JPS5840421A - Reheating method for desulphurized waste gas - Google Patents

Reheating method for desulphurized waste gas

Info

Publication number
JPS5840421A
JPS5840421A JP56138641A JP13864181A JPS5840421A JP S5840421 A JPS5840421 A JP S5840421A JP 56138641 A JP56138641 A JP 56138641A JP 13864181 A JP13864181 A JP 13864181A JP S5840421 A JPS5840421 A JP S5840421A
Authority
JP
Japan
Prior art keywords
gas
temperature
heat
medium
untreated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56138641A
Other languages
Japanese (ja)
Inventor
Hiroshi Fujiike
藤池 宏
Kazunori Orio
折尾 一紀
Hiromitsu Shirai
白井 博光
Shunji Kasuga
春日 俊二
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Heavy Industries Ltd
Original Assignee
Mitsubishi Heavy Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Heavy Industries Ltd filed Critical Mitsubishi Heavy Industries Ltd
Priority to JP56138641A priority Critical patent/JPS5840421A/en
Publication of JPS5840421A publication Critical patent/JPS5840421A/en
Pending legal-status Critical Current

Links

Classifications

    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F23COMBUSTION APPARATUS; COMBUSTION PROCESSES
    • F23JREMOVAL OR TREATMENT OF COMBUSTION PRODUCTS OR COMBUSTION RESIDUES; FLUES 
    • F23J15/00Arrangements of devices for treating smoke or fumes
    • F23J15/08Arrangements of devices for treating smoke or fumes of heaters

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Chimneys And Flues (AREA)
  • Treating Waste Gases (AREA)

Abstract

PURPOSE:To miniaturize a reheating system for treated gas, by a method wherein two liquid thermal mediums are applied as a heat accumulating body and the two liquid thermal mediums each are made to exchange their heat indirectly after heat has been exchanged directly between untreated gas and treated gas. CONSTITUTION:High temperature untreated gas 1 touches directly a No.1 low temperature thermal medium 31 in a No.1 thermal medium contactor 11, the high temperature untreated gas 1 is turned into a low temperature untreated gas 1' through a temperature decrease and the No.1 low temperature medium 31 is turned into a No.1 high temperature medium 31' through a temperature rise. The No.1 high temperature thermal medium 31' led to an indirect heat exchanger 20 is exchanged its heat with that of a No.2 low temperature thermal medium 32 and No.1 high temperature medium 31' is turned into the No.1 low temperature medium 31 through the temperature decrease. On the other hand, the No.2 low temperature thermal medium 32 is turned into a No.2 high tem perature thermal medium 32' through the temperature rise. With this, it is possible to obtain a heat recovery and reheating method which is compact and free of gas leak.

Description

【発明の詳細な説明】 本発明は湿式排煙脱硫処理ガスの再加熱方法の改jlL
K関する。
[Detailed Description of the Invention] The present invention is an improvement of a method for reheating wet flue gas desulfurization treatment gas.
Regarding K.

脱硫処理ガス#1801などの腐食成分と飽和湿分を含
むガスであシ、後流機器の腐食防止、煙突からの白煙防
止・拡散性増大の九めに再加熱後排出されている。
A gas containing corrosive components and saturated moisture, such as desulfurization gas #1801, is discharged after reheating to prevent corrosion of downstream equipment, prevent white smoke from chimneys, and increase dispersion.

処理ガスの再加熱手段としては、かつてはアーフタバー
ナ蒸気による加熱が行なわれてい九が、最近は省エネル
ギ的見地から処理前ガスより回収した熱で再加熱する方
法が採用されている。熱回収方式として実用化されてi
るのは、蓄熱回転方式の本のであるが、回転部を完全に
シールできぬために未処理ガスの処理ガス側への漏洩が
あり、特に石炭焚の場合のように未処理ガス中にダスト
が多い場合に#′i適当な装置とはいえな−ものである
。また上記漏洩を防ぐ手段としては、間接熱交換器方式
も考えられるが、ガス−固体壁間の熱伝達率は小さいた
め装置が大きくなゐ欠点があった。
As a means of reheating the treated gas, heating with afterburner steam was once used, but recently, from the viewpoint of energy saving, a method of reheating using heat recovered from the pre-treated gas has been adopted. It has been put into practical use as a heat recovery method.
This is a book about a heat storage rotation system, but because the rotating part cannot be completely sealed, untreated gas leaks to the treated gas side, and dust may be present in the untreated gas, especially in the case of coal-fired combustion. #'i is not an appropriate device if there are many. An indirect heat exchanger method may also be considered as a means to prevent the above-mentioned leakage, but this method has the disadvantage that the device is large because the heat transfer coefficient between the gas and the solid wall is small.

そこで本発明者らけ、小型にしてかつガス漏洩のなh@
回収再加熱法の開発につき鋭意研究の結果、蓄熱体とし
て二つの液体熱媒体を使用し、該液体熱媒体を、未処理
ガス及び/又は処理ガスと直談熱交換させ、それぞれの
液体熱媒体上間接的に熱交換させることKよシ上記目的
を達成しうることを確認し、本発明を完成するに至った
Therefore, the inventors of the present invention decided to make it small and prevent gas leakage.
As a result of intensive research into the development of the recovery reheating method, we found that two liquid heat carriers are used as heat storage bodies, and the liquid heat carriers are directly heat exchanged with untreated gas and/or treated gas, and each liquid heat carrier is It has been confirmed that the above object can be achieved by performing heat exchange upwardly and indirectly, and the present invention has been completed.

すなわち本発明は排煙脱硫処理ガスを再加熱する方法に
おいて、未処理ガスの冷却部と間接熱交部との間を循環
する第1の液体熱媒体と、処理ガスの加熱部と前記間接
熱交換部との間を循環する第2の液体熱媒体とを、前記
間接熱交部で熱交換させるとともに、未処理ガスの冷却
部、処理ガスの加熱部においては、前記液体熱媒体を未
処理ガス、処理ガスのいずれか一方まえは両方と直接接
触させることを特徴とする排煙脱硫処理ガスの再加熱方
法を要旨とする本のである。
That is, the present invention provides a method for reheating flue gas desulfurization treatment gas, in which a first liquid heat medium circulates between an untreated gas cooling section and an indirect heat exchange section, and a first liquid heat medium that circulates between a treatment gas heating section and the indirect heat exchanger. The indirect heat exchanger exchanges heat with the second liquid heat medium that circulates between the exchanger and the second liquid heat carrier, and the untreated liquid heat carrier is heated in the untreated gas cooling section and the treated gas heating section. This book provides a summary of a method for reheating flue gas desulfurization processing gas, which is characterized by direct contact with either gas or processing gas beforehand.

以下、本発明を図面を参照しながら詳述する。Hereinafter, the present invention will be explained in detail with reference to the drawings.

第1図は二つの液体熱媒体を未処理ガス及び処理ガスと
直接熱交換させる場合のフローである。
FIG. 1 is a flowchart in which two liquid heat carriers are directly heat exchanged with an untreated gas and a treated gas.

第1図にお−て高温未処理ガス1Fi、第1熱媒接触装
置11にお−て第1低温熱媒体3!と直接接触して高温
未処理ガス1は温度低下し低温未処理ガス1′とな抄、
第1低温熱媒体s1は温度上昇して第1高温熱媒体酊と
なる。第1高温熱媒体ぢは間接熱交換器20に導かれて
、と\で第2低拳塾媒体ちと熱交換し、第1高温熱媒体
3ζは温度低下し第1低温熱媒体ちとID、−力筒2低
温熱媒体−は温度上昇して第2高温熱媒体6となる。
In FIG. 1, the high temperature untreated gas 1Fi, the first low temperature heat medium 3 in the first heat medium contactor 11! The temperature of the high-temperature untreated gas 1 decreases by direct contact with the low-temperature untreated gas 1',
The temperature of the first low-temperature heat medium s1 increases and becomes the first high-temperature heat medium. The first high-temperature heat medium 3ζ is guided to the indirect heat exchanger 20 and exchanges heat with the second low-temperature heat medium 3ζ at The temperature of the power cylinder 2 low-temperature heat medium rises and becomes the second high-temperature heat medium 6.

次いで第2高温熱媒体編は第2熱媒接触装置13におい
て低温処理ガス2と直接接触し、第2高温熱媒体編は温
度像下しポンプ21によ抄前述の系を循環させられ、低
温処理ガス2は温度上昇して高温処理ガス2′となる。
Next, the second high-temperature heat carrier is brought into direct contact with the low-temperature processing gas 2 in the second heat-medium contacting device 13, and the second high-temperature heat carrier is circulated through the above-mentioned system by the temperature lowering pump 21, and is then heated to a low temperature. The temperature of the processing gas 2 increases to become a high temperature processing gas 2'.

間接熱交換器20を出る第1低温熱媒体31は沈殿槽1
4$1C導かれて静置され、高温未処理ガス1の冷却と
同時に同ガス1よ)除去し大ダストを沈殿させられる。
The first low-temperature heat medium 31 exiting the indirect heat exchanger 20 is in the settling tank 1
4$1C is introduced and left to stand still, and at the same time the high temperature untreated gas 1 is cooled, the same gas 1) is removed and large dust is precipitated.

沈殿槽14の上澄液である第1低温熱媒体り社ポンプ1
5によシ第1熱媒接触装置11に一環させられる。
The first low-temperature heat transfer pump 1 is the supernatant liquid of the settling tank 14.
5, it is integrated into the first heat medium contacting device 11.

沈殿槽14におけゐ沈殿液4は、例えば遠心分離機のよ
うな固液分離装置14にお−て分離ダスト5を分離し先
後、分離液6はリターンポンプ17により沈殿槽14に
返送される。
The sedimentation liquid 4 in the sedimentation tank 14 is separated from the separated dust 5 by a solid-liquid separator 14 such as a centrifuge, and then the separated liquid 6 is returned to the sedimentation tank 14 by a return pump 17. .

第1、第2熱媒接触装置として社、液とガスの接触面積
の多いものならばどのような型式でもよく、例えばスプ
レー塔、ベンチュリ・充填塔、棚段塔などいずれでもよ
い。いずれの装置で本ガス側にはミストの同伴があるの
で、ギストセパレータ18.1?でミストを回収し、副
液液管7.8で熱媒接触装置11.15と返送するよう
Kするのがよい。
The first and second heat medium contactors may be of any type as long as they have a large contact area between liquid and gas, such as spray towers, venturi-packed towers, tray towers, etc. In either device, mist is entrained on the main gas side, so the gist separator 18.1? It is preferable to collect the mist at the auxiliary liquid pipe 7.8 and return it to the heat medium contactor 11.15 through the sub-liquid pipe 7.8.

熱媒体としては、高温未処理ガス入口温f(120〜1
60℃)で沸騰しな−ことを量低条件とし、この温度に
シーで蒸気圧が低−はど好ましい、この条件に適合する
ものとしては、2−インプロビルナフタレンのようなア
ルキル−ナフタレ/系の有機系熱媒体があげられる。
As a heat medium, a high temperature untreated gas inlet temperature f (120 to 1
60°C), and it is preferable to boil at this temperature and have a low vapor pressure. Examples include organic heat carriers.

以上説明したように二つの液体熱媒体を中間媒体として
、未処理ガスと処理ガスの熱交換がなされ、両ガスは直
接接触することがないので処理ガス儒(未処理ガスが漏
洩することは完全に防止することができゐ。
As explained above, heat exchange between the untreated gas and the treated gas is performed using two liquid heat carriers as an intermediate medium, and since the two gases do not come into direct contact with each other, the treated gas leakage (leaking of the untreated gas is completely prevented). can be prevented.

上記第1図のフローの変形として、第2図に示すような
フローにすることもできる。
As a modification of the flow shown in FIG. 1, the flow shown in FIG. 2 may be used.

すなわち、第1液体熱媒体中に未処理ガスからダストが
入ることを避ける場合には、高温未処理ガス1と第1低
温熱媒体−との接触は間接熱交換装置22による間接熱
交換方式を採り、低温@11ガス2と第1高温熱媒体編
との接触は、第1図のフローと同様直接熱交換方式とす
ればよ−、このような方式にすると、第1図の沈殿槽1
4tわ)の装置が省略しうる効果がある。
That is, in order to avoid dust from entering the first liquid heat medium from the untreated gas, the contact between the high temperature untreated gas 1 and the first low temperature heat medium is performed using an indirect heat exchange method using the indirect heat exchange device 22. The contact between the low-temperature @11 gas 2 and the first high-temperature heat transfer medium can be done by a direct heat exchange method similar to the flow shown in Figure 1.
This has the advantage that 4 tons of equipment can be omitted.

なお第2図中、第1図と同一符号は第1図と同一部分を
表わす。
Note that in FIG. 2, the same reference numerals as in FIG. 1 represent the same parts as in FIG. 1.

実施例 第2図の70−に従って、1!$2’eの高温未処理ガ
x 5!$1500 Myl/b  と65℃の水18
5500に−とを間接接触適せ九とζろ、未処lガスの
温度は?O’eK低下し、水は10!’tになつ九、こ
の105℃の水を、56℃の2−イソプロビルナフタレ
)/ !I?44110 ktv/に+と間接熱交換さ
せたところ水Fi65℃罠な抄、2−インプロピルナフ
タレンは96℃となった。との96℃の2−イソプロピ
ルナフタレン(394680k7 )と51.8℃の低
温処理ガス548300 Mrl/h  と直接接触さ
せたところ、2−イソプロピルナフタレンFi56℃に
な抄、処理ガスは92.9℃に加熱された。
According to 70- in FIG. 2 of the embodiment, 1! $2'e high temperature untreated moth x 5! $1500 Myl/b and 65℃ water18
What is the temperature of the untreated l gas when 5500 and - are brought into indirect contact with 9 and ζ? O'eK has dropped and water is 10! 't becomes nine, convert this 105℃ water into 56℃ 2-isoprobylnaphthalene)/! I? When indirect heat exchange was performed with + at 44110 ktv/, the water temperature was 65°C, and the temperature of 2-inpropylnaphthalene was 96°C. When 2-isopropylnaphthalene (394,680k7) at 96°C was brought into direct contact with 548,300 Mrl/h of low temperature processing gas at 51.8°C, 2-isopropylnaphthalene (394,680k7) at 96°C was brought into contact with 2-isopropylnaphthalene at 56°C, and the processing gas was heated to 92.9°C. heated.

以上、説明した通シ、本発明によシ (1)熱媒体を直接ガスと熱交換することKより処理ガ
スの再加熱系が、コンパクト、低コストになる。
As described above, according to the present invention, (1) the heat medium is directly exchanged with the gas, so that the processing gas reheating system becomes compact and low cost.

(2)16理ガスの処理ガス側への漏洩がな−という効
果が奏され、本発明は特に石炭焚排煙脱硫処理ガスの再
加熱手段として工業的に極めて有意義な方法である。
(2) The present invention has the effect that there is no leakage of the 16 process gas to the process gas side, and the present invention is an industrially extremely significant method, especially as a means for reheating coal-fired flue gas desulfurization process gas.

【図面の簡単な説明】[Brief explanation of the drawing]

第1.2図と本本発明の実施態様のフ四−を示すもので
ある。 復代理人  内 1)  明 榎代理人  奪 原 亮 −
FIG. 1.2 shows a diagram of an embodiment of the present invention. Sub-agents 1) Myoki agent Ryo Hara -

Claims (1)

【特許請求の範囲】[Claims] (1)  排煙脱硫処理ガスを再加熱する方法において
、未処理ガスの冷却部と間接熱交部との間を循環する第
1の液体熱媒体と、処理ガスの加熱部と前記間接熱交換
部との間を循環する第2の液体熱媒体とを、前記間接熱
交部で熱交換させるとともに1未処理ガスの冷却部、処
理ガスの加熱部にシいては、前記液体熱媒体を未処理ガ
ス、処理ガスのいずれか一方または両方と直接接触させ
ることを特徴とする排煙脱硫処理ガスの再加熱方法。
(1) In a method for reheating flue gas desulfurization treatment gas, the first liquid heat medium circulates between the untreated gas cooling section and the indirect heat exchange section, and the treatment gas heating section and the indirect heat exchange section. In the indirect heat exchanger section, the liquid heat medium is exchanged with the second liquid heat medium circulating between the untreated gas cooling section and the treated gas heating section. A method for reheating flue gas desulfurization processing gas, the method comprising direct contact with the processing gas, one or both of the processing gases.
JP56138641A 1981-09-04 1981-09-04 Reheating method for desulphurized waste gas Pending JPS5840421A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56138641A JPS5840421A (en) 1981-09-04 1981-09-04 Reheating method for desulphurized waste gas

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56138641A JPS5840421A (en) 1981-09-04 1981-09-04 Reheating method for desulphurized waste gas

Publications (1)

Publication Number Publication Date
JPS5840421A true JPS5840421A (en) 1983-03-09

Family

ID=15226759

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56138641A Pending JPS5840421A (en) 1981-09-04 1981-09-04 Reheating method for desulphurized waste gas

Country Status (1)

Country Link
JP (1) JPS5840421A (en)

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