JPS58201617A - Polyp-phenylenesulfide film - Google Patents
Polyp-phenylenesulfide filmInfo
- Publication number
- JPS58201617A JPS58201617A JP57085293A JP8529382A JPS58201617A JP S58201617 A JPS58201617 A JP S58201617A JP 57085293 A JP57085293 A JP 57085293A JP 8529382 A JP8529382 A JP 8529382A JP S58201617 A JPS58201617 A JP S58201617A
- Authority
- JP
- Japan
- Prior art keywords
- film
- polymer
- heat
- elongation
- rate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
- C08G75/02—Polythioethers
- C08G75/0204—Polyarylenethioethers
- C08G75/0231—Polyarylenethioethers containing chain-terminating or chain-branching agents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
- C08G75/02—Polythioethers
- C08G75/0204—Polyarylenethioethers
- C08G75/0209—Polyarylenethioethers derived from monomers containing one aromatic ring
- C08G75/0213—Polyarylenethioethers derived from monomers containing one aromatic ring containing elements other than carbon, hydrogen or sulfur
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
- C08G75/02—Polythioethers
- C08G75/0204—Polyarylenethioethers
- C08G75/025—Preparatory processes
- C08G75/0254—Preparatory processes using metal sulfides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
- C08G75/02—Polythioethers
- C08G75/0204—Polyarylenethioethers
- C08G75/0277—Post-polymerisation treatment
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
- C08G75/14—Polysulfides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2381/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing sulfur with or without nitrogen, oxygen, or carbon only; Polysulfones; Derivatives of such polymers
- C08J2381/02—Polythioethers; Polythioether-ethers
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Shaping By String And By Release Of Stress In Plastics And The Like (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は耐熱老化性、機械特性、耐熱寸法安定性にすぐ
れた性質を有するポリp−フェニレンスルフィドフィル
ムに関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a poly p-phenylene sulfide film having excellent heat aging resistance, mechanical properties, and heat resistant dimensional stability.
近年の電子、電気機器の技術的進歩および用途拡大は著
しく、電子機器の高性能化、信頼性の向上、小型軽量化
と低価格化が急速に進められている。そのため使用され
るフィルム素材に対する機械的、電気的特性、高度な寸
法安定性などについての要求も次第に厳しくなってきて
いる。現在、耐熱性フィルムとしてポリイミドが使われ
ているが価格の高いこと、耐薬品性の悪いことなどの短
所が多い。又、ポリエチレンテレフタレートフィルムも
使用されている。2. Description of the Related Art In recent years, technological progress and expansion of applications of electronic and electrical devices have been remarkable, and electronic devices are rapidly becoming more sophisticated, more reliable, smaller, lighter, and less expensive. For this reason, the requirements for mechanical, electrical properties, high dimensional stability, etc. for the film materials used are becoming increasingly strict. Currently, polyimide is used as a heat-resistant film, but it has many disadvantages such as high price and poor chemical resistance. Polyethylene terephthalate films have also been used.
このフィルムは低価格であり、機械的、電気的特性なら
びに耐薬品性もすぐれているが、融点が260℃付近と
低いため260℃前後でのハンダ付加工法による電子部
品の実装工程を行うことができず@熱性に問題がある。This film is inexpensive and has excellent mechanical and electrical properties as well as chemical resistance, but its melting point is low at around 260°C, making it difficult to mount electronic components by soldering at around 260°C. I can't do it @There is a problem with heat.
本発明はこれら既存のフィルムの欠点を補い機械的特性
、電気的特性及び耐熱性の各特性にバランスのとれたフ
ィルムを提供せんとするものであり、特に熱時の寸法安
定性に極めてすぐれた特性を有するフィルムを提供する
ものである。The present invention aims to compensate for the shortcomings of these existing films and provide a film with well-balanced mechanical properties, electrical properties, and heat resistance, and in particular, a film with extremely excellent dimensional stability under heat. The present invention provides a film having the following characteristics.
すなわち、本発明は繰返し単位+S+を90モル%以上
含むポリp−フェニレンスルフィドフィルムであって、
そのポリマーの溶液粘度が0.12dl/g以上であり
、かっこのフィルムより縦方向および横方向に中10鶴
、長さ100〜1500に切り出し、270℃で10分
間弛緩状態で熱処理した後、23℃、200%/分の速
度で伸長した時の引張強度、伸度5%時の応力(以下、
F−5値とする)、伸度の各値が該熱処理前のフィルム
を同条件で引張試験したときの引張@炭、F−5値、伸
度の各値と比較し、それぞれ60%以上、80%以上、
80〜120%の保持率を有する2軸配向ポリp−フェ
ニレンスルフィドフィルムを提供するものである。That is, the present invention is a poly p-phenylene sulfide film containing 90 mol% or more of repeating units +S+,
The solution viscosity of the polymer was 0.12 dl/g or more, and the film was cut out into 10-100 mm lengths in the vertical and horizontal directions, and heat treated at 270°C for 10 minutes in a relaxed state. °C, tensile strength when elongated at a rate of 200%/min, stress at 5% elongation (hereinafter referred to as
F-5 value), each value of elongation is 60% or more compared to each value of tensile @ charcoal, F-5 value, and elongation when the film before heat treatment is subjected to a tensile test under the same conditions. , more than 80%,
A biaxially oriented poly p-phenylene sulfide film having a retention rate of 80 to 120% is provided.
は芳香族ジハロゲン化物を硫化して合成する方法、チオ
フェノール塩を脱塩する方法などがある。工業的にはp
−ジクロルベンゼンなどのp〜ジハロベンゼンと硫化ソ
ータラN−メチルピロリドン等のアミド系極性溶媒中で
檜重合反応を行って得る方法が最も好ましい。又、本発
明のフィルムのポリマー成分はその溶液帖壇がα−クロ
ルナフタリンを溶剤として温度206℃、濃度0.4g
/100m7!の時の値が0.12dJ/g以−ヒ、好
ましくは0.12〜1.Odl/gである。このような
溶液粘度のポリフェニレンスルフィド系ポリブーを得る
のに例えば次の3つの方法が挙げられる。There are methods for synthesizing aromatic dihalides by sulfurization, and methods for desalting thiophenol salts. Industrially p
The most preferred method is to carry out a hinoki polymerization reaction in a p-dihalobenzene such as -dichlorobenzene and an amide polar solvent such as sulfurized sortara N-methylpyrrolidone. Further, the polymer component of the film of the present invention is prepared using α-chlornaphthalene as a solvent at a temperature of 206°C and a concentration of 0.4 g.
/100m7! When the value is 0.12 dJ/g or less, preferably 0.12 to 1. Odl/g. For example, the following three methods can be used to obtain a polyphenylene sulfide polybute having such a solution viscosity.
第1には重合時に酢酸リチウム、酢酸ナトリウム、酢酸
カルシウム、安息香酸ナトリウム、安息香酸リチウムな
どのカルボン酸アルカリ金属塩、アルカリ土類金属塩な
どをモノマーの10〜150モル%程度の量を添加して
、生成ポリマーの分子量を上げる方法がある。第2には
重合時にモノマーとしてp−ジクロルベンゼンなどの2
盲部性化合物以外に例えば1,2.4−)ジクロルベン
ゼンを使用しポリマーに多少架橋構造を導入して溶液粘
度を上昇させる方法があり、主として第1の方法と併用
して用いられる。この場合3官能性モノマーの主モノマ
ーに対する混合比は多くとも10モル%以下、好ましく
は1モル%以下であることがこのましい。第3の方法と
しては重合した低熔嫂粘度のポリマーを200℃から融
点以下の温度範囲で空気中にさらすことにより酸化架橋
を促進させ、ポリマーの溶液粘度を上昇する方法がある
。しかし、この方法も第1の方法と併用する場合は好ま
しい場合もあるが、重合11mの溶液粘度があまり低い
ポリマーを拳法で酸化架橋して使用することは本発明に
とって好ましくない。例えば溶液粘度0.10のものを
酸化架橋によって溶液粘度0.30dl/g以上のポリ
マーとして使用してもほとんど延伸できないポリマーと
なる。尚、第2および第3の方法は本発明の原料として
のポリマーに架橋構造を適度に導入する場合には好まし
いが、あまり極端に架橋構造を導入するとポリマーが溶
融時および延伸時にゴム弾性を示すようになり、平面性
の悪いフィルムしか得られなかったり、延伸性が悪くな
ったりして本発明にあるような特性をもつフィルムが得
られなくなる場合が多い。First, during polymerization, a carboxylic acid alkali metal salt or alkaline earth metal salt such as lithium acetate, sodium acetate, calcium acetate, sodium benzoate, or lithium benzoate is added in an amount of about 10 to 150 mol% of the monomer. Therefore, there is a method to increase the molecular weight of the produced polymer. Secondly, 2 such as p-dichlorobenzene is used as a monomer during polymerization.
In addition to the blinding compound, there is a method of increasing the solution viscosity by introducing some crosslinking structure into the polymer using, for example, 1,2,4-)dichlorobenzene, which is mainly used in combination with the first method. In this case, the mixing ratio of the trifunctional monomer to the main monomer is at most 10 mol% or less, preferably 1 mol% or less. A third method is to expose the polymerized low viscosity polymer to air at a temperature ranging from 200° C. to below the melting point to promote oxidative crosslinking and increase the solution viscosity of the polymer. However, although this method may be preferable when used in combination with the first method, it is not preferable for the present invention to use a polymer whose solution viscosity in Polymerization 11m is too low after being oxidized and crosslinked using a fist method. For example, even if a polymer having a solution viscosity of 0.10 is used as a polymer having a solution viscosity of 0.30 dl/g or more by oxidative crosslinking, the polymer becomes almost impossible to stretch. The second and third methods are preferable when a moderate amount of crosslinked structure is introduced into the polymer as a raw material of the present invention, but if the crosslinked structure is introduced too drastically, the polymer exhibits rubber elasticity when melted and stretched. This often results in a film with poor flatness or poor stretchability, making it impossible to obtain a film with the characteristics of the present invention.
本発明を満足するためにはバラフェニレンスルフィト単
位が90モル%以上ポリマー中に存在することが必要で
あフェニル、アルコキシ、スルホン、ハロゲン、カルボ
ン酸、カルボン酸の金属塩などである)、および前述の
3官能フもよい。In order to satisfy the present invention, it is necessary that phenylene sulfite units exist in the polymer in an amount of 90 mol% or more (eg, phenyl, alkoxy, sulfone, halogen, carboxylic acid, metal salt of carboxylic acid, etc.), and The above-mentioned trifunctional compounds may also be used.
本発明の原料として上記のようなポリマーが使用される
が、これに滑剤、酸化防止剤、紫外線吸収剤、可塑剤、
着色剤などの添加剤を混入したり、また本発明の目的を
そこなわない範囲のポリマーや無機の充填剤を調合して
使用することは1向に差しつかえない。The above polymers are used as raw materials for the present invention, and include lubricants, antioxidants, ultraviolet absorbers, plasticizers,
There is no problem in mixing additives such as colorants, or blending and using polymers and inorganic fillers within a range that does not impede the purpose of the present invention.
本発明のフィルムを1造するには、まず上記原料を押出
機、プレス等によりシートまたはフィルム状に成形した
後液体窒素、水、ロール等を使用して急冷することによ
り密度が1.330g/−以下であるほとんど非晶質の
未延伸フ5−
ィルムを得る。未延伸フィルムの結晶化が進行している
と延伸性が低下し、延伸時にフィルムの破断が生じやす
くなる。To make one film of the present invention, the above raw materials are first formed into a sheet or film using an extruder, press, etc., and then rapidly cooled using liquid nitrogen, water, a roll, etc. to a density of 1.330 g/ A nearly amorphous unstretched film having the following properties is obtained. If the crystallization of the unstretched film progresses, the stretchability will decrease and the film will be more likely to break during stretching.
次に延伸を行う。延伸温度はポリマーの分子量や成分に
よって多少の相違はあるが、通常ポリマーのガラス転移
温虐付近が望ましい、具体的には80〜120℃、好ま
しくは90〜110℃である。延伸方法として通常用い
られているロール法、テンター法、チェーブラー法など
による延伸方法が便利である。延伸倍率は得られるフィ
ルムの物性および生産性から見て2.5〜7倍、好まし
くは2.5〜6倍とするのがよ(、同時2軸延伸或いは
逐決延伸のどちらを用いてもよい。Next, stretching is performed. Although the stretching temperature varies somewhat depending on the molecular weight and components of the polymer, it is usually desirable to be near the glass transition temperature of the polymer, specifically 80 to 120°C, preferably 90 to 110°C. As a stretching method, a commonly used stretching method such as a roll method, a tenter method, or a Chevler method is convenient. The stretching ratio should be 2.5 to 7 times, preferably 2.5 to 6 times, in view of the physical properties and productivity of the resulting film (regardless of whether simultaneous biaxial stretching or sequential stretching is used). good.
このようにして2軸延伸されたフィルムは密度を上昇さ
せ寸法安定性、耐熱性、機械強度などを向上させるため
、特に本発明のフィルムが必須に保有すべき機械特性を
満足させるために熱処理を行い、結晶化させる必要があ
る。熱処理条件としては融点(↑−以上350℃以下、
好ましくは111〜340℃の温度[1F+で120秒
以下の時間で緊張下に行う必要がある。この熱処理によ
り耐熱性、寸法安定性に優れたポリp−フェニレンスル
フィドフィルムが得られる。ここで融点(Ts+)は2
軸延伸直後のフィルムのDSC(示差走査熱量針)によ
り得られた融点である。この際6−
350℃を越える熱処理温度では熱処理時間を短くして
もフィルムが溶融状態になりフィルムの形状を保つこと
ができなくなる。T−〜350℃の温度範囲であれば1
20秒以内で熱処理時間を適度に調整することによりフ
ィルムが溶融状態にならず熱固定ができる。In order to increase the density of the biaxially stretched film and improve its dimensional stability, heat resistance, mechanical strength, etc., heat treatment is particularly necessary to satisfy the mechanical properties that the film of the present invention must have. and crystallize it. Heat treatment conditions include melting point (↑-350℃ or lower,
Preferably, it is necessary to carry out the process at a temperature of 111 to 340°C [1F+, under tension, for a time of 120 seconds or less. This heat treatment yields a poly p-phenylene sulfide film with excellent heat resistance and dimensional stability. Here, the melting point (Ts+) is 2
This is the melting point obtained by DSC (differential scanning calorimetry) of the film immediately after axial stretching. At this time, if the heat treatment temperature exceeds 6-350 DEG C., the film becomes molten and cannot maintain its shape even if the heat treatment time is shortened. 1 if the temperature range is T-~350℃
By appropriately adjusting the heat treatment time to within 20 seconds, the film can be heat-set without becoming molten.
本発明のフィルムを得るにあたって必要に応じて上述の
如き熱処理工程の前後に150〜3′JO℃の温度範囲
で、好ましくは200〜340℃の温度範囲で一方向あ
るいは二方向に25%以内、好ましくは15%以内の制
限収縮もしくは伸長または定長下、10分以内の時間内
で適度にフィルムを処理することにより、熱収縮を小さ
くし加熱下における寸法安定性を向−ヒさせることもで
きる。In order to obtain the film of the present invention, if necessary, before and after the above-mentioned heat treatment process, within a temperature range of 150 to 3'JO °C, preferably 200 to 340 °C, within 25% in one direction or two directions, Heat shrinkage can be reduced and dimensional stability under heating can be improved by appropriately treating the film under limited shrinkage or elongation or constant length, preferably within 15%, within 10 minutes. .
上記熱処理は加熱された気体、液体あるいは固体と熱処
理前のフィルムとを接触させることによって行われる。The above heat treatment is performed by bringing a heated gas, liquid, or solid into contact with the film before heat treatment.
又、赤外線ヒーターなどのような輻射、超音波もしくは
高周波の照射を利用することもできる。本発明における
熱処理のra度」および「時間」とは媒体使用の場合に
は加熱媒体の温度および加熱媒体への接触時間のことで
あり、又、赤外線ヒーター、超音波、高周波使用の場合
にはフィルム温度および処理時間である。It is also possible to use radiation such as an infrared heater, ultrasonic waves, or high frequency irradiation. In the present invention, the "ra degree" and "time" of heat treatment refer to the temperature of the heating medium and the contact time to the heating medium in the case of using a medium, and in the case of using an infrared heater, ultrasonic wave, or high frequency, film temperature and processing time.
実用的な意味での耐熱性というのは種々の意味を有して
いるが、最も重要なものの一つに、ハンダ浸漬時の寸法
安定性がある。電子あるいは電気部品を11!l′mに
実装する方法としては、ハンダ付けが最も一般的な方法
である。このハンダ付工程の際、寸法変化が起る材料で
は精密な寸法精隋を要する電子、電気機器に用いること
ができないのである。Heat resistance in a practical sense has various meanings, but one of the most important is dimensional stability during solder immersion. 11 electronic or electrical parts! Soldering is the most common method for mounting l'm. Materials whose dimensions change during the soldering process cannot be used in electronic or electrical equipment that requires precise dimensional control.
本発明者らはこのハンダ浸漬時の寸法安定性を良好にす
るために各種組成のポリマー、フィルム製造条件および
最終フィルムの寸法安定性の関係について詳細に検討し
た。In order to improve the dimensional stability during solder immersion, the present inventors conducted detailed studies on the relationship between polymers of various compositions, film manufacturing conditions, and the dimensional stability of the final film.
その結果、270℃、10分間弛緩状態で熱処理したフ
ィルムの強伸度保持率がある一定の値以上となる本発明
のフィルムは特異的に優れたハンダ浸漬時における寸法
安定性を示している。すなわち、本発明のフィルムはそ
の縦方向および横方向に巾10tI、長さ100”15
0mに切り出し、270℃で10分間弛緩状態で熱処理
した後、23℃、200%/分の速度で伸長した時の引
張強度、F−5値、伸度の各値が該熱処理前のフィルム
を前記条件で伸長したときの引張強度、F−5値、伸度
の各値に対してそれぞれ60%以上、80%以上、80
〜120%、好ましくはそれぞれ60〜110%、80
〜110%、90〜120%の保持率を有することによ
りすぐれたハンダ浸漬時における寸法安定性を示す。As a result, the film of the present invention, in which the strength and elongation retention of the film heat-treated at 270°C for 10 minutes in a relaxed state, is a certain value or more, exhibits uniquely excellent dimensional stability when immersed in solder. That is, the film of the present invention has a width of 10tI and a length of 100"15 in the longitudinal and transverse directions.
The tensile strength, F-5 value, and elongation values when the film was cut out to 0 m, heat-treated at 270°C for 10 minutes in a relaxed state, and then stretched at 23°C at a rate of 200%/min were as follows: 60% or more, 80% or more, and 80% of each value of tensile strength, F-5 value, and elongation when stretched under the above conditions, respectively.
~120%, preferably 60-110%, 80% respectively
By having retention rates of ~110% and 90-120%, it shows excellent dimensional stability during solder immersion.
このような機械特性を有するポリp−フェニレンスルフ
ィドフィルムの製造法は前述の通りであるが、特に延伸
温度、延伸倍率などの延伸条件とともに結晶化のための
熱処理条件が重要である。最適処理条件はポリマーの組
成により若干翼なってくるが、+S−なる繰返し単位を
90モル%以上含むポリマー、あるいはこれを主成分と
して少量の添加剤、ブレンドポリマーを含有するポリマ
ー組成物を原料として前述の如き製造条件により得た本
発明に示す機械特性を有するフィルムは優れたハンダ耐
熱性を示す。The method for producing a poly p-phenylene sulfide film having such mechanical properties is as described above, but stretching conditions such as stretching temperature and stretching ratio as well as heat treatment conditions for crystallization are particularly important. The optimal processing conditions vary slightly depending on the composition of the polymer, but it is possible to use a polymer containing 90 mol% or more of +S- repeating units, or a polymer composition containing this as the main component and a small amount of additives or a blend polymer as a raw material. A film having the mechanical properties shown in the present invention obtained under the above manufacturing conditions exhibits excellent soldering heat resistance.
本発明のフィルムは優れた・1ンダ耐熱性を有している
が、長期耐熱性にも優れF−4を合格(IEcIl格p
ub86)の耐熱フィルムとして使用可能である。The film of the present invention has excellent 1-da heat resistance, and also has excellent long-term heat resistance, passing F-4 (IEcIl rating P).
It can be used as a heat-resistant film for ub86).
本発明のフィルムは電気絶縁用フィルムとして最適であ
る。例えばフレキシブルプリント配線用ベースフィルム
;車両用モーター、冷凍機用モーター、発電機などの各
11回転機あるいは各種酢1に機などの絶縁材料として
、また一般ケーブル、高圧、超高圧ケーブルの被覆用絶
縁材料;磁気テープ用ベースフィルム:コンデン号−フ
ィルムとして有用である。また乾式および油浸式トラン
スの絶縁材料としても適している。更に、電気絶縁材料
以外でも、プロセッシングの工程で高温にさらされ、か
つ寸法安定性を要求される複写用フィルム、トレーシン
グ用フィルム、高温で調理する際の食品包装材などにも
使われる。その他装飾用、建材用、写真用フィルム、磁
気ディスク用ベースやスビー9−
カーの振動板などの音響用途、電池の隔膜、ホットスタ
ンピングのベース材などにも有用である。また他のフィ
ルムとのラミネート、金属や紙などとの組合せによる複
合材としての使用も可能である。The film of the present invention is most suitable as an electrically insulating film. For example, a base film for flexible printed wiring; as an insulating material for 11-rotation machines such as vehicle motors, refrigerator motors, and generators, or various vinegar machines, and as insulation for covering general cables, high voltage, and ultra-high voltage cables. Material: Base film for magnetic tape: Useful as a Condensation film. It is also suitable as an insulating material for dry type and oil-immersed transformers. Furthermore, in addition to electrical insulating materials, it is also used in copying films, tracing films, and food packaging materials used in high-temperature cooking, which are exposed to high temperatures during processing and require dimensional stability. It is also useful for decorative purposes, building materials, photographic films, acoustic uses such as bases for magnetic disks and diaphragms for 9-cars, diaphragms for batteries, and base materials for hot stamping. It is also possible to use it as a composite material by laminating it with other films or combining it with metals, paper, etc.
以下に実施例により本発明を説明する。The present invention will be explained below with reference to Examples.
なお、実施例中の引張試験は、次の条件で行った。In addition, the tensile test in Examples was conducted under the following conditions.
縦方向および横方向に中10mm、長さ100〜150
mに切り出し、23℃の測定温度で200%/分の速度
で伸長した。Medium 10mm in vertical and horizontal directions, length 100-150
The sample was cut out to a length of 1.5 m, and elongated at a measurement temperature of 23° C. at a rate of 200%/min.
実施例1
51オートクレーブにN−メチルピロリドン1.8 k
gと硫化ナトリウム 2.7水塩0.5 kgおよび安
息香酸ナトリウト0、6 b、水酸化ナトリウム1.6
gを仕込み、窒稟雰囲気下で200℃まで約2時間かけ
て攪拌しながら徐々に昇温し5.105m1の水を留出
させた0反応系を170℃に冷却した後、p−ジクロル
ベンゼン0.6 kgとN−メチルピロリドン0.4
kgを加え、220℃で2時間、次いで250℃で3時
間反応させた。重合終了時の内圧は6.7kr/cia
であった。Example 1 1.8 k of N-methylpyrrolidone in a 51 autoclave
g and sodium sulfide 2.7 hydrate 0.5 kg and sodium benzoate 0.6 b, sodium hydroxide 1.6
After cooling the reaction system to 170°C, the temperature was gradually raised to 200°C under nitrogen atmosphere with stirring for about 2 hours, and 5.105ml of water was distilled out. 0.6 kg of benzene and 0.4 kg of N-methylpyrrolidone
kg was added and reacted at 220°C for 2 hours and then at 250°C for 3 hours. Internal pressure at the end of polymerization is 6.7kr/cia
Met.
反応系を冷却後、内容物を濾別し、固形分を熱水で31
1!I、さらにアセトンで2回洗浄した後、120℃で
3時間乾燥させ、灰色状、粒状のポリマーを得た。この
ポリマーの溶液粘度をα−クロルナフタリンを用いて、
温度206℃、10−
濃度0.4g/100m1で測定したところ0.29d
l/gであった。After cooling the reaction system, the contents were separated by filtration, and the solid content was evaporated with hot water.
1! After washing twice with acetone and drying at 120° C. for 3 hours, a gray, granular polymer was obtained. The solution viscosity of this polymer was determined using α-chlornaphthalene.
When measured at a temperature of 206℃ and a 10-concentration of 0.4g/100ml, it was 0.29d.
It was l/g.
このポリマーを310℃でプレス1lllll&、水中
に入れて急冷し、透明な厚さ400ミクロンの未延伸シ
ートを得た。This polymer was pressed at 310°C and quenched in water to obtain a transparent unstretched sheet with a thickness of 400 microns.
このシートの密度は1.321g/−であり、はとんど
非晶質であった。このシートのガラス転移温度をDSC
を用いて昇温速度10℃/分で測定したところ90℃で
あった。この非品性未延伸シートを94℃で3.5 X
3.5倍の同時2軸延伸を行いフィルムを得た。この
フィルムのT−を昇温速度10℃/分でDSCで測定し
たところ285℃であった。このフィルムを295℃で
20秒間定長下で熱固定し、次いで250℃で20秒間
、収縮率5%の弛緩処理を行った。The density of this sheet was 1.321 g/- and was mostly amorphous. The glass transition temperature of this sheet was determined by DSC.
The temperature was 90°C when measured using a heating rate of 10°C/min. This unstretched sheet was heated to 3.5× at 94°C.
A film was obtained by simultaneous biaxial stretching of 3.5 times. The T- of this film was measured by DSC at a heating rate of 10°C/min and found to be 285°C. This film was heat-set at 295° C. for 20 seconds at a constant length, and then subjected to relaxation treatment at 250° C. for 20 seconds with a shrinkage rate of 5%.
最終フィルムの厚みは33ミクロンであった。また密度
は1.366g/−であった。The final film thickness was 33 microns. Moreover, the density was 1.366 g/-.
このフィルムの引張特性は次の通りであった。The tensile properties of this film were as follows.
引張搾度(縦/横) :23/22 (睦/J)F
−5411(縦/横) : 11 / 11 (k
g/w)伸 度 (縦/411) :62/63
(%)このフィルムを270℃の雰囲気下で10分
間弛緩状態で放置した後、前と間挿に引張特性を測定し
、その保持率を求めたところ次の通りであった。Tensile squeeze (vertical/horizontal): 23/22 (Mutsu/J)F
-5411 (vertical/horizontal): 11/11 (k
g/w) Elongation (length/411): 62/63
(%) After this film was left in a relaxed state for 10 minutes in an atmosphere of 270° C., the tensile properties were measured before and after insertion, and the retention rate was determined as follows.
引張強度保持率(縦/横) :85/83 (94)
F−5被保持率(1/劃: 91/90 (!1()伸
度保持率 (縦/横) :110/112 (%)
また270℃の雰囲気下で10分間弛緩状態で放置する
前のフィルムの熱収縮率、ハンダ耐熱性を測定したとこ
ろ表−1の通りであった。Tensile strength retention rate (vertical/horizontal): 85/83 (94)
F-5 retention rate (1/height: 91/90 (!1()) Elongation retention rate (vertical/horizontal): 110/112 (%)
Further, the heat shrinkage rate and solder heat resistance of the film were measured before being left in a relaxed state for 10 minutes in an atmosphere of 270°C, and the results were as shown in Table 1.
表 1
このフィルムは加熱時の寸法安定性が非常にすぐれてお
り、フレキシブルプリント配線板のベースフィルムとし
て有用である。Table 1 This film has excellent dimensional stability during heating and is useful as a base film for flexible printed wiring boards.
比較例1
実施例1で使用した鵡固定前のフィルムを250℃で2
0秒間定長下で熱固定し、次いで同温賓720秒間収縮
率5%の弛緩処理を行った。このフィルムの引張物性は
次の通りであった。Comparative Example 1 The film used in Example 1 before the cormorant fixation was heated at 250°C for 2 hours.
It was heat-set at a constant length for 0 seconds, and then relaxed at the same temperature for 720 seconds at a shrinkage rate of 5%. The tensile properties of this film were as follows.
引張強度(縦/横>10/22 (瞼/i>F−5値(
縦/横) : 10 / 10 (kJr/#)伸
度(縦/横):6]15B (%)このフィルムを
270℃の雰囲気下で10分間弛緩状態で放置した後、
前と同様に引張特性を測定し、その保持率を求めたとこ
ろ次の通りであった。Tensile strength (length/width>10/22 (eyelid/i>F-5 value (
Vertical/Horizontal): 10/10 (kJr/#) extension
Degree (vertical/horizontal): 6] 15B (%) After leaving this film in a relaxed state for 10 minutes in an atmosphere of 270°C,
The tensile properties were measured in the same manner as before, and the retention rates were determined as follows.
引張強度保持率(1/横):47151 (%)F−
51保持1 ([/横) : 73/75 (%)伸
度保持率 (*/横): 131/125 (%)ま
た、270℃の雰囲気下で10分間弛緩状態で放置する
前のフィルムの熱収縮率、ハンダ耐熱性を測定したとこ
ろ表−2の通りであった。Tensile strength retention rate (1/horizontal): 47151 (%) F-
51 retention 1 ([/horizontal): 73/75 (%) Elongation retention (*/horizontal): 131/125 (%) Also, the film before being left in a relaxed state for 10 minutes in an atmosphere of 270°C The heat shrinkage rate and solder heat resistance were measured and were as shown in Table 2.
表 2
13−
実施例2
七ツマ−としてp−ジクロルベンゼン585g、1,2
゜4−トリクロルベンゼン2.1 gを使用する以外は
実開1と同様な条件で重合を行い、灰白色、粒状のポリ
マーを得た。このポリマーの溶液粘度を実施例】と同様
な条件で測定したところ0.42a/gであった。Table 2 13- Example 2 585 g of p-dichlorobenzene as 7-mer, 1,2
Polymerization was carried out under the same conditions as in Utility Model Application No. 1, except that 2.1 g of 4-trichlorobenzene was used, and a gray-white, granular polymer was obtained. The solution viscosity of this polymer was measured under the same conditions as in Example and found to be 0.42 a/g.
このポリマーを310℃でプレス製膜後、水中に入れて
急冷し透明な厚さ400ミクロンの未延伸シートを得た
。This polymer was formed into a film by pressing at 310°C, and then quenched in water to obtain a transparent unstretched sheet with a thickness of 400 microns.
このシートの密度を測定したところ]、322g/cd
であり、はとんど非晶質であった。このシートのガラス
転移温度を実施例1と同様に測定したところ91℃であ
った。この非品性未延伸シートを決95℃で、3.5
X 3.5倍の同時2軸延伸を行いフィルムを得た。こ
のフィルムのT11を実施例1と同様に測定したところ
279℃であった。このフィルムを305℃で20秒間
定長下で熱固定し、次いで260℃で15秒間、収縮率
5%の弛緩処理を行った。最終dフィルムの厚みは約3
3ミクロンであり、密度は1.364g/−であった。The density of this sheet was measured], 322 g/cd
and was mostly amorphous. The glass transition temperature of this sheet was measured in the same manner as in Example 1 and was found to be 91°C. This unstretched sheet was heated to 3.5°C at 95°C.
A film was obtained by simultaneous biaxial stretching of 3.5 times. The T11 of this film was measured in the same manner as in Example 1 and was found to be 279°C. This film was heat-set at 305° C. for 20 seconds at a constant length, and then subjected to relaxation treatment at 260° C. for 15 seconds with a shrinkage rate of 5%. The thickness of the final d film is approximately 3
3 microns, and the density was 1.364 g/-.
このフィルムの引張特性の結果を以下に示す。The results of the tensile properties of this film are shown below.
引41強度(1/横) : I 9 / 20 (k
g/ l1m1)F−5値(1/横) : 10 /
10 (kit/ w’)伸 度(縦/横):58
157 (%)このフィルムを270℃の雰囲気下でl
O分間弛緩状態14−
で放置した後、同様に引張特性を測定してその保持率を
求めたところ次の通りであった。Pull 41 strength (1/horizontal): I 9/20 (k
g/l1m1) F-5 value (1/horizontal): 10/
10 (kit/w') Elongation (vertical/horizontal): 58
157 (%) This film was heated in an atmosphere of 270°C.
After being left in the relaxed state for 0 minutes, the tensile properties were measured in the same manner and the retention rate was determined as follows.
引張強度保持率(縦/横):86/85 (%)F−5
値保持率(*/411) : 95/93 (%)伸
度保持率 (vl/横) : 109/111
(%)また、270℃の雰囲気下で10分間弛緩状態で
放置する前のフィルムの熱収縮率、ハンダ耐熱性を測定
したところ、250℃での熱収縮率は0.6%であり、
又260℃、30秒のハンダ浸漬による一方向の収縮率
は0.7%であり、本発明のフィルムは加熱時の寸法安
定性が非常にすぐれていることが判明した。Tensile strength retention rate (vertical/horizontal): 86/85 (%) F-5
Value retention rate (*/411): 95/93 (%) Elongation retention rate (vl/horizontal): 109/111
(%) Also, when we measured the heat shrinkage rate and solder heat resistance of the film before leaving it in a relaxed state for 10 minutes in an atmosphere at 270°C, the heat shrinkage rate at 250°C was 0.6%.
Furthermore, the shrinkage rate in one direction after immersion in solder at 260° C. for 30 seconds was 0.7%, indicating that the film of the present invention has excellent dimensional stability during heating.
比1!2例2
実施例2で使用した熱固定前のフィルムを240℃で2
0秒間定長下で熱固定し、次いで250℃で15秒間収
縮亭5%の弛緩処理を行った。このフィルムの密崖は1
.348g/−であった、このフィルムの引張特性の結
果は次の通りである。Ratio 1!2 Example 2 The film used in Example 2 before heat setting was heated to 240°C.
It was heat-set for 0 seconds at a constant length, and then subjected to a relaxation treatment of 5% shrinkage at 250° C. for 15 seconds. The cliff in this film is 1
.. The results of the tensile properties of this film were 348 g/-.
引張強度(1/横) : 17 / + 8 (kg
/町)F−5値(縦/横) : 10 / 10 (k
g/j)伸 度(N/横):51/49(%)このフ
ィルムを270℃の雰囲気下で10分間弛緩状態で放置
した後、同様に引張特性を測定し、その保持率を求めた
ところ次の通りであった。Tensile strength (1/horizontal): 17/+8 (kg
/ town) F-5 value (vertical/horizontal): 10 / 10 (k
g/j) Elongation (N/lateral): 51/49 (%) After this film was left in a relaxed state for 10 minutes in an atmosphere at 270°C, the tensile properties were similarly measured and the retention rate was determined. The situation was as follows.
引張強度保持率(縦/横):53151 (%)F−
5値保持率(縦/横):15/14 (%)伸度保持
率 (l/横) =131/135 (%)また、
270℃の雰囲気下で10分間弛緩状態で放置する前の
フィルムの熱収縮率、ハンダ耐熱性を測定したところ、
250℃での熱収縮率は9.3%であり、又260℃、
30秒のハンダ浸漬による一方向の収縮率は11%であ
り、フィルムにしわが発生した。このフィルムは加熱時
のす法安定性が悪く、ハンダ処理を行うフレキシブルプ
リント配線板としては不向きであった。Tensile strength retention rate (vertical/horizontal): 53151 (%) F-
Five-value retention rate (length/width): 15/14 (%) Elongation retention rate (l/width) = 131/135 (%)
The heat shrinkage rate and solder heat resistance of the film were measured before being left in a relaxed state for 10 minutes in an atmosphere of 270°C.
The heat shrinkage rate at 250°C is 9.3%, and at 260°C,
The shrinkage rate in one direction after 30 seconds of solder immersion was 11%, and wrinkles occurred in the film. This film had poor thermal stability during heating and was unsuitable for use as a flexible printed wiring board that undergoes soldering.
Claims (1)
レンスルフィドフィルムであって、そのポリマーの溶液
粘度が0.11//g以上であり、かっこのフィルムよ
り縦方向および横方向に中10m、長さ100〜150
m5に切り出し、270℃で10分間弛緩状態で熱処理
した後、23℃、200%/分の速度で伸長した時の引
張強度、伸度5%時の応力、伸度の各値が該熱処理前の
フィルムを前記条件で伸長した時の引張強度、伸度5%
時の応力、伸度の各値と比較し、それぞれ60に以上、
80%以−F、80〜120%の保持率を有することを
特徴とする2軸配向ポリp−フェニレンスルフィドフィ
ルム。A poly p-phenylene sulfide film containing 90 mol% or more of repeating units +S+, the solution viscosity of the polymer is 0.11//g or more, and a length of 10 m in the vertical and horizontal directions from the parenthesized film. 100-150
The tensile strength, stress at 5% elongation, and elongation values before the heat treatment when cut into 5 mm length, heat treated at 270°C for 10 minutes in a relaxed state, and then elongated at 23°C at a rate of 200%/min. Tensile strength and elongation of 5% when the film is stretched under the above conditions
Comparing the stress and elongation values at 60 and above, respectively,
A biaxially oriented poly p-phenylene sulfide film having a retention rate of 80% or more and 80 to 120%.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57085293A JPS58201617A (en) | 1982-05-20 | 1982-05-20 | Polyp-phenylenesulfide film |
US06/816,312 US4629778A (en) | 1982-05-20 | 1986-01-06 | Poly(p-phenylene sulfide) film and process for production thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57085293A JPS58201617A (en) | 1982-05-20 | 1982-05-20 | Polyp-phenylenesulfide film |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58201617A true JPS58201617A (en) | 1983-11-24 |
JPH044133B2 JPH044133B2 (en) | 1992-01-27 |
Family
ID=13854529
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57085293A Granted JPS58201617A (en) | 1982-05-20 | 1982-05-20 | Polyp-phenylenesulfide film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58201617A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60255978A (en) * | 1984-06-01 | 1985-12-17 | Toray Ind Inc | Metallized film |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54142275A (en) * | 1978-04-28 | 1979-11-06 | Toray Ind Inc | Transparent biaxially oriented poly-p-phenylene sulfide film |
JPS5662127A (en) * | 1979-10-26 | 1981-05-27 | Toray Ind Inc | Poly-p-phenylene sulfide film |
JPS5662128A (en) * | 1979-10-26 | 1981-05-27 | Toray Ind Inc | Preparation of poly-p-phenylene sulfide film |
-
1982
- 1982-05-20 JP JP57085293A patent/JPS58201617A/en active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54142275A (en) * | 1978-04-28 | 1979-11-06 | Toray Ind Inc | Transparent biaxially oriented poly-p-phenylene sulfide film |
JPS5662127A (en) * | 1979-10-26 | 1981-05-27 | Toray Ind Inc | Poly-p-phenylene sulfide film |
JPS5662128A (en) * | 1979-10-26 | 1981-05-27 | Toray Ind Inc | Preparation of poly-p-phenylene sulfide film |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60255978A (en) * | 1984-06-01 | 1985-12-17 | Toray Ind Inc | Metallized film |
JPH0585636B2 (en) * | 1984-06-01 | 1993-12-08 | Toray Industries |
Also Published As
Publication number | Publication date |
---|---|
JPH044133B2 (en) | 1992-01-27 |
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JPS63260121A (en) | Capacitor | |
JPH0523939B2 (en) | ||
JPS6340811B2 (en) | ||
JPH022409B2 (en) |