antifoaming agent of about o, oe.
This can be solved by containing the compound within the range of solubility in the bath from ct7t. A particularly preferred antifoaming agent is octyl alcohol, which is chemically and electrochemically incompatible with other bath components, but which does not cause any adverse effects on the tin-lead coating. not give.
この発明は次の実施例の判読によって更に理解が容易に
なるはずである。This invention will become easier to understand after reading the following examples.
実施例 1 次に記載の鎖成分からめつき浴を調製した。Example 1 A plating bath was prepared from the following chain components.
成 分
量子ず(フッ化ホウ阪第1すすとして添加)30f/j
鉛(フッ化ホウ酸鉛として添加) 4 t
/lフッ化ホウ素酸 172 t
/LO−クロルアニリン 0.5 f
/lホルマリン 20卿tポ
リオキシエチレンラウリルエーテル 2.5t/1
1−ナフ卓アルデヒド 0.05f/A水
ノ(ラ
ンス調製された浴は安定であり20℃、60ム8F(6
ム/背)において、かく扛ん下で銅試験片上にめっきし
た。生成したすず一鉛皮膜は95重量%の鉛から成り、
著しい光沢を呈していた。Ingredients
Quantum (added as borofluoride first soot) 30f/j
Lead (added as lead fluoroborate) 4 t
/l fluoroboric acid 172 t
/LO-Chloraniline 0.5 f
/l formalin 20 tons polyoxyethylene lauryl ether 2.5t/1
1-Naph aldehyde 0.05f/A water (lance) The bath prepared is stable and at 20°C, 60mm, 8F (6
The specimen was plated on a copper test piece under such conditions. The resulting tin-lead film consists of 95% lead by weight,
It had a remarkable shine.
実施例 2
実施例1の処方において、0.5 f/lのフッ化ホウ
酸銅全添加した。この浴を用いて6ム/背にてめっきを
行ったところ約1重量%の銅、89重量%のすず及び5
重量−の鉛から成る光沢性の丁ず一鉛一鋼合金めつきが
得られた。Example 2 In the formulation of Example 1, 0.5 f/l of copper fluoroborate was added in total. When plating was carried out at 6 μm/back using this bath, it contained approximately 1% by weight of copper, 89% by weight of tin, and 5% by weight of copper.
A bright one-lead-one-steel alloy plating consisting of -90% of lead by weight was obtained.
上記の2価のすず一鉛浴において銅に代えて鉄及びイン
ジウム金属を用いたところ、これらの金属類の共析は全
く起こらなかった。When iron and indium metals were used in place of copper in the above divalent tin-lead bath, no eutectoiding of these metals occurred.
実施例 3 次の成分を用いて浴會調製した。Example 3 A bath was prepared using the following ingredients.
成 分 量
子ず(7ツ化ホウ酸第1すすとして添加)30f/を鉛
(7ツ化ホウ酸鉛として添加) 4 t/
lフフ化ホウ素酸 172 f/
lホウ酸 20 f/lホ
ルマリン 2o蜂tO−クロ
ルアニリン 0.5 t/ll−ナフ
ーアルデヒド o、osr7zポリオキシ
エチレンラクリルエーテル 2.5f/を蟻 酸(8
8重量%) 2卿を浴は室温、6ム/D
n/ 、急速かくはん下で丁ず一鉛アノードを用いて操
作した。ホルムアルデヒド濃度は実施例1と全く同じで
あるが蟻酸を添加することにより引き続くホルムアルデ
ヒドの補給管しないで奄よいようにした。生成したすず
一鉛めつきは著しく光沢がToり丁ずを95ff1%と
船上5重量%含有していた。Ingredients Quantum (added as the first soot of boric acid heptad) 30f/lead (added as lead boric acid heptad) 4 t/
l Fufluoroboric acid 172 f/
l Boric acid 20 f/l formalin 2 o O-chloroaniline 0.5 t/l-naphaldehyde o, osr7z polyoxyethylene lacryl ether 2.5 f/ formic acid (8
8% by weight) 2. Bath at room temperature, 6mm/D
n/, operated with a single lead anode under rapid stirring. The formaldehyde concentration was exactly the same as in Example 1, but by adding formic acid, it was made easier without the need for a subsequent formaldehyde supply tube. The resulting tin-lead plating was extremely shiny and contained 95ff1% tin and 5% by weight on board.
実施例 4
次の鎖成分を用いてすず一鉛めっき浴を調製した0
成 分 量すず
(7ツ化ホウ酸第1丁ずとして添加)3ot/を鉛(フ
ッ化ホウ酸鉛として添加) 4 t/lフ
ッ化ホウ素酸 172 f/lホ
ウ酸 20 f/lホルマ
リン 1o咄0−り四ルアニ
リン 0.5約1−す7Jアルデヒド
0.05f/lポリオキシエチレンラ
ウリルエーテル 2.5f/を蟻 酸(88重量%
) 5 cr7zこの浴を実施例3
に記載の条件で操作し本。もともと必要なホルムアルデ
ヒド量の50重量St−蟻酸により置換したにも拘らず
、20C1y’lのホルマリンを含み蟻酸を含まない実
施例1の浴により得られたと全く同じ光沢でめった。Example 4 A tin-lead plating bath was prepared using the following chain components: 0 Ingredients Quantity Tin (added as 1st part of boric acid heptad) 3 ot/lead (added as lead fluoroborate) 4 t/l fluoroboric acid 172 f/l boric acid 20 f/l formalin 10-40-4 aniline 0.5 about 1-7J aldehyde 0.05 f/l polyoxyethylene lauryl ether 2.5 f/l Acid (88% by weight
) 5 cr7z This bath was used in Example 3.
Operate under the conditions described in this book. Despite substituting the originally required amount of formaldehyde with 50 wt St-formic acid, it plated with exactly the same gloss as obtained with the bath of Example 1 containing 20 C1y'l of formalin and no formic acid.
実施例 5
実施例1によるめっき浴中に、それぞれo 、 06
ct7を及び0 、18 %/Aのオクチルアルコール
金添加し穴。Example 5 o, 06, respectively, in the plating bath according to example 1
ct7 and 0,18%/A octyl alcohol gold added to the wells.
これらの浴全実施例1と同様に操作したところ、すす1
95重量−と鉛t−5重量%含む極めて明るい丁ず一鉛
皮膜が生成し皮。When these baths were operated in the same manner as in Example 1, soot 1
An extremely bright lead film containing 95% by weight and 5% by weight of lead is formed on the skin.
これらの浴のそれぞれ及び実施例1の浴から試料を採取
して瓶中に仕込み、蓋をほどこしたのち振盪した。0.
06cty/lのオクチルアルコールを含む試料の泡の
高さは実施例1の浴から採取した試料を含む瓶中の高さ
よりも約209gな−シ30慢低かった。0 、18
cc/Lのオクチルアルコール含有試料瓶中の泡の高さ
は実施例1の浴から採取した試料を含む瓶中の高さと殆
んど同じであった。前者における泡の消失時間は後者の
それより約30チ少なかった。Samples were taken from each of these baths and from the bath of Example 1, placed in bottles, capped and shaken. 0.
The foam height of the sample containing 0.6 cty/l of octyl alcohol was about 209 g - 30 ml lower than the height in the bottle containing the sample taken from the bath of Example 1. 0, 18
The foam height in the sample bottle containing cc/L octyl alcohol was almost the same as the height in the bottle containing the sample taken from the bath of Example 1. The foam disappearance time in the former was about 30 inches less than that in the latter.
実施例 6 次の味成分?用いてめっき浴を調製した。Example 6 The next flavor ingredient? A plating bath was prepared using
成 分
量すず(フッ化ホウ酸第1丁ずとして添加)30f/を
鉛(フッ化ホウ酸鉛として添加) s y
/lフッ化ホウ累酸 172
t/lO−クロルアニリン 0.56
f/Lホルマリン 20 C
11tポリオキシエチレンラウリルエーテル 2.
5f/11−す7Jアルデヒド 0.11
f/j水 バ
ランス調製浴は安定でろ9120℃、6ムAνにてかく
はん下で銅試験片をめっきした。生成し几すず一鉛皮膜
は著しく光沢があり、60重を−のすすと40重量−の
鉛を含んでいた◎
実施例 7
この発明における必須の添加剤の効果音説明する友めに
、次のような511類のめつき浴を調製し皮。Ingredients
Amount of tin (added as fluoroboric acid No. 1) 30f/lead (added as lead fluoroborate) s y
/l fluoroboric acid 172
t/lO-chloroaniline 0.56
f/L formalin 20C
11t polyoxyethylene lauryl ether 2.
5f/11-7J aldehyde 0.11
The f/j water balance preparation bath was stable and the copper specimens were plated at 9120° C. and 6 μm Av with stirring. The resulting tin-lead film was extremely shiny and contained 60 parts by weight of soot and 40 parts by weight of lead. Prepare a plating bath of type 511 and peel.
A−一実施例の浴
B−非イオン性界面活性剤のない実施例1の浴〇−脂肪
族アルデヒドのない実施例1の浴り一芳香族アミンのな
一実施例1の浴
E−芳香族アルデヒドのない実施例1の浴これらの浴を
実施例1と同じ条件にて操作したところ、次の結果が得
られた。A - Bath of Example 1 B - Bath of Example 1 without nonionic surfactant - Bath of Example 1 without aliphatic aldehyde - Bath of Example 1 without aromatic amine E - Aromatic Baths of Example 1 without Group Aldehydes These baths were operated under the same conditions as in Example 1 and the following results were obtained.
浴ム 光沢性、平滑皮膜
浴B 樹枝状粒子のめる黒色スポンジ皮膜浴0 曇った
金属性白色皮膜
浴D 曇った灰色又は黒色曇り
浴K 高電流密度部分にてスキップめっきによる半光沢
皮膜、低電流密度部分にて白色曇り皮膜
実施例 8
芳香族アミン対芳香族アルデヒドの比が1.25 :
1ないし100 : 1の範囲以外の場合の浴を用いた
ときの効果管説明するために、次の諸成分を用いて電気
めっき浴を調製した。Bath Glossy, smooth film Bath B Black sponge film containing dendritic particles Bath 0 Cloudy metallic white film Bath D Cloudy gray or black cloudy bath K Semi-gloss film with skip plating in high current density areas, low current density Partly white cloudy film Example 8 Ratio of aromatic amine to aromatic aldehyde is 1.25:
1 to 100: To illustrate the effect tube when using a bath outside the range of 1, an electroplating bath was prepared using the following components.
成 分 量
子ず(7ツ化ホウ酸第1すすとして添加)30f/を鉛
(フッ化ホウ酸鉛として添加) 4 t/
lフッ化ホウ票酸 172 t
/lホルマリン 20 ct
、/lポリオキシエチレンラウリルエーテル 2:
5f/lO−クロルアニリン 変 動1
−ナフタアルデヒド 変 動これらの実験
では真鍮生地上に、浴温20℃、6vDn11激しいか
くはんの条件下ですず一鉛合金めっき1に施した。0−
クロルアニリン対l−す一フタアルデヒドの比は、次の
ようになるように変えた0
−ノルマル−光沢剤のル率範囲内の湊度ハ イ −比
率範囲の上限金離えた濃度口 ウー比率範囲の下限以
下の濃度
この方式では次のような結果が得られた。Ingredients Quantum (added as the first soot of boric acid heptadide) 30f/lead (added as lead fluoroborate) 4t/
l Fluoroboric acid 172 t
/l formalin 20 ct
,/l polyoxyethylene lauryl ether 2:
5f/lO-Chloraniline variation 1
-Naphthaldehyde Variation In these experiments, tin-lead alloy plating 1 was applied on brass fabric under conditions of bath temperature 20°C and 6vDn11 vigorous stirring. 0-
The ratio of chloraniline to l-phthaldehyde was changed as follows: 0 - Normal - Brightness within the brightener ratio range High - Upper limit of the ratio range - Concentration at a distance - Wu ratio Concentrations below the lower limit of the range This method gave the following results.
0−クロルアニリン 1−ナツタアルデヒド 外
観ハ イ ノルマル 低電流密度部分でスキ
ップめっき
ハ イ ハ イ 曇ったスキップめ
っきノルマル ノルマル 明るい平滑な皮膜前記
した実施例は単に説明の目的のた−めのものであり、こ
の発明の範囲から逸脱することなく種々の変更や修正が
なされうろこと扛自明である。0-Chloraniline 1-Natutaldehyde
High Normal Skip plating in low current density areas High High Cloudy skip plating Normal Normal Bright smooth coating The above embodiments are for illustrative purposes only and do not fall within the scope of this invention. It is obvious that various changes and modifications have been made without exception.
ほか1名1 other person
Claims (11)
丁ず一鉛合金を効果的に析出せしめるのに少なくとも十
分な量ないし浴への最高溶解度までの量の浴可溶性2価
すず塩及び2価船塩と;蚊塩類と相溶する酸であって浴
に対して導電性を付与して浴中へのi塩類の溶解度を維
持せしめるのに少なく共十分な量の酸と;粒子リファイ
ナーとして有効な量の非イオン性界面活性剤と:ならび
に芳香族アルデヒド、脂肪族アルデヒド及び芳香族アず
ンから成り、それぞれの成分がすず一鉛合金皮膜に対し
て光沢を付与するのに少なく共十分な量で存在し、かつ
芳香族アミン対芳香族アルデヒドの比が約1.25:1
ないし100 : 1の範囲以内にめるような光沢剤組
成物とから成るすず一鉛電気めっき浴。(1) a tin-lead electroplating bath in which divalent tin is soluble in the bath in an amount at least sufficient to effectively deposit the desired tin-lead alloy on the substrate up to its maximum solubility in the bath; salts and divalent ship salts; an acid compatible with the mosquito salts in an amount at least sufficient to impart conductivity to the bath and maintain the solubility of the salts in the bath; an effective amount of a nonionic surfactant as a particle refiner; both are present in sufficient amounts and the ratio of aromatic amine to aromatic aldehyde is about 1.25:1.
A tin-lead electroplating bath comprising a brightener composition within the range of 1 to 100:1.
塩及びフッ化ホウ酸鉛でらることを特徴とする特許請求
の範囲第1項に記載の電気めっき浴。(2) The electroplating bath according to claim 1, wherein the tin salt and the lead salt are fluoroboric acid tin salt and lead fluoroborate, respectively.
特許請求の範囲第1項に記載の電気めっき浴。(3) The electroplating bath according to claim 1, wherein the compatible acid is fluoroboric acid.
る合金化金属をも含有することt−特徴とする特許請求
の範囲第1項に記載の電気めっき浴。4. Electroplating bath according to claim 1, characterized in that it also contains an alloying metal selected from the group consisting of copper and rhodium metals.
求の範囲第1項に記載の電気めっき浴。(5) The electroplating bath according to claim 1, characterized in that boric acid is present in the bath.
とする特許請求の範囲第1項に記載の電気めっき浴。(6) The electroplating bath according to claim 1, characterized in that one type of antifoaming agent is contained in the bath in t%.
とする特許請求の範囲第6項に記載の電気めっき浴。(7) The electroplating bath according to claim 6, wherein the antifoaming agent is octyl alcohol.
肪族酸によって置換せられることを特徴とする特許請求
の範囲第1項に記載の電気めっき浴。(8) Electroplating bath according to claim 1, characterized in that up to 50% by weight of the aliphatic aldehyde is replaced by the corresponding aliphatic acid.
3〜20 fμ相溶性酸 1
00〜250 f/を非イオン性界面活性剤 0.1〜
20 t/を芳香族アミン θ、3〜1st/を
芳香族アルデヒド 0.01〜0.5?/を脂肪族ア
ルデヒド 0.5〜20 t/lであることを特徴と
する特許請求の範囲第1項に記載の電気めっき浴。(9) Ingredients in the following amounts, namely: 5 to 50 flt lead
3-20 fμ compatible acid 1
00~250 f/Nonionic surfactant 0.1~
20 t/ is aromatic amine θ, 3-1 st/ is aromatic aldehyde 0.01-0.5? 2. The electroplating bath according to claim 1, wherein / is an aliphatic aldehyde of 0.5 to 20 t/l.
酸鉛として添加せられ、相溶性酸がフッ化ホウ素酸でラ
シ、非イオン性界面活性剤がポリオキシエチレンラウリ
ルエーテルでおり、芳香族アミンが0−クロルアニリン
で娶り、芳香族アルデヒドが1−ナツタアルデヒドであ
り、脂肪族アルデヒドがホルマリンでらることを特徴と
する特許請求の範囲第9項に記載の電気めっき浴。(10) Tin and lead are added as tin heptafluoroborate and lead heptoborate, the compatible acid is fluoroboric acid, and the nonionic surfactant is polyoxyethylene lauryl ether. , the aromatic amine is 0-chloroaniline, the aromatic aldehyde is 1-natal aldehyde, and the aliphatic aldehyde is formalin. .
に工り置換せられることt特徴とする特許請求の範囲第
10項に記載の電気めっき浴。 (12、特許請求の範囲第1項、第2項、第3項、第4
項、第5項、第6項、第7項、W、8項、第9項、第1
0項又は@11項の電気めっき浴を通してアノードとカ
ソード間に通電し、所望のすず〜鉛合金皮膜が形成され
るのに十分な時間帯に亘ってめっきすることから成る明
色のすず一鉛合金の電着方法。(11) The electroplating bath according to claim 10, characterized in that up to 50 weight qII of formaldehyde is substituted with formic acid. (12. Claims 1, 2, 3, and 4)
Term, 5th term, 6th term, 7th term, W, 8th term, 9th term, 1st term
Light-colored tin-lead formed by passing current between the anode and cathode through the electroplating bath of Item 0 or @ Item 11 and plating for a sufficient period of time to form the desired tin-lead alloy film. Method of electrodeposition of alloys.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US29976081A | 1981-09-08 | 1981-09-08 | |
US299760 | 1981-09-08 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5842786A true JPS5842786A (en) | 1983-03-12 |
JPH0213036B2 JPH0213036B2 (en) | 1990-04-03 |
Family
ID=23156175
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57147498A Granted JPS5842786A (en) | 1981-09-08 | 1982-08-25 | Electrodeposition of tin-lead alloy |
Country Status (10)
Country | Link |
---|---|
JP (1) | JPS5842786A (en) |
BE (1) | BE894329A (en) |
BR (1) | BR8205180A (en) |
DE (1) | DE3228911A1 (en) |
ES (1) | ES8308367A1 (en) |
FR (1) | FR2512466B1 (en) |
GB (1) | GB2105370B (en) |
IT (1) | IT1189337B (en) |
NL (1) | NL8203230A (en) |
SE (1) | SE8204505L (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62196391A (en) * | 1985-09-20 | 1987-08-29 | リ−ロ−ナル インコ−ポレ−テツド | Preparation of tin-lead electroplating bath |
JP2016531206A (en) * | 2013-09-05 | 2016-10-06 | エンソン インコーポレイテッド | Aqueous electrolyte composition with reduced atmospheric release, method and use of the composition |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
ES2016313B3 (en) * | 1986-10-03 | 1990-11-01 | Asta Pharma Ag | COMPOUNDS OF DIAMINE-PLATINUM (II) COMPLEXES WITH A HYDROXYLATED PHENYL-INDOLL RING. |
DE4440176C2 (en) * | 1994-02-05 | 1996-06-27 | Heraeus Gmbh W C | Bath for the electrodeposition of silver-tin alloys |
GB0106131D0 (en) * | 2001-03-13 | 2001-05-02 | Macdermid Plc | Electrolyte media for the deposition of tin alloys and methods for depositing tin alloys |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3785939A (en) * | 1970-10-22 | 1974-01-15 | Conversion Chem Corp | Tin/lead plating bath and method |
US3905878A (en) * | 1970-11-16 | 1975-09-16 | Hyogo Prefectural Government | Electrolyte for and method of bright electroplating of tin-lead alloy |
NL7104810A (en) * | 1971-04-08 | 1972-10-10 | ||
US3730853A (en) * | 1971-06-18 | 1973-05-01 | Schloetter M | Electroplating bath for depositing tin-lead alloy plates |
US3749649A (en) * | 1971-12-16 | 1973-07-31 | M & T Chemicals Inc | Bright tin-lead alloy plating |
US3926749A (en) * | 1971-12-20 | 1975-12-16 | M & T Chemicals Inc | Tin-lead alloy plating |
US4000047A (en) * | 1972-11-17 | 1976-12-28 | Lea-Ronal, Inc. | Electrodeposition of tin, lead and tin-lead alloys |
JPS4993235A (en) * | 1973-01-10 | 1974-09-05 | ||
US3850765A (en) * | 1973-05-21 | 1974-11-26 | Oxy Metal Finishing Corp | Bright solder plating |
GB1469547A (en) * | 1973-06-28 | 1977-04-06 | Minnesota Mining & Mfg | Tin/lead electr-plating baths |
SE390986B (en) * | 1973-10-18 | 1977-01-31 | Modo Kemi Ab | PROCEDURE FOR ELECTROPLETING AW COATINGS OF IGNITION OR IGNITION ALLOY UNIT OF AN ACID ELECTROLYTE BATH |
US3956123A (en) * | 1974-02-19 | 1976-05-11 | R. O. Hull & Company, Inc. | Additive for electrodeposition of bright tin and tin-lead alloy |
US3875029A (en) * | 1974-02-19 | 1975-04-01 | R O Hull & Company Inc | Plating bath for electrodeposition of bright tin and tin-lead alloy |
US3977949A (en) * | 1975-07-07 | 1976-08-31 | Columbia Chemical Corporation | Acidic plating bath and additives for electrodeposition of bright tin |
US4135991A (en) * | 1977-08-12 | 1979-01-23 | R. O. Hull & Company, Inc. | Bath and method for electroplating tin and/or lead |
US4139425A (en) * | 1978-04-05 | 1979-02-13 | R. O. Hull & Company, Inc. | Composition, plating bath, and method for electroplating tin and/or lead |
GB1567235A (en) * | 1978-05-15 | 1980-05-14 | Pmd Chemicals Ltd | Electrodeposition of tin or tin/lead alloys |
-
1982
- 1982-07-29 SE SE8204505A patent/SE8204505L/en not_active Application Discontinuation
- 1982-08-03 DE DE19823228911 patent/DE3228911A1/en active Granted
- 1982-08-17 NL NL8203230A patent/NL8203230A/en not_active Application Discontinuation
- 1982-08-18 IT IT49001/82A patent/IT1189337B/en active
- 1982-08-25 JP JP57147498A patent/JPS5842786A/en active Granted
- 1982-09-03 BR BR8205180A patent/BR8205180A/en not_active IP Right Cessation
- 1982-09-06 FR FR8215125A patent/FR2512466B1/en not_active Expired
- 1982-09-07 GB GB08225406A patent/GB2105370B/en not_active Expired
- 1982-09-07 BE BE0/208965A patent/BE894329A/en not_active IP Right Cessation
- 1982-09-07 ES ES515543A patent/ES8308367A1/en not_active Expired
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62196391A (en) * | 1985-09-20 | 1987-08-29 | リ−ロ−ナル インコ−ポレ−テツド | Preparation of tin-lead electroplating bath |
JPH0241589B2 (en) * | 1985-09-20 | 1990-09-18 | ||
JP2016531206A (en) * | 2013-09-05 | 2016-10-06 | エンソン インコーポレイテッド | Aqueous electrolyte composition with reduced atmospheric release, method and use of the composition |
US10081876B2 (en) | 2013-09-05 | 2018-09-25 | Macdermid Enthone Inc. | Aqueous electrolyte composition having a reduced airborne emission, method and use of this composition |
Also Published As
Publication number | Publication date |
---|---|
FR2512466A1 (en) | 1983-03-11 |
SE8204505L (en) | 1983-03-09 |
JPH0213036B2 (en) | 1990-04-03 |
DE3228911A1 (en) | 1983-03-24 |
GB2105370B (en) | 1985-05-01 |
FR2512466B1 (en) | 1987-06-26 |
NL8203230A (en) | 1983-04-05 |
DE3228911C2 (en) | 1988-02-04 |
BE894329A (en) | 1983-03-07 |
SE8204505D0 (en) | 1982-07-29 |
ES515543A0 (en) | 1983-08-16 |
BR8205180A (en) | 1983-09-06 |
GB2105370A (en) | 1983-03-23 |
IT8249001A0 (en) | 1982-08-18 |
ES8308367A1 (en) | 1983-08-16 |
IT1189337B (en) | 1988-02-04 |
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