JPS58194074A - Fixing device - Google Patents
Fixing deviceInfo
- Publication number
- JPS58194074A JPS58194074A JP7664882A JP7664882A JPS58194074A JP S58194074 A JPS58194074 A JP S58194074A JP 7664882 A JP7664882 A JP 7664882A JP 7664882 A JP7664882 A JP 7664882A JP S58194074 A JPS58194074 A JP S58194074A
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- heating element
- temperature
- fixing body
- heat
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G15/00—Apparatus for electrographic processes using a charge pattern
- G03G15/20—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat
- G03G15/2003—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat using heat
- G03G15/2014—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat using heat using contact heat
- G03G15/2039—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat using heat using contact heat with means for controlling the fixing temperature
- G03G15/2042—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat using heat using contact heat with means for controlling the fixing temperature specially for the axial heat partition
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Fixing For Electrophotography (AREA)
- Control Of Resistance Heating (AREA)
Abstract
Description
【発明の詳細な説明】
おけるトナー像の加熱定着装置の改良に関し、詳しくは
、内部にハロゲンランプ等の発熱体を設けた加熱ローラ
等の加熱定着体を用いる定着装置の改良に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an improvement in a heat fixing device for toner images, and more particularly, to an improvement in a fixing device that uses a heat fixing body such as a heating roller provided with a heating element such as a halogen lamp inside.
従来、上述のような定着装置として、例えば、支持体に
支持されたセラミックベース上に耐熱抵抗発熱体パター
ンが焼付けられていて、その焼付けられたセラミックベ
ース上に耐熱ゴム層を被覆した加熱定着体を用いる複写
紙への定着装Ｗｔｔ寸Ｊｐ：（開昭！；ＩＩ − ３０
に４’／号公報により知られており、また、正の抵抗温
度係数即ち、ＰＴＯ％性を有し自己湿度制御性を示すセ
ラミックスを耐熱抵抗発熱体として用いた加熱定着体も
特開昭ｊ６ー／．２３ＪＩＩ号公報等により知られてい
る。Conventionally, as the above-mentioned fixing device, for example, a heating fixing body is used, in which a heat-resistant resistance heating element pattern is baked on a ceramic base supported by a support, and a heat-resistant rubber layer is coated on the baked ceramic base. Fixing device for copy paper using
In addition, a heating fixing body using ceramics as a heat-resistant resistance heating element which has a positive temperature coefficient of resistance, that is, PTO% property and exhibits self-humidity control property, is also known from Japanese Patent Application Laid-Open No. 4'/1986. -/． It is known from Publication No. 23JII.
しかし、そのようか従来の加熱定着体ｄ１抵抗発熱体パ
ターンが全体として電源に直列に接続されるものである
ために、全体としての平均的な温度、発熱量制御は容易
釦なされても、部分的な温度、発熱量制御はなされなか
った。即ち、部分的な放熱量の差に対応して温度、発熱
量を制御するのは、抵抗発熱体パターンの配役の部分的
疎密によっており、したがって不測の放熱量の変動に対
しては全体の平均的な制御によるよりなかった。However, since the conventional heat fixing body d1 resistive heating element pattern is connected in series with the power supply as a whole, even if the average temperature and heat generation amount as a whole can be easily controlled, it is difficult to control the part. Temperature and calorific value were not controlled. In other words, controlling the temperature and heat generation amount in response to local differences in heat radiation amount depends on the local spacing and density of the resistive heating element pattern, and therefore, the overall average It was not due to physical control.
そして、抵抗発熱体が自己温度制御性を有するものであ
るときは、全体としての平均的な温度、発熱量制御はＶ
２／Ｒ（Ｖは抵抗発熱体パターンの電源電圧、Ｒは全体
の抵抗）によって自動的に行われても、部分的に温度差
が生じたときは、部分的な温度、発熱量がＩｒ２（Ｉは
抵抗発熱体パターンに流れる電流、ｒは部分抵抗）によ
って変化するから、その温度差はむしろ増大する。When the resistance heating element has self-temperature control, the average temperature and heat generation amount control as a whole is V.
2/R (V is the power supply voltage of the resistance heating element pattern, R is the overall resistance), but if a temperature difference occurs locally, the local temperature and heat generation amount will be changed to Ir2 ( Since I changes depending on the current flowing through the resistive heating element pattern and r represents the partial resistance, the temperature difference increases rather.
本発明は、上述の従来の加熱定着体における問題を解消
したものであり、全体的な温度、発熱量制御が自動的に
行われるばかりでなく、部分的な温度、発熱量制御も自
動的に行われるような加熱定着体を用いた定着装置を提
供するものである。The present invention solves the above-mentioned problems with the conventional heat fixing body, and not only automatically controls the overall temperature and amount of heat generated, but also automatically controls the temperature and amount of heat generated locally. The purpose of the present invention is to provide a fixing device using a heat fixing body as described above.
本発明は、内部に発熱体を設けた加熱定着体を用いる定
着装置において、前記発熱体が自己温度制御性を有する
抵抗発熱体パターンで構成され、かつ、該パターンが電
源に対して並列に接続された複数のパターンユニットか
らなることを特徴とする定着装置にあり、本発明の加熱
定着体は、自己温度制御性を有する抵抗発熱体パターン
が電源に並列に接続される複数の並列パターンユニット
から成ることによって、全体的々温度、発熱量制御が自
動的に行われるだけでなく、部分的な温度、発熱量制御
も自動的に行われると云う優れた効果を発揮する。The present invention provides a fixing device using a heat fixing body provided with a heating element inside, wherein the heating element is configured with a resistive heating element pattern having self-temperature control, and the pattern is connected in parallel to a power source. The heating fixing body of the present invention includes a plurality of parallel pattern units in which a resistance heating element pattern having self-temperature control is connected in parallel to a power source. By doing so, not only the overall temperature and calorific value control is automatically performed, but also the partial temperature and calorific value control is automatically performed, which is an excellent effect.
以下、本発明を図示例に基いて説明する。Hereinafter, the present invention will be explained based on illustrated examples.
第１図は本発明の定着装置に用いられる加熱定着体の一
例を示す断面図、第１図及び第３図は加熱定着体の抵抗
発熱体パターンの例を示す展開平面図である。FIG. 1 is a sectional view showing an example of a heating fixing body used in the fixing device of the present invention, and FIGS. 1 and 3 are developed plan views showing examples of a resistance heating element pattern of the heating fixing body.
図において、ｌ、／′は図示せざる軸受けに回転可能に
支承される支持体、λは支持体／、ｌ′に結合されたセ
ラミックベース、３けセラミックベースλ上に設けられ
た自己温度制御性を有する抵抗発熱体パターンで、電圧
Ｖの電源に並列に接続されるａａのパターンユニツ）Ｊ
−／、、、？−２，３−３．・・・Ｊ−ｎ等より成る。In the figure, l and /' are supports that are rotatably supported on bearings (not shown), λ is a support body /, a ceramic base coupled to l', and a self-temperature control device installed on the 3-piece ceramic base λ. A pattern unit of aa connected in parallel to a power supply of voltage V with a resistive heating element pattern having a characteristic of
-／、、、? -2,3-3. ... Consists of J-n, etc.
ψは抵抗発熱体パターン３（Ｄｆｋけられたセラミック
ベースλ上を被覆するセラミック絶縁体層、まけセラミ
ック絶縁体層ｔの表向を更に被覆するように設けられた
弗素系、シリコン系樹脂あるいは芳香族ポリアミド。ψ is a ceramic insulating layer covering the ceramic base λ having a resistive heating element pattern 3 (Dfk), and a fluorine-based, silicon-based resin or aromatic resin provided to further cover the surface of the ceramic insulating layer t. family polyamide.
ポリイミド等の耐熱性樹脂から成る樹脂絶縁体層、乙、
６′は支持体／、／′にそれぞれ設けたスリップリング
で、それぞれ抵抗発熱体パターン３の電源ラインＪａ
、 Ｊｂに接続されている。７ 、７’ｉ−カーボンブ
ラシ等の摺擦子で、スリップリング６．６′を介して抵
抗発熱体パターン３の電源ライン３ａ。A resin insulating layer made of heat-resistant resin such as polyimide,
6' is a slip ring provided on the support bodies / and /', respectively, and is connected to the power line Ja of the resistance heating element pattern 3, respectively.
, connected to Jb. 7, 7'i - Power line 3a of the resistive heating element pattern 3 via the slip ring 6.6' with a rubbing element such as a carbon brush.
３ｂを通しパターンユニット３−／ 、 ３−２ 、３
−３等に電源電圧■を印加する。3b through pattern unit 3-/, 3-2, 3
Apply power supply voltage ■ to -3 etc.
セラミックベースλとその上に設けられる抵抗発熱体パ
ターン３及びそれらの表面を被覆するセラミック絶縁体
層グは一体に形成した後焼成する従来公知の方法によっ
て作られ、その後に樹脂層Ｓを設けられて、支持体／、
／′と結合される。その結合に際してスリップリング乙
、）′と抵抗発熱体パターン３のｍ源うインＪａ 、
３ｂとの接続が行われることは勿論である。なお、スリ
ップリング乙、６′はセラミックベース２上に設けられ
ていてもよいし、それが抵抗発熱体パターン３と同様に
一体に設けられたものであってもよい。The ceramic base λ, the resistance heating element pattern 3 provided thereon, and the ceramic insulating layer covering their surfaces are made by a conventionally known method of integrally forming and then firing, and then the resin layer S is provided. , support /,
Combined with /'. When they are connected, the slip ring (B)' and the m source of the resistive heating element pattern 3 (Ja) are connected.
Of course, the connection with 3b is made. Note that the slip rings B and 6' may be provided on the ceramic base 2, or may be provided integrally with the resistive heating element pattern 3.
第１図の抵抗発熱体パターン３は、パターンユニット３
−／ 、３−．２．３−３等がセラミックベース上に一
様に分布して配設されたものであり、このような抵抗発
熱体パターン３によれば、パターンユニット３−／ 、
３−２ 、３−３、−３−ｎ等の発熱量がｖ２／ ｒ
ｌ、 ｖ２／ ｒ２ 、 Ｖ２／ ｒ５（ｒｌ 。The resistance heating element pattern 3 in FIG.
-/, 3-. 2.3-3 etc. are uniformly distributed and arranged on the ceramic base, and according to such a resistance heating element pattern 3, the pattern unit 3-/,
The calorific value of 3-2, 3-3, -3-n, etc. is v2/r
l, v2/r2, V2/r5(rl.
ｒ２． ｒ３けパターンユニット３／ 、 ３２ 、３
３の抵抗）等となるから、加熱定着体の表面温度が軸方
向の部分的にも周方向の部分的にも自動的に制御されて
極めて均一性の高いものとなり、表面のどの部分によっ
ても定着が一様に行われるようになる。r2. r3 pattern unit 3/, 32, 3
3 resistance), etc., so the surface temperature of the heating fixing body is automatically controlled partially in the axial direction and partially in the circumferential direction, making it extremely uniform, and it is possible to Fixation will occur uniformly.
第３図の抵抗発熱体パターン３は、パターンユニット３
−／が例えばＢｊサイズの被定着紙の紙幅部分に、パタ
ーンユニット３−２がＢ、ｔサイズの紙幅を超えるＡ４
’サイズの紙幅部分に、パターンユニット３−３がＡ４
’サイズの紙幅ヲ超エルＢＩＩサイズの紙幅部分に配設
されたものであり、このような抵抗発熱体パターン３に
よれば、少ないパターンユニットで紙サイズが変っても
合理的に熱損失少なく一様に熱定着できる。この場合、
各部分のパターンユニットをそれぞれ複数のパターンユ
ニットよりなるものにしてもよいことは勿論である。The resistance heating element pattern 3 in FIG. 3 is the pattern unit 3.
- / is, for example, in the paper width part of the Bj size fixing paper, and the pattern unit 3-2 is A4 that exceeds the paper width of B, t size.
'The pattern unit 3-3 is A4 in the paper width part of the size.
According to this resistive heating element pattern 3, even if the paper size changes with a small number of pattern units, heat loss can be maintained at a reasonable level with minimal heat loss. It can be heat-fixed in various ways. in this case,
Of course, each pattern unit of each portion may be made up of a plurality of pattern units.
以上述べたところから明らかなように、本発明によれば
、従来のセラミックベースを用いた加熱定着体による定
着装置におけると同様、表面温度の立上りに時間が掛ら
ず、熱効率が高くてエネルギ損失が少なく、全体的な温
度、発熱量制御が容易に、しかも自動的に行われるだけ
ではなく、従来の定着装置では行われなかった加熱定着
体の部分的湿度、発熱量制御も自動的に行われるように
なり、熱効率が一段と高まる以上に、定着の一様安定性
が著しく向上すると云う優れた効果が得られる。しかも
、コストが従来の装置に比較して高くなることもない。As is clear from the above description, according to the present invention, as with conventional fixing devices using heat fixing bodies using ceramic bases, it does not take time for the surface temperature to rise, and thermal efficiency is high, resulting in less energy loss. Not only can the overall temperature and heat generation amount be controlled easily and automatically, but also the partial humidity and heat generation amount control of the heat fixing body, which was not possible with conventional fixing devices, can also be performed automatically. As a result, not only the thermal efficiency is further increased, but also the uniform stability of fixing is significantly improved, which is an excellent effect. Moreover, the cost is not higher than that of conventional devices.
なお、本発明は図示例に限定されるものではなく、例え
ば加熱定着体が平面的なものでも、あるいは抵抗発熱体
パターンを設けたセラミックベースの上面を被覆する絶
縁体層がセラミック層または樹脂層のみから成るもので
もよい。絶縁体層にセラミック層を用いる場合には、そ
のセラミック層（温度立上り時間を短かくするために薄
い層に形成される）のセラミックスに熱伝導率がセラミ
ックベースのセラミックスよりも高いものを用いると、
それによって抵抗発熱体パターンの形状が表面温度に現
われることを防ｌにすると云う効果が得られる。しかし
、抵抗発熱体パターンは発熱体ラインの間隙をＱ、１ｙ
ａｔｎ位まで狭めて設けることが可能であるから、絶縁
体層が樹脂層のみから成るものであっても、抵抗発熱体
パターンの形状が表面温度に現われることを防止するこ
とはできる。Note that the present invention is not limited to the illustrated example; for example, the heating fixing body may be flat, or the insulating layer covering the upper surface of the ceramic base provided with the resistive heating element pattern may be a ceramic layer or a resin layer. It may also consist of only When using a ceramic layer as an insulator layer, the ceramic layer (formed in a thin layer to shorten the temperature rise time) should have a higher thermal conductivity than the ceramic base ceramic. ,
This has the effect of preventing the shape of the resistance heating element pattern from appearing in the surface temperature. However, in the resistance heating element pattern, the gap between the heating element lines is Q, 1y
Since it is possible to narrow the resistive heating element pattern to about atn, it is possible to prevent the shape of the resistive heating element pattern from appearing in the surface temperature even if the insulating layer is made of only a resin layer.
次に本発明の実施例を示す。Next, examples of the present invention will be shown.
実施例
第１図のセラミックベースλに熱伝導率がｏ、ｏ １Ｉ
ｃａｌ・ｍ／σ２ｓｅｃ℃のアルミナセラミックスヲ用
い、このセラミックベースλにチタン酸バリウムを主成
分とした抵抗発熱体パターン３を第２図に示したように
設け、その上に熱伝導率が０．０１ｃａｌ・α７ｃｍ２
ＳｅＧ℃のアルミナセラミックスよりなる保麹層を設け
、更にその保護層の表面にテフロン（デュポン社製弗素
系樹脂）被膜を設けた加熱定着ローラを小西六写真工業
社製Ｕ−ＢｉｘＶの定着装置として用いた。なお、抵抗
発熱体パターン３のパターンユニット３−／ 、３−２
．３−３等は、発熱体ラインの幅がＱＪｔｕｎ、その屈
曲している隣り合せの間隙が０．２１１１１１１で、ｊ
ａｎの間隔の電源ライン３ａと３ｂに両端を接続されて
おり、軸と平行な方向の配列ピッチがｊｓｍに配設され
ている。Example The ceramic base λ shown in Fig. 1 has a thermal conductivity of o, o 1I
Using alumina ceramics with a temperature of cal·m/σ2sec°C, a resistive heating element pattern 3 containing barium titanate as a main component is provided on this ceramic base λ as shown in FIG. 01cal・α7cm2
A heating fixing roller with a protective layer made of SeG°C alumina ceramics and a Teflon (fluorine-based resin manufactured by DuPont) coating on the surface of the protective layer is used as a fixing device for U-BixV manufactured by Konishiroku Photo Industry Co., Ltd. Using. In addition, pattern units 3-/, 3-2 of resistance heating element pattern 3
．． 3-3 etc., the width of the heating element line is QJtun, the gap between adjacent curved lines is 0.2111111, and j
Both ends are connected to power supply lines 3a and 3b with an interval of an, and the arrangement pitch in the direction parallel to the axis is jsm.
この加熱定着ローラけ、１ＯＯＯＷ／ｈｒの発熱が可能
で、表面温度が常温から２００℃に上昇するのに２０ｓ
ｅｃで済み、Ｕ −Ｂｉｘ Ｖの複写の定着に用いた結
果は、各種のサイズの複写紙を用いても定着ムラは全く
見られず、表面温度のムラは従来の加熱定着ローラに比
して著しく改善されていた。This heating fixing roller can generate heat of 1OOOW/hr, and it takes only 2 seconds for the surface temperature to rise from room temperature to 200℃.
The results of using the U-Bix V to fix copies of copies showed that there was no unevenness in fixing at all even when copy paper of various sizes was used, and the unevenness in surface temperature was lower than that of conventional heat fixing rollers. It was markedly improved.
第１図は本発明の定着装置に用いられる加熱定着体の一
例を示す断面図、第１図及び第３図は加熱定着体の抵抗
発熱体パターンの例を示す展開平面図である。
／、７′・・・支持体、 −２・セラミックベース
、（ｑ）
３・・抵抗発熱体パターン、
３−／、３−２．３−３・・・パターンユニット、３ａ
、３ｂ・・・電源ライン、
ｑ・・・セラミック絶縁体層、
Ｓ・・・樹脂絶縁体層、
乙、ｔ′・・・スリップリング、
７．７′・・・摺擦子。FIG. 1 is a sectional view showing an example of a heating fixing body used in the fixing device of the present invention, and FIGS. 1 and 3 are developed plan views showing examples of a resistance heating element pattern of the heating fixing body. /, 7'...Support, -2.Ceramic base, (q) 3..Resistive heating element pattern, 3-/, 3-2.3-3...Pattern unit, 3a
, 3b...power line, q...ceramic insulator layer, S...resin insulator layer, Otsu, t'...slip ring, 7.7'...suribura.
Claims (1)
において、前記発熱体が自己湿度制御性を有する抵抗発
熱体パターンで構成され、かつ、該パターンが電源に対
して並列に接続された複数のパターンユニットからなる
ことを特徴とする定着装置。 ２、 前記加熱定着体が回転可能ローラーであり、前記
パターンユニットの前記ローラーの回転軸方向に並んだ
ものが電源に並列に接続されることを特徴とする特許請
求の範囲第１項記載の定着装置。[Scope of Claims] t. In a fixing device using a heating fixing body provided with a heating element inside, the heating element is constituted by a resistive heating element pattern having self-humidity control property, and the pattern is connected to a power source. A fixing device comprising a plurality of pattern units connected in parallel. 2. The fixing device according to claim 1, wherein the heat fixing body is a rotatable roller, and the pattern units arranged in the direction of the rotation axis of the roller are connected in parallel to a power source. Device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7664882A JPS58194074A (en) | 1982-05-10 | 1982-05-10 | Fixing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7664882A JPS58194074A (en) | 1982-05-10 | 1982-05-10 | Fixing device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS58194074A true JPS58194074A (en) | 1983-11-11 |
Family
ID=13611212
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7664882A Pending JPS58194074A (en) | 1982-05-10 | 1982-05-10 | Fixing device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58194074A (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS618891A (en) * | 1984-06-22 | 1986-01-16 | キヤノン株式会社 | Heating member and heater having same |
| EP0332105A2 (en) * | 1988-03-11 | 1989-09-13 | Hitachi, Ltd. | Fixing device and recording device |
| JPH04305679A (en) * | 1991-04-03 | 1992-10-28 | Oki Electric Ind Co Ltd | Fixing device |
| EP0777161A2 (en) * | 1995-11-28 | 1997-06-04 | Hewlett-Packard Company | Instant-on fuser roller structure |
| EP0915395A1 (en) * | 1997-11-05 | 1999-05-12 | Agfa-Gevaert N.V. | Photothermographic development system |
| FR2784759A1 (en) * | 1998-10-16 | 2000-04-21 | Sagem | PRINTING POWDER FIXING OVEN |
-
1982
- 1982-05-10 JP JP7664882A patent/JPS58194074A/en active Pending
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS618891A (en) * | 1984-06-22 | 1986-01-16 | キヤノン株式会社 | Heating member and heater having same |
| EP0332105A2 (en) * | 1988-03-11 | 1989-09-13 | Hitachi, Ltd. | Fixing device and recording device |
| JPH04305679A (en) * | 1991-04-03 | 1992-10-28 | Oki Electric Ind Co Ltd | Fixing device |
| EP0777161A2 (en) * | 1995-11-28 | 1997-06-04 | Hewlett-Packard Company | Instant-on fuser roller structure |
| EP0777161A3 (en) * | 1995-11-28 | 1998-06-03 | Hewlett-Packard Company | Instant-on fuser roller structure |
| EP0915395A1 (en) * | 1997-11-05 | 1999-05-12 | Agfa-Gevaert N.V. | Photothermographic development system |
| BE1011530A4 (en) * | 1997-11-05 | 1999-10-05 | Agfa Gevaert Nv | Photothermographic DEVELOPMENT SYSTEM. |
| FR2784759A1 (en) * | 1998-10-16 | 2000-04-21 | Sagem | PRINTING POWDER FIXING OVEN |
| DE19950268B4 (en) * | 1998-10-16 | 2010-08-26 | Sagem Communications | Oven for fixing printing powder for a printer |
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