JPS58199619A - Manufacture of thin metallic film - Google Patents

Abstract

PURPOSE:To manufacture an extremely thin metallic film, by forming a metallic film on an organic polymer film by a physical depositing method, and thereafter, melting the film. CONSTITUTION:A thin metallic film is formed by depositing metallic particles on an organic polymer film under vacuum by a physical depositing method such as a vacuum vapor-depositing method, an ion plating method, a sputtering method, etc. Subsequently, the polymer film is dissolved by use of a suitable solvent, and an extremely thin metallic film of about 0.02-10mu is manufactured.

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing thin metal films. Furthermore, −shi< is
A new method for producing extremely thin metal films with a thickness of 0.02 nm to 1 O1 is proposed.

The manufacturing methods for metal thin films include extrusion, pressing, and hammering III.
The usual method is to stretch the gold ingot into a thin layer using a method such as making. However, the metal thin films obtained by these methods are usually thicker than the thickness of the metal thin film E.
As for gold, silver, edge, full quaternium, especially ductile g
There was only one thing that could be obtained other than metals. Even with these metals, in order to reduce the thickness to several 10j or less, special methods such as sheet metal forming had to be used. However, the thickness of the thin films produced by these methods is not uniform, and the metal thin films may break during the sheet metal processing process, making it impossible to obtain large-area metal thin films.

Moreover, it was not possible to obtain an ai-lower metal thin film using any of these methods in which the metal mass was stretched thinly as a point of eruption. A truly special method for obtaining a thin film is to form a thin metal film on a plastic film using a physical deposition method such as 9-layer deposition, and then mechanically deposit it on the plastic film.
There is a way. Even az, K on polynisnal film
A Ti thin IF can be obtained by applying Ti to a thickness of several tons and then peeling it off from a polyester film, or by forming a Ti thin IF on a polymer film. Stamping foil, etc., which is transferred onto an object by pouring adhesive onto it, is well known.

However, these methods require the metal film to be peeled off from the polymer film once it has formed, so the metal must be adhesive to the polymer film, or the KA molecule film must be prepared in some way in advance to make it removable. It was necessary to perform treatments, such as coating with a release layer.

As a result of intensive research to solve the drawbacks of these metal thin film manufacturing methods, the inventors arrived at the following findings. That is, one aspect of the present invention is a method for producing a metal thin film, which is characterized in that metal III is formed on an aiso polymer film by an in-situ deposition method, and then the coated organic polymer film is dissolved.

The polymeric film referred to in the present invention is one on which a metal film is formed by an in-situ deposition method, and it may be of a specific type. Examples of am bird molecule films are polyethylene terephthalate, polyimide, boria 1, polypropylene, polycarbonate, polysulfone, and polyethylene.

) Su7 acetate, vinyl chloride, polystyrene.

Films include polyvinyl alcohol, hydrochloric acid rubber film, and nylon. In order for the MONORU deposition method to be operational, it is necessary that there is little gas release in vacuum and that it is resistant to heat.
Polyester, polypropylene, polycarbonate, and nylon films are usually preferred. Also, from a - point of view, these films need to be able to be dissolved in a specific III agent, and need not be susceptible to metal thinning. - All metals, such as KM, are stable in the organic solvent used to form a film. Film and IIIa#)lffi
An example of the combination is 1llK, where the combination of the film and #I#L (is determined by these Ktil), but not the combination of the film and #I#L.
Needless to say, it may be a modified weaving material.

Table 1 Films and Solvents There may also be no need to prepare the film completely. In other words, the film swells due to #I cutting.
1) It is extremely difficult to peel off m14m from a K film (41J), so when using a relatively thick film like this, it is difficult to peel off the bulge like this when using a relatively thick film. ρ−.

Among the films that meet the above condition t, polyester films are preferred in 11 and 4h.

The physical deposition method used in the present invention is a vacuum island layer method.

A method of depositing metal particles on a substrate under a vacuum of 10 Torr or less to form a metal thin film, such as the ion punching method and the sputtering method. The thickness can be adjusted to any desired thickness after 9 hours or the like. Generally, metals have a thickness of several 11 μm to 100 μm. l! −
However, when the film that is the support for the thin metal film is melted, if the thickness of the gold metal is too thin, the continuity will be disrupted, and the thickness must be greater than 100%. ji obtained by this method! What about IJI11-? Due to its weak A degree, it is difficult for single AlC to maintain its skin shape, and the support and body of the m-shaped body suspended in the sapon on #4L, a 6.4-molecular film, is the supporting substrate. You will need to put it on top or use a metal rod to scoop it out. Gold 1111111
1. In a certain form of yangdu, for example, as a thin strip, c.
In order to achieve this, it is necessary to increase the metal film thickness by t, which is several thousand micrometers or more.

The metal thin film that can be produced by this method may be of any material as long as it can be formed on a single molecule film by an in-situ deposition method, or it may be an alloy of two or more types, or it may be formed as a continuous film. If it is to be used, it should be formed on the film.
Furthermore, it is clear that the present method can be applied even if the base material is not a film shape.

The present invention will be explained below based on embodiments.

Example 1 2S? A rhinoceros KCog4t of about 5 GOOA was formed on a rhinoceros polyester film by half-tone sputtering method. The sputtering conditions are Ar gas pressure 2x1o.
Torr, Sputter J ME 1 (100A/
It's a minute. Co- was strongly adhered to the polyester film, and the bending of @10- was repeated, and although cracks were formed on the Co11Ia surface of -C, it did not peel off.

This film was immersed in Ortsk pμ phenol for 3 hours.
L, 500 um thick Co by melting polyester film
A thin film was obtained.

Tetraori Example 2 On a polyester film having a thickness of 12 μm, a layer of about 2 s'1) was formed by magnetron sputtering at a speed of about 2.1:7 minutes. This film k) 1 1 combination of Taffresol and hexachloroethane KIIIL, polyester film 41' was dissolved and obtained.

Mouku f11 ÷ 5.61 Polynis 1 Le Film K N1j'eM.

(Ni near 1vt%, Fa: 18wt% + Mu:
A 4yL%'1 film was formed to a thickness of about 0.6 μm by t sputtering.

To that 1 IkWc film, 1,000 full: 4-1 was used with Rubble Panol, #mL, NiF@Maillk. f
iNiFaM.

A thin film magnetic head was fabricated by easily slitting it to a width of 100 yen and sticking it onto the ceramic with Km adhesive.

The obtained material exhibited good magnetic properties as a head material, with no stress exerted by the substrate and no trace magnetic anisotropy.

Patent applicant Teijin Ltd.

Claims (1)

[Claims] L: Forming a metal film on an organic molecular film by a physical deposition method and then dissolving the organic polymer film to obtain a metal thin film. 4+- Production of a replacement image and a metal thin film. Law. 1 Claim Ii where the organic molecular film is Boriesua refilm! ! Imitation method of spinal cord 1st term 1st term 1.