JPS58217695A - Electroplating method - Google Patents

Electroplating method

Info

Publication number
JPS58217695A
JPS58217695A JP10177382A JP10177382A JPS58217695A JP S58217695 A JPS58217695 A JP S58217695A JP 10177382 A JP10177382 A JP 10177382A JP 10177382 A JP10177382 A JP 10177382A JP S58217695 A JPS58217695 A JP S58217695A
Authority
JP
Japan
Prior art keywords
plating
anode
strip
electrode
metal strip
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10177382A
Other languages
Japanese (ja)
Inventor
Kazuo Kondo
和夫 近藤
Shinji Fujiwara
慎二 藤原
Nobukazu Suzuki
鈴木 信和
Minoru Nishihara
西原 実
Yoshio Shimozato
下里 省夫
Kenichi Yanagi
謙一 柳
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Heavy Industries Ltd
Nippon Steel Corp
Original Assignee
Mitsubishi Heavy Industries Ltd
Sumitomo Metal Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Heavy Industries Ltd, Sumitomo Metal Industries Ltd filed Critical Mitsubishi Heavy Industries Ltd
Priority to JP10177382A priority Critical patent/JPS58217695A/en
Publication of JPS58217695A publication Critical patent/JPS58217695A/en
Pending legal-status Critical Current

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  • Electroplating Methods And Accessories (AREA)

Abstract

PURPOSE:To prevent the damage of an electrode protecting film, by a method wherein a plating liquid is injected from the side of an electrode arranged in opposed relation to a metal strip by a static pressure pad system and the electrode protecting film having a passing orifice between both of them is provided. CONSTITUTION:A metal strip 3 is passed through the plating liquid 2 in a plating tank 1 by a current supply roll 4 and a sink roll 5 and a current is supplied between an anode 6 and the strip 3 to carry out plating. An anode chamber is constituted from a partition wall 7 and the surface thereof opposed to the strip 3 is used as an electrode protecting film 8 having a passing orifice. The gap of the anode chamber is used as a plating liquid jet nozzle 10 for injecting the plating liquid 2 to a direction crossing the strip 3 at right angles. By this structure, when the plating liquid 2 is injected to the strip 3 from the nozzle 10, the runnability thereof is stabilized and the damage of the electrode protecting film 8 can be certainly prevented.

Description

【発明の詳細な説明】 本発明は、金属板あるいは線材等の金属ストリップを連
続的に電気メッキする方法に関する0金属ストリツプを
連続的に電気メッキを行うにあだ91メツキ液を金属ス
トリップの走行方向に向流的に噴射させるかあるいは順
流的に噴射させると、金属ス) 1721表面近くでの
乱流境界厚の厚みが減少し、適用電流密度を高くでき、
通電量が大きくでき、単位メッキ量当りの電力使用量を
低減できるばかシでなく、金属ストリップと電極とを近
接配置できることが、たとえば特公昭53−18167
号公報等によシ知られている。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for continuously electroplating a metal strip such as a metal plate or a wire rod. Countercurrent or cocurrent injection reduces the thickness of the turbulent boundary near the metal 1721 surface, allowing higher applied current densities;
For example, in Japanese Patent Publication No. 53-18167, it is possible to increase the current flow and reduce the power consumption per unit plating amount, and also to be able to place the metal strip and the electrode close to each other.
It is known from the publication No.

しかし、同公報や既存の技術のいずれにおいても、電極
すなわち金属ストリップを陰極とした場合には陽極と、
金属ストリップとの間には  −例らの介在物もなく対
向しているものであった。
However, in both the publication and the existing technology, when the electrode, that is, the metal strip is used as the cathode, it becomes the anode,
There were no inclusions between the metal strip and the metal strip.

ところが、このような条件のもとで、金属ストリップに
メッキ液の噴流を与えると、たしかに上記利点はもたら
されるけれども、陽極近くでのメッキ液流が増大するた
め、このメッキ液流によって陽極が損傷することがあり
、これがためにしばしば陽極の交換を行わなければなら
ない0 また、隔壁、電極保護膜を設けない場合において、噴射
流速が3 m/sec以上となると、Agを1係含むp
b系の不溶性陽極の場合、pbの酸化物が剥離して、こ
れによりロールでの押し込み疵を発生させ、メッキ製品
として劣るものが作られることがある。
However, although applying a jet of plating solution to the metal strip under these conditions does bring about the above advantages, the plating solution flow increases near the anode, causing damage to the anode. For this reason, the anode must be replaced frequently.0 In addition, in the case where no partition wall or electrode protective film is provided, if the jet flow rate is 3 m/sec or more, the
In the case of a B-based insoluble anode, the PB oxide may peel off, causing roll indentation flaws, resulting in inferior plated products.

そこで、本発明者らは、電極と金属ストリップとの間に
電極保護膜、たとえばアノードバックやイオン交換膜隔
膜等を設置すればよいことを見出した。
Therefore, the present inventors have found that it is sufficient to install an electrode protective film, such as an anode back or an ion exchange membrane diaphragm, between the electrode and the metal strip.

ところが、これだけでは問題の完全な解決とはならない
。すなわち、金属ストリップを連続的に走行させる場合
、金属ストリップ自体に巾反シやカテナリーがあると、
その部分が一般的に強度的に弱い材料からなる電極保護
膜に接触し、それを破損させることがあるからである。
However, this alone does not completely solve the problem. In other words, when running a metal strip continuously, if the metal strip itself has a width line or catenary,
This is because that part may come into contact with the electrode protective film, which is generally made of a material with weak strength, and damage it.

又巾反υがあるとエツジ部と中央部のメッキ付着量の偏
りが存在する。この点について、さらに考究したところ
上記のメッキ液の噴流方式のうち、直交的にまたは斜向
的にメッキ液を金属ストリップへ電極側から投射させる
方式と本発明に係る電極保護膜の設置とを組み合せると
、全ての問題が好適に解決されることを見出した。
Also, if there is a width warp υ, there will be a bias in the amount of plating deposited between the edge and center areas. Further studies on this point revealed that among the above plating solution jet methods, a method in which the plating solution is orthogonally or obliquely projected onto the metal strip from the electrode side and the installation of the electrode protective film according to the present invention were found. It has been found that when combined, all problems are successfully solved.

すなわち、金属ストリップへメッキ液を静圧バッド方式
で噴射させると、ストリップに対し垂直な噴流方式に比
べて、金属ス) IJツブ位置近傍で安定点が得られ、
たとえ巾反りやカテナリーがあったとしてもそれらを修
正でき電極保護膜の損傷を防止でき、安定したストリッ
プの走行を確保できる。
In other words, when the plating solution is injected onto the metal strip using the static pressure pad method, a stable point is obtained near the IJ knob position, compared to the jet method perpendicular to the strip.
Even if there is warpage or catenary, they can be corrected, damage to the electrode protective film can be prevented, and stable strip running can be ensured.

また電極保護膜として特にアノードパックを用いると、
従来例においてみられる陽極泥がストリップに同伴し、
これがコンダクタ−ロールを通過する際、逆に陽極泥に
よって金属ス) IJツブに押し込み疵を生じることが
防止できる利点もある。
In addition, when an anode pack is used as an electrode protective film,
The anode mud seen in the conventional example is entrained in the strip,
When this passes through the conductor roll, it also has the advantage of preventing indentation scratches on the metal IJ tube due to anode mud.

さらに、電極保護膜として、隔膜特にイオン交換膜隔膜
を使用すれば、陽極室と陰極室とのそれぞれの部屋にお
けるメッキ液組成の制御がきわめて容易とカリ、たとえ
ばFe系メッキにあって陰イオン交換膜隔膜を用いると
、メッキにとって有害である陰極室でのFe  の存在
を極力防止できる効果もある。
Furthermore, if a diaphragm, particularly an ion exchange membrane diaphragm, is used as an electrode protective film, it will be extremely easy to control the composition of the plating solution in the anode and cathode chambers. The use of a membrane diaphragm also has the effect of minimizing the presence of Fe in the cathode chamber, which is harmful to plating.

すなわち、本発明は、メッキ槽中に金属ストリップを連
続的に供給し、この金属ストリップに対向して電極を配
置して行う電気メツキ方法において、電極配置側からメ
ッキ液を金属ストリップに当てるようにするとともに、
電極と金属ストリップとの間に透孔を有する電極保護膜
を設けることを特徴とするものである。
That is, the present invention provides an electroplating method in which a metal strip is continuously supplied into a plating bath and an electrode is placed opposite to the metal strip, in which the plating liquid is applied to the metal strip from the side where the electrode is placed. At the same time,
This method is characterized in that an electrode protective film having a through hole is provided between the electrode and the metal strip.

本発明は、竪型電気メッキであれ、横型電気メッキであ
れ、さらに両面または片面メッキのいずれの場合にも適
用される。
The present invention is applicable to both vertical electroplating and horizontal electroplating, as well as double-sided or single-sided plating.

以下本発明を竪型の両面メッキの場合の具体例によって
説明すると、1はメッキ槽で、図示では1槽であるが必
要によシ適宜複数の槽がタンデム配置される。このメッ
キ槽1にはメッキ液2が満され、金属ストリップ3は通
電ロール4をめぐっそメッキ槽1内に入り、ジンクロー
ル5において方向を変え、他の通電ロール4を通って次
の槽へと走行する。ここで必要ならば、通電ロール4の
部分をコンダクタ−ロールとし、ストリップ3の外方に
通電ロールを配置することもできる。
The present invention will be described below with reference to a specific example of vertical double-sided plating. 1 is a plating tank. Although only one tank is shown in the figure, a plurality of tanks may be arranged in tandem as necessary. This plating tank 1 is filled with a plating solution 2, and the metal strip 3 enters the plating tank 1 around the current-carrying roll 4, changes direction at the zinc roll 5, passes through another current-carrying roll 4, and enters the next tank. and run. If necessary, the current-carrying roll 4 can be made into a conductor roll and the current-carrying roll can be arranged outside the strip 3.

6は金属ストリップ3と対向的に配置された可溶性また
は不溶性陽極で、陽極室を構成する隔置壁7によシ包囲
されている。隔壁7の金属ストリップ3と対向する面は
、tノードバック(たとえばナイロン繊維)または隔膜
からなる電極保護膜8とされている。また隔壁7の全て
を電極保護膜8としてもよい。かかる陽極室は上下に複
数構成され、それらの陽極室間隙は、メッキ液2の循環
ポンプ9によりメッキ液が金属ストリップ3に直交的に
噴射するメッキ液投射ノズル10となっている。
A soluble or insoluble anode 6 is placed opposite the metal strip 3 and is surrounded by a separating wall 7 forming an anode chamber. The surface of the partition wall 7 facing the metal strip 3 is an electrode protection film 8 made of a t-node back (for example, nylon fiber) or a diaphragm. Further, all of the partition walls 7 may be made into the electrode protective film 8. A plurality of such anode chambers are arranged above and below, and a gap between these anode chambers serves as a plating solution injection nozzle 10 through which the plating solution is sprayed orthogonally onto the metal strip 3 by a circulation pump 9 for the plating solution 2.

このようなメッキ装置によりメッキを行う場合、ノズル
10からメッキ液を金属ストリップ3に、噴射すると、
その走行性が安定しく特に両側からの噴射の場合)、形
状不良があっても電極保護膜の損傷を確実に防止できる
。またメッキ液噴射本来の利点である、スト1ルプ表面
における常に新しいメッキ液の補給、入替の達成、電流
密度が高い条件での急速メッキの可能性、発生ガスの排
除がなるなどの効果も期待できる。
When plating is performed using such a plating device, when the plating solution is injected from the nozzle 10 onto the metal strip 3,
Its running properties are stable (especially when injecting from both sides), and damage to the electrode protective film can be reliably prevented even if there is a shape defect. In addition, the inherent advantages of plating solution injection are expected, such as the ability to constantly replenish and replace new plating solution on the Stroop surface, the possibility of rapid plating under conditions of high current density, and the elimination of generated gas. can.

さらにストリップと電極との近接配置が可能となシ、乱
流境界層の厚みを減少させることができ、電力消費量が
大巾に低減する。
Furthermore, since the strip and the electrode can be placed close to each other, the thickness of the turbulent boundary layer can be reduced, and the power consumption can be significantly reduced.

また、本発明では、電極保護膜を特に設けている。この
電極保護膜は、メッキの噴射に伴う一番の問題としての
、メッキ液流速の増大に伴う電極の損傷を確実に防止で
き、連続メッキを行う場合における電極の取替作業を極
力少くできるという顕著な効果をもたらす。
Further, in the present invention, an electrode protective film is particularly provided. This electrode protective film can reliably prevent damage to the electrode due to an increase in the flow rate of the plating solution, which is the biggest problem associated with plating spraying, and can minimize the need for electrode replacement when performing continuous plating. It has a remarkable effect.

一方、電極保護膜としてアノードパックまたは隔膜を用
いれば陽極ドロスのストリップへの移行を防止できるか
ら、陽極ドロスのストリップへのプリント疵、押し込み
疵を防止でき、美麗な表面性状のストリップを得ること
ができる。
On the other hand, if an anode pack or a diaphragm is used as an electrode protective film, it is possible to prevent the transfer of anode dross to the strip, thereby preventing printing defects and indentation defects of the anode dross on the strip, thereby making it possible to obtain a strip with beautiful surface texture. can.

ここで、第2図のように、陽極ドロスは、陽極室液循環
系を構成し、そこにおいて排除すると特に好ましい。
Here, as shown in FIG. 2, it is particularly preferable that the anode dross constitutes the anode chamber fluid circulation system and is removed there.

第2図は、メッキ液の金属ストリップ3への噴射に当っ
て、陽極室間にガイド体11を設け、これと陽極室との
間に形成した斜角ノズル10′から噴射させるようにす
るとともに、陽極室液を循環ポンプ12によシ循環させ
るようにしたものである。
FIG. 2 shows that when spraying the plating solution onto the metal strip 3, a guide body 11 is provided between the anode chambers, and the plating solution is sprayed from an oblique nozzle 10' formed between the anode chamber and the guide body 11. , the anode chamber liquid is circulated by a circulation pump 12.

もし、電極保護膜として隔膜等の強度的に弱い材料を用
いる場合、第3図のようにその表面を金網やエキスバン
ドメタル、あるいはポリエチレン製の網体等の膜プロテ
クター13を設けると好ましい。
If a material with weak strength such as a diaphragm is used as the electrode protective film, it is preferable to provide a membrane protector 13 such as a wire mesh, expanded metal, or polyethylene mesh on the surface as shown in FIG.

さらに、第4図のように、電極保護膜8は、ガイド体1
1の前面よシ後方に配設させてもよい。また、必要なら
ば、前記公報とほぼ同様に電極室にメッキ液を供給し、
電極室の前面から電極保護膜を通してメッキ液を噴射し
てもよい。
Furthermore, as shown in FIG. 4, the electrode protective film 8
It may be arranged at the front or rear of 1. Additionally, if necessary, supply the plating solution to the electrode chamber in substantially the same manner as in the above publication,
The plating solution may be sprayed from the front of the electrode chamber through the electrode protective film.

しかも、メッキ液噴射ノズルは巾方向に複数設けて、金
属ストリップの巾方向の曲9に対処したシ、また噴射ノ
ズルからのメッキ液噴射量を制御することもできる。
Furthermore, a plurality of plating liquid spray nozzles can be provided in the width direction to cope with the curve 9 in the width direction of the metal strip, and also to control the amount of plating liquid sprayed from the spray nozzles.

一方、Fe系メッキの場合、陽極として不陽性陽極を用
い、電極保護膜として陰イオン交換膜隔膜(たとえば徳
山曹達(株)製[ネオセプターACH4!5TJ)を用
い、陽極室とメッキ液室として分離し、さらにメッキ液
室から隔膜を通して陽極室へ移行するFe2+イオンが
陽極室においてFe3+イオンとなることに対して、陽
極室液を取り出してFe3+イオンをFe2+イオンに
還元してメッキ液として供給すると、安定した高品質の
メッキを達成できる0またこのこととは別に、一般にメ
ッキ液室と陽極室とを隔膜等を介して分離して構成する
と、各室での液組成を調整でき、適切なメッキ条件を設
定できるから、この意味で本発明に係る電極保護膜の設
置が応用範囲を広げることになる。
On the other hand, in the case of Fe-based plating, a non-positive anode is used as the anode, an anion exchange membrane diaphragm (for example, Neoceptor ACH4!5TJ manufactured by Tokuyama Soda Co., Ltd.) is used as the electrode protective film, and the anode chamber and plating liquid chamber are The Fe2+ ions that are separated and further migrate from the plating solution chamber to the anode chamber through the diaphragm become Fe3+ ions in the anode chamber, but if the anode chamber solution is taken out and the Fe3+ ions are reduced to Fe2+ ions and supplied as the plating solution. Apart from this, generally, if the plating solution chamber and anode chamber are separated via a diaphragm, the solution composition in each chamber can be adjusted and the appropriate Since the plating conditions can be set, in this sense, the installation of the electrode protective film according to the present invention expands the range of applications.

ところで、メッキ液の噴射流速は、5〜10m/sec
が望ましく、また噴射ノズルのスリット巾は1〜3 y
+mが好ましい。ノズルの傾射角は30〜60°、特に
45°が最適である。
By the way, the jet flow velocity of the plating solution is 5 to 10 m/sec.
is desirable, and the slit width of the injection nozzle is 1 to 3 y
+m is preferred. The optimum angle of inclination of the nozzle is 30 to 60°, particularly 45°.

以上の通シ、本発明は、メッキ液の金属ストリップへの
噴射と電極保護膜の設置とを巧妙に組み合せたから、使
用メッキ電力量の低減、ストリップの走行安定性、電極
の保護等に著しい効果を示す。
In summary, the present invention cleverly combines the injection of plating solution onto the metal strip and the installation of an electrode protective film, which has a remarkable effect on reducing the amount of plating power used, improving the running stability of the strip, protecting the electrode, etc. shows.

次に実施例を示す。Next, examples will be shown.

実施例I Agを1係含むpb系の不溶性陽極を用い、この陽極の
ストリップ側にナイロン繊維製のアノードパックを設け
た場合と、設けない場合とで比較を試みた。またメッキ
液の噴射は、第1図に示す構造の1.5朋巾のノズルか
ら4〜10 m/Secの流速で噴射しながら、連続亜
鉛メッキを行った。その結果、アノードバックを設けな
い場合、陽極・陰極間距離が40朋以下の場合、陽極上
に生じた酸化物が脱落し、これがストリップに持ち去ら
れ、押し込み疵を生じた。さらにこの場合の使用電圧は
34Vであり高い値となった。
Example I Using a PB-based insoluble anode containing one part of Ag, a comparison was made between cases in which a nylon fiber anode pack was provided on the strip side of the anode and cases in which it was not provided. Continuous zinc plating was performed while spraying the plating solution at a flow rate of 4 to 10 m/Sec from a 1.5 mm wide nozzle having the structure shown in FIG. As a result, when an anode back was not provided and the distance between the anode and the cathode was 40 mm or less, the oxide formed on the anode fell off and was carried away by the strip, causing indentation flaws. Furthermore, the voltage used in this case was 34V, which was a high value.

これに対して、アノードバックを設けた場合には、極間
距離を101mとしても押し込み疵の発生はなく、かつ
陽極の損傷も全くみられず、さらに使用電圧は11Vと
低く、そのときの電流密度は60A/dm’と高いもの
であった。
On the other hand, when an anode back is provided, no push-in flaws occur even if the distance between the electrodes is 101 m, and no damage to the anode is observed.Furthermore, the working voltage is as low as 11V, and the current at that time does not occur. The density was as high as 60 A/dm'.

実施例2 電極間距離を30朋とし、液流速を変えながら、他の条
件は実施例1と同一としながら、メッキ液の噴射の有無
および本発明に係る静圧パッド方式に則った上でメッキ
液流速変化によって、巾ぞシ量およびメッキの均一性に
ついて調べたところ、次表に示す結果が得られた。
Example 2 Plating was carried out with the distance between the electrodes set to 30 mm, the liquid flow rate changed, and the other conditions being the same as in Example 1, with or without injection of the plating liquid and in accordance with the static pressure pad method according to the present invention. The amount of width and plating uniformity were investigated by changing the liquid flow rate, and the results shown in the following table were obtained.

上表の結果からも、メッキ液に流速を与えることにより
、巾ぞシが少くなシ、かつ場所的に均一なメッキ皮膜を
得ることができることが判る0
From the results in the table above, it can be seen that by giving a flow rate to the plating solution, it is possible to obtain a plating film that has fewer width gaps and is uniform in location.

【図面の簡単な説明】[Brief explanation of drawings]

第1図〜第4図は本発明を実施するための装置例を示す
概要図である。 1・・メッキ槽   3・・金属ストリップ6・・陽極
     8・・電極保護膜、。 10.10’・・メッキ液噴射ノズル 特許出願人 住友金属工業株式会社 三菱重工業株式会社 第1頁の続き 0発 明 者 柳謙− 広島市観音新町四丁目6番22号 三菱重工業株式会社広島研究所 内 ■出 願 人 三菱重工業株式会社 東京都千代田区丸の内2丁目5 番1号 −535−
FIGS. 1 to 4 are schematic diagrams showing examples of apparatus for carrying out the present invention. 1. Plating bath 3. Metal strip 6. Anode 8. Electrode protective film. 10.10'... Plating liquid injection nozzle Patent applicant: Sumitomo Metal Industries, Ltd. Mitsubishi Heavy Industries, Ltd. Page 1 continued 0 Inventor: Ken Yanagi - 4-6-22 Kannon Shinmachi, Hiroshima City Mitsubishi Heavy Industries, Ltd. Hiroshima Research Office ■ Applicant Mitsubishi Heavy Industries, Ltd. 2-5-1-535 Marunouchi, Chiyoda-ku, Tokyo

Claims (1)

【特許請求の範囲】[Claims] (1)  メッキ槽中に金属ストリップを連続的に供給
し、この金属ストリップに対向して電極を配置して行う
電気メツキ方法において、電極配置側からメッキ液を静
圧パッド方式で金属ストリップに当てるようにするとと
もに、電極と金属ストリップとの間に透孔を有する電極
保護膜を設けることを特徴とする番梼電気メッキ方法0
(1) In an electroplating method in which a metal strip is continuously supplied into a plating tank and an electrode is placed opposite the metal strip, the plating solution is applied to the metal strip from the electrode placement side using a static pressure pad method. A method for electroplating 0 characterized by providing an electrode protective film having a through hole between the electrode and the metal strip.
JP10177382A 1982-06-14 1982-06-14 Electroplating method Pending JPS58217695A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10177382A JPS58217695A (en) 1982-06-14 1982-06-14 Electroplating method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10177382A JPS58217695A (en) 1982-06-14 1982-06-14 Electroplating method

Publications (1)

Publication Number Publication Date
JPS58217695A true JPS58217695A (en) 1983-12-17

Family

ID=14309529

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10177382A Pending JPS58217695A (en) 1982-06-14 1982-06-14 Electroplating method

Country Status (1)

Country Link
JP (1) JPS58217695A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04259396A (en) * 1991-02-15 1992-09-14 Kawasaki Steel Corp Electroplating device for steel strip and its operating method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04259396A (en) * 1991-02-15 1992-09-14 Kawasaki Steel Corp Electroplating device for steel strip and its operating method

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