JPS5832443A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPS5832443A
JPS5832443A JP56130328A JP13032881A JPS5832443A JP S5832443 A JPS5832443 A JP S5832443A JP 56130328 A JP56130328 A JP 56130328A JP 13032881 A JP13032881 A JP 13032881A JP S5832443 A JPS5832443 A JP S5832443A
Authority
JP
Japan
Prior art keywords
electrode
concavity
semiconductor
semiconductor device
thermal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56130328A
Other languages
Japanese (ja)
Inventor
Kazutoyo Narita
成田 一豊
Tadashi Sakagami
阪上 正
Noboru Kawasaki
昇 川崎
Kenji Suzuki
建治 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP56130328A priority Critical patent/JPS5832443A/en
Publication of JPS5832443A publication Critical patent/JPS5832443A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/492Bases or plates or solder therefor
    • H01L23/4924Bases or plates or solder therefor characterised by the materials
    • H01L23/4928Bases or plates or solder therefor characterised by the materials the materials containing carbon
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01006Carbon [C]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01029Copper [Cu]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/35Mechanical effects
    • H01L2924/351Thermal stress

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Die Bonding (AREA)

Abstract

PURPOSE:To effectively emanate the heat generated at the semiconductor element of the titled device by a method wherein said element is placed in the concavity of a concaved electrode, the electrode on the other side is contacted to the above, and when the semiconductor device is formed by filling the insulator to be used for airtight sealing into the concavity, these electrodes are constituted by a compound material in which carbon fibers were buried in a copper matrix. CONSTITUTION:On surface of the semiconductor is adhered to the inner part of the concavity of the concaved electrode 1 using solder material 4, and the electrode 3 located on the other side is adhered to the othr surface of the element 2 using solder material 4 in the same manner as above. Subsequently, the semiconductor device is formed by filling silicon rubber 6, which is the insulator to be used for airtight sealing, into the concavity. According to this constitution, the electrodes 1 and 3 are composed of the compound material in which carbon fibers were buried in a copper matrix. Accordingly, the heat generated at the element 2 can be emanated effectively, and the thermal stress of the solder material 4 generated due to the difference in the thermal expansion coefficient between component materials can be lessened, thereby enabling to greatly increase the life of the device for thermal fatigue and breakdown.

Description

【発明の詳細な説明】 本発明は銅マトリクス中に炭素繊維を埋設した複合材(
以下、複合材と略記)を電極として用いた半導体装置に
関するもので、半導体素子において発生する熱を良好に
放熱でき、半導体素子と電極間の熱膨張係数差により生
ずる鑞材への熱応力を軽減できる半導体装置に関するも
のである。
DETAILED DESCRIPTION OF THE INVENTION The present invention is a composite material in which carbon fibers are embedded in a copper matrix (
This relates to a semiconductor device using a composite material (hereinafter abbreviated as composite material) as an electrode, which can effectively dissipate heat generated in a semiconductor element, and reduce thermal stress on the solder material caused by the difference in thermal expansion coefficient between the semiconductor element and the electrode. The present invention relates to semiconductor devices that can be used.

従来の半導体装置は第1図に示7すように鋼材の凹状電
極1に半導体素子2.他方側電極3を鑞材4で固着する
構造、もしくは第2図に示すように、鋼材の凹状電極1
に半導体素子2.他方側電極3゜タングステンやモリブ
デンなどの熱応力緩和材5を鑞材4で固着する構造とな
っていた。しかし前者において、電極1側への放熱性は
・良いが、他方側電極3への放熱性が悪く、鑞材4への
熱応力が大きいこと、後者において、熱応力緩和材5に
より応力は緩和されるが放熱性が低下し、更に製品コス
トが高くなるという欠点があった。尚、両図において、
6は、シリコーンゴムでアル。
As shown in FIG. 1, a conventional semiconductor device has a concave electrode 1 made of steel and a semiconductor element 2. A structure in which the other side electrode 3 is fixed with a solder material 4, or a concave electrode 1 made of steel as shown in FIG.
Semiconductor element 2. The other side electrode had a structure in which a thermal stress relieving material 5 such as tungsten or molybdenum was fixed with a solder material 4. However, in the former, the heat dissipation to the electrode 1 side is good, but the heat dissipation to the other electrode 3 is poor, and the thermal stress on the solder material 4 is large; in the latter, the stress is alleviated by the thermal stress relaxation material 5. However, there were drawbacks such as a decrease in heat dissipation and an increase in product cost. Furthermore, in both figures,
6 is silicone rubber.

本発明の目的は半導体素子での発熱を有効に放熱し、構
成部材の熱膨張係数差により鑞材部に生ずる熱応力を緩
和しうる半導体装置を提供することにある。
SUMMARY OF THE INVENTION An object of the present invention is to provide a semiconductor device that can effectively dissipate heat generated in a semiconductor element and alleviate thermal stress generated in a solder material due to differences in thermal expansion coefficients of constituent members.

半導体装置の動作時において、鑞材部に生ずる熱応力は
、構成部材の熱膨張係数差、鑞材環、装置の温度上昇等
で決まり、熱膨張係数差、及び温度上昇は小さいほど望
ましい。一方、温度上昇は装置自身の持つ熱抵抗と動作
時の発生損失とで決まり、やはり小さいほど望ましい。
During operation of a semiconductor device, the thermal stress generated in the solder metal portion is determined by the difference in thermal expansion coefficients of the constituent members, the solder metal ring, the temperature rise of the device, etc., and it is desirable that the difference in thermal expansion coefficients and the temperature rise be as small as possible. On the other hand, the temperature rise is determined by the thermal resistance of the device itself and the loss generated during operation, and is preferably as small as possible.

従来熱応力緩和材としては半導体素子に熱膨張係数の近
いタングステン、モリブデン等を用いていたが、コスト
Conventionally, materials such as tungsten and molybdenum, which have thermal expansion coefficients similar to those of semiconductor elements, have been used as thermal stress relaxation materials, but they are expensive.

熱抵抗の点で問題があり、一方散熱性を高める材料とし
ては一般に銅、鉄、アルミニウム等を用いていたが、熱
膨張係数差の点で問題があった。その点複合材は、熱膨
張係数が半導体素子のそれに近く、熱伝導率は銅に近い
点で上記した問題点を同時に解決できる。従って本発明
ではその複合材を電極として用い、更にその電極構造は
半導体素子の接合部で発生した熱をそれぞれ半導体素子
の両面に熱の拡がりが等価となる様設置することにより
装置の熱抵抗を最小とすることに着目したものである。
There was a problem in terms of thermal resistance, and on the other hand, copper, iron, aluminum, etc. were generally used as materials to improve heat dissipation, but there were problems in terms of differences in thermal expansion coefficients. In this respect, composite materials can solve the above-mentioned problems at the same time because their coefficient of thermal expansion is close to that of semiconductor elements and their thermal conductivity is close to that of copper. Therefore, in the present invention, the composite material is used as an electrode, and the electrode structure is arranged so that the heat generated at the joint of the semiconductor element is spread equally to both sides of the semiconductor element, thereby reducing the thermal resistance of the device. The focus is on minimizing.

以下本発明の一実施例を第3図により説明する。An embodiment of the present invention will be described below with reference to FIG.

凹状電極1.半導体素子2.他方側電極3が鑞材4によ
って固着されており、凹状電極2の内部には気密封止用
絶縁物としてシリコーンゴム6が充填されている。凹状
電極τ□、他方側電極3は本発明において、特に複合材
で成型されており、熱伝導性に優れているので、半導体
素子2において発生した熱は速やかに放散される。この
時凹状電極側から拡散される熱流は破線で示すように拡
がるので、他方側電極3の形状、特に電極径と電極環は
破線と同等以上とする即ちほぼ等しい熱流の拡がりを与
えることが重要であるb 半導体装置の熱抵抗は、半導体素子2接合部から凹状電
極1の直列熱抵抗をr、とし、半導体素子2接合部から
他方側電極3の直列熱抵抗をr2とし、この合成熱抵抗
R8で表わされ、この関係関係にあった為、装置の合成
熱抵抗R8は大となる欠点があったが、本発明の如<r
tを小さくすることにより、装置の合成熱抵抗R0を小
さくできる。
Concave electrode 1. Semiconductor element 2. The other side electrode 3 is fixed with a solder material 4, and the inside of the concave electrode 2 is filled with silicone rubber 6 as an insulator for airtight sealing. In the present invention, the concave electrode τ□ and the other side electrode 3 are particularly made of a composite material and have excellent thermal conductivity, so that the heat generated in the semiconductor element 2 is quickly dissipated. At this time, the heat flow diffused from the concave electrode side spreads as shown by the broken line, so it is important to make the shape of the other side electrode 3, especially the electrode diameter and electrode ring, equal to or larger than the broken line, that is, to give almost equal spread of the heat flow. b The thermal resistance of the semiconductor device is defined as the series thermal resistance from the semiconductor element 2 junction to the concave electrode 1 as r, the series thermal resistance from the semiconductor element 2 junction to the other side electrode 3 as r2, and this composite thermal resistance. R8, and because of this relationship, there was a drawback that the combined thermal resistance R8 of the device was large, but the present invention
By reducing t, the composite thermal resistance R0 of the device can be reduced.

本発明において、装置に電流を断続的に通電して、温度
サイクルを加える、いわゆる鑞材の熱疲労耐量試験を実
施した結果、凹状電極側温度上昇主 T1.他方電極側T2の関係は従来装置のrl<12時
はT、<T2となり、鑞材の熱疲労破壊は半導体素子2
と他方側電極3側のみ破壊したが、他方側電極構造に本
発明をとシ入れr1ζr!とすることにより、熱疲労破
壊寿命は大巾に向上出来た。
In the present invention, as a result of carrying out a so-called thermal fatigue resistance test of the solder material in which a current is intermittently applied to the device and a temperature cycle is applied, it was found that the temperature rise on the concave electrode side is mainly T1. On the other hand, the relationship between T2 on the electrode side is T and <T2 when rl<12 in the conventional device, and thermal fatigue failure of the solder material occurs on the semiconductor element 2.
Although only the other side electrode 3 side was destroyed, the present invention was introduced into the other side electrode structure r1ζr! By doing so, the thermal fatigue fracture life could be greatly improved.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来装置の断面図、第2図は熱応力緩和材を介
した従来装置の断面図、第3図は本発明の一実施例を示
す半導体装置の断面図である。 1・・・凹状電極、2・・・半導体素子、3・・・他方
側電極、薯1図 第3図
FIG. 1 is a sectional view of a conventional device, FIG. 2 is a sectional view of the conventional device through a thermal stress relaxation material, and FIG. 3 is a sectional view of a semiconductor device showing an embodiment of the present invention. DESCRIPTION OF SYMBOLS 1...Concave electrode, 2...Semiconductor element, 3...Other side electrode, Figure 1, Figure 3

Claims (1)

【特許請求の範囲】[Claims] 1、凹状電極、半導体素子および、他方側電極を鑞材で
順次固着し、凹状電極内に気密封止用絶縁物を充填した
半導体装置において、凹状電極および他方側電極を銅マ
トリクス中に炭素繊維を埋設してなる複合材で構成し、
他方側電極は凹状電極における熱流の拡がりとほぼ等し
い熱流の拡がりを与える形状を持っていることを特徴と
する半導体装置。
1. In a semiconductor device in which the recessed electrode, the semiconductor element, and the other electrode are sequentially fixed with a soldering material, and the recessed electrode is filled with an insulator for airtight sealing, the recessed electrode and the other electrode are made of carbon fiber in a copper matrix. Comprised of a composite material made by burying
A semiconductor device characterized in that the other side electrode has a shape that provides a heat flow spread approximately equal to the heat flow spread in the concave electrode.
JP56130328A 1981-08-21 1981-08-21 Semiconductor device Pending JPS5832443A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56130328A JPS5832443A (en) 1981-08-21 1981-08-21 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56130328A JPS5832443A (en) 1981-08-21 1981-08-21 Semiconductor device

Publications (1)

Publication Number Publication Date
JPS5832443A true JPS5832443A (en) 1983-02-25

Family

ID=15031722

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56130328A Pending JPS5832443A (en) 1981-08-21 1981-08-21 Semiconductor device

Country Status (1)

Country Link
JP (1) JPS5832443A (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53128274A (en) * 1977-04-15 1978-11-09 Hitachi Ltd Semiconductor device
JPS53140969A (en) * 1977-05-16 1978-12-08 Hitachi Ltd Semiconductor device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53128274A (en) * 1977-04-15 1978-11-09 Hitachi Ltd Semiconductor device
JPS53140969A (en) * 1977-05-16 1978-12-08 Hitachi Ltd Semiconductor device

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