JPS5823233B2 - transfer foil - Google Patents
transfer foilInfo
- Publication number
- JPS5823233B2 JPS5823233B2 JP51118781A JP11878176A JPS5823233B2 JP S5823233 B2 JPS5823233 B2 JP S5823233B2 JP 51118781 A JP51118781 A JP 51118781A JP 11878176 A JP11878176 A JP 11878176A JP S5823233 B2 JPS5823233 B2 JP S5823233B2
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- Prior art keywords
- layer
- transfer foil
- chromium
- thin
- transfer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Description
【発明の詳細な説明】 本発明は新規な転写箔に関する。[Detailed description of the invention] The present invention relates to a novel transfer foil.
さらに詳しくは、耐蝕性、耐候性、耐クラツク性にすぐ
れたホットスタンピング用転写箔に関する。More specifically, the present invention relates to a transfer foil for hot stamping that has excellent corrosion resistance, weather resistance, and crack resistance.
従来のホットスタンピング用転写箔の代表的なものとし
ては、アルミニウムからなる金属薄層を設けたもの、あ
るいはクロムからなる金属薄層を設けたものなどがある
。Typical examples of conventional transfer foils for hot stamping include those provided with a thin metal layer made of aluminum or those provided with a thin metal layer made of chromium.
しかしながらアルミニウムからなる金属薄層を設けた転
写箔にあっては、該金属薄層が塩水やアルカリ液に侵さ
れやすく耐蝕性の点で問題があり、また耐候性の点でも
問題があるため、かかる転写箔をホットスタンプして屋
外の装飾品や自動車の外装品を製造したばあい短期間の
うちに金属光沢が失なわれる欠点を有する。However, with transfer foils provided with a thin metal layer made of aluminum, the thin metal layer is susceptible to corrosion by salt water or alkaline liquid, and there are problems in terms of corrosion resistance, and there are also problems in terms of weather resistance. When such transfer foils are hot-stamped to produce outdoor decorations or automobile exteriors, they have the disadvantage that they lose their metallic luster within a short period of time.
一方、クロムからなる金属薄層を設けた転写箔は、耐蝕
性、耐候性の点ですぐれたものであるが、転写時の衝撃
および冷熱サイクルにおける耐クラツク性に劣るという
大きな欠点を有する。On the other hand, a transfer foil provided with a thin metal layer made of chromium has excellent corrosion resistance and weather resistance, but has a major drawback of poor impact resistance during transfer and poor crack resistance during cooling and heating cycles.
本発明者らは、クロム薄層を設けた転写箔のクラック発
生原因について種々研究を重ねた結果、該クロム薄層は
形成時における内部応力が非常に大きいこと、および転
写されるべきプラスチックi基材との熱膨張率の差が大
きいことがクラック発生の主要原因であると推定される
にいたった。As a result of various studies on the causes of cracks in transfer foils provided with a thin chromium layer, the present inventors found that the thin chromium layer has a very large internal stress during formation and that the plastic i-based material to be transferred is It has been assumed that the main cause of cracks is the large difference in thermal expansion coefficient between the material and the material.
そこでこれらのクラック発生原因を解消することにより
クロム薄層に対してすぐれた耐クラツク性を付与しうる
添加元素を見出すべくさらに研究を重ンねた結果、Va
族の元素がクロム薄層形成時における内部応力の緩和性
にすぐれ、かつ膨張係数が犬であることから、添加元素
として最適であるという知見をえ、かかる知見に基いて
本発明を完成するにいたった。Therefore, as a result of further research in order to find an additive element that could provide excellent crack resistance to a thin chromium layer by eliminating these causes of crack occurrence, we found that Va.
The present invention was completed based on the knowledge that the group elements are optimal as additive elements because they have excellent internal stress relaxation properties when forming a thin chromium layer and have a small coefficient of expansion. It happened.
; すなわち本発明は、転写箔の金属薄層としてクロム
AとVa族の元素Bの少なくとも1種とからなるほど均
質な金属薄層を設けることを特徴とする耐蝕性、耐候性
、耐クラツク性のきわめてすぐれた転写箔に関する。That is, the present invention provides a thin metal layer of a transfer foil that is homogeneous enough to be composed of chromium A and at least one element B of the Va group. Concerning extremely excellent transfer foil.
フ 前記Va族の元素Bとしては、ビスマス、アンチモ
ン、ヒ素、リンなどがあげられるが、これらのうちヒ素
は人体に有毒な物質であるから、その使用を極力避ける
のが好ましい。F. Examples of the Va group element B include bismuth, antimony, arsenic, phosphorus, etc. Among these, arsenic is a poisonous substance to the human body, so it is preferable to avoid its use as much as possible.
したがって本発明が特徴とする金属薄層の好ましい態様
としては)(1)クロム・ビスマス、(2)クロム・ビ
スマス・アンチモン、(3)クロム・ビスマス・リン、
(4)クロム・ビスマス・アンチモン・リン、(5)ク
ロム・アンチモン、(6)クロム・アンチモン・リン、
(7)クロム・リンの各組合せから、なる金属薄層があ
げられる。Therefore, preferred embodiments of the metal thin layer characterized by the present invention are (1) chromium bismuth, (2) chromium bismuth antimony, (3) chromium bismuth phosphorus,
(4) Chromium, bismuth, antimony, phosphorus, (5) chromium, antimony, (6) chromium, antimony, phosphorus,
(7) Each combination of chromium and phosphorous can produce a thin metal layer.
しかして、これらの金属薄層は、内部応力の緩和性にす
ぐれた膨張係数の犬なるVa族の元素Bが主成分のクロ
ムNにほぼ均一に分散した状態で存在。Therefore, these metal thin layers exist in a state in which element B of the Va group, which has an excellent expansion coefficient and has excellent internal stress relaxation properties, is almost uniformly dispersed in chromium N, which is the main component.
する均質な薄層であるので、いずれもすぐれた耐クラツ
ク性を有し、かつ主成分のクロムAがすぐれた耐蝕性お
よび耐候性を確保する。Because they are homogeneous thin layers, they all have excellent crack resistance, and the main component, chromium A, ensures excellent corrosion resistance and weather resistance.
かかる金属薄層にあっては、主成分のクロムNと添加成
分のVa族の元素Bとの比率を重量比で100:0.1
〜100:10の範囲内とすることが好ましい。In such a thin metal layer, the weight ratio of chromium N as a main component and Va group element B as an additive component is 100:0.1.
The ratio is preferably within the range of 100:10.
すなわち、かかる特定比率のときは主成分のクロムAが
本来固有のすぐれた耐蝕性、耐候性を何ら損なわずに耐
クラツク性を顕著に向上せしめうるからである。That is, at such a specific ratio, the main component, chromium A, can significantly improve crack resistance without impairing the originally excellent corrosion resistance and weather resistance.
これに対し、クロムAとVa族の元素Bとの比率が前記
特定範囲を下回るときは耐クラツク性の向上が顕著でな
く、一方前記特定範囲を上回るときは耐蝕性、耐候性の
低下を生じる傾向があるため、いずれも本発明の目的を
充分に達成できない。On the other hand, when the ratio of chromium A and Va group element B is below the specified range, the improvement in crack resistance is not significant, while when it exceeds the specified range, corrosion resistance and weather resistance are reduced. Because of this tendency, neither of them can sufficiently achieve the purpose of the present invention.
また金属薄層の厚さについては200〜1000人の範
囲内とすることが好ましい。The thickness of the metal thin layer is preferably within the range of 200 to 1000 people.
もし200人未満とすればクロムA固有の金属光沢かえ
られがたく、シかも転写箔をホットスタンプしたばあい
プラスチック基材に対する隠ペイカに欠けるなどの不都
合を生じ、一方1000人を超えるときは耐クラツク性
を顕著に向上せしめえないなどの不都合を生じるからで
ある。If the number is less than 200, it will be difficult to change the metallic luster inherent to Chromium A, and if the transfer foil is hot-stamped, there will be problems such as a lack of hiding power on the plastic substrate. This is because it causes inconveniences such as not being able to significantly improve crack resistance.
かくのごとき金属薄層は真空蒸着法、スパッタリング法
、イオンブレーティング法などの通常の金属薄膜形成法
によって容易に形成されうる。Such a thin metal layer can be easily formed by a conventional metal thin film forming method such as a vacuum evaporation method, a sputtering method, or an ion blasting method.
形成条件については当業者に自明のことであるから詳述
しないが、たとえば真空蒸着法によるときは真空度3X
10’〜1×10−6トール、蒸発源温度300〜20
00℃の範囲から適宜選択すればよく、またスパッタリ
ング法によるときはたとえばアルゴンなどの不活性ガス
雰囲気中で真空度5X 10−2〜1×10−3トール
の範囲から適宜選択すればよい。The formation conditions are obvious to those skilled in the art and will not be described in detail, but for example, when using a vacuum evaporation method, the degree of vacuum is 3X.
10'~1x10-6 Torr, evaporation source temperature 300~20
The temperature may be appropriately selected from the range of 00 DEG C., and when the sputtering method is used, the temperature may be appropriately selected from the vacuum degree of 5.times.10@-2 to 1.times.10@-3 Torr in an inert gas atmosphere such as argon.
本発明の転写箔は、その金属薄層として前述のごとき特
定の金属薄層を設けることを特徴とするものであって、
転写箔の積層構造やその材質などについては何ら制限を
受けるものではない。The transfer foil of the present invention is characterized in that a specific metal thin layer as described above is provided as the metal thin layer,
There are no restrictions on the laminated structure of the transfer foil or its material.
したがって本発明の転写箔は前述のごとき特定金属薄層
を設ける限りいかなる実施態様の転写箔をも包含する。Therefore, the transfer foil of the present invention includes any embodiment of the transfer foil as long as it is provided with the specific metal thin layer as described above.
以下、その代表的な実施態様について図面を参照しなが
ら説明する。Hereinafter, typical embodiments thereof will be described with reference to the drawings.
第1〜4図はそれぞれ本発明にかかる転写箔の代表的な
一実症態様を示す概略拡大部分縦断面図である。1 to 4 are schematic enlarged partial longitudinal sectional views showing typical embodiments of the transfer foil according to the present invention, respectively.
ここに1はベースフィルム、2は透明または半透明樹脂
層、3は金属薄層、4は感1g接着剤層、5は離型層、
6は金属膜保護層、7は静電気除去層である。Here, 1 is a base film, 2 is a transparent or translucent resin layer, 3 is a thin metal layer, 4 is a 1g adhesive layer, 5 is a release layer,
6 is a metal film protective layer, and 7 is a static electricity removal layer.
すなわち第1図の転写箔は、ベースフィルム1の片面に
透明または半透明樹脂層2、金属薄層3および感熱性接
着剤層4を順次積層してなるもので、ホットスタンプす
ることによって感熱性接着剤層4がプラスチック基材に
溶着し、それによって2,3および4の各層が一体とな
ってベースフィルム1より剥離し、転写されるものであ
る。That is, the transfer foil shown in FIG. 1 is made by sequentially laminating a transparent or translucent resin layer 2, a thin metal layer 3, and a heat-sensitive adhesive layer 4 on one side of a base film 1, and makes it heat-sensitive by hot stamping. The adhesive layer 4 is welded to the plastic base material, whereby the layers 2, 3 and 4 are peeled off from the base film 1 as one body and transferred.
かかる実施態様の転写箔はベースフィルム1と透明また
は半透明樹脂層2との剥離性が良好なばあいに好適に採
用される。The transfer foil of this embodiment is suitably employed when the peelability between the base film 1 and the transparent or semitransparent resin layer 2 is good.
第2図の転写箔は、ベースフィルム1と透明または半透
明樹脂層2との剥離性を向上せしめるために、両層の間
に離型層5を積層したものである。The transfer foil shown in FIG. 2 has a release layer 5 laminated between the base film 1 and the transparent or translucent resin layer 2 in order to improve their releasability.
第3図の転写箔は、前記離型層5を積層して剥離性を向
上せしめるとともに、さらに金属薄層3と感熱性接着剤
層4との間に金属膜保護層6を積層して感熱性接着剤層
4の溶着時に金属薄層3がその悪影響(たとえば金属薄
層の部分的な破損など)を受けないようにしたものであ
る。The transfer foil shown in FIG. 3 has the above-mentioned release layer 5 laminated to improve releasability, and a metal film protective layer 6 is laminated between the metal thin layer 3 and the heat-sensitive adhesive layer 4 to make it heat-sensitive. This prevents the thin metal layer 3 from being adversely affected (for example, partial damage to the thin metal layer) when the adhesive layer 4 is welded.
また、かかる態様の転写箔にあっては、接着剤を広く選
択できる利点や金属薄層の腐蝕防止の利点がある。In addition, the transfer foil of this embodiment has the advantage of being able to select a wide range of adhesives and the advantage of preventing corrosion of the thin metal layer.
第4図の転写箔は、前記離型層5および金属膜保護層6
を積層するとともに、さらにベースフィルム1の反対側
片面に静電気除去層7を積層して5.2および6の各層
の積層時にホコリやチリなどの浮遊物の付着に起因する
コーティングムラを防止したものである。The transfer foil in FIG. 4 includes the release layer 5 and the metal film protective layer 6.
In addition to laminating the base film 1, a static electricity removal layer 7 is further laminated on one side opposite to the base film 1 to prevent coating unevenness caused by the adhesion of floating substances such as dust and dirt when laminating each layer of 5.2 and 6. It is.
なお、これらの転写箔にあっては、ベースフィルム1の
材質や厚さ、あるいは2,4,5,6および7の各層の
材質や厚さについてはとくに制限はなく、下記第1表に
例示されるごとき従来の転写箔に採用されている材質お
よび厚さを有するものから適宜選択採用すればよい。For these transfer foils, there are no particular restrictions on the material and thickness of the base film 1 or the materials and thicknesses of each layer 2, 4, 5, 6, and 7, and examples are shown in Table 1 below. The material and thickness may be appropriately selected from those having the materials and thicknesses used in conventional transfer foils.
また各層の形成手段についても何ら制限はなく、たとえ
ばソルベントコーティング法(離型層5としてワックス
類を用いるばあいにはホットメルトコーティング法でも
よい)のごとき通常のコーティング手段で形*・成すれ
ばよい。Furthermore, there is no restriction on the means for forming each layer; for example, it may be formed by a normal coating method such as a solvent coating method (if a wax is used as the release layer 5, a hot melt coating method may be used). good.
以上述べたごとき本発明の転写箔は、たとえば自転車お
よび自動車用外装材、ラベル、ネームプレート、化粧品
の包装材、銘板、各種プラスチック成形品などのごとき
金属代替用装飾材の用途に。The transfer foil of the present invention as described above can be used as a decorative material for replacing metal, such as exterior materials for bicycles and automobiles, labels, name plates, packaging materials for cosmetics, name plates, and various plastic molded products.
巾広く用いられ、とくに耐候性、耐蝕性、耐クラツク性
を必要とする装飾材の用途に最適である。It is widely used and is especially suitable for decorative materials that require weather resistance, corrosion resistance, and crack resistance.
つぎに実施例および比較例をあげて本発明の詳細な説明
するが、本発明はもとよりこれらの実施例のみに限定さ
れるものではない。Next, the present invention will be described in detail with reference to Examples and Comparative Examples, but the present invention is not limited to these Examples.
実施例 1
厚さ18μのポリエチレンテレツクレートフィルムの片
面に、ワックスのトルエン溶液を塗布後乾燥して乾燥層
厚0.5μの離型層を設け、その上に熱硬化性アクリル
樹脂のアルコールートルエンノ溶液を塗布、乾燥して乾
燥層厚1μの透明樹脂層ヲ設けた。Example 1 A toluene solution of wax was coated on one side of a 18μ thick polyethylene terrestrial film and dried to form a release layer with a dry layer thickness of 0.5μ, and on top of that was a release layer of thermosetting acrylic resin alcohol-toluene. The solution was applied and dried to provide a transparent resin layer with a dry layer thickness of 1 μm.
ついでクロム−ビスマス(100:3(重量比))のタ
ーゲットを用いて、マグネトロンスパッターにより5×
10−3トールのアルゴンガス雰囲気中で投入電力65
0■、2Aの条件下にスパッタリングしてクロムとビス
マスの比率が重量比でほぼ100:3の厚さ500人の
金属薄層を設けた。Then, using a chromium-bismuth (100:3 (weight ratio)) target, 5×
Input power 65 in 10-3 torr argon gas atmosphere
A thin metal layer having a thickness of 500 mm and having a weight ratio of chromium to bismuth of about 100:3 was formed by sputtering under conditions of 0.0 mm and 2 A.
さらに該金属薄層の上にアクリル酸エステル−塩化ビニ
ル共重合体のトルエン−酢酸エチル溶液を塗布、乾燥し
て乾燥層厚1.5μの感熱性接着剤層を設け、第2図に
示されるごとき構造の転写箔を作製した。Furthermore, a toluene-ethyl acetate solution of acrylic acid ester-vinyl chloride copolymer was applied on the thin metal layer and dried to form a heat-sensitive adhesive layer with a dry layer thickness of 1.5 μm, as shown in FIG. We created a transfer foil with a structure like this.
この転写箔を常法にしたがってABS成形品の表面にホ
ットスタンプした。This transfer foil was hot-stamped on the surface of an ABS molded product according to a conventional method.
転写層は美麗なりロム光沢を呈した。The transfer layer exhibited a beautiful ROM gloss.
つぎに、えられたABS成形転写品について、塩水噴霧
試験、冷熱サイクル試験および耐候試験を以下の方法に
したがって行なった。Next, the obtained ABS molded transfer product was subjected to a salt spray test, a thermal cycle test, and a weather resistance test according to the following methods.
(1)塩水噴霧試験:ABS成形転写品に塩水を8時間
噴霧、16時間休止
のサイクルを4回繰返し、
腐蝕の有無を観察した。(1) Salt water spray test: A cycle of spraying salt water on the ABS molded transfer product for 8 hours and resting for 16 hours was repeated 4 times, and the presence or absence of corrosion was observed.
(2)?lAサイクル試験:ABS成形転写品を一30
℃で20時間保持後室温で
4時間保持し、ついで80
℃で20時間保持後室温で
1時間保持するのを1サイ
クルとし、3サイクル行な
ったのちクラックの有無を
観察した。(2)? lA cycle test: ABS molded transfer product - 130
One cycle consisted of holding at 80° C. for 20 hours, then at room temperature for 4 hours, then at 80° C. for 20 hours, and then at room temperature for 1 hour. After 3 cycles, the presence or absence of cracks was observed.
(3)耐 候 試 験:サンシャインウェザ−メーク(
東洋理化工業■製)で・
400時間暴露後金属光沢
の低下を調べた。(3) Weather resistance test: Sunshine Weather Make (
(manufactured by Toyo Rika Kogyo ■) and examined the decrease in metallic luster after 400 hours of exposure.
その結果、ABS成形転写品は腐蝕、クラックの発生、
金属光沢の低下がまったく認められなかった。As a result, ABS molded transfer products suffer from corrosion, cracks, and
No reduction in metallic luster was observed at all.
実施例 2
実施例1の金属薄層に代えて、クロム−アンチモン(1
00:3(重量比))の混合粉末焼結体をエレクトロン
ビーム加熱方式による真空蒸着法を採用して、真空度l
Xl0−5トール、投入型カゴ0、1 kWの条件下に
蒸着し、クロムとアンチモンの比率が重量比でほぼ10
0:3の厚さ400人の金属薄層を設けたほかは実施例
1と同様にして転写箔を作製した。Example 2 Instead of the thin metal layer of Example 1, chromium-antimony (1
A vacuum evaporation method using an electron beam heating method was used to prepare a mixed powder sintered body with a ratio of 0.00:3 (weight ratio) to a vacuum degree of l.
It was deposited under the conditions of
A transfer foil was produced in the same manner as in Example 1, except that a thin metal layer with a thickness of 0:3 was provided.
えられた転写箔を用いてABSBS成形品写しシたのち
、実施例1と同様にしてABS成形転写品の塩水噴霧試
験、冷熱サイクル試験および耐候試験を行なった。After copying the ABS molded product using the obtained transfer foil, the ABS molded transfer product was subjected to a salt spray test, a thermal cycle test, and a weather resistance test in the same manner as in Example 1.
その結果、実施例1のばあいと同様に腐蝕、クラックの
発生、金属光沢の低下がまったく認められなかった。As a result, as in the case of Example 1, no corrosion, no cracking, and no decrease in metallic luster was observed.
実施例 3
2個のバースにクロムとリンとを別々に入れ、真空度I
X 10−5トール、エレクトロンパワー0.4kW
でエレクトロンビームを約100:1の割合で照射する
同時蒸着を行ない、クロムとリンの比率が重量比で10
0:1の厚さ800人の金属薄層を設けたほかは実施例
1と同様にして転写箔を作製した。Example 3 Chromium and phosphorus are placed separately in two berths, and the vacuum degree is I.
X 10-5 torr, electron power 0.4kW
Simultaneous deposition is performed by irradiating electron beams at a ratio of approximately 100:1, and the ratio of chromium to phosphorus is 10 by weight.
A transfer foil was produced in the same manner as in Example 1 except that a thin metal layer with a thickness of 0:1 was provided.
えられた転写箔を用いて実施例1と同様にABSBS成
形品写し、塩水噴霧試験、冷熱サイクル試験および耐候
試験を行なった。Using the obtained transfer foil, ABSBS molded product copying, a salt spray test, a thermal cycle test, and a weather resistance test were conducted in the same manner as in Example 1.
その結果、実施例1のばあいと同様に腐蝕、クラックの
発生、金属光沢の低下がまったく認められなかった。As a result, as in the case of Example 1, no corrosion, no cracking, and no decrease in metallic luster was observed.
比較例 1
実施例1のクロム−ビスマスのターゲットに代えてクロ
ム単独のターゲットを用いたほかは実施例1と同様にし
て厚さ500人のクロム薄層を有する転写箔を作製した
。Comparative Example 1 A transfer foil having a thin chromium layer of 500 mm thick was produced in the same manner as in Example 1, except that a chromium-only target was used in place of the chromium-bismuth target in Example 1.
この転写箔を用いてA、BS成形品に転写したのち、実
施例1と同様にしてABS成形転写品の塩水噴霧試験、
冷熱サイクル試験および耐候試験を行なった。After transferring to A and BS molded products using this transfer foil, the ABS molded transfer product was subjected to a salt spray test in the same manner as in Example 1.
A thermal cycle test and a weather test were conducted.
その結果、腐蝕および金属光沢の低下はまったく認めら
れなかったが、冷熱サイクル試験においては1サイクル
でクラックの発生がみられた。As a result, no corrosion or reduction in metallic luster was observed at all, but cracks were observed in one cycle in the thermal cycle test.
第1〜4図はそれぞれ本発明にかかる転写箔の代表的な
一実椎態様を示す概略拡大部分縦断面図である。
図面の符号、1・・・・・・ベースフィルム、2・・・
・・・透明または半透明樹脂層、3・・・・・・金属薄
層、4・・・・・・感熱性接着剤層、5・・・・・・離
型層、6・・・・・・金属膜保護層、7・・・・・・静
電気除去層。1 to 4 are schematic enlarged partial vertical cross-sectional views showing typical solid embodiments of the transfer foil according to the present invention, respectively. Drawing code, 1...Base film, 2...
... Transparent or translucent resin layer, 3 ... Thin metal layer, 4 ... Heat-sensitive adhesive layer, 5 ... Release layer, 6 ... ...Metal film protective layer, 7...Static electricity removal layer.
Claims (1)
Bの少なくとも1種とからなるほぼ均質な金属薄層を設
けたことを特徴とする転写箔。 2 クロムAとVa族の元素Bとの比率が、重量比で1
00:C)、1〜100:10の範囲内にある特許請求
の範囲第1項記載の転写箔。 3 金属薄層の厚さが200〜1000人の範囲内にあ
る特許請求の範囲第1項または第2項記載の転写箔。[Scope of Claims] 1. A transfer foil characterized in that a substantially homogeneous thin metal layer consisting of chromium A and at least one element B of the Va group is provided as the thin metal layer of the transfer foil. 2 The ratio of chromium A to Va group element B is 1 by weight.
00:C), 1 to 100:10. 3. The transfer foil according to claim 1 or 2, wherein the thickness of the metal thin layer is within the range of 200 to 1000 layers.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP51118781A JPS5823233B2 (en) | 1976-10-02 | 1976-10-02 | transfer foil |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP51118781A JPS5823233B2 (en) | 1976-10-02 | 1976-10-02 | transfer foil |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5344215A JPS5344215A (en) | 1978-04-20 |
JPS5823233B2 true JPS5823233B2 (en) | 1983-05-13 |
Family
ID=14744913
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP51118781A Expired JPS5823233B2 (en) | 1976-10-02 | 1976-10-02 | transfer foil |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5823233B2 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58116191A (en) * | 1981-12-29 | 1983-07-11 | Oike Kogyo Kk | Transfer foil |
-
1976
- 1976-10-02 JP JP51118781A patent/JPS5823233B2/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS5344215A (en) | 1978-04-20 |
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