JPS58198841A - Focal point regulation device of stereoscopic scanning type electron microscope - Google Patents
Focal point regulation device of stereoscopic scanning type electron microscopeInfo
- Publication number
- JPS58198841A JPS58198841A JP8141582A JP8141582A JPS58198841A JP S58198841 A JPS58198841 A JP S58198841A JP 8141582 A JP8141582 A JP 8141582A JP 8141582 A JP8141582 A JP 8141582A JP S58198841 A JPS58198841 A JP S58198841A
- Authority
- JP
- Japan
- Prior art keywords
- scanning
- focal point
- electron beam
- signal generator
- sample
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/21—Means for adjusting the focus
Abstract
Description
【発明の詳細な説明】
本発明は、立体走査型電子顕微鋼において、大きな立体
角で像観察した際に生じる焦点ずれ全補正する装置に関
するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a device for completely correcting defocus that occurs when an image is observed at a large solid angle in a stereoscopic scanning electron microscope.
従来の立体走査型電子顕微鋼において、特定の2方向に
電子線を傾斜路せた際に生じる焦点ずれは、再焦点合わ
せ全行なって除去されている。In conventional stereoscopic scanning electron microscopy, defocusing that occurs when an electron beam is tilted in two specific directions is removed by completely refocusing.
しかし、立体角を大きくしていくと、走査時にも定食点
に対応して焦点ずれが生じてくるが、この焦点ずれは除
去できなかった。したがって、高分解能観察ができなか
った。However, as the solid angle increases, a focus shift occurs corresponding to the fixed point even during scanning, but this focus shift cannot be removed. Therefore, high-resolution observation was not possible.
本発明の目的は、試料像の立体観察時に生じる電子線の
走査位置に依存する焦点ずれ會取り除き大きな立体角で
も高分解能を有する像を得る焦点補正装置の提供にある
。SUMMARY OF THE INVENTION An object of the present invention is to provide a focus correction device that eliminates defocusing depending on the scanning position of an electron beam that occurs during three-dimensional observation of a sample image, and obtains an image with high resolution even at a large solid angle.
本発明の補正装置は、偏向収差理論より導いたものであ
る。偏向器には、立体観察用に2方向に電子線を傾むけ
る偏向器と、像観察用の走査用偏向器とがある。前者は
、試料面の垂線に対して角度上t(=t、+itア)だ
け傾斜式せるもので、+1.−1時に走査用偏向器によ
り電子線は試料面上全2次元走査(任意の走査点f c
= x + i yとする)され、像観察がな芒れる
。このときの焦点ずれ量(ΔZ)は、収差論より次式と
なる。The correction device of the present invention is derived from deflection aberration theory. The deflector includes a deflector that tilts an electron beam in two directions for stereoscopic observation, and a scanning deflector for image observation. The former is tilted by an angle t (=t, +ita) with respect to the perpendicular to the sample surface, which is +1. At -1, the scanning deflector scans the electron beam over the sample surface in all two dimensions (any scanning point f c
= x + i y), and the image observation can be done. The amount of defocus (ΔZ) at this time is expressed by the following equation based on aberration theory.
ΔZ”KF IICC+LrCt+xyCt+kr t
t・・・・・・・・・・・・(1)
ここで、Kr、kyはそれぞれ走査用偏向器、立体観察
用の傾斜用偏向器それぞれ単独での像面彎曲収差係数で
あり、XFは両者の偏向器の複合動作詩に生じる像面彎
曲収差係数である。ΔZ”KF IICC+LrCt+xyCt+kr t
t・・・・・・・・・・・・(1) Here, Kr and ky are the field curvature aberration coefficients of the scanning deflector and the tilting deflector for stereoscopic observation, respectively, and is the field curvature aberration coefficient that occurs in the composite motion of both deflectors.
一般に、第1項は他の項に比べて十分小さく、無視でき
る。第3項は、電子線の走査時には定数となり、通常の
焦点合わせ時に取り除かれている。Generally, the first term is sufficiently small compared to the other terms and can be ignored. The third term becomes a constant during electron beam scanning and is removed during normal focusing.
また、tは+tと−tのみしか取らないゆえ、この性質
全考慮して整理すると
ΔZ=±(ax+b)’) ・・・・・・・・・・・
・・・・(2)となる。ここで、(x、y)は試料面走
査時の座標点であり、a、bは係数である。士の符号は
、士tの符号に対応している。本発明は、この焦点ずれ
量ΔZk補正するものである。Also, since t only takes +t and -t, if we take all of these properties into consideration, we get ΔZ=±(ax+b)')...
...(2). Here, (x, y) are coordinate points during sample surface scanning, and a, b are coefficients. The sign of shi corresponds to the sign of shi t. The present invention corrects this amount of defocus ΔZk.
以下、本発明の一実施例を第1図によV説明する。物点
2エリ出た′電子線は、王レンズ8により試料面4上に
細く絞られている。この電子線を偏向器5により軌道3
とし、光学軸1に対して−を傾斜させられる。この状態
で、走査用偏向器6により電子線は試料4上を2次元的
に走査場れ、像観察ができる。この後、軌道3と同一の
傾斜角で光学軸1とは対称な方向に+を傾斜させて同様
のことを行ない、この動作をくり返すことにエリ試料4
の立体観察視が可能となる。このような動作は、走査用
信号発生器9と、これに同期した傾斜用信号発生器10
との両者にエリ電気的に制御される。本発明では、発生
器9と10に同期して焦点補正イ^号発生器11を動作
させ、補助レンズ7を通して、電子線の焦点調整を行な
う。この補正 ・信号は(2)式に示すように、電
子線の走査位置(X。Hereinafter, one embodiment of the present invention will be explained with reference to FIG. The electron beam emitted from the object point 2 is narrowly focused onto the sample surface 4 by the King lens 8. This electron beam is guided to the trajectory 3 by the deflector 5.
The optical axis 1 can be tilted at - with respect to the optical axis 1. In this state, the electron beam is scanned two-dimensionally over the sample 4 by the scanning deflector 6, allowing image observation. After this, the same thing is done by tilting + in the direction symmetrical to the optical axis 1 at the same inclination angle as the orbit 3, and this operation is repeated.
This enables stereoscopic viewing. Such an operation is performed by a scanning signal generator 9 and a tilting signal generator 10 synchronized therewith.
Both are electrically controlled. In the present invention, the focus correction signal generator 11 is operated in synchronization with the generators 9 and 10, and the focus of the electron beam is adjusted through the auxiliary lens 7. This correction signal is determined by the scanning position (X) of the electron beam, as shown in equation (2).
y)の関数になっており、士の符号は傾斜tの符号に対
応している。すなわち、2方向の傾斜時に補正信号量の
符号を変化させればよい。(2)式の係数a、bは、あ
らかじめ測定しておくのであるが、実際の走査領域より
大きく偏向走査すれば、容易に求められる。y), and the sign of y corresponds to the sign of the slope t. That is, it is sufficient to change the sign of the correction signal amount when tilting in two directions. Although the coefficients a and b in equation (2) are measured in advance, they can be easily determined by scanning with a deflection larger than the actual scanning area.
本発明において、士tの傾きに対して単に士a。In the present invention, the slope of shi t is simply shi a.
士すと符号の変化のみではなく別々の係数を用いてもよ
いことは言う萱でもない。筐た定数項を加えてもよい。However, it goes without saying that it is also possible to use different coefficients in addition to changing the sign. A constant term may also be added.
この場合には、理想系よりずれた電子光学系に対して有
効に作用する。In this case, it acts effectively on an electron optical system that deviates from the ideal system.
−万、電子光学系はここに示したものに限ることなく、
立体観察用の光学系であればよい。−10,000, the electron optical system is not limited to what is shown here,
Any optical system for stereoscopic observation may be used.
本発明によれば、分解能低下の原因となる焦点ずれを容
易に取り除くことがすき、大きな立体角で高分解能をも
つ試料像の立体観察が可能となる。According to the present invention, it is possible to easily eliminate defocus that causes a decrease in resolution, and it is possible to perform stereoscopic observation of a sample image with a large solid angle and high resolution.
第1図は、本発明の一実施例を示した基本構成図である
。
5・・・電子線の傾斜用偏向器、6・・・走査用偏向器
、7・・・補助レンズ、8・・・王レンズ、9・・・走
査用偏向信号発生器、10・・・傾斜用信号発生器、1
1・・・焦点補正信号発生器。
代理人 弁理士 薄田利幸FIG. 1 is a basic configuration diagram showing an embodiment of the present invention. 5... Electron beam tilting deflector, 6... Scanning deflector, 7... Auxiliary lens, 8... King lens, 9... Scanning deflection signal generator, 10... Tilt signal generator, 1
1... Focus correction signal generator. Agent Patent Attorney Toshiyuki Usuda
Claims (1)
り試料面上に結像させる手段と、この電子mを特定の2
刀向に傾むける手段と、傾むけられた電子線を試料面上
で2次元的に走査する手段とを具備した装置において、
2次元走査に同期して焦点の調整を行なうこと全特徴と
する立体走査型電子顕微鋼の焦点調整装置。1. ``Means for constricting the electron beam generated from the electron beam generation source into a narrow image on the sample surface, and
In an apparatus equipped with a means for tilting the electron beam in the direction of the electron beam and a means for two-dimensionally scanning the tilted electron beam on the sample surface,
A focus adjustment device for a three-dimensional scanning electron microscope, which is characterized by adjusting the focus in synchronization with two-dimensional scanning.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8141582A JPS58198841A (en) | 1982-05-17 | 1982-05-17 | Focal point regulation device of stereoscopic scanning type electron microscope |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8141582A JPS58198841A (en) | 1982-05-17 | 1982-05-17 | Focal point regulation device of stereoscopic scanning type electron microscope |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS58198841A true JPS58198841A (en) | 1983-11-18 |
Family
ID=13745708
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8141582A Pending JPS58198841A (en) | 1982-05-17 | 1982-05-17 | Focal point regulation device of stereoscopic scanning type electron microscope |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58198841A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2013103090A1 (en) * | 2012-01-06 | 2013-07-11 | 株式会社 日立ハイテクノロジーズ | Charged particle beam device and inclined observation image display method |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5176963A (en) * | 1974-12-27 | 1976-07-03 | Hitachi Ltd | |
JPS5548610B2 (en) * | 1973-05-18 | 1980-12-06 |
-
1982
- 1982-05-17 JP JP8141582A patent/JPS58198841A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5548610B2 (en) * | 1973-05-18 | 1980-12-06 | ||
JPS5176963A (en) * | 1974-12-27 | 1976-07-03 | Hitachi Ltd |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2013103090A1 (en) * | 2012-01-06 | 2013-07-11 | 株式会社 日立ハイテクノロジーズ | Charged particle beam device and inclined observation image display method |
JP2013143197A (en) * | 2012-01-06 | 2013-07-22 | Hitachi High-Technologies Corp | Charged particle beam apparatus and method for displaying inclined observation image |
CN104040676A (en) * | 2012-01-06 | 2014-09-10 | 株式会社日立高新技术 | Charged particle beam device and inclined observation image display method |
CN104040676B (en) * | 2012-01-06 | 2016-03-16 | 株式会社日立高新技术 | Charged particle line apparatus and oblique view method for displaying image |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR101436218B1 (en) | Charged particle beam device and image display method | |
US4983832A (en) | Scanning electron microscope | |
KR101470270B1 (en) | Charged particle beam device | |
JPS60140641A (en) | Method of optically regulating image correcting control variable of electron microscope | |
JP5798424B2 (en) | Charged particle beam axial alignment method and charged particle beam apparatus | |
US5225676A (en) | Electrooptical viewing apparatus capable of switching depth of focus | |
JPH0313700B2 (en) | ||
KR101455944B1 (en) | Scanning electron microscope | |
JPH0122705B2 (en) | ||
KR20190024685A (en) | Charged particle beam apparatus | |
JPS58198841A (en) | Focal point regulation device of stereoscopic scanning type electron microscope | |
US7109487B2 (en) | Particle beam device | |
US4714310A (en) | Method and apparatus for dynamic focusing control of a radiant energy beam | |
CN113466266A (en) | Method and system for acquiring 3D diffraction data | |
JP2000251823A (en) | Sample inclination observing method in scanning charged particle beam system | |
JPH05135727A (en) | Electron microscope | |
JPS58198842A (en) | Astigmatism correction device of stereoscopic scanning type electron microscope | |
JPS59171445A (en) | Stereoscopic scanning electron microscope | |
KR102628711B1 (en) | Charged particle beam device | |
JP4011455B2 (en) | Sample observation method using transmission electron microscope | |
EP1442471A2 (en) | System and method for fast focal length alterations | |
JPS63114035A (en) | Beam centering | |
JPH05258700A (en) | Scanning image observing method and scanning electron microscope | |
JP3717202B2 (en) | Electron microscope and alignment method thereof | |
JP7027538B2 (en) | Electron beam device |