JPS5838892B2 - Mizubun Sangata Go Seijyu Shivarnish Omochiitadenchiyakuzetsuendensenno Seizouhouhou - Google Patents

Mizubun Sangata Go Seijyu Shivarnish Omochiitadenchiyakuzetsuendensenno Seizouhouhou

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Publication number
JPS5838892B2
JPS5838892B2 JP2666075A JP2666075A JPS5838892B2 JP S5838892 B2 JPS5838892 B2 JP S5838892B2 JP 2666075 A JP2666075 A JP 2666075A JP 2666075 A JP2666075 A JP 2666075A JP S5838892 B2 JPS5838892 B2 JP S5838892B2
Authority
JP
Japan
Prior art keywords
water
film
electrodeposited
synthetic resin
dispersed synthetic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP2666075A
Other languages
Japanese (ja)
Other versions
JPS51101879A (en
Inventor
文彦 佐藤
恭一 柴山
良純 藤井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
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Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP2666075A priority Critical patent/JPS5838892B2/en
Publication of JPS51101879A publication Critical patent/JPS51101879A/en
Publication of JPS5838892B2 publication Critical patent/JPS5838892B2/en
Expired legal-status Critical Current

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Description

【発明の詳細な説明】 この発明は電着塗装法を用いた絶縁電線の製造方法に関
し、さらに詳しくは、水分散形合成樹脂ワニスな用いて
電気泳動により、導電体を被覆した後、皮膜形成を容易
にさせるために−たん該水分散形合成樹脂ワニスの最低
皮膜形成温度以上で加熱し、上記樹脂層中の水分を一部
蒸発させることによって表面皮膜を形成させ、さらに、
樹脂層が電着された導体の断面積の10倍から250倍
の断面積をもつ管内で該水分散形合威樹脂ワニスの最低
皮膜形成温度以上の高温で加熱し、絶縁皮膜形成を完了
する電着絶縁電線の製造方法である。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing an insulated wire using an electrodeposition coating method. In order to facilitate this, a surface film is formed by heating the water-dispersed synthetic resin varnish above the minimum film-forming temperature to evaporate part of the water in the resin layer, and further,
The resin layer is heated in a tube having a cross-sectional area 10 to 250 times larger than the cross-sectional area of the conductor to which the resin layer is electrodeposited at a high temperature higher than the lowest film-forming temperature of the water-dispersed Hewei resin varnish to complete the formation of the insulating film. This is a method for manufacturing an electrodeposited insulated wire.

電着塗装法を用い水分散形合成樹脂ワニスを導電材に電
着して絶縁皮膜を行なう場合電着析出層内に多量の水分
が存在することによりこの電着皮膜の形成性は周囲の環
境条件に著しく影響される。
When forming an insulating film by electrodepositing a water-dispersed synthetic resin varnish onto a conductive material using the electrodeposition coating method, the formation of this electrodeposited film is affected by the surrounding environment due to the presence of a large amount of water in the electrodeposited layer. Significantly influenced by conditions.

すなわち雰囲気温度が低い場合、水分散形合威樹脂粒子
の相互凝集・融着が十分行なわれず皮膜の形成性は悪い
That is, when the ambient temperature is low, the water-dispersed composite resin particles do not sufficiently coagulate and fuse with each other, resulting in poor film formation.

したがってレベリング(皮膜表面の平滑性)も悪い。Therefore, leveling (smoothness of the film surface) is also poor.

これに対し雰囲気温度が高すぎると水分散形合成樹脂粒
子の相互凝集・融着が促進され、皮膜形成が速みやかに
行なわれるが、樹脂層内の水分が完全に蒸発しきらない
内に表面層に皮膜が形成されるので発泡が著しく起り、
良好な皮膜を得ることができない。
On the other hand, if the ambient temperature is too high, mutual aggregation and fusion of water-dispersed synthetic resin particles will be promoted, and film formation will occur quickly, but the water in the resin layer will not completely evaporate. As a film is formed on the surface layer, foaming occurs significantly,
A good film cannot be obtained.

これらのため高温度で連続皮膜を形成させるには雰囲気
温度と皮膜の乾燥速度を同時に巧みに制御する必要があ
るが、長尺の水分散形合成樹脂電着(絶縁)電線を製造
する場合にはその条件設定が非常に難かしく工業化に至
っていない。
For these reasons, in order to form a continuous film at high temperatures, it is necessary to skillfully control both the ambient temperature and the drying rate of the film at the same time. It has not been industrialized because it is very difficult to set the conditions.

このため従来よう電着塗装法を用いて水分散形合成樹脂
ワニスを導電材に電着して絶縁皮膜を行なう場合、皮膜
形成助剤として有機溶剤を用いることが必要となってい
た。
For this reason, when forming an insulating film by electrodepositing a water-dispersed synthetic resin varnish onto a conductive material using the conventional electrodeposition coating method, it has been necessary to use an organic solvent as a film-forming aid.

この有機溶剤を回収することによって経済性、無公害化
を高めることができるが完全な回収は困難で、やはり、
かかる従来の有機溶剤を用いる方法は、製品単価の低廉
化、節資源、無公害化の観点から好1しくはないことは
明白である。
By recovering this organic solvent, it is possible to improve economic efficiency and eliminate pollution, but complete recovery is difficult.
It is clear that such a conventional method using an organic solvent is not preferable from the viewpoint of reducing the unit price of the product, saving resources, and eliminating pollution.

この発明は、従来、工業的に事実上不可能であった皮膜
形成助剤を用いない絶縁電線の製造を可能にしたもので
、製品単価の低廉化、節資源、無公害化を目的とした新
規な絶縁電線製造方法である。
This invention made it possible to manufacture insulated wires without the use of film-forming aids, which had previously been virtually impossible industrially. This is a new method for manufacturing insulated wires.

すなわち電着塗装法を用いて水分散形合成樹脂ワニスな
導電材に電着した後、−たん該水分散形合成樹脂ワニス
の最低皮膜形成温度以上で加熱し電着皮膜中の水の一部
を短時間で蒸発させることにより表皮に半透明状の平滑
な薄膜を形成させ、さらに該水分散形合成樹脂ワニスの
最低皮膜形成温度以上に加熱された管内を通し皮膜を形
成させる。
That is, after electrodeposition is performed on a conductive material such as a water-dispersed synthetic resin varnish using an electrodeposition coating method, the water-dispersed synthetic resin varnish is heated to a temperature higher than the minimum film-forming temperature of the water-dispersed synthetic resin varnish to remove some of the water in the electrodeposited film. is evaporated in a short period of time to form a translucent, smooth thin film on the epidermis, and then passed through a tube heated above the lowest film-forming temperature of the water-dispersed synthetic resin varnish to form a film.

この加熱された管内では電着皮膜から蒸発した水蒸気が
充満しており、したがって電着皮膜中の水は徐々に蒸発
し、急激な水の蒸発による発泡を抑制しながら皮膜形成
を促進させ、かつ同時に水分散形合成樹脂ワニス粒子の
凝集・融着も起り、均一な連続皮膜形成が完了する。
This heated tube is filled with water vapor that has evaporated from the electrodeposited film, so the water in the electrodeposited film gradually evaporates, promoting film formation while suppressing foaming caused by rapid water evaporation. At the same time, agglomeration and fusion of the water-dispersed synthetic resin varnish particles also occur, completing the formation of a uniform continuous film.

かくして皮膜形成助剤である有機溶剤を用いずに良好な
水分散形合成樹脂電着絶縁電線を得ることができる。
In this way, a good water-dispersed synthetic resin electrodeposited insulated wire can be obtained without using an organic solvent as a film-forming aid.

上記のようにこの発明は1ず電着皮膜の表皮膜を形成せ
しめ、さらに皮膜内部の水を徐々に蒸発させることによ
って皮膜形成を完了する二段階の工程をもってなること
を特徴とする。
As described above, the present invention is characterized by a two-step process of first forming a surface film of an electrodeposited film, and then completing the film formation by gradually evaporating the water inside the film.

又、この発明を構成する管の材質は耐熱材であれば特に
限定しないが、一般にガラス、金属などが用いられる。
Further, the material of the tube constituting the present invention is not particularly limited as long as it is a heat-resistant material, but glass, metal, etc. are generally used.

第1図は従来の製造装置の概略構成図で、1は矢印入方
向に引かれている長尺の導電材、2は焼鈍炉、3は前処
理槽、4は電着槽、5は皮膜形成助剤施与部、6は予備
加熱硬化部、7は最終加熱硬化部である。
Figure 1 is a schematic configuration diagram of a conventional manufacturing apparatus, in which 1 is a long conductive material drawn in the direction of the arrow, 2 is an annealing furnace, 3 is a pretreatment tank, 4 is an electrodeposition tank, and 5 is a coating film. A forming aid application section, 6 a preheat curing section, and 7 a final heat curing section.

このように構成された装置では、絶縁被覆を施さんする
長尺の導電材1は1ず焼鈍炉2内を走行せることによっ
て加工性が高められ、ついで前処理槽3内を通されて表
面が洗浄され、ついで水分散形合成樹脂ワニスが満なさ
れた電着槽4内に、1.−して樹脂層が電着され、つい
で皮膜形成助剤施与部5において気体状または液体状の
皮膜形成助剤が施与され、次の予備加熱硬化部6におい
て加熱されて揮発分の大部分が気化蒸発し、さらに最終
加熱硬化部7内で加熱されて絶縁皮膜が完成する。
In the apparatus configured as described above, the long conductive material 1 to be coated with an insulating coating is first run through an annealing furnace 2 to improve workability, and then passed through a pretreatment tank 3 to coat the surface. 1. was washed and then placed in the electrodeposition tank 4 filled with water-dispersed synthetic resin varnish. - A resin layer is electrodeposited, and then a gaseous or liquid film forming aid is applied in a film forming aid applying section 5, and heated in the next preheating and curing section 6 to increase the volatile content. The portion is vaporized and further heated in the final heat curing section 7 to complete the insulating film.

このような構成から戊る従来の方法では、皮膜形成助剤
施与部5、予備加熱硬化部6の画部分において気化蒸発
する形で皮膜形成助剤が消費され、経済性と無公害化を
損う原因となっていた。
In the conventional method based on such a structure, the film forming aid is consumed in the form of vaporization in the film forming aid applying section 5 and the preheating and curing section 6, making it economical and non-polluting. It was causing a loss.

第2図はこの発明の一実施例の概略構成図で8は予備加
熱乾燥部、9は管を組入れた加熱乾燥部である。
FIG. 2 is a schematic diagram of an embodiment of the present invention, in which 8 is a preliminary heating drying section, and 9 is a heating drying section incorporating a tube.

第3図は管を組入れた加熱乾燥部の構成を説明するため
の概略構成図で、9aは加熱炉、9bはガラスあるいは
金属等でできた管である。
FIG. 3 is a schematic configuration diagram for explaining the configuration of a heating drying section incorporating a tube, where 9a is a heating furnace, and 9b is a tube made of glass, metal, or the like.

この管の内径は走行する導電材1の線径によっても異な
るが通常10(mviφ)〜50 (mythφ)程度
のものが用いられる。
Although the inner diameter of this tube varies depending on the wire diameter of the conductive material 1 running, it is usually about 10 (mviφ) to 50 (mythφ).

1ず電着された樹脂皮膜を有する導電材1は予備加熱乾
燥部8内で電着皮膜中の表皮の水の一部を蒸発により失
い、半透明状の薄膜を形成する。
First, the electrically conductive material 1 having the electrodeposited resin film loses a part of the surface water in the electrodeposited film by evaporation in the preheating drying section 8 to form a translucent thin film.

導電材1はさらに加熱されたガラスあるいは金属等でで
きた管9bへと入っていくが、ここで、電着皮膜中の残
りの水は管内の水蒸気圧のために急激に蒸発することな
く徐々に蒸発し皮膜が形成されて、次の最終加熱硬化炉
7で硬化され皮膜形成を完了する。
The conductive material 1 further enters a tube 9b made of heated glass or metal, but here, the remaining water in the electrodeposited film does not evaporate rapidly due to the water vapor pressure inside the tube, but gradually evaporates. It evaporates to form a film, which is then cured in the final heating and curing furnace 7 to complete the film formation.

このように、従来不可欠とされてきた皮膜形成助剤施与
法を用いることなく簡単な装置で水分散形合成樹脂電着
絶縁電線の製造が可能となった。
In this way, it has become possible to produce a water-dispersed synthetic resin electrodeposited insulated wire using a simple device without using the conventional method of applying a film-forming aid, which has been considered indispensable.

次に従来法による比較例と、この発明の実施例とを挙げ
てこの発明の効果を示す。
Next, the effects of the present invention will be illustrated by giving comparative examples based on the conventional method and examples of the present invention.

比較例 1 スチレン45部(重量部、以下同様)、アクリル酸メチ
ル45部、グリシジルメタクリレート5部、メタクリル
酸5部、イオン交換水200部、ラウルル硫酸エステル
ソーダ2部、過硫酸カリウム0.1部、亜硫酸水素す)
IJウム0.033部を重合容器に入れ、この混合物
をチッ素流下で30分間攪拌した。
Comparative Example 1 45 parts of styrene (parts by weight, the same applies hereinafter), 45 parts of methyl acrylate, 5 parts of glycidyl methacrylate, 5 parts of methacrylic acid, 200 parts of ion-exchanged water, 2 parts of sodium raul sulfate, 0.1 part of potassium persulfate. , hydrogen sulfite)
0.033 part of IJum was placed in a polymerization vessel, and the mixture was stirred for 30 minutes under a nitrogen stream.

ついで50〜60℃の温度で攪拌しながら4時間反応さ
せることにより水分散形合成樹脂ワニスを得た。
Then, a water-dispersed synthetic resin varnish was obtained by reacting for 4 hours while stirring at a temperature of 50 to 60°C.

この水分散形合成樹脂ワニスを長さ50cmの電着槽に
入れ、0.3φの裸銅線と対向電極の間に直流電圧2v
を印加し、線速18m/分で走らせ、つづいて長さ30
cmの皮膜形成助剤浸漬槽に送り、N、N−ジメチルホ
ルムアミド(DMF)を1.2秒間浸漬した後加熱硬化
し、仕上ジ皮膜厚25μの良好な絶縁電線を得た。
This water-dispersed synthetic resin varnish was placed in an electrodeposition tank with a length of 50 cm, and a DC voltage of 2 V was applied between the 0.3φ bare copper wire and the counter electrode.
was applied and run at a linear speed of 18 m/min, followed by a length of 30 m/min.
The wire was sent to a film-forming aid dipping bath with a diameter of 1.5 cm, and after being dipped in N,N-dimethylformamide (DMF) for 1.2 seconds, it was cured by heating to obtain a good insulated wire with a finished film thickness of 25 μm.

実施例 1 比較例1のワニスな用い、第2図の構成を備えた装置で
直流電圧2■を印加し、線速18m/分で走らせ、つづ
いて120℃に保たれた予備加熱乾燥部中を4秒間通し
、さらに150℃に保たれた、内径3CrfLのガラス
管を組入れた加熱乾燥部中を8秒間通し、さらに加熱硬
化させ、仕上り皮膜厚25μの良好な絶縁電線を得た。
Example 1 Using the varnish of Comparative Example 1, a DC voltage of 2 cm was applied using an apparatus having the configuration shown in Fig. 2, and the varnish was run at a linear speed of 18 m/min. was passed through for 4 seconds, and then passed through a heating drying section maintained at 150° C. and incorporating a glass tube with an inner diameter of 3 CrfL for 8 seconds, and then heated and cured to obtain a good insulated wire with a finished coating thickness of 25 μm.

実施例 2 アクリロニトリル53部、スチレン27部、エチルアク
リレート9部、メタクリル酸5部、グリシジルメタクリ
レート5部を成分とする水分散形合成樹脂ワニスを比較
例1と同様にして得た。
Example 2 A water-dispersed synthetic resin varnish containing 53 parts of acrylonitrile, 27 parts of styrene, 9 parts of ethyl acrylate, 5 parts of methacrylic acid, and 5 parts of glycidyl methacrylate was obtained in the same manner as in Comparative Example 1.

このワニスな第2図の構成を備えた装置で直流電圧未来
2.5Vを印加し、線速20m/分で走らせ、つづいて
130℃に保たれた予備加熱乾燥部中を3秒間通し、さ
らに150℃に保たれた内径3cIrLのガラス管を組
入れた加熱乾燥部中を8秒間涌し、さらに加熱硬化させ
、仕上り皮膜厚26μの良好な絶縁電線を得た。
A DC voltage of 2.5 V was applied to this varnish device with the configuration shown in Figure 2, and it was run at a linear speed of 20 m/min, then passed through a preheated drying section kept at 130°C for 3 seconds, and then The wire was soaked for 8 seconds in a heat drying section containing a glass tube with an inner diameter of 3 cIrL kept at 150° C., and then heated and cured to obtain a good insulated wire with a finished coating thickness of 26 μm.

比較例1、および実施例1,2で製造した電線の特性は
表1に示す。
The characteristics of the electric wires manufactured in Comparative Example 1 and Examples 1 and 2 are shown in Table 1.

表1から明らかなように、この発明による方法で製造さ
れた絶縁電線の特性は従来法によるものと比較して伺等
遜色のないものである。
As is clear from Table 1, the characteristics of the insulated wire produced by the method according to the present invention are comparable to those produced by the conventional method.

なおこの発明が適用できる電着ワニスは上記の実施例に
限られるものではなく、一般に用いられる水分散形合成
樹脂ワニスで良し。
The electrodeposition varnish to which this invention can be applied is not limited to the above embodiments, and any commonly used water-dispersed synthetic resin varnish may be used.

この発明は以上説明したように、皮膜形成助剤を用いず
にしかも簡単な装置で、従来法と比較して何等遜色のな
い絶縁電線を得る新規な方法で、製品単価の低廉化とと
もに無公害化を図ることができるという、実用上大きな
有利点をもつものである。
As explained above, this invention is a new method for obtaining an insulated wire that is comparable to conventional methods without using film-forming aids and with a simple device, and is non-polluting while reducing the unit price of the product. This has a great practical advantage in that it can be used for various purposes.

尚、以上の説明では横型の電着絶縁電線の製造装置につ
いて記載しているが、この発明は竪型あるいはそれに準
する装置についても適用できるものである。
In the above description, a horizontal type electrodeposited insulated wire manufacturing apparatus has been described, but the present invention can also be applied to a vertical type or similar apparatus.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来の水分散形合成樹脂ワニスを用いた絶縁電
線の製造方法を示す装置の概略構成図、第2図はこの発
明の方法を用いる一実施例の概略構成図、第3図は第2
図における管を組入れた加熱乾燥装置の構成図の一例で
ある。 図において1は導電材、2は焼鈍炉、3は前処理槽、4
は電着槽、5は皮膜形成助剤施与部、6は予備加熱硬化
部、7は最紙加熱硬化部、8は予備加熱乾燥部、9は管
を組入れた加熱乾燥部、9aは加熱炉、9bはガラスあ
るいは金属等でできた管である。 な釦図中同−符号はそれぞれ同−lたは相当部分を示す
Fig. 1 is a schematic block diagram of an apparatus showing a conventional method for manufacturing insulated wires using water-dispersed synthetic resin varnish, Fig. 2 is a schematic block diagram of an embodiment using the method of the present invention, and Fig. 3 is Second
It is an example of the block diagram of the heating drying apparatus incorporating the pipe|tube in a figure. In the figure, 1 is a conductive material, 2 is an annealing furnace, 3 is a pretreatment tank, and 4
5 is an electrodeposition tank, 5 is a film forming aid application part, 6 is a preheat curing part, 7 is a paper heating curing part, 8 is a preheat drying part, 9 is a heat drying part incorporating a tube, and 9a is a heating part. The furnace 9b is a tube made of glass or metal. The same symbols in the button diagrams indicate the same or equivalent parts, respectively.

Claims (1)

【特許請求の範囲】[Claims] 1 水分散形合成樹脂ワニスな用いて電気泳動法により
導体上に樹脂層を電着させ、これを加熱して絶縁皮膜を
形成させる際し、上記樹脂層が電着された導体を−たん
該水分散形合成樹脂ワニスの最低皮膜形式温度以上で短
時間加熱し、上記樹脂層中に存在する水を一部蒸発させ
ることによって表面皮膜を形成させる工程と、上記樹脂
層が電着された導体の断面積の10倍から250倍の断
面積をもつ管内で該水分散形合成樹脂ワニスの最低皮膜
形成温度以上の高温で加熱する工程とを含んでなる水分
散形合成樹脂電着絶縁電線の製造方法。
1. When a resin layer is electrodeposited on a conductor by electrophoresis using a water-dispersed synthetic resin varnish and then heated to form an insulating film, the conductor on which the resin layer has been electrodeposited is A step of forming a surface film by heating the water-dispersed synthetic resin varnish for a short time at a temperature higher than the lowest film-forming temperature to partially evaporate the water present in the resin layer, and a conductor on which the resin layer is electrodeposited. heating the water-dispersed synthetic resin electrodeposited insulated wire at a high temperature higher than the lowest film forming temperature of the water-dispersed synthetic resin varnish in a tube having a cross-sectional area of 10 to 250 times the cross-sectional area of the water-dispersed synthetic resin electrodeposited wire. Production method.
JP2666075A 1975-03-04 1975-03-04 Mizubun Sangata Go Seijyu Shivarnish Omochiitadenchiyakuzetsuendensenno Seizouhouhou Expired JPS5838892B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2666075A JPS5838892B2 (en) 1975-03-04 1975-03-04 Mizubun Sangata Go Seijyu Shivarnish Omochiitadenchiyakuzetsuendensenno Seizouhouhou

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2666075A JPS5838892B2 (en) 1975-03-04 1975-03-04 Mizubun Sangata Go Seijyu Shivarnish Omochiitadenchiyakuzetsuendensenno Seizouhouhou

Publications (2)

Publication Number Publication Date
JPS51101879A JPS51101879A (en) 1976-09-08
JPS5838892B2 true JPS5838892B2 (en) 1983-08-26

Family

ID=12199565

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2666075A Expired JPS5838892B2 (en) 1975-03-04 1975-03-04 Mizubun Sangata Go Seijyu Shivarnish Omochiitadenchiyakuzetsuendensenno Seizouhouhou

Country Status (1)

Country Link
JP (1) JPS5838892B2 (en)

Also Published As

Publication number Publication date
JPS51101879A (en) 1976-09-08

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