JPS5819488A - Plating device - Google Patents

Plating device

Info

Publication number
JPS5819488A
JPS5819488A JP11536981A JP11536981A JPS5819488A JP S5819488 A JPS5819488 A JP S5819488A JP 11536981 A JP11536981 A JP 11536981A JP 11536981 A JP11536981 A JP 11536981A JP S5819488 A JPS5819488 A JP S5819488A
Authority
JP
Japan
Prior art keywords
electrode
plating
mold
measuring
plated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11536981A
Other languages
Japanese (ja)
Other versions
JPS6151640B2 (en
Inventor
Kiyoshi Inoue
潔 井上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Inoue Japax Research Inc
Original Assignee
Inoue Japax Research Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Inoue Japax Research Inc filed Critical Inoue Japax Research Inc
Priority to JP11536981A priority Critical patent/JPS5819488A/en
Priority to US06/401,247 priority patent/US4430165A/en
Priority to GB08221336A priority patent/GB2106542B/en
Priority to FR828212947A priority patent/FR2513273B1/en
Priority to DE19823227878 priority patent/DE3227878A1/en
Priority to IT8248887A priority patent/IT1148391B/en
Publication of JPS5819488A publication Critical patent/JPS5819488A/en
Publication of JPS6151640B2 publication Critical patent/JPS6151640B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE:To provide a plating device by which plating layers of a uniform or desired thickness can be formed on the surface to be plated by plating the surface to be plated while measuring the thickness of the plating layer applied on said surface with a measuring electrode and controlling the position of a bar- like electrode and applied electric power. CONSTITUTION:In a plating device for applying plating on an electrocast mold 1 having a complicated shape such as recessed cavities, etc. in the plating soln. 22 of a plating cell 2, a bar-like electrode 18 and a measuring electrode 19 can be moved in proximity to or contact with the desired positions on the mold 1 by the operations of a traveling carriage 4 in an X-axis direction, a traveling carriage 12 in a Y-axis direction, a vertically moving device 16 for the electrode and a vertically moving device 17 for the measuring electrode 17. The distance at which the electrode 19 is moved from a reference position until it contacts with the plating surface and the distance from the reference position up to the mold 1 are compared with a numeriacal controller 21, by which the thickness of the plating layer is calculated. The controller 21 controls the position of the electrode 18 and the applied electric power of an electric power source 20 for plating, thereby performing plating.

Description

【発明の詳細な説明】 本発明は特に複雑な形状の面にも均一なメッキを施し得
るようにしたメッキ装置に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a plating apparatus that is capable of uniformly plating even surfaces with particularly complex shapes.

凹凸に富む複雑な形状の被メッキ面に均一なメッキを施
すことは電気メッキ、化学メッキ等のいずれを問わず困
難である。即ち、このような面にメッキを施そうとする
と、突出部、特に鋭角をなして突出する腹部にはメッキ
層が厚く発達するが、凹部、溝内或いはその角部や隅部
等にはメッキがほとんど付かないという問題が発生する
Regardless of whether electroplating or chemical plating is used, it is difficult to apply uniform plating to a surface to be plated that has a complex shape and is rich in irregularities. In other words, when plating is applied to such a surface, a thick plating layer develops on the protruding parts, especially on the abdomen that protrudes at an acute angle, but it is difficult to plate the inside of the recesses, grooves, or their corners. The problem arises that almost no marks are attached.

ま九、被メッキ面の一部にメッキを行なうには、いちい
ち複雑、面倒なマスヤング手段を講する必要があシ、効
率的な部分メッキが行なえず、寸法的にも限度があった
Furthermore, in order to plate a part of the surface to be plated, it is necessary to take complicated and troublesome mass-younging measures, making it impossible to perform efficient partial plating, and there are also size limitations.

本発明は畝上の観点にたってなされ九ものであって、そ
の目的とするところは、メッキ加工時に被メッキ面に施
されるメッキ層の厚さを測定しつつ加工を行ない、被メ
ッキ面に均一または所望の厚さのメッキ層を施し得るメ
ッキ装置を提供しようとするものである。
The present invention has been made from the viewpoint of ridges, and its purpose is to perform processing while measuring the thickness of the plating layer applied to the surface to be plated during plating processing. It is an object of the present invention to provide a plating apparatus that can apply a plating layer of uniform or desired thickness.

以下、図面によシ本発明の詳細を具体的に説明する。Hereinafter, the details of the present invention will be specifically explained with reference to the drawings.

第1図は、本発明にかかるメッキ装置の一実施例を示す
説明図、第2図は、他の実施例を示す説明図、第3図お
よび第4図は第2図の装置に使用される電極の一部拡大
断面図、第5図線更に他の実施例を示す説明図、第6図
は第5図の装置に使用される電極の一部拡大断面図であ
る0第1図中1は例えば3次元形状のメッキすべき凹状
キャビティを有する電型、2はメッキ槽、3.3はメッ
キ槽2の壁体上に設けられたレール、4は一対の■ビー
ムを平行に結合して成る車体5、車輪6.6、車軸7、
駆動用モータ8、チェーンホイール9および10、チェ
ーン11等から成るX軸方向走行台車、12は車体13
、車輪14.14、駆動用モータ15その他から成り、
電極昇降装置16 および測定用電極昇降装置17を搭
載してX軸方向走行台車4の上でその長手方向に走行す
るY軸方向走行台車、18は必要に応じ側面を絶縁地理
した長尺の棒状電極、19は電型に施されたメッキ層の
厚さを測定する測定用電極、19aは測定用電極19表
面を檀っている絶縁性部材、20は電型1と電極18間
に所定の極性の直流電圧、または電圧パルスを供給する
メッキ電源回路、21は測定用電極19の測定量に基づ
き昇降装置16と17による電極18の2軸方向位置や
電極19による測定シーフェンス動作、及びを 回路20のメッキ条件訃れぞれの駆動条件を制御する数
値制御装置、22はメッキ液である。
FIG. 1 is an explanatory diagram showing one embodiment of the plating apparatus according to the present invention, FIG. 2 is an explanatory diagram showing another embodiment, and FIGS. FIG. 6 is a partially enlarged sectional view of the electrode used in the device shown in FIG. 1 is an electric mold having a three-dimensional concave cavity to be plated, 2 is a plating tank, 3.3 is a rail provided on the wall of the plating tank 2, and 4 is a pair of beams connected in parallel. A vehicle body 5, wheels 6.6, an axle 7,
A bogie running in the X-axis direction consisting of a drive motor 8, chain wheels 9 and 10, chain 11, etc., 12 is a car body 13
, wheels 14, 14, drive motor 15 and others,
A Y-axis moving truck mounted with an electrode lifting device 16 and a measuring electrode lifting device 17 and running in the longitudinal direction on top of the X-axis moving truck 4, 18 is a long rod-shaped body whose side surfaces are insulated as necessary. Electrode 19 is a measurement electrode for measuring the thickness of the plating layer applied to the electromold, 19a is an insulating member covering the surface of the measurement electrode 19, and 20 is a predetermined electrode between the electromold 1 and the electrode 18. A plating power supply circuit 21 supplies a polar DC voltage or a voltage pulse, and a plating power supply circuit 21 controls the biaxial position of the electrode 18 by the lifting devices 16 and 17 and the measurement sea fence operation by the electrode 19 based on the measured amount of the measurement electrode 19. Numerical control device 22 is a plating solution that controls the driving conditions for each plating condition of circuit 20.

而して、電極18は電極昇降装置16にょシ昇降自在に
支承されており、同装置16に内蔵されている図示され
ていないモータにより電型1のメッキキャビティ形状に
応じ、例えば電極18の先端と電型1との対向間隙が常
に所定の、好ましくは小さい所定間隙に維持されるよう
に昇降制御せしめられる。また、測定用電極19も同様
に測定用電極昇降装置17により昇降制御自在に支承さ
れており、同装置17に内蔵されている図示されていな
いモータにより設定測定プログラム等によるシーフェン
ス制御の昇降せしめられる。
The electrode 18 is supported by an electrode lifting device 16 so as to be able to rise and fall freely, and a motor (not shown) built in the device 16 moves the tip of the electrode 18, for example, according to the shape of the plating cavity of the electric mold 1. The vertical movement is controlled so that the opposing gap between the mold 1 and the electric mold 1 is always maintained at a predetermined, preferably small, predetermined gap. Furthermore, the measurement electrode 19 is similarly supported by a measurement electrode lifting device 17 so as to be able to be controlled up and down, and a motor (not shown) built into the device 17 is used to raise and lower the sea fence control according to a set measurement program, etc. It will be done.

X軸方向およびX軸方向走行台車4および12を走行さ
せるモータ8および15は電極18および測定用電極1
9を昇降させる前記モータと同様数値制御装置21によ
シミ極18及び19の電型1上に於けるメッキ及び測定
位置の順次走査及び移動速度等が制御されるようになっ
ている。
The motors 8 and 15 that drive the X-axis direction and the X-axis direction traveling carts 4 and 12 are connected to the electrode 18 and the measurement electrode 1.
Similar to the motor for raising and lowering the stain electrodes 9, a numerical control device 21 controls the sequential scanning and movement speed of the plating and measurement positions of the stain electrodes 18 and 19 on the mold 1.

電極移動を行なう揚台の理想的な様式は、電極18の中
心部が常時被メッキ面の法線と一致せしめられるよう、
且つ、その先端と被メッキ面との間のギャップが常時標
準極間距離に等しく保たれるよう電極18の位置および
姿勢を制御すると共に、被メッキ面の各部に対する滞留
時間が均斉となるように電極18先端を移動させると云
う方式である。(但し、ここで標準極間距離は、例えば
平面にメッキを施す際適切とされる極間距離である。) この極間距離が大きいと巨視的にはメッキは均一に施さ
れるが、電力損失が増大する上、被メッキ面の起伏、凹
凸によってメッキ層の厚みに不均一が生ずるという問題
がある。
The ideal form of the platform for moving the electrode is such that the center of the electrode 18 is always aligned with the normal to the surface to be plated.
In addition, the position and posture of the electrode 18 is controlled so that the gap between its tip and the surface to be plated is always maintained equal to the standard inter-electrode distance, and the residence time for each part of the surface to be plated is made uniform. This method involves moving the tip of the electrode 18. (However, the standard inter-electrode distance here is the inter-electrode distance that is considered appropriate when plating a flat surface, for example.) If this inter-electrode distance is large, the plating will be applied macroscopically uniformly, but the In addition to increased loss, there is a problem in that the thickness of the plated layer becomes non-uniform due to the undulations and irregularities of the surface to be plated.

これに反し、極間距離をあまり小さくすると、電極パス
の全長が長くなり、数値制御プログラムも冗長となるば
かりでなく、電極ノ(スに沿ったうねりが生じるので、
自ら適切な極間距離が定められるものである。
On the other hand, if the distance between the electrodes is made too small, the total length of the electrode path becomes long, which not only makes the numerical control program redundant, but also causes waviness along the electrode path.
An appropriate distance between poles can be determined by the operator himself.

然しなから、このような制御を行なうためには複雑で高
価な電極制御装置を必要とするばかりでなく、数値制御
プログラムの作成にも繁雑な計算を必要とするので、こ
の方法は実用的とはいえない0 而して、本装置においては、電型1表面のメッキが施さ
れた部分に測定用電極19が所定の位置より接触するま
で測定用電極昇降装置17が駆動し、その移動距離が測
定される0この測定値は数値制御装置21において基準
値となる電型1表面にメッキが施される以前の同位置ま
での測定用電極19の移動距離と比較され、この比較値
に応じてあらかじめ定められたプログラムに従ってX軸
方向およびY軸方向走行台車4および12を走行させる
モータ8および15、並びに電極18および測定用電極
19を昇降させるモータと、電型1と電極18間に所定
の極性の直流電圧若しくはパルス電圧を供給する電源回
路20を制御するので、電型1の形状等を問わずその表
面には略均−な厚さのメッキ加工が施されるのである。
However, in order to carry out such control, not only a complicated and expensive electrode control device is required, but also complicated calculations are required to create a numerical control program, so this method is not practical. No.0 Therefore, in this device, the measuring electrode lifting device 17 is driven until the measuring electrode 19 comes into contact with the plated part of the surface of the electric mold 1 from a predetermined position, and the moving distance is This measured value is compared with the moving distance of the measuring electrode 19 to the same position before plating was applied to the surface of the electromold 1, which serves as a reference value in the numerical control device 21, and according to this comparison value, Motors 8 and 15 move the carts 4 and 12 traveling in the X-axis and Y-axis directions according to a predetermined program, and a motor that moves the electrodes 18 and measurement electrodes 19 up and down, and Since the power supply circuit 20 that supplies a DC voltage or a pulse voltage of polarity is controlled, the surface of the electric mold 1 is plated to a substantially uniform thickness regardless of its shape or the like.

測定用電極19の周壁部は合成樹脂等の絶縁性部材19
mで優われていて、測定用電極19が腐蝕するようなこ
とがないようになっている。
The peripheral wall of the measurement electrode 19 is made of an insulating member 19 made of synthetic resin or the like.
The measurement electrode 19 is not corroded.

次に第2図、第3図および第4図について説明する。第
2図はメッキ加工時に加工部分に熱線を照射しつつ加工
を行なう装置の実施例を示しており、電極および測定用
電極の駆動方法、電圧供給方法等は第1図に示したもの
と同様であって、第3図で第1図と同一な誉号を付した
ものは同一な構成要素を示し、図中18mは導電性のパ
イプ状の電極、23aはパイプ状電極18mの先端に取
り付けられた透明若しくは半透明の凸レンズ、23bは
素通しのガラス、24は熱線源、25は熱線源24の下
端に固定して設けられ、パイプ状の電極18mを支承す
る電極ホルダである。
Next, FIGS. 2, 3, and 4 will be explained. Figure 2 shows an embodiment of a device that performs plating while irradiating hot rays to the processed part, and the driving method and voltage supply method for the electrodes and measurement electrodes are the same as those shown in Figure 1. In Fig. 3, the same symbols as in Fig. 1 indicate the same components, and in the figure, 18m is a conductive pipe-shaped electrode, and 23a is attached to the tip of the pipe-shaped electrode 18m. 23b is a transparent or semi-transparent convex lens, 23b is a transparent glass, 24 is a heat ray source, and 25 is an electrode holder fixed to the lower end of the heat ray source 24 and supporting a pipe-shaped electrode 18m.

而して、導電性の材質で製作されたパイプ状の電極18
mの先端部分には透明若しくは半透明な凸レンズ23a
が取シ付けられ、そして、パイプ状の電極18aは熱線
源24の下端に固定された電極ホルダ25に取り付けら
れている。
Therefore, a pipe-shaped electrode 18 made of a conductive material
A transparent or semi-transparent convex lens 23a is provided at the tip of m.
is attached, and the pipe-shaped electrode 18a is attached to an electrode holder 25 fixed to the lower end of the hot ray source 24.

熱線源24としてはレーザ光、クセノン光若しくは赤外
線等の実質上の熱線を照射するものが用いられる。また
、熱線源24からの光線は、測定用電極19が所定の位
置よシ移動して、電型1表面のメッキが施された部分に
接触しその移動距離を測定すると、この測定値が数値制
御装置21において基準値となる電型1表面のメッキが
施される以前の同位置までの測定用電極19の移動距離
と比較され、この比較値に応じてあらかじめ定められた
プログラムに従ってその強弱が制御されると共に、パイ
プ状の′It極18の先端部分に設けられている凸レン
ズ23mで加点が絞られ、電型1のメッキが施される部
分に照射される。また、本実施例装置は第1図の実施例
装置の如く、電極と対向した電型のある一定の範囲にメ
ッキ加工が施されるものと異なシ、熱線源21・らの光
線が照射された部分のみメッキが施されるので、測定用
電極19の移動方向は常に定まっている。即ち、熱線源
24からの照射が行なわれメッキ加工力5施されたあと
を測定用電極19が追随して測定して行くように構成さ
れている。
As the heat ray source 24, one that emits substantial heat rays, such as laser light, xenon light, or infrared rays, is used. In addition, when the measuring electrode 19 moves from a predetermined position to the light beam from the heat ray source 24 and comes into contact with the plated part of the surface of the electric mold 1 and measures the moving distance, this measured value becomes a numerical value. The control device 21 compares the moving distance of the measuring electrode 19 to the same position before plating on the surface of the electric mold 1, which is a reference value, and determines the strength or weakness according to a predetermined program according to this comparison value. While being controlled, the convex lens 23m provided at the tip of the pipe-shaped 'It pole 18 narrows down the additional point, and irradiates the part of the electrode mold 1 to be plated. Furthermore, unlike the apparatus of the present embodiment shown in FIG. 1, in which plating is applied to a certain range of the electrode facing the electrode, the apparatus of this embodiment is irradiated with light beams from the heat ray source 21. Since plating is applied only to the portions where the measurement electrode 19 is moved, the direction of movement of the measurement electrode 19 is always fixed. That is, the measurement electrode 19 is configured to follow and measure after irradiation from the hot ray source 24 is performed and the plating force 5 is applied.

而して、この実施例装置により加工が行なわれる場合に
は、室温またはこれ以下の温度にメッキ液22を保って
おくと共に、電源回路20の電圧も従来慣用の条件にお
ける電圧前後以下に設定して、メッキが極めて遅い速度
か、または殆んどメッキが進行しないようにしておく。
When processing is carried out using the apparatus of this embodiment, the plating solution 22 is kept at room temperature or below, and the voltage of the power supply circuit 20 is set to be around or below the voltage under conventional conditions. The plating speed is very slow, or the plating is hardly progressed at all.

また、この時、電型1のメッキを施す部分には熱線源2
4からの光線がパイプ状の電極18mの内部を通過して
凸レンズ23&で焦点が絞られてその部分に照射される
ので・、その電型1の表面または表面近くのメッキ液2
2温度は約45〜60℃のメッキに最適な温度に加熱さ
れ、従って、当該部分が活性化されて析出効率が向上し
、当該光線照射部分のみにほぼ選択的にメッキが施され
る。また、凸レンズ23mを適宜調節してビームスポッ
トの大きさに  。
Also, at this time, a hot ray source 2 is placed on the part of electro mold 1 to be plated.
The light beam from 4 passes through the inside of the pipe-shaped electrode 18m, is focused by the convex lens 23, and is irradiated to that part.
2 temperature is about 45 to 60° C., which is the optimum temperature for plating, and therefore, the part concerned is activated, the deposition efficiency is improved, and plating is applied almost selectively only to the part irradiated with the light beam. Also, adjust the convex lens 23m appropriately to the size of the beam spot.

応じた領域に限定してメッキを施すことも可能である。It is also possible to apply plating to a limited area.

パイプ状の電極18’aの先端部分に取染付けられる透
明若しくは半透明の凸レンズ23mは、照射部分の形状
があまり複雑でなくビームスポットの調節等を必要とし
ない場合には素通しのガラス23b等に変更できるもの
であるQ また、上記レンズ23a等の光学素子は 、パイプ状電
極18m、18b内へのメッキ液の侵入を先端の透光ガ
ラスや管内供給圧給気体によって防止するとか、メッキ
液22の液位が浅く、電極先端の液中挿入長さが短い場
合には、上記光学素子を電極軸方向の適宜の位置に設け
て熱線の集中、拡散、或いはビームスポットの大きさ等
を設定制御するように構成することができ、またパイプ
状電極内の一部または全部を1本以上の光学ファイバグ
ラスの挿設にiシ導光路とするように構成しても良い。
The transparent or semi-transparent convex lens 23m attached to the tip of the pipe-shaped electrode 18'a may be made of transparent glass 23b etc. if the shape of the irradiated area is not very complicated and adjustment of the beam spot is not required. Optical elements such as the lens 23a can be changed by preventing the plating liquid from entering into the pipe-shaped electrodes 18m and 18b by using transparent glass at the tip or by supplying pressure gas inside the tube. When the liquid level is shallow and the length of the electrode tip inserted into the liquid is short, the above optical element is installed at an appropriate position in the electrode axis direction to control the concentration and diffusion of the heat rays, and the size of the beam spot. Alternatively, a part or all of the inside of the pipe-shaped electrode may be constructed to serve as a light guide path in which one or more optical fiber glasses are inserted.

次に、第5図および第6図について説明する。Next, FIGS. 5 and 6 will be explained.

!s5図は先端部分が開放されている導電性のパイプ状
の電極中へメッキ液が侵入するのを防止するために圧縮
空気を用いた実施例を示してお如、電極および測定用電
極の駆動方法、電圧供給方法、熱線源の制御方法等1f
@2図に示したものと同様であって、第5図で第2図と
同一な番号を付したものは同一な構成要素を示し、図中
1゛8bは両光18bは合成樹脂で製作される不溶性の
パイプ、29はパイプ18eの先端周壁部分に取シ付け
られる金属性電極部材である。
! Figure s5 shows an example in which compressed air is used to prevent the plating solution from entering the conductive pipe-shaped electrode with an open tip. Method, voltage supply method, heat ray source control method, etc. 1f
@It is the same as that shown in Figure 2, and the same numbers in Figure 5 as in Figure 2 indicate the same components, and in the figure, 1゛8b and both lights 18b are made of synthetic resin. The insoluble pipe 29 is a metal electrode member attached to the distal end peripheral wall portion of the pipe 18e.

而して、パイプ状の電極18bは電極ホルダ怒に取シ付
けられていて、熱線源24からの光線はパイプ状の電極
18b中を通過して電型1のメッキが施される部分に無
射される。然しなから、第5図に示した実施例装置にお
いては、パイプ状の電極18bの先端部分が開放されて
いるのでパイプ状の電極18b内にメッキ液22が侵入
することがないような構造となっている。即チ、パイプ
状の電極18bの側壁にはパイプ状の電極18b中にコ
ンプレッサー28からの圧縮空気を送り込むための小穴
が設けられている。而して、測定用電極19が所定の位
置よシ移動して、電型1表面のメッキが施され九部分に
接触しその移動距離を測定すると、この測定値が数値制
御装置21において基準値となる電型1表面のメッキが
施される以前の同位置までの測定用電極19の移動距離
と比較され、この比較値に応じてあらかじめ定められた
プログラムに従ってパイプ状の電極18bの先端部分の
液圧よりやや高い圧縮空気になるように調圧弁27を制
御してパイプ状の電極18b内に圧縮空気を送り込む。
The pipe-shaped electrode 18b is attached to the electrode holder, and the light beam from the hot ray source 24 passes through the pipe-shaped electrode 18b and is applied to the part of the electroform 1 to be plated. shot. However, in the embodiment shown in FIG. 5, the tip of the pipe-shaped electrode 18b is open, so the structure is such that the plating solution 22 does not enter into the pipe-shaped electrode 18b. It has become. That is, a small hole is provided in the side wall of the pipe-shaped electrode 18b for feeding compressed air from the compressor 28 into the pipe-shaped electrode 18b. Then, when the measuring electrode 19 moves from a predetermined position and comes into contact with the nine plated parts of the surface of the electric mold 1 and measures the moving distance, this measured value is set as a reference value in the numerical control device 21. The distance traveled by the measurement electrode 19 to the same position before plating was applied to the surface of the electromold 1 is compared, and the tip of the pipe-shaped electrode 18b is moved according to a predetermined program according to this comparison value. The pressure regulating valve 27 is controlled so that the compressed air is slightly higher than the liquid pressure, and the compressed air is sent into the pipe-shaped electrode 18b.

従って、パイプ状の電極18b内にはメッキ液22が侵
−人することがないので、光線源24からの光線を電型
1に直接投光せしめることが可能となる。
Therefore, the plating liquid 22 does not invade the inside of the pipe-shaped electrode 18b, so that the light beam from the light source 24 can be directly projected onto the mold 1.

また、パイプ状の電極としては導電性のパイプ状の電極
18bに限定されず、第6図に示した如き合成樹脂等の
不溶性パイプ18cの先端周壁部分に金属性電極部材2
9を取り付けて電極としたものをも使用できるものであ
る。
Further, the pipe-shaped electrode is not limited to the conductive pipe-shaped electrode 18b, and a metallic electrode member 2 is attached to the tip peripheral wall of an insoluble pipe 18c made of synthetic resin or the like as shown in FIG.
9 can also be used as an electrode.

本発明は紙上の如く構成されるので、本発明装置による
ときは、電型表面に施されたメッキ層の厚さを逐次測定
しつつ加工を行なうので、複雑な形状の電型にも均一な
厚さのメッキ層を形成することが可能となるのである。
Since the present invention is constructed as on paper, when using the apparatus of the present invention, processing is carried out while sequentially measuring the thickness of the plating layer applied to the surface of the electric mold, so even electric molds with complex shapes can be uniformly processed. This makes it possible to form a thick plating layer.

なお、本発明の構成は紙上の実施例に限定されるもので
はない。即ち、例えば、本実itおいては篭をを固定し
てお金電極を三軸方向に移動させて加工を行なうように
構成したが、電極を固定しておきメッキ槽全体をクロス
−スライドテーブルて三軸方向に移動させて電型にメッ
キ層を形成するようにしてもよい。また、パイプ状の電
極内にオプチカルファイバを多数結束してなるものを設
は光線源からの光線を別異の方向へ投光せしめるように
してもよく、本発明はその目的の範囲内で自由に設計変
更できるものであり、本発明はそれらの全てを包摂する
ものである。例えば、測定用電極の昇降によるメッキ厚
さの測定には、電極19の先端が、之に゛対向する電型
1のメッキ面に直接接触したのを電気的手段郷によって
検出するものの外に、上記先端に所定の比較的小さな近
接間隙となったとき之をその間隙の抵抗、静電容量、電
圧、電流、又は光や超音波の送受波等によって検出する
ことにより電極の下降を停止させるとか、所定のプログ
ラム等された予定量の下降をさせてその際に形成される
間隙を先端に設けた検出器によって測定する等の変更実
施が可能なものである。
Note that the configuration of the present invention is not limited to the embodiments on paper. That is, for example, in this actual IT, processing was carried out by fixing the basket and moving the money electrode in three axes, but it is also possible to fix the electrode and move the entire plating tank using a cross-slide table. The plating layer may be formed on the electrode mold by moving it in three axial directions. Furthermore, a pipe-shaped electrode may be provided with a large number of optical fibers bundled together to project light from a light source in different directions, and the present invention is free within the scope of its purpose. However, the present invention encompasses all of them. For example, in order to measure the plating thickness by raising and lowering the measuring electrode, in addition to detecting by electrical means that the tip of the electrode 19 comes into direct contact with the plating surface of the electrode mold 1 facing the electrode, The lowering of the electrode is stopped by detecting when a predetermined relatively small close gap is formed at the tip using the resistance, capacitance, voltage, current, transmission and reception of light or ultrasonic waves, etc. of the gap. Modifications can be made, such as lowering a predetermined amount according to a predetermined program and measuring the gap formed at that time using a detector provided at the tip.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、本発明にかかるメッキ装置の一実施例を示す
説明図、第2図は、他の実施例を示す説明図、第3図お
よび第4図は第2図の装置に使用される電極の一部拡大
断面図、第5図は更に他の実施例を示す説明図、第6図
は第5図の装置に使用される電極の一部拡大断面図であ
る。 1・・・・・・・・・・・・・・・・・・電型2・・・
・・・・・・・・・・・・用メッキ槽3・・・・・・・
・・・・・・・・・・・レール4・・・・・・・・・・
・・・・・・・・X軸方向走行台車5.13・・・・・
・・・・車 体 6.14・・・・・・・・・車 輪 7・・・・・・・・・・・・・・・・・・車 軸8.1
5・・・・・・・・・駆動用パルスモータ12・・・・
・・・・・・・・・・・Y軸方向走行台車18・・・・
・・・・・・・・・・・棒状電極18a、18b・・川
・導電性のパイプ状の電極19・・・・・・・・・・・
・・・・測定用電極20・・・・・・・・・・・・・・
・電源回路21・・・・・・・・・・・・・・・数値制
御回路22・・・・・・・・・・・・・・・メッキ液 
 23m・・・・・・・・・・・・凸レンズ2−3b・
・・・・・・・・用素通しのガラス  ・24・・・・
・・・・・・・・・・・熱線源25・・・・・・・・・
・・・・・・電極ホルダ26・・・・・・・・・・・・
・・・絞 リ27・・・・・・・・・・・・・・・″調
圧弁28・・・・・・・・・・・・・・・コンプレッサ
ー29・・・・・・・・・・・・・・・金属性電極部材
特許出願人  株式会社井上ジャパックス研究所代、理
 人  (7524)  最 上 正太部第(3図 第・1図    第3ス
FIG. 1 is an explanatory diagram showing one embodiment of the plating apparatus according to the present invention, FIG. 2 is an explanatory diagram showing another embodiment, and FIGS. FIG. 5 is an explanatory diagram showing still another embodiment, and FIG. 6 is a partially enlarged sectional view of the electrode used in the device shown in FIG. 1・・・・・・・・・・・・・・・Electric type 2...
Plating tank 3 for...
・・・・・・・・・・・・Rail 4・・・・・・・・・・・・
......X-axis direction traveling trolley 5.13...
...Car body 6.14 ...Wheel wheel 7 ...Car shaft 8.1
5... Drive pulse motor 12...
......Y-axis direction traveling trolley 18...
...... Rod-shaped electrodes 18a, 18b... River/conductive pipe-shaped electrode 19...
...Measurement electrode 20...
・Power supply circuit 21・・・・・・・・・・・・Numerical control circuit 22・・・・・・・・・・・・Plating liquid
23m・・・・・・・・・Convex lens 2-3b・
・・・・・・・Transparent glass ・24・・・・
......Heat ray source 25...
・・・・・・Electrode holder 26・・・・・・・・・・・・
... Throttle valve 27...''Pressure regulating valve 28...Compressor 29...・・・・・・Metallic electrode member patent applicant Inoue Japax Laboratory Co., Ltd., Director (7524) Mogami Shotabe No. 3 (Figure 3, Figure 1, Figure 3)

Claims (1)

【特許請求の範囲】 電型と電極間にメッキ液を供給させ、上記電型と上記電
極間に所定の通電を行ない、且つ、必要に応じて上記電
型部分に熱線を照射しつつ加工を行なうメッキ装置にお
いて、 下記a)項ないしC)項までの構成要素からなるメツ中
厚さ調整装置を具備したことを特徴とするメッキ装置。 a)電型表面に施されたメッキ面に所定の位置より移動
し、上記メッキ面に近接又は接触してその移動量を測定
する測定用電極。 b)上記測定用電極を電属表面上の所望の位置に移動さ
せると共に、上記測定用電極を予め定められた基準位置
から電型に向けて上記測定用電極が上記i型に所定の近
接、又は接触状態となるまで移動させる測定用電極移動
装置。 C)上記測定用電極の上記基準位置から電型に近接又は
接触するまでの移動距離を予めメモリーされた基準位置
と電型までの早離とを比較することによりメッキ厚さを
算出し、その算出値に基づきメッキ加工を制御する制御
回路。
[Scope of Claims] A plating solution is supplied between the electric mold and the electrode, a predetermined current is applied between the electric mold and the electrode, and processing is performed while irradiating the electric mold part with hot rays as necessary. A plating apparatus for plating, characterized in that it is equipped with a thickness adjustment device comprising the following components a) to c). a) A measuring electrode that moves from a predetermined position to a plated surface applied to the surface of the electrolyte mold, approaches or contacts the plated surface, and measures the amount of movement. b) moving the measuring electrode to a desired position on the metal surface, and moving the measuring electrode from a predetermined reference position toward the electric mold until the measuring electrode is in a predetermined proximity to the i-shape; Or a measurement electrode moving device that moves until it comes into contact. C) Calculate the plating thickness by comparing the moving distance of the measurement electrode from the reference position to the time when it comes close to or comes into contact with the mold and the reference position stored in advance and the quick separation from the mold. A control circuit that controls plating processing based on calculated values.
JP11536981A 1981-07-24 1981-07-24 Plating device Granted JPS5819488A (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP11536981A JPS5819488A (en) 1981-07-24 1981-07-24 Plating device
US06/401,247 US4430165A (en) 1981-07-24 1982-07-23 Laser-activated electrodepositing method and apparatus
GB08221336A GB2106542B (en) 1981-07-24 1982-07-23 A method and apparatus for electrodeposition
FR828212947A FR2513273B1 (en) 1981-07-24 1982-07-23 METHOD AND APPARATUS FOR ELECTRO-DEPOSITION OF METAL ON A WORKPIECE USING A LASER BEAM OR THE LIKE THERMAL LIGHT BEAM
DE19823227878 DE3227878A1 (en) 1981-07-24 1982-07-26 METHOD AND DEVICE FOR GALVANIC DEPOSITING A METAL ONTO A WORKPIECE
IT8248887A IT1148391B (en) 1981-07-24 1982-07-26 METHOD AND EQUIPMENT FOR ELECTRODEPOSITION ACTIVATED WITH LASER

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11536981A JPS5819488A (en) 1981-07-24 1981-07-24 Plating device

Publications (2)

Publication Number Publication Date
JPS5819488A true JPS5819488A (en) 1983-02-04
JPS6151640B2 JPS6151640B2 (en) 1986-11-10

Family

ID=14660815

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11536981A Granted JPS5819488A (en) 1981-07-24 1981-07-24 Plating device

Country Status (1)

Country Link
JP (1) JPS5819488A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS644546A (en) * 1987-06-29 1989-01-09 Fujikura Ltd Manufacture of trolley steel wire covered with copper

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS644546A (en) * 1987-06-29 1989-01-09 Fujikura Ltd Manufacture of trolley steel wire covered with copper

Also Published As

Publication number Publication date
JPS6151640B2 (en) 1986-11-10

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