JPS5821893A - Method of producing flexible printed circuit board - Google Patents

Method of producing flexible printed circuit board

Info

Publication number
JPS5821893A
JPS5821893A JP11936281A JP11936281A JPS5821893A JP S5821893 A JPS5821893 A JP S5821893A JP 11936281 A JP11936281 A JP 11936281A JP 11936281 A JP11936281 A JP 11936281A JP S5821893 A JPS5821893 A JP S5821893A
Authority
JP
Japan
Prior art keywords
group
weight
parts
bonded
molecule
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11936281A
Other languages
Japanese (ja)
Other versions
JPS6360558B2 (en
Inventor
仲間 敬一郎
北島 一人
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Momentive Performance Materials Japan LLC
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Toshiba Silicone Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd, Toshiba Silicone Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Priority to JP11936281A priority Critical patent/JPS5821893A/en
Publication of JPS5821893A publication Critical patent/JPS5821893A/en
Publication of JPS6360558B2 publication Critical patent/JPS6360558B2/ja
Granted legal-status Critical Current

Links

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 本発明は、金属箔と融点が260℃以上のプラスチック
フィルムとを接着するに於いて、その接着剤として、 (A)  ケイ素原子に結合したビニル基を分子中に平
均2個以上有し、平均重合度が50〜10,000のポ
リオルガノシロキサン1oo重量部、(B)  ケイ素
原子に結合した水素原子を分子中に平均2個を越える数
を有するポリオルガノハイドロジエンシロキサン、該水
素原子が(Δ)中のケイ素原子に結合したビニル基1モ
ルに対して、0.5〜10モルになる量、 (C)  シリカ系充填剤20〜150重量部、(D)
  一般式(FeO)x (Fe2O3)y  (ただ
し、Xバは0.05〜1.0である。)で表わされる酸
化鉄又は(及び)カーボンブラック0,5〜20重量部
、 (E)白金化合物白金原子として1〜200 ppm、
(F)  分子鎖のケイ素原子に結合した水素原子を分
子中に少なくとも1個と、一般式 %式% びQ2は互いに同−又は相異なる直鎖状又は分枝状のア
ルキレン基、Rは炭素数1〜4のアルキル基を示す。)
で表わされ、分子鎖のケイ素原子に結合した基を分子中
に少なくとも1個有するポリシロキチン0.5〜50重
量部、から成る接着剤組成物を基板の構成たる融点が2
60℃以上のプラスチックフィルム又は(及び)金属箔
に塗布して乾燥した後、このプラスチックフィルムと金
amとを重ね加熱圧着し、アフターキ=アーすることを
特徴とするフレキシブルプリント配線用基板の製造方法
に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention provides an adhesive for bonding a metal foil to a plastic film having a melting point of 260° C. or higher. 10 parts by weight of a polyorganosiloxane having 2 or more hydrogen atoms and an average degree of polymerization of 50 to 10,000; (B) a polyorganohydrodiene siloxane having an average number of more than 2 hydrogen atoms bonded to silicon atoms in the molecule; , an amount in which the hydrogen atom is 0.5 to 10 moles per mole of the vinyl group bonded to the silicon atom in (Δ), (C) 20 to 150 parts by weight of a silica filler, (D)
Iron oxide or (and) 0.5 to 20 parts by weight of carbon black represented by the general formula (FeO) 1 to 200 ppm as compound platinum atoms,
(F) At least one hydrogen atom bonded to a silicon atom in the molecular chain in the molecule, the general formula % and Q2 are linear or branched alkylene groups that are the same or different from each other, and R is carbon It represents an alkyl group of numbers 1 to 4. )
An adhesive composition consisting of 0.5 to 50 parts by weight of polysilochitin, which is represented by
A method for manufacturing a flexible printed wiring board, which comprises coating a plastic film or (and) metal foil at 60° C. or higher, drying the film, then overlaying the plastic film and gold am and heat-pressing it, followed by after-keying. It is related to.

電子機器の多様化に伴って、軽量で立体配線の出来るフ
レキシブル配線板の普及が著しいが、最近、安全性の立
場から難撚性の要求が強くなってきており、特に厳しい
難燃性の試験法であるUL 94 V−〇相当の難燃性
が要求されてきている。然し乍ら、ポリイミドフィルム
等の耐熱性プラスチックフィルムは耐熱性、難燃性等に
勝れているものもあるが、接着剤を介して金属箔とプラ
スチックフィルムとを加熱圧着により一体化するフレキ
シブルプリント配線用基板に於いては、接着剤の特性で
基板の接着性、耐熱性及び難燃性等の特性が決まり、接
着剤にこれらの特性を兼備させることは極めて困難であ
った。これは、融点が260 ℃以上のプラスチックフ
ィルム例えば、ポリイミドフィルムと金属箔との接着剤
として耐熱性を発揮させる為に一般的に用いられている
エポキシ樹脂に難燃性の為に臭素を含有する臭素化エポ
キシ樹脂を用いた場合には、耐熱性、接着性が著しく低
下するからである。
With the diversification of electronic equipment, flexible wiring boards that are lightweight and capable of three-dimensional wiring are becoming increasingly popular, but recently there has been a strong demand for twist resistance from a safety standpoint, and particularly stringent flame retardant tests are required. Flame retardancy equivalent to UL 94 V-○, which is the legal standard, is now required. However, although some heat-resistant plastic films such as polyimide films have excellent heat resistance and flame retardancy, they are not suitable for flexible printed wiring, which integrates metal foil and plastic film by heat and pressure bonding via adhesive. Regarding substrates, the characteristics of the adhesive determine the adhesive properties, heat resistance, flame retardance, etc. of the substrate, and it has been extremely difficult to make the adhesive have all of these characteristics. This is a plastic film with a melting point of 260 °C or higher, such as an epoxy resin that is commonly used to exhibit heat resistance as an adhesive between a polyimide film and metal foil, but contains bromine for flame retardancy. This is because when a brominated epoxy resin is used, heat resistance and adhesiveness are significantly reduced.

本発明者等は種々検討した結果、接着剤として付加反応
架橋型シリコーン樹脂を用いることにより、フレキシブ
ルプリント配線用基板として必要な引き剥がし強さく接
着性)、半田耐熱性、難燃性等の特性が満たされること
を見い出し、本発明を完成させるに至った。
As a result of various studies, the inventors of the present invention found that by using an addition reaction cross-linked silicone resin as an adhesive, properties such as peel strength and adhesion required for a flexible printed wiring board, soldering heat resistance, flame retardance, etc. They have found that the following requirements are satisfied, and have completed the present invention.

以下、本発明の詳細な説明する。The present invention will be explained in detail below.

本発明に於ける金属箔としては、銅箔、アルミニウム箔
、ニッケル箔、ニクロム箔等の導電性を有する金属箔が
使用出来る。
As the metal foil in the present invention, conductive metal foils such as copper foil, aluminum foil, nickel foil, and nichrome foil can be used.

本発明に於けるプラスチックフィルムとしては、ポリイ
ミドフィルム、ポリアミドフィルム= 5− イルム、ポリアミドフィルム、ポリスルホンフィルム、
二軸延伸ポリエステルフィルム等の融点が260℃以上
のプラスチックフィルムが使用出来る。
Examples of the plastic film in the present invention include polyimide film, polyamide film = 5-ilm, polyamide film, polysulfone film,
A plastic film having a melting point of 260° C. or higher, such as a biaxially stretched polyester film, can be used.

接着剤組成物の各成分について説明する。Each component of the adhesive composition will be explained.

仄)のポリオルガノシロキサンは、シリコーン接着剤の
ベースポリマーであって実質的に直鎖状の骨格を為し、
(B)によって網状高分子を形成する為には、ケイ素原
子(−結合したビニル基を分子中に平均2個以上有する
ことが必要である。
廄) Polyorganosiloxane is a base polymer of silicone adhesive and has a substantially linear skeleton.
In order to form a network polymer using (B), it is necessary to have an average of two or more silicon atoms (-bonded vinyl groups) in the molecule.

ケイ素原子に結合した有機基としては、上記のビニル基
の他に、メチル基、エチル基、プロピル基、ブチル基、
ペンチル基、ヘキシル基、オクチル基、デシル基、ドデ
シル基の様なアルキシ基、フェニル基の様なアリール基
、ベンジル基、β−フェニルエチル基、β−フェニルプ
ロピル基の様なアラルキル基、β−シアノエチル基、3
.3.3−)リフルオロプロピル基、クロロフェニル基
の様な置換炭化水素基が例示されるが、ポリジオルガノ
シロキサンの特徴である耐熱性、 6− 耐寒性を示し、且つ合成し易く取扱いも容易な点で、該
有機基中の85%以上がメチル基であることが好ましく
、ビニル基以外の有機基が実質的に総てメチル基である
ことが更に好ましい。
In addition to the vinyl group mentioned above, organic groups bonded to silicon atoms include methyl group, ethyl group, propyl group, butyl group,
Alkyl groups such as pentyl group, hexyl group, octyl group, decyl group, dodecyl group, aryl group such as phenyl group, aralkyl group such as benzyl group, β-phenylethyl group, β-phenylpropyl group, β- Cyanoethyl group, 3
.. 3.3-) Substituted hydrocarbon groups such as lifluoropropyl group and chlorophenyl group are exemplified, but polydiorganosiloxanes exhibit the characteristics of heat resistance and 6- cold resistance, and are easy to synthesize and handle. In this respect, it is preferable that 85% or more of the organic groups are methyl groups, and it is more preferable that substantially all organic groups other than vinyl groups are methyl groups.

分子末端は通常トリメチルシリル基、ジメチルビニルシ
リル基、ジメチルフェニルシリル基の様なトリオルガノ
シリル基か水酸基で閉塞される。平均重合度はシロキサ
ン単位として50〜10.000の範囲であることが好
ましい、、50未満では架橋によって十分な機械的強度
が得られず引き剥がし強さが弱い。また、ポリジオルガ
ノシロキサンの粘度が低くなって配合した(0)やfD
)が沈降する為(1均−な接着剤層が得られない。
The terminal end of the molecule is usually blocked with a triorganosilyl group such as trimethylsilyl, dimethylvinylsilyl, dimethylphenylsilyl, or hydroxyl group. The average degree of polymerization is preferably in the range of 50 to 10,000 in terms of siloxane units. If it is less than 50, sufficient mechanical strength cannot be obtained due to crosslinking, resulting in weak peel strength. In addition, the viscosity of polydiorganosiloxane is lowered and the blended (0) and fD
) settles, making it impossible to obtain a uniform adhesive layer.

また、10,000を越えると合成し叶い上、(0)や
FD)を均一(二分散させることが極めて困難になる接
着側層1:十分な機械的強度、特1:衝撃や剪断力が働
いたときに耐える力を与えるには、重合度が3,000
〜10,000の範囲であることが好ましい。
In addition, if it exceeds 10,000, it will be difficult to synthesize (0) and FD), and it will be extremely difficult to uniformly (bidisperse) adhesive side layer 1: sufficient mechanical strength, special feature 1: impact and shear force. The degree of polymerization must be 3,000 to provide strength when working.
The range is preferably from 10,000 to 10,000.

(B)のポリオルガノハイドロジエンシロキサンはその
ケイ素−水素結合が(B)の触媒作用によって、(A)
のケイ素原子に結合したビニル基と反応することにより
、仏)を架橋して網状高分子とするものであり、斯々る
網状化の為には分子中にケイ素原子に結合した水素原子
を平均2個を越える数を有することが必要である。分子
骨格は直鎖状、分岐状、環状の何れでもよい。ケイ素原
子に結合した有機基としては(A>に例示した様なアル
ギル基、アリール基、アラルキル基及び]U換炭化炭化
水素例示されるが、(A)との間に良好な相溶性をもつ
為には(A>と同様な有機基の構成であることが好まし
く、(A)の場合と同様な理由から、メチル基であるこ
とが好ましい。(B)の配合量は、<A、)中のケイ素
原子に結合したビニル基1モルに対して(B)のケイ素
原子に結合した水素原子が0.5〜10モルの間である
。0.5モル未満では硬化が十分行われず半田耐熱性が
得られず、10モルを越えると硬化後も未反応のケイ素
−水素結合の残存量が多いので耐熱性が低下する。また
、勝れた引き剥がし強さを付与する為には、上記の水素
原子の量が、2,5〜6モルの間であることが好ましい
。2.5モル未満又は6モルを越えると、十分な引き剥
がし強さが得られない。
The polyorganohydrodiene siloxane (B) has a silicon-hydrogen bond that is formed by the catalytic action of (B).
By reacting with the vinyl group bonded to the silicon atom of the molecule, the molecule is crosslinked to form a network polymer, and in order to create such a network, hydrogen atoms bonded to the silicon atom in the molecule must be It is necessary to have more than two. The molecular skeleton may be linear, branched, or cyclic. Examples of the organic group bonded to a silicon atom include (argyl group, aryl group, aralkyl group, and] U-substituted hydrocarbons as exemplified in A>), which have good compatibility with (A). In order to achieve this, it is preferable to have the same organic group structure as (A>, and for the same reason as in (A), a methyl group is preferable. The blending amount of (B) is <A,) The hydrogen atoms bonded to silicon atoms in (B) are between 0.5 and 10 moles per mole of vinyl groups bonded to silicon atoms in (B).If less than 0.5 moles, curing will not be sufficient and the soldering heat resistance will be poor. If the amount exceeds 10 mol, there will be a large amount of unreacted silicon-hydrogen bonds remaining even after curing, resulting in a decrease in heat resistance.In addition, in order to provide excellent peel strength, the above-mentioned The amount of hydrogen atoms is preferably between 2.5 and 6 moles.If it is less than 2.5 moles or more than 6 moles, sufficient peel strength cannot be obtained.

(0)のシリカ系充填剤は、接着剤に機械的強度耐熱性
及び難燃性を与えるもので、煙霧質シリカ、沈殿シリカ
、シリカエアロゲル、焼成シリカの様な補強性の強いも
の、粉砕石英、溶融シリカ、珪藻土の様な大量に系に配
合出来て難燃性を付与するものが例示される。接着剤に
耐湿性や耐熱水性を与える為に、上記の補強性充填剤の
表面をオルガノクロロシラン、ポリジメチルシロキサン
、ヘキサメチルジシランの様な有機ケイ素化合物で処理
して、表面のシラノール基の一部又は全部を改質するこ
とが好ましい。
The silica-based filler (0) is one that provides mechanical strength, heat resistance, and flame retardancy to the adhesive, and includes strong reinforcing materials such as fumed silica, precipitated silica, silica aerogel, calcined silica, and crushed quartz. , fused silica, and diatomaceous earth, which can be incorporated into the system in large quantities and impart flame retardancy. In order to impart moisture resistance and hot water resistance to the adhesive, the surface of the reinforcing filler described above is treated with an organosilicon compound such as organochlorosilane, polydimethylsiloxane, or hexamethyldisilane to remove some of the silanol groups on the surface. Or it is preferable to modify all of them.

(0)の配合量は(A)100重量部に対して20〜1
50重量部好ましくは40〜100重量部の範囲である
。20重量1部以下では引き剥がし強さや難燃性が十分
でなく150重量部を越えると接着剤層が硬くなり過ぎ
十分な引き剥がし強さが得られ= 9− ない。また、勝れた難燃性を得る為には(C)のうち粉
砕石英又は溶融シリカの量が30〜100重量部あるこ
とが好ましい。30重量部未満では十分な難燃性が得ら
れず、100重量部を越えると沈降し易く均一な接着剤
層が得られない。
The blending amount of (0) is 20 to 1 per 100 parts by weight of (A).
The amount is 50 parts by weight, preferably 40 to 100 parts by weight. If it is less than 1 part by weight of 20 parts, the peel strength and flame retardance will not be sufficient, and if it exceeds 150 parts by weight, the adhesive layer will become too hard and sufficient peel strength cannot be obtained. Further, in order to obtain excellent flame retardancy, it is preferable that the amount of crushed quartz or fused silica in (C) is 30 to 100 parts by weight. If it is less than 30 parts by weight, sufficient flame retardancy cannot be obtained, and if it exceeds 100 parts by weight, sedimentation tends to occur and a uniform adhesive layer cannot be obtained.

(D)の酸化鉄、カーボンブラックは、接着剤層に勝れ
た難燃性を付与するもので、一般式(Fe0))x(F
ears )yで表わされ、Xとyの比0.05〜1.
0の範囲である酸化鉄とカーボンブラックを単独又は併
用して使用出来る。両者を比較すると酸化鉄の方がより
高い難燃性を与える。
Iron oxide and carbon black (D) impart excellent flame retardancy to the adhesive layer, and have the general formula (Fe0)) x (F
ears )y, and the ratio of X and y is 0.05 to 1.
Iron oxide and carbon black in the range of 0 can be used alone or in combination. When comparing the two, iron oxide provides higher flame retardancy.

酸化鉄のXとyの比が上記の範囲以外では、十分な難燃
性が得られない。(D)の配合量は、(A)100重量
部に対して0.5〜20重量部の範囲である。0.5重
量部未満では難燃性が十分でなく、20重量部を越すと
引き剥がし強さの低下を来たす。
If the ratio of X to y of iron oxide is outside the above range, sufficient flame retardancy cannot be obtained. The blending amount of (D) is in the range of 0.5 to 20 parts by weight per 100 parts by weight of (A). If the amount is less than 0.5 parts by weight, the flame retardance will not be sufficient, and if it exceeds 20 parts by weight, the peel strength will decrease.

(E)の白金化合物は、(A)のビニル基と(B)のケ
イ素−水素結合を反応させることにより(A)を(B)
で架橋させる為の触媒であり、また、硬化後の接 10
− 着剤に難燃性を付与する重要な成分である。(E)とし
ては、塩化白金酸、塩化白金−オレフィン錯体、塩化白
金−ジアルキルエーテル錯体、塩化白金−ビニル基含有
ポリシロキサン錯体、0価及び2価の白金−ホスフィン
錯体並びに白金−ホスファイト錯体、アセチルアセトナ
ト白金等が例示される。@)の配合量はその種類によっ
ても適正な範囲が相違するが、(A)に対して、白金原
子として1〜200 ppm好ましくは5〜50ppm
の範囲である。(E)が少な過ぎると十分な難燃性が得
られず、また、多すぎると半田耐熱性の低下を来たす。
The platinum compound (E) is produced by converting (A) into (B) by reacting the vinyl group of (A) with the silicon-hydrogen bond of (B).
It is a catalyst for crosslinking, and also a catalyst for crosslinking after curing.
- It is an important component that imparts flame retardancy to adhesives. (E) includes chloroplatinic acid, platinum chloride-olefin complexes, platinum chloride-dialkyl ether complexes, platinum chloride-vinyl group-containing polysiloxane complexes, zero- and divalent platinum-phosphine complexes, and platinum-phosphite complexes, Examples include acetylacetonatoplatinum. The appropriate amount of @) varies depending on its type, but it is 1 to 200 ppm, preferably 5 to 50 ppm as platinum atoms, relative to (A).
is within the range of If (E) is too small, sufficient flame retardancy cannot be obtained, and if it is too large, soldering heat resistance will be reduced.

(F)のポリシロキサンは、勝れた引き剥がし強さな付
与するもので、シロキサン骨格は、直鎖状、分岐状、環
状の何れでもよいが、合成の容易なことから、通常、直
鎖状又は環状のものが用いられる。また、水素原子と −Q’−C−0Q2Si(OR)3は、通常、シロギナ
ン骨格の別々のケイ素原子に結合するが、同一のケイ素
原子に結合しても差支えない。Q’及びC2は同一でも
相異なってもよく、メチレン基、エチレン基、プロピレ
ン基、ブチレン基等が例示され、プロピレン基、ブチレ
ン基は、直鎖状でも分岐状でもよい。合成の容易なこと
と耐加水分解性から、Qlはメチレン基又は1,2−プ
ロピレン基 C2はケイ素原子とエステル酸素原子を少
なくとも3個の炭素鎖によって結ぶアルキレン基、特に
1,3−プロピレン基であることが好ましい。Rとして
はメチル基、エチル基、プロピル基、ブチル基が挙げら
れるが、良好な引き剥がし強さを得るには、メチル基又
はエテル基が好ましい。(F)の配合量は、(A)10
0重量部に対して0.5〜50重量部好ましくは、2〜
10重量部の範囲である。0.5重量部未満では接着性
が十分でなく50重量部を越えると耐熱性と難燃性が低
下するからである。
The polysiloxane (F) has excellent peel strength, and the siloxane skeleton may be linear, branched, or cyclic, but it is usually a linear chain because it is easy to synthesize. A shape or a ring shape is used. Furthermore, although the hydrogen atom and -Q'-C-0Q2Si(OR)3 are usually bonded to separate silicon atoms of the silogenane skeleton, they may be bonded to the same silicon atom. Q' and C2 may be the same or different, and examples include a methylene group, an ethylene group, a propylene group, a butylene group, and the propylene group and the butylene group may be linear or branched. For ease of synthesis and hydrolysis resistance, Ql is a methylene group or a 1,2-propylene group, and C2 is an alkylene group that connects a silicon atom and an ester oxygen atom through at least three carbon chains, especially a 1,3-propylene group. It is preferable that Examples of R include a methyl group, an ethyl group, a propyl group, and a butyl group, and in order to obtain good peel strength, a methyl group or an ether group is preferable. The blending amount of (F) is (A) 10
0.5 to 50 parts by weight, preferably 2 to 50 parts by weight
The range is 10 parts by weight. This is because if the amount is less than 0.5 parts by weight, the adhesiveness will be insufficient, and if it exceeds 50 parts by weight, the heat resistance and flame retardance will be reduced.

この他、接着剤中には任意の成分として、その他の離燃
剤、耐熱性向上剤、(C)及び(Dlを(A)と混和す
るときの加工助剤、安定剤等、公知のものを配合しても
差支えない。
In addition, the adhesive may contain other known components such as flame retardants, heat resistance improvers, processing aids and stabilizers when (C) and (Dl are mixed with (A)). There is no problem even if they are combined.

本発明の接着剤は、通常(A)、 (C1,(D)、 
(E)及び(G)から成るベースと(B)及び(F)か
ら成る架橋剤組成物を別々に調整しておき、使用直前に
ベースと架橋剤組成物を混合して調整するが、(A、)
、 (C)及び/又は(Glの一部を架橋剤組成物に配
合してもよく、(E)を別個に保存してもよい。また、
後者の場合、混合の便宜の為に(八)の一部を(E)と
共存させても差支えない。
The adhesive of the present invention is usually (A), (C1, (D),
The base consisting of (E) and (G) and the crosslinking agent composition consisting of (B) and (F) are prepared separately, and the base and crosslinking agent composition are mixed immediately before use. A,)
, (C) and/or (a portion of (Gl) may be blended into the crosslinker composition, and (E) may be stored separately.
In the latter case, a part of (8) may be allowed to coexist with (E) for the convenience of mixing.

本発明に於けるプラスチックフィルムと金属箔との貼り
合せは常法により行える。例えば、特公昭55−194
38にある様に、プラスチックフィルムを送り出し塗布
ロールで接着剤をフィルムの片面に塗布し、次いで乾燥
部を通過させて接着剤を乾かす。一方、金属箔を送り出
し、加熱された圧着ロールで接着剤付きフィルムと連続
的に貼合せる。次いで、乾燥炉で接着剤をアフターキー
アーし半田耐熱性、引き剥がし強さを向」ニさせる。
In the present invention, the plastic film and the metal foil can be bonded together by a conventional method. For example, Tokuko Sho 55-194
38, the plastic film is delivered and an application roll applies adhesive to one side of the film, and then passes through a drying section to dry the adhesive. Meanwhile, the metal foil is sent out and continuously bonded to the adhesive-coated film using a heated pressure roll. Next, the adhesive is after-keyed in a drying oven to improve solder heat resistance and peel strength.

以下実施例について説明する。Examples will be described below.

 13 一 実施例1 下記のポリシロキサンS−1〜S−9を用いて、第1表
の様な配合比で接着剤A−1〜A−18を調整した。即
ち、A−1を例にとると、ポリシロキサンS−1、煙霧
質シリカ、粉砕シリカを混練機で十分に混練し、更に酸
化鉄と白金−ビニルシロキサン錯体を添加して混練し、
ベースコンパウンドを得た。これをトルエンに稀釈し、
これに予め混合しておいたポリシロキサンS−4とS−
6の混合液を配合して十分に攪拌し、接着剤A−1を得
た。同様にしてA−2〜A−18の接着剤を得た。
13 Example 1 Adhesives A-1 to A-18 were prepared using the following polysiloxanes S-1 to S-9 at the compounding ratios shown in Table 1. That is, taking A-1 as an example, polysiloxane S-1, fumed silica, and pulverized silica are sufficiently kneaded in a kneader, and further iron oxide and platinum-vinyl siloxane complex are added and kneaded,
I got the base compound. Dilute this with toluene,
Polysiloxane S-4 and S- mixed in advance with this
The mixed solution of No. 6 was blended and sufficiently stirred to obtain adhesive A-1. Adhesives A-2 to A-18 were obtained in the same manner.

次いで、厚さ50μmのポリイミドフィルム(カプトン
:デーポン社製)に前記接着剤例えばA−1を乾燥後で
厚さが約20μmになる様に塗布し、130℃2分間乾
燥後、厚さ35μm電解銅箔を加熱ロールで貼合せ、1
60℃10時間アフターキーアーし、フレキシブルプリ
ント配線用基板B−1を得た。同様にしてA ?、〜A
−18の接着剤を用いて、B−2〜B−18のフレキシ
ブルプ 14− リント配線用基板を得た。このものの性能を表2に示す
Next, the adhesive, for example A-1, was applied to a polyimide film (Kapton, manufactured by Dapon Co., Ltd.) with a thickness of 50 μm to a thickness of about 20 μm after drying, and after drying at 130° C. for 2 minutes, electrolysis was performed to a thickness of 35 μm Laminate the copper foil with a heating roll, 1
After-keying was carried out at 60° C. for 10 hours to obtain a flexible printed wiring board B-1. Similarly, A? ,~A
Flexible print wiring boards B-2 to B-18 were obtained using the adhesive No. 18. The performance of this product is shown in Table 2.

S−1:0.2モル%のメチルビニルシロキシ単位と残
余のジメチルシロキシ単位 から成り、末端がトリメチルシリル基 で閉塞され、平均重合度が7,000のポリジオルガノ
シロキサ〕/ S−2:  0.2モル%のメチルビニルシロキシ単位
、8モル%のジフェニルシロキシ 単位及び残余のジメチルシロキシ単位 から成り、末端がジメチルビニルシリ ル基で閉塞され、平均重合度が5,000のポリジオル
ガノシロキサン S−3:  ジメチルシロキシ単位から成り、末端がジ
メチルビニルシリル基で閉塞さ れた平均重合度1,500のポリジオルガノシロキサン 5−4=  メチルハイドロジエンシロキシ単位から成
り、末端がトリメチルシリル基 で閉塞された平均重合度30のポリメ チルハイドロジエンシロキサン S−5:60モル%のメチルハイドロジエンシロキシ単
位と残余のジメチルシロキ シ単位から成り、末端がトリメチルシ リル基で閉塞された平均重合度50の ポリメチルハイドロジエンシロキサン (CH3)2 で表わされるポリシロキサン 5−7=  分子式 で表わされるポリシロキサン (CH2)3 CO(CHJa si (OCHs)s
i1 で表わされるポリシロキサン S−9:S−3と間じ化学構造である平均重合度45の
ポリジオルガノシロキサン ベースポリマーとして、平均重合度50未満のものを用
いると(A−10’)、十分な引き剥がし強さが得られ
ない(B−10)。
S-1: Polydiorganosiloxa consisting of 0.2 mol% methylvinylsiloxy units and the remaining dimethylsiloxy units, the terminals are blocked with trimethylsilyl groups, and the average degree of polymerization is 7,000] / S-2: 0 .Polydiorganosiloxane S-3 consisting of 2 mol% methylvinylsiloxy units, 8 mol% diphenylsiloxy units and the remainder dimethylsiloxy units, the terminals are blocked with dimethylvinylsilyl groups, and the average degree of polymerization is 5,000. : Polydiorganosiloxane 5-4, consisting of dimethylsiloxy units and having an average degree of polymerization of 1,500, whose ends are blocked by dimethylvinylsilyl groups = Polydiorganosiloxane 5-4, which consists of methylhydrogensiloxy units and whose ends are blocked by trimethylsilyl groups 30 polymethylhydrodiene siloxane S-5: Polymethylhydrodiene siloxane (CH3) consisting of 60 mol% methylhydrodiene siloxy units and the remaining dimethylsiloxy units, with an average degree of polymerization of 50 and whose terminals are blocked with trimethylsilyl groups. 2 Polysiloxane 5-7 = Polysiloxane (CH2)3 CO(CHJa si (OCHs)s) represented by the molecular formula
Polysiloxane S-9 represented by i1: When a polydiorganosiloxane base polymer having an average degree of polymerization of 45 and having the same chemical structure as S-3 is used, it is sufficient to use a polydiorganosiloxane base polymer having an average degree of polymerization of less than 50 (A-10'). peel strength could not be obtained (B-10).

ポリオルガノハイドロジエンシロギサンの量と性能との
関係がA−11〜A14.  B−11〜14でポリオ
ルガノハイドロジエンが少な過ぎても、多過ぎても半田
耐熱性及べ引き剥がし強さが低い。
The relationship between the amount of polyorganohydrogensiloxane and performance is A-11 to A14. In B-11 to B-14, if the polyorganohydrodiene is too small or too large, the soldering heat resistance and peel strength will be low.

シリカ系充填剤の情については、多過ぎると(A−15
)引き剥がし強さが低下し、少な過ぎると(A−41)
引き剥がし強さ、難燃性が低下する。
Regarding the situation with silica-based fillers, if there is too much (A-15
) If the peel strength is too low (A-41)
Peel strength and flame retardancy decrease.

酸化鉄のlは多過ぎると(A−17)引き剥がし 17
− 強さ、表面抵抗が低下し、少な過ぎると(A−16)難
燃性が低下する。また、η々比が0の酸化鉄では(A−
7)M、燃性が得られない。
If there is too much l of iron oxide, it will peel off (A-17) 17
- Strength and surface resistance decrease, and if too low (A-16) flame retardancy decreases. In addition, for iron oxide with a ratio of 0 (A-
7) M: Flammability cannot be obtained.

(F)のポリシロキサンの旨については、多過ぎても、
少な過ぎても(A−11,A−14)引き剥がし強さ、
半田耐熱性が低下する。
Regarding (F) polysiloxane, even if it is too much,
Even if it is too small (A-11, A-14) peel strength,
Solder heat resistance decreases.

適正な配合量であるA−1〜6では、引き剥がし強さ、
半田耐熱性、難燃性等の良好な特性が得られた。
In A-1 to A-6, which are appropriate blending amounts, peel strength,
Good properties such as solder heat resistance and flame retardancy were obtained.

実施例2 プラスチックフィルムとしてポリアミドイミドフィルム
(厚さ5011m )を、接着剤としてA−1を用いる
以外は実施例1と同様の方法により、フレキシブルプリ
ント配線用基板(B−19)を得た。このものの性能を
表2に示す。
Example 2 A flexible printed wiring board (B-19) was obtained in the same manner as in Example 1, except that a polyamide-imide film (thickness: 5011 m) was used as the plastic film and A-1 was used as the adhesive. The performance of this product is shown in Table 2.

実施例3 金属箔としてアルミニウム箔(厚さ50μ??L)を、
接着剤としてA−1を用いる以外は実施例】と同様の方
法により、フレキシブルプリント配線用基板(B−20
)を得た。
Example 3 Aluminum foil (thickness 50μ??L) was used as the metal foil,
A flexible printed wiring board (B-20
) was obtained.

 18− このものの性能を表2に示す。18- The performance of this product is shown in Table 2.

−19− 特開+1.’7s8−21893 C8)形   窓 ム    入 卿 駆 ど く 日    互-19- Special release +1. '7s8-21893 C8) type window Enter Lord Drive degree Ku Japan mutual

Claims (1)

【特許請求の範囲】 シリコーン接着剤として、 (A)  ケイ素原子に結合したビニル基を分子中1′
−平均2個以上有し、平均重合度が50〜10,000
のポリオルガノシロキサン100重量部、iB)  ケ
イ素原子に結合した水素原子を分子中に平均2個を越え
る数を有するポリオルガツノ\イド・ロジエンシロヤサ
ン、該水素原子がfAl中のケイ素原子に結合したビニ
ル基1モルに対して、0.5〜10モルも二なる量、 (C)  シリカ系充填剤20〜150重量部、+D)
  一般式(Fe0)x (Fe2O3)y  (ただ
し、ゾは0.05〜1.0である。)で表わされる酸化
鉄又は(及び)カーボンブラック0.5〜20重り部、 (E)  白金化合物、白金原子として1〜200 P
Pm 。 (F)  ケイ素原子に結合した水素原子を分子中に少
なくとも1個と、一般式 Q2は互いに同−又は相異なる直鎖状又は分枝状のアル
キレン基、Rは炭素数1〜4のアルキル基を示す。)で
表わされ、ケイ素原子に結合した基を分子中に少なくと
も1個有するポリシロキサン0.5〜50重量部、 からなる接着剤組成物を基板の構成たる融点が260℃
以上のプラスチックフィルム又は(及び)金属箔に塗布
して乾燥した後、このプラスチックフィルムと金属箔と
を重ね加熱圧着し、アフターキュアーすることを特徴と
するフレキシブルプリント配線用基板の製造方法。
[Claims] As a silicone adhesive, (A) 1' vinyl group bonded to a silicon atom in the molecule;
-Has an average of 2 or more, and an average degree of polymerization of 50 to 10,000
100 parts by weight of polyorganosiloxane, iB) A polyorganosiloxane having on average more than 2 hydrogen atoms bonded to silicon atoms in the molecule, the hydrogen atoms bonded to the silicon atoms in fAl. 0.5 to 10 moles per mole of vinyl group is also an amount; (C) 20 to 150 parts by weight of silica filler; +D)
Iron oxide or (and) 0.5 to 20 parts by weight of carbon black represented by the general formula (Fe0)x (Fe2O3)y (where zo is 0.05 to 1.0), (E) Platinum compound , 1-200 P as a platinum atom
Pm. (F) At least one hydrogen atom bonded to a silicon atom in the molecule, the general formula Q2 is a linear or branched alkylene group that is the same or different from each other, and R is an alkyl group having 1 to 4 carbon atoms. shows. ) and having at least one group bonded to a silicon atom in the molecule, an adhesive composition comprising 0.5 to 50 parts by weight of polysiloxane represented by
A method for producing a flexible printed wiring board, which comprises coating the plastic film or (and) metal foil as described above and drying the film, and then stacking the plastic film and the metal foil, heat-pressing them, and after-curing.
JP11936281A 1981-07-31 1981-07-31 Method of producing flexible printed circuit board Granted JPS5821893A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11936281A JPS5821893A (en) 1981-07-31 1981-07-31 Method of producing flexible printed circuit board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11936281A JPS5821893A (en) 1981-07-31 1981-07-31 Method of producing flexible printed circuit board

Publications (2)

Publication Number Publication Date
JPS5821893A true JPS5821893A (en) 1983-02-08
JPS6360558B2 JPS6360558B2 (en) 1988-11-24

Family

ID=14759612

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11936281A Granted JPS5821893A (en) 1981-07-31 1981-07-31 Method of producing flexible printed circuit board

Country Status (1)

Country Link
JP (1) JPS5821893A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62149981A (en) * 1985-12-25 1987-07-03 カンボウプラス株式会社 Heat resistant sheet
JPH02307294A (en) * 1989-05-23 1990-12-20 Furukawa Saakitsuto Fuoiru Kk Copper foil for printed circuit
JPH0429885A (en) * 1990-05-28 1992-01-31 Pioneer Electron Corp Information recording medium
US6004679A (en) * 1991-03-14 1999-12-21 General Electric Company Laminates containing addition-curable silicone adhesive compositions
JP2013128108A (en) * 2011-12-16 2013-06-27 Prologium Holding Inc Pcb structure with silicone layer as adhesive
CN112312647A (en) * 2019-08-02 2021-02-02 辉能科技股份有限公司 Circuit board structure with silica gel adhesive layer

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3010034U (en) * 1994-10-11 1995-04-18 クリステック株式会社 Diamond saw blade

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5448853A (en) * 1977-09-26 1979-04-17 Toshiba Silicone Organopolysiloxane curable into rubbery state
JPS5519438A (en) * 1978-07-26 1980-02-12 Mitsubishi Electric Corp Brazing method

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5448853A (en) * 1977-09-26 1979-04-17 Toshiba Silicone Organopolysiloxane curable into rubbery state
JPS5519438A (en) * 1978-07-26 1980-02-12 Mitsubishi Electric Corp Brazing method

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62149981A (en) * 1985-12-25 1987-07-03 カンボウプラス株式会社 Heat resistant sheet
JPH02307294A (en) * 1989-05-23 1990-12-20 Furukawa Saakitsuto Fuoiru Kk Copper foil for printed circuit
JPH0429885A (en) * 1990-05-28 1992-01-31 Pioneer Electron Corp Information recording medium
JP2518954B2 (en) * 1990-05-28 1996-07-31 パイオニア株式会社 Information recording medium
US6004679A (en) * 1991-03-14 1999-12-21 General Electric Company Laminates containing addition-curable silicone adhesive compositions
JP2013128108A (en) * 2011-12-16 2013-06-27 Prologium Holding Inc Pcb structure with silicone layer as adhesive
CN112312647A (en) * 2019-08-02 2021-02-02 辉能科技股份有限公司 Circuit board structure with silica gel adhesive layer
JP2021027307A (en) * 2019-08-02 2021-02-22 輝能科技股▲分▼有限公司Prologium Technology Co., Ltd. Pcb structure having silicone layer as adhesive agent
CN112312647B (en) * 2019-08-02 2022-05-06 辉能科技股份有限公司 Circuit board structure with silica gel adhesive layer

Also Published As

Publication number Publication date
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