JPS5842199A - 中性粒子入射装置 - Google Patents

中性粒子入射装置

Info

Publication number
JPS5842199A
JPS5842199A JP56138482A JP13848281A JPS5842199A JP S5842199 A JPS5842199 A JP S5842199A JP 56138482 A JP56138482 A JP 56138482A JP 13848281 A JP13848281 A JP 13848281A JP S5842199 A JPS5842199 A JP S5842199A
Authority
JP
Japan
Prior art keywords
gas
injection device
neutral particle
neutralization cell
particle injection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56138482A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6355757B2 (enrdf_load_stackoverflow
Inventor
裕 伊藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP56138482A priority Critical patent/JPS5842199A/ja
Publication of JPS5842199A publication Critical patent/JPS5842199A/ja
Publication of JPS6355757B2 publication Critical patent/JPS6355757B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Plasma Technology (AREA)
  • Particle Accelerators (AREA)
JP56138482A 1981-09-04 1981-09-04 中性粒子入射装置 Granted JPS5842199A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56138482A JPS5842199A (ja) 1981-09-04 1981-09-04 中性粒子入射装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56138482A JPS5842199A (ja) 1981-09-04 1981-09-04 中性粒子入射装置

Publications (2)

Publication Number Publication Date
JPS5842199A true JPS5842199A (ja) 1983-03-11
JPS6355757B2 JPS6355757B2 (enrdf_load_stackoverflow) 1988-11-04

Family

ID=15223105

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56138482A Granted JPS5842199A (ja) 1981-09-04 1981-09-04 中性粒子入射装置

Country Status (1)

Country Link
JP (1) JPS5842199A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02201200A (ja) * 1989-01-30 1990-08-09 Nippon Telegr & Teleph Corp <Ntt> 高速原子線源装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02201200A (ja) * 1989-01-30 1990-08-09 Nippon Telegr & Teleph Corp <Ntt> 高速原子線源装置

Also Published As

Publication number Publication date
JPS6355757B2 (enrdf_load_stackoverflow) 1988-11-04

Similar Documents

Publication Publication Date Title
CN104903967B (zh) 基于负离子的中性束注入器
US6422825B2 (en) Plasma vacuum pumping cell
JPS5842199A (ja) 中性粒子入射装置
Matsumoto et al. Large-aperture travelling-wave accelerator structure for positron capture of SuperKEKB injector linac
US6559601B1 (en) Plasma vacuum pump
KR100358966B1 (ko) 빔전하교환장치
CN112151196A (zh) 一种具有三棱柱反射阵列的气体靶中性化器
US2839706A (en) Pulsed ion source
JPS6355756B2 (enrdf_load_stackoverflow)
JPH0619120Y2 (ja) 液体用ターゲットボックス
JP7019141B2 (ja) 差圧室連通装置及び差圧室連通方法
JPH04324238A (ja) イオン中和器
JPH01310179A (ja) Ｅｃｒ型イオンスラスタ
JP3524277B2 (ja) 中性粒子入射装置
JP3297181B2 (ja) ビーム荷電変換装置
JPS62180935A (ja) マイクロ高速原子線源装置
JPH03138849A (ja) イオン注入装置
Steski et al. Neutralization of space charge forces using ionized background gas
JPH07211496A (ja) 中性ビーム荷電変換装置
JPS62278800A (ja) シンクロトロン
CN208891097U (zh) 大强度离子的离子源产生装置
JPH01204348A (ja) イオン化物質導入装置
JPH01204347A (ja) イオン化物質導入装置
JPS62174573A (ja) 電子衝撃型イオン・スラスタ
JPH097799A (ja) 電子蓄積リング用真空槽