JPS58180631U - プラズマ反応処理装置 - Google Patents

プラズマ反応処理装置

Info

Publication number
JPS58180631U
JPS58180631U JP7715382U JP7715382U JPS58180631U JP S58180631 U JPS58180631 U JP S58180631U JP 7715382 U JP7715382 U JP 7715382U JP 7715382 U JP7715382 U JP 7715382U JP S58180631 U JPS58180631 U JP S58180631U
Authority
JP
Japan
Prior art keywords
reaction processing
plasma reaction
space
vacuum
processing equipment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7715382U
Other languages
English (en)
Japanese (ja)
Other versions
JPH025531Y2 (enrdf_load_stackoverflow
Inventor
植原　晃
宮崎　重一
中根　久
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Priority to JP7715382U priority Critical patent/JPS58180631U/ja
Publication of JPS58180631U publication Critical patent/JPS58180631U/ja
Application granted granted Critical
Publication of JPH025531Y2 publication Critical patent/JPH025531Y2/ja
Granted legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP7715382U 1982-05-26 1982-05-26 プラズマ反応処理装置 Granted JPS58180631U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7715382U JPS58180631U (ja) 1982-05-26 1982-05-26 プラズマ反応処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7715382U JPS58180631U (ja) 1982-05-26 1982-05-26 プラズマ反応処理装置

Publications (2)

Publication Number Publication Date
JPS58180631U true JPS58180631U (ja) 1983-12-02
JPH025531Y2 JPH025531Y2 (enrdf_load_stackoverflow) 1990-02-09

Family

ID=30086427

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7715382U Granted JPS58180631U (ja) 1982-05-26 1982-05-26 プラズマ反応処理装置

Country Status (1)

Country Link
JP (1) JPS58180631U (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPH025531Y2 (enrdf_load_stackoverflow) 1990-02-09

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