JPS5825324B2 - Light-shielding polymer, method for producing the same, and cosmetic composition containing the same - Google Patents

Light-shielding polymer, method for producing the same, and cosmetic composition containing the same

Info

Publication number
JPS5825324B2
JPS5825324B2 JP8307777A JP8307777A JPS5825324B2 JP S5825324 B2 JPS5825324 B2 JP S5825324B2 JP 8307777 A JP8307777 A JP 8307777A JP 8307777 A JP8307777 A JP 8307777A JP S5825324 B2 JPS5825324 B2 JP S5825324B2
Authority
JP
Japan
Prior art keywords
following formula
copolymer
group
light
shielding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP8307777A
Other languages
Japanese (ja)
Other versions
JPS5316093A (en
Inventor
クリストス・パパントニオー
クロード・マイウー
ピエール・デユフオール
ベルナル・ジヤツク
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
LOreal SA
Original Assignee
LOreal SA
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Filing date
Publication date
Application filed by LOreal SA filed Critical LOreal SA
Publication of JPS5316093A publication Critical patent/JPS5316093A/en
Publication of JPS5825324B2 publication Critical patent/JPS5825324B2/en
Expired legal-status Critical Current

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Classifications

    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61QSPECIFIC USE OF COSMETICS OR SIMILAR TOILETRY PREPARATIONS
    • A61Q17/00Barrier preparations; Preparations brought into direct contact with the skin for affording protection against external influences, e.g. sunlight, X-rays or other harmful rays, corrosive materials, bacteria or insect stings
    • A61Q17/04Topical preparations for affording protection against sunlight or other radiation; Topical sun tanning preparations
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K8/00Cosmetics or similar toiletry preparations
    • A61K8/18Cosmetics or similar toiletry preparations characterised by the composition
    • A61K8/72Cosmetics or similar toiletry preparations characterised by the composition containing organic macromolecular compounds
    • A61K8/81Cosmetics or similar toiletry preparations characterised by the composition containing organic macromolecular compounds obtained by reactions involving only carbon-to-carbon unsaturated bonds
    • A61K8/8141Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • A61K8/8158Homopolymers or copolymers of amides or imides, e.g. (meth) acrylamide; Compositions of derivatives of such polymers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/52Amides or imides
    • C08F20/54Amides, e.g. N,N-dimethylacrylamide or N-isopropylacrylamide
    • C08F20/60Amides, e.g. N,N-dimethylacrylamide or N-isopropylacrylamide containing nitrogen in addition to the carbonamido nitrogen
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K2800/00Properties of cosmetic compositions or active ingredients thereof or formulation aids used therein and process related aspects
    • A61K2800/40Chemical, physico-chemical or functional or structural properties of particular ingredients
    • A61K2800/57Compounds covalently linked to a(n inert) carrier molecule, e.g. conjugates, pro-fragrances

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  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Animal Behavior & Ethology (AREA)
  • General Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Veterinary Medicine (AREA)
  • Epidemiology (AREA)
  • Birds (AREA)
  • Dermatology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Cosmetics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Description

【発明の詳細な説明】 本発明は新規な遮光性の重合体、その製法およびそれを
含有する化粧品組成物に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a novel light-blocking polymer, a method for producing the same, and a cosmetic composition containing the same.

本発明によると次式(■): で示される基を表わす) に相当する反復重合単位の少くとも一つを含有し、平均
分子量が2,000乃至1,000,000の範囲にあ
る遮光性重合体が提供される。
According to the present invention, a light-shielding compound containing at least one repeating polymer unit corresponding to the following formula (■): (representing a group represented by) and having an average molecular weight in the range of 2,000 to 1,000,000 A polymer is provided.

この新規重合体は紫外線の゛炎症帯” (280から3
15 nmの間)の波長領域の光のみならず肌を褐色に
焼く波長領域の光(350nmまで)をも吸収する特徴
を有するので、太陽光線による火傷と280から350
nmの間の紫外線の作用とに対して同時に且つ全般的
に保護することができる。
This new polymer is capable of producing ultraviolet rays in the ``inflammation zone'' (280 to 3
It has the characteristic of absorbing not only light in the wavelength range (between 15 nm) but also light in the wavelength range (up to 350 nm) that browns the skin, so it can prevent burns caused by sunlight and 280 to 350 nm.
It is possible to simultaneously and generally protect against the effects of ultraviolet radiation between 100 nm and 200 nm.

本発明の新規重合体は遮光性共重合体(二元重合体、三
元共重合体など)、すなわち前記式(n)の重合単位と
エチレン型不飽和モノマーから誘導される他の重合単位
の一種あるいは数種とを同時に含有するものであるのが
望ましい。
The novel polymer of the present invention is a light-shielding copolymer (dipolymer, terpolymer, etc.), that is, a polymeric unit of the formula (n) and other polymeric units derived from an ethylenically unsaturated monomer. It is desirable to contain one or several kinds at the same time.

本発明の共重合体をつくる時に用いられるエチレン型不
飽和モノマーあるいはコモノマーは作ろうとする化粧品
組成物の種類に応じて選ばれる。
The ethylenically unsaturated monomer or comonomer used in preparing the copolymer of the present invention is selected depending on the type of cosmetic composition to be prepared.

実際にコモノマーの種類を変えることによって遮光性共
重合体に種々の性質をもたせることができる。
In fact, by changing the type of comonomer, it is possible to impart various properties to the light-shielding copolymer.

好ましいコモノマーの例としてはとくに次のものが挙げ
られる、 N−ビニルピロリドン、 N−メタクリロイル−D−グルコサミン、ジメチルアミ
ンエチルメタクリレート、 ステアリルアクリレート、 ステアリルアクリレート、 ビニルステアレート。
Examples of preferred comonomers include, inter alia, N-vinylpyrrolidone, N-methacryloyl-D-glucosamine, dimethylamine ethyl methacrylate, stearyl acrylate, stearyl acrylate, vinyl stearate.

前者の三種のコモノマーは水溶液中への溶解性を付与す
るものであり、後者の三種は油中への溶解性を付与する
ものである。
The former three types of comonomers provide solubility in aqueous solutions, and the latter three types provide solubility in oil.

本発明の好ましい共重合体は次の一般式:〔式中Z1は
上述と同じ意味を持ち、R′は水素原子あるいはメチル
基を表わし、Yは次式:(式中Xは四級化した又は四級
化してないジメチルアミノエチル基又はCl8H3□を
表わす、および (式中Aはグルコサミン残基である) の基の群より選ばれる基を表わす〕で表わされる反復単
位を有し、平均分子量が2,000乃至1.000,0
00の範囲にあるものである。
A preferred copolymer of the present invention has the following general formula: [wherein Z1 has the same meaning as above, R' represents a hydrogen atom or a methyl group, and Y represents the following formula: (wherein, X is a quaternized or a non-quaternized dimethylaminoethyl group or Cl8H3□, and (wherein A is a glucosamine residue) a repeating unit represented by a group selected from the group of is 2,000 to 1,000,0
It is in the range of 00.

本発明によると遮光性重合体は式(II)の基即ち重合
単位を重合体全重量に対して一般的には15乃至100
%、なるべくは20乃至80%の範囲で含有する。
According to the present invention, the light-shielding polymer generally contains groups of formula (II), that is, polymerized units, in an amount of 15 to 100 based on the total weight of the polymer.
%, preferably in the range of 20 to 80%.

本発明は前記式(II)および(ll[)の新規遮光性
重合体の製造法に関する。
The present invention relates to a method for producing novel light-shielding polymers of formulas (II) and (ll[).

すなわち、本発明においては、第一段階で次式:%式%
() (式中Z1は後記と同じ意味を持つ) で示される所謂゛炉光性モノマー″であるモノマーヲ調
製し、ついでこのモノマーをホモ重合するかまたは一種
あるいは数種の他のコモノマーと共重合することを特徴
とする、 次式■: (式中Z1は次式: 又は で示される基を表わす) の重合単位の少くとも一つを含有する遮光性重合体ある
いは次式■: 〔式中Z1ば上述と同じ意味を持ち、R′は水素原子あ
るいはメチル基を表わし、Yは次式:(但しXは四級化
した又は四級化されていないジメチルアミノエチル基又
はCl8H37を表かす)及び (但しAはグルコサミン残基である)の基の群より選ば
れる基を表わす〕で表わされる反復単位を有する遮光性
共重合体の製造法をも要旨とするものである。
That is, in the present invention, in the first step, the following formula: % formula %
() (in which Z1 has the same meaning as below) is prepared as a so-called "furnace photosensitive monomer", and then this monomer is homopolymerized or copolymerized with one or more other comonomers. A light-shielding polymer containing at least one polymerized unit of the following formula ■: (wherein Z1 represents a group represented by the following formula: or) or the following formula ■: [wherein Z1 represents a group represented by the following formula: Z1 has the same meaning as above, R' represents a hydrogen atom or a methyl group, and Y represents the following formula: (However, X represents a quaternized or non-quaternized dimethylaminoethyl group or Cl8H37) The present invention also provides a method for producing a light-shielding copolymer having a repeating unit selected from the group consisting of: and (where A is a glucosamine residue).

p光性モノマーは硫酸の存在下でのN−メチロールアク
リルアミドと芳香族化合物Z1Hとの冷時反応によって
調製される。
The p-photomonomer is prepared by cold reaction of N-methylolacrylamide and aromatic compound Z1H in the presence of sulfuric acid.

前記の重合反応は通常の重合方法、すなわち塊状重合、
溶液重合、懸濁重合あるいは乳化重合によって、従来の
重合開始剤を用いて実施される。
The above polymerization reaction is carried out by a conventional polymerization method, that is, bulk polymerization,
It is carried out by solution, suspension or emulsion polymerization using conventional polymerization initiators.

本発明の遮光性重合体の分子量はブチルアルデヒドの如
きアルデヒド類あるいはクロロホルム、ブロモホルム、
四塩化炭素などの如き塩化物のような鎖長調節剤の少量
(0,05〜0.15重量%)を重合中に添加すること
によって加減しうる。
The molecular weight of the light-shielding polymer of the present invention is determined by aldehydes such as butyraldehyde, chloroform, bromoform,
This can be controlled by adding small amounts (0.05 to 0.15% by weight) of chain length regulators such as chlorides such as carbon tetrachloride during the polymerization.

重合の終った時、もし望むならば、得られた重合体をた
とえばイオン交換樹脂で処理することによって精製でき
る。
At the end of the polymerization, if desired, the resulting polymer can be purified, for example by treatment with an ion exchange resin.

本発明はまた紫外線へのp光活性のある物質として前述
のような式■の反復単位の重合体又は式■の反復単位の
共重合体の少くとも一種を含有する日焼は止め用化粧品
組成物をも要旨とするものである。
The present invention also provides a sunscreen cosmetic composition containing at least one of the above-mentioned polymers of repeating units of formula (1) or copolymers of repeating units of formula (2) as a UV-active substance. It is also a gist of things.

本発明の化粧品組成物は意図する用途に応じて色々の形
につくることができる。
The cosmetic compositions of the present invention can be made into various forms depending on the intended use.

本組成物は水性乳液、ローション、クリーム、乳液、ゲ
ルあるいはエアゾールの形で用いられるのが望ましい。
Preferably, the composition is used in the form of an aqueous emulsion, lotion, cream, emulsion, gel or aerosol.

本組成物はまた水溶液、水性アルコール溶液(エタノー
ルあるいはイソプ0/々ノール)または油性溶液の形で
も用いられる。
The compositions may also be used in the form of aqueous, hydroalcoholic (ethanol or isopropanol) or oily solutions.

本発明の組成物がエアゾールの形で用いられる時には、
噴霧用ガスと共に附子容器中に封じ込められ、噴霧用ガ
スとしてはハロゲン化炭化水素、またはトリクロロフル
オロメタンとジクロロジフルオロメタンの混合物のよう
なハロゲン化炭化水素の混合物を用いることが望ましい
When the composition of the invention is used in the form of an aerosol,
Preferably, the atomizing gas is enclosed in a bellows vessel, and the atomizing gas is a halogenated hydrocarbon or a mixture of halogenated hydrocarbons, such as a mixture of trichlorofluoromethane and dichlorodifluoromethane.

本発明の化粧品組成物中での上述のような遮光性重合体
の濃度は、どの程度の保護をなすべきかという度合によ
って変る。
The concentration of light-blocking polymers as described above in the cosmetic compositions of the invention will vary depending on the degree of protection desired.

しかし遮光性重合体濃度は一般に組成物全重量に対して
0,2〜20%の範囲にあることが望ましい。
However, it is generally desirable that the concentration of the light blocking polymer be in the range of 0.2 to 20% based on the total weight of the composition.

本組成物はさらに油脂(油、グリース、ろう等)、乳化
剤、表面活性剤、香料、シリコン油、顔料、染料および
保存剤のような一般成分をも含有することができる。
The compositions may also contain common ingredients such as fats (oils, greases, waxes, etc.), emulsifiers, surfactants, fragrances, silicone oils, pigments, dyes, and preservatives.

本組成物に着色用顔料を添加すると表皮を着色し、それ
によって皮膚の欠点を蔽いかくすことができる。
Addition of coloring pigments to the composition can color the epidermis, thereby masking skin imperfections.

本発明の化粧品組成物を皮膚に用いると表皮に対して良
好な親和性のある被膜を形成し、太陽光線に対し優れた
皮膚の保護作用を呈する。
When the cosmetic composition of the present invention is used on the skin, it forms a film that has good affinity for the epidermis and exhibits an excellent skin protection effect against sunlight.

以下の実施例において、製造された調光性物質の紫外線
吸収能はKspで定義され、これは試料中に含有される
炉光性物質の分量、測定される吸光度および装置に特有
の定数に関する数値である。
In the following examples, the UV absorption capacity of the manufactured photochromic material is defined by Ksp, which is a numerical value related to the amount of photochromic material contained in the sample, the measured absorbance and constants specific to the apparatus. It is.

Kspの定義はGillamおよび5tern著” I
ntroduction to electronic
absorptionSpectroscopy i
n organic chemistry”(Arno
ld社版、ロンドン、1954年、10頁)に記載され
である。
The definition of Ksp is by Gillam and 5tern” I
introduction to electronic
absorption spectroscopy i
organic chemistry” (Arno
(ed., London, 1954, p. 10).

d=測測定れる吸光度 l−装置の試料容器の厚さ、α 以下本発明を実施例を以って説明する。d = absorbance that can be measured l - Thickness of the sample container of the device, α The present invention will be explained below with reference to Examples.

参考例 以下の式の炉光性モノマー、2−((2’−ヒドロキシ
−5′−メチルアクリルアミドメチル)フェニルシー2
H−ベンゾトリアゾールの調製:純粋な硫酸192gお
よび2−((2’−ヒドロキシ−5′−メチル)フェニ
ル)−2H−ベンゾトリアゾール72gを窒素下でフラ
スコに入れる。
Reference Example: A photosensitive monomer of the following formula, 2-((2'-hydroxy-5'-methylacrylamidemethyl)phenylcy 2
Preparation of H-benzotriazole: 192 g of pure sulfuric acid and 72 g of 2-((2'-hydroxy-5'-methyl)phenyl)-2H-benzotriazole are placed in a flask under nitrogen.

この混合物を0℃に冷却し、ついでN−ヒドロキシメチ
ルアクリルアミド31.5gを加える。
The mixture is cooled to 0 DEG C. and then 31.5 g of N-hydroxymethylacrylamide are added.

室温に戻るまで放置し次に18時間撹拌をつづける。Allow to return to room temperature and then continue stirring for 18 hours.

混合物を水中に注ぎ入れ、ついて炉別する。Pour the mixture into water and separate in the oven.

クロロホルム中で再結晶すると純粋な生成物55gが得
られる。
Recrystallization in chloroform gives 55 g of pure product.

収率:56% 融点−204°C λmaxl(THF)−302nm、 Ksp=55
,000λmax2(THF)−339nm Ks
p=57,000同様の方法で、2−フェニルベンズイ
ミダゾールのアクリルアミドメチル誘導体を製造できる
Yield: 56% Melting point -204°C λmaxl(THF) -302nm, Ksp=55
,000λmax2(THF)-339nm Ks
p=57,000 Acrylamidomethyl derivatives of 2-phenylbenzimidazole can be produced in a similar manner.

実施例 1 2−〔(アクリルアミドメチル−27−ヒドロキシ−5
′−メチル)フェニル)−2H−ペンツトリアゾールと
硫酸ジメチルで四級化したN、N−ジメチル−2−アミ
ノエチルメタクリレートとの共重合体の製造 前記参考例で調製した炉光性七ツマ−2g、硫酸ジメチ
ルで四級化したN、N−ジメチル−2−アミノエチルメ
タクリレート8g、ジメチルホルムアミド(DMF)2
0gおよびアゾビス−イソブチロニトリル1gを窒素下
でフラスコに入れる。
Example 1 2-[(acrylamidomethyl-27-hydroxy-5
Preparation of copolymer of N,N-dimethyl-2-aminoethyl methacrylate quaternized with dimethyl sulfate and N,N-dimethyl-2-aminoethyl methacrylate quaternized with dimethyl sulfate , 8 g of N,N-dimethyl-2-aminoethyl methacrylate quaternized with dimethyl sulfate, dimethylformamide (DMF) 2
0 g and 1 g of azobis-isobutyronitrile are placed in the flask under nitrogen.

混合物を24時間80°Cに加熱し、ついで冷却後20
TLlのメタノールで希釈し、500m1のアセトン中
に一滴づつ注ぎ入れる。
The mixture was heated to 80 °C for 24 h and then cooled to 20 °C.
Dilute with TLl methanol and pour dropwise into 500 ml acetone.

重合体をp別し成上下で乾燥する。The polymer is separated and dried on top and bottom.

水溶性の共重合体8gが得られる。収率:80% λmax1(DMF)−298nm、 Ksp=6
,200λmax2(DMF)−335nm、 K
sp=5,200同様の方法で2−フェニルベンズイミ
ダゾールのアクリルアミドメチル誘導体と硫酸ジメチル
で四級化したN、N−ジメチル−2−アミノエチルメタ
クリレートとの共重合体を製造できる。
8 g of water-soluble copolymer are obtained. Yield: 80% λmax1(DMF)-298nm, Ksp=6
,200λmax2(DMF)-335nm, K
sp=5,200 A copolymer of an acrylamide methyl derivative of 2-phenylbenzimidazole and N,N-dimethyl-2-aminoethyl methacrylate quaternized with dimethyl sulfate can be produced in a similar manner.

実施例 2 2−〔(アクリルアミドメチル−2′−ヒドロキシ−5
7−メチル)フェニル:]−]2H−ペンツトリアゾー
とステアリルアクリレートとの共重合体の製造 前記参考例で調製した炉光性モノマー50.9、ステア
リルアクリレート33.4g、テトラヒドロフラン(T
HF)150gおよびアゾビス−イソブチロニトリル5
gをフラスコに入れる。
Example 2 2-[(acrylamidomethyl-2'-hydroxy-5
7-Methyl)phenyl:]-]2H-Pentztriazo and stearyl acrylate copolymer production: 50.9 g of the photosensitive monomer prepared in the above reference example, 33.4 g of stearyl acrylate, tetrahydrofuran (T
HF) 150 g and azobis-isobutyronitrile 5
Put g into the flask.

混合物を9時間80°Cに加熱し、ついで71のメタノ
ール中に注ぎ入れる。
The mixture is heated to 80° C. for 9 hours and then poured into 71 methanol.

炉別し、減田下で乾燥した後、油溶性の共重合体70g
が得られる。
After separating in a furnace and drying under a reduced temperature, 70g of oil-soluble copolymer
is obtained.

収率:85% λmax1(THF)−303nm、 Ksp=28
,300λmax2(THF)−339nm、 Ks
p=28,000同様の方法で2−フェニルベンズイミ
ダゾールのアクリルアミドメチル誘導体とステアリルア
クリレートとの共重合体を製造できる。
Yield: 85% λmax1(THF)-303nm, Ksp=28
,300λmax2(THF)-339nm, Ks
p=28,000 A copolymer of an acrylamide methyl derivative of 2-phenylbenzimidazole and stearyl acrylate can be produced in a similar manner.

実施例 3 2−((2’−ヒドロキシ−5′−メチル−アクリルア
ミドメチル)フェニル)−2H−ベンゾトリアゾールと
ビニルステアレートとの共重合体の製造 ビニルステアレート6.6g、 2− ((2’−ヒ
ドロキシ−5′−メチル−アクリルアミドメチル)フェ
ニル)−2H−ペンツトリアゾール13.3g及びアゾ
ビスイソブチロニトリル2gをジメチルホルムアミド−
テトラフランの50 : 50混合物200m1に溶解
させ、次いで窒素の雰囲気下に24時間還流温度に加熱
する。
Example 3 Production of copolymer of 2-((2'-hydroxy-5'-methyl-acrylamidomethyl)phenyl)-2H-benzotriazole and vinyl stearate 6.6 g of vinyl stearate, 2-((2 13.3 g of '-hydroxy-5'-methyl-acrylamidomethyl)phenyl)-2H-penztriazole and 2 g of azobisisobutyronitrile were dissolved in dimethylformamide.
Dissolve in 200 ml of a 50:50 mixture of tetrafuran and then heat to reflux temperature for 24 hours under an atmosphere of nitrogen.

次いで反応混合物を21のメタノールにそ5ぎ、沈澱し
た共重合体を乾燥させる(収率50%)。
The reaction mixture is then poured into 21 methanol and the precipitated copolymer is dried (50% yield).

紫外吸収スペクトル: λmax1(CHCA3)−304nm λmax2(CHC13)−338nm 実施例 4 2−((2’−ヒドロキシ−57−メチル−アクリルア
ミドメチル)フェニル)−2H−ベンゾトリアゾールと
N−ビニルピロリドンとの共重合体の製造 2−((2’−ヒドロキシ−5′−メチル−アクリルア
ミドメチル)フェニル)−2H−ベンゾトリアゾール1
2.9をN−メチルピロリドン80.9に溶解させ、次
いでN−ビニルピロリドン28gを加える。
Ultraviolet absorption spectrum: λmax1 (CHCA3) - 304 nm λmax2 (CHC13) - 338 nm Example 4 Co-existence of 2-((2'-hydroxy-57-methyl-acrylamidomethyl)phenyl)-2H-benzotriazole and N-vinylpyrrolidone Preparation of polymer 2-((2'-hydroxy-5'-methyl-acrylamidomethyl)phenyl)-2H-benzotriazole 1
2.9 is dissolved in 80.9 g of N-methylpyrrolidone, and then 28 g of N-vinylpyrrolidone is added.

この混合物を窒素の雰囲気下に80℃に加熱する。This mixture is heated to 80° C. under an atmosphere of nitrogen.

得られた粗製溶液を31のトルエンにそメぎ、沈澱した
共重合体を収集し乾燥させる(収率77%)。
The resulting crude solution is poured into 31 parts of toluene, and the precipitated copolymer is collected and dried (77% yield).

紫外吸収スペクトル: λrn aX 1 (エタノール)−303nmλm
aX 2 (エタノール)=338nm実施例 5 2−((2’−ヒドロキシ−57−メチル−アクリルア
ミドメチル)フェニル)−2H−ペンツトリアゾールと
N−メタクリロイルグルコサミンとの共重合体の製造 2−((2’−ヒドロキシ−57−メチル−アクリルア
ミドメチル)フェニル)−2H−ベンゾトリアゾール8
g及びN−メタクリロイルグルコサミン32gをN−メ
チルピロリドン20.9に溶解させ、アゾビスイソブチ
ロニトリル2gを加える。
Ultraviolet absorption spectrum: λrn aX 1 (ethanol) - 303 nm λm
aX 2 (ethanol) = 338 nm Example 5 Preparation of copolymer of 2-((2'-hydroxy-57-methyl-acrylamidomethyl)phenyl)-2H-penztriazole and N-methacryloylglucosamine 2-((2 '-Hydroxy-57-methyl-acrylamidomethyl)phenyl)-2H-benzotriazole8
g and 32 g of N-methacryloylglucosamine are dissolved in 20.9 g of N-methylpyrrolidone, and 2 g of azobisisobutyronitrile is added.

窒素の雰囲気下に24時間80℃に加熱した後に、粗製
溶液をトルエンにそ5ぎ、沈澱した共重合体を収集し、
N−メチルピロリドン150m1に溶解させる。
After heating to 80° C. for 24 hours under an atmosphere of nitrogen, the crude solution was poured into toluene and the precipitated copolymer was collected;
Dissolve in 150 ml of N-methylpyrrolidone.

得られる溶液を24時間水に対して透析する。The resulting solution is dialysed against water for 24 hours.

この水溶液を濃縮することにより23gの純粋な共重合
体を得る(収率60%)。
By concentrating this aqueous solution, 23 g of pure copolymer is obtained (60% yield).

紫外吸収スペクトル: λrnaX1(エタノール)=303nmλrn aX
2 (エタノール)=338nm以下本発明の化粧品組
成物を実施例をもって説明する。
Ultraviolet absorption spectrum: λrnaX1 (ethanol) = 303nmλrnaX
2 (ethanol) = 338 nm or less The cosmetic composition of the present invention will be explained with examples.

実施例 I 以下の成分を混合して遮光性(日焼は止め用)クリーム
を製造する。
Example I A light-blocking (sunscreen) cream is prepared by mixing the following ingredients.

実施例1により製造される重合体・・・・・・・・・1
5.9セチルステアリルアルコール ・・・・・
・・・・ 2gグリセロールのモノステアレート・・・
・・・・・・ 4gセチルアルコール ・
・・・・・・・・ 4gワセリン油
・・・・・・・・・ 5gブチルステアレート
・・・・・・・・・ 5gプロピレングリコ
ール ・・・・・・・・・ 79シリコーン油
・・・・・・・・・0.125gU
NIONCARBIDE社からPOLYOXの商品名で
市販されている高分子量の非イオン性重合体の 5%水溶液 ・・・・・・・・・
3.5gp−ヒドロキシ安息香酸のメチルエステル・・
・・・・・・・0.3g香料
・・・・・・・・・0.5g水 ・
・・・・・・・・全体が100gになる量実施例 ■ 以下の成分を混合して遮光性(日焼は止め用)油を製造
する。
Polymer produced according to Example 1...1
5.9 Cetylstearyl alcohol...
...2g glycerol monostearate...
・・・・・・ 4g cetyl alcohol ・
・・・・・・・・・ 4g Vaseline oil
・・・・・・・・・ 5g butyl stearate
・・・・・・・・・ 5g Propylene glycol ・・・・・・・・・ 79 Silicone oil
・・・・・・・・・0.125gU
A 5% aqueous solution of a high molecular weight nonionic polymer commercially available from NIONCARBIDE under the trade name POLYOX.
3.5gp-hydroxybenzoic acid methyl ester...
・・・・・・0.3g fragrance
・・・・・・・・・0.5g water ・
・・・・・・Amount to make the whole 100g Example ■ The following ingredients are mixed to produce a light-shielding oil (for sunscreen).

Claims (1)

【特許請求の範囲】 1 次式■: で示される基を表わす) の反復重合単位の少くとも一つを含有し、平均分子量が
2,000乃至1,000,000の範囲にあることを
特徴とする遮光性重合体。 2 次式■: 〔式中Z、は次式: で示される基を表わし、R′は水素原子あるいはメチル
基を表わし、Yは次式: (但しXは四級化した又は四級化されていないジメチル
アミノエチル基又はCl8H3□を表わす)および (但しAはグルコサミン残基である)の基の群より選ば
れる基を表わす〕で表わされる反復単位を有し、平均分
子量が2,000乃至1,0σo、oo。 の範囲にあることを特徴とする遮光性共重合体。 3 遮光性を有する反復重合単位を共重合体全重量に対
して15乃至100%、なるべくは20乃至80重量%
の範囲で含有する特許請求の範囲第2項に記載の共重合
体。 4 共重合体が2−〔(アクリルアミドメチル−21−
ヒドロキシ−5/−メチル)フェニル)−2H−ベンゾ
トリアゾールと硫酸ジメチルで四級化したN、N−ジメ
チル−2−アミンエチルメタクリレートとの共重合体お
よび2−〔(アクリルアミドメチル−27−ヒドロキシ
−57−メチル)フェニル〕−2H−ベンゾトリアゾー
ルとステアリルアクリレートとの共重合体からなる群よ
り選ばれる特許請求の範囲第2項記載の共重合体。 5 第一段階で次式: (式中Z1は次式: 又は で示される基を表わす) の不飽和誘導体を先ず調製し、次いで、第二段階でこの
誘導体をホモ重合することを特徴とする、次式■: で示される基を表わす) の重合単位の少くとも一つを含有する遮光性重合体の製
造方法。 6 第一段階で次式: (式中Z′は後記の意義を有する)の不飽和誘導体を先
ず調製し、次いで、第二段階で所期の遮光性共重合体に
相当する比率でこの誘導体を少くとも1つのコモノマー
と共重合させることを特徴とする、次式(■): 〔式中Z1は次式: で示される基を表わし、R′は水素原子あるいはメチル
基を表わし、Yは次式: (但しXは四級化した又は四級化されていないジメチル
アミノエチル基又はCl8H3□を表わす)(但しAは
グルコサミン残基である)の基の群より選ばれる基を表
わす〕で表わされる反復単位を有する遮光性共重合体の
製造方法。 7 次式■: (式中Z、は次式: 又は で示される基を表わす) の重合単位の少くとも一つを含有し、平均分子量が2,
000乃至1,000,000の範囲にある遮光性重合
体の少くとも一つを適当な化粧品媒体中に配合して成る
ことを特徴とする、日焼は止め用化粧品組成物。 8 遮光性重合体を組成物全重量に対して0.2乃至2
0%の範囲の比率で含有する特許請求の範囲第7項に記
載の化粧品組成物。 9 水溶液、水性アルコール溶液、油性溶液、ゲル、ク
リーム、乳液あるいはエアゾールの形で用いられる特許
請求の範囲第7項または第8項に記載の化粧品組成物。 10 次式■: 〔式中Z1は次式: で示される基を表わし、R′は水素原子又はメチル基を
表わし、Yは次式: (但しXは四級化した又は四級化されていないジメチル
アミノエチル基又はCl8H3□を表わす)及び (但しAはグルコサミン残基である)の基の群より選ば
れる基を表わす〕で表わされる反復単位を有し、平均分
子量が2,000乃至i、o o o、o o 。 の範囲にある遮光性共重合体の少くとも一つを適当な化
粧品媒体中に配合して成ることを特徴とする、日焼は止
め化粧品組成物。
[Scope of Claims] It is characterized by containing at least one repeating polymer unit of the primary formula (■: representing a group represented by) and having an average molecular weight in the range of 2,000 to 1,000,000. A light-shielding polymer. 2nd formula ■: [In the formula, Z represents a group represented by the following formula: R' represents a hydrogen atom or a methyl group, Y represents the following formula: (However, X is a quaternized or non-quaternized (represents a dimethylaminoethyl group or Cl8H3□) and (represents a group selected from the group of groups) (where A is a glucosamine residue), and has an average molecular weight of 2,000 to 1,0σo,oo. A light-shielding copolymer characterized by being in the range of. 3 15 to 100%, preferably 20 to 80% by weight of repeating polymer units having light-shielding properties based on the total weight of the copolymer
The copolymer according to claim 2, which contains the copolymer in the following range. 4 The copolymer is 2-[(acrylamidomethyl-21-
Copolymer of hydroxy-5/-methyl)phenyl)-2H-benzotriazole and N,N-dimethyl-2-amine ethyl methacrylate quaternized with dimethyl sulfate and 2-[(acrylamidomethyl-27-hydroxy- The copolymer according to claim 2, which is selected from the group consisting of copolymers of 57-methyl)phenyl]-2H-benzotriazole and stearyl acrylate. 5 In the first step, an unsaturated derivative of the following formula: (wherein Z1 represents a group represented by the following formula: or) is first prepared, and then, in the second step, this derivative is homopolymerized. , a method for producing a light-shielding polymer containing at least one polymerized unit of the following formula (2): (representing a group represented by the following formula). 6 In the first step, an unsaturated derivative of the following formula: (wherein Z' has the meaning below) is first prepared, and then in the second step, this derivative is added in a proportion corresponding to the desired light-shielding copolymer. is copolymerized with at least one comonomer, with the following formula (■): [wherein Z1 represents a group represented by the following formula:, R' represents a hydrogen atom or a methyl group, and Y represents a The following formula: represents a group selected from the group of groups (wherein X represents a quaternized or non-quaternized dimethylaminoethyl group or Cl8H3□) (wherein A is a glucosamine residue) A method for producing a light-shielding copolymer having the following repeating unit. 7 Contains at least one polymerized unit of the following formula ■: (in the formula, Z represents a group represented by the following formula: or), and has an average molecular weight of 2,
A sunscreen cosmetic composition comprising at least one light-shielding polymer in the range of 000 to 1,000,000 in a suitable cosmetic medium. 8 The light-shielding polymer is added in an amount of 0.2 to 2% based on the total weight of the composition.
Cosmetic composition according to claim 7, containing in a proportion in the range of 0%. 9. The cosmetic composition according to claim 7 or 8, which is used in the form of an aqueous solution, hydroalcoholic solution, oily solution, gel, cream, emulsion or aerosol. 10 The following formula ■: [In the formula, Z1 represents a group represented by the following formula:, R' represents a hydrogen atom or a methyl group, and Y represents the following formula: (However, X is a quaternized or non-quaternized (represents a dimethylaminoethyl group or Cl8H3□) and (where A is a glucosamine residue), and has an average molecular weight of 2,000 to i , o o o, o o. 1. A sunscreen cosmetic composition comprising at least one light-shielding copolymer in a suitable cosmetic medium.
JP8307777A 1976-07-29 1977-07-13 Light-shielding polymer, method for producing the same, and cosmetic composition containing the same Expired JPS5825324B2 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7623174A FR2359857A2 (en) 1976-07-29 1976-07-29 ANTI-SOLAR POLYMERS AND COSMETIC COMPOSITIONS CONTAINING THEM

Publications (2)

Publication Number Publication Date
JPS5316093A JPS5316093A (en) 1978-02-14
JPS5825324B2 true JPS5825324B2 (en) 1983-05-26

Family

ID=9176322

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Country Link
JP (1) JPS5825324B2 (en)
BE (1) BE854748R (en)
CA (1) CA1043495A (en)
CH (1) CH610338A5 (en)
DE (1) DE2734149A1 (en)
FR (1) FR2359857A2 (en)
GB (1) GB1579647A (en)
IT (1) IT1116760B (en)
NL (1) NL179184C (en)
SE (1) SE432428B (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NZ208751A (en) * 1983-07-11 1987-04-30 Iolab Corp 2-hydroxy-5-acrylyloxyalkylphenyl-2h-benzotriazole derivatives and polymers and copolymers thereof and use as uv absorbing additives in polymer compositions
DE3333502A1 (en) * 1983-09-16 1985-04-18 Röhm GmbH, 6100 Darmstadt THERMOPLASTIC PLASTIC MOLDS CONTAINING UV ABSORBER
GB2171106B (en) * 1984-12-18 1989-10-11 Tr Dev Ltd Hydrogel-forming polymers
FR2597336B1 (en) * 1986-01-10 1988-12-09 Oreal NOVEL COMPOSITIONS OF POLYMERS DERIVED FROM ACRYLAMIDE SUBSTITUTED BY COMPOUNDS ABSORBING ULTRAVIOLET RADIATIONS, AND THEIR APPLICATION IN PARTICULAR IN THE PRODUCTION OF COSMETIC COMPOSITIONS FOR PROTECTING THE SKIN AGAINST THE SIDE EFFECTS OF ULTRAVIOLET RADIATION.
JPS6328277A (en) * 1986-07-21 1988-02-05 Matsushita Seiko Co Ltd Pwm signal generation circuit
US5099027A (en) * 1987-08-12 1992-03-24 Ppg Industries, Inc. 2(2-hydroxyphenyl)2H-benzotriazole compounds and homopolymers or copolymers thereof
JP3202233B2 (en) * 1991-05-22 2001-08-27 花王株式会社 Small resin particles
WO2006048159A1 (en) * 2004-11-02 2006-05-11 Dsm Ip Assets B.V. Additive for uv-sunscreen preparations

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* Cited by examiner, † Cited by third party
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FR1324899A (en) * 1961-06-16 1963-04-19 Geigy Ag J R New 2- (2'-hydroxyphenyl) -benzotriazoles and their preparation
GB1346764A (en) * 1970-06-09 1974-02-13 Agfa Gevaert Ultraviolet absorbing filter layers
LU65622A1 (en) * 1972-06-29 1974-01-04
HU164662B (en) * 1972-07-31 1974-03-28
GB1407670A (en) * 1973-06-29 1975-09-24 Oreal Anti-sunburn polymers

Also Published As

Publication number Publication date
FR2359857A2 (en) 1978-02-24
JPS5316093A (en) 1978-02-14
BE854748R (en) 1977-11-17
FR2359857B2 (en) 1979-09-28
CA1043495A (en) 1978-11-28
SE432428B (en) 1984-04-02
GB1579647A (en) 1980-11-19
IT1116760B (en) 1986-02-10
NL179184B (en) 1986-03-03
SE7705635L (en) 1978-01-30
NL179184C (en) 1986-08-01
NL7706415A (en) 1978-01-31
CH610338A5 (en) 1979-04-12
DE2734149A1 (en) 1978-02-02

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