JPS5832446B2 - Manufacturing method of image pickup tube target - Google Patents
Manufacturing method of image pickup tube targetInfo
- Publication number
- JPS5832446B2 JPS5832446B2 JP52126141A JP12614177A JPS5832446B2 JP S5832446 B2 JPS5832446 B2 JP S5832446B2 JP 52126141 A JP52126141 A JP 52126141A JP 12614177 A JP12614177 A JP 12614177A JP S5832446 B2 JPS5832446 B2 JP S5832446B2
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- film
- filter
- forming
- transparent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Optical Filters (AREA)
- Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
- Image-Pickup Tubes, Image-Amplification Tubes, And Storage Tubes (AREA)
Description
【発明の詳細な説明】
本発明は、色分解線条フィルタを備えた小形カラーテレ
ビカメラに最適なカラーテレビジョン用等の撮像管ター
ゲットの製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing an image pickup tube target for color television, etc., which is most suitable for a small color television camera equipped with a color separation line filter.
一般に、色分解線条フィルタを備えたカラーテレビジョ
ン用撮像管は、透光性基板と透明電極との間に種々の方
法で色分解線条フィルタを介在させ、次に透明電極上に
光導電膜を形成した色分解線条フィルタ内蔵ターゲット
部と、電子銃部とを管内に真空封止して構成される。In general, a color television image pickup tube equipped with a color-separating striped filter includes a color-separating striped filter interposed between a light-transmitting substrate and a transparent electrode using various methods, and then a photoconductive layer is placed on the transparent electrode. It is constructed by vacuum-sealing a target part with a built-in color separation line filter on which a film is formed and an electron gun part in a tube.
さらに、色分解線条フィルタ内蔵ターゲット部の構造お
よび製造方法について詳述する。Furthermore, the structure and manufacturing method of the target section with a built-in color separation line filter will be described in detail.
従来の色分解線条フィルタ内蔵ターゲット部の構造を第
1図に示す。The structure of a conventional target section with a built-in color separation line filter is shown in FIG.
第1図において、11は透光性基板で線膨張係数45
X 10−7/℃のE−2ガラス(市原光学社製)や、
線膨張係数
46 X 10−7/’Cの7059ガラス(コーハン
グ社製)等が用いられている。In Figure 1, 11 is a transparent substrate with a linear expansion coefficient of 45.
E-2 glass (manufactured by Ichihara Kogaku Co., Ltd.) with a temperature of X 10-7/°C,
7059 glass (manufactured by Kohang Co., Ltd.) having a linear expansion coefficient of 46 x 10-7/'C is used.
12は色分解線条フィルタである。12 is a color separation line filter.
13は透光性薄膜で線膨張係数5、5 X 10−7/
℃の石英ガラスが主に用いられている。13 is a transparent thin film with a linear expansion coefficient of 5, 5 x 10-7/
℃ quartz glass is mainly used.
透光性薄膜13が熱歪によりクラックを生じるような場
合、透光性基板11と同種のガラスが用いられる。If the transparent thin film 13 cracks due to thermal strain, the same type of glass as the transparent substrate 11 is used.
14は透明電極で、S n 02やIn2O3膜等が用
いられている。14 is a transparent electrode, and S n 02, In2O3 film, etc. are used.
15は光導電膜でSb2S3膜が用いられている。15 is a photoconductive film, and an Sb2S3 film is used.
次に、上記従来構造の製造方法について述べる。Next, a method of manufacturing the above conventional structure will be described.
第2図a、bは、その構造および製造工程を示したもの
である。Figures 2a and 2b show its structure and manufacturing process.
構造の各部の番号は、第1図示の各部の番号と対応して
いる。The number of each part of the structure corresponds to the number of each part shown in the first diagram.
まずイの色分解線条フィルタの形成工程で透光性基板1
1上に蒸着法とIC技術を用いて色分解線条フィルタ1
2を形成する。First, in the process of forming the color separation line filter in A.
Color separation line filter 1 is fabricated using vapor deposition method and IC technology on 1.
form 2.
次に口の透光性薄膜の形成工程で、透光性薄膜13を電
子ビーム蒸着法あるいはスパッタリング法等により、色
分解線条フィルタ12を被覆する。Next, in the step of forming a light-transmitting thin film at the mouth, the color-separating striped filter 12 is covered with a light-transmitting thin film 13 by electron beam evaporation, sputtering, or the like.
次にハの平滑化工程で、透光性薄膜13の表面凹凸を研
摩法などにより平滑化する。Next, in the smoothing step (c), the surface irregularities of the light-transmitting thin film 13 are smoothed by a polishing method or the like.
次に二の透明電極の形成工程で、S n 02膜あるい
はIn2O3膜などの透明導電膜14を吹き付は法ある
いは蒸着法あるいはスパッタリング法などにより形成す
る。Next, in the second step of forming a transparent electrode, a transparent conductive film 14 such as an S n 02 film or an In2O3 film is formed by a spraying method, a vapor deposition method, a sputtering method, or the like.
次にホの光導電膜の形成工程で、5b203の光導電膜
15を蒸着法により、基板温度室温のもとで形成する。Next, in the photoconductive film forming step (e), the photoconductive film 15 of 5b203 is formed by vapor deposition at a substrate temperature of room temperature.
以上のような構造および製造工程によって、従来の色分
解線条フィルタ内蔵ターゲットは得られていた。With the structure and manufacturing process described above, a conventional target with a built-in color separation line filter was obtained.
従来のターゲットにおいて、とくに、
(ZnxCdt−xTe)y(In2Te3)x−yを
含む光導電膜を用いると、製造工程において、この光導
電膜を300〜700℃で熱処理する工程が不可欠のた
め、フィルタ表面の汚れ、フィルタ内部への薬品の吸着
等により透光性薄膜にクラックが発生し、さらにそれが
光導電膜に影響をおよぼして、画質を悪化させたり、暗
電流を増大させる等の問題があり、良好な色分解線条フ
ィルタ内蔵ターゲットは得られなかった。In conventional targets, especially when using a photoconductive film containing (ZnxCdt-xTe)y(In2Te3)x-y, it is essential to heat-treat the photoconductive film at 300 to 700°C in the manufacturing process. Cracks occur in the transparent thin film due to dirt on the filter surface or adsorption of chemicals inside the filter, which in turn affects the photoconductive film, resulting in problems such as deterioration of image quality and increase in dark current. However, a target with a built-in color separation stripe filter could not be obtained.
本発明は、透光性基板上に色分解線条フィルタ、透光性
薄膜、光導電膜を形成する撮像ターゲットにおいて、画
質の悪化、暗電流の増大を防止することのできる製造方
法を提供するものである。The present invention provides a manufacturing method that can prevent deterioration of image quality and increase of dark current in an imaging target in which a color separation striped filter, a transparent thin film, and a photoconductive film are formed on a transparent substrate. It is something.
次に、本発明について述べる。Next, the present invention will be described.
第3図は、本発明の構造を示す色分解線条フィルタ内蔵
ターゲットの断面図である。FIG. 3 is a sectional view of a target with a built-in color separation line filter, showing the structure of the present invention.
図において、31は透光性基板で線膨張係数が56 X
10−7/’C〜ll0XIO−、/’Cである。In the figure, 31 is a transparent substrate with a linear expansion coefficient of 56
10-7/'C~ll0XIO-,/'C.
32は色分解線条フィルタである。32 is a color separation line filter.
33は透光性薄膜で線膨張係数が56 X 1 o−y
℃〜ll0XIO−7℃である。33 is a transparent thin film with a linear expansion coefficient of 56 X 1 o-y
°C to 110XIO-7°C.
34は透明電極である。34 is a transparent electrode.
35は光導電膜で、たとえば(Zn Cd、−Te )
、 (In2Te3 ) IX X
(0≦X≦1)、(0<y≦1)を含んでいる。35 is a photoconductive film, for example (Zn Cd, -Te)
, (In2Te3) IXX (0≦X≦1), (0<y≦1).
なお、第3図の構造において、透光性基板31および透
光性薄膜33ともに線膨張係数をs 6 X 10−’
/’C〜110×10−′//℃とすると画質、暗電流
の点でより好ましい。In the structure shown in FIG. 3, the linear expansion coefficient of both the transparent substrate 31 and the transparent thin film 33 is s 6 X 10-'
/'C to 110 x 10-'//'C is more preferable in terms of image quality and dark current.
第4図a、bは、本発明の製造工程を示した一実施例で
ある。FIGS. 4a and 4b show an embodiment of the manufacturing process of the present invention.
構造の各部の番号は、前記本発明の構造を示す第3図の
各部の番号と対応している。The numbers of each part of the structure correspond to the numbers of each part in FIG. 3 showing the structure of the present invention.
イの色分解線条フィルタの形成工程で、透光性基板31
上に色分解線条フィルタ用材料を蒸着し、IC技術を用
いてフィルタ32をパターン形成する。In the step of forming the color separation striped filter of (a), the transparent substrate 31
A color separation stripe filter material is deposited on top and the filter 32 is patterned using IC technology.
次に口の熱処理工程で、空気中または酸素を含む不活性
ガス中すなわち酸素雰囲気中で300℃〜6000G、
30分〜iso分熱処理を施して、無機材料からなる多
層膜で構成されるフィルタ32の表面の清浄化、吸着成
分の除去等を行う。Next, in the heat treatment process of the mouth, 300°C to 6000G in air or an inert gas containing oxygen, that is, an oxygen atmosphere,
Heat treatment is performed for 30 minutes to iso minutes to clean the surface of the filter 32, which is made of a multilayer film made of inorganic materials, and to remove adsorbed components.
次にへの透光性薄膜の形成工程で、透光性薄膜33をス
パッタリング法により数μ〜10μの厚さに形成する。In the next step of forming a transparent thin film, a transparent thin film 33 is formed to a thickness of several microns to 10 microns by sputtering.
次に二の平滑化工程で、透光性薄膜33の表面凹凸を研
摩法により平滑化する。Next, in a second smoothing step, the surface irregularities of the light-transmitting thin film 33 are smoothed by a polishing method.
次にホの透明電極の形成工程でS n 02膜からなる
透明電極34を吹き付は法により形成する。Next, in the step of forming a transparent electrode (e), a transparent electrode 34 made of an S n 02 film is formed by a spraying method.
次にべの光導電膜の形成工程で、第1層がZn5e膜で
、第2層が(Zn077CdO,3T e )0.95
(I n2 T e3 )0.05からなる光導電膜
35を蒸着法により形成する。Next, in the process of forming a photoconductive film, the first layer is a Zn5e film, and the second layer is a (Zn077CdO,3T e )0.95
A photoconductive film 35 made of (I n2 T e3 )0.05 is formed by vapor deposition.
次にトの熱処理工程で、真空中550℃数分〜数十分間
熱処理する。Next, in the heat treatment step (g), heat treatment is performed at 550° C. for several minutes to several tens of minutes in a vacuum.
以上のようにして撮像管ターゲットは製造される。The image pickup tube target is manufactured as described above.
第2図の従来の製造工程と第4図の本発明の製造工程と
の対比かられかるように、本発明の製造方法は、透光性
薄膜33の形成工程前に、酸素雰囲気中での熱処理工程
を備えている。As can be seen from the comparison between the conventional manufacturing process shown in FIG. 2 and the manufacturing process according to the present invention shown in FIG. Equipped with a heat treatment process.
この工程を備えていないと、画質が非常に低下し、暗電
流も幾分増加の傾向を示す。If this step is not provided, the image quality will be extremely degraded and the dark current will also tend to increase somewhat.
このような、熱処理工程を備えることによって、画質、
暗電流などが向上したのは、無機材料からなるフィルタ
の熱処理効果として、前述のごとく、表面の清浄化、フ
ィルタの結晶性の安定化などが考えられ、特に画質に影
響するようなフィルタ32上に形成される透光性薄膜3
3のクラックなどが減少し、良好な透光性薄膜、さらに
は良好な光導電膜が形成できるようになったためと思わ
れる。By including such a heat treatment process, image quality,
The improvement in dark current, etc. is thought to be due to the effects of heat treatment of filters made of inorganic materials, such as cleaning the surface and stabilizing the crystallinity of the filter, as described above. Translucent thin film 3 formed on
This seems to be because cracks and the like in No. 3 were reduced, making it possible to form a good light-transmitting thin film and even a good photoconductive film.
そして酸素の存在により、フィルタ32のパターン形成
時に使用されるレジスト等の有機成分を有効に除去でき
る。Further, due to the presence of oxygen, organic components such as resist used when forming the pattern of the filter 32 can be effectively removed.
なお、透光性薄膜33の表面凹凸は、透明電極34の断
線や光導電膜35の特性劣化のため、平滑化が必要であ
る。Incidentally, the surface unevenness of the light-transmitting thin film 33 needs to be smoothed because of breakage of the transparent electrode 34 and deterioration of the characteristics of the photoconductive film 35.
通常この凹凸は1μ前後で平滑化は研摩法により実施さ
れる。Normally, the unevenness is around 1 μm and smoothing is performed by a polishing method.
この時、研摩は低速度で行なうのが一般的であり、透光
性薄膜の材料によって、研摩時間が非常に違う。At this time, polishing is generally performed at a low speed, and the polishing time varies greatly depending on the material of the transparent thin film.
例えば、石英ガラスやサファイアなどは、平滑化に数時
間を要する。For example, quartz glass and sapphire require several hours to smooth.
これらに対し、クラウンガラスやフリントガラス、さら
にはクラウンおよびフリントガラスは、数十分で平滑化
でき、非常に製造が容易である。In contrast, crown glass, flint glass, and even crown and flint glass can be smoothed in several tens of minutes and are extremely easy to manufacture.
以上説明したように、本発明は透光性基板上に無機材料
からなる色分解線条フィルタを形成後、酸素雰囲気中で
熱処理したのち透光性薄膜、光導電膜を形成するもので
あり、画質、暗電流の向上を行うことができ、高品質な
撮像管ターゲットの製造に大きく寄与するものである。As explained above, the present invention involves forming a color separation striped filter made of an inorganic material on a light-transmitting substrate, and then heat-treating the filter in an oxygen atmosphere to form a light-transmitting thin film and a photoconductive film. It can improve image quality and dark current, and greatly contributes to the production of high-quality image pickup tube targets.
第1図は従来の色分解線条フィルタ内蔵ターゲットの断
面図、第2図a、bは各々従来の色分解線条フィルタ内
蔵ターゲット製造工程図およびその説明図、第3図は本
発明の一実施例の方法により作成された色分解線条フィ
ルタ内蔵ターゲットの断面図、第4図a、bは同ターゲ
ットの製造工程図および説明図である。
31・・・・・・透光性基板、32・・・・・・色分解
線条フィルタ、33・・・・・・透光性薄膜、34・・
・・・・透明電極、35・・・・・・光導電膜。FIG. 1 is a sectional view of a conventional target with a built-in color separation line filter, FIGS. A cross-sectional view of a target with a built-in color separation line filter created by the method of the example, and FIGS. 4a and 4b are a manufacturing process diagram and an explanatory diagram of the same target. 31... Transparent substrate, 32... Color separation striped filter, 33... Transparent thin film, 34...
...Transparent electrode, 35...Photoconductive film.
Claims (1)
タを形成後、酸素雰囲気中で熱処理する工程と、前記基
板およびフィルタ上に透光性薄膜を形成する工程と、前
記薄膜上に透明電極および光導電膜を形成する工程とを
備えたことを特徴とする撮像管ターゲットの製造方法。1. A step of forming a color-separating striped filter made of an inorganic material on a transparent substrate and then heat-treating it in an oxygen atmosphere, a step of forming a transparent thin film on the substrate and the filter, and a step of forming a transparent thin film on the thin film. 1. A method for manufacturing an image pickup tube target, comprising a step of forming an electrode and a photoconductive film.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP52126141A JPS5832446B2 (en) | 1977-10-19 | 1977-10-19 | Manufacturing method of image pickup tube target |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP52126141A JPS5832446B2 (en) | 1977-10-19 | 1977-10-19 | Manufacturing method of image pickup tube target |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5459029A JPS5459029A (en) | 1979-05-12 |
JPS5832446B2 true JPS5832446B2 (en) | 1983-07-13 |
Family
ID=14927680
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP52126141A Expired JPS5832446B2 (en) | 1977-10-19 | 1977-10-19 | Manufacturing method of image pickup tube target |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5832446B2 (en) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4960625A (en) * | 1972-10-12 | 1974-06-12 | ||
JPS5057394A (en) * | 1973-09-18 | 1975-05-19 | ||
JPS5086923A (en) * | 1973-12-03 | 1975-07-12 |
-
1977
- 1977-10-19 JP JP52126141A patent/JPS5832446B2/en not_active Expired
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4960625A (en) * | 1972-10-12 | 1974-06-12 | ||
JPS5057394A (en) * | 1973-09-18 | 1975-05-19 | ||
JPS5086923A (en) * | 1973-12-03 | 1975-07-12 |
Also Published As
Publication number | Publication date |
---|---|
JPS5459029A (en) | 1979-05-12 |
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