JPS58211171A - Recording system - Google Patents

Abstract

PURPOSE:To enable recording with less decrease in resolving power, by disposing a light source which emits a light signal like stripes to a photosensitive layer of the constitution wherein a striped photoconductive layer and a striped insulation layer are arranged alternately so as to face said photosensitive layer. CONSTITUTION:A photosensitive member is made into the constitution wherein a striped photoconductive layer 2 and a striped insulation layer 3 are arranged alternately on a substrate 1 and a surface insulation layer 4 is formed on said layers. A striped light source 12, for example, a light source consisting of a semiconductor laser, is provided on the layer 2 of the photoreceptor constituted in such a way in tight contact with said layer. Then, the distance between the light source and the photoreceptor is not longer than the case in which the striped photoreceptor is exposed by using an He-Ne laser, Ar layer or the like; therefore the deformation in the size of the exposing beam is obviated. Since an f-theta lens for correcting the beam diameter is eliminated, the cost is reduced.

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a recording method for recording digital optical signals when forming nine characters, images, etc. on a recording medium.

Conventionally, recording using an electrophotographic photoreceptor has been widely used. In other words, the photoreceptor is silent! ! An image is formed and this is developed with toner to form a visible image.

However, when forming an image using a conventional photoreceptor, the inner cone forms a high-resolution image for digital images. The reason for this is the spread of the electric field of the electrostatic image and the lateral spread of charge movement in the photoconductive layer.

When pattern exposure is applied to an electrophotographic photoreceptor, the distance from the light source to the photoreceptor is long in a copier using an electrophotographic device, or a printer or printer using laser beam scanning. There is also an expansion of

For these reasons, this is inconvenient when attempting to record with high resolution.

Therefore, the present invention aims to reduce the decrease in resolution due to the spread of the beam caused by the distance from the light source by combining a photosensitive member with a photosensitive member that reduces the decrease in resolution due to the spread of the electric field and the lateral spread of charge movement in the photoconductive layer. The main purpose is to provide a recording method that reduces the amount of data.

The present invention is characterized in that, as a means for achieving the above object, a photosensitive layer formed by alternately arranging striped photoconductive layers and striped insulating layers and a striped light source are used.

Namely, in the photosensitive member according to the present invention, the photoconductive layer is discontinuously formed in stripes.

The size of the dots of the digital electrostatic image formed on the surface of the photosensitive member is limited by the insulating layer interposed between the light guide FfL layers, and a high-resolution digital image with fine dots can be easily formed. It is.

Further, since the spread of the movement of charges in the photoconductive layer is suppressed by the adjacent insulating layer, the resolution of the dot itself is also improved.

Furthermore, in the present invention, the light source has a fine cell structure and is further formed into a striped light source so as to face the striped photosensitive member. By bringing this striped light source close to the striped photosensitive member, a high-resolution digital image can be easily produced.

That is, the combination of a striped photosensitive member and a striped light source can significantly improve the resolution of the obtained digital image.

One representative embodiment of a photosensitive member according to the present invention is shown in FIG.

Reference numeral 1 denotes a support, on which a striped photoconductive layer 2 and a striped insulating layer 1f43 are alternately arranged.

Surface insulation 1@4 is formed on the front surface.

This surface insulating layer protects the photosensitive layer consisting of the photoconductive layer 2 and the insulating layer 3 or supplements the charge retention ability of the photosensitive layer. Note that the surface insulation layer 4 may be omitted.

The above photosensitive member may be considered to be roughly the same as a known electrophotographic photosensitive member. For example, as the support 1, stainless steel, I
%i and other various metals or alloys thereof, or various insulating supports may be used. In the latter case, a conductive treatment layer 10 is formed between the photosensitive layer and the photosensitive layer.

The shape of the support may be any shape such as a cylinder, a belt, or a plate.

Its shape is determined depending on the need, but in the case of continuous high-speed copying, it is desirable to have an endless belt shape or a cylindrical shape.

For the photoconductive layer 2, various known inorganic and organic photoconductors are used.

Although the thickness of the photoconductive layer depends on the type and characteristics of the photoconductive layer used, it is generally preferred to have a thickness of about 5 to 100 microns, particularly about 10 to 50 microns. The electrical resistance of the photoconductive layer in the dark is usually set in the range of 1012 to 1014 ohms.

The striped insulating layer 6 may be formed of a conventional insulating layer, and is preferably formed of photoresist. That is, it can be easily formed by coating a photoresist on a support on which a striped photoconductive layer is formed and selectively etching away only the photoresist layer on the photoconductive layer by pattern exposure.

As the photoresist, any conventionally commonly used materials can be used. For example, as a commercially available product, the product name:
KPR (Kodak photo Re5ist +
: I-dak developer: methylene chloride, trichlene, etc.), product name: KMER (Kodak Meta
l Etch Re5ist + Manufactured by Kodatsu...Developer: xylene, trichlene, etc.), Product name: TPR (
Manufactured by Tokyo Ohka...Developer: xylene, trichlene, etc.), Product name: Silaplay AZ 1300 (Silapray SO...Developer: Alkaline aqueous solution), Product name: KT
FR (Kodak Th1n Film Resist
*Kodak e...Developer: xylene, trichlene, etc.), Product name: FNRR (Fuji Pharmaceutical Co., Ltd., Sou-Ken developer: Chlorocene), Product name: EPER (FujiPho)
to Etching Re5ist, Fuji Photo Phil A jJl! *@Kaikai developer: Triclean), product name: TESHDOOL (Kaihon Chemical Industry Co., Ltd. @Ken developer: water), and product name: Fuji Regis) No. 7 (
Manufactured by Fuji Pharmaceutical Co., Ltd. (developer: water), etc. After using the mask, remove it with trichloride or methylene chloride.

Trade name: AZIJ Mover (manufactured by Silapray), sulfuric acid, etc. are used.

Further, the patterned photoconductive layer may be formed using a photoresist or by a suitable method such as vapor deposition or etching. If by vapor deposition.

A photoconductive layer forming material is deposited with a mask having striped openings placed on the support, and then the mask is removed to form a striped photoconductive layer.

When forming a photoconductive layer by etching, the method is similar to that of forming a masking pattern using a normal photoresist, that is, a photoconductive layer forming layer is formed on a support, and then a photoresist layer is formed on the photoconductive layer forming layer. 9. Next, pattern exposure is performed.

Selectively remove the unexposed areas of the photoresist layer with a developer (if a photoresist whose exposed areas become soluble in the developer is used, selectively remove the exposed areas) 9. Next, remove the photoresist layer. Partitions of the photoconductive layer forming layer exposed to light after removal of the layer are dissolved and removed using a predetermined etching solution such as an organic solvent, 9 parts strong acid, 1 part strong alkali, etc., to form partition walls. The photoresist remaining in the exposed areas (or unexposed areas) is removed with a predetermined solvent.

In addition, striped photoconductive 1 (insulated from j42) fits
The width of 3 is set appropriately, but it is 1μ to 100μ, especially 2
~50μ is suitable.

As for the photosensitive member provided with the surface insulation ff14, various kinds of ordinary resins can be appropriately used as the resin used to form the surface insulation layer. for example·.

polyethylene, polyester, polypropylene.

polystyrene, polyvinyl chloride, polyvinyl acetate,
These include acrylic resin, polycarbonate, silicone resin, fluororesin, and epoxy resin. The thickness of the surface insulating layer is usually set to 0.1 to 50 μm, particularly 0.1 to 10 μm.

A typical recording method using such a photosensitive member includes a step of charging the photosensitive member, a step of electrostatically adhering toner, an exposure step, and a step of transferring a toner image to a transfer member. It is. In this case, the step of electrostatically adhering the toner may be performed after the exposure step.

Next, the striped light source can be effectively used as long as the material can emit light in the form of a thin film. for example.

These include LEDs, semiconductor lasers, electroluminescence, etc.

Such materials include GaAs tGapAg+ In
GaAs + JaAs + GaP e Zn (S,
Se), ZnS:Cu, etc.

Normally, the size of one light source cell is several microns to several hundreds of microns9%, the suitable size is about 10 microns to 60 microns.0 Figure 2 shows an embodiment of the striped light source according to the present invention, 11 is a substrate;
2 is a light emitting part, 16 is a light shielding layer, and 14 is a protective layer. Second
As shown in the figure, they are digitally arranged in stripes so that they emit light in response to an input signal. The light-emitting member shown in this example has a maximum coloring wavelength of 850 nm. This is a semiconductor laser whose main composition is GaAs. As a semiconductor laser light source, the cell structure is formed into an almost square shape.

-The length of the sides is 40μ. In addition, the gap between adjacent cells is set to 10μ to create a tub that can emit light in an array.

Next, a method of completing the recording apparatus constructed using the photosensitive member shown in FIG. 1 and the light source shown in FIG. 2 will be described.

The photosensitive member shown in FIG. 1 is charged 5 as shown in FIG.

next? , 41N, toner 6 charged with the opposite polarity is uniformly deposited on the strip. Next, as shown in FIG. 5, by performing exposure 7 with a light beam having recorded information, the resistance of the photoconductive layer 2 is lowered, and the surface potential of the surface insulating layer N44 on the photoconductive layer is lowered. , the electrostatic attraction force with the toner is weakened.

Next, as shown in FIG. 6, by applying a voltage of opposite polarity to the toner 6 to the transfer head 9 via the transfer paper 8 between the transfer head 9 and the photosensitive member, the photoconductive Only the toner 6 on the layer selectively adheres to the transfer paper. The transferred toner is heated and fixed to obtain a final image.

A typical striped light source is a semiconductor laser, and an example of its exposure state is shown in FIG. Since the semiconductor laser is capable of current modulation, the nine image signals are input as modulated light.

In the case of the present invention, as described above, the striped light source and the striped photoconductor are used in close contact with each other so that the striped light source faces the photoconductive layer, so a HeNe laser, an Ar laser, etc. are used. Since the distance between the light source and the photoreceptor is not long, unlike when exposing a striped photoreceptor, the size of the exposure beam does not change. Since the -θ lens is omitted, the cost can be reduced.

Furthermore, since digital processing can be performed by arranging array-type light sources, it is possible to miniaturize a flat plate as a recording device.

The greatest effect of the present invention is that a compact flat plate copying machine printer can be produced.

It should be noted that the drive circuit for the array light source using digital signals is omitted because known technology is used.

[Brief explanation of the drawing]

FIG. 1 is a cross-sectional view of a part of the photoreceptor used in the present invention, FIG. 2 is a cross-sectional view of a strata and an eve-shaped light source, FIGS. 3 to 6 are explanatory diagrams of the image forming process, and FIG. FIG. 4 is an explanatory diagram of the exposure state of the invention. 2 is a striped photoconductive layer of a photosensitive layer, 6 is a striped insulating layer, 12 is a striped light emitting portion of a light source, and 13 is a light shielding layer.

Claims (1)

[Claims] (1) A recording method characterized in that a light source that emits optical signals in a stripe pattern is arranged opposite to a photosensitive layer formed by alternately arranging a stripe pattern photoconductive layer and a stripe pattern insulating layer.