JPS5818845A - Color cathode-ray tube - Google Patents

Color cathode-ray tube

Info

Publication number
JPS5818845A
JPS5818845A JP11526481A JP11526481A JPS5818845A JP S5818845 A JPS5818845 A JP S5818845A JP 11526481 A JP11526481 A JP 11526481A JP 11526481 A JP11526481 A JP 11526481A JP S5818845 A JPS5818845 A JP S5818845A
Authority
JP
Japan
Prior art keywords
electron beam
line
shadow mask
shadow masks
centers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11526481A
Other languages
Japanese (ja)
Inventor
Masanori Kamimuro
神室 政則
Hisashi Okada
岡田 久史
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP11526481A priority Critical patent/JPS5818845A/en
Publication of JPS5818845A publication Critical patent/JPS5818845A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/46Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
    • H01J29/80Arrangements for controlling the ray or beam after passing the main deflection system, e.g. for post-acceleration or post-concentration, for colour switching
    • H01J29/81Arrangements for controlling the ray or beam after passing the main deflection system, e.g. for post-acceleration or post-concentration, for colour switching using shadow masks

Abstract

PURPOSE:To enable an accurate landing condition to be maintained by forming an asymmetrical electron lens so that the line connecting the centers of a pair of electron beam passing holes becomes slant from the beam-orbit axis, and changing the degree of the slant of the above line in accordance with the thermal deformations of shadow masks. CONSTITUTION:Penetrating hole centers 7 and 11 of two shadow masks are constituted so that a penetrating-hole-center axial line 12 connecting the centers 7 and 11 is not perpendicular to a fluorescent screen, and so that the line 12 is slant from the incidence orbit axis of an electron beam 5. Since an anode voltage (Eb) is larger than a sub-focus voltage (Vg), an incoming electron beam 5 is curved along the direction of the line 12. Due to thermal deformation of the shadow masks caused by the electron beam 5, the electron beam 5 located on a given phosphor 3 moves to the right, and at the same time, a distance (gM) changes. As the result, a correction which is almost euqal to the degree of the movement of the electron beam 5 and is in the reverse direction to the above movement can be obtained.

Description

【発明の詳細な説明】 本発明は複数の色選択電極、即ちシャドウマスクを有す
るカラー陰極線管に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a color cathode ray tube having a plurality of color selection electrodes or shadow masks.

カラー陰極線管1c卦いては、電子銃からの3本の電子
ビームを夫々所定の発光色を有する螢光体に正確に照射
させて正しく発色させる為に色選択電極、即ちシャドウ
マスクが電子銃と螢光面との間に設けられている。この
シャドウマスクには電子ビームを通過させるための多数
の透孔と、電子ビームt−遁断するためのマスク部分、
即ち透孔以外の部分とが設けられており、正確な電子ビ
ームのランディング状Wを得るために非常に高度の形状
精度が求められる。シャドウマスクVCは通常非常に薄
い金属板が用9られ、エツチング等により透孔が形成′
されるが、この精度は一般に金g板の厚さが薄いほど高
iものが得られる。しかし乍ら電子ビームの半分を大幅
にこえる分がこのシャドウマスクの透孔外の部分に照射
されており、このためにシャドウマスクは加熱され、熱
変形を生じて正常なランディング状態から逸脱する不都
&1生じ、この現象はシャドウマスクの厚さが薄いほど
大きなもの七なる。このような不都合の解決策として、
例えばシャドウマスクをバイメタルを介してパネルガラ
スに固定してシャドウマスクの加熱による変位を補正し
ている。しかしこの方法は    ゛マスク全体の変位
補正に対しては有効であるが、局部的な電子ビームの入
射による熱変形に対しては解決策とはならない。従って
この解決策としてシャドウマスクの板厚を厚くすれば良
いが、逆に電子ビーム透孔の加工精度を低下させてしま
うことしこなる。
In the color cathode ray tube 1c, a color selection electrode, that is, a shadow mask, is used as the electron gun in order to accurately irradiate the three electron beams from the electron gun onto the phosphors each having a predetermined emission color to produce the correct color. It is provided between the fluorescent surface and the fluorescent surface. This shadow mask has a large number of through holes for passing the electron beam, and a mask portion for cutting off the electron beam.
That is, a portion other than the through hole is provided, and a very high degree of shape accuracy is required in order to obtain an accurate landing shape W of the electron beam. A very thin metal plate is usually used for the shadow mask VC, and through holes are formed by etching, etc.'
However, in general, the thinner the gold plate is, the higher the accuracy can be obtained. However, significantly more than half of the electron beam is irradiated onto the part of the shadow mask outside the hole, which heats up the shadow mask, causing thermal deformation and causing it to deviate from the normal landing state. The thinner the shadow mask is, the greater this phenomenon becomes. As a solution to this inconvenience,
For example, a shadow mask is fixed to a panel glass via a bimetal to correct displacement of the shadow mask due to heating. However, although this method is effective for correcting the displacement of the entire mask, it is not a solution to the thermal deformation caused by local electron beam incidence. Therefore, as a solution to this problem, it would be possible to increase the thickness of the shadow mask, but this would conversely end up lowering the processing accuracy of the electron beam holes.

またシャドウマスクの発熱をパネル〃ラスの方へ熱放射
させて放熱効果を良好にする九めに螢光向のアルミメタ
ルバックの面を更に黒色にする等の手段も用いら几るが
、之等の手段では何れも電子ビームの正確なランディン
グを維持するための根本的解決とは言いJilt/−a
ものである。
In addition, measures such as making the surface of the aluminum metal back facing the fluorescent light further black may also be used to improve the heat radiation effect by radiating the heat generated by the shadow mask towards the panel lath. None of these methods is a fundamental solution to maintaining accurate landing of the electron beam, but Jilt/-a
It is something.

また特公昭55−2698号公報には電子ビームの軌道
軸に沿って透孔を配置した二重マスクにより加熱変形に
よるランディング劣化を防止する技術が示されている。
Furthermore, Japanese Patent Publication No. 55-2698 discloses a technique for preventing landing deterioration due to thermal deformation by using a double mask with through holes arranged along the orbital axis of the electron beam.

しかし乍らこの方式では、単にm2のマスクが電子ビー
ムtS蔽するのみであシ、二重構造のマスクに各々異な
る電位が印加されていても遮蔽マスクが熱変形を生じた
場合、電界の変化により電子ビームがかえってずれ、ラ
ンディングが激しく劣化する欠点を有している。
However, in this method, the m2 mask simply shields the electron beam tS, and even if different potentials are applied to each double-structured mask, if the shielding mask is thermally deformed, the electric field will change. This has the drawback of causing the electron beam to shift and severely deteriorating the landing.

本発明は以上の点に鑑みてなされたもので%複数のシャ
ドウマスクを用い、特に周辺部の対応する電子ビーム透
過孔対の各々の中心を結ぶ透孔中心軸が電子ビーム軌道
軸に対して傾きを有するように構成することによって、
透孔部に非対称電子レンズを形成し、且つこの非対称電
子レンズ全シャドウマスクの熱変形に合せて前記傾きi
lを変化させる様に構成し正確なランディング状態を維
持するカラー陰極線管を提供することを目的とするもの
である。
The present invention has been made in view of the above points, and uses a plurality of shadow masks. In particular, the central axis of the through hole connecting the centers of each pair of corresponding electron beam transmission holes in the peripheral area is relative to the electron beam orbit axis. By configuring it to have an inclination,
An asymmetric electron lens is formed in the through hole, and the inclination i is adjusted according to thermal deformation of the entire shadow mask of the asymmetric electron lens.
The object of the present invention is to provide a color cathode ray tube configured to vary l and maintain an accurate landing state.

以下本発明の一実施例について図面に従い詳細に説明す
る。第1図は本発明のカラー陰極線管の特にシャドウマ
スク近傍の基本的構成を示す概略図である。第1図にお
いて、カラー陰極線管のガラスフェースプレー) (1
)の内面には螢光向(2)が形成され、螢光面(2)は
各色に発光する螢光体(3)とその残余の面t−aう黒
色光吸収体層(4)とから構成される。この螢光面(2
)と複数の電子ビームを発射する電子銃(図示せず)と
の間にあって螢光面(2)に近接して電子ビーム(5)
を正しく対応する所定の螢光体(3)に照射するための
シャドウマスク(6)が配設される。さらにこのシャド
ウマスク(6)の電子銃側に近接して第2のシャドウマ
スク(IQが配役され、之等の2つのシャドウマスク(
6)及び0(IKは異なる電位が印加される。之等の2
つのシャドウマスクの対応する透孔センター(7)及び
01)は、その螢光面に対して垂直な透孔軸(8)及び
(9)が異なる様に、即ち透孔センター(7)及び01
)を結ぶ透孔中心軸線a2は螢光面に対して非垂直とな
るように構成され、さらにこの透孔中心軸線a3は電子
ビーム(5)の入射軌道軸に対して非平行となる様罠、
即ち傾きを有する様に構成される。以上のような配列構
成のクヤドウマδり7を有するカッ−陰極線管において
、アノード電圧Eb)サブフォーカス電圧Vgとなるよ
うに電圧が印加されているので入射する電子ビーム(5
)は、シャドウマスク(6)の透孔セン・ター(7)と
第2のシャドウマスクQGの透孔センタ′−aυを結ぶ
透孔中心軸SaWの方向に沿うように曲げられる。この
時の電子ビーム(5)の入射軌道軸に対する透孔中心軸
waasとのなす角度の変化量#は概略ΔD  Eb θ″″=KX丁×互 で表わされる。但しKHシャドウマスク(6) 、!:
 @ 2のシャドウマスクQaとの間隔tMとアノード
電圧gb及びサブフォーカス電圧Vg により定まる定
数、Dはタヤドウマスク(6)と第2のシャト°ウマス
ク(IIの透孔径である。
An embodiment of the present invention will be described in detail below with reference to the drawings. FIG. 1 is a schematic diagram showing the basic structure of a color cathode ray tube according to the present invention, particularly in the vicinity of a shadow mask. In Figure 1, the glass face plate of a color cathode ray tube) (1
) is formed with a fluorescent surface (2), and the fluorescent surface (2) has a fluorescent material (3) that emits light in each color and a black light absorber layer (4) on the remaining surface t-a. It consists of This fluorescent surface (2
) and an electron gun (not shown) that emits a plurality of electron beams, and an electron beam (5) is located close to the fluorescent surface (2).
A shadow mask (6) is provided to properly illuminate a corresponding predetermined phosphor (3). Furthermore, a second shadow mask (IQ) is placed close to the electron gun side of this shadow mask (6), and these two shadow masks (
6) and 0 (different potentials are applied to IK.
The corresponding through-hole centers (7) and 01) of the two shadow masks are arranged such that the through-hole axes (8) and (9) perpendicular to the phosphor surface are different, that is, through-hole centers (7) and 01
) is configured so that the central axis a2 of the through hole is non-perpendicular to the fluorescent surface, and the central axis a3 of the through hole is also configured to be non-parallel to the incident trajectory axis of the electron beam (5). ,
That is, it is configured to have an inclination. In the cathode ray tube having the above-mentioned array configuration and the quadrature angle δ, a voltage is applied to the anode voltage Eb) and the subfocus voltage Vg, so that the incident electron beam (5
) is bent along the direction of the hole center axis SaW connecting the hole center (7) of the shadow mask (6) and the hole center '-aυ of the second shadow mask QG. At this time, the amount of change # in the angle between the incident orbital axis of the electron beam (5) and the center axis waas of the through hole is approximately expressed as ΔD Eb θ″″=KX d×interval. However, KH Shadow Mask (6),! :
A constant determined by the distance tM from the second shadow mask Qa, the anode voltage gb, and the subfocus voltage Vg, and D is the through-hole diameter of the second shadow mask (6) and the second shadow mask (II).

今、電子銃から発射された電子ビーム(5)によりシャ
ドウマスクの熱変形が生じたとすると、シャドウマスク
の熱変形により螢光面(2)の所定の螢光体(31上に
位置していた電子ビームは@1図において右側方向へ移
動し、且つ同時にシャト°ウマスク(6)と第2のシャ
ドウマスクa・との間隔tMdi変イヒし定数に−の値
が大きくなる。定数にの値が大きくなると電子ビーム(
5)の入射軌道軸に対する透孔中心軸線αのとのなす偏
向角0が太きくな少、シャドウマスクの熱変形によって
電子ビーム(51力(移動する量とほぼ同等量分の逆方
向の補正量を得ることができる。
Now, suppose that the shadow mask is thermally deformed by the electron beam (5) emitted from the electron gun. The electron beam moves to the right in Figure 1, and at the same time, the distance tMdi between the shadow mask (6) and the second shadow mask a increases, and the negative value of the constant increases. When it gets bigger, the electron beam (
5) If the deflection angle 0 between the through-hole central axis α and the incident orbital axis is too large, thermal deformation of the shadow mask will cause the electron beam (51 force) to be corrected in the opposite direction by an amount approximately equivalent to the amount of movement. You can get the amount.

第2図乃至第4図は本発明の実施例を示すもので、第1
図と共通の、要素は同一番号で示しである。
Figures 2 to 4 show embodiments of the present invention.
Elements that are common to the figures are designated by the same number.

即ち、第2図はシャドウマスクの孔形状が円形のンヤド
ウマスクに本発明を適用した場合であり、M3図は同じ
く矩形状のシャドウマスクに本発明を適用した場合であ
り、第4図は同じく画面の喬直線に沿って切れ目のない
金属線状を張ったいわゆるアパーチャーグリル形状の/
ヤドウマスクに本発明を適用した場合であり、何れの場
合もその基本的構成及び作用は第1図に示すものと−じ
である。また複数のシャドウマスクに第2図乃至第4図
に示す孔形状のシャドウマスクを組合せて用いても良い
ことFi百5までもなり。
That is, Figure 2 shows the case where the present invention is applied to a shadow mask with a circular hole shape, Figure M3 shows the case where the present invention is applied to a rectangular shadow mask, and Figure 4 shows the case where the present invention is applied to a shadow mask with a circular hole shape. This is a so-called aperture grill shape in which an unbroken metal wire is stretched along a straight line.
This is a case where the present invention is applied to a Yado mask, and in either case, its basic structure and operation are the same as those shown in FIG. Further, it is possible to use a plurality of shadow masks in combination with hole-shaped shadow masks shown in FIGS. 2 to 4.

以上のように本発明によれに、シャドウマスクの熱変形
によっても正確な電子ビームのランディノグを有するカ
ラー陰極線管を得ることができる。
As described above, according to the present invention, a color cathode ray tube having accurate electron beam randomization can be obtained even by thermal deformation of a shadow mask.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明のカラー陰極線管の特にシャドウマスク
近傍の基本的構成を示す部分概略構成図、第2図乃至第
4図は本発明の実施例を示す部分概略構成図である。 (1)・・・ガラスフェースプレート (2)・・・螢
f、m(3)・・・螢光体     (4)・・・光吸
収体層(5)・・・電子ビーム   (6)、Ql・・
・シャドウマスク(7)、Qυ・・・透孔センター +
81.(9)・・・透孔軸aり・・・透孔中心軸線 (7317)代理人弁理士 則 近 憲 佑(ほか1名
)第2図 第  4 図 第3図
FIG. 1 is a partial schematic diagram showing the basic configuration of a color cathode ray tube according to the present invention, particularly in the vicinity of a shadow mask, and FIGS. 2 to 4 are partial schematic diagrams showing embodiments of the present invention. (1)... Glass face plate (2)... Firefly f, m (3)... Fluorescent material (4)... Light absorber layer (5)... Electron beam (6), Ql...
・Shadow mask (7), Qυ... Clear hole center +
81. (9)...Through-hole axis a...Through-hole center axis (7317) Representative Patent Attorney Noriyuki Chika (and one other person) Figure 2 Figure 4 Figure 3

Claims (1)

【特許請求の範囲】[Claims] 螢光面と電子銃の間に複数のシャドウマスクが配置&さ
れ、之等のシャドウマスクに異なる電位を印加するカラ
ー陰極線管において、前記複数のシャドウマスクの周辺
部の対応する電子ビーム透過孔対の各々の中心を結ぶ透
孔中心軸が前記シャドウマスクの電子ビーム透過孔対に
入射する電子ビーム軌導軸に対して傾きを有することを
特徴とするカラー陰極線管。
In a color cathode ray tube in which a plurality of shadow masks are arranged between a fluorescent surface and an electron gun, and different potentials are applied to the shadow masks, corresponding pairs of electron beam transmission holes in the periphery of the plurality of shadow masks are arranged. A color cathode ray tube characterized in that a central axis of the through hole connecting the centers of each of the holes has an inclination with respect to a trajectory axis of an electron beam incident on the pair of electron beam transmission holes of the shadow mask.
JP11526481A 1981-07-24 1981-07-24 Color cathode-ray tube Pending JPS5818845A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11526481A JPS5818845A (en) 1981-07-24 1981-07-24 Color cathode-ray tube

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11526481A JPS5818845A (en) 1981-07-24 1981-07-24 Color cathode-ray tube

Publications (1)

Publication Number Publication Date
JPS5818845A true JPS5818845A (en) 1983-02-03

Family

ID=14658361

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11526481A Pending JPS5818845A (en) 1981-07-24 1981-07-24 Color cathode-ray tube

Country Status (1)

Country Link
JP (1) JPS5818845A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USRE34556E (en) * 1985-01-23 1994-03-01 Smith & Nephew Dyonics Inc. Surgical system for powered instruments

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS552698A (en) * 1978-06-22 1980-01-10 Parcor Thienooor furopyridone derivative* its manufacture and therapeutic composition containing it

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS552698A (en) * 1978-06-22 1980-01-10 Parcor Thienooor furopyridone derivative* its manufacture and therapeutic composition containing it

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USRE34556E (en) * 1985-01-23 1994-03-01 Smith & Nephew Dyonics Inc. Surgical system for powered instruments

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