JPS58208994A - Nonvolatile semiconductor storage device - Google Patents

Nonvolatile semiconductor storage device

Info

Publication number
JPS58208994A
JPS58208994A JP57090583A JP9058382A JPS58208994A JP S58208994 A JPS58208994 A JP S58208994A JP 57090583 A JP57090583 A JP 57090583A JP 9058382 A JP9058382 A JP 9058382A JP S58208994 A JPS58208994 A JP S58208994A
Authority
JP
Japan
Prior art keywords
data
written
rewrite
cell
rewriting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP57090583A
Other languages
Japanese (ja)
Inventor
Masashi Wada
和田 正志
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP57090583A priority Critical patent/JPS58208994A/en
Publication of JPS58208994A publication Critical patent/JPS58208994A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/10Programming or data input circuits
    • G11C16/102External programming circuits, e.g. EPROM programmers; In-circuit programming or reprogramming; EPROM emulators
    • G11C16/105Circuits or methods for updating contents of nonvolatile memory, especially with 'security' features to ensure reliable replacement, i.e. preventing that old data is lost before new data is reliably written
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/10Programming or data input circuits
    • G11C16/102External programming circuits, e.g. EPROM programmers; In-circuit programming or reprogramming; EPROM emulators

Abstract

PURPOSE:To attain efficient data rewriting, by performing erase and rewrite only to a storage element where the necessity of data rewrite is discriminated by means of the comparison between a written data and a data to be written in. CONSTITUTION:A data written in an ROM cell electrically rewritable of a cell matrix 1 and a data to be written in via an I/O buffer 2 are compared at comparison circuits 4a, 4b-, and when they are dissident, it is discriminated that the data rewrite is required. The data erase/rewrite is done for the corresponding ROM cell of the matrix 1 with a write signal generating circuit 5 and an erase signal generating circuit 6 in response to this discrimination signal. Thus, it is not required to rewrite after lots of ROM cells are erased in byte unit, and the data rewrite is done for a required cell only efficiently and quickly.

Description

【発明の詳細な説明】 〔発明の技術分野〕 本発明は記憶データを電気的に書換え可能な所gl!!
E PROMを記憶装置本体とする不揮発性半導体記憶
装置に関する。
DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention is directed to a place where stored data can be electrically rewritten. !
The present invention relates to a nonvolatile semiconductor memory device whose main body is an EPROM.

〔発明の技術的背景とその問題点〕[Technical background of the invention and its problems]

読出し専用メモリ、所謂ROMは各種のデータ処理に広
く用いられている。また穀近ではこのようなROMの記
憶データを電気的に書換え可能としたE PROM(E
lectrical Erasable Progra
mpbleROM )が開発され、広く利用されるよう
になってきている。
Read-only memories, so-called ROMs, are widely used for various data processing. In addition, Kokuchika has developed an E PROM (E
Electrical Erasable Progra
mpbleROM) has been developed and is becoming widely used.

しかして従来、この種のE2FROMは、一般的に第1
図に示すように複数の記憶セルをマトリックス状に配置
してなる記憶装置本体としてのセル・マトリ、クス1、
このセルマトリ、クス1の記憶セルを選択する図示しな
い選択回路、そして上記選択された記憶セルと外部との
データの授受を行うI10パ、ファ回路2、前記選択さ
れた記憶セルのデータ書換えを制御するW/E切換え回
路3によシ構成される。このW/FJ切換え回路3は、
例えは記憶セルのデータを1#から0”に変更してデー
タ書込みを行わしめると共に1データを′0”からパ1
”に変更してその消去を行わしめるものである。
However, conventionally, this type of E2FROM generally has a first
As shown in the figure, a cell matrix, a cell matrix 1, which is a storage device body formed by arranging a plurality of storage cells in a matrix,
This cell matrix, a selection circuit (not shown) that selects the memory cell of the cell matrix 1, an I10 buffer circuit 2 that transmits and receives data between the selected memory cell and the outside, and controls data rewriting of the selected memory cell. The W/E switching circuit 3 includes a W/E switching circuit 3. This W/FJ switching circuit 3 is
For example, the data in the memory cell is changed from 1# to 0'' to write the data, and 1 data is changed from '0'' to 1#.
” to delete it.

このような構成のg2FROM 、即ち不揮発性半導体
記憶装置のデータを書換える場合、先ずデータ書換えの
目的番地の記憶セルを選び、そのセルに”1″なるデー
タを力えてその消去を行ったのち、1.換えるべき新し
いデータに応じて0″の書込み処理が行われる。このよ
うなデータ書換え処理は、数ビットのセルからなるバイ
ト単位で行う場合にも同様にして行われ、まず選択され
た全てのセルのデータを消去したのち、新たなデータの
書込みが行われる。
When rewriting data in a g2FROM having such a configuration, that is, a nonvolatile semiconductor memory device, first select a memory cell at the target address for data rewriting, write data "1" to that cell, and erase it. 1. A 0" write process is performed according to the new data to be replaced. Such data rewrite process is performed in the same way when performing byte units consisting of several bits of cells. First, all selected cells are After erasing the data, new data is written.

つまり、従来装置にあっては、ビットデータの全ての消
去と、所望データの書込みと云う2工程のデータ書換え
処理を必要とする。その上、これらの処理は、通常高電
圧を用いて行われる為、その取扱、いかめんどうであっ
た。
In other words, the conventional device requires a two-step data rewriting process: erasing all bit data and writing desired data. Moreover, since these treatments are usually performed using high voltage, they are quite cumbersome to handle.

〔発明の目的〕[Purpose of the invention]

本発明はこのような事情を考慮してなされたもので、そ
の目的とするところは、不揮発性半導体記憶素子からな
る記憶装置本体の記憶データを単一の過程で効率良く書
換えることのできる実用性の高い不揮発性半導体記憶装
置を提供することにある。
The present invention has been made in consideration of the above circumstances, and its purpose is to provide a practical method for efficiently rewriting data stored in a storage device body made of a non-volatile semiconductor memory element in a single process. An object of the present invention is to provide a nonvolatile semiconductor memory device with high performance.

〔発明の概要〕[Summary of the invention]

本発明の概要は記憶セルに既に書込まれているデータと
、該記憶セルに新たに書込もうとするデータとを比較し
て上記既に書込まれたデータの書換えの必要性を判定し
、その判定結果に従ってデータの書込み(’J’→″′
0”)またはデータの消去(′0″→″’1”)を選択
的に行わしめ、これによシデータの書換えの必要性のあ
る記憶セルに対してのみl工程処理によってそのデータ
の書換えを行うようにしたものである。
The outline of the present invention is to compare data already written in a memory cell with data to be newly written to the memory cell, and determine whether it is necessary to rewrite the already written data. Data is written according to the judgment result ('J'→″′
0'') or erase data ('0''→''1'') selectively, thereby rewriting the data only in the memory cells that need to be rewritten by the l process. This is what I decided to do.

〔発明の効果〕〔Effect of the invention〕

従って本発明によれば、データの書換えを必要とする記
憶セルのみを選択してデータ゛Omの書込み、或いは′
1#への消去を単一の過程で行うことによシ、その書換
えを行うことができ、非常に簡単である。故に、その取
扱いの簡易化を図ることができ、実用的利点が絶大であ
る。
Therefore, according to the present invention, only the memory cells that require data rewriting are selected and the data 'Om' or 'Om' is written.
By erasing to 1# in a single process, rewriting can be performed, which is very simple. Therefore, it is possible to simplify its handling, which has great practical advantages.

〔発明の実姉例〕[Actual sister example of invention]

以下、図面を参照して本発明の一実施例につき押明する
Hereinafter, one embodiment of the present invention will be explained with reference to the drawings.

第2図は実施例装聞の概略構成図であり、1はセル・マ
トリックス、2Vr I/QノJ、ツファ回路、3はW
/E切換え回路である。この装置が特徴とするところは
、セル・マトリックス1の選択された記憶セルに既に書
込まれているデータと、110−4ッファ回路2を介し
て与えられる新たに書込むべきデータとを比較回路4m
 、4b〜4nにてそれぞれ比較するようにして・いる
。この例では比較回路4h、4b〜4nにて1/ぐイト
単位で、各ビットデータがそれぞれ比較されるようにな
っている。各比較回路4a 、4b〜4nは、記憶セル
に既に書込まれているデータRと、新たに謝込むべきデ
ータDとを比較し、第1表に示す如き論理処理を行って
、書込みが必要であるか否かを示すデータW1と、消去
が必要であるか否かを示すデータElとをそれぞれ求め
ている。
FIG. 2 is a schematic configuration diagram of an embodiment of the device, in which 1 is a cell matrix, 2Vr I/Q no J, Tufa circuit, and 3 is a W
/E switching circuit. This device is characterized by a circuit that compares the data already written in the selected memory cell of the cell matrix 1 with the data to be newly written given via the 110-4 buffer circuit 2. 4m
, 4b to 4n are compared. In this example, the comparison circuits 4h, 4b to 4n compare each bit data in units of 1/bit. Each of the comparison circuits 4a, 4b to 4n compares the data R that has already been written in the memory cell with the new data D that needs to be written, and performs the logical processing as shown in Table 1. Data W1 indicating whether or not erasing is required, and data El indicating whether erasing is necessary are obtained.

第1表 このようにして各比較回路4a、4b〜4nによシそれ
ぞれ求められた上記データwt 、 FEIは書込み信
号発生回路5および消去信号発生回路6にそれぞれ与え
られる。これらの信号を受けて前記各信号発生回路5.
6は書込み信号Wおよび消去信号Eを発生し、これをW
/E切換え回路3に与えている。。しかしてW/E切換
え回路3は、例えば第2表に示す如き論理処理によって
、畳込みモードWおよび消去モードeの判定を行い、前
記セルマトリックス1に対してモード切換えを行ってい
る。
Table 1 The data wt and FEI thus obtained by each of the comparison circuits 4a, 4b to 4n are applied to the write signal generation circuit 5 and the erase signal generation circuit 6, respectively. Upon receiving these signals, each of the signal generating circuits 5.
6 generates a write signal W and an erase signal E, and sends this to W.
/E switching circuit 3. . The W/E switching circuit 3 determines the convolution mode W and the erasure mode e by, for example, logical processing as shown in Table 2, and switches the mode for the cell matrix 1.

第   2   表 尚、ここでは1バイト単位で書込みの発生および消去の
発生が検出されるようになっておシ、書込みモードに比
して消去モードが優先されるように定められている。ま
たこのような1 /、Iイト単位での処理を行う為には
、例えば前記データW1.Eiを1バイト単位で論理和
処理する等して行われる。
Table 2 Note that here, writing and erasing occurrences are detected in units of bytes, and the erasing mode is given priority over the writing mode. In addition, in order to perform such processing in units of 1/I, for example, the data W1. This is performed by performing logical OR processing on Ei in 1-byte units.

しかして、このようにデータの書込みおよび消去の必要
性が検出(判定)された記憶セルに対しては、W/F、
切換え回路3にょシモードが指定された上で、高電圧発
生回路7よシ高電圧が印加されて、その書込み、あるい
は消去が行われる。この場合、1バイトヲ構成する記憶
セル中の消去を必要とするセルに対してデータの消去が
行われ、次に上記1バイトの配憶セル中の書込みを必要
とするセルに対してデータの書込みが行われる。
Therefore, for a memory cell in which the necessity of writing and erasing data has been detected (determined) in this way, the W/F,
After the switching circuit 3 is designated with the mode, a high voltage is applied to the high voltage generating circuit 7 to perform writing or erasing. In this case, data is erased from the cells that need to be erased among the memory cells that make up one byte, and then data is written to the cells that need to be written among the one-byte storage cells. will be held.

かくしてこのように構成された装置によれば、第3図に
タイミング図を示すように、期間TIにて書換えるべき
データDを読込み、既に書込まれているデータRと比較
する。その後、期間T2において上記比較結果に従って
消去を必要とするセルに対して、データの消去(Oj′
→゛°1″)1−行わしめる。またこのとき、消去を必
要とするセルが存在しない場合には、期間T2において
書込みを必要とするセルに対してデータの書込み(l#
→゛0#)を行わしめる。更に、データ書換えを必要と
しない場合には、−切書換処理を行わない。しかるのち
、次の期間T3には、前記期間T1と同様にしてデータ
の比較を行い、期間T4では先に消去動作によって書込
みがなされなかったセルに対してデ〜りの書込みを行わ
しめる。
According to the device configured in this way, as shown in the timing chart of FIG. 3, data D to be rewritten is read in period TI and compared with data R that has already been written. Thereafter, in period T2, data is erased (Oj'
→゛°1″) 1- is executed. At this time, if there is no cell that requires erasing, data is written (l#
→゛0#) is executed. Furthermore, if data rewriting is not required, -switching rewriting processing is not performed. Thereafter, in the next period T3, the data is compared in the same manner as in the period T1, and in the period T4, a new write is performed to the cells that were not previously written by the erase operation.

これらの期間T1〜T4の処理により、データ宵換えを
必要とする全てのセルに対してデータの消去またはデー
タの別込みが行われ、上記データの書換えが完了する。
Through the processing during these periods T1 to T4, data is erased or data is added to all cells that require data rewriting, and the data rewriting is completed.

つまり、データの書換えを必要とする記憶セルについて
のみ、そのデータの書換えが消去または書込み処理によ
り実行されることになる。
In other words, data rewriting is performed by erasing or writing processing only for memory cells that require data rewriting.

以上のように本発明によれば、従来のように記憶セルを
一旦消去したのち新たなデータを書込むと云う2段階の
処理を必要とせず、短時間に効率よくデータの書換えを
行い得る。しかも、データの書換えを必要とする記憶セ
ルに対して  ・のみ1.換え処理、つまり書込みまた
は消去処理を行うので、非常に簡単であり、このような
処理に高電圧を用いることから、記憶セル(素子)に対
するデータ書換え回数の制限が大幅に緩和される。つま
υ、高電圧印加によるデータ変更の都度その菓子特性が
劣化するが、データの1換えの必要なセルに対してのみ
高電圧を加えるので、全体的にはデータ変更回数に比し
て各セルのデータ書換回数が減少する。従って、上記し
たように書換え可能回数の向上を図り伊、実用的利点が
絶大である。
As described above, according to the present invention, data can be rewritten efficiently in a short time without requiring the conventional two-step process of once erasing a memory cell and then writing new data. Moreover, for memory cells that require data rewriting, only 1. Since rewriting processing, that is, writing or erasing processing, is performed, it is very simple, and since a high voltage is used for such processing, restrictions on the number of times data can be rewritten to a memory cell (element) are greatly relaxed. However, the confectionery characteristics deteriorate each time data is changed by applying a high voltage, but since high voltage is applied only to cells that require one change of data, overall the performance of each cell is lower than the number of data changes. The number of data rewrites is reduced. Therefore, as described above, the practical advantage of increasing the number of rewrites is enormous.

尚、本発明は上記実施、例に限定されるものではない。Note that the present invention is not limited to the above embodiments and examples.

例えば冑込みモードを消去モードより優先させるように
してもよ、い。またバイト単ムTではなく、1ビット単
位でデータ1換えを行うようにしてもよい。この場合に
は上記モードの優先は全く不要となる。以上要するに本
発明はその要旨を逸脱しない範囲で種々変形して実施す
ることができる。
For example, you could make the embroidery mode take priority over the erase mode. Further, instead of byte unit T, data 1 may be changed in units of 1 bit. In this case, there is no need to give priority to the above mode. In summary, the present invention can be implemented with various modifications without departing from the gist thereof.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来装置の構成図、第2図は本発明の一実施例
装置の概略構成図、第3図は実施例装置の動作モードを
示すタイミングmlである。 1・・・セル・マトリックス(記憶装置本体)、2・・
Ilo・9277回路、3・・W/E切換え回路、4a
、4b〜4n・・・比較回路、5・・書込み信号発生回
路、6・・・消去信号発生回路、7・・・高電圧発生回
路、
FIG. 1 is a configuration diagram of a conventional device, FIG. 2 is a schematic configuration diagram of an embodiment of the device of the present invention, and FIG. 3 is a timing diagram showing the operation mode of the embodiment device. 1...Cell matrix (storage device body), 2...
Ilo・9277 circuit, 3...W/E switching circuit, 4a
, 4b to 4n... Comparison circuit, 5... Write signal generation circuit, 6... Erase signal generation circuit, 7... High voltage generation circuit,

Claims (1)

【特許請求の範囲】[Claims] 記憶データを電気的に書換えoJ能な複数の不揮発性半
導体記憶素子からなる記憶装置本体と、この記憶装置本
体の選択された記憶素子に既に書込まれたデータと該記
憶素子に1・込まんとするデータとを比較して該記憶素
子に既に書込まれたデータの書換えの必要性を判定する
手段と、この判定結果に従ってデータの1換えを必要と
する記憶素子に対してのみデータの書込みまたはデータ
の消去を行わしめてデータの書換えを行う手段とを具備
したことを特徴とする不揮発性半導体記憶装置。
A storage device main body consisting of a plurality of non-volatile semiconductor storage elements that can electrically rewrite stored data, and data that has already been written to a selected storage element of this storage device main body and 1. a means for comparing the data with data to determine whether it is necessary to rewrite data already written in the memory element, and writing data only to the memory element that requires one change of data according to the result of this determination; or means for erasing data and rewriting data.
JP57090583A 1982-05-28 1982-05-28 Nonvolatile semiconductor storage device Pending JPS58208994A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57090583A JPS58208994A (en) 1982-05-28 1982-05-28 Nonvolatile semiconductor storage device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57090583A JPS58208994A (en) 1982-05-28 1982-05-28 Nonvolatile semiconductor storage device

Publications (1)

Publication Number Publication Date
JPS58208994A true JPS58208994A (en) 1983-12-05

Family

ID=14002461

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57090583A Pending JPS58208994A (en) 1982-05-28 1982-05-28 Nonvolatile semiconductor storage device

Country Status (1)

Country Link
JP (1) JPS58208994A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61131485A (en) * 1984-11-29 1986-06-19 Res Dev Corp Of Japan Writing method of nonvolatile semiconductor memory
JPH02116092A (en) * 1988-10-25 1990-04-27 Nec Corp Electrically erasable/writable nonvolatile memory
JPH02260455A (en) * 1988-12-15 1990-10-23 Samsung Electron Co Ltd Electrically exasable and programmable semiconductor memory device and its eraoing method and its erasing programming method
JPH0349099A (en) * 1989-04-27 1991-03-01 Nec Corp Programmable read-only memory
JPH03232196A (en) * 1990-02-07 1991-10-16 Toshiba Corp Semiconductor storage device
JP2000257502A (en) * 1999-03-05 2000-09-19 Denso Corp Electronic controller for automobile
JPWO2015008438A1 (en) * 2013-07-17 2017-03-02 パナソニックIpマネジメント株式会社 Nonvolatile semiconductor memory device and rewriting method thereof

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61131485A (en) * 1984-11-29 1986-06-19 Res Dev Corp Of Japan Writing method of nonvolatile semiconductor memory
JPH0550868B2 (en) * 1984-11-29 1993-07-30 Shingijutsu Kaihatsu Jigyodan
JPH02116092A (en) * 1988-10-25 1990-04-27 Nec Corp Electrically erasable/writable nonvolatile memory
JPH02260455A (en) * 1988-12-15 1990-10-23 Samsung Electron Co Ltd Electrically exasable and programmable semiconductor memory device and its eraoing method and its erasing programming method
JPH0349099A (en) * 1989-04-27 1991-03-01 Nec Corp Programmable read-only memory
JPH03232196A (en) * 1990-02-07 1991-10-16 Toshiba Corp Semiconductor storage device
JP2000257502A (en) * 1999-03-05 2000-09-19 Denso Corp Electronic controller for automobile
JPWO2015008438A1 (en) * 2013-07-17 2017-03-02 パナソニックIpマネジメント株式会社 Nonvolatile semiconductor memory device and rewriting method thereof

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