JPS58214388A - Apparatus for photoreaction - Google Patents

Abstract

PURPOSE:To expand the applicability of the apparatus, while eliminating unevenness in the application of light to a workpiece to be reated and making the intensity of radiation uniform, by revising the elliptic part of the elliptic cross section of the elliptic column of the apparatus for photoreaction under a specified condition. CONSTITUTION:The cross section of an elliptic column is made as the first ellipse, and the points of said ellipse intersecting a straight line connecting the focus mu, mu' of said ellipse are made as B, B'. The second ellipse is drawn using the focus mu and the intersecting point B as its focus, its point intersecting the straight line mu-mu' is made as C, and the point of said ellipse intersecting an arc AB is made as D. A part of the arc AB of the first ellipse is added to the arc CD of the second ellipse to form an arc CDB. Other three points are revised by the same way. Thus, the application of light to a workpiece to be reacted is made uniform, and the applicability is extended.

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a photoreaction device, particularly an organic material having poor UV transmittance.
This invention relates to a decomposition sterilization device that processes inorganic wastewater using an ultraviolet lamp.

Conventionally, in underwater organic matter decomposition equipment or sterilization equipment using ultraviolet m<hereinafter referred to as UV), an ultraviolet lamp (hereinafter referred to as UV lamp) is installed in a quartz tube that seals the water and is installed in the water. This has been done by draining the water to be treated outside. Since this method has a simple structure, it is widely used mainly as a sterilization device. This photoreaction device is often made of stainless steel (5US304 or BU8316) and has its inner surface polished to a mirror finish to increase the efficiency of light utilization, and is also suitable for large-scale diluted processing.

However, the conventional photoreaction device uses a quartz tube across the U
Since the V-lamp is in contact with water, which is a reactant, there is a risk of dirt components adhering to the quartz tube or turbidity of the liquid.
Since the effective UV output is a problem, it has been used only for liquids with extremely good transparency.

The performance of such flush-type UV decomposition equipment and sterilization equipment is limited by the dirt on the quartz tube and the turbidity of the water, so devices that avoid direct contact of the UV lamp with water through the quartz tube are also used. . A non-contact type device has been devised in which a UV lamp is installed at one focal point of an elliptical cylinder with a mirror-finished inner surface, and treated water is poured into the other focal point. This device effectively uses specular reflection to increase the amount of UV irradiation to the object to be treated, so it eliminates the drawback of conventional UV reactors that are susceptible to turbidity and It can also be applied to processing targets.

This type of photoreaction device, as shown in the cross-sectional view of FIG.
A UV lamp 10 serving as a light source is held along one focal point μ of a regular elliptic cylinder 4 whose inner surface is mirror-finished, and a reactant 11 is arranged along the other focal point I. In this figure, the intersections of the ellipse and the straight line extending the interfocal μμ′ in the μ direction and the μ′ direction are respectively A and A, and the radiation angle α is the right angle i.
Let Aμ be the angle created by the emitted ray counterclockwise from this Aμ, and the incident angle β is created by the straight line AI and the straight line created by the reflected ray counterclockwise from this person II and the focal point I where the reacted object is located. Let it be an angle. This structure enables concentrated light irradiation to the target object due to its simple cross-sectional structure.

In this structure, when the incident angle α is around 00 or 360°, that is, the amount of light in the direction facing the light source is large, but the amount of light incident on the back side of the light source is extremely low. In other words, when the angle of incidence α is around 00, the amount of light is large because the direct light 1 from the light source and the reflected light 2 from the inner wall of the elliptical cylinder 4 are irradiated, but when the angle of incidence is around 180°, the amount of light emitted from the light source is large. Since the light is obstructed by the reactant 11, the incident light disappears at the angle of incidence between the incident light 3 that passes through the tangent to the reactant and is reflected from the elliptical cylinder 4, and the amount of light decreases. This is because it becomes zero. For this reason, this photoreaction device is not suitable for objects that require light irradiation density and has directionality, and is used for objects other than specific objects such as fine solid samples; There was no problem.

An object of the present invention is to eliminate such non-uniformity of light irradiation to reactants, and to provide a photoreaction device which can expand the range of use by equalizing the amount of light irradiated.

The structure of the present invention is such that an elliptical cylinder whose inner surface is mirror-finished is provided with a light source at one focal point of the elliptical cylinder and a reactant at the other focal point, and the light from the light source is transmitted to the reacted object. In a photoreaction device that irradiates an object, the cross section of the elliptical cylinder is a first ellipse, and the focal point of this first ellipse is μ, 11
The intersection point between the extension of the straight line connecting ' and this ellipse is A, λ, and the intersection point between the perpendicular bisector of the straight line μI and this ellipse is 4B.
, B.

A second ellipse with the focal point μ and the intersection point B as the focal point and an intersection point C between the focal point μ and the intersection point A, and the intersection point of this second ellipse and the arc AD of the first ellipse = iD Then, that partial arc of the arc AB of the first ellipse! "Dt
- a correction arc CDB replacing the partial arc CD of the second ellipse; similarly to this correction arc, I and B of the focal point and the intersection point, μ;
A correction ellipse is formed by focusing on B′, μ′, and B′, and three correction arcs in which the partial arcs of the first ellipse are replaced with partial arcs of the same ellipse as the second ellipse. A feature of the present invention is that the elliptical cylinder is formed.

The present invention will be explained in detail below with reference to the drawings.

FIG. 2 is a sectional view showing the basic configuration of an embodiment of the present invention. In this embodiment, a correction elliptical mirror surface 21.22'e is provided on a part of a regular elliptic cylinder 20 having focal points μ and I.

FIG. 3 is a diagram illustrating this corrected elliptical mirror surface 21. As shown in FIG.

Note that in this figure, the ratio of the major axis to the minor axis of the ellipse is set large for ease of viewing. This figure focuses on μ.

A basic ellipse 5 with a major axis Aλ and a minor axis BB' with I, and a corrected ellipse 6 with focal points μ and B are shown, but the corrected mirror surface (
21) are the focal points μ and B, μ and B', and d and B.

It is formed by four correction ellipses with μ' and I3''i.

The first condition for this corrected ellipse is the corrected ellipse 6 and straight line A.
One point of intersection C with N is between points A and μ. Here, when the intersection of the correction ellipse 6 and the basic ellipse 5 is defined as D, the curve CD becomes the correction mirror surface. In this case, when the reactant 11 is placed at the focal point μ and the center of the light source is placed at the focal point μ', the focal point μ
The intersection point E of the tangent to the reactant 11 passing through ' and the basic ellipse 5
The most uniform light can be obtained when the intersection point of the ellipse 5°6 coincides with the intersection point of the 5°6 ellipse. Therefore, it is necessary to design the correction ellipse 6 so that these intersection points and E match as much as possible. On the other hand, if the short axis/long axis ratio of the basic ellipse 5 is made small, there is a possibility of specular contamination if the reactant is a liquid, so to avoid this, it is better to set the short axis/long axis ratio to 0.9 or more. . Since it is practically impossible to completely match El between these points of intersection, it is desirable that El be within 0.8 or more and within 1.2 with respect to the straight line Aμ'E.

By using four such correction elliptical mirror surfaces, the embodiment shown in FIG. 2 is constructed. In the figure, the short axis/long axis ratio is 0.
．． 94, and the tangent to the object passing through the focus μ is the main ellipse 2
0 and the correction mirror surfaces 21 and 22. By providing such correction mirror surfaces 21 and 22, the light source 11
The light from the correction mirror surface 21, the ellipsoid surface 20 and the correction ellipse 2
It can be seen that the emitted light and the incident light of the tertiary reflected light 27 reflected by the main ellipse 20 are at a line-symmetrical position with respect to the short axis of the main ellipse 20.

In addition, the vicinity of the minor axis B B' of the main ellipse 20 is the correction mirror surface 21
．． Since the tertiary reflected light using 22 is intensively reflected, mirror finishing with diamond paste or the like is required to particularly improve the reflection.

FIG. 4 is a partially exploded perspective view of a specific embodiment of the present invention. In the figure, 30 is a mirror surface formed from a stainless steel pipe and includes a main elliptical surface 20 and correction mirror surfaces 21 and 22, 31 is a bottom surface, 32 is a UV lamp, 33 is a quartz tube for protecting the lamp 32,
34 is a liquid passing device through which the liquid to be treated passes. In addition, a specific example of this photoreaction device has a length of 30 crlL and a power consumption of 8.
W, UV output (2537”A) 1.3W UV lamp (
32) Using t-ellipse mirror surface 31 and 5 basic ellipses 20
The major axis is 60 cIrL.

Minor axis 55.5cm, focal distance 20crrL, height 3
0(1'#1 can be configured.

FIG. 5 shows a sectional view of a specific example of the liquid passing device (34) shown in FIG. 4. In the figure, 40 is a circulation tank in which the liquid to be treated is placed, 41
is a circulation pump, 42 is a hollow cylinder (pipe) through which the liquid passes, 4
3 is a restraint for the cylinder 42, and 44 is a receiving tank for the fallen liquid.

The circulation pipe 40 supplies liquid from inside the cylinder 42 and drops it into the receiving tank 44 along the outer wall of the cylinder. In this case, a cylinder retainer 43 is provided which is connected to the cylinder by suitable means so that the water flows downwardly along the cylinder 42.

In this case, a hollow cylinder 42 with an outer diameter of 3 Q rrm and an inner diameter of 20 ITIn is used.

According to such a photoreaction device, U
Since the ultraviolet light from the V-lamp 32 is uniformly irradiated onto the liquid that covers the entire outer wall of the vibrator 42, the surface reaction of the liquid is efficiently carried out, making it effective even for highly turbid processing liquids.

FIGS. 6 and 7 are graphs showing measurements of the ultraviolet intensity on a cylinder in a conventional device (FIG. 1) and an embodiment of the present invention (FIG. 4). Note that this measurement was carried out by using a dummy cylinder, fixing the UV sensor at a position 15 cIrL from the upper end of the cylinder, and rotating the cylinder. The horizontal axis of these graphs shows the incident angle β, and the vertical axis shows the direct reading value of 07 intensity. With conventional equipment, the maximum strength at around 0° is 11,
There is a wide high peak of about 000 μw/cm, and 1
There is an extremely low peak of only 600 μw/m near 80°, and it can be said that the device has a large variation in intensity depending on the angle. Particularly in the area corresponding to the back side of the cylinder, almost no UV rays are irradiated, leading to long-term problems. On the other hand, in the device of this embodiment, the high peaks are 9,000 μw/m near 25° and 335°, and 5.0 μw/m near 180°.
There are many peaks of 00μw/crl, and the low peaks include a narrow peak of 4000μw/crl near θ° and a peak of 3.000μw/cm near 160° and 210°, but at least 3.0001P over the entire area.
The strength of w/d is high, and the non-uniformity of strength compared to the conventional method is significantly improved. Therefore, the photoreaction device with the corrected mirror surface according to the present invention provides uniform light irradiation to the surface of reactants, and can be used not only as a sterilizer for turbid water and as an organic matter decomposition device, but also as a photoreaction device for cylindrical solids. It is fully usable.

The results of sterilization tests conducted using these conventional devices and the device of this example will be described below.

As a sample, Fe2O3 fine powder 'eloOppm was dispersed as a turbidity component in water collected from a public road gutter.Using raw water that had been stirred all day and night, it was irradiated with ultraviolet light using both devices, and the number of viable bacteria was determined after 1 to 6 hours. Table 1 shows the results of measuring (number/wtl).

In Table 1, the water that was not UV treated was circulated by a pump under the same conditions in the target experiment. At this time, raw water was used at 11 hours, water was supplied at 217 hours, and the ice falling time on the cylinder was about 0.
It was 3 seconds. As shown in Table 1, the photoreaction device of this example has a U
It has been found that because V is used effectively, sterilization can be done in about half the time compared to conventional methods.

Since this device is large-sized and uses a high-intensity UV lamp, it can also be applied to various decomposition devices and photosynthetic reaction devices.

[Brief explanation of drawings]

Figure 1 is a cross-sectional view of a conventional elliptical cylindrical photoreactor;
The figure is a sectional view showing the basic configuration of an embodiment of the present invention, FIG. 3 is a configuration diagram explaining the configuration of FIG. 2, FIG. FIG. 4 is a partial cross-sectional view of the liquid passing device, and FIGS. 6 and 7 are graphs showing measurements of UV irradiation intensity versus incident angle using a conventional device and the device of this embodiment. In the figure, 1.25...direct light, 2.26...-
Next reflected light. 3...Light ray that comes into contact with the reactant, 4...
Regular ellipse cylinder, 5...Basic ellipse, 6...Correction ellipse, 10. Old light source (UV lamp) 11...
...Reactant, 20...Main ellipsoid, 21.2
2...Corrected elliptical mirror surface, 27...mark/tertiary reflected light, 30...mirror surface, 31...bottom surface, 32
...UV lamp, 33...Quartz tube, 3
4.Old...Liquid passing device, 40...Circulation tank, 41.
... Circulation pump, 42 ... Hollow cylinder (pipe), 43 ... Cylindrical retainer, 44 ...
Receiver, μ, 11'...Focus, AA'...Long axis of curve. BB' is the short axis. Plan Taso 1 6 times □ Jinno Nishi (Kaya 71 yen r

Claims (1)

[Claims] A photoreaction device in which a light source is placed at one focus of the elliptical cylinder and a reactant is placed at the other focus in an elliptical cylinder whose inner surface is mirror-finished, and the reactant is irradiated with light from the light source. Let the cross section of the elliptical cylinder be a first ellipse, let the intersection point 'iA', A of the extension of the straight line connecting the foci μ, μ' of this first ellipse and this ellipse, and let the perpendicular of the straight line μI be The intersection points iB and g between the bisector and this ellipse are defined as a second ellipse whose focal point is the focal point μ and the intersection point B, and which has an intersection point Ct between the focal point μ and the intersection point A, and this second ellipse and the arc K) of the first ellipse is defined as D, the partial arc ADi of the arc AB of the first ellipse, and the correction arc CDB replaced by the partial arc CD of the second ellipse; Similarly to this correction arc, μ' and B, μ and 13' of the focal point and the intersection point,
The ellipse is formed into a correction ellipse consisting of three correction arcs each having a focal point of d and n=1 and three correction arcs in which the partial arcs of the first ellipse are respectively replaced by partial arcs of the same ellipse as the second ellipse. A photoreaction device characterized by forming pillars.