JPS5821173Y2 - Furnace tube - Google Patents

Description

[Detailed Description of the Invention] The present invention relates to a reactor core tube through which reactive gases and the like are guided, and proposes a structure of the reactor core tube suitable for manufacturing semiconductor devices and the like.

First, FIG. 1 shows the main structure of a conventional diffusion furnace for manufacturing semiconductor devices.

1 is a gas introduction pipe, 2 is a reaction furnace, 3 is a heating coil, and 4 is a semiconductor wafer.

Now, in the diffusion furnace shown in Fig. 1, gas is introduced into the reaction furnace 2 through the gas introduction pipe 1 and heated by the heating coil 3. Gas cannot be uniformly diffused into an object.

Furthermore, if the gas has a high reaction rate, the gas concentration will decrease as it comes into contact with the reactant, and the reaction will be non-uniform at the inlet and outlet.

In addition, even if a fan is attached to the gas inlet to diffuse gas, the gas only rotates as it enters, which does not contribute much to equalizing the concentration of the reactant gas at the inlet and outlet, and the fan's mechanical This may cause dust, etc. to be generated due to manual operation.

Furthermore, even if a large number of inlets are provided on the furnace wall, it is insufficient for uniform diffusion, making it difficult to manufacture and not practical.

Therefore, in view of the above problems, the present invention provides a reactor core tube for reactant gas that uses a single inlet tube, has a uniform gas concentration throughout the furnace, and has less uneven reaction. 1 shows the main parts of a diffusion furnace for manufacturing semiconductor devices according to an embodiment of the present invention.

As shown in FIGS. 2 and 3, the gas introduction tube 11 connected to the reactor 12 heated by the heating coil 13 is provided with a rifle section 15 and an outlet section 16 having a smaller diameter than the introduction tube 11.

FIG. 3 is a sectional view taken along line AB in FIG. 2.

First, wafers 14 are placed in a reactor 12 as shown in the figure, and gas is supplied through a gas introduction pipe 11 while the reactor 12 is heated by a coil 13.

In this case, the gas passing through the gas introduction pipe 11 is transferred to the rifle section 15.
The reactor 12 is rotated in a spiral shape, rotates from the tube wall of the reactor 12 toward the center, and advances toward the outlet of the reactor 12, thereby making it possible to make the concentration of the reactant gas uniform.

Further, by making the outlet part 16 of the gas introduction pipe 11 a little thinner as shown in the figure, the gas suddenly diffuses at the inlet of the reactor 12, so that the gas is sufficiently spread to the pipe wall near the gas reactor 12 population, and the reactor 12 The gas flow velocity becomes faster in the inner part near the pipe wall, and the flow velocity remains the same in the center.

As described above, even if there is a wafer 14, the rewafer 1 has a small difference in reaction gas concentration between the inlet and the outlet of the reactor 12.
The reaction above will proceed uniformly.

It goes without saying that the present invention is applicable not only to diffusion furnaces but also to any gas reaction apparatus.

As described above, according to the present invention, without placing obstacles in the furnace or modifying the furnace itself, by devising the introduction pipe itself, gas can be blown into the furnace while being diffused throughout, and objects inside the furnace can be blown into the furnace. can be reacted more uniformly.

[Brief explanation of the drawing]

Fig. 1 is a structural diagram of the main parts of a conventional diffusion furnace for manufacturing semiconductor devices, Fig. 2 is a structural diagram of main parts of the same diffusion furnace according to an embodiment of the present invention, and Fig. 3 is a section A of Fig. 2. It is a diagram. B line 11... Gas introduction pipe, 12... Reactor, 15... Rifle part, 16... Outlet part.

Claims (1)

[Scope of utility model registration request] A furnace core tube comprising an introduction tube for introducing gas and a reactor for reacting reactants, the introduction tube having a spiral groove on its inner wall.