JPS58214262A - Liquid metal ion source - Google Patents

Liquid metal ion source

Info

Publication number
JPS58214262A
JPS58214262A JP9485082A JP9485082A JPS58214262A JP S58214262 A JPS58214262 A JP S58214262A JP 9485082 A JP9485082 A JP 9485082A JP 9485082 A JP9485082 A JP 9485082A JP S58214262 A JPS58214262 A JP S58214262A
Authority
JP
Japan
Prior art keywords
matter
ionized
evaporation
metal ion
ion source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9485082A
Other languages
Japanese (ja)
Other versions
JPH0324014B2 (en
Inventor
Toru Ishitani
亨 石谷
Hifumi Tamura
田村　一二三
Akira Shimase
朗 嶋瀬
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP9485082A priority Critical patent/JPS58214262A/en
Publication of JPS58214262A publication Critical patent/JPS58214262A/en
Publication of JPH0324014B2 publication Critical patent/JPH0324014B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/26—Ion sources; Ion guns using surface ionisation, e.g. field effect ion sources, thermionic ion sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Electron Tubes For Measurement (AREA)

Abstract

PURPOSE:To suppress the useless evaporation of a matter to be ionized by covering its surface with a liquid matter which has a relatively low vapor pressure and doesn't react with the matter to be ionized. CONSTITUTION:A liquid metal ion source is an electronic-inpulse-heated type, in which a tip 1 is heated by providing impulses to it by means of thermions discharged from a filament 9. A matter 3 to be ionized is molten by the heat of the tip 1. When the temperature of InSbB2O2 used as the matter 3 is increased to around 800 deg.K in order to melt InSb, Sb vigorously evaporates from the surface of a reservoir 2 for the matter 3 due to the high vapor pressure of Sb. By providing B2O2 used as an evaporation-preventing matter 6 on the entire upper surface of the matter 3, any evaporation of Sb element having a high vapor pressure from the reservoir 2 can be prevented, and any adhesion of evaporated Sb element to a vacuum case, an electrode part and the like can be prevented. In addition, when a matter to be ionized is an alloy or a chemical compound, such a means as above has an effect of preventing any compositional change which might be caused by selective evaporation.

Description

【発明の詳細な説明】 本発明は液体金属イオン源の改良に関するものであシ、
その要旨とするところは、蒸気圧の高いイオン化物質の
その液体表面からの蒸発をおさえるためにその高温時に
液状でかつ蒸気圧の比較的圓いＢ　！　Ｏｎ等の液状物
質でイオン化物質の表面をおおうようにしたものである
。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to improvements in liquid metal ion sources.
The gist of this is that in order to suppress the evaporation of ionized substances with high vapor pressure from the liquid surface, B! The surface of the ionized substance is covered with a liquid substance such as On.

第１図は従来のニードル・キャピラリー・タイプの液体
金属イオン源の基本構成を示したものである。イオン化
物質３はキャピラリー２の中に貯蔵されており、イオン
源を働かす時は、例えば、通電加熱、あるいは電子衝撃
加熱などの方法によりイオン化物質３が溶融し、ニード
ル状チップ１の表面を濡らして、その表面とよくなじむ
ように加熱し、高温保持される。この時、イオン化物質
３が蒸気圧の高い物質である場合、その表面からイオン
化物質３が真空中に蒸発し、その結果、真空壁や他の電
極の表面に付着してそれらを汚したり、イオン化物質３
自身のムダな消耗をするなどの欠点があった。又、イオ
ン化物質３が合金や化合物の場合、そめ構成元素ごとの
蒸気圧の差からその成分比が次第に変化する場合がある
という欠点もあった。FIG. 1 shows the basic configuration of a conventional needle capillary type liquid metal ion source. The ionized substance 3 is stored in the capillary 2, and when the ion source is operated, the ionized substance 3 is melted by a method such as electrical heating or electron impact heating, and wets the surface of the needle-shaped tip 1. , heated so that it blends well with its surface and held at a high temperature. At this time, if the ionized substance 3 is a substance with high vapor pressure, the ionized substance 3 evaporates from its surface into the vacuum, and as a result, it adheres to the vacuum wall or the surface of other electrodes, contaminating them, or ionizing them. substance 3
There were drawbacks such as wasting one's own energy unnecessarily. Further, when the ionized substance 3 is an alloy or a compound, there is also a drawback that the component ratio may gradually change due to the difference in vapor pressure of each constituent element.

したがって、本発明の目的は、このイオン化物質のムダ
な蒸発を押さえることを可能とした液体金属イオン源を
提供することにある。Therefore, an object of the present invention is to provide a liquid metal ion source that makes it possible to suppress wasteful evaporation of this ionized substance.

上記目的を達成するために本発明においては、液状イオ
ン化物質の蒸発を防止するため、その温度で液状で、蒸
気圧が比較的低く、かつイオン化物質と反応しない物質
でイオン化物質の表面をおおうようにして液体金属イオ
ン源を構成したことを特徴としている。To achieve the above object, in the present invention, in order to prevent the liquid ionized substance from evaporating, the surface of the ionized substance is covered with a substance that is liquid at that temperature, has a relatively low vapor pressure, and does not react with the ionized substance. The feature is that the liquid metal ion source is configured as follows.

以下、本発明の一実施例全第２図によシ説明する。第２
図は本発明によるニードル・キャピラリー・タイプの液
体金属イオン源の基本構成を示したものである。同図に
おいて、１はニードル状チップ、２はイオン化物質３の
溜、４は引出し電極１．５はイオンビーム、６は本発明
の特徴である蒸発防止物質、７は軸出し用スペーサ、８
は制御電極、９はフィラメント、１０〜１２は電源であ
る。この液体金属イオン源は電子衝撃加熱タイプであっ
て、フィラメント９から放出された熱電子でチップ１を
衝撃して加熱する。その熱でイオン化物質３を溶融する
。本実施例ではイオン化物質３としてＩｎ　Ｓｂ、蒸発
防止物質６としてＢｓ０ｓｔ用いた。第３図に工ｎ５ｂ
１およびＢｔＯ−の蒸気圧と温度との関係を示す。これ
らの融点ＴｍはＴｍ（Ｉｆｌ）＝４２９°に、Ｔｍ（８
ｂ）＝９０３．５°Ｋ。Hereinafter, one embodiment of the present invention will be explained with reference to FIG. Second
The figure shows the basic configuration of a needle capillary type liquid metal ion source according to the present invention. In the figure, 1 is a needle-shaped tip, 2 is a reservoir for an ionized substance 3, 4 is an extraction electrode 1.5 is an ion beam, 6 is an evaporation prevention material that is a feature of the present invention, 7 is a centering spacer, 8
9 is a control electrode, 9 is a filament, and 10 to 12 are power sources. This liquid metal ion source is of an electron impact heating type, and heats the chip 1 by impacting it with thermoelectrons emitted from the filament 9. The heat melts the ionized substance 3. In this example, InSb was used as the ionized substance 3, and Bs0st was used as the evaporation prevention substance 6. Figure 3 shows the construction n5b.
1 shows the relationship between vapor pressure and temperature of 1 and BtO−. These melting points Tm are Tm(Ifl)=429°, Tm(8
b)=903.5°K.

Ｔｍ（Ｂｔ　Ｏｔ　）　＝　７２３°に、Ｔｍ（ＩｎＳ
ｂ）＝７９８°にである。従って、ＩｎＳｂを溶融する
ため８００°に程度まで温度を上げると、Ｓｂはその蒸
気圧が高いためイオン化物質３のため２の表面からの蒸
発がはげしい。そこでＢｓ０ｓ６をその表面に乗せて覆
うことにより、そこからの蒸発を防止することができた
。ただし、チップ１の先端からの蒸発は従来と同様に存
在する。At Tm(BtOt) = 723°, Tm(InS
b) = 798°. Therefore, when the temperature is raised to about 800° to melt InSb, Sb is an ionized substance 3 and evaporates from the surface of Sb rapidly due to its high vapor pressure. Therefore, by placing Bs0s6 on the surface and covering it, evaporation from there could be prevented. However, evaporation from the tip of the tip 1 exists as in the conventional case.

本発明によれば、イオン化物質のため部からの蒸気圧の
高い元素の蒸発が防止できるので、それによる真空容器
や電極部などへの付着が防げる。According to the present invention, since it is possible to prevent the evaporation of elements with high vapor pressure from the ionized substance part, it is possible to prevent the elements from adhering to the vacuum container, the electrode part, etc.

また、イオン化物質が合金や化合物の場合、選択蒸発に
よる組成の変化を防ぐ効果がある。後者は特に液体金属
イオン源の放出イオン種の安定性に寄与するものである
。Further, when the ionized substance is an alloy or a compound, it has the effect of preventing changes in composition due to selective evaporation. The latter particularly contributes to the stability of the emitted ionic species of the liquid metal ion source.

【図面の簡単な説明】[Brief explanation of drawings]

第１図は従来のニードル・キャピラリー型液体金属イオ
ン源の縦断面図、第２図は本発明の液体金属イオン源の
縦断面図、第３図はＳｂ、Ｉ”＋Ｂ、０．の温度と蒸気
圧との関係を示すグラフである。 １・・・ニードル状チップ、２・・・イオン化物質のた
め部、３・−・イオン化物質、４・・・イオン引出し電
極、５・・・イオンビーム、６・・・蒸発防止物質、７
・・・チップ軸出し用スペーサ、８・・・制御電極、９
・・・フィラメント、１０・・・電子加速電源、１１・
・・フィラメント　　１　　図 冨　３　　図 温屓（°すFIG. 1 is a vertical cross-sectional view of a conventional needle capillary type liquid metal ion source, FIG. 2 is a vertical cross-sectional view of the liquid metal ion source of the present invention, and FIG. It is a graph showing the relationship with vapor pressure. 1... Needle-shaped tip, 2... Ionized substance reservoir, 3... Ionized substance, 4... Ion extraction electrode, 5... Ion beam , 6... Evaporation prevention substance, 7
... Spacer for chip axis alignment, 8 ... Control electrode, 9
... filament, 10... electron acceleration power source, 11.
...Filament 1 Figure 3 Figure warmth (°su)

Claims (1)

【特許請求の範囲】 １、イオン化すべき液体状の物質上だくわえるための貯
蔵部と、針状チップと、引出し電極とから構成される液
体金属イオン源において、上記イオン化すべき物質の表
面を蒸気圧が比較的低く、かつ、上記イオン化すべき物
質と非反応性の液状物質でおおうことｔ−特徴とする液
体金属イオン源。 ２、上記イオン化物質をおおう上記液状物質が、Ｂｔｕ
ｓからなることを特徴とする第１項の液体金属イオン源
。[Scope of Claims] 1. In a liquid metal ion source consisting of a storage part for holding onto a liquid substance to be ionized, a needle tip, and an extraction electrode, the surface of the substance to be ionized is A liquid metal ion source characterized in that it has a relatively low vapor pressure and is covered with a liquid substance that is non-reactive with the substance to be ionized. 2. The liquid substance covering the ionized substance contains Btu
The liquid metal ion source according to item 1, characterized in that it consists of s.
JP9485082A 1982-06-04 1982-06-04 Liquid metal ion source Granted JPS58214262A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9485082A JPS58214262A (en) 1982-06-04 1982-06-04 Liquid metal ion source

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9485082A JPS58214262A (en) 1982-06-04 1982-06-04 Liquid metal ion source

Publications (2)

Publication Number Publication Date
JPS58214262A true JPS58214262A (en) 1983-12-13
JPH0324014B2 JPH0324014B2 (en) 1991-04-02

Family

ID=14121500

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9485082A Granted JPS58214262A (en) 1982-06-04 1982-06-04 Liquid metal ion source

Country Status (1)

Country Link
JP (1) JPS58214262A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6438700A (en) * 1987-08-03 1989-02-08 Mitsubishi Electric Corp Ion source

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6438700A (en) * 1987-08-03 1989-02-08 Mitsubishi Electric Corp Ion source

Also Published As

Publication number Publication date
JPH0324014B2 (en) 1991-04-02

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