JPS582807A - Manufacture of diffraction grating - Google Patents

Abstract

PURPOSE:To obtain a diffraction grating used for a branching filter for <=1,000Angstrom wavelength, by providing an easily oxidizable layer on a substrate, forming a grating pattern for masking, etching away the easy-to-oxide layer, and then performing an oxidation treatment. CONSTITUTION:On a substrate 2, an easily oxidizable layer 3 Al, etc., is provided and then a masking grating M with a striped grating pattern of synchronism 2v is formed. Then, only a masking striped body (m) with width (e) and an easily oxidizable material grating (h) beneath it are formed the substrate is dipped in about 60 deg.C warm water to carry out an oxidation treatment. The oxidation proceeds from both sides 9 and 10 where the warm water comes into contact, thus obtaining a linear oxide body (g) with width D. Then, the striped body (m) for a color mask is etched away and the remaining layer (h) is removed similarly to obtain a precise diffraction grating of only the linear oxide body (g).

Description

DETAILED DESCRIPTION OF THE INVENTION This is a IIK of a diffraction grating that can be applied to obtain a 1lfr Nobuko etc. used in a wavelength demultiplexing filter applied to an optical integrated circuit, a demultiplexing radar, etc. Regarding improvements to #&.

The diffraction grating is planned/lem (set this to -11 and call it A)
It has a lattice pattern of
A period A of -y is desired for a wavelength demultiplexing filter in a 1000-1/1 circuit, a diffraction grating used without a distributed repository semiconductor, and the like.

However, in the conventional method of manufacturing a diffraction grating, it has been difficult to satisfy the above-mentioned desired requirements. That is, as a manufacturing method for a diffraction grating, conventional methods include a step of exposing a photosensitive material layer to interference fringes of a laser beam to obtain a grating for a mask having a grating pattern with a period A formed from the photosensitive material layer. The method of obtaining the desired diffraction tooth using a diffraction grating is that the period A of the grating pattern is smaller than the circumference 84 of the grating pattern of the diffraction grating obtained by other diffraction grating manufacturing methods. It has been proposed that it can be easily obtained.

However, in order to pray, the diffraction grating (to the m period) is less than or equal to 1 o ois degrees.
It was extremely difficult to obtain... Incidentally, in the case of the method described above, if the wavelength of the laser beam is λ and the refractive index of the sensitive material layer is λ, then the number of diffraction gratings is 1.

Although it can be obtained with a minimum period A given by Even if a photosensitive material layer having a refractive index of 1 was used, a minimum period A of only 16 zsl could be obtained.

Therefore, it will become clear from what follows that this threat is intended to propose a flIllL diffraction grating l1tiC that can easily satisfy the desired improvements.

Iris 1- shows an example of a method of the llN lattice according to s@c of the present application I11. -1 For example, an oxidizing layer S consisting of a layer S is formed by vacuum evaporation, sputtering, etc., which is known in itself (first l
AB).

Next, on the ink oxidizing layer, 1, for example, 7 o) v cysts are formed.
Many of the striped body parts for masks with W have a period of 2A.
A mask grating M having a striped grating pattern arranged in the form of a mask grating M is an omniscient analogy to, for example, a photoresist layer. The exposure escape of the interference fringes is formed by including the interference pattern 1 (jllllllc)
. However, in this case, the width W of the stripe-like body is selected to a value that provides the relationship "1'W-A+D" with @D of the oxide linear body g, which will be described later.

Next, the black oxidizable layer S using the master grating M as a mask is etched by a known chemical etching treatment, plasma etching, etc. ! # of an island oxidizable layer S having a striped lattice pattern with a period of 2A formed from a mono-oxidizing layer consisting of a large number of easily oxidizable material stripes according to His Excellency's OK. A black oxidizing material lattice H is formed by the family (JIIID).

11. Next, the manner in which the ICV screen grid N is used as a mask is explained for each of the black oxidizing material stripes forming the crystal oxidizing material lattice H. It is the first and second Confucian II that oppose it.
Oxidized from 5 and 6 years old.

Thus, the first and 1112 striped bodies of black oxidizing material
The oxide linear bodies 9 and 10 of 纒1 and JII2 having widths made of oxide of the material constituting the crystalline oxidizing material stripe-like body are carved into the oxide linear bodies 9 and 10 of Jl< When the oxide linear bodies 91 and 10 are defined as a co-cll compound g, a linear turn is formed by arranging a large number of oxidized linear bodies g each having a width of 1 with a period A. An oxide lattice G is formed (Iris 1-1).

Next, attach the foot of the master grid to the top of the bird oxidizing material grid H (III■F), I! For example, if the etchant layer 11 is coated with an etchant in which the etchant yl:i11 degree for the black oxidizing material lattice H is larger than that for the oxide lattice G, then the easily oxidizable lattice H becomes muj, and l! oxide yang ati
The oxidizing material has a striped body, which heats up the plasma elastomer using an oxide, for example CCj4iI, and makes the oxidizable lattice H stronger. Areas other than 9 and 10 on the board! Remove from above (Figure 11111G).

In this way, a desired diffraction grating having a structure in which an oxide grating G having a grating pattern with a period A is formed on a substrate 1 as shown in IIIGK is obtained.

The above is an example of the Il method for the diffraction grating according to the 1m1 No. 0-example of the present application.
According to the diffraction grating showing HC, due to its oxide lattice G,
It is clear that the function as a diffraction grating can be obtained.

Therefore, according to the II method according to the book lI@ mentioned above in 11111&c, it is possible to obtain a diffraction grating that can function as an a-ply grating. @(III-c)<@Keru! Due to the width W of the strip-shaped body m for fabric and the width of the oxide linear body g in the process of forming the oxide lattice G (Summary 1, Figure 1 m), (W
-D) ゛It is decided as something that is expressed exclusively.

For this reason - the period A of the new lattice,! Turn it around the knee to form the lattice M for the sufu! If @W of the striped body for fabric is formed with the minimum dimension "r!", it can be formed to have a width smaller than the minimum dimension width, and its period A is smaller than that of the saponide lattice G.
It becomes smaller as the width of the oxide linear body becomes larger by increasing the time required for the spinning process to form a loaf.

According to the 1I Ori C by the 1st Earl Motohara, who can improve his value to the best of his ability, there is a method for obtaining a diffraction grating that is 11 times different from the mask grating M, and that it can be formed by the same method. When forming a desired diffraction grating,
The diffraction grating was described by Ma Jllj at the beginning.
This is much smaller than the period of the diffraction grating obtained by &. It has a large Ifli image that can be obtained as 1 mm or less.

Next, to explain an example of the method of manufacturing a diffraction grating according to the second example of the present application, steps similar to those described above are adopted for Il51111m to G4C, as shown in Fig. 2m.

Oxide lattice G having a lattice pattern of period A on substrate 2
Next, as shown in FIG. 2B, the substrate 2 with the oxide lattice G as a mask is etched on the main surface of the substrate 2 by a known etching process. A substrate material lattice made of the material of the substrate 2 having a linear lattice pattern with a period l constituted by a large number of substrate material linear bodies g' formed by a large number of oxide lattice G of the oxide-linear body g'G' is formed, and then the oxide grating G is removed from above the substrate grating G' as shown in Fig. 2iC, thus obtaining the desired diffraction grating.

The above is an example of the method of manufacturing a diffraction grating according to Kimei, which is the second in this application. According to the diffraction grating shown in Figure 1112C obtained by such a manufacturing method, the WXA
It is clear that the structure can be used as a folded lattice.

Therefore, according to the manufacturing method according to Book 1lv1 described above in Fig. 2, it is possible to obtain a folded grating that can function as a single diffraction grating, but the period A can be improved at 1. From @D and k (W-D
). ζ
Because of Φ, the period A of the new lattice can be made smaller in the fringe 1' diagram.

Therefore, the 211th article is based on the above-mentioned book 1 II book 2 of the present application, but although this is omitted in the details,
m111C has the same excellent tatami texture as the above-mentioned Patent Application No. 1-1.

The above discussion is merely an example of the inventions of Benganme 1 and 1111 Qiao, and various changes may be made without departing from the spirit of the invention. .

[Brief explanation of drawings]

Iris 1■Mu~G is the original I/I! The 1st model of the 81st diffraction grating based on the 1st m@ at Hoji's factory.
IIli-, 11211-C are 111th-order process 5uc showing an example of the method for manufacturing a diffraction grating according to the invention of No. 112 I of the present application.
It is almost a close cutoff tII@l. ■Middle 2 is the substrate, S is the bird oxidation layer 1M is the mask grid, H
is To acid oxidizing lattice h is easily oxidizable material striped body,
7 and 8 are Confucian painting club,? , 10 and g are oxidized mass %G
indicates an oxide lattice, and G' indicates a substrate material lattice. Applicant: Nippon Electric Telephone Public Corporation Figure 1 Figure 1

Claims (1)

[Claims] t! ! a step of forming an easily oxidizable layer on the main surface of the plate; a factory forming a mask grating having a striped grating pattern with a period of 2A on the skeleton oxidizable layer;
・“The above-mentioned Sumishunsho using the lattice for scissor mask as a mask” ・The above-mentioned easy-to-understand film having striped lattice pins with a period of 2A formed from the oxidizable layer by etching the silica layer A factory that forms a black oxidizable material lattice using the material of the oxidizing layer.The oxidation treatment of the above-mentioned island oxidation 4! forming an oxide lattice having a linear lattice pattern with a period A by forming the 111L and the second Confucian pattern portions facing each other in the oxide linear bodies of the first and second oxide bodies, respectively; a factory in which the oxidizable material lattice is subjected to an etching process to remove the rays other than the first and second oxide linear bodies from each of the saponifiable material striped bodies constituting the black oxidizable material lattice; A method for manufacturing a diffraction grating characterized by comprising: 2. Forming an easily oxidizable layer on the main surface of a substrate. Forming a mask grating having a striped grating pattern with a period of 2A on the crystal oxidizable layer. Step: Ink oxidation by the material of the easily oxidizable layer having a striped grating pattern with a period of 2A formed from the Jokihata oxidizable layer by an etching treatment for the toalizable layer using the cough mask grating as a mask. a step of forming a lattice of easily oxidizable material.For each of the easily oxidizable material stripes forming the lattice of easily oxidized material made of the oxidized ground mass for the lattice of easily oxidized material, Jll and the second N are opposed to each other. A step of forming a surface portion into TSL and a second oxidation-1 soft body to form an oxide lattice having a linear lattice pattern with a period A, and etching relief for the crystalline oxidizing material lattice to form an ink oxidizing material. Step 1 of removing the area other than the ill and 82 oxide linear bodies of each of the easily oxidizable material stripes constituting the lattice. Etching the 111M plate using the oxide toothpick as a mask. A method for manufacturing a diffraction grating, comprising the step of forming a base@# grating using the material of the substrate, having a bell-shaped grating pattern of Jll on the main image side of the substrate.